JP2003080028A - Method for treating gas and apparatus used therefor - Google Patents
Method for treating gas and apparatus used thereforInfo
- Publication number
- JP2003080028A JP2003080028A JP2001281500A JP2001281500A JP2003080028A JP 2003080028 A JP2003080028 A JP 2003080028A JP 2001281500 A JP2001281500 A JP 2001281500A JP 2001281500 A JP2001281500 A JP 2001281500A JP 2003080028 A JP2003080028 A JP 2003080028A
- Authority
- JP
- Japan
- Prior art keywords
- light
- processing
- gas
- agent
- chlorine gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 29
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 43
- 230000001678 irradiating effect Effects 0.000 claims abstract description 16
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 10
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 claims description 45
- 238000012545 processing Methods 0.000 claims description 42
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 39
- 239000007788 liquid Substances 0.000 claims description 37
- 238000006243 chemical reaction Methods 0.000 claims description 17
- 239000000243 solution Substances 0.000 claims description 17
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical group Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 claims description 16
- 239000007864 aqueous solution Substances 0.000 claims description 13
- 239000003054 catalyst Substances 0.000 claims description 8
- 238000003672 processing method Methods 0.000 claims description 8
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 3
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 claims description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 3
- 239000000376 reactant Substances 0.000 claims description 3
- 239000005337 ground glass Substances 0.000 claims 2
- 239000000460 chlorine Substances 0.000 abstract description 40
- 229910052801 chlorine Inorganic materials 0.000 abstract description 37
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract description 34
- 239000000126 substance Substances 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 30
- 238000010521 absorption reaction Methods 0.000 description 14
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 7
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- 238000000354 decomposition reaction Methods 0.000 description 5
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 5
- -1 polypropylene Polymers 0.000 description 5
- 239000005708 Sodium hypochlorite Substances 0.000 description 4
- 239000006227 byproduct Substances 0.000 description 4
- 150000004045 organic chlorine compounds Chemical class 0.000 description 4
- 238000005273 aeration Methods 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000013505 freshwater Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000002896 organic halogen compounds Chemical class 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 239000002351 wastewater Substances 0.000 description 2
- 238000004065 wastewater treatment Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 1
- 102100032566 Carbonic anhydrase-related protein 10 Human genes 0.000 description 1
- 102100033029 Carbonic anhydrase-related protein 11 Human genes 0.000 description 1
- 101150000715 DA18 gene Proteins 0.000 description 1
- 101000867836 Homo sapiens Carbonic anhydrase-related protein 10 Proteins 0.000 description 1
- 101000867841 Homo sapiens Carbonic anhydrase-related protein 11 Proteins 0.000 description 1
- 101001075218 Homo sapiens Gastrokine-1 Proteins 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000007844 bleaching agent Substances 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- UKLNMMHNWFDKNT-UHFFFAOYSA-M sodium chlorite Chemical compound [Na+].[O-]Cl=O UKLNMMHNWFDKNT-UHFFFAOYSA-M 0.000 description 1
- 229960002218 sodium chlorite Drugs 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Catalysts (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、ガスを液相に吸収
して除去し、さらに液相においてガス成分を分解する方
法及び装置に関する。特に、塩素ガスを、効率的にしか
も環境安全性よく吸収処理し、かつ該吸収塩素分を分解
処理する方法に関するものである。詳しくは、有機塩素
化合物を光分解処理する際、浄化ガスに含まれる塩素ガ
ス、または、半導体プロセスにおけるの反応によって発
生する塩素ガスの処理方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for absorbing and removing gas in a liquid phase and further decomposing gas components in the liquid phase. In particular, the present invention relates to a method for efficiently absorbing chlorine gas with good environmental safety and decomposing the absorbed chlorine content. More specifically, the present invention relates to a method of treating chlorine gas contained in a purification gas or chlorine gas generated by a reaction in a semiconductor process when an organic chlorine compound is photolytically decomposed.
