JP2003098339A - Method for manufacturing filter for display - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for manufacturing a filter for a display with a silver thin film layer in which no flocculation in the silver thin film layer takes place. SOLUTION: The method for manufacturing the filter for the display consists of: a step to form an electrode (F) containing a metal on a transparent stacked body (E) comprising a transparent substrate (A) with a transparent conductive thin film layer (D) formed on the principal surface thereof; a step to form a transparent protective film (G); and a step to form a supporting body (H) on the other principal surface of the transparent substrate (A). The step to form the transparent protective film (G) is carried out first.

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to a method for manufacturing a filter for a display. More specifically, the present invention relates to a method for manufacturing a display filter used for the purpose of shielding electromagnetic waves generated from a display such as a plasma display (PDP), a cathode ray tube (CRT), a liquid crystal display (LCD), or the like.

[0002]

2. Description of the Related Art In recent years, society has become highly informed. Along with this, the technology for information-related equipment and related parts has significantly advanced and spread.

Among them, the display device is used for providing various information such as a television, a personal computer, a guidance display at a station or an airport. Various characteristics have come to be required for display devices in order to use them for various purposes. Among them, particularly large size and thin type are required, and the plasma display has come to be particularly noticed, and in addition to the display for business use, it is also used for general household use. Came. However, the plasma display (hereinafter referred to as PDP) has a problem that a strong leakage electromagnetic field and near-infrared light are generated due to its principle problem. Therefore, the PDP uses a filter (electromagnetic wave filter) for blocking the leakage electromagnetic field and the near infrared light.

At present, the materials for shielding near infrared rays and electromagnetic fields of electromagnetic wave filters are roughly classified into i) a combination of a metal mesh, a synthetic resin or a mesh of metal fibers coated with a metal, and a dye absorbing near infrared rays. Ii) There is a combination of a transparent conductive thin film in which a transparent conductive thin film and a metal thin film are laminated, and (in some cases) a dye that absorbs near infrared rays.

In particular, the examples are particularly preferable because they do not generate a light-shielding portion due to a mesh or moire as compared with the former and have high transparency. However, when the transparent conductive thin film of ii) is used, the problem of environmental resistance arises. That is, there has been a problem that a reflective defect is generated due to deterioration and aggregation of the silver thin film layer forming the transparent conductive thin film layer. When the diameter of the agglomerated portion of the silver thin film layer is about 0.3 mm, it can be visually confirmed as a discolored portion of reflection. In particular, it becomes remarkable when the display is turned off. In order to solve such a problem, for example, Japanese Patent Publication Sho 59
It has been proposed to improve durability by alloying a silver thin film layer into a gold-silver thin film layer as disclosed in Japanese Patent Publication No. 44993. However, it is known that alloying increases the surface resistivity of the silver thin film layer and extremely reduces the electromagnetic wave shielding ability. Therefore, even if alloying is performed, the proportion of metals other than silver that can be added is necessarily limited due to the problem of surface resistivity. As a result, the durability is significantly improved as compared with the case of using silver alone, but it cannot be said that the durability is sufficient for practical use. Also,
It is possible to prevent deterioration of the silver thin film layer by protecting the peripheral edge of the transparent conductive thin film layer to some extent, but this is not always sufficient and there is a problem that deterioration occurs from other than the peripheral edge. . Further, by forming a low moisture-permeable transparent protective layer on the transparent conductive thin film, deterioration and aggregation of the silver thin film layer can be suppressed to some extent, but it cannot be said to be sufficient. Aggregation is observed.

[0006]

SUMMARY OF THE INVENTION It is an object of the present invention to provide a method for manufacturing a display filter having no reflective discoloration portion.

