JP2003133460A - Airtight sealing type electronic component - Google Patents

Airtight sealing type electronic component

Info

Publication number
JP2003133460A
JP2003133460A JP2001327180A JP2001327180A JP2003133460A JP 2003133460 A JP2003133460 A JP 2003133460A JP 2001327180 A JP2001327180 A JP 2001327180A JP 2001327180 A JP2001327180 A JP 2001327180A JP 2003133460 A JP2003133460 A JP 2003133460A
Authority
JP
Japan
Prior art keywords
layer
thickness
electronic component
silver
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001327180A
Other languages
Japanese (ja)
Other versions
JP3558129B2 (en
Inventor
Hiroyoshi Matsuura
宏嘉 松浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daishinku Corp
Original Assignee
Daishinku Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daishinku Corp filed Critical Daishinku Corp
Priority to JP2001327180A priority Critical patent/JP3558129B2/en
Publication of JP2003133460A publication Critical patent/JP2003133460A/en
Application granted granted Critical
Publication of JP3558129B2 publication Critical patent/JP3558129B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide an electronic component that copes with lead-free condition without deteriorating airtightness after press fit, and carries out airtight sealing with excellent heat resistance. SOLUTION: A base 1 comprises a metallic shell 10, insulating glass 13 that is filled in the shell, and lead terminals 11 and 12 that pass through the insulating glass 13 for fixing. On the Kovar surface of the shell and lead terminal, a nickel layer or a copper layer 101 is formed to a thickness of 2 to 5 μm. On the upper surface, silver layer 102 is formed by a thickness of 5 to 15 μm. In addition, on the upper surface, a gold layer 103 is formed by a thickness of 0.05 to 1 μm.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は水晶振動子等の電子部品
に関するものであり、特に無鉛化に対応するとともに耐
熱性に優れた気密封止型の電子部品に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electronic component such as a crystal oscillator, and more particularly to a hermetically sealed electronic component which is lead-free and has excellent heat resistance.

【0002】[0002]

【従来の技術】金属製のシェルに絶縁ガラスが充填さ
れ、当該絶縁ガラスにリード端子が貫通固定された気密
ベースを用い、当該気密ベースに円筒状のキャップを圧
入する気密封止構成は、例えば特公昭58−47083
号で開示されているように音叉型水晶振動子等で慣用さ
れている。当該気密封止はベース、キャップのいずれか
一方あるいは両者の接合部分に軟質金属を形成し、相対
的に大きな径の略円柱状のベースに円筒状のキャップを
圧入することにより、軟質金属の塑性変形によりシール
が行われるものである。
2. Description of the Related Art An airtight sealing structure in which a metal shell is filled with insulating glass and a lead terminal is fixed through the insulating glass and a cylindrical cap is press-fitted into the airtight base is known. Japanese Patent Publication 58-47083
As is disclosed in Japanese Patent No. 3,849,865, it is commonly used in tuning fork type crystal oscillators and the like. The airtight seal is formed by forming a soft metal on either or both of the base and the cap, and by pressing the cylindrical cap into the approximately cylindrical base with a relatively large diameter, the plasticity of the soft metal is improved. Sealing is performed by deformation.

【0003】従来の構成は、例えばベースの金属製のシ
ェルの基材はコバールからなり、その表面にニッケルあ
るいは銅層がメッキ等の手段により形成され、さらにそ
の表面に錫層を形成した構成である。また、キャップは
洋白等の鉄ニッケル系合金からなり、少なくともベース
と圧接される領域には鉛1:錫9比率の半田が形成され
ていた。以上の構成により、ベース側の錫やキャップ側
の半田層が軟質であるため、両金属が強く密着した状態
で圧入されることにより塑性変形し、圧入を容易にして
いた。
In the conventional structure, for example, the base material of the base metal shell is made of Kovar, a nickel or copper layer is formed on the surface by means such as plating, and a tin layer is further formed on the surface. is there. Further, the cap was made of iron-nickel alloy such as nickel silver, and at least a region of pressure contact with the base was formed with solder having a lead: tin9 ratio. With the above configuration, since the tin layer on the base side and the solder layer on the cap side are soft, they are plastically deformed by being press-fitted in a state where both metals are strongly adhered to each other, facilitating press-fitting.

【0004】ところで近年においては、リフローソルダ
リング環境に対応させる必要がでてきた。すなわち、リ
フローソルダリングにおいては、240〜260℃の高
温環境により実装基板への搭載を行うため、この圧入部
分の金属構成も耐熱性が要求されるようになった。
By the way, in recent years, it has become necessary to support a reflow soldering environment. That is, in reflow soldering, since mounting on a mounting board is performed in a high temperature environment of 240 to 260 ° C., the metal structure of this press-fitted portion is also required to have heat resistance.

