JP2003094650A - Ink-jet head - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve a finished accuracy of a gap length by making an individual electrode basically constituted of a diffusion electrode. SOLUTION: A diaphragm 21 constitutes a part of a liquid chamber 25 communicating with a nozzle 32 discharging recording liquid, and an electrode supporting substrate 11 facing the individual electrode 13 is arranged via a gap G with respect to the diaphragm 21. Recording is made on a recording medium by deforming the diaphragm 21 with electrostatic power, pressurising the recording liquid in the liquid chamber 25, and allowing the nozzle to discharge the liquid. The main material of the electrode supporting substrate 11 and the diaphragm 21 is single crystal silicon, and the individual electrode 13 is formed by PN junction isolation with respect to the electrode supporting substrate 11, by doping and diffusing a first impurity in the silicon of the electrode supporting substrate 11 and a second impurity in the individual electrode 13.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention
More specifically, the present invention relates to a head configuration of an inkjet recording head that utilizes electrostatic force.

[0002]

2. Description of the Related Art FIG. 7 is a cross-sectional view of a main part (longitudinal cross-sectional view of a main part of an individual bit) for explaining an example of a conventional electrostatic ink jet head, in which 100 is an electrode substrate.
Reference numeral 200 is a liquid chamber substrate (vibration plate substrate), 300 is a nozzle substrate, and the electrode substrate 100 is an electrode support substrate 111, individual electrodes 112, an insulating protective film 113, a gap forming member 114,
Consists of an electrode pad 115, an ink supply channel 116, etc.,
The liquid chamber substrate 200 includes a common liquid chamber 221, which communicates with the ink supply path 116, an ink liquid chamber 222 which communicates with the common liquid chamber 221, a vibrating plate 223, and the common liquid chamber 221.
The partition 224 and the like that form the ink liquid chamber 222 and the like,
The nozzle substrate 300 includes an ink ejection hole (nozzle) 332,
The nozzle plate 331 has a fluid resistance flow path 333 that connects the common liquid chamber 221 and the ink liquid chamber 222, and the individual electrode 112 (strictly speaking, the insulating protective film 113) and the vibration plate 22.
3 is provided to be opposed to each other via a gap G by a gap forming member 114.

As is well known, in the electrostatic ink jet head as described above, a static voltage is applied between the individual electrode and the vibrating plate, and the vibrating plate 223 is attracted to the individual electrode 112 side by the electrostatic force acting between them. Then, by turning off the applied voltage, the vibrating plate 223 is returned by its elastic force, the ink in the ink liquid chamber 222 is pressurized, and the nozzle 33
2 is discharged.

In connection with the electrostatic ink jet head as described above, Japanese Patent Laid-Open No. 11-277741 proposes to introduce impurities into a silicon diaphragm, and a P-type impurity atom (boron atom) is introduced to the diaphragm side. In addition to utilizing the advantage of mixing the impurities in a high density, the residual stress of the diaphragm and the generation of crystal defects, which are the defects caused by mixing the impurities, are suppressed and prevented by defining the impurity mixed region. Structurally, impurities are introduced into single crystal silicon and used as electrodes.

In Japanese Patent Laid-Open No. 2000-52544, a drive active element is manufactured on a silicon substrate on the electrode substrate side by a general semiconductor device manufacturing technique, and an ink jet head is manufactured easily and inexpensively. The individual electrode is composed of a diffusion layer on a silicon substrate.

[0006]

DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention
In Japanese Patent No. 7741, an impurity (P-type) is introduced and diffused into a partial region of a diaphragm of silicon single crystal, but the individual electrode is not formed on the diaphragm side.
It is only related to the formation of the diaphragm that serves as the common electrode.
As for the individual electrodes, the electrode material and the protective film are formed and patterned as usual, and the precision of the gap length is difficult to improve because the precision of the finish is determined by the total precision of these film thicknesses.