[0007]

Means for Solving the Problems As a result of intensive investigations by the present inventors in order to solve the above-mentioned problems, as a result, the reflective discolored portion is caused by the aggregation of the silver thin film layer, The inventors have found that the floating foreign matter in the air in the room adheres to the transparent conductive thin film, and the adhered floating foreign matter serves as a starting point to generate a reflective discoloration portion, thus completing the present invention. That is, the present invention comprises (1) forming a metal-containing electrode (F) on a transparent laminate (E) in which a transparent conductive thin film layer (D) is formed on one main surface of a transparent substrate (A). A method for producing a filter for a display, which comprises a step, a step of forming a transparent protective film (G), and a step of forming a support (H) on the other main surface of the transparent substrate (A). A method for producing a filter for a display, which comprises first performing the step of forming (G). (2) The transparent conductive thin film layer (D) is a combination of the high refractive index thin film layer (B) and silver or a metal thin film layer containing silver (C) (B) / (C) twice or more as a repeating unit. It is repeatedly laminated, and a high refractive index thin film layer (B) is further formed thereon.
The method for producing a filter for a display according to (1), characterized in that the filter for display is laminated. (3) The electrode (F) is on the transparent conductive thin film layer (D), and
The method for producing a filter for a display according to (1) or (2), characterized in that the transparent conductive thin film layer (D) is formed at a peripheral edge portion. (4) The transparent protective film (G) is attached to a portion of the transparent conductive thin film layer (D) where the electrode (F) is not formed with an adhesive or an adhesive (1) to ( 3) A method for manufacturing a display filter according to any one of the above. (5) The method for producing a display filter according to any one of (1) to (4), wherein the support (H) is attached to the transparent substrate (A). Regarding

[0008]

BEST MODE FOR CARRYING OUT THE INVENTION A glass plate or transparent plastic can be used as the transparent substrate (A), but a transparent plastic film is preferred in the present invention.

The transparent plastic film is not particularly limited as long as it is transparent, but for example, polyethylene terephthalate, polyether sulfone, polyethylene naphthalate, polyarylate, polyacrylate, polycarbonate, polyether ether ketone, polyacetyl cellulose, polyethylene, Homopolymer such as polyester, polypropylene, polyamide, polyimide,
And a polymer film made of a copolymer of these resins.

As a method for forming the transparent plastic film, a known method for producing a plastic film such as a melt extrusion method, a casting method or a calendering method can be used. The total light transmittance of the transparent plastic film is 70
% Or more, more preferably 75% or more, and most preferably 80% or more.
However, this is not the case when the chromaticity correction layer is formed as described later. The total light transmittance of these transparent plastic films generally does not exceed 92%. However, it is possible to exceed the above value by forming an antireflection layer or the like to increase the light transmittance. The transparent conductive thin film layer (D) used in the present invention described below is
Since it is colored, the original color of the display may be impaired, and the entire screen may have an undesired color tone.
For the purpose of preventing the influence of the coloring of the transparent conductive thin film layer (D), it is possible to knead a dye into a transparent plastic in a range satisfying the above-mentioned characteristics or to color it into a preferable color by using a method such as coating. Is.

The thickness of the transparent plastic film is not particularly limited, but is 25 μm from the viewpoint of handleability.
m to 250 μm is preferable. Further, for the purpose of improving the adhesiveness with the transparent conductive thin film layer (D), the adhesiveness of, for example, an aqueous polyurethane-based or silicon-based coating agent is improved on the surface on which the transparent conductive thin film layer (D) is formed. It is also possible to form a base layer for this. The transparent conductive thin film layer (D) in the present invention preferably comprises a high refractive index thin film layer (B) and a silver or metal thin film layer (C) containing silver. A multilayer thin film in which a metal such as silver and a high-refractive-index thin film are laminated has the conductivity and optical characteristics of a metal such as silver, and the property of suppressing the reflection of the high-refractive-index thin film by the metal in a certain wavelength region, It can be preferably used in any of the properties of conductivity, near-infrared ray cutting ability and transparency. Further, the combination (B) / (C) of the high refractive index thin film layer (B) and the silver or metal thin film layer containing silver (C) is repeated twice or more, preferably twice or more and four times or less. Furthermore, it is preferable to further stack the high refractive index thin film (B) on the uppermost layer. The number of repetitions generally does not exceed 7.