【0005】このような要求に対応するために半田組成
を例えば鉛9:錫1と鉛含有量を増加させ融点を上げた
半田が用いられてきた。しかしながら、鉛は人体に対し
て有害な物質であるため世界的にその使用を抑制あるい
は禁止する傾向にある。上記半田組成はこのような無鉛
化の動向に反するものであり、代替品が求められてい
た。
In order to meet such a demand, solder having a solder composition of, for example, lead 9: tin 1 and an increased lead content and an increased melting point has been used. However, since lead is a harmful substance to the human body, its use tends to be suppressed or prohibited worldwide. The above-mentioned solder composition is against the trend of lead-free, and a substitute product has been demanded.

【0006】このような無鉛化を考慮した構成が特開2
001−68194号に開示されており、この中で無鉛
化されたろう材として錫−銀系合金あるいは錫−ビスマ
ス系合金が例示されている。しかしながらこのような合
金は表面に酸化層が形成されやすく、軟質金属による気
密性能が極端に低下することがあった。また本公開公報
には、ろう材の表面に酸化防止用の錫膜を形成した旨も
開示されているが、錫膜の融点は220℃であり、上述
のリフローソルダリング温度よりも融点が低く、気密性
低下をまねくおそれがあった。
[0006] A structure in consideration of such lead-free is disclosed in Japanese Patent Laid-Open No.
No. 001-68194, and a tin-silver alloy or a tin-bismuth alloy is exemplified as the lead-free brazing filler metal. However, in such an alloy, an oxide layer is easily formed on the surface, and the airtightness of the soft metal may be extremely deteriorated. This publication also discloses that a tin film for oxidation prevention is formed on the surface of the brazing material, but the melting point of the tin film is 220 ° C., which is lower than the reflow soldering temperature described above. However, there is a possibility that airtightness may be deteriorated.

【0007】[0007]

【発明が解決しようとする課題】本発明は上記問題点を
解決するためになされたもので、圧入後の気密性を低下
させることなく無鉛化に対応することを1つの目的とす
るとともに、耐熱性に優れた気密封止を行う電子部品を
提供することをもう1つの目的とするものである。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and an object thereof is to cope with lead-free without reducing airtightness after press fitting, and heat resistance Another object is to provide an electronic component that is highly airtight and sealed.

【0008】[0008]

【課題を解決するための手段】本発明は請求項1に示す
ように、金属製のシェルに絶縁ガラスが充填され、当該
絶縁ガラスにリード端子が貫通固定されたベースと、当
該ベースに搭載される電子素子と、前記ベースに圧入さ
れることにより前記電子素子を気密封止するキャップと
からなる電子部品において、少なくとも前記金属製のシ
ェル外周にはニッケル層または銅層が形成され、当該層
上に銀層が形成され、当該銀層上に金層が形成されてい
ることを特徴としている。
According to a first aspect of the present invention, a metal shell is filled with insulating glass, and lead terminals are fixed through the insulating glass, and the base is mounted on the base. In the electronic component including an electronic element and a cap that hermetically seals the electronic element by being pressed into the base, a nickel layer or a copper layer is formed on at least the outer circumference of the metal shell, and a nickel layer or a copper layer is formed on the layer. And a gold layer is formed on the silver layer.

【0009】前記ニッケル層または銅層は、その上部に
形成される銀層の膜形成強度を向上させ、膜の安定性を
高める。当該銀層はその軟質性において従来用いられて
いた錫には劣るが、ある程度の軟質性を有し、圧入時に
必要な塑性変形を発生させることができる。また銀は周
知のとおり融点が高く、銀を圧入時のシール材として用
いた電子部品においては、これが比較的高い温度条件
(例えば260〜280℃)のリフローソルダリング環
境にさらされた場合でも、シール材の溶融等による不具
合が発生することはない。また当該銀層の上部に形成さ
れた金層は下の銀層の酸化を防止するとともに、良好な
延性により圧入をスムーズに進めることができ、また気
密性を向上させることができる。
The nickel layer or the copper layer improves the film forming strength of the silver layer formed on the nickel layer or the copper layer, and improves the stability of the film. Although the silver layer is inferior to tin which has been used conventionally in softness, it has a certain degree of softness and can generate necessary plastic deformation at the time of press fitting. Further, as is well known, silver has a high melting point, and in an electronic component using silver as a sealing material at the time of press fitting, even when it is exposed to a reflow soldering environment under relatively high temperature conditions (for example, 260 to 280 ° C.), Problems such as melting of the sealing material do not occur. Further, the gold layer formed on the silver layer can prevent the oxidation of the silver layer below, and can smoothly press fit due to good ductility and improve airtightness.

