JP2003093964A - Method for manufacturing release film - Google Patents

Method for manufacturing release film

Info

Publication number
JP2003093964A
JP2003093964A JP2001296257A JP2001296257A JP2003093964A JP 2003093964 A JP2003093964 A JP 2003093964A JP 2001296257 A JP2001296257 A JP 2001296257A JP 2001296257 A JP2001296257 A JP 2001296257A JP 2003093964 A JP2003093964 A JP 2003093964A
Authority
JP
Japan
Prior art keywords
film
release
release agent
roll
polyester film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001296257A
Other languages
Japanese (ja)
Other versions
JP4919139B2 (en
Inventor
Hiroyuki Miyahara
裕之 宮原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP2001296257A priority Critical patent/JP4919139B2/en
Priority to TW91118445A priority patent/TW542786B/en
Publication of JP2003093964A publication Critical patent/JP2003093964A/en
Application granted granted Critical
Publication of JP4919139B2 publication Critical patent/JP4919139B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a method for manufacturing a release film which can remarkably reduce defective products occurring ratio by properly preventing contamination of dust and foreign matter between laminated layers in a ceramic capacitor. SOLUTION: In the method for manufacturing the release film including a process in which after a release agent liquid is applied onto at least one surface of a continuously carried polyester film, the film is dried and then is wound up in a roll shape, before winding up the dried film in the roll shape after drying the film, the release agent liquid applied surface of the polyester film is cleaned. Further in the method for manufacturing the release film including the process in which after the release agent liquid is applied onto at least one surface of the continuously carried polyester film, the film is dried, is wound up in a roll shape and then is cut to a prescribed width, after cutting the film to the prescribed width, the release agent liquid applied surface of the polyester film is cleaned.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は剥離フィルムの製造
方法に関し、詳しくは、セラミックコンデンサの製造に
用いられる剥離フィルムの製造過程において混入するダ
ストや異物を適切に排除することにより、不良の発生率
が飛躍的に低減された剥離フィルムの製造方法に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a release film, and more specifically, by appropriately removing dust and foreign matter mixed in during the manufacturing process of a release film used for manufacturing a ceramic capacitor, the defect occurrence rate is improved. The present invention relates to a method for producing a release film in which the number is dramatically reduced.

【0002】[0002]

【従来の技術】セラミックコンデンサ等のセラミック電
子部品は、例えば、可撓性支持体(剥離フィルム)上
に、ドクターブレード法等によりセラミック粉、有機バ
インダー、可塑剤、溶剤等を含むセラミック塗料を塗布
してグリーンシート(未焼成セラミック誘電体シート)
を成形し、その上に、パラジウム、銀、ニッケル等の電
極をスクリーン印刷により形成する工程により製造する
ことができる。特に、積層構造を有するセラミックコン
デンサを得る場合には、得られたグリーンシートを所望
の積層構造になるように一枚ずつ積層し、プレス切断工
程を経てセラミックグリーンチップを得る。このように
して得られたセラミックグリーンチップ中のバインダー
をバーンアウトし、1000℃〜1400℃で焼成し、
得られた焼成体に銀、銀−パラジウム、ニッケル、銅等
の端子電極を形成して、セラミック電子部品を得る。
2. Description of the Related Art For ceramic electronic parts such as ceramic capacitors, for example, a flexible support (release film) is coated with a ceramic paint containing a ceramic powder, an organic binder, a plasticizer, a solvent, etc. by a doctor blade method or the like. And green sheet (unfired ceramic dielectric sheet)
Can be manufactured by a step of molding, and forming an electrode of palladium, silver, nickel or the like on it by screen printing. In particular, when obtaining a ceramic capacitor having a laminated structure, the obtained green sheets are laminated one by one so as to have a desired laminated structure, and a ceramic green chip is obtained through a press cutting process. The binder in the ceramic green chip thus obtained is burned out and fired at 1000 ° C to 1400 ° C,
Terminal electrodes made of silver, silver-palladium, nickel, copper or the like are formed on the obtained fired body to obtain a ceramic electronic component.