By alternately and repeatedly stacking the high refractive index thin film layer (B) and the metal thin film layer (C), it becomes possible to more effectively suppress reflection by the metal thin film layer (C). When the number of times of repeating is within the above range, it can be preferably used in any of the characteristics of conductivity, near infrared ray cutting ability and transparency. If the number of times of repetition is larger than the above range, it is difficult to control the optical characteristics and productivity is deteriorated, which is not preferable. On the other hand, when it is smaller than the above range, the conductivity, the optical property, and the near-infrared ray cutting ability cannot be satisfied, which is not preferable. The total light transmittance of the transparent conductive layer is preferably 40% or more, more preferably 60% or more, and most preferably 65% or more. When a transparent conductive layer having a total light transmittance lower than the above value is used, when it is attached to a display, the screen becomes dark, which is not preferable. Further, as described above, the transparent conductive layer used in the present invention uses a metal thin film layer of silver or the like, and therefore the transmittance does not generally exceed 80%. The material for the high refractive index thin film layer (B) used in the present invention is not particularly limited, but a material having a refractive index of 1.6 or more, more preferably 1.8 or more is preferable. Specific materials capable of forming such a high refractive index thin film layer include oxides or sulfides of indium, titanium, zirconium, bismuth, tin, zinc, antimony, tantalum, neodymium, lanthanum, thorium, magnesium, gallium and the like. Compounds, mixtures of these oxides or sulfides, complex oxides, complex sulfides, and the like.

These oxides or sulfides may be present in a range that does not significantly change the optical characteristics even if there is a difference in stoichiometric composition between the metal and oxygen or sulfur. Among these materials, indium oxide, indium oxide-tin (ITO), and tin oxide have high transparency and a high refractive index, and also have a high film formation speed and good adhesion to the metal thin film layer. Therefore, it can be preferably used. The thickness of the high refractive index thin film layer (B) is determined from the required optical characteristics and is not particularly limited, but the thickness of each layer is preferably 5 nm to 200 nm.
0 nm to 100 nm is particularly preferable. Further, although the high refractive index thin film layers (B) are alternately laminated with the metal thin film layers (C) as described above, the high refractive index thin film layers do not have to be made of the same material and have the same thickness. It doesn't have to be. As a method for forming the high refractive index thin film layer (B), known methods such as a sputtering method, an ion plating method, an ion beam assist method, a vacuum vapor deposition method, and a wet coating method can be used.

For example, when the ITO thin film is formed by the sputtering method, it is performed as follows. First, the transparent substrate (A) is allowed to stand in a vacuum container and the pressure is set to 0.01 P.
Evacuate to a. After that, the pressure is 0.18 Pa
Argon gas is introduced so that the total pressure becomes 0.
Oxygen gas is introduced so that the pressure becomes 26 Pa. Under the above pressure, an ITO thin film layer is formed by a magnetron DC sputtering method using an indium-tin alloy as a target. As a material of the metal thin film layer (C), silver or an alloy containing silver can be preferably used. Silver can be preferably used because of its low surface resistivity, good infrared reflection properties, and good optical properties when laminated with a high refractive index thin film layer. However, silver is poor in chemical / physical stability and easily deteriorates due to pollutants in the environment, moisture, heat, and light rays.
Alloys with metals such as gold, platinum, palladium and indium can also be preferably used. However, in the case of an alloy, if the proportion of silver decreases, the conductivity deteriorates and the electromagnetic wave shielding ability decreases, so the proportion of silver in the alloy is preferably 90% by weight or more.

The thickness of each metal thin film layer is preferably not less than 4 nm because it is preferably not an island structure.
From the viewpoint of transparency, it is preferably 30 nm or less.
However, even if the thickness exceeds the above range, it can be used when the total light transmittance of the filter is 40% or more. As in the case of the high refractive index thin film layer, the thickness of each metal thin film layer does not have to be the same, and the same material need not be used. As a method for forming the metal thin film layer (C), a known forming method such as a sputtering method, an ion plating method, an ion beam assist method, or a vacuum vapor deposition method can be used. For example, when a silver thin film is formed into an ITO thin film layer by a sputtering method, it is performed as follows. First, a transparent substrate (A) having an ITO thin film formed on one main surface was allowed to stand still in a vacuum container at a pressure of 0.
Evacuate so as to be 01 Pa. After that, the pressure is 0.1
Argon gas is introduced so that the pressure becomes 8 Pa. A silver thin film layer is formed on the ITO thin film by magnetron DC sputtering using metallic silver as a target. For the purpose of preventing the deterioration of the transparent conductive thin film layer (D), particularly the metal thin film layer (C), it is possible to seal the peripheral end portion of the transparent conductive thin film layer (D). For example, a triazine amine-based compound, a thiodipropionate-based compound, a benzimidazole-based compound, or the like alone or a transparent resin containing these compounds can be used for the above purpose.
Further, for the purpose of adjusting the color of the transparent conductive thin film layer (D), it is possible to provide a color-adjusting layer such as a dye or a pigment on any constituent member by a method such as coating or kneading.
The method of applying the dye to the transparent substrate is one of the preferable methods. Further, a method of dispersing a dye in an adhesive material described later is also one of the preferable methods.