【0010】なお、前述のとおり銀は従来用いられてい
た錫に較べて軟質性に劣るが、これはベースに対するキ
ャップの圧入時の製造精度を向上させることにより、不
具合発生を防止することができる。例えばキャップが圧
入されるベースの微視的な傾き、位置ずれを極力排除す
る高精度な治具を用いたり、またキャップ側の圧入方向
の微視的な位置ずれを排除する高精度な装置、治具を用
いることにより圧入時の不具合を無くすことができる。
As mentioned above, silver is inferior in softness to the conventionally used tin, but this can prevent the occurrence of defects by improving the manufacturing accuracy when the cap is press-fitted into the base. . For example, using a high-precision jig that eliminates the microscopic tilt and displacement of the base into which the cap is press-fitted, or a high-precision device that eliminates microscopic displacement in the press-fitting direction on the cap side, By using a jig, it is possible to eliminate problems during press fitting.

【0011】また請求項2に示すように、請求項1記載
の構成において、前記錫層および銀層および金層の構成
をリード端子に形成してもよい。最上層の金層によりリ
ード端子の酸化を防止でき、実装基板への半田付け性を
向上させることができる。
Further, as described in claim 2, in the structure of claim 1, the structure of the tin layer, the silver layer and the gold layer may be formed in the lead terminal. Oxidation of the lead terminals can be prevented by the uppermost gold layer, and solderability to the mounting board can be improved.

【0012】また請求項3に示すように、上記各構成に
おいて、前記金層を0.05μm〜1μmの厚さで形成
するとよい。金層が0.05μm以下の場合であると、
銀の酸化防止作用が機能しにくくなり、銀の酸化層が形
成されると銀の軟質性が低下し、また表面の平滑性も損
なわれてくる。このような表面状態で圧入を行うと銀の
塑性変形による気密性が低下し、例えば内部を真空に保
つ必要のある音叉型水晶振動子に適用した場合、気密性
の低下によりCI(クリスタルインピーダンス)値が悪
化し、振動子としての機能が極端に低下するというよう
に、封止の信頼性が低下する。金層の厚さが1μm以上
となると気密性能の向上はあまり認められず、金を用い
ることによるコスト高が顕著となる。また金層が厚くな
るとリード端子部分を半田等の接合材にて接合する際、
接合材中に金が拡散して接合材が脆くなることが知られ
ている。よって、このような観点からも金層を厚くしす
ぎると好ましくなく、性能対価格あるいは性能品質の確
保を考慮すれば金層の厚さは0.05μm〜1μmが好
ましい。
As described in claim 3, in each of the above structures, the gold layer may be formed to a thickness of 0.05 μm to 1 μm. If the gold layer is 0.05 μm or less,
When the antioxidizing action of silver becomes difficult to function and the silver oxide layer is formed, the softness of silver is lowered and the smoothness of the surface is also impaired. When press-fitting is performed in such a surface state, the airtightness due to plastic deformation of silver is reduced. For example, when applied to a tuning fork type crystal resonator that needs to maintain a vacuum inside, the airtightness is reduced, resulting in CI (crystal impedance). The reliability deteriorates as the value deteriorates and the function as the vibrator extremely decreases. When the thickness of the gold layer is 1 μm or more, the airtight performance is not so much improved, and the cost increase due to the use of gold becomes remarkable. Also, when the gold layer becomes thick, when joining the lead terminal part with a joining material such as solder,
It is known that gold diffuses into the bonding material and the bonding material becomes brittle. Therefore, also from this point of view, it is not preferable to make the gold layer too thick, and in consideration of performance versus price or performance quality, the thickness of the gold layer is preferably 0.05 μm to 1 μm.

【0013】さらに請求項4に示すように、銀層の厚さ
を5μm〜15μmとするとよい。銀層は、前述のとお
りある程度の軟質性を有し、圧入時に必要な塑性変形を
発生させ気密封止性能を高めることができ、また耐熱性
にも優れているという利点を有している。銀層を5μm
未満とした場合、銀による塑性変形領域(厚さ)が少な
くなり、下部の金属層の状態が平滑でない等の場合、当
該金属層の影響を銀層が受け、たとえ上述のように精度
良く圧入を行った場合でも、気密封止性能は十分ではな
くなることがある。5μm以上にすると下部の金属層の
影響をあまり受けなくなり、気密封止性能が安定する。
Further, as described in claim 4, the thickness of the silver layer is preferably 5 μm to 15 μm. The silver layer has a certain degree of softness as described above, and has the advantage that it can generate the necessary plastic deformation at the time of press fitting to enhance the hermetic sealing performance and is also excellent in heat resistance. 5 μm silver layer
If it is less than the above, the plastic deformation area (thickness) due to silver is reduced, and if the state of the lower metal layer is not smooth, etc., the silver layer is affected by the metal layer, and even if it is pressed in accurately as described above. Even if the above is performed, the hermetic sealing performance may not be sufficient. When the thickness is 5 μm or more, the lower metal layer is less affected, and the hermetic sealing performance becomes stable.

