JP2003114522A5 - - Google Patents
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- Publication number
- JP2003114522A5 JP2003114522A5 JP2001307537A JP2001307537A JP2003114522A5 JP 2003114522 A5 JP2003114522 A5 JP 2003114522A5 JP 2001307537 A JP2001307537 A JP 2001307537A JP 2001307537 A JP2001307537 A JP 2001307537A JP 2003114522 A5 JP2003114522 A5 JP 2003114522A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- photosensitive composition
- positive photosensitive
- substituent
- composition according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 125000000217 alkyl group Chemical group 0.000 claims 6
- 239000002253 acid Substances 0.000 claims 4
- 125000001424 substituent group Chemical group 0.000 claims 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 3
- 239000003513 alkali Substances 0.000 claims 2
- 150000007514 bases Chemical class 0.000 claims 2
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 125000004442 acylamino group Chemical group 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 1
- 125000002877 alkyl aryl group Chemical group 0.000 claims 1
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims 1
- 150000001450 anions Chemical class 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 125000004432 carbon atoms Chemical group C* 0.000 claims 1
- 150000007942 carboxylates Chemical group 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 238000004090 dissolution Methods 0.000 claims 1
- 230000000694 effects Effects 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxyl anion Chemical group [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims 1
- 125000002883 imidazolyl group Chemical group 0.000 claims 1
- 230000002401 inhibitory effect Effects 0.000 claims 1
- 125000000686 lactone group Chemical group 0.000 claims 1
- 125000005647 linker group Chemical group 0.000 claims 1
- 125000002950 monocyclic group Chemical group 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 230000000269 nucleophilic Effects 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 150000003384 small molecules Chemical class 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- 150000003568 thioethers Chemical class 0.000 claims 1
- 125000005270 trialkylamine group Chemical group 0.000 claims 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001307537A JP3827290B2 (ja) | 2001-10-03 | 2001-10-03 | ポジ型感光性組成物 |
| KR1020020059948A KR100879252B1 (ko) | 2001-10-03 | 2002-10-01 | 포지티브 감광성 조성물 |
| EP02022234A EP1300727A3 (en) | 2001-10-03 | 2002-10-02 | Positive photosensitive composition |
| US10/261,655 US6830867B2 (en) | 2001-10-03 | 2002-10-02 | Positive photosensitive composition |
| TW091122794A TWI255965B (en) | 2001-10-03 | 2002-10-03 | Positive photosensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001307537A JP3827290B2 (ja) | 2001-10-03 | 2001-10-03 | ポジ型感光性組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003114522A JP2003114522A (ja) | 2003-04-18 |
| JP2003114522A5 true JP2003114522A5 (US07494231-20090224-C00006.png) | 2005-04-07 |
| JP3827290B2 JP3827290B2 (ja) | 2006-09-27 |
Family
ID=19126985
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001307537A Expired - Fee Related JP3827290B2 (ja) | 2001-10-03 | 2001-10-03 | ポジ型感光性組成物 |
Country Status (5)
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4637476B2 (ja) * | 2002-12-19 | 2011-02-23 | 東京応化工業株式会社 | ホトレジスト組成物の製造方法 |
| JP2005084240A (ja) | 2003-09-05 | 2005-03-31 | Fuji Photo Film Co Ltd | 感刺激性組成物、化合物及び感刺激性組成物を用いたパターン形成方法 |
| US7488565B2 (en) * | 2003-10-01 | 2009-02-10 | Chevron U.S.A. Inc. | Photoresist compositions comprising diamondoid derivatives |
| JP4393910B2 (ja) * | 2004-04-08 | 2010-01-06 | 東京応化工業株式会社 | ホトレジスト組成物の製造方法、ろ過装置、塗布装置及びホトレジスト組成物 |
| JP4557159B2 (ja) * | 2004-04-15 | 2010-10-06 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト材料及びこれを用いたパターン形成方法 |
