JP2003117504A - Cleaning device - Google Patents
Cleaning deviceInfo
- Publication number
- JP2003117504A JP2003117504A JP2001318450A JP2001318450A JP2003117504A JP 2003117504 A JP2003117504 A JP 2003117504A JP 2001318450 A JP2001318450 A JP 2001318450A JP 2001318450 A JP2001318450 A JP 2001318450A JP 2003117504 A JP2003117504 A JP 2003117504A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- cleaned
- fluid
- cleaning tank
- flow path
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/54—Improvements relating to the production of bulk chemicals using solvents, e.g. supercritical solvents or ionic liquids
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Extraction Or Liquid Replacement (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、半導体素子や液晶
ディスプレイなどの微細加工部品を、超臨界または亜臨
界状態の洗浄流体を使用して洗浄する洗浄装置に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning device for cleaning microfabricated components such as semiconductor devices and liquid crystal displays using a cleaning fluid in a supercritical or subcritical state.
【0002】[0002]
【従来の技術】近年、半導体素子や液晶ディスプレイな
どの微細加工部品を洗浄する装置として、超臨界流体を
利用した洗浄装置が注目されている。超臨界流体とは、
物質固有の臨界温度及び臨界圧力を超えた領域にある流
体を指す。この超臨界流体は、気体と液体の中間の粘度
・拡散係数・密度・溶解力をもっている。また、元来、
気体を圧縮して使用するため、圧力を通常圧に戻すと気
体として振る舞う。2. Description of the Related Art In recent years, a cleaning device using a supercritical fluid has been attracting attention as a device for cleaning microfabricated parts such as semiconductor elements and liquid crystal displays. What is a supercritical fluid?
It refers to a fluid in the region above the critical temperature and critical pressure peculiar to a substance. This supercritical fluid has a viscosity, a diffusion coefficient, a density, and a dissolving power intermediate between those of gas and liquid. Also, originally
Since the gas is used after being compressed, it behaves as a gas when the pressure is returned to the normal pressure.
【0003】このような性質を有する超臨界流体を洗浄
媒体として利用することは、従来から行われていた湿式
洗浄に比べて、
・微細化に対応し易い
・被洗浄物質の形状にとらわれない
・乾燥工程が不要である
・素早い処理が可能である
・廃液処理が不要である
・添加溶剤を加えること等で溶解力を自由にコントロー
ルできる
・装置本体の小型化が可能である
・抽出した汚染物質の分離が簡単である(特に二酸化炭
素の超臨界流体を用いた場合)
などの多くの利点を有する。The use of a supercritical fluid having such properties as a cleaning medium is easier to deal with miniaturization than conventional wet cleaning. It is not restricted by the shape of the substance to be cleaned. No drying process is required, quick treatment is possible, waste liquid treatment is not required, dissolving power can be freely controlled by adding additional solvent, etc., device main unit can be downsized, extracted contaminants It has many advantages such as easy separation (especially when using carbon dioxide supercritical fluid).
【0004】超臨界流体の洗浄媒体(洗浄用流体)とし
て主に使用される材料は、二酸化炭素、亜硫酸ガス、亜
酸化窒素、エタン、プロパン、フロンガス等である。例
えば良く使用される二酸化炭素は、温度31.06℃以
上、圧力74.8atm以上の条件で超臨界流体となる。Materials mainly used as a cleaning medium (cleaning fluid) for the supercritical fluid are carbon dioxide, sulfurous acid gas, nitrous oxide, ethane, propane, CFC gas and the like. For example, carbon dioxide often used becomes a supercritical fluid under the conditions of a temperature of 31.06 ° C. or higher and a pressure of 74.8 atm or higher.
【0005】この種の超臨界流体を利用した洗浄装置と
して、特開昭62−176504号公報に示されている
洗浄装置では、洗浄槽の内部に筒壁を設けることで、洗
浄槽内に筒壁の内側の流路と外側の流路からなる循環流
路を画成し、被洗浄物を収容する内側の流路に加熱手
段、外側の流路に冷却手段を設け、内側の流路に加熱に
より比重の軽くなった流体の上昇流、外側の流路に冷却
により比重の重くなった流体の下降流を生じさせること
により、対流による超臨界流体の内部循環を発生させ
て、洗浄効果を高めるようにしている。このような内部
循環型の洗浄装置では、洗浄流体の使用量を減らせる
上、外部循環と違って循環ポンプが不要である等のメリ
ットがある。As a cleaning device using this type of supercritical fluid, in the cleaning device disclosed in Japanese Patent Laid-Open No. 176504/1987, a cylinder wall is provided inside the cleaning tank, so that a cylinder is provided inside the cleaning tank. A circulation flow path is defined by a flow path inside the wall and a flow path outside, and a heating means is provided in the internal flow path for accommodating the object to be cleaned and a cooling means is provided in the external flow path. By generating an ascending flow of the fluid whose specific gravity is reduced by heating and a descending flow of the fluid whose specific gravity is increased by cooling in the outer flow path, internal circulation of the supercritical fluid by convection is generated to improve the cleaning effect. I try to raise it. Such an internal circulation type cleaning device has advantages that the amount of cleaning fluid used can be reduced and that a circulation pump is not required unlike the external circulation.
【0006】[0006]
【発明が解決しようとする課題】ところで、特開昭62
−176504号公報に記載された従来の洗浄装置にお
いては、加熱により密度が小さくなり、それに伴って汚
染物の溶解度が小さくなる内側流路の流体中に被洗浄物
を配置しているので、洗浄能力があまり高くない可能性
がある。また、溶解性の低い粒子等を含む汚染物質を除
去しようとする場合には、有効な洗浄能力を発揮できな
いため不適である。また、筒壁の内側に加熱手段として
の熱交換パイプを配置しているので、被洗浄物の出し入
れを洗浄槽の上部から行おうとすると、熱交換パイプが
邪魔になり、被洗浄物の出し入れがしにくくなる可能性
がある。By the way, JP-A-62-62
In the conventional cleaning device described in Japanese Patent Laid-Open No. 176504/1998, since the density is reduced by heating and the solubility of contaminants is reduced accordingly, the object to be cleaned is disposed in the fluid in the inner flow path, It is possible that the ability is not very high. Further, when attempting to remove contaminants including particles having low solubility, it is not suitable because effective cleaning ability cannot be exhibited. Also, since the heat exchange pipe as the heating means is arranged inside the cylindrical wall, when trying to load or unload the item to be cleaned from the upper part of the cleaning tank, the heat exchange pipe becomes an obstacle, and the item to be cleaned can be loaded or unloaded. It may be difficult to do.