【０００２】[0002]
【従来の技術】有機塩素化合物等の分解のための技術と
して、例えば、有機ハロゲン化合物を含む排ガスを紫外
線照射処理して酸性の分解ガスとした後、アルカリで洗
浄して無害化処理する方法（特開昭６２−１９１０２５
号公報）、有機ハロゲン化合物を含有する排水を曝気処
理し、排出されるガスを紫外線照射した後、アルカリ洗
浄する装置（特開昭６２−１９１０９５号公報）等が提
案されている。また、塩素ガスを含む気体と分解される
べき気体状有機塩素化合物とを混合せしめ、該混合気体
に対して光照射する気体状有機塩素化合物の分解浄化装
置が提案されている。いずれの方法においても分解処理
後に塩素ガスが残り、これらはアルカリ処理されてい
る。これらの処理原理は、以下に述べる半導体プロセス
で発生する塩素ガスの処理同様である。2. Description of the Related Art As a technique for decomposing organic chlorine compounds and the like, for example, a method of irradiating exhaust gas containing an organic halogen compound with ultraviolet rays to make it into an acidic decomposition gas, followed by washing with an alkali to detoxify it ( JP-A-62-191025
Japanese Patent Laid-Open No. 62-191095), a device for aeration-treating waste water containing an organic halogen compound, irradiating the discharged gas with ultraviolet rays, and then washing with an alkali (JP-A-62-191095). Further, there has been proposed a device for decomposing and purifying a gaseous organic chlorine compound in which a gas containing chlorine gas is mixed with a gaseous organic chlorine compound to be decomposed and the mixed gas is irradiated with light. In either method, chlorine gas remains after the decomposition treatment, and these are alkali-treated. These processing principles are the same as the processing of chlorine gas generated in the semiconductor process described below.
【０００３】半導体プロセスでおこなわれる塩素ガスの
処理は、一般的なガス処理に用いられる排ガススクラバ
ーによって処理が行われ、水酸化ナトリウム水溶液を反
応させて処理を行っている。その処理方法の一例を説明
すると、排ガススクラバーに、最大１００ｐｐｍ、平均
で３０〜４０ｐｐｍの塩素ガスを本体下部から処理風量
３０ｍ３／ｍｉｎで連続して送り込み、本体中央部にラ
シヒリングが充填された上方から２〜５％水酸化ナトリ
ウム水溶液を最下部液層からポンプにて循環噴射し、ス
クラバー内ミストの濃度をｐＨ１１〜１２に調整制御し
ながら反応させ、反応後のガスをスクラバー最上部の排
出筒から排出する。この時の主な反応は以下のようであ
る。The chlorine gas treatment performed in the semiconductor process is performed by an exhaust gas scrubber used for general gas treatment, and the treatment is carried out by reacting an aqueous sodium hydroxide solution. Explaining one example of the treatment method, chlorine gas having a maximum of 100 ppm and an average of 30 to 40 ppm is continuously fed into the exhaust gas scrubber from a lower portion of the main body at a treatment air volume of 30 m 3 / min, and an upper portion filled with Raschig rings in a central portion of the main body. 2-5% aqueous sodium hydroxide solution is circulated and injected from the lowermost liquid layer by a pump, and the reaction is performed while adjusting the concentration of mist in the scrubber to pH 11 to 12, and the gas after the reaction is discharged at the top of the scrubber. Discharge from. The main reactions at this time are as follows.
【０００４】 Ｃｌ２＋２ＮａＯＨ→ＮａＣｌ＋ＮａＣｌＯ＋Ｈ２ＯCl 2 +2 NaOH → NaCl + NaClO + H 2 O
【０００５】[0005]
【発明が解決しようとする課題】しかしながら、上記し
た従来の塩素ガス処理方法では以下のような不具合があ
った。上記反応式から分かるように、副生成物として次
亜塩素酸ナトリウム（ＮａＣｌＯ）が発生する。該塩素
化合物は漂白剤や水道水の殺菌に使われることから分か
るように酸化力が非常に強い。このため塩素処理後の副
生成物を含んだ排水をそのままＢＯＤ処理のための曝気
処理槽を持つ総合排水処理システムに送水すると曝気処
理槽内のバクテリアに悪影響を与えてしまう虞れがあ
る。However, the above-mentioned conventional chlorine gas treatment method has the following problems. As can be seen from the above reaction formula, sodium hypochlorite (NaClO) is generated as a by-product. The chlorine compound has a very strong oxidizing power as can be seen from the fact that it is used for bleaching agent and tap water sterilization. Therefore, if the wastewater containing the by-products after the chlorine treatment is sent as it is to the integrated wastewater treatment system having an aeration treatment tank for BOD treatment, there is a risk that bacteria in the aeration treatment tank will be adversely affected.