【0003】また、セラミック電子部品を製造する別の
技術として、グリーンシートを可撓性支持体が上になる
ように熱転写する方法や(特開昭63−188926号
公報等)、可撓性支持体上で、グリーンシートを成形す
る工程と、グリーンシート上に電極を印刷する工程と
を、必要な積層数だけ繰り返すことにより積層体を得る
方法が提案されている。
Further, as another technique for manufacturing a ceramic electronic component, there is a method of thermally transferring a green sheet so that the flexible support faces upward (Japanese Patent Laid-Open No. 63-188926), and flexible support. There has been proposed a method for obtaining a laminated body by repeating the step of forming a green sheet on the body and the step of printing electrodes on the green sheet by the required number of layers.

【0004】[0004]

【発明が解決しようとする課題】上記のように何工程も
の積層工程を要するセラミック電子部品、特に、積層セ
ラミックチップコンデンサの製造においては、ダストや
異物等のコンタミの混入が大きな問題点の一つであり、
かかるコンタミの混入防止が製造上の重要な注意点の一
つとなる。積層チップコンデンサは、上述のように誘電
体層と電極層とが交互に多層積層された積層構造を有
し、また、縦・横共に数mm程度と非常に小さなサイズ
であることから、微小なダスト等が各層の間に混入した
場合でも、不良品の発生率が非常に高くなってしまうた
めである。
One of the major problems in the production of ceramic electronic components, especially multilayer ceramic chip capacitors, which require many lamination steps as described above, is contamination by contamination such as dust and foreign matters. And
Prevention of such contamination is one of the important precautions in manufacturing. The multilayer chip capacitor has a laminated structure in which dielectric layers and electrode layers are alternately laminated as described above, and has a very small size of about several mm in both length and width, so it is very small. This is because the occurrence rate of defective products becomes extremely high even if dust or the like is mixed between the layers.

【0005】具体的には、剥離フィルム上にセラミック
塗料を塗布して誘電体層を形成する工程や、その上に電
極層を形成する工程において、剥離層上にダストや異物
の付着が発生した場合に、それらが除去されないまま積
層工程が繰り返されて得られたセラミックコンデンサで
は、ショート不良の発生率が高くなってしまう。
Specifically, in the step of forming a dielectric layer by applying a ceramic coating on a release film, or in the step of forming an electrode layer thereon, dust or foreign matter adheres to the release layer. In this case, in a ceramic capacitor obtained by repeating the lamination process without removing them, the occurrence rate of short-circuit defects increases.

【0006】そこで本発明の目的は、上記問題を解消し
て、セラミックコンデンサの積層層間におけるダストや
異物の混入を適切に防止することにより、不良の発生率
を飛躍的に低減することができる剥離フィルムの製造方
法を提供することにある。
Therefore, an object of the present invention is to solve the above problems and to appropriately prevent dust and foreign matter from being mixed between the laminated layers of the ceramic capacitor, so that the occurrence rate of defects can be dramatically reduced. It is to provide a method for producing a film.

【0007】[0007]

【課題を解決するための手段】上記課題を解決するため
に、本発明の剥離フィルムの製造方法は、連続的に搬送
されるポリエステルフィルムの少なくとも片面に剥離剤
液を塗布した後、乾燥させ、ロール状に巻き取る工程を
含む剥離フィルムの製造方法において、前記乾燥後、前
記ロール状の巻き取り前に、前記ポリエステルフィルム
剥離剤液塗布面をクリーニングすることを特徴とするも
のである。
In order to solve the above-mentioned problems, the method for producing a release film of the present invention comprises applying a release agent solution to at least one side of a polyester film which is continuously conveyed, and then drying the solution. In the method for producing a release film including a step of winding in a roll shape, the polyester film release agent liquid application surface is cleaned after the drying and before the winding in the roll shape.

【0008】また、本発明の他の剥離フィルムの製造方
法は、連続的に搬送されるポリエステルフィルムの少な
くとも片面に剥離剤液を塗布した後、乾燥させ、ロール
状に巻き取った後、所定幅に裁断する工程を含む剥離フ
ィルムの製造方法において、前記所定幅の裁断後に、前
記ポリエステルフィルムの剥離剤液塗布面をクリーニン
グすることを特徴とするものである。
Another method for producing a release film of the present invention is to apply a release agent solution to at least one side of a polyester film that is continuously conveyed, dry it, and wind it into a roll, and then a predetermined width. In the method for producing a release film, which comprises the step of cutting into pieces, the release agent liquid-coated surface of the polyester film is cleaned after cutting to the predetermined width.