【0007】本発明は、上記事情を考慮し、対流による
内部循環型の洗浄装置において、洗浄効率のアップと被
洗浄物の出し入れの容易化を実現することのできる洗浄
装置を提供することを目的とする。In view of the above circumstances, it is an object of the present invention to provide a cleaning device of an internal circulation type by convection, which can improve the cleaning efficiency and facilitate the taking in and out of an object to be cleaned. And
【0008】[0008]
【課題を解決するための手段】請求項1の発明は、気密
に密閉された洗浄槽内に被洗浄物を収容し、洗浄槽内で
被洗浄物に超臨界または亜臨界状態の洗浄用流体を接触
させることにより、被洗浄物に付着または含浸した汚染
物を抽出除去する洗浄装置において、前記洗浄槽内の上
部に冷却手段、下部に加熱手段を設けることで、対流に
よって前記流体が循環する循環流路を形成し、この循環
流路のうち下降流路の冷却手段の下側に被洗浄物の収容
部を確保すると共に、洗浄槽の下部に、抽出した汚染物
の滞留部を設けたことを特徴とする。According to a first aspect of the present invention, an object to be cleaned is contained in an airtightly sealed cleaning tank, and the cleaning fluid is in a supercritical or subcritical state for the object to be cleaned in the cleaning tank. In the cleaning device for extracting and removing contaminants attached to or impregnated with the object to be cleaned by providing a cooling means at the upper part and a heating means at the lower part in the cleaning tank, the fluid circulates by convection. A circulation channel is formed, and a storage section for the object to be cleaned is secured below the cooling means of the descending channel in this circulation channel, and a retention section for the extracted contaminants is provided at the bottom of the cleaning tank. It is characterized by
【0009】請求項1の発明では、洗浄槽の上部に冷却
手段、下部に加熱手段を配置しているので、流体の循環
効率が高くなり洗浄能力がアップする。また、冷却手段
の下側に被洗浄物の収容部を設けたので、冷却により密
度が高められて溶解度が高くなった流体を直接被洗浄物
に接触させることができ、汚染物を有効に流体中に溶解
させることができる。また、洗浄槽の下部にある加熱手
段で流体を加熱することにより、流体の密度を低くして
溶解度を低下させるので、流体中に溶解していた汚染物
を洗浄槽の下部で有効に分離することができ、汚染物が
分離された流体を再び循環させることで洗浄能力のアッ
プが図れる。なお、ここで分離した汚染物は洗浄槽の下
部の滞留部に溜まるので、適宜外部に取り出すことがで
きる。また、洗浄槽の上部と下部に冷却手段と加熱手段
を分けて配置していることから、上部の冷却手段を洗浄
槽の上蓋に一体化させることが可能であり、冷却手段を
一緒に上蓋と取り外すことで、被洗浄物を簡単に洗浄槽
に対し出し入れすることができるようになる。According to the first aspect of the present invention, since the cooling means is arranged in the upper part of the cleaning tank and the heating means is arranged in the lower part, the circulation efficiency of the fluid is increased and the cleaning capacity is improved. In addition, since the storage portion for the object to be cleaned is provided below the cooling means, the fluid whose density is increased by cooling and whose solubility is increased can be directly contacted with the object to be cleaned, and the contaminant can be effectively used as a fluid. It can be dissolved in. Further, since the fluid is heated by the heating means provided in the lower part of the cleaning tank to lower the density of the fluid and reduce the solubility, contaminants dissolved in the fluid are effectively separated in the lower part of the cleaning tank. The cleaning ability can be improved by recirculating the fluid from which contaminants have been separated. In addition, since the contaminants separated here are collected in the retention part in the lower part of the cleaning tank, they can be appropriately taken out to the outside. Further, since the cooling means and the heating means are separately arranged at the upper part and the lower part of the cleaning tank, it is possible to integrate the upper cooling means with the upper lid of the cleaning tank, and the cooling means together with the upper lid. By removing it, the object to be cleaned can be easily put in and taken out of the cleaning tank.
【0010】請求項2の発明は、請求項1において、前
記洗浄槽の内部に上下方向に延在する仕切部材を設ける
ことで、前記循環流路の上昇流路と下降流路とを画成
し、前記上昇流路の下部に加熱手段、前記下降流路の上
部に冷却手段をそれぞれ配置したことを特徴とする。According to a second aspect of the present invention, in the first aspect, a partition member extending in the vertical direction is provided inside the cleaning tank to define an ascending channel and a descending channel of the circulation channel. The heating means is arranged below the ascending passage and the cooling means is arranged above the descending passage.
【0011】請求項1の発明では、特に仕切部材を洗浄
槽内部に設けて循環流路の上昇流路と下降流路とを画成
するところまでは限定していないが、請求項2の発明で
は、洗浄槽の内部に上下方向に延在する仕切部材を設け
て循環流路の上昇流路と下降流路とを画成する点を限定
している。そして、上昇流路の下部に加熱手段、下降流
路の上部に冷却手段をそれぞれ配置している。このよう
に上昇流路と下降流路を仕切部材ではっきりと画成する
ことにより、上昇流と下降流の接触による循環ロスを軽
減できる。しかも、上昇流路の下部に加熱手段、下降流
路の上部に冷却手段を配置しているので、上昇流及び下
降流を有効に作り出すことができて、循環効率の向上に
よる洗浄能力のアップが図れる。In the invention of claim 1, the partition member is not particularly limited to the place where the ascending flow path and the descending flow path of the circulation flow path are defined by providing the partition member inside the cleaning tank. In the above, the point that the partition member extending in the vertical direction is provided inside the cleaning tank to define the ascending channel and the descending channel of the circulation channel is limited. The heating means is arranged below the ascending flow path, and the cooling means is arranged above the descending flow path. By thus clearly defining the ascending flow path and the descending flow path by the partition member, the circulation loss due to the contact between the ascending flow and the descending flow can be reduced. Moreover, since the heating means is arranged in the lower part of the ascending flow path and the cooling means is arranged in the upper part of the descending flow path, the ascending and descending flows can be effectively created, and the cleaning efficiency is improved by improving the circulation efficiency. Can be achieved.
【0012】請求項3の発明は、請求項2において、前
記仕切部材を、内側を下降流路、外側を上昇流路とし、
且つ、上部を大径、下部を小径とした段付き筒壁で構成
し、大径部の内部空間を被洗浄物の収容部とし、小径部
の外側に加熱手段を配置したことを特徴とする。According to a third aspect of the present invention, in the second aspect, the partition member has a downward flow passage on the inside and an upward flow passage on the outside.
In addition, it is characterized in that it is configured by a stepped cylindrical wall having an upper portion having a large diameter and a lower portion having a small diameter, the internal space of the large diameter portion serving as a storage portion for the object to be cleaned, and the heating means arranged outside the small diameter portion. .