【0014】また銀層の厚さをあまり厚くするのも好ま
しくない。すなわち、例えば銀層をメッキ等により形成
していくと、図3に示すように徐々にベースの面部分t
1に対し角部分t2の厚みが増え、膜厚を厚くするにつ
れてこの現象が顕著になる。なお、図3にはベース部分
の断面図であり、上記現象を強調して記載した模式図で
ある。このような表面状態で圧入を行うと圧入時のキャ
ップの歪み、破損等につながり、結果として気密封止性
能を低下させてしまうことになる。銀層の厚さを15μ
m以下とすることにより、このような現象による気密封
止性能低下を防ぐことができる。以上から銀層の厚さは
5〜15μmとすることが好ましい範囲といえる。
It is also not preferable to make the silver layer too thick. That is, when, for example, a silver layer is formed by plating or the like, as shown in FIG.
1, the corner portion t2 has an increased thickness, and this phenomenon becomes more remarkable as the film thickness is increased. Note that FIG. 3 is a cross-sectional view of the base portion, and is a schematic diagram in which the above phenomenon is emphasized and described. If the press-fitting is performed in such a surface state, the cap may be distorted or damaged at the time of press-fitting, and as a result, the hermetic sealing performance may be deteriorated. The thickness of the silver layer is 15μ
By setting m or less, it is possible to prevent the deterioration of the hermetic sealing performance due to such a phenomenon. From the above, it can be said that the preferable range of the thickness of the silver layer is 5 to 15 μm.

【0015】次に本発明品と従来品について、各性能に
ついて比較確認を行った。用いたサンプルは下記従来
品、本発明品、比較品各50個であり、確認した性能
は、気密性、半田付け性、耐熱(耐リフローソルダリン
グ)性能である。気密性はヘリウムリーク試験により確
認した。すなわち、各々メッキ処理したベースに水晶振
動素子(電子素子)を搭載し、キャップにて気密封止
(圧入)した水晶振動子をヘリウムリーク試験により気
密性能を確認した。試験前後で特性変化(周波数変化、
CI値変化等)が所定基準内のものを良品(○)、平均
的には所定基準内であるがバラツキが大きく製造条件に
よっては基準外となるものを境界品(△)、所定基準外
のものを不良品(×)とした。
Next, the performance of the product of the present invention and that of the conventional product were compared and confirmed. The samples used were 50 pieces each of the following conventional products, invention products, and comparative products, and the confirmed performances were airtightness, solderability, and heat resistance (reflow soldering resistance) performance. The airtightness was confirmed by a helium leak test. That is, a quartz resonator (electronic element) was mounted on each plated base, and a quartz resonator hermetically sealed (press-fitted) with a cap was confirmed to have hermetic performance by a helium leak test. Characteristic change (frequency change,
Goods with a CI value change etc. within the predetermined standard (○), those that are on average within the predetermined standard but are out of the standard depending on the manufacturing conditions are boundary products (△), and are outside the predetermined standard. The product was regarded as a defective product (x).

【0016】半田付け性は半田ぬれ性試験により確認し
た。水晶振動子の外部リード端子を所定条件で半田槽に
浸漬し、浸漬部分のぬれ割合(ぬれ面積割合)について
観察した。ぬれ割合が85%以上のものを良品(○)と
し、特にぬれ割合が95%以上のものを優良品(◎)と
した。またぬれ割合が75%以下のものを不良品(×)
とした。
The solderability was confirmed by a solder wettability test. The external lead terminal of the crystal unit was immersed in a solder bath under predetermined conditions, and the wetted portion (wet area ratio) of the immersed portion was observed. A product having a wetting rate of 85% or more was regarded as a good product (◯), and a product having a wetting ratio of 95% or more was regarded as a good product (⊚). If the wetting ratio is 75% or less, it is a defective product (x).
And

【0017】また耐熱(耐リフローソルダリング)性能
は所定条件(例えばリフローソルダリング環境の240
〜260℃)の加熱による特性変化(周波数変化、CI
値変化等)の有無により確認した。試験前後で特性変化
が所定基準内のものを良品(○)、所定基準外のものを
不良品(×)とした。
Further, heat resistance (anti-reflow soldering) performance is required under predetermined conditions (for example, 240 in a reflow soldering environment).
Characteristic change (frequency change, CI
The change was confirmed by the presence or absence of value change. Goods with a characteristic change within the predetermined standard before and after the test were evaluated as good products (◯), and those with a property change outside the predetermined standards were evaluated as defective products (x).