【０００６】また、次亜塩素酸ナトリウムが高濃度にな
ると、次亜塩素酸の濃度が増大し、これは塩素発生の源
となりうる。特に、処理状況によって一部の酸が混入す
るなどしてｐＨの変動が見られたときは次亜塩素酸から
塩素が発生する危険性がある。Further, when the concentration of sodium hypochlorite increases, the concentration of hypochlorous acid increases, which can be a source of chlorine generation. In particular, there is a risk that chlorine will be generated from hypochlorous acid when a change in pH is observed due to the mixing of some acids depending on the treatment conditions.
【０００７】本発明は以上述べた従来の処理方法が有す
る問題点を解決するべく、簡便な処理により副生成物に
問題のないコストの低い塩素ガス処理方法を提供するこ
とを課題とする。An object of the present invention is to provide a low-cost chlorine gas treatment method in which there are no problems with by-products by a simple treatment in order to solve the problems of the above-mentioned conventional treatment methods.
【０００８】[0008]
【課題を解決するための手段】この目的を達成するため
の本発明による処理装置は、塩素ガスと処理剤と接触さ
せて塩素ガスを吸収し除去する処理装置において、塩素
ガスと処理剤との反応物に光を照射する手段を有する処
理装置である。A processing apparatus according to the present invention for achieving the above object is a processing apparatus for contacting chlorine gas with a processing agent to absorb and remove the chlorine gas. It is a processing apparatus having means for irradiating a reactant with light.
【０００９】さらに、この処理装置が、処理剤を循環す
る手段と、塩素ガスと処理剤を接触させる反応層と、処
理剤を貯留する液槽と、塩素ガスの流入手段及び処理後
のガスを排出する手段からなる処理装置である。Further, the processing apparatus includes a means for circulating the processing agent, a reaction layer for contacting the chlorine gas with the processing agent, a liquid tank for storing the processing agent, an inflow means for the chlorine gas and a gas after the processing. It is a processing device comprising a discharging means.
【００１０】処理剤がアルカリ性水溶液を含む処理装置
である。A processing apparatus in which the processing agent contains an alkaline aqueous solution.
【００１１】また、光照射手段からの光を反射し反応物
に光を照射する、光反射手段を有する処理装置である。Further, the processing apparatus has a light reflecting means for reflecting the light from the light irradiating means and irradiating the reactant with the light.
【００１２】また、本発明による処理方法は、塩素ガス
と処理剤と接触させて塩素ガスを吸収し除去する処理装
置において、塩素ガスと処理剤との反応物に光を照射す
る工程を有する処理方法である。Further, the treatment method according to the present invention is a treatment apparatus in which chlorine gas and a treatment agent are brought into contact with each other to absorb and remove the chlorine gas, and the treatment method includes a step of irradiating a reaction product of the chlorine gas and the treatment agent with light. Is the way.
【００１３】さらに、この処理方法が、処理剤を循環す
る工程と、塩素ガスと処理剤を接触させる反応工程と、
処理剤を貯留する工程と、塩素ガスの流入工程及び処理
後のガスを排出する工程からなるの処理方法である。Further, this treatment method comprises a step of circulating a treatment agent, a reaction step of contacting chlorine gas with the treatment agent,
The treatment method comprises a step of storing a treatment agent, a step of inflowing chlorine gas, and a step of discharging gas after treatment.