【0013】請求項3の発明では、上部を大径、下部を
小径とした段付き筒壁で仕切部材を構成しているので、
大径部の内部に、冷却されて高密度となった流体を滞留
させることができ、被洗浄物に対する十分な接触時間を
確保することができて、洗浄能力のアップが図れる。ま
た、小径部の外側に加熱手段を配置しているので、例え
ば、熱交換コイルで加熱手段を構成する場合にも、スペ
ース的な余裕を持って加熱手段を配備することができ、
加熱効率を高めて有効な上昇流を作り出すことができ
る。According to the third aspect of the present invention, since the partition member is constituted by the stepped cylindrical wall whose upper portion has a large diameter and whose lower portion has a small diameter,
A fluid that has been cooled and has a high density can be retained inside the large-diameter portion, a sufficient contact time with the object to be cleaned can be secured, and the cleaning capacity can be improved. Further, since the heating means is arranged outside the small diameter portion, for example, even when the heating means is constituted by a heat exchange coil, the heating means can be arranged with a space margin.
The heating efficiency can be increased to create an effective upflow.
【0014】請求項4の発明は、請求項1〜3のいずれ
かにおいて、前記下降流路の冷却手段の下側に、冷却手
段によって冷却された流体が内部に滞留した後オーバー
フローする洗浄容器を配置し、この洗浄容器の内部を被
洗浄物の収容部としたことを特徴とする。According to a fourth aspect of the present invention, in any one of the first to third aspects, below the cooling means of the descending flow path, there is provided a cleaning container in which the fluid cooled by the cooling means stays inside and overflows. The cleaning container is arranged, and the inside of the cleaning container is used as a housing portion for the object to be cleaned.
【0015】請求項4の発明では、洗浄容器内に常に冷
却されて高密度になった流体を滞留させておくことがで
きるので、被洗浄物に対する十分な接触時間を確保する
ことができ、洗浄能力のアップが図れる。According to the fourth aspect of the present invention, since the fluid that has been constantly cooled and has a high density can be retained in the cleaning container, a sufficient contact time with the object to be cleaned can be ensured and the cleaning can be performed. The ability can be improved.
【0016】請求項5の発明は、請求項3または4にお
いて、前記被洗浄物の収容部の周囲を断熱材で覆ったこ
とを特徴とする。The invention of claim 5 is characterized in that, in claim 3 or 4, the periphery of the accommodation portion of the object to be cleaned is covered with a heat insulating material.
【0017】請求項5の発明では、断熱材により被洗浄
物の収容部を囲ったので、被洗浄物に接触する流体の温
度を一定に保っておくことができ、高い循環能力を保持
し、洗浄効率のアップが図れる。According to the fifth aspect of the present invention, since the accommodation portion of the article to be cleaned is surrounded by the heat insulating material, the temperature of the fluid in contact with the article to be cleaned can be kept constant, and high circulation ability can be maintained. Cleaning efficiency can be improved.
【0018】請求項6の発明では、請求項1〜5のいず
れかにおいて、前記洗浄流体として亜臨界状態の流体を
使用すると共に、洗浄槽に前記流体の液位を検出する液
位計を設けたことを特徴とする。According to a sixth aspect of the present invention, in any one of the first to fifth aspects, a subcritical fluid is used as the cleaning fluid, and a cleaning tank is provided with a liquid level gauge for detecting the liquid level of the fluid. It is characterized by that.
【0019】請求項6の発明では、亜臨界状態の流体を
洗浄流体として使用するので、冷却により液体になった
流体を被洗浄物に接触させて汚染物を液体中に有効に溶
解させることができると共に、加熱により低密度化する
ときに、溶解していた汚染物を有効に分離することがで
きる。従って、溶解と分離による汚染物抽出作用の促進
が図れる。また、液位計を設けたことで、所定量の亜臨
界流体を洗浄に使用することができる。According to the sixth aspect of the invention, since the fluid in the subcritical state is used as the cleaning fluid, it is possible to bring the fluid which has become liquid by cooling into contact with the object to be cleaned to effectively dissolve the contaminants in the liquid. At the same time, the dissolved contaminants can be effectively separated when the density is reduced by heating. Therefore, the action of extracting contaminants by dissolution and separation can be promoted. Further, by providing the liquid level meter, a predetermined amount of subcritical fluid can be used for cleaning.
【0020】請求項7の発明は、請求項1〜6のいずれ
かにおいて、前記流体としてCO2、亜酸化窒素または
SF6 を使用することを特徴とする。The invention of claim 7 is characterized in that, in any one of claims 1 to 6, CO 2 , nitrous oxide or SF 6 is used as the fluid.
【0021】[0021]
【発明の実施の形態】以下、本発明の実施形態を図面に
基づいて説明する。図1は超臨界状態のCO2 を洗浄流
体として使用する実施形態の洗浄装置の概略構成図であ
る。この洗浄装置は、気密に密閉された洗浄槽1内に被
洗浄物Wを収容し、洗浄槽1内で被洗浄物Wに超臨界C
O2 を接触させることにより、被洗浄物Wに付着または
含浸した汚染物を抽出除去するものであり、洗浄槽1内
の上部に冷却手段としての冷却コイル2、下部に加熱手
段としての加熱コイル3を設けることで洗浄槽1内に対
流を起こさせるようにしている点に特徴を有する。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic configuration diagram of a cleaning device of an embodiment using CO 2 in a supercritical state as a cleaning fluid. This cleaning device accommodates an object W to be cleaned in a cleaning tank 1 which is hermetically sealed, and supercritical C is applied to the object W to be cleaned in the cleaning tank 1.
By contacting with O 2 , the contaminants adhering to or impregnated with the object to be cleaned W are extracted and removed. The cooling coil 2 as a cooling means is provided in the upper part of the cleaning tank 1, and the heating coil as a heating device is provided in the lower part. 3 is provided so that convection is caused in the cleaning tank 1.
【0022】洗浄槽1の内部には、内側を下降流路4、
外側を上昇流路5とした循環流路を構成する筒壁(仕切
部材)10が、洗浄槽1の内壁と同心に配されている。
この筒壁10は、上部が大径部11として構成され、下
部が小径部12として構成された段付きのもので、上側
の大径部11の内部が、被洗浄物Wの収納部7となって
いる。また、大径部11の上部にはガイド筒13が連設
され、そのガイド筒13の内周に冷却コイル2が挿入さ
れている。この洗浄槽1は、上蓋(図示略)開閉式のも
ので、上蓋に冷却コイル2が一体に設けられている。ま
た、加熱コイル3は、小径部12の外周に確保された余
裕のあるスペースに配置されている。これにより上昇流
路5の下部に加熱コイル3が位置し、下降流路4の上部
に冷却コイル2が位置している。Inside the washing tank 1, the inside is a descending flow path 4,
A cylindrical wall (partitioning member) 10 that forms a circulation flow path with the outside as the upward flow path 5 is arranged concentrically with the inner wall of the cleaning tank 1.