【0018】試験結果を表1に示す。The test results are shown in Table 1.

【表1】 [Table 1]

【0019】いずれの金属膜もベースのシェルおよびリ
ード端子に形成した。従来品1はPb9:Sn1含有の
耐熱半田を12μm形成したもので、従来品2はSnを
5μm、その上にAgを3μm形成したもの、従来品3
はSnを5μm、その上にAgを8μm形成したもので
ある。また、本発明品1はNiを3μm、その上にAg
を5μm、その上にAuを0.05μm形成したもの、
本発明品2はNiを3μm、その上にAgを5μm、そ
の上にAuを1μm形成したもの、本発明品3はNiを
3μm、その上にAgを8μm、その上にAuを0.0
5μm形成したもの、本発明品4はNiを3μm、その
上にAgを8μm、その上にAuを1μm形成したも
の、本発明品5はNiを2μm、その上にAgを15μ
m、その上にAuを0.05μm形成したもの、本発明
品6はNiを2μm、その上にAgを15μm、その上
にAuを1μm形成したものである。比較品1はNiを
5μm、その上にAgを2μm、その上にAuを0.0
5μm形成したもの、比較品2はNiを5μm、その上
にAgを2μm、その上にAuを1μm形成したもの、
比較品3はNiを5μm、その上にAgを5μm、その
上にAuを0.03μm形成したもの、比較品4はNi
を2μm、その上にAgを18μm、その上にAuを
0.05μm形成したもの、比較品5はNiを3μm、
その上にAgを5μm、その上にAuを2μm形成した
ものである。
Any metal film was formed on the shell of the base and the lead terminal. Conventional product 1 is Pb9: Sn1 containing heat-resistant solder formed to 12 μm, Conventional product 2 is Sn to 5 μm, Ag is formed on it to 3 μm, Conventional product 3
Is Sn having a thickness of 5 μm and Ag having a thickness of 8 μm formed thereon. Further, the product 1 of the present invention has Ni of 3 μm and Ag on top of it.
Having a thickness of 5 μm and Au formed thereon with a thickness of 0.05 μm,
The product 2 of the present invention has Ni of 3 μm, Ag of 5 μm formed thereon, and Au of 1 μm formed thereon. The product 3 of the present invention has Ni of 3 μm, Ag of 8 μm on it, and Au of 0.0 on it.
5 μm formed, Inventive product 4 has Ni of 3 μm, Ag of 8 μm formed thereon, and Au of 1 μm formed thereon. Invented product 5 has Ni of 2 μm formed thereon and Ag of 15 μm formed thereon.
m, Au having a thickness of 0.05 μm formed thereon, and the product 6 of the present invention has Ni having a thickness of 2 μm, Ag having a thickness of 15 μm formed thereon, and Au having a thickness of 1 μm formed thereon. Comparative product 1 had Ni of 5 μm, Ag of 2 μm on it, and Au of 0.0 on it.
5 μm, Comparative product 2 has Ni of 5 μm, Ag of 2 μm formed thereon, and Au of 1 μm formed thereon.
Comparative product 3 has Ni of 5 μm, Ag of 5 μm formed thereon, and Au of 0.03 μm formed thereon, and Comparative product 4 of Ni
Of 2 μm, Ag of 18 μm formed thereon, and Au of 0.05 μm formed thereon. Comparative product 5 has Ni of 3 μm,
5 μm of Ag is formed thereon, and 2 μm of Au is formed thereon.

【0020】上記実験結果から、従来品は半田付け性あ
るいは耐熱性に劣っており、実用に供することは好まし
くない。これに対して本発明品は気密性、半田付け性、
耐熱性とも良好な試験結果を得ており、特に半田付け性
については95%以上の半田ぬれ性を示しており、極め
て良好であることを示している。また比較品1〜4はい
ずれも半田付け性、耐熱性は良好であるが気密性のバラ
ツキが大きく、やや信頼性に欠いていることが理解でき
る。また比較品5は上記各特性については良好である
が、前述したように金のコスト高と、金による接合材へ
の悪影響が出る可能性が高くなる。
From the above experimental results, the conventional products are inferior in solderability or heat resistance and are not suitable for practical use. In contrast, the product of the present invention is airtight, solderability,
Good heat resistance and good test results have been obtained, and especially solderability shows a solder wettability of 95% or more, showing that it is extremely good. Further, it can be understood that Comparative Examples 1 to 4 all have good solderability and heat resistance, but have a large variation in airtightness, and are somewhat lacking in reliability. Although the comparative product 5 is good in each of the above-mentioned characteristics, as described above, the cost of gold is high and the possibility that gold will adversely affect the bonding material is high.