【００１４】処理剤がアルカリ性水溶液である処理方法
で、光を照射する反応物が次亜塩素酸塩である。In the treatment method in which the treatment agent is an alkaline aqueous solution, the reaction product irradiated with light is hypochlorite.
【００１５】光を照射する工程で照射する光が、波長３
００〜５００ｎｍの波長域の光を含む光である処理方法
である。The light emitted in the step of irradiating light has a wavelength of 3
It is a processing method that is light including light in the wavelength range of 00 to 500 nm.
【００１６】また、処理剤が光照射下で触媒と接触する
工程をもつ処理方法である。Further, it is a treatment method having a step of bringing the treatment agent into contact with the catalyst under light irradiation.
【００１７】尚、本発明の処理方法を実施するのに使用
する装置としては、排ガスの処理装置として一般的に使
用されている排ガススクラバーを使用することができ
る。As an apparatus used for carrying out the treatment method of the present invention, an exhaust gas scrubber generally used as an exhaust gas treatment apparatus can be used.
【００１８】[0018]
【作用】塩素ガスの処理に上記手段を用いると次の作用
を生じる。塩素ガス中と接触した処理剤中の水酸化ナト
リウムは、下記の（１）式に示すように反応し、次亜塩
素酸ナトリウムが生成される。そして、次亜塩素酸ナト
リウムは直ちに照射される光と反応し、下記の（２）式
に示すように塩化ナトリウムと酸素に分解し、従来処理
方法の反応において発生し処理に課題のあった次亜塩素
酸ナトリウムは結果的には生成されない。請求項に記載
内容を実行することにより従来と異なり、塩素処理の際
に発生する副生成物である排液を直接総合排水処理設備
へ送液可能となったことで、２次処理が不要でコストの
低い塩素ガス処理が実現した。
（１）Ｃｌ２＋２ＮａＯＨ→ＮａＣｌ＋ＮａＣｌＯ＋Ｈ２Ｏ
（２）２ＮａＣｌＯ→２ＮａＣｌ＋Ｏ２ When the above means is used for the treatment of chlorine gas, the following action will occur. Sodium hydroxide in the treating agent that has come into contact with chlorine gas reacts as shown in the following formula (1) to produce sodium hypochlorite. Then, sodium hypochlorite immediately reacts with the light to be irradiated, decomposes into sodium chloride and oxygen as shown in the following formula (2), and is generated in the reaction of the conventional treatment method. Sodium chlorite is consequently not produced. By executing the contents of the claims, unlike the conventional method, the waste liquid, which is a by-product generated during chlorine treatment, can be directly sent to the integrated wastewater treatment facility, which eliminates the need for secondary treatment. A low cost chlorine gas treatment has been realized. (1) Cl 2 +2 NaOH → NaCl + NaClO + H 2 O (2) 2NaClO → 2NaCl + O 2
【００１９】[0019]
【発明の実施の形態】以下、実施の形態の一例について
図１を用いて説明する。吸収塔１の下方には被処理ガス
（塩素ガス）の流入口２があり、最上部の処理済みガス
の排出管３へと繋がっている。吸収塔１の内側中央部に
は直径約２５ｍｍのポリプロピレン製ラシヒリングが多
数充填された反応層４が設置され、被処理ガスとシャワ
ー状に噴射される処理剤の反応時の接触性を高めてい
る。又、吸収塔１の下部には、水酸化ナトリウム水溶液
からなる処理剤を循環させるための液槽５が配置され、
ラシヒリング層上部には液槽からポンプ６を介して管で
接続された処理剤噴射口７が設置されている。吸収塔１
内の液槽５には光照射手段８により光が照射される。ま
た吸収塔１の外部には処理剤を液槽に供給するためのタ
ンク等からなる処理剤供給装置９が設置されている。BEST MODE FOR CARRYING OUT THE INVENTION An example of an embodiment will be described below with reference to FIG. Below the absorption tower 1 is an inlet 2 for the gas to be treated (chlorine gas), which is connected to the discharge pipe 3 for the uppermost treated gas. A reaction layer 4 filled with a large number of polypropylene Raschig rings having a diameter of about 25 mm is installed in the center of the inside of the absorption tower 1 to enhance the contact property at the time of reaction between the gas to be treated and the treatment agent injected in the shower shape. . Further, a liquid tank 5 for circulating a treatment agent composed of an aqueous sodium hydroxide solution is arranged below the absorption tower 1,
A treatment agent injection port 7 connected by a pipe from a liquid tank via a pump 6 is installed above the Raschig ring layer. Absorption tower 1
The liquid tank 5 therein is irradiated with light by the light irradiation means 8. A processing agent supply device 9 including a tank for supplying the processing agent to the liquid tank is installed outside the absorption tower 1.