The cylindrical wall 10 has a stepped structure in which an upper portion is configured as a large diameter portion 11 and a lower portion is configured as a small diameter portion 12, and the inside of the upper large diameter portion 11 serves as a storage portion 7 for the article W to be cleaned. Has become. Further, a guide cylinder 13 is continuously provided above the large-diameter portion 11, and the cooling coil 2 is inserted into the inner circumference of the guide cylinder 13. The cleaning tank 1 is of an openable / closable type with an upper lid (not shown), and a cooling coil 2 is integrally provided on the upper lid. In addition, the heating coil 3 is arranged in a space that is secured around the outer circumference of the small diameter portion 12. As a result, the heating coil 3 is located below the ascending flow path 5, and the cooling coil 2 is located above the descending flow path 4.
【0023】筒壁10の小径部12の下端は、洗浄槽1
の下部に確保された汚染物の滞留部8に届く位置まで延
ばされており、この滞留部8まで下降した流体が、向き
を反転させて加熱コイル3で加熱され、低密度化して上
昇するようになっている。なお、下降流路4を画成する
筒壁10には、その外周の上昇流路5との断熱を図るた
めの断熱材18が設けられている。断熱材18は、少な
くとも被洗浄物Wの収納部7を囲むように設けられてい
る。The lower end of the small diameter portion 12 of the cylinder wall 10 is the cleaning tank 1
Is extended to a position where it reaches the retention part 8 of the contaminants secured in the lower part of the container, and the fluid descending to the retention part 8 is heated in the heating coil 3 by reversing its direction, and the density is lowered to rise. It is like this. A heat insulating material 18 is provided on the cylindrical wall 10 defining the descending flow path 4 to insulate it from the ascending flow path 5 on the outer periphery thereof. The heat insulating material 18 is provided so as to surround at least the storage portion 7 for the article W to be cleaned.
【0024】筒壁10の大径部11の内部には、大径部
11の内壁との間に流路を確保した状態で、有底円筒状
の洗浄容器15が収容されている。この洗浄容器15
は、冷却コイル2の下側に位置しており、冷却コイル2
によって冷却された流体が内部に滞留した後、上縁部か
らオーバーフローして、筒壁10の内面を伝わって小径
部12に流れる落ちるように配置されている。そして、
この洗浄容器15の内部に、底部中央に流出孔17を有
する有底円筒状の洗浄内容器16が配置され、洗浄内容
器16の中に被洗浄物Wが収容されるようになってい
る。洗浄槽1に対して被洗浄物Wを出し入れする場合
は、洗浄容器15ごと出し入れする。Inside the large diameter portion 11 of the cylindrical wall 10, a bottomed cylindrical cleaning container 15 is accommodated in a state where a flow path is secured between the large diameter portion 11 and the inner wall of the large diameter portion 11. This cleaning container 15
Is located below the cooling coil 2 and
It is arranged so that the fluid cooled by is retained inside, overflows from the upper edge portion, flows along the inner surface of the cylindrical wall 10 and flows to the small diameter portion 12. And
Inside the cleaning container 15, a bottomed cylindrical inner cleaning container 16 having an outflow hole 17 at the center of the bottom is arranged, and the object W to be cleaned is accommodated in the inner cleaning container 16. When the object W to be cleaned is taken in and out of the cleaning tank 1, the cleaning container 15 is put in and taken out.
【0025】また、この洗浄槽1の胴部には、超臨界C
O2 を導入するための導入ライン20が、バルブ21を
介して接続されている。Further, the supercritical C
An introduction line 20 for introducing O 2 is connected via a valve 21.
【0026】次に作用を説明する。被洗浄物Wを超臨界
CO2 で洗浄する場合には、まず、洗浄槽1内の中央の
筒壁10の大径部11内に洗浄容器15を設置し、被洗
浄物Wをその中に入れる。次に、上蓋を閉じて洗浄槽1
を密閉した状態にし、洗浄槽1内にバルブ21を介して
CO2 を供給し、超臨界状態となる所定の温度圧力(温
度31℃以上、圧力70kg/cm2 以上)に維持す
る。Next, the operation will be described. When cleaning the object W to be cleaned with supercritical CO 2 , first, the cleaning container 15 is installed in the large diameter portion 11 of the central cylindrical wall 10 in the cleaning tank 1, and the object W to be cleaned is placed therein. Put in. Next, close the top lid and wash tank 1
Is closed and CO 2 is supplied into the cleaning tank 1 through the valve 21 to maintain a predetermined temperature and pressure (temperature 31 ° C. or higher, pressure 70 kg / cm 2 or higher) that results in a supercritical state.
【0027】次いで、加熱コイル3により洗浄槽1の下
部を加熱し、冷却コイル2により洗浄槽1の上部を冷却
して、洗浄槽1の内部に温度分布を形成し、図2に矢印
で示すような、対流による自然循環を生じさせる。この
場合、加熱コイル3により加熱されたCO2 は、密度の
減少(約0.1〜0.46くらい)により洗浄槽1の上
部に上昇し、上昇したCO2 は冷却コイル2によって冷
やされ、密度の増加(密度0.46〜0.85くらい)
によりその下側の洗浄容器15に流れ落ちる。例えば、
洗浄槽1内の圧力を100kg/cm2 とした場合、下
部を200℃、上部を40℃とすると、下部は0.12
g/cm3 、上部はO.8g/cm3 となる。これは、
超臨界状態のCO2 の密度が、図6に示すような温度依
存性を持つことから割り出される。図2において、C
は、密度0.8(圧力100kg/cm2 時、温度40
℃)のCO2 高密度領域、Hは、密度0.12(圧力1
00kg/cm2 時、温度200℃)のCO2 低密度領
域を示す。Next, the heating coil 3 heats the lower part of the cleaning tank 1 and the cooling coil 2 cools the upper part of the cleaning tank 1 to form a temperature distribution inside the cleaning tank 1, as shown by the arrow in FIG. It causes natural circulation by convection. In this case, the CO 2 heated by the heating coil 3 rises to the upper part of the cleaning tank 1 due to the decrease in density (about 0.1 to 0.46), and the elevated CO 2 is cooled by the cooling coil 2. Increased density (density 0.46-0.85)
Thus, it flows down into the cleaning container 15 below. For example,
If the pressure in the cleaning tank 1 is 100 kg / cm 2 , the lower part is 200 ° C. and the upper part is 40 ° C.
g / cm 3 , the upper part is O. It becomes 8 g / cm 3 . this is,
It can be determined that the density of CO 2 in the supercritical state has temperature dependence as shown in FIG. In FIG. 2, C
Has a density of 0.8 (at a pressure of 100 kg / cm 2 and a temperature of 40
C) high density region of CO 2 , H has a density of 0.12 (pressure 1
CO 2 low density region of 00 kg / cm 2 at a temperature of 200 ° C.).