The transparent conductive thin film layer is formed by forming the first high refractive index thin film layer (C1) on one main surface of the transparent substrate (A), and then forming the first metal layer. Thin film layer (B
1) is formed. After that, the high refractive index thin film layer (Bn) and the metal thin film layer (Cn) are alternately and repeatedly laminated, and finally the high refractive index thin film layer (B ′) is formed. In the present invention, an electrode (F) containing at least a metal is formed at the peripheral end of the transparent conductive thin film layer (D) for the purpose of grounding the transparent conductive thin film layer. The above-mentioned transparent conductive thin film layer has both transparency and conductivity, and can be preferably used as a filter for a display, but absolute conductivity is overwhelmingly higher than that of bulk metal, and it is grounded. Even if it is brought into contact with a metal fitting or the like, there is a possibility that the effective electromagnetic wave shielding ability may not be exerted because the electric conduction at the contact is not sufficient. Therefore, in the present invention, it is preferable to form an electrode at the peripheral end portion of the transparent conductive thin film layer which is out of the visual field to surely perform grounding. As a material for forming the electrodes, a film of a paste (metal paste) in which a metal is dispersed in a resin to form an ink is preferably used. As the metal used in the metal paste,
A metal such as gold, silver, copper, or iron, which has a generally low conductivity and is relatively easily available, is used. As the resin used for the metal paste, any resin can be used as long as it has a high viscosity and can easily disperse the metal. For example, an acrylic resin, a urethane resin, a melamine resin is used. . The ratio of metal to resin in the metal paste is not particularly limited, but the specific resistance is 1 ×
It is preferable to adjust it to be 10 ⁻³ Ω / □ or less. When the specific resistance is not more than the above value, the transparent conductive layer can be grounded more reliably.

As a method of forming an electrode, as a method of forming a metal film, there is a method of forming the above-described metal thin film forming method at a desired position. As a method for forming the metal paste thin film, a known printing method such as a screen printing method or a flexographic printing method can be used. As described above, the transparent conductive thin film layer used in the present invention does not have sufficient surface hardness as it is, and also has a sufficient function as an electromagnetic wave filter due to scratches on the surface during handling or use. I will lose it. In addition, deterioration of the metal layer can easily occur due to contaminants, moisture, light rays, etc. in the environment. Therefore, in the present invention, a transparent protective film is used as a transparent protective layer on the transparent conductive thin film layer for the purpose of preventing deterioration of the transparent conductive thin film layer. As a method of forming the transparent protective layer, a method of laminating a transparent film with an adhesive material or an adhesive agent can be mentioned as a preferable method. As the transparent substrate used for the transparent protective film (G), the transparent plastic film used for the transparent substrate (A) can be used. The above-mentioned transparent plastic film has a refractive index of about 1.6 to 1.7. If it is exposed to the outermost surface of the filter as it is, reflection occurs between the air layer and the plastic film, and reflection of about 6% occurs. Also,
Most of this reflection is specular, and when attached to a display, outside light (especially indoors such as a fluorescent lamp)
The problem that the reflection becomes remarkable occurs. Therefore, in the present invention, an antireflection layer is provided for the purpose of reducing the reflection between the plastic film and the air layer, and an antiglare layer and an anti-Newton ring layer are provided for the purpose of reducing the specular reflectance. It can be preferably used to form it on the surface which is not attached to the conductive thin film layer (D), that is, on the outermost surface. Here, the antireflection layer, the antiglare layer, and the anti-Newton ring layer are films having respective functions or films having corresponding functions. As a method for forming a film having each function, coating / printing or various known film forming methods, or a transparent molded product having each function may be bonded using an arbitrary adhesive material or adhesive. As the antireflection layer, a film having a refractive index in the visible region of 1.5 or less, preferably 1.4 or less is preferable.