In the above-mentioned Japanese Patent Laid-Open No. 2000-52544, an ink jet head using a diffusion layer on a silicon supporting substrate as a counter electrode is premised, and the individual electrode is PN.
Although separated by the junction, the PN junction area of the individual electrode is large, and it is expected that a leak current will flow between the individual electrode and the supporting substrate or between the individual electrodes.

The present invention has been made in view of the above situation, and a first object of the present invention is to apply a diffusion electrode to an individual electrode in an electrostatic actuator to finish the gap length. It is possible to reduce the number of processes and manufacturing costs by improving the precision and, in connection with this, forming individual electrodes by impurity diffusion into single crystal silicon using general semiconductor device manufacturing technology. That is.

A second object of the present invention is that when an electrode is formed by diffusing impurities into single crystal silicon, if the area is large, a leak current will flow and stable operation will not be possible.
This is to manufacture a head that reduces this leakage current and has low current consumption. In addition, when the driving voltage is high, the breakdown due to the electric field concentration of the depletion layer of the PN junction is prevented and the inkjet head of the electrostatic system can be stably driven. Is to provide.

[0010]

According to a first aspect of the present invention, there is provided a vibrating plate forming a part of a liquid chamber communicating with a nozzle for ejecting a recording liquid, and an individual electrode via a gap with respect to the vibrating plate. An electrode supporting substrate arranged to face each other, and a static voltage is applied between the vibrating plate and the individual electrode to deform the vibrating plate by an electrostatic force to pressurize the recording liquid in the liquid chamber to press the nozzle. In an ink jet recording head ejected from a substrate, the main material of the electrode supporting substrate and the vibrating plate is single crystal silicon, and the base silicon that is the electrode supporting substrate has a first material.
The second electrode is doped with a second impurity so as to diffuse the impurity, and the individual electrode is formed by PN junction separation with respect to the base silicon.

According to a second aspect of the present invention, in the first aspect of the invention, the PN structure from the individual electrode side is a P + region / P- region / N electrode supporting substrate or an N + region / N- region / P electrode supporting substrate. The feature is that the individual electrodes are connected to P + type or N + type silicon in this order.

According to a third aspect of the present invention, in the second aspect, the distance between the end of the region where the second impurity is high and the end of the thin region of the impurity concentration profile of the individual electrode is 1.5 μm or more. It is what

According to a fourth aspect of the invention, in the first or second aspect of the invention, the termination peripheral region of the silicon surface of the second impurity of the individual electrode is under the silicon oxide film.

According to a fifth aspect of the present invention, in the first aspect of the invention, a guard ring is provided around the individual electrode.

The invention of claim 6 is the invention of claim 5 characterized in that the impurities of the guard ring are formed in the same type as the impurities of the individual electrodes.

According to a seventh aspect of the present invention, there is provided a vibrating plate having a liquid chamber communicating with a nozzle for ejecting the recording liquid on one side and an individual electrode on the other side, and a gap with respect to the vibrating plate. And a common electrode substrate disposed opposite to each other, a static voltage is applied between the individual electrodes on the vibrating plate and the common electrode on the common electrode substrate to deform the vibrating plate by electrostatic force, and In an inkjet recording head that pressurizes a recording liquid in a chamber and ejects it from the nozzle, a main material of the common electrode substrate and the diaphragm substrate is single crystal silicon, and a first impurity is added to the base silicon that is the diaphragm substrate. The individual electrode is doped with a second impurity and diffused so that the individual electrode is formed by PN junction separation with respect to the base silicon.

According to an eighth aspect of the invention, in the invention of the seventh aspect, an SOI (silicon on in) is provided on the diaphragm substrate.
It is characterized by the use of a sulator.

[0018]

BEST MODE FOR CARRYING OUT THE INVENTION The present invention, in the electrostatic ink jet head as described above, improves the finishing accuracy of the gap length by making the basic structure of the individual electrode a diffusion electrode. By providing a diffusion electrode structure that can utilize general reliable semiconductor equipment and processes and has a small number of manufacturing steps, it is possible to reduce costs and shorten the construction period. Since the drive characteristics become unstable due to the leak current flowing in proportion to the PN junction area, a structure for reducing the leak current is added to the basic structure.