【0028】洗浄容器15内では、高密度CO2 が次々
に流入するため、被洗浄物Wに付着あるいは含浸してい
る汚染物(有機性物質)がCO2 に効率よく溶解し、被
洗浄物Wの洗浄が行われる。また、CO2 による洗浄効
果を増すため、洗浄容器15内に高密度CO2 を滞留す
る構造になっているため、一定量のCO2 が常に被洗浄
物Wに接し、高効率の洗浄が行われる。そして、洗浄後
のCO2 はオーバフローし、小径部12を通って洗浄槽
1の下部に落下する。従って、被洗浄物Wは常にフレッ
シュなCO2 によって洗浄される。Since high-density CO 2 flows into the cleaning container 15 one after another, contaminants (organic substances) adhering to or impregnating the object to be cleaned W are efficiently dissolved in CO 2 and the object to be cleaned is W cleaning is performed. Moreover, to increase the cleaning effect of the CO 2, since that is a structure in which residence dense CO 2 in the cleaning vessel 15, a certain amount of CO 2 is in contact at all times to the object to be cleaned W, the washing of the high efficiency line Be seen. Then, the CO 2 after cleaning overflows and falls through the small diameter portion 12 to the lower part of the cleaning tank 1. Therefore, the object W to be cleaned is always cleaned with fresh CO 2 .
【0029】洗浄槽1の下部に流れ落ちたCO2 は、洗
浄槽1の下部で加熱コイル3により加熱される。この
時、CO2 の密度は流体温度の上昇とともに減少するた
め、汚染物とCO2 が分離されることになる。分離した
汚染物は、洗浄槽1の下部の滞留部8に溜まり、加熱さ
れたCO2 は再度洗浄槽1の上部に流れる。洗浄槽1の
下部に溜まった汚染物は、必要に応じて適宜抜き出す。
そして、所定時間後、加熱と冷却を停止し、洗浄槽1内
を減圧して、被洗浄物Wを取り出す。The CO 2 flowing down to the lower part of the cleaning tank 1 is heated by the heating coil 3 in the lower part of the cleaning tank 1. At this time, the density of CO 2 decreases as the fluid temperature rises, so that contaminants and CO 2 are separated. The separated contaminants accumulate in the retention part 8 at the bottom of the cleaning tank 1, and the heated CO 2 flows to the upper part of the cleaning tank 1 again. The contaminants accumulated in the lower part of the cleaning tank 1 are appropriately extracted as needed.
Then, after a predetermined time, heating and cooling are stopped, the inside of the cleaning tank 1 is decompressed, and the object W to be cleaned is taken out.
【0030】このように、洗浄槽1の上部に冷却コイル
2、下部に加熱コイル3を配置して上下で温度差を持た
せるようにしているので、CO2 流体の循環効率が高く
なって洗浄能力が向上する。また、冷却コイル2の直下
に被洗浄物Wを配置しているので、高密度のCO2 を直
接被洗浄物Wに接触させることができる。また、洗浄槽
1の下部の加熱コイル3でCO2 を加熱し密度を低下さ
せるので、CO2 流体中に溶解していた汚染物を、洗浄
槽1の下部で効率良く分離することができ、汚染物が分
離された流体を再び循環させることができて、洗浄能力
のアップが図れる。As described above, since the cooling coil 2 is arranged above the cleaning tank 1 and the heating coil 3 is arranged below the cleaning tank 1, the temperature difference between the cooling coil 2 and the cooling coil 2 is increased so that the circulation efficiency of the CO 2 fluid is increased and the cleaning is performed. Ability is improved. Further, since the object W to be cleaned is arranged immediately below the cooling coil 2, high-density CO 2 can be brought into direct contact with the object W to be cleaned. Further, since CO 2 is heated by the heating coil 3 in the lower part of the cleaning tank 1 to reduce the density, the contaminants dissolved in the CO 2 fluid can be efficiently separated in the lower part of the cleaning tank 1, The fluid from which the contaminants have been separated can be circulated again, and the cleaning ability can be improved.
【0031】また、上部を大径、下部を小径とした段付
き筒壁10で上昇流路5と下降流路4を画成しているの
で、上昇流と下降流の接触による循環ロスを軽減できる
上、大径部11の内部及び洗浄容器15の内部に、冷却
されて高密度となった流体を滞留させることができ、被
洗浄物Wに対する十分な接触時間を確保することができ
て、洗浄能力のアップが図れる。また、断熱材18で被
洗浄物Wの収容部7を囲っているので、被洗浄物Wに接
触するCO2 流体の温度を一定に保っておくことがで
き、洗浄効率のアップが図れる。Further, since the ascending flow path 5 and the descending flow path 4 are defined by the stepped cylindrical wall 10 with the upper part having a large diameter and the lower part having a small diameter, the circulation loss due to the contact between the ascending flow and the descending flow is reduced. In addition, it is possible to retain the cooled and high-density fluid inside the large-diameter portion 11 and inside the cleaning container 15, and to secure a sufficient contact time with the object W to be cleaned. The cleaning ability can be improved. Further, since the heat insulating material 18 surrounds the accommodation portion 7 for the article to be cleaned W, the temperature of the CO 2 fluid in contact with the article to be cleaned W can be kept constant, and the cleaning efficiency can be improved.
【0032】また、洗浄槽1の上部と下部に冷却コイル
2と加熱コイル3を分けて配置しているから、上部の冷
却コイル2を洗浄槽1の上蓋に一体化させて構成するこ
とができ、冷却コイル2を一緒に上蓋と取り外すこと
で、被洗浄物Wを簡単に洗浄槽1に対し出し入れするこ
とができ、作業性の向上が図れる。Further, since the cooling coil 2 and the heating coil 3 are separately arranged on the upper and lower portions of the cleaning tank 1, the upper cooling coil 2 can be integrated with the upper lid of the cleaning tank 1. By removing the cooling coil 2 together with the upper lid, the object to be cleaned W can be easily put in and taken out from the cleaning tank 1, and the workability can be improved.