【0009】本発明の剥離フィルムの製造方法において
は、前記ポリエステルフィルムの両面をクリーニングす
ることが好適である。
In the method for producing a release film of the present invention, it is preferable to clean both sides of the polyester film.

【0010】本発明に従い、剥離層形成後に、少なくと
も剥離剤液塗布面にクリーニングを施した剥離フィルム
を使用して製造したセラミックコンデンサは、クリーニ
ングなしの剥離フィルムを使用した場合と比較してコン
デンサのショート不良の発生率を格段に低減することが
できる。
According to the present invention, after the release layer is formed, the ceramic capacitor manufactured by using the release film having at least the release agent liquid application surface cleaned is compared with the case where the release film without cleaning is used. The occurrence rate of short-circuit defects can be significantly reduced.

【0011】[0011]

【発明の実施の形態】以下、本発明の具体的な実施の形
態について詳細に説明する。本発明においては、ポリエ
ステルフィルム等の樹脂フィルム上にシリコーン樹脂等
の剥離剤液を塗布、乾燥して剥離層を形成した後、ポリ
エステルフィルムの剥離剤液塗布面をクリーニングす
る。これにより、ショート不良の発生原因となり得る、
製造時におけるセラミックコンデンサ内部へのダストや
異物等の混入を確実に防止することができ、不良発生率
を格段に低減することができる。
BEST MODE FOR CARRYING OUT THE INVENTION Specific embodiments of the present invention will be described in detail below. In the present invention, a release agent solution such as a silicone resin is applied on a resin film such as a polyester film and dried to form a release layer, and then the release agent solution application surface of the polyester film is cleaned. This may cause a short circuit failure,
It is possible to reliably prevent dust, foreign matter, and the like from entering the inside of the ceramic capacitor during manufacturing, and it is possible to significantly reduce the defect occurrence rate.

【0012】クリーニングは、ポリエステルフィルムを
連続的に搬送して、少なくとも片面に剥離層を形成し、
ロール状に巻き取る剥離フィルムの製造工程において、
剥離剤液を塗布し、乾燥、好適には乾燥・硬化させて剥
離層を形成した後、ロール状に巻き取る前に行う。巻き
取ったロールは、その後、別に設けられた工程に移され
て、再度繰り出され、剥離層表面上に誘電体層および電
極層を塗布および印刷により形成するセラミックコンデ
ンサの製造工程に供される。従って、クリーニングは、
剥離層形成後、巻き取る直前に行うことが最も好まし
い。
For cleaning, the polyester film is continuously conveyed to form a release layer on at least one side,
In the manufacturing process of the release film wound into a roll,
The release agent liquid is applied and dried, preferably dried and cured to form a release layer, and then, before the roll is wound. The wound-up roll is then transferred to a separately provided step, re-fed out, and subjected to a manufacturing step of a ceramic capacitor in which a dielectric layer and an electrode layer are formed on the surface of the release layer by coating and printing. Therefore, cleaning
Most preferably, it is performed immediately after winding after the peeling layer is formed.

【0013】また、剥離フィルムを塗布する装置の幅が
誘電体層を塗布する装置の幅よりも広い場合には、剥離
フィルムを形成して巻き取った後に誘電体層の塗布幅に
合うよう剥離フィルムを所定幅に裁断するスリット工程
が行われるが、この場合には、スリット工程により所定
幅に裁断した後にクリーニングを行う。ダストや異物の
混入を確実に排除するためには、可能な限り誘電体層等
の塗布工程の直前にクリーニングを行うことが好ましい
からである。
Further, when the width of the device for applying the release film is wider than that of the device for applying the dielectric layer, the release film is formed and wound up, and then peeled so as to match the applied width of the dielectric layer. A slit process of cutting the film into a predetermined width is performed. In this case, cleaning is performed after cutting the film into a predetermined width by the slit process. This is because it is preferable to perform cleaning immediately before the step of applying the dielectric layer or the like as much as possible in order to reliably remove dust and foreign matter.