(Embodiment 1) FIG. 1 is a sectional view of an essential part for explaining a first embodiment of an ink jet head according to the present invention. FIG. 1 (A) is a sectional view in the bit lateral direction of an actuator portion, FIG. 1B is a longitudinal sectional view, in which 1
Reference numeral 0 is an electrode substrate, 20 is a vibrating plate (liquid chamber) substrate, 30 is a nozzle substrate, and the electrode substrate 10 is an electrode supporting substrate 11, a silicon oxide film 12, an individual electrode 13, an electrode protective film 14, a gap spacer 15, an electrode. The vibrating plate substrate 20 includes a vibrating plate 21, an insulating film 22, a partition wall 23, a common liquid chamber 24, an ink liquid chamber (pressurizing chamber) 25, and the like. The nozzle substrate 30 includes a nozzle plate 31 and a nozzle plate 31. Nozzle 32, fluid resistance path 3
It is composed of 3 etc. A minute gap G is formed between the diaphragm 21 and the individual electrode 13 (correctly, the protective film 14), and when a voltage is applied between the diaphragm 21 and the individual electrode 13, the diaphragm 21 is caused by electrostatic force. When the displacement diaphragm 13 is displaced to the side of the counter electrode 13 and then the voltage is returned to 0, the displaced diaphragm 13 presses the ink in the ink liquid chamber 25 with the force to return to the original position due to its elastic force. Nozzle 32
More ink is ejected.

The protective film 14 on the individual electrode 13 is the diaphragm 2
A short circuit between 1 and the individual electrode 13 is prevented, and an insulating film having the same function may be formed on the diaphragm side. It should be noted that this insulating film can be omitted if the diaphragm is operated by a driving method such that the individual electrodes do not come into contact with each other. Further, the gap shape of this embodiment is merely an example, and other gap shapes can be used depending on the purpose. In order to obtain the desired ink ejection force, the parameters (gap length, diaphragm thickness, diaphragm material, diaphragm short side length, fluid resistance, protective film thickness / material, etc.) Perform and achieve optimal design.

The present invention forms an individual electrode by doping an impurity into a silicon single crystal and diffusing it, and further, the individual electrode of the present invention has a double diffusion structure and a guard ring structure with the diffusion electrode as a basic structure. Is added.

In the example of the present invention, the nozzles are laid out on one flat plate to form a nozzle plate, and the respective substrates (electrode substrate, diaphragm substrate, nozzle substrate) are bonded together, and then cut out into a head size. Then, the FPC is pressure-bonded to the back surface side and externally connected to complete the ink jet head.

FIGS. 2 and 3 are schematic views for explaining one embodiment of the manufacturing process of the ink jet head according to the present invention. For example, boron (first impurity) is added to silicon in the <100> orientation plane to a level of 0.1. An electrode supporting substrate 11 (FIG. 2 (A)) containing 0.1 to 0.1 Ωcm is prepared, and a silicon oxide film 15 is grown to a thickness of 0.5 μm on the whole by a thermal oxidation wet method.
After that, a resist pattern corresponding to a desired electrode pattern forming area of the ink ejecting liquid chamber and the ink supply path is formed, wet etching is performed using a silicon oxide film etchant (hydrofluoric acid), and the resist is removed after etching. (FIG. 2 (B)). Then, a second impurity (for example, phosphorus) is implanted by high energy ion implantation using the silicon oxide film as a mask, and the impurity is diffused in a diffusion furnace. Here, solid diffusion, or second impurities (such as phosphorus)
It is also possible to mix a silicate glass containing the above with a solvent, apply it to the electrode supporting substrate 11 and pre-bak it, diffuse the impurities in the diffusion furnace, and introduce the second impurities into the same selected area. The diffusion condition is 1000 ° C. for about 2 hours (FIG. 2 (C)).