【0033】図3はこの洗浄槽1を中心に備えた洗浄シ
ステムの構成図である。この洗浄システムは、CO2 貯
槽31、ポンプ32、CO2 供給槽33、圧力計34、
加熱器35、洗浄槽1、バルブ21を備えたCO2 導入
ライン20、洗浄槽1の下部の滞留部8から洗浄後のC
O2 を導出するバルブ42付きのCO2導出ライン4
1、導出ライン41にて導かれた洗浄済CO2 から汚染
物を分離するCO2 フラッシュ槽(気液分離槽)43、
冷却器46を介してCO2 をリサイクルする戻りライン
45、CO2 フラッシュ槽43で分離した汚染物を回収
する有機物回収槽44とを備えている。FIG. 3 is a block diagram of a cleaning system provided mainly with the cleaning tank 1. This cleaning system includes a CO 2 storage tank 31, a pump 32, a CO 2 supply tank 33, a pressure gauge 34,
From the heater 35, the cleaning tank 1, the CO 2 introduction line 20 equipped with the valve 21, the retention section 8 in the lower part of the cleaning tank 1 to C after cleaning
CO 2 discharge line 4 with valve 42 for discharging O 2
1. A CO 2 flash tank (gas-liquid separation tank) 43 for separating contaminants from the washed CO 2 guided by the discharge line 41,
A return line 45 for recycling CO 2 via a cooler 46 and an organic substance recovery tank 44 for recovering the contaminants separated in the CO 2 flash tank 43 are provided.
【0034】このシステムでは、CO2 貯槽31からポ
ンプ32及び加熱器35を介してCO2 供給槽33にC
O2 を供給する。ここで、CO2 供給槽33は、洗浄槽
1と同じ温度圧力条件とする。洗浄作業を実施する場合
は、CO2 供給槽33からバルブ21を介して、洗浄槽
1に超臨界CO2 を導入する。そして、前述したよう
に、洗浄槽1を所定の条件に維持して洗浄を行う。In this system, C 2 is supplied from the CO 2 storage tank 31 to the CO 2 supply tank 33 via the pump 32 and the heater 35.
Supply O 2 . Here, the CO 2 supply tank 33 is under the same temperature and pressure conditions as the cleaning tank 1. When carrying out the cleaning operation, supercritical CO 2 is introduced into the cleaning tank 1 from the CO 2 supply tank 33 via the valve 21. Then, as described above, cleaning is performed while maintaining the cleaning tank 1 under a predetermined condition.
【0035】洗浄が終了したら、減圧バルブ42を介し
て洗浄済CO2 を取り出し、CO2フラッシュ槽43で
CO2 と有機物を分離する。そして、分離したCO2 は
冷却器46を通してCO2 貯槽31に送ってリサイクル
し、汚染物は有機物回収槽44に送る。When the washing is completed, the washed CO 2 is taken out through the pressure reducing valve 42, and the CO 2 flash tank 43 separates the CO 2 from the organic matter. Then, the separated CO 2 is sent to the CO 2 storage tank 31 for recycling through the cooler 46, and the contaminants are sent to the organic matter recovery tank 44.
【0036】次に、洗浄流体として亜臨界CO2 を使用
する場合の実施形態を説明する。図4に示すように、洗
浄装置の基本構成は超臨界CO2 を使用する装置と、液
位計25を付加した点以外まったく同じである。Next, an embodiment in which subcritical CO 2 is used as the cleaning fluid will be described. As shown in FIG. 4, the basic configuration of the cleaning device is exactly the same as the device using supercritical CO 2 except that a liquid level gauge 25 is added.
【0037】洗浄方法について説明すると、まず、洗浄
槽1内にバルブ21を介してCO2を供給し、所定の常
温圧力(圧力35〜75kg/cm2 )の亜臨界状態に
維持する。この時、液体CO2 と気体CO2 が2層で存
在するように、液位計25によってCO2 の供給量を調
整する。Explaining the cleaning method, first, CO 2 is supplied into the cleaning tank 1 through the valve 21 and is maintained in a subcritical state at a predetermined room temperature pressure (pressure 35 to 75 kg / cm 2 ). At this time, the supply amount of CO 2 is adjusted by the liquid level gauge 25 so that liquid CO 2 and gas CO 2 exist in two layers.
【0038】この状態で、加熱コイル3により洗浄槽1
の下部を加熱し、冷却コイル2により洗浄槽1の上部を
冷却して、洗浄槽1内に温度分布を形成し、対流を生じ
させる。亜臨界条件の洗浄では、洗浄槽1の下部はガス
CO2 、洗浄槽1の上部と洗浄容器15内は液CO2 と
なる。洗浄条件は下表1の通りである。In this state, the cleaning tank 1 is heated by the heating coil 3.
Is heated and the upper part of the cleaning tank 1 is cooled by the cooling coil 2 to form a temperature distribution in the cleaning tank 1 to generate convection. In the cleaning under the subcritical condition, the lower part of the cleaning tank 1 becomes gas CO 2 , and the upper part of the cleaning tank 1 and the inside of the cleaning container 15 become liquid CO 2 . The washing conditions are as shown in Table 1 below.
【0039】[0039]
【表1】 [Table 1]
【0040】例えば、CO2 充填条件が17℃、6MP
aの時、洗浄槽1は気液2相になっているが、洗浄槽1
の下部を加熱コイル3で加熱し27℃以上にしてガスC
O2とし、冷却コイル2で洗浄槽1の上部を17℃以下
に維持すると、洗浄槽1の内部で対流を生じ、洗浄容器
15内に液体CO2 が流れ込むようになる。このとき断
熱材18や図示しない冷却器等によって、洗浄容器15
は17以下℃に維持する。For example, the CO 2 filling condition is 17 ° C. and 6 MP
When it is a, the cleaning tank 1 is in a gas-liquid two phase, but the cleaning tank 1
The lower part of the gas is heated by the heating coil 3 and heated to 27 ° C or higher to gas C
When O 2 is used and the upper part of the cleaning tank 1 is maintained at 17 ° C. or lower by the cooling coil 2, convection occurs inside the cleaning tank 1 and the liquid CO 2 flows into the cleaning container 15. At this time, the cleaning container 15 is provided by the heat insulating material 18 and a cooler (not shown).
Is maintained below 17 ° C.
【0041】このような条件を維持することにより、洗
浄容器15内には液体CO2 が滞留することになるた
め、被洗浄物Wに付着した汚染物(有機物)はCO2 に
効率良く溶解して、被洗浄物Wの洗浄が行われる。By maintaining such conditions, the liquid CO 2 is retained in the cleaning container 15, so that the contaminants (organic substances) attached to the object W to be cleaned are efficiently dissolved in CO 2. Thus, the object W to be cleaned is cleaned.