| US7167106B2 (en) * | 2004-04-15 | 2007-01-23 | 3M Innovative Properties Company | Methods and systems utilizing a programmable sign display located in proximity to a traffic light |
| US7509600B2 (en) * | 2004-04-22 | 2009-03-24 | Janusz Rajski | Generating test patterns having enhanced coverage of untargeted defects |
| JP4533660B2 (ja) * | 2004-05-14 | 2010-09-01 | 富士フイルム株式会社 | ポジ型感光性組成物及びそれを用いたパターン形成方法 |
| US7169532B2 (en) * | 2004-12-29 | 2007-01-30 | Tokyo Ohka Kogyo Co., Ltd. | Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
| US7951522B2 (en) * | 2004-12-29 | 2011-05-31 | Tokyo Ohka Kogyo Co., Ltd. | Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
| US7927778B2 (en) * | 2004-12-29 | 2011-04-19 | Tokyo Ohka Kogyo Co., Ltd. | Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
| JP4796792B2 (ja) * | 2005-06-28 | 2011-10-19 | 富士フイルム株式会社 | ポジ型感光性組成物及びそれを用いたパターン形成方法 |
| JP4786238B2 (ja) * | 2005-07-19 | 2011-10-05 | 東京応化工業株式会社 | レジスト組成物の製造方法、ろ過装置、レジスト組成物の塗布装置 |
| EP1806621A1 (en) * | 2006-01-08 | 2007-07-11 | Rohm and Haas Electronic Materials LLC | Coating compositions for photoresists |
| JP4623324B2 (ja) | 2008-03-18 | 2011-02-02 | 信越化学工業株式会社 | 水酸基を有する単量体、高分子化合物、レジスト材料及びパターン形成方法 |
| JP5947053B2 (ja) | 2011-02-25 | 2016-07-06 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| JP6013799B2 (ja) | 2011-07-19 | 2016-10-25 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| TWI659046B (zh) | 2015-05-06 | 2019-05-11 | Sumitomo Bakelite Co., Ltd. | 作爲永久介電材料的順丁烯二醯亞胺及環烯烴單體之聚合物 |
| JP6764678B2 (ja) * | 2015-05-11 | 2020-10-07 | 住友化学株式会社 | 化合物、樹脂、レジスト組成物及びレジストパターンの製造方法 |
| TWI731961B (zh) * | 2016-04-19 | 2021-07-01 | 德商馬克專利公司 | 正向感光材料及形成正向凸紋影像之方法 |
| JP7066573B2 (ja) * | 2017-09-15 | 2022-05-13 | 住友化学株式会社 | 塩、レジスト組成物及びレジストパターンの製造方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69821049T2 (de) | 1997-05-09 | 2004-10-21 | Fuji Photo Film Co Ltd | Positiv arbeitende lichtempfindliche Zusammensetzung |
| KR100574257B1 (ko) | 1998-07-27 | 2006-04-27 | 후지 샤신 필름 가부시기가이샤 | 포지티브 감광성 조성물 |
| JP4131062B2 (ja) * | 1998-09-25 | 2008-08-13 | 信越化学工業株式会社 | 新規なラクトン含有化合物、高分子化合物、レジスト材料及びパターン形成方法 |
| JP3963602B2 (ja) | 1999-01-27 | 2007-08-22 | 富士フイルム株式会社 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| JP4124907B2 (ja) | 1999-04-06 | 2008-07-23 | 東京応化工業株式会社 | ポジ型レジスト組成物 |
| JP4562829B2 (ja) * | 1999-09-01 | 2010-10-13 | ダイセル化学工業株式会社 | ４−オキサトリシクロ［４．３．１．１３，８］ウンデカン−５−オン誘導体 |
| TWI227377B (en) | 1999-10-06 | 2005-02-01 | Fuji Photo Film Co Ltd | Positive-type resist composition |
| TW565746B (en) | 1999-10-29 | 2003-12-11 | Fuji Photo Film Co Ltd | Positive-type photoresist composition |
| DE10054550A1 (de) | 1999-11-01 | 2001-05-31 | Nec Corp | Sulfoniumsalz-Verbindung, Photoresist-Zusammensetzung und Verfahren zur Muster-/Strukturerzeugung unter Verwendung derselben |
| JP3948506B2 (ja) * | 1999-11-11 | 2007-07-25 | 富士フイルム株式会社 | ポジ型フォトレジスト組成物 |
| JP2001235865A (ja) * | 2000-02-23 | 2001-08-31 | Fuji Photo Film Co Ltd | ポジ型フォトレジスト組成物 |
| KR100795109B1 (ko) | 2001-02-23 | 2008-01-17 | 후지필름 가부시키가이샤 | 포지티브 감광성 조성물 |
| TWI272452B (en) | 2001-06-12 | 2007-02-01 | Fuji Photo Film Co Ltd | Positive resist composition |
| JP4025074B2 (ja) | 2001-09-19 | 2007-12-19 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
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2001
- 2001-10-03 JP JP2001307537A patent/JP3827290B2/ja not_active Expired - Fee Related
-
2002
- 2002-10-01 KR KR1020020059948A patent/KR100879252B1/ko not_active IP Right Cessation
- 2002-10-02 EP EP02022234A patent/EP1300727A3/en not_active Withdrawn
- 2002-10-02 US US10/261,655 patent/US6830867B2/en not_active Expired - Fee Related
- 2002-10-03 TW TW091122794A patent/TWI255965B/zh not_active IP Right Cessation