In forming the region where the second impurity is concentrated and the region where the impurity concentration profile is thin to the individual electrode, the impurity ions are implanted by, for example, arsenic at a high concentration (5E15i).
ons / cm ² ) followed by a low phosphorus concentration (1E12i
ons / cm ² ). In the subsequent heat treatment, a low-concentration N-region is formed on the contact surface so that the high-concentration N + region covers the contact surface due to the difference in diffusion coefficient.
Alternatively, a similar impurity concentration profile can be obtained by implanting the same impurity ions at low acceleration and high acceleration.

As a method for separating the end points of the region where the second impurity is high and the region where the second impurity is high in the impurity concentration profile to the individual electrodes by 1.5 μm or more, ions of the same polarity having different diffusion coefficients are injected with different energies. Or, it is controlled by the drive time by heat diffusion.

About 200 on the individual electrodes of the electrode supporting substrate 11.
nm to form a protective film 13 on the impurity diffusion (FIG. 2).
(D)). Next, the silicon substrate 20 on the vibration plate side is attached by direct bonding or the like, and is polished (mirror finish) to an appropriate thickness (FIG. 2E). Next, the silicon nitride film 26 is deposited, and the portion which becomes the ink pressurizing liquid chamber 25, the ink supply passage and the common liquid chamber 24, and the portion which becomes the back surface flow passage are photoengraved and etched (FIG. 3 (F)).

After removing the resist, silicon is etched with KOH (the thickness of the vibrating plate remains 1 to 3 μm).
A portion which becomes the ink liquid chambers 24 and 25 and a portion which becomes the back surface flow path are formed (FIG. 3G).

Next, the separately processed nozzle plate 31 is attached with an adhesive and cured. The flow path from the ink supply path to each pressurized liquid chamber may be formed on the nozzle plate side so as to include fluid resistance (FIG. 3 (H)).

(Embodiment 2) FIG. 4 is a process flow chart for explaining another embodiment of the ink jet head manufacturing process according to the present invention. FIG. 4 (A) is shown in FIG. 2 (C) and FIG.
2 (B) corresponds to FIG. 2 (D), and the others correspond to FIG.
Since the steps are the same as those shown in FIG. 3, they are omitted. In FIG. 4A, the guard ring 15 is formed at the same time when the impurity implantation pattern is formed in the silicon single crystal.
_A pattern of ₁ , 15 ₂ is formed in advance.

The pattern of the guard ring is preferably designed so as to surround the periphery of the individual electrode with an appropriate distance. Therefore, at the time of implanting impurities, desired ions are implanted into the individual electrode portion and the guard ring portion to thermally diffuse. Alternatively, as in Example 1, solid diffusion or silicate glass containing a second impurity (for example, phosphorus) is mixed with a solvent and applied to the support substrate 11, prebaked, and the impurities are diffused in a diffusion furnace. The second impurity may be introduced into the same selected area. Then, it is oxidized to form a protective film. Then, the electrode supporting substrate 11 is directly bonded to pattern the ink pressurizing chamber region.

As an effect of providing the guard ring, when a drive voltage is applied to the individual electrodes, the depletion layer of the PN junction extends so as to wrap the guard ring, and particularly, the breakdown voltage is low at the lower corner portion having a high curvature. By providing the guard ring, the depletion layer relaxes the curvature at the guard ring and shifts to the higher breakdown voltage.

(Embodiment 3) FIG. 5 is a view for explaining still another embodiment of the ink jet head manufacturing process according to the present invention, and since it is almost the same as Embodiment 1, here, Embodiment 1 and The same process is omitted.

In this embodiment, individual electrodes are formed on the vibrating substrate side. For the vibration substrate 20, for example, SOI (silic) is used.
Using an on insulator, impurities are introduced into the silicon active region (2 μm thick) in the same manner as in Example 1 and oxidation is performed to form the protective film 27, and at the same time, the gap spacer 28 is formed. After that, the support substrate is directly bonded to pattern the ink pressurizing chamber region (FIG. 5).
(B)).