Specific examples thereof include a single layer film of fluorine-based transparent polymer resin, magnesium fluoride, silicon-based resin, silicon oxide and the like. In addition, a thin film of an inorganic compound such as a metal oxide, a fluoride, a silicide, a boride, a carbide, a nitride, or a sulfide having a different refractive index or a thin film of an organic compound such as a silicon resin, an acrylic resin, or a fluorine resin is used. There is a multi-layered structure of more than one layer. As a method for forming the antireflection layer, known methods such as sputtering, ion plating, ion beam assist, vacuum deposition, and wet coating method can be used for the inorganic compound thin film. For the organic compound thin film, a known coating method such as a wet coating method can be used. The reflectance of the antireflection layer formed by the above method with respect to the following light rays is preferably 5% or less, more preferably 3% or less, and most preferably 2% or less. Moreover, in general, it is the current technology that the value falls below 0.1%.
It is difficult to manufacture stably and inexpensively, but the lower the better, the more preferable. The anti-Newton ring layer and the anti-glare layer used in the present invention are different from each other only in their uses, and are layers that are transparent to visible light and have a surface condition of minute irregularities of about 0.1 to 10 μm. As a material for forming the anti-Newton ring layer or the anti-glare layer, for example, acrylic resin, silicon resin, melamine resin, urethane resin, alkyd resin, etc., or organic or inorganic fine particles such as silica, melamine, acrylic, and alumina. Examples thereof include those obtained by dispersing and making into ink.

As a method for forming these layers, known coating methods such as a bar coating method, a reverse coating method and a die coating method can be used. The transmittance of the anti-Newton ring layer or the anti-glare layer formed by the above method is preferably 70% to 95%, more preferably 80% to 95%. The haze value is preferably 0.5% to 20%, more preferably 1% to 10%. Further, by coating an ink in which fine particles having anti-Newton ring ability or anti-glare ability are dispersed in the above-mentioned organic compound capable of forming an anti-reflection layer, both the anti-reflection layer and the anti-Newton ring layer or the anti-glare layer are applied. Forming a layer having a function can also be preferably used. The moisture permeability of the above-mentioned transparent protective film is 20.
g / m ² · day or less is preferable, and 10 g /
More preferably m ² · day or less, 5 g /
Most preferably, it is not more than m ² · day.

It is also possible to impart an antistatic property or antifouling property to the antireflection, antinewton ring, and antiglare layer for the purpose of preventing the adhesion of hand dust and indoor dust. As a method for sticking the transparent protective film, a known sticking method using an adhesive material or an adhesive can be used. The pressure sensitive adhesive or adhesive is preferably non-colored and highly transparent. If the adhesive or adhesive has a practical adhesive strength, it can be preferably used in the form of sheet or liquid. As a method for laminating the transparent protective film, specifically, for a sheet-shaped adhesive material, it is directly laminated on the transparent protective film or the transparent conductive layer. Regarding the liquid adhesive, for example, on the transparent protective film, for example, acrylic-based, urethane-based, epoxy-based liquid pressure-sensitive adhesive or adhesive known bar coating method, reverse coating method, gravure coating method,
The transparent protective film and the transparent laminate can be bonded together by a known method such as a method of applying a die coat method or the like and then leaving it at room temperature or under heating and then using a pinch roll, or pressure bonding under a vacuum. The thickness of the adhesive material or the adhesive layer is not particularly limited,
The thickness is preferably 0.5 μm to 50 μm, more preferably 1 μm to 30 μm. After sticking together using adhesive or adhesive, air bubbles that enter between the members during sticking are defoamed or solid-dissolved in the adhesive or adhesive, further increasing the adhesion between the members. For that purpose, it is preferable to carry out curing under heating and pressure. The pressurizing condition is generally 2 atm to 20 atm, and the warming condition is generally room temperature to 80 ° C. although it depends on the heat resistance of each member.