【0042】洗浄容器15からオーバーフローした液体
CO2 は、小径部12を通って洗浄槽1の下部に落下
し、洗浄槽1の下部で加熱コイル3により再度加熱され
る。この時、液体CO2 はガスCO2 になるため、汚染
物(有機物)の溶解度が減少して、汚染物とCO2 が分
離されることになる。分離した汚染物は、洗浄槽1の下
部の滞留部8に溜まり、加熱されたガスCO2 は再度洗
浄槽1の上部に流れて行く。なお、洗浄槽1の下部の滞
留部8に溜まった汚染物は、必要に応じて適宜抜き出
す。そして、所定時間後、加熱と冷却を停止し、洗浄槽
1内を減圧して、被洗浄物Wを取り出す。The liquid CO 2 overflowing from the washing container 15 passes through the small diameter portion 12 and drops to the lower portion of the washing tank 1, and is heated again by the heating coil 3 in the lower portion of the washing tank 1. At this time, since liquid CO 2 becomes gas CO 2 , the solubility of the pollutant (organic matter) is reduced and the pollutant and CO 2 are separated. The separated contaminants are accumulated in the retention part 8 in the lower part of the cleaning tank 1, and the heated gas CO 2 flows to the upper part of the cleaning tank 1 again. Incidentally, the contaminants accumulated in the retention section 8 below the cleaning tank 1 are appropriately extracted as necessary. Then, after a predetermined time, heating and cooling are stopped, the inside of the cleaning tank 1 is decompressed, and the object W to be cleaned is taken out.
【0043】この洗浄装置では、超臨界及び亜臨界状態
の流体を洗浄流体として使用するので、冷却により高密
度になった流体を被洗浄物に接触させて汚染物を液体中
に有効に溶解させることができると共に、加熱により低
密度化するときに、溶解していた汚染物を有効に分離す
ることができ、高い洗浄効果を発揮することができる。In this cleaning apparatus, since fluids in the supercritical and subcritical states are used as cleaning fluids, the fluid having a high density due to cooling is brought into contact with the object to be cleaned to effectively dissolve contaminants in the liquid. In addition, the dissolved contaminants can be effectively separated when the density is lowered by heating, and a high cleaning effect can be exhibited.
【0044】なお、上記実施形態においては、超臨界流
体としてCO2 を用いた場合について説明したが、本発
明はこれに限定されるものではなく、亜酸化窒素、SF
6 、C2 H4 、C2 H6 、C3 H6 、CHClF2 、C
3 H8 、CCl2 F2 、NH 3 などの安定で、且つ、容
易に超臨界状態をつくることができると共に、臨界温度
が室温に近く、よって加熱操作が一層容易になる各種の
流体を好適に使用することができる。In the above embodiment, the supercritical flow
CO as the body2I explained about the case of using
Ming is not limited to this, nitrous oxide, SF
6, C2HFour, C2H6, C3H6, CHClF2, C
3H8, CCl2F2, NH 3Such as stable and
Supercritical state can be easily created, and the critical temperature
Is close to room temperature, which makes the heating operation easier.
A fluid can be preferably used.
【0045】[0045]
【発明の効果】以上説明したように、請求項1〜7の発
明によれば、洗浄槽の上部に冷却手段を配置し、下部に
加熱手段を配置しているので、流体の循環効率を高める
ことができる。また、冷却手段の下側に被洗浄物を配置
するようにし、洗浄槽の下部に汚染物の滞留部を設けた
ので、洗浄能力のアップが図れる。また、上部の冷却手
段を洗浄槽の上蓋に一体化させることができるので、被
洗浄物の出し入れの容易化を図ることができる。As described above, according to the inventions of claims 1 to 7, since the cooling means is arranged in the upper part of the cleaning tank and the heating means is arranged in the lower part, the circulation efficiency of the fluid is enhanced. be able to. Further, since the object to be cleaned is arranged below the cooling means and the contaminated part is provided in the lower part of the cleaning tank, the cleaning capacity can be improved. Further, since the upper cooling means can be integrated with the upper lid of the cleaning tank, it is possible to facilitate the loading and unloading of the object to be cleaned.
【0046】請求項2の発明によれば、洗浄槽の内部に
仕切部材を設けて循環流路の上昇流路と下降流路とを画
成しているので、上昇流と下降流の接触による循環ロス
を軽減でき、循環効率の向上による洗浄能力のアップが
図れる。According to the second aspect of the present invention, the partition member is provided inside the cleaning tank to define the ascending flow path and the descending flow path of the circulation flow path. Circulation loss can be reduced and cleaning efficiency can be improved by improving circulation efficiency.
【0047】請求項3の発明によれば、上部を大径、下
部を小径とした段付き筒壁で流路を仕切っているので、
大径部の内部に高密度の流体を滞留させることができ、
洗浄能力のアップが図れる。また、小径部の外側に加熱
手段を配置しているので、スペース的な余裕を持って加
熱手段を配備することができる。また、請求項4の発明
によれば、洗浄容器内に高密度の流体を滞留させておく
ことができるので、洗浄能力のアップが図れる。According to the third aspect of the present invention, since the flow path is partitioned by the stepped cylindrical wall having an upper portion having a large diameter and a lower portion having a small diameter,
High density fluid can be retained inside the large diameter part,
The cleaning ability can be improved. Further, since the heating means is arranged outside the small diameter portion, the heating means can be arranged with a space margin. Further, according to the invention of claim 4, since a high-density fluid can be retained in the cleaning container, the cleaning capacity can be improved.
【0048】請求項5の発明によれば、断熱材で被洗浄
物に接触する流体の温度を一定に保っておくことができ
るので、洗浄効率のアップが図れる。According to the fifth aspect of the present invention, since the temperature of the fluid that contacts the object to be cleaned can be kept constant by the heat insulating material, the cleaning efficiency can be improved.
【図1】本発明の第1実施形態の洗浄装置の構成図であ
る。FIG. 1 is a configuration diagram of a cleaning device according to a first embodiment of the present invention.
【図2】同洗浄装置の洗浄時の状態を示す図である。FIG. 2 is a diagram showing a state of the cleaning device during cleaning.
【図3】前記洗浄装置を備えた洗浄システムの構成図で
ある。FIG. 3 is a configuration diagram of a cleaning system including the cleaning device.
【図4】本発明の第2実施形態の洗浄装置の構成図であ
る。FIG. 4 is a configuration diagram of a cleaning device according to a second embodiment of the present invention.
【図5】同洗浄装置の洗浄時の状態を示す図である。FIG. 5 is a diagram showing a cleaning state of the cleaning apparatus.
【図6】超臨界CO2 の密度の温度依存性を示す特性図
である。FIG. 6 is a characteristic diagram showing the temperature dependence of the density of supercritical CO 2 .