By doing so, the manufacturing process can be simplified and the manufacturing period can be shortened. Further, when the SOI substrate is used (Calculation example 2), the PN junction area of the individual electrode is about 5% or less compared to when it is not (Calculation example 1), so that the leak current can be remarkably reduced. . Calculation example 1) Normal PN junction area (lower area) of individual electrode 130 x 2000 + (peripheral area) 130 x
2 × 2 + 2000 × 2 × 2 = 268520 (μm ² ) Calculation example 2) PN junction area (surrounding area) when using an SOI bonded plate 130 × 2 × 2 + 2000 × 2 × 2 = 85
20 (μm ² )

FIG. 6 is a main part configuration diagram for explaining an example of an ink jet recording apparatus equipped with the ink jet head according to the present invention as described above. The ink jet recording apparatus is provided inside the recording apparatus main body 51 in the main scanning direction. Printing mechanism unit 5 including a movable carriage, a recording head including an inkjet head mounted on the carriage, an ink cartridge for supplying ink to the recording head, and the like.
A sheet feeding cassette (or a sheet feeding tray) 54 capable of accommodating a large number of sheets 53 from the front side can be detachably attached to the lower portion of the apparatus main body 51, and the like. The manual feed tray 55 for manually feeding the paper 53 can be opened, and the paper feed cassette 54
Alternatively, the paper 53 fed from the manual feed tray 55 is taken in, the desired image is recorded by the printing mechanism unit 52, and then the paper is ejected to the paper ejection tray 56 mounted on the rear surface side.

The printing mechanism section 52 includes a main guide rod 61 and a sub guide rod 62, which are guide members which are horizontally mounted on the left and right side plates (not shown), to move the carriage 63 in the main scanning direction (see FIG. 6).
An inkjet head that holds slidably in (B) the direction perpendicular to the paper surface and ejects ink droplets of each color of yellow (Y), cyan (C), magenta (M), and black (Bk) onto the carriage 63. The head 64 is formed by arranging a plurality of ink ejection ports in a direction intersecting the main scanning direction, and is mounted with the ink droplet ejection direction facing downward. Further, each ink cartridge 65 for supplying ink of each color to the head 64 is replaceably mounted on the carriage 63.

The ink cartridge 65 has an atmosphere port communicating with the atmosphere above, a supply port supplying ink to the ink jet head below, and a porous body filled with ink inside. The ink supplied to the inkjet head is maintained at a slight negative pressure by the capillary force of.

Although the heads 64 of the respective colors are used here as the recording head, a single head having nozzles for ejecting ink droplets of the respective colors may be used. Furthermore, the head 6
The ink jet head used as No. 4 is a piezo type that presses ink through a vibration plate that forms a wall surface of a liquid chamber with an electromechanical conversion element such as a piezoelectric element, or a bubble type that presses ink by generating bubbles by a heating resistor. Alternatively, it is possible to use an electrostatic type or the like in which the diaphragm is displaced by the electrostatic force between the diaphragm forming the wall surface of the ink flow path and the electrode facing the diaphragm to press the ink. An electrostatic inkjet head is used.

Here, the carriage 63 is slidably fitted to the main guide rod 61 on the rear side (downstream side in the sheet conveying direction) and the front side (downstream side in the sheet conveying direction) on the sub guide rod 6.
2 is slidably mounted. Then, since the carriage 63 is moved and scanned in the main scanning direction, the main scanning motor 6
A timing belt 70 is stretched between a drive pulley 68 and a driven pulley 69 which are rotationally driven by 7, and the timing belt 70 is fixed to the carriage 63. It is driven back and forth.

On the other hand, in order to convey the paper 53 set in the paper feed cassette 54 to the lower side of the head 64, the paper feed roller 71 and the friction pad 72 for separately feeding the paper 53 from the paper feed cassette 54, and the paper 53. A guide member 73 that guides the sheet 53, a conveyance roller 74 that reverses and conveys the fed sheet 53, a conveyance roller 75 that is pressed against the peripheral surface of the conveyance roller 74, and a delivery angle of the sheet 53 from the conveyance roller 74. The front end roller 76 is provided. The conveyance roller 74 is rotationally driven by the sub-scanning motor 77 via a gear train.