The support (H) made of a transparent molded product preferably has a main surface which is smooth and plate-like. Examples of the material that can serve as such a support include transparent plastic plates and glass plates in the visible light region. Among them, as the plastic plate, acrylic resin such as polymethylmethacrylate (PMMA), polycarbonate resin,
A transparent ABS resin or the like can be used, but the resin is not limited to these. Among them, the PMMA resin can be preferably used because of its transparency in a wide visible light region and high mechanical strength. The thickness of these plastic plates is sufficient as long as they have sufficient mechanical strength and rigidity to maintain smoothness without bending, but in general, 1 mm to 10 mm is preferable from the viewpoint of handling property. Further, as the glass plate, it is preferable to use a glass plate that has been subjected to air-cooling strengthening processing or chemical strengthening processing in order to increase mechanical strength. Similarly, the thickness of the glass plate should be sufficient mechanical strength and rigidity to maintain smoothness without sagging, but in general it is 1 mm to 10 mm in terms of handleability.
Is preferred.

The method of combining the above-mentioned support (H) and transparent laminate (E) is the same as the method used in the above-mentioned method of combining the transparent molded body (E) and transparent protective layer (G). Can be used. The method for producing a filter for a display according to the present invention includes a step of laminating a transparent molded body (E), a transparent protective layer (G), and a support (H) with an adhesive or an adhesive, and a transparent electrode (F). Forming a conductive thin film (D). Among these, the step of laminating the transparent laminate (E) and the transparent protective layer (G) with an adhesive or an adhesive is first performed. If another step is performed before the step of bonding the transparent laminate (E) and the transparent protective layer (G), foreign matter may adhere to the transparent conductive thin film and a reflective discolored portion may occur, which is not preferable. It is possible to suppress the generation of discolored parts as much as possible by carrying out in an environment (clean room) where there are few floating foreign substances, but foreign substances mixed in various materials may adhere.

After the respective materials are bonded together by using the tacky material or the adhesive, the air bubbles that have entered between the members at the time of the bonding are defoamed or solid-dissolved in the tacky material or the adhesive material. It is preferable to carry out curing under heating and pressurization for the purpose of increasing the adhesion force between them.
The pressure condition is generally 2 atm to 20 atm,
The heating condition depends on the heat resistance of each member, but is from room temperature to 80
C is common. A preferred configuration example of the present invention will be described with reference to the drawings. FIG. 1 is a plan view of a preferred configuration example of the present invention seen from the surface on which electrodes and a transparent protective film are formed, and FIG. 2 shows a cross section taken along the line AA ′ in FIG. The transparent laminate (10) comprises a transparent substrate (1) and a transparent conductive thin film layer (2) formed on the transparent substrate (1). An electrode (5) containing a metal is formed on the peripheral edge of the transparent conductive thin film layer (2). In addition, the transparent protective film (1) is formed on the transparent conductive thin film layer (2) at a portion other than the peripheral edge portion, that is, a portion where the metal-containing electrode (5) is not formed.
1) is formed. The transparent protective film comprises an antireflection layer, an antiglare layer or an anti-Newton ring layer (4) on a transparent substrate (3), and a transparent laminate (10) is made transparent by using an adhesive material or an adhesive layer (6). It is bonded to the surface of the conductive thin film (2). Further, a transparent molded body (7) is attached to the surface of the transparent laminate (10) on which the transparent protective film (11) and the electrode (5) are not attached, by using the same adhesive or adhesive layer (6). There is.

[0024]

The present invention will be described in detail with reference to the following examples, but the present invention is not limited thereto. The evaluation was performed as follows.

Number of reflective defects (pieces) Measurement was carried out in a 10 cm square area. The measurement was performed on the part where the electrode was not formed.

A fluorescent lamp (three-wave tube: National Twin 1 FPL27EX-N) was applied from a position 1 m above the measuring range, and the reflective discolored portion was visually observed from a position 0.3 m.

The size of the reflective discolored portion was visually measured with a general-purpose loupe (magnification: 10 times), and the diameter was 0.3.
The number of pieces having a size of mm or more was counted. Evaluation,
It was carried out after 30 days to form a filter shape by combining various members.