【0021】[0021]

【実施例】本発明の実施例について、図面を参照して説
明する。図1は音叉型水晶振動子の分解した内部構造を
示す図であり、図2は図1のベース部分の部分拡大図で
ある。
Embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a diagram showing an exploded internal structure of a tuning fork type crystal unit, and FIG. 2 is a partially enlarged view of a base portion of FIG.

【0022】ベース1は、金属製のシェル10と、当該
シェル内に充填された絶縁ガラス13と、当該絶縁ガラ
ス13に貫通固定されたリード端子11,12とからな
る。シェル10は例えばコバールあるいは鉄ニッケル系
合金を基体としており、上下に貫通した円筒形状を有し
ている。リード端子11,12は例えばコバールを基体
とし線状に加工され、かつ前記シェルに所定の間隔をも
って貫通配置されている。絶縁ガラス13は例えばホウ
ケイ酸ガラスからなり、前記シェル10とリード端子1
1,12とを各々電気的に独立した状態でガラス焼成技
術により一体的に成形される。
The base 1 comprises a metallic shell 10, an insulating glass 13 filled in the shell, and lead terminals 11 and 12 penetratingly fixed to the insulating glass 13. The shell 10 has, for example, a Kovar or iron-nickel-based alloy as a base, and has a cylindrical shape that penetrates vertically. The lead terminals 11 and 12 are formed into a linear shape using, for example, Kovar as a base, and are arranged through the shell at a predetermined interval. The insulating glass 13 is made of, for example, borosilicate glass, and includes the shell 10 and the lead terminal 1.
1 and 12 are integrally molded by a glass firing technique in an electrically independent state.

【0023】この一体成形されたベースを酸洗浄等によ
り金属表面の洗浄や浸炭部分の除去を行い、その後次の
金属被膜が形成される。シェルおよびリード端子のコバ
ール表面には、ニッケル層あるいは銅層101が2〜5
μmの厚さで形成され、その上面には銀層102が5〜
15μmの厚さで形成される。またその上面には金層1
03が0.05〜1μmの厚さで形成される。これら各
金属被膜形成はバレルメッキを用いるとよい。バレルメ
ッキは被膜形成対象物を投入したバレルをメッキ浴に浸
漬し、バレルを回転させることにより電解メッキを効率
的に行うことができ、またバッチ処理が可能であること
から、量産性にも優れている。
This integrally molded base is subjected to acid cleaning or the like to clean the metal surface or remove the carburized portion, and then the next metal coating is formed. On the surface of the Kovar of the shell and the lead terminal, the nickel layer or the copper layer 101 is 2-5.
The thickness of the silver layer 102 is 5 μm, and the silver layer 102 has a thickness of 5-5 μm.
It is formed with a thickness of 15 μm. Moreover, a gold layer 1 is formed on the upper surface thereof.
03 is formed with a thickness of 0.05 to 1 μm. Barrel plating is preferably used for forming each of these metal coatings. Barrel plating is excellent in mass productivity because it is possible to perform electrolytic plating efficiently by immersing the barrel into which the film-forming target is placed in the plating bath and rotating the barrel, and batch processing is also possible. ing.

【0024】このようなメッキ処理により、ベースのシ
ェルおよびリード端子表面に上記各金属層が形成され
る。そしてリード端子のインナー側11a,12aには
電子素子である音叉型水晶振動子片2が半田等により接
合される。音叉型水晶振動子片2の主面および側面には
図示していないが1対の励振電極が形成されており、そ
れぞれの電極がリード端子部分に引き出され、前記イン
ナー側のリード端子11a,12aと導電接合される。
By such a plating treatment, the above metal layers are formed on the surface of the base and the lead terminals. The tuning fork type crystal resonator element 2 which is an electronic element is joined to the inner sides 11a and 12a of the lead terminals by soldering or the like. Although not shown, a pair of excitation electrodes are formed on the main surface and the side surface of the tuning fork type crystal unit 2, and each of the electrodes is drawn out to a lead terminal portion, and the inner lead terminals 11a, 12a are formed. And conductively joined.