A print receiving member 79, which is a paper guide member for guiding the paper 53 sent out from the carrying roller 74 below the recording head 64, is provided in correspondence with the movement range of the carriage 63 in the main scanning direction. There is. A conveyance roller 81 and a spur 82 that are driven to rotate in order to send out the paper 53 in the paper discharge direction are provided on the downstream side of the print receiving member 79 in the paper transport direction, and further, the paper 53 is sent to the paper discharge tray 56. A roller 83, a spur 84, and guide members 85 and 86 that form a paper discharge path are provided.

At the time of recording, by driving the recording head 64 in accordance with the image signal while moving the carriage 63, ink is ejected onto the stopped paper 53 to record one line, and the paper 53 is moved by a predetermined amount. After transportation, the next line is recorded. Upon receiving a recording end signal or a signal that the trailing edge of the paper 53 reaches the recording area, the recording operation is ended and the paper 53 is ejected.

A recovery device 87 for recovering the ejection failure of the head 64 is arranged at a position outside the recording area on the right end side of the carriage 63 in the moving direction. The recovery device has a cap means, a suction means, and a cleaning means. The carriage 63 uses the recovery device 87 while waiting for printing.
The head 64 is moved to the side and the head 64 is capped by the capping means, and the ejection port portion is kept in a wet state to prevent ejection failure due to ink drying. Further, by ejecting ink that is not related to recording during recording or the like, the ink viscosity of all the ejection ports is made constant, and stable ejection performance is maintained.

When an ejection failure occurs, the ejection port of the head 64 is sealed by the capping means, and the bubbles are sucked together with the ink from the ejection port by the suction means through the tube. Is removed by the cleaning means and the ejection failure is recovered. Further, the sucked ink is discharged to a waste ink reservoir (not shown) installed in the lower portion of the main body, and is absorbed and held by an ink absorber inside the waste ink reservoir.

[0045]

EFFECTS OF THE INVENTION Since individual electrodes are formed by ion implantation, PBF coating, or thermal diffusion, silicon processing equipment and technology with high process yield can be used abundantly, and electrodes can be separated by PN junction, which has a proven track record in semiconductor manufacturing. A head with a simple process and high reliability can be manufactured. In addition, the gap length accuracy is improved compared to the conventional electrode formation by patterning and patterning the electrode material, so that it is possible to provide a head with less variation in the vibration characteristics of the diaphragm, and the electrostatic ink jet printer obtained thereby has a high reliability. Highly stable printing is possible.

By making the impurity profile of the individual electrodes double diffused, an electrode structure that can withstand high withstand voltage driving can be obtained, and product design with a high degree of freedom corresponding to the printing characteristics of high voltage stable driving becomes possible. .

By optimizing the impurity profile of the double diffusion of the individual electrode, the layout can be designed minimally, the chip size can be reduced, and the cost can be reduced.

The PN junction leak current on the silicon surface can be suppressed, and a stable drive voltage can be supplied to the individual electrodes. Therefore, highly reliable printing becomes possible.

Since the curvature of the depletion layer of the PN junction generated by applying a voltage to the individual electrode can be alleviated and breakdown can be prevented, a stable drive voltage can be supplied to the individual electrode. Therefore, highly reliable printing is possible. Also,
The leakage current is small and high voltage driving can be performed.

By providing a guard ring of the same type as the individual electrode, the depletion layer relaxes the curvature at the guard ring and shifts to a higher breakdown voltage, so that breakdown of the PN junction can be suppressed (that is, Since the overcurrent can be suppressed), the voltage of the individual electrodes can be stabilized, and highly reliable printing can be performed.

In the formation of the individual electrode pad, if the etching with KOH and the silicon oxide film thereunder are removed when the liquid chamber is formed, the individual electrode can be taken out easily, the manufacturing process can be simplified and the yield can be improved.

By using SOI for the vibrating substrate,
The manufacturing period of the vibration substrate can be shortened and the productivity is improved. Further, a leak current in the depth direction of the diffusion electrode is suppressed by the silicon oxide film (BOX), and a stable and highly reliable head can be manufactured.