Example 1 A transparent laminate was manufactured by the following method. Biaxially stretched polyethylene terephthalate (PE
T) film (thickness 75 μm, A4 manufactured by Toyobo Co., Ltd.)
100) on one main surface by a DC magnetron sputtering method, a silver thin film layer as a metal thin film layer, an ITO thin film layer as a high refractive index thin film layer, and an ITO thin film (thickness 40 n).
m) / silver thin film (thickness 10 nm) / ITO thin film (80 n
m) / silver thin film (10 nm) / ITO thin film (80 nm) /
A silver thin film (10 nm) / ITO thin film (40 nm) was formed in this order to form a transparent conductive thin film layer composed of three metal thin film layers and four high refractive index thin film layers, and a transparent conductive film was formed. Obtained. As a method for forming the ITO thin film, the ITO thin film is left standing in a vacuum container and exhausted so that the pressure becomes 0.01 Pa. After that, argon gas is introduced so that the pressure becomes 0.18 Pa, and further oxygen gas is introduced so that the total pressure becomes 0.26 Pa. An ITO thin film layer is formed by magnetron DC sputtering using an indium-tin alloy (tin weight ratio 10%) as a target at the above pressure. The pressure is 0.01P when forming the silver thin film layer.
Evacuate to a. After that, the pressure is 0.18 Pa
Argon gas is introduced so that ITO by magnetron DC sputtering method with silver as a target
A silver thin film layer is formed on the thin film. The transparent protective film was manufactured by the following method. Using the PET film described above, an antireflection layer made of a silicon oxide thin film having a thickness of 90 nm was formed on one main surface by an electron beam evaporation method. A transparent glass plate having a thickness of 5 mm was used as the transparent molded body. Silver paste (MSP-600F manufactured by Mitsui Chemicals, Inc.) as an electrode
Was applied by screen printing and dried at room temperature for 24 hours. The electrodes were formed on four sides on the transparent conductive thin film, and the distance from the end was 0 to 5 mm. After the above materials were manufactured, a display filter was prepared in the following steps and order. The display filter is made by the following steps.

Step A) The surface of the transparent protective film on which the transparent protective layer was not formed and the surface of the transparent conductive film on which the transparent conductive thin film was formed were bonded together using an adhesive material. The transparent protective film was not adhered to the four sides of the transparent conductive film which were 5 mm from the end. Specifically, one release film of an acrylic pressure-sensitive adhesive film (double tack film # 5510 manufactured by Sekisui Chemical Co., Ltd.) having release films on both sides was peeled off, and then it was attached to a transparent protective film using a pinch roll. After peeling off the other release film, it was attached on the transparent conductive thin film layer using a pinch roll to obtain a filter for display.

Step B) An electrode was formed on four sides of the transparent conductive thin film, and a portion 0 to 5 mm from the end. Specifically, silver paste (Mitsui Chemicals
MSP-600F) was applied by a screen printing method and then dried at room temperature to form an electrode.

Step C) The surface of the transparent conductive film on which the transparent conductive thin film layer was not formed was adhered to the support. The bonding method was exactly the same as in step A described above. Each process is
Process A → Process B → Process C were carried out in this order. It should be noted that a display filter having the same structure can be obtained by going through all of the above-mentioned three steps regardless of the order of the above-mentioned steps A, B, and C. The reflective discolored portion of the display filter thus obtained was measured, but no reflective discolored portion was observed.

Example 2 A display filter was prepared in the same manner as in Example 1 except that the order of each step was step A → step C → step B. The reflective discolored portion of the display filter thus obtained was measured, but no reflective discolored portion was observed.

(Comparative Example 1) A display filter was prepared in the same manner as in Example 1 except that the steps were performed in the order of step B-> step C-> step A. The reflective discolored portion of the thus obtained display filter was measured, and 12 reflective discolored portions having a diameter of 0.3 mm or more were recognized. When the reflective discolored part was observed with an optical microscope at a magnification of 50 times, it was found that foreign matter was attached to any of the reflective discolored parts.

(Comparative Example 2) A display filter was prepared in the same manner as in Example 1 except that the steps were performed in the order of step C-> step B-> step A. The reflective discolored portion of the display filter thus obtained was measured and 11 reflective discolored portions having a diameter of 0.3 mm or more were recognized. When the observed reflective discolored portions were magnified 50 times with an optical microscope and observed, it was confirmed that foreign matter was attached to any of the reflective discolored portions.