【0014】剥離層形成後のポリエステルフィルム(剥
離フィルム)のクリーニングは、剥離剤液塗布側の面に
対し行うことが必要であるが、好ましくは両面につき行
う。即ち、両面に剥離層を形成する場合は当然に両面に
つきクリーニングを行う必要があるが、片面にしか剥離
層を形成しない場合であっても両面をクリーニングする
ことが好ましい。片面の場合には剥離層を形成した面の
みをクリーニングすればダスト等の混入は最低限防止で
きるが、剥離層を形成しない側にダストや異物等が付着
していた場合には、巻き取り等の工程を経る間に再度剥
離層上が汚染されるおそれがあるため、両面につき行う
ことが好適となる。
Cleaning of the polyester film (release film) after formation of the release layer is required to be performed on the surface on which the release agent liquid is applied, but it is preferably performed on both surfaces. That is, when forming the release layers on both sides, it is naturally necessary to perform cleaning on both sides, but it is preferable to clean both sides even when the release layer is formed on only one side. In the case of one side, dust and the like can be prevented at least by cleaning only the surface where the release layer is formed, but if dust or foreign matter is attached to the side where the release layer is not formed, take up the roll etc. Since the peeling layer may be contaminated again during the step (2), it is preferable to perform it on both sides.

【0015】セラミックコンデンサは、剥離フィルムの
剥離層上に、セラミック塗料を塗布して誘電体層を形成
し、この誘電体層上に電極層を印刷し、この二層の形成
工程を少なくとも1回以上繰り返して、剥離フィルムの
剥離層上に誘電体層および電極層を積層することにより
製造するが、本発明においては、好ましくは前記のよう
に、剥離層形成後、巻き取る直前に剥離層表面をクリー
ニングするため、効果的なクリーニングとなる。
In a ceramic capacitor, a ceramic coating is applied on a release layer of a release film to form a dielectric layer, an electrode layer is printed on the dielectric layer, and the step of forming the two layers is performed at least once. Repeating the above, it is produced by laminating the dielectric layer and the electrode layer on the release layer of the release film, but in the present invention, preferably, as described above, the release layer surface immediately after winding after the release layer is formed. The cleaning is effective, so the cleaning is effective.

【0016】クリーニング方法としては、接触式、非接
触式のいずれであってもよく、例えば、図1に示す接触
式クリーニング法または図2に示す非接触式クリーニン
グ法を用いることができる。図1および図2のいずれも
上面側に剥離層が設けられたフィルムを搬送する様子を
示している。図1に示すような接触式の場合、クリーニ
ング材としては不織布が一般的であり、フィルムにキズ
が入らないよう注意して使用する。具体的には図示する
ように、不織布2をロール状に巻いた繰り出しロール3
と、繰り出された不織布2を巻き取るための巻き取りロ
ール4と、不織布2をフィルム1の表面に押し当てるた
めのガイドロール5とを有する装置を使用することが好
ましい。この装置はフィルムの少なくとも剥離層形成側
の面にのみ設置することが必要となるが、図1に示すよ
うに両面に設置することが好ましい。また、ガイドロー
ル5はフィルム1に対する押し当て強さを調節可能なよ
うに位置を変えることができる構造であることが好まし
く、位置を変えることにより、剥離層やポリエステルフ
ィルム表面にキズが入らない範囲で、ダスト等を効率よ
く捕集することが容易となる。
The cleaning method may be either a contact type or a non-contact type, and for example, the contact type cleaning method shown in FIG. 1 or the non-contact type cleaning method shown in FIG. 2 can be used. Both FIG. 1 and FIG. 2 show how a film provided with a release layer on the upper surface side is conveyed. In the case of the contact type as shown in FIG. 1, a non-woven fabric is generally used as a cleaning material, and care should be taken to prevent scratches on the film. Specifically, as shown in the drawing, a feeding roll 3 in which a nonwoven fabric 2 is wound in a roll shape
It is preferable to use an apparatus having a winding roll 4 for winding the unwound nonwoven fabric 2 and a guide roll 5 for pressing the nonwoven fabric 2 against the surface of the film 1. This device needs to be installed only on at least the surface of the film on the side where the release layer is formed, but it is preferably installed on both surfaces as shown in FIG. Further, the guide roll 5 preferably has a structure capable of changing its position so that the pressing strength against the film 1 can be adjusted. By changing the position, the peeling layer or the surface of the polyester film is not damaged. Thus, it becomes easy to efficiently collect dust and the like.