【0025】キャップ3は洋白(Cu−Ni−Zn系合
金)からなり、有底の円筒状を有している。キャップの
外周および内周面にはニッケル層31がメッキ等の手段
により形成されている。なお、当該キャップに形成する
金属層は、ニッケルに代えて銅または銀または金を用い
てもよいし、ニッケル、銅、銀、金を適宜組み合わせた
多層構造であってもよい。キャップの内径は前記ベース
のシェル部分よりも若干小さく設計されており、例えば
2〜5%小さな内径に設定されている。このようなキャ
ップを真空雰囲気中で前記電子素子である音叉型水晶振
動子片を被覆し、キャップ開口部をベースに圧入するこ
とにより、ベースとキャップが強く密着しキャップ内部
が真空状態に保たれた気密封止を行うことができる。
The cap 3 is made of nickel silver (Cu-Ni-Zn alloy) and has a bottomed cylindrical shape. A nickel layer 31 is formed on the outer and inner peripheral surfaces of the cap by means such as plating. The metal layer formed on the cap may use copper, silver, or gold instead of nickel, or may have a multi-layer structure in which nickel, copper, silver, and gold are appropriately combined. The inner diameter of the cap is designed to be slightly smaller than the shell portion of the base, and is set to, for example, 2 to 5% smaller. By covering such a cap with the tuning-fork type crystal oscillator piece which is the electronic element in a vacuum atmosphere and press-fitting the cap opening into the base, the base and the cap are firmly adhered to each other, and the inside of the cap is kept in a vacuum state. Airtight sealing can be performed.

【0026】以上により、リード端子のアウター側11
b、12bには表面に薄い金層が形成された電子部品を
得ることができ、これにより実装基板への半田付けも半
田付け性が低下することなく、スムーズな実装を行うこ
とができる。なお電子素子をリード端子に接合する半田
および電子部品を実装基板に接合する半田も無鉛のもの
で、かつ耐熱性に優れた材料を用いることにより、電子
部品のトータルとしての無鉛化、耐熱性対応の電子部品
を得ることができる。
From the above, the outer side 11 of the lead terminal
It is possible to obtain an electronic component in which a thin gold layer is formed on the surfaces b and 12b, so that the soldering to the mounting board can be performed smoothly without lowering the solderability. In addition, the solder that joins the electronic element to the lead terminal and the solder that joins the electronic component to the mounting board are lead-free, and by using a material with excellent heat resistance, the total electronic component can be lead-free and heat resistant. The electronic parts of can be obtained.

【0027】また、上記構成においてニッケルあるいは
銅層と銀層間に両者の合金層を形成してもよい。合金層
の形成は例えばニッケルあるいは銅層、そして銀層を順
次メッキ形成した後、例えば210℃の真空雰囲気中に
て数時間の加熱により拡散処理を行うとよい。合金層領
域は拡散処理時間により制御することができる。
In the above structure, an alloy layer of nickel or copper may be formed between the silver layer and the silver layer. To form the alloy layer, for example, a nickel or copper layer and a silver layer are sequentially formed by plating, and then diffusion treatment may be performed by heating for several hours in a vacuum atmosphere at 210 ° C., for example. The alloy layer region can be controlled by the diffusion treatment time.

【0028】当該合金層を形成することにより、ニッケ
ルあるいは銅層と銀層との膜形成強度が向上し、圧入時
の気密封止性能を向上させることができる。なお、金層
は上記拡散処理後に形成すればよい。
By forming the alloy layer, the film forming strength between the nickel or copper layer and the silver layer is improved, and the airtight sealing performance at the time of press fitting can be improved. The gold layer may be formed after the above diffusion process.

【0029】なお、上記実施例においては、真空封止を
行う音叉型水晶振動子を例示したが、不活性ガス雰囲気
で気密封止したものに適用したり、他の振動モードの水
晶振動子に適用することも可能である。またさらには、
水晶振動子以外の圧電素子あるいは他の電子素子の気密
封止に適用することも可能である。
In the above embodiment, the tuning fork type crystal unit for vacuum sealing is shown as an example. However, the present invention can be applied to those which are hermetically sealed in an inert gas atmosphere, or for crystal units of other vibration modes. It is also possible to apply. Furthermore,
It is also possible to apply to hermetically sealing piezoelectric elements other than the crystal oscillator or other electronic elements.

【0030】[0030]

【発明の効果】本発明によれば、銀層がベースに強固に
膜形成されるとともに、圧入時に前記銀層が塑性変形
し、必要な気密封止性能を確保する。また金層により銀
層の酸化を防止するとともに、圧入時の気密性確保が有
効に機能し、良好な延性により圧入をスムーズに進める
ことができる。さらにいずれの金属材料も耐熱性に優れ
ており、比較的高い温度条件(例えば260〜280
℃)のリフローソルダリングにも対応させることがで
き、適用温度範囲を大きく拡大することができる。また
すべて鉛を用いない材料でベースに対する金属層を構成
しているので、無鉛化にも対応することができる。よっ
て、圧入後の気密性を低下させることなく無鉛化に対応
するとともに、耐熱性に優れた気密封止を行う電子部品
を得ることができる。
According to the present invention, the silver layer is firmly formed on the base, and the silver layer is plastically deformed at the time of press fitting, so that the required hermetic sealing performance is secured. Further, the gold layer prevents the silver layer from being oxidized, and the airtightness at the time of press-fitting effectively functions, and the good ductility allows the press-fitting to proceed smoothly. Further, all the metal materials have excellent heat resistance, and are relatively high temperature conditions (for example, 260 to 280).
(° C) reflow soldering can also be applied, and the applicable temperature range can be greatly expanded. Further, since the metal layer for the base is made of a material that does not use any lead, it is possible to deal with lead-free. Therefore, it is possible to obtain an electronic component that can be lead-free without lowering the airtightness after press-fitting and that has an excellent heat resistance and is hermetically sealed.