[Brief description of drawings]

FIG. 1 is a sectional view of an essential part for explaining a first embodiment of an inkjet head according to the present invention.

FIG. 2 is a schematic view for explaining a part of an embodiment of the manufacturing process of the inkjet head according to the present invention.

FIG. 3 is a schematic view for explaining a continuation of the process shown in FIG. 1 of the manufacturing process of the inkjet head according to the present invention.

FIG. 4 is a process chart of a main part for explaining another embodiment of the inkjet head manufacturing process according to the present invention.

FIG. 5 is a view for explaining still another embodiment of the inkjet head manufacturing process according to the present invention.

FIG. 6 is a main part configuration diagram for explaining an example of an inkjet recording apparatus equipped with an inkjet head according to the present invention.

FIG. 7 is a cross-sectional view of a main part for explaining an example of a conventional electrostatic inkjet head.

[Explanation of symbols]

10 ... Electrode substrate, 11 ... Electrode supporting substrate, 12 ... Silicon oxide film, 13 ... Individual electrode, 14 ... Electrode protective film, 15 ... Gap spacer, 16 ... Electrode pad, 20 ... Vibrating plate (liquid chamber) substrate, 21 ... Vibration plate, 22 ... Insulating film, 23 ... Partition wall,
24 ... Common liquid chamber, 25 ... Ink liquid chamber (pressurizing chamber), 26 ...
Silicon nitride film, 27 ... Protective film, 28 ... Gap spacer, 30 ... Nozzle substrate, 31 ... Nozzle plate, 32 ... Nozzle, 33 ... Fluid resistance path.

Claims (8)

[Claims] 1. A vibrating plate forming a part of a liquid chamber communicating with a nozzle for ejecting a recording liquid, and an electrode supporting substrate on which individual electrodes are opposed to the vibrating plate via a gap. In an ink jet recording head for applying a static voltage between the vibrating plate and an individual electrode to deform the vibrating plate by an electrostatic force to pressurize the recording liquid in the liquid chamber and eject it from the nozzle, The main material of the substrate and the diaphragm is single crystal silicon, and the base electrode, which is the electrode supporting substrate, is doped with a first impurity and the second electrode is doped with a second impurity so as to be diffused. An ink jet head formed by separating a PN junction from a base silicon. 2. The ink jet head according to claim 1, wherein the PN structure from the individual electrode side is a P + region /
The order is P-region / N electrode support substrate or N + region / N-region / P electrode support substrate.
An ink jet head characterized in that individual electrodes are connected to + type base silicon. 3. The ink jet head according to claim 2, wherein the distance between the end of the region where the second impurity is high and the end of the thin region of the impurity concentration profile of the individual electrode is 1.5.
An inkjet head characterized by being separated by at least μm. 4. The inkjet head according to claim 1, wherein a termination peripheral region of the silicon surface of the second impurity of the individual electrode is below the silicon oxide film. 5. The inkjet head according to claim 1, further comprising a guard ring around the individual electrode. 6. The inkjet head according to claim 5, wherein the impurities of the guard ring are formed in the same type as the impurities of the individual electrode. 7. A vibrating plate having a liquid chamber communicating with a nozzle for ejecting a recording liquid on one side and an individual electrode on the other side, and the vibrating plate is opposed to the vibrating plate via a gap. A common electrode substrate is provided, and a static voltage is applied between the individual electrodes on the vibrating plate and the common electrode on the common electrode substrate to deform the vibrating plate by an electrostatic force to remove the recording liquid in the liquid chamber. In an inkjet recording head that pressurizes and ejects from the nozzle, a main material of the common electrode substrate and the diaphragm substrate is single crystal silicon, and a first impurity is added to the base silicon that is the diaphragm substrate to the individual electrodes. An inkjet head, wherein the individual electrode is formed by PN junction separation with respect to the base silicon by doping and diffusing a second impurity. 8. The inkjet head according to claim 7, wherein an SOI (silicon on) is provided on the vibration plate substrate.
An inkjet head characterized by using an insulator.