【0017】また、図2に示す非接触式の場合、図示す
るようにガイドロール6を介してフィルム1を搬送しつ
つ、例えば、ウェブクリーナー等のクリーニング装置7
を用いてクリーニングを行う。図示するウェブクリーナ
ーは高速エアー吹き付け機構とバキューム吸引機構とを
備え、高速で空気を吹き付けてフィルム表面に付着した
微粒子サイズのダストや異物を取り除き、これを吸引除
去するタイプのクリーニング方法である。
In the case of the non-contact type shown in FIG. 2, while the film 1 is being conveyed through the guide roll 6 as shown in the drawing, a cleaning device 7 such as a web cleaner is used.
Use to clean. The illustrated web cleaner is a cleaning method of a type that includes a high-speed air blowing mechanism and a vacuum suction mechanism, blows air at high speed to remove fine particle size dust and foreign matter adhering to the film surface, and sucks and removes this.

【0018】尚、図示するいずれのクリーニング方法
も、積層チップコンデンサのように極めて小さいサイズ
で、しかも何層にも積層される製品の歩留まりの向上に
は極めて有効である。
It should be noted that any of the cleaning methods shown in the figures is extremely effective for improving the yield of products that are extremely small in size, such as a multilayer chip capacitor, and that are laminated in many layers.

【0019】[0019]

【実施例】実施例1 〈剥離剤液の調製〉以下に示す配合内容で、ビニル基を
有するポリジメチルシロキサンとハイドロジェンシラン
系化合物との混合物に白金系触媒を加えて付加反応させ
るタイプの硬化型シリコーン(信越化学工業(株)製・
KS−847(H))をメチルエチルケトン(MEK)
およびトルエンの混合溶剤中に溶解させ、全体の固形分
濃度が3.0重量%の剥離剤液(シリコーン樹脂溶液)
を調製した。 信越化学工業(株)製 商品名:KS−847H 300g (固形分濃度30%、樹脂90g) 白金触媒CAT−PL−50T(信越化学工業(株)製) 3.0g MEK/トルエン=50/50(重量比)溶液 2700g
Example 1 <Preparation of release agent liquid> A type of curing in which a platinum-based catalyst is added to a mixture of a vinyl group-containing polydimethylsiloxane and a hydrogensilane-based compound to carry out an addition reaction in the following formulation. Type silicone (manufactured by Shin-Etsu Chemical Co., Ltd.
KS-847 (H)) with methyl ethyl ketone (MEK)
Release agent liquid (silicone resin solution) with a total solids concentration of 3.0 wt% dissolved in a mixed solvent of toluene and toluene
Was prepared. Shin-Etsu Chemical Co., Ltd. product name: KS-847H 300 g (solid content concentration 30%, resin 90 g) Platinum catalyst CAT-PL-50T (Shin-Etsu Chemical Co., Ltd.) 3.0 g MEK / toluene = 50/50 (Weight ratio) solution 2700g

【0020】〈誘電体層塗料の調製〉粒径0.1μm〜
1.0μm程度のチタン酸バリウム、酸化クロム、酸化
イットリウム、炭酸マンガン、炭酸バリウム、炭酸カル
シウム、酸化硅素等の粉末を焼成した後、BaTiO3
100モル%として、Cr23に換算して0.3モル
%、MnOに換算して0.4モル%、BaOに換算して
2.4モル%、CaOに換算して1.6モル%、SiO
2に換算して4モル%、Y23に換算して0.1モル%
の組成になるように混合し、ボールミルにより24時間
混合して、乾燥後、誘電体原料を得た。この誘電体原料
100重量部と、アクリル樹脂5重量部と、塩化メチレ
ン40重量部と、アセトン25重量部と、ミネラルスピ
リット6重量部とを配合し、市販のφ10mmジルコニ
アビーズを用いてポット架台により24時間混合して、
誘電体セラミック塗料(誘電体層塗料)を得た。
<Preparation of coating for dielectric layer> Particle size: 0.1 μm
After firing powder of barium titanate, chromium oxide, yttrium oxide, manganese carbonate, barium carbonate, calcium carbonate, silicon oxide, etc. having a thickness of about 1.0 μm, BaTiO 3
As 100 mol%, 0.3 mol% converted to Cr 2 O 3 , 0.4 mol% converted to MnO, 2.4 mol% converted to BaO, and 1.6 mol converted to CaO. %, SiO
4 mol% when converted to 2 , 0.1 mol% when converted to Y 2 O 3
The resulting mixture was mixed so as to have the composition described above, mixed by a ball mill for 24 hours, and dried to obtain a dielectric material. 100 parts by weight of this dielectric material, 5 parts by weight of acrylic resin, 40 parts by weight of methylene chloride, 25 parts by weight of acetone, and 6 parts by weight of mineral spirit were blended, and commercially available φ10 mm zirconia beads were used to form a pot stand. Mix for 24 hours,
A dielectric ceramic paint (dielectric layer paint) was obtained.