【0031】また請求項2によれば、上記効果に加えて
最上層の金層によりリード端子の酸化を防止でき、実装
基板への半田付け性を向上させることができる。
According to the second aspect, in addition to the above effect, the uppermost gold layer can prevent the lead terminals from being oxidized, and the solderability to the mounting substrate can be improved.

【0032】また請求項3によれば、気密性の確保とコ
ストを考慮した好ましい気密封止を行った電子部品を得
ることができる。
According to the third aspect, it is possible to obtain an electronic component which is preferably hermetically sealed in consideration of ensuring airtightness and cost.

【0033】さらに請求項4によれば、必要な気密性を
確実に得ることのできる好ましい気密封止を行った電子
部品を得ることができる。
Furthermore, according to the fourth aspect, it is possible to obtain an electronic component which is preferably hermetically sealed so that the necessary hermeticity can be surely obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】音叉型水晶振動子の分解した内部構造を示す
図。
FIG. 1 is a diagram showing an exploded internal structure of a tuning fork type crystal unit.

【図2】図1のベース部分の部分拡大図。FIG. 2 is a partially enlarged view of a base portion of FIG.

【図3】膜形成の不具合状態を示すベースの部分断面
図。
FIG. 3 is a partial cross-sectional view of a base showing a defective state of film formation.

【符号の説明】[Explanation of symbols]

1 ベース 10 シェル 11,12 リード端子 13 絶縁ガラス 1 base 10 shell 11,12 Lead terminal 13 insulating glass

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 金属製のシェルに絶縁ガラスが充填さ
れ、当該絶縁ガラスにリード端子が貫通固定されたベー
スと、当該ベースに搭載される電子素子と、前記ベース
に圧入されることにより前記電子素子を気密封止するキ
ャップとからなる電子部品において、 少なくとも前記金属製のシェル外周にはニッケル層また
は銅層が形成され、当該ニッケル層または銅層上に銀層
が形成され、当該銀層上に金層が形成されていることを
特徴とする気密封止型電子部品。
1. A base in which a metal shell is filled with insulating glass, and lead terminals are fixed through the insulating glass, an electronic element mounted on the base, and the electronic device by being press-fitted into the base. In an electronic component including a cap for hermetically sealing an element, a nickel layer or a copper layer is formed at least on the outer circumference of the metal shell, a silver layer is formed on the nickel layer or the copper layer, and a silver layer is formed on the silver layer. A hermetically sealed electronic component, wherein a gold layer is formed on the.
【請求項2】 前記ニッケル層または銅層および銀層お
よび金層がリード端子にも形成されていることを特徴と
する請求項1記載の気密封止型電子部品。
2. The hermetically sealed electronic component according to claim 1, wherein the nickel layer or the copper layer and the silver layer and the gold layer are also formed on the lead terminals.
【請求項3】 前記金層の厚さが0.05μm〜1μm
であることを特徴とする請求項1または請求項2記載の
気密封止型電子部品。
3. The thickness of the gold layer is 0.05 μm to 1 μm.
The hermetically sealed electronic component according to claim 1 or 2, wherein
【請求項4】 前記銀層の厚さが5μm〜15μmであ
ることを特徴とする請求項1または請求項2または請求
項3記載の気密封止型電子部品。
4. The hermetically sealed electronic component according to claim 1, 2 or 3, wherein the thickness of the silver layer is 5 μm to 15 μm.
JP2001327180A 2001-10-25 2001-10-25 Hermetically sealed electronic components Expired - Fee Related JP3558129B2 (en)

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Application Number Priority Date Filing Date Title
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JP3558129B2 JP3558129B2 (en) 2004-08-25

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ID=19143448

Family Applications (1)

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Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7276667B2 (en) 2003-11-14 2007-10-02 Seiko Epson Corporation Press-fit sealed electronic component and method for producing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7276667B2 (en) 2003-11-14 2007-10-02 Seiko Epson Corporation Press-fit sealed electronic component and method for producing the same

Also Published As

Publication number Publication date
JP3558129B2 (en) 2004-08-25

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