1 洗浄槽 2 冷却コイル(冷却手段) 3 加熱コイル(加熱手段) 4 下降流路 5 上昇流路 7 被洗浄物の収容部 8 滞留部 10 筒壁 11 大径部 12 小径部 15 洗浄容器 18 断熱材 25 液位計 W 被洗浄物 1 cleaning tank 2 Cooling coil (cooling means) 3 heating coils (heating means) 4 descending channels 5 ascending channel 7 Storage area for objects to be cleaned 8 staying part 10 tube wall 11 Large diameter part 12 Small diameter part 15 Washing container 18 Insulation 25 level gauge W to be cleaned
───────────────────────────────────────────────────── フロントページの続き (72)発明者 畠山 耕 茨城県那珂郡那珂町向山1002−14 三菱マ テリアル株式会社総合研究所那珂研究セン ター内 (72)発明者 西村 建二 茨城県那珂郡那珂町向山1002−14 三菱マ テリアル株式会社総合研究所那珂研究セン ター内 Fターム(参考) 3B201 AA02 AA03 AB43 BB04 BB82 BB87 BB90 BB98 4D056 AB11 AC24 BA16 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Ko Hatakeyama 1002-14 Mukoyama, Naka-machi, Naka-gun, Ibaraki Prefecture Terari Co., Ltd. Inside (72) Inventor Kenji Nishimura 1002-14 Mukoyama, Naka-machi, Naka-gun, Ibaraki Prefecture Terari Co., Ltd. Inside F-term (reference) 3B201 AA02 AA03 AB43 BB04 BB82 BB87 BB90 BB98 4D056 AB11 AC24 BA16
Claims (7)
収容し、洗浄槽内で被洗浄物に超臨界または亜臨界状態
の洗浄用流体を接触させることにより、被洗浄物に付着
または含浸した汚染物を抽出除去する洗浄装置におい
て、 前記洗浄槽内の上部に冷却手段、下部に加熱手段を設け
ることで、対流によって前記流体が循環する循環流路を
形成し、この循環流路のうち下降流路の冷却手段の下側
に被洗浄物の収容部を確保すると共に、洗浄槽の下部
に、抽出した汚染物の滞留部を設けたことを特徴とする
洗浄装置。1. An object to be cleaned is housed in an airtightly sealed cleaning tank, and the cleaning fluid in the supercritical or subcritical state is brought into contact with the object to be cleaned in the cleaning tank to adhere to the object to be cleaned. Alternatively, in a cleaning device for extracting and removing impregnated contaminants, a cooling means is provided in an upper part of the cleaning tank, and a heating means is provided in a lower part of the cleaning tank to form a circulation flow path for circulating the fluid by convection. A cleaning device characterized in that a housing portion for the object to be cleaned is secured below the cooling means of the descending flow path, and a retaining portion for the extracted contaminants is provided below the cleaning tank.
仕切部材を設けることで、前記循環流路の上昇流路と下
降流路とを画成し、前記上昇流路の下部に加熱手段、前
記下降流路の上部に冷却手段をそれぞれ配置したことを
特徴とする請求項1に記載の洗浄装置。2. A partition member extending in the up-down direction is provided inside the cleaning tank to define an ascending flow path and a descending flow path of the circulation flow path, and heat the lower part of the ascending flow path. The cleaning device according to claim 1, wherein a cooling means and a cooling means are disposed above the descending channel.
を上昇流路とし、且つ、上部を大径、下部を小径とした
段付き筒壁で構成し、大径部の内部空間を被洗浄物の収
容部とし、小径部の外側に加熱手段を配置したことを特
徴とする請求項2に記載の洗浄装置。3. The partition member is constituted by a stepped cylinder wall having a downward flow passage on the inner side and an upward flow passage on the outer side, and an upper portion having a large diameter and a lower portion having a small diameter, and an internal space of the large diameter portion is formed. The cleaning device according to claim 2, wherein a heating means is disposed outside the small diameter portion as a housing portion for the object to be cleaned.
手段によって冷却された流体が内部に滞留した後オーバ
ーフローする洗浄容器を配置し、この洗浄容器の内部を
被洗浄物の収容部としたことを特徴とする請求項1〜3
のいずれかに記載の洗浄装置。4. A cleaning container is disposed below the cooling means of the descending flow path, and the fluid cooled by the cooling means accumulates therein and then overflows, and the inside of the cleaning container accommodates an object to be cleaned. 4. The method according to claim 1, wherein
The cleaning device according to any one of 1.
覆ったことを特徴とする請求項3または4に記載の洗浄
装置。5. The cleaning apparatus according to claim 3, wherein the housing of the object to be cleaned is covered with a heat insulating material.
使用すると共に、洗浄槽に前記流体の液位を検出する液
位計を設けたことを特徴とする請求項1〜5のいずれか
に記載の洗浄装置。6. A subcritical fluid is used as the cleaning fluid, and a liquid level gauge for detecting the liquid level of the fluid is provided in the cleaning tank. The cleaning device described.
たはSF6 を使用することを特徴とする請求項1〜6の
いずれかに記載の洗浄装置。7. The cleaning apparatus according to claim 1, wherein CO 2 , nitrous oxide, or SF 6 is used as the fluid.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001318450A JP2003117504A (en) | 2001-10-16 | 2001-10-16 | Cleaning device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001318450A JP2003117504A (en) | 2001-10-16 | 2001-10-16 | Cleaning device |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2003117504A true JP2003117504A (en) | 2003-04-22 |
Family
ID=19136150
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001318450A Pending JP2003117504A (en) | 2001-10-16 | 2001-10-16 | Cleaning device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2003117504A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005288388A (en) * | 2004-04-02 | 2005-10-20 | Showa Tansan Co Ltd | Gas-liquid separating device |
JP2006073752A (en) * | 2004-09-01 | 2006-03-16 | Fujitsu Ltd | Etching treatment device |
JP2011218352A (en) * | 2011-04-27 | 2011-11-04 | Showa Tansan Co Ltd | Gas-liquid separating device |
CN109939994A (en) * | 2019-04-17 | 2019-06-28 | 重庆工程职业技术学院 | Portable supersonic cleaning machine |
-
2001
- 2001-10-16 JP JP2001318450A patent/JP2003117504A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005288388A (en) * | 2004-04-02 | 2005-10-20 | Showa Tansan Co Ltd | Gas-liquid separating device |
JP2006073752A (en) * | 2004-09-01 | 2006-03-16 | Fujitsu Ltd | Etching treatment device |
JP4528065B2 (en) * | 2004-09-01 | 2010-08-18 | 富士通株式会社 | Etching processing equipment |
JP2011218352A (en) * | 2011-04-27 | 2011-11-04 | Showa Tansan Co Ltd | Gas-liquid separating device |
CN109939994A (en) * | 2019-04-17 | 2019-06-28 | 重庆工程职业技术学院 | Portable supersonic cleaning machine |
CN109939994B (en) * | 2019-04-17 | 2021-03-02 | 重庆工程职业技术学院 | Portable ultrasonic cleaning machine |
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