【0021】〈剥離フィルムの作製〉上記剥離剤液を、
バーコーターにて、乾燥後の塗膜厚が0.15μmとな
るように幅100mm、厚さ38μmの2軸延伸ポリエ
チレンテレフタレート(PET)フィルムに塗布し、加
熱温度110℃で40秒間乾燥および硬化反応を行わせ
た。その後、図1に示す接触式クリーニング法にて不織
布(富士紡績(株)製、POLYPAS)を使用してフ
ィルムの両面のクリーニングを行ってから巻き取って、
ロール状に巻回した剥離フィルムを得た。
<Preparation of release film>
Using a bar coater, apply it to a biaxially stretched polyethylene terephthalate (PET) film with a width of 100 mm and a thickness of 38 μm so that the coating film thickness after drying will be 0.15 μm, and dry and cure for 40 seconds at a heating temperature of 110 ° C. Was done. After that, a nonwoven fabric (Fuji Spinning Co., Ltd., POLYPAS) was used to clean both sides of the film by the contact type cleaning method shown in FIG.
A release film wound into a roll was obtained.

【0022】〈誘電体層の形成〉次に、ドクターコート
法を用いて、誘電体層塗料を、剥離フィルムの剥離剤液
塗布面に乾燥後の誘電体層厚が8μmとなるように塗布
し、70℃で20秒間乾燥した後ロール状に巻き取っ
て、誘電体層(グリーンシート)を形成した。
<Formation of Dielectric Layer> Next, using a doctor coat method, a dielectric layer coating material is applied to the release agent liquid application surface of the release film so that the dielectric layer thickness after drying is 8 μm. It was dried at 70 ° C. for 20 seconds and wound into a roll to form a dielectric layer (green sheet).

【0023】〈電極層の印刷〉続いて、上記誘電体層上
に、電極パターンを印刷した。電極には、ニッケル、銅
を主成分とする材料を用いた。電極パターンは個々の電
極が横方向及び縦方向に間隔を隔てて配列されているも
のとした。
<Printing of electrode layer> Subsequently, an electrode pattern was printed on the dielectric layer. A material containing nickel and copper as main components was used for the electrodes. The electrode pattern was such that individual electrodes were arranged at intervals in the horizontal and vertical directions.

【0024】〈剥離・積層工程〉以上の誘電体層形成工
程および電極層印刷工程を実行した後、誘電体層および
電極層を剥離フィルムから剥離した。このようにして得
られた電極付きのグリーンシートを75枚作製して、こ
れらを積層数75層にて積層した。
<Peeling / Laminating Step> After the above-mentioned dielectric layer forming step and electrode layer printing step were carried out, the dielectric layer and the electrode layer were peeled from the release film. Seventy-five green sheets with electrodes thus obtained were produced, and these were laminated in a number of 75 layers.

【0025】〈積層セラミックチップ試料の作製〉上述
のようにして得られた積層グリーンシートを打ち抜き後
プレスし、切断することにより、積層セラミックチップ
を得た。得られた積層セラミックチップを、280℃で
12時間脱バインダし、還元雰囲気中で1300℃にて
2時間焼成した。焼成後得られた積層体に端子電極を形
成した。端子電極の材質は銅を主成分とした。これを窒
素と水素の混合ガス雰囲気中で800℃にて30分間焼
付けし、メッキを行って、積層セラミックチップ試料を
得た。
<Preparation of multilayer ceramic chip sample> The multilayer green sheet obtained as described above was punched, pressed and cut to obtain a multilayer ceramic chip. The obtained multilayer ceramic chip was debindered at 280 ° C. for 12 hours and fired at 1300 ° C. for 2 hours in a reducing atmosphere. A terminal electrode was formed on the laminate obtained after firing. The material of the terminal electrode was copper as a main component. This was baked in a mixed gas atmosphere of nitrogen and hydrogen at 800 ° C. for 30 minutes and plated to obtain a multilayer ceramic chip sample.