(Comparative Example 3) A display filter was prepared in the same manner as in Example 1 except that the steps were performed in the order of step B-> step A-> step C. The reflective discolored portion of the display filter thus obtained was measured, and eight reflective discolored portions having a diameter of 0.3 mm or more were recognized. When the reflective discolored part was observed with an optical microscope at a magnification of 50 times, it was found that foreign matter was attached to any of the reflective discolored parts.

(Comparative Example 4) A display filter was prepared in the same manner as in Example 1 except that the order of each step was step C → step A → step B. The reflective discolored portion of the display filter thus obtained was measured, and four reflective discolored portions having a diameter of 0.3 mm or more were recognized. When the reflective discolored part was observed with an optical microscope at a magnification of 50 times, it was found that foreign matter was attached to any of the reflective discolored parts.

From the above results, it is possible to suppress the occurrence of the reflective discolored portion by performing the step of laminating the transparent protective film and the transparent laminated body before the step of laminating the transparent laminated body and the transparent molded body or the electrode forming step. It turns out that it is possible.

[0038]

According to the method of the present invention, it is possible to provide a display filter without aggregation of a silver thin film layer, which has been difficult to solve by conventional techniques.

[Brief description of drawings]

FIG. 1 is a plan view showing an example of a preferable display filter of the present invention.

2 is a cross-sectional view taken along the line A-A 'in FIG.

[Explanation of symbols]

1 Transparent Substrate A 2 Transparent Conductive Thin Film Layer D (Repeated Laminate of High Refractive Index Thin Film Layer B and Metal Thin Film Layer C) 3 Transparent Substrate I 4 Antireflection, Antiglare or Antinewton Ring Layer 5 5 At least a Metal Including electrode F 6 Adhesive or adhesive 7 Transparent molded body H 10 Transparent laminated body E 11 Transparent protective film G

─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. ⁷ Identification code FI theme code (reference) G09F 9/00 313 G02B 1/10 A H05K 9/00 Z (72) Inventor Yukinori Asakawa Nagaura, Sodegaura, Chiba Prefecture 580 Address 32 Mitsui Chemicals, Inc. (72) Inventor Shin Morohashi Nagaura, Sodegaura, Chiba Prefecture 580 32 Mitsui Chemicals, Inc. F Term (reference) 2H048 FA01 FA05 FA13 FA24 GA01 GA07 GA19 GA36 GA60 GA61 2K009 AA09 AA12 BB02 BB11 BB24 CC02 CC03 CC06 CC09 CC14 CC21 DD03 DD04 EE03 5E321 AA04 AA23 AA50 BB23 BB25 BB44 CC16 GG05 GH01 5G435 AA01 AA17 DD12 FF02 GG11 GG33 HH02 HH03 HH12 KK07 LL04 LL08

Claims (5)

[Claims] 1. A step of forming an electrode (F) containing a metal on a transparent laminate (E) having a transparent conductive thin film layer (D) formed on one main surface of a transparent substrate (A), transparent. A process for producing a filter for a display, which comprises a step of forming a protective film (G) and a step of forming a support (H) on the other main surface of a transparent substrate (A), the transparent protective film (G) 1. A method for manufacturing a filter for a display, which comprises first performing the step of forming. 2. The transparent conductive thin film layer (D) comprises a combination of a high refractive index thin film layer (B) and a silver or silver-containing metal thin film layer (C) (B) / (C) as a repeating unit. 2. The high-refractive-index thin film layer (B) is further laminated thereon, and the high-refractive-index thin film layer (B) is further laminated thereon.
A method for manufacturing a display filter according to. 3. The electrode (F) is formed on the transparent conductive thin film layer (D) and at the peripheral end portion of the transparent conductive thin film layer (D), according to claim 1 or 2. A method for producing the described display filter. 4. The transparent protective film (G) is attached to a portion of the transparent conductive thin film layer (D) where the electrode (F) is not formed with an adhesive or an adhesive.
4. The method for manufacturing the display filter according to any one of 3 to 3. 5. The method for producing a display filter according to claim 1, wherein the support (H) is attached to the transparent substrate (A).