【００２０】発生した塩素ガスは、吸収塔１のガス流入
口から一定流量１ｍ３／ｍｉｎで吸収塔１の内部に送り
込まれる。この時の平均濃度は８０〜１２０ｐｐｍであ
る。送り込まれた塩素ガスは吸収塔１の上方に向かって
流れラシヒリング層部で、液槽５からポンプ６で圧送さ
れ下方に向かってノズル７から噴射された処理剤と混ざ
り合い反応が行われる。この時の処理剤の循環流量はお
およそ０．５Ｌ／ｍｉｎ，濃度は水酸化ナトリウム、１
０％であり、これは塩素ガスの排出濃度の変動に対応す
るため濃い目の濃度に設定してある。The generated chlorine gas is fed into the absorption tower 1 at a constant flow rate of 1 m 3 / min from the gas inlet of the absorption tower 1. The average concentration at this time is 80 to 120 ppm. The chlorine gas fed in flows upward in the absorption tower 1, in the Raschig ring layer portion, is pumped from the liquid tank 5 by the pump 6 and mixed downward with the treatment agent injected from the nozzle 7 to carry out a reaction. The circulating flow rate of the treating agent at this time is approximately 0.5 L / min, the concentration is sodium hydroxide, 1
It is 0%, which is set to a darker concentration in order to cope with the fluctuation of the chlorine gas emission concentration.
【００２１】処理されたガスは吸収塔１上部の排出管３
から大気中へ放出されるが、処理が進むにつれ処理剤の
濃度が低くなってくる。このため処理剤供給装置から適
宜所要の水酸化ナトリウムを注入する。光照射は、３０
０ｎｍ以上の波長の光を放出するブラックライト蛍光ラ
ンプを用いて液槽内の塩素吸収溶液におこなう。尚、吸
収塔１から大気中に蒸発する水分を補給するために、液
槽へ適宜、新水を補給する。このように処理を行った時
の大気中への放出ガスの塩素濃度は、処理前入口濃度１
２０ｐｐｍの時で０．１ｐｐｍ以下であった。また、液
槽内の塩素吸収溶液中の残留塩素濃度は１ｍｇ／ｌ以下
であった。The treated gas is discharged into the exhaust pipe 3 above the absorption tower 1.
Is released into the atmosphere, the concentration of the treatment agent becomes lower as the treatment progresses. Therefore, the required sodium hydroxide is appropriately injected from the treatment agent supply device. Light irradiation is 30
The chlorine absorbing solution in the liquid tank is exposed using a black light fluorescent lamp that emits light with a wavelength of 0 nm or more. In order to replenish the water vaporized from the absorption tower 1 to the atmosphere, fresh water is replenished to the liquid tank as appropriate. The chlorine concentration of the gas released into the atmosphere when treated in this way is 1
It was 0.1 ppm or less at 20 ppm. The residual chlorine concentration in the chlorine absorbing solution in the liquid tank was 1 mg / l or less.
【００２２】（光照射手段）本発明に用いることのでき
る光照射手段としては、塩素ガスの吸収に用いる処理剤
によって生じる反応物、例えば次亜塩素酸塩を分解する
ものなら如何なるものでも良いが、例えば、波長３００
〜５００ｎｍの光が好ましく、３５０〜４５０ｎｍの光
を用