【0026】実施例2 接触式クリーニング法としての不織布の代わりに、図2
に示す空気吹き付けタイプの非接触式クリーニング法
(ウェブクリーナー)を用いた以外は実施例1と同様に
して、積層セラミックチップ試料を作製した。
Example 2 Instead of the non-woven fabric as the contact type cleaning method, as shown in FIG.
A multilayer ceramic chip sample was prepared in the same manner as in Example 1 except that the air-blowing type non-contact cleaning method (web cleaner) shown in was used.

【0027】実施例3 剥離層の形成工程において、1000mm幅のPETフ
ィルムを用い、剥離層形成後一旦巻き取ったフィルムの
ロールをスリッターにて100mm幅に裁断した後、再
度ロール状に巻き取る前に同様のクリーニングを行った
以外は実施例1と同様にして、積層セラミックチップ試
料を作製した。
Example 3 In the step of forming a peeling layer, a PET film having a width of 1000 mm was used, and after the peeling layer was formed, a roll of the film once cut into 100 mm width with a slitter and before being wound into a roll again. A laminated ceramic chip sample was produced in the same manner as in Example 1 except that the same cleaning was performed.

【0028】実施例4 剥離層の形成工程において、1000mm幅のPETフ
ィルムを用い、剥離層形成後一旦巻き取ったフィルムの
ロールをスリッターにて100mm幅に裁断した後、再
度ロール状に巻き取る前に同様のクリーニングを行った
以外は実施例2と同様にして、積層セラミックチップ試
料を作製した。
Example 4 In the step of forming a peeling layer, a PET film having a width of 1000 mm was used, and after the peeling layer was formed, a roll of the film once cut into 100 mm width with a slitter and before being wound into a roll again. A laminated ceramic chip sample was prepared in the same manner as in Example 2 except that the same cleaning was performed.

【0029】比較例 クリーニングを全く行わなかった以外は実施例1と同様
にして、積層セラミックチップ試料を作製した。
Comparative Example A laminated ceramic chip sample was prepared in the same manner as in Example 1 except that cleaning was not performed at all.

【0030】ショート不良率 ヒューレットパッカード社製 高抵抗計HP−4329
Aを用いて、20℃にて10V印加し、30秒後に抵抗
値を測定した。絶縁抵抗が1000Ω以下のものをショ
ート不良とし、各試料について、試験に供されたサンプ
ル数に対するショート不良発生数の割合をショート不良
率として表示した。この結果を下記の表1に示す。
Short-circuit defect rate High resistance meter HP-4329 manufactured by Hewlett-Packard Co.
Using A, 10 V was applied at 20 ° C., and the resistance value was measured after 30 seconds. A test piece having an insulation resistance of 1000Ω or less was defined as a short circuit failure, and the ratio of the number of short circuit failure occurrences to the number of samples provided for the test was displayed as a short circuit failure rate for each sample. The results are shown in Table 1 below.

【0031】[0031]

【表1】 [Table 1]

【0032】[0032]

【発明の効果】以上説明してきたように、本発明の剥離
フィルムの製造方法によれば、セラミックコンデンサの
積層層間におけるダストや異物等の混入を適切に防止す
ることにより、不良の発生率を飛躍的に低減することが
できる。
As described above, according to the method for producing a release film of the present invention, the incidence of defects is significantly increased by appropriately preventing the inclusion of dust, foreign matter, etc. between the laminated layers of the ceramic capacitor. Can be reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る接触式クリーニング法の一実施例
を示す概略図である。
FIG. 1 is a schematic view showing an embodiment of a contact type cleaning method according to the present invention.

【図2】本発明に係る非接触式クリーニング法の一実施
例を示す概略図である。
FIG. 2 is a schematic view showing an example of a non-contact cleaning method according to the present invention.

【符号の説明】[Explanation of symbols]

1 フィルム 2 クリーニング材(不織布) 3 繰り出しロール 4 巻き取りロール 5,6 ガイドロール 7 クリーニング装置 1 film 2 Cleaning material (nonwoven fabric) 3 Feeding roll 4 winding roll 5,6 guide roll 7 Cleaning device

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 連続的に搬送されるポリエステルフィル
ムの少なくとも片面に剥離剤液を塗布した後、乾燥さ
せ、ロール状に巻き取る工程を含む剥離フィルムの製造
方法において、 前記乾燥後、前記ロール状の巻き取り前に、前記ポリエ
ステルフィルムの剥離剤液塗布面をクリーニングするこ
とを特徴とする剥離フィルムの製造方法。
1. A method for producing a release film, which comprises the steps of applying a release agent solution to at least one surface of a polyester film that is continuously conveyed, drying the roll, and winding the roll into a roll. The method for producing a release film, which comprises cleaning the release agent liquid-coated surface of the polyester film before winding the film.
【請求項2】 連続的に搬送されるポリエステルフィル
ムの少なくとも片面に剥離剤液を塗布した後、乾燥さ
せ、ロール状に巻き取った後、所定幅に裁断する工程を
含む剥離フィルムの製造方法において、 前記所定幅の裁断後に、前記ポリエステルフィルムの剥
離剤液塗布面をクリーニングすることを特徴とする剥離
フィルムの製造方法。
2. A method for producing a release film, which comprises the steps of applying a release agent solution to at least one surface of a polyester film that is continuously conveyed, drying it, winding it into a roll, and cutting it into a predetermined width. A method for producing a release film, which comprises cleaning the release agent liquid application surface of the polyester film after cutting the predetermined width.
【請求項3】 前記ポリエステルフィルムの両面をクリ
ーニングする請求項1または2記載の剥離フィルムの製
造方法。
3. The method for producing a release film according to claim 1, wherein both surfaces of the polyester film are cleaned.
JP2001296257A 2001-09-27 2001-09-27 Method for producing release film for producing ceramic capacitor Expired - Lifetime JP4919139B2 (en)

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JP2001296257A JP4919139B2 (en) 2001-09-27 2001-09-27 Method for producing release film for producing ceramic capacitor
TW91118445A TW542786B (en) 2001-09-27 2002-08-15 Method for manufacturing release film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001296257A JP4919139B2 (en) 2001-09-27 2001-09-27 Method for producing release film for producing ceramic capacitor

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011206999A (en) * 2010-03-29 2011-10-20 Tdk Corp Method for manufacturing peeling film, method for manufacturing ceramic component sheet, and method for manufacturing ceramic component
JP2015228036A (en) * 2015-07-24 2015-12-17 住友化学株式会社 Foreign matter removal device
US9395559B2 (en) 2005-02-14 2016-07-19 Johnson & Johnson Vision Care, Inc. Comfortable ophthalmic device and methods of its production

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007052387A1 (en) 2005-11-04 2007-05-10 Tokyo Seimitsu Co., Ltd. Film peeling method and film peeling apparatus
TWI651469B (en) 2017-02-08 2019-02-21 吳樹木 Air pumping device with automatic opening and closing air reservoir vent function

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05213506A (en) * 1992-02-04 1993-08-24 Mitsubishi Paper Mills Ltd Dust removing method for web
JPH0991692A (en) * 1995-09-26 1997-04-04 Sony Corp Surface treatment of magnetic recording medium and device for surface treatment
JP2000006353A (en) * 1998-06-25 2000-01-11 Teijin Ltd Mold release film
JP2000288483A (en) * 1999-04-05 2000-10-17 Fuji Photo Film Co Ltd Dust removing method of long-length flexible sheet

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05213506A (en) * 1992-02-04 1993-08-24 Mitsubishi Paper Mills Ltd Dust removing method for web
JPH0991692A (en) * 1995-09-26 1997-04-04 Sony Corp Surface treatment of magnetic recording medium and device for surface treatment
JP2000006353A (en) * 1998-06-25 2000-01-11 Teijin Ltd Mold release film
JP2000288483A (en) * 1999-04-05 2000-10-17 Fuji Photo Film Co Ltd Dust removing method of long-length flexible sheet

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9395559B2 (en) 2005-02-14 2016-07-19 Johnson & Johnson Vision Care, Inc. Comfortable ophthalmic device and methods of its production
JP2011206999A (en) * 2010-03-29 2011-10-20 Tdk Corp Method for manufacturing peeling film, method for manufacturing ceramic component sheet, and method for manufacturing ceramic component
JP2015228036A (en) * 2015-07-24 2015-12-17 住友化学株式会社 Foreign matter removal device

Also Published As

Publication number Publication date
JP4919139B2 (en) 2012-04-18
TW542786B (en) 2003-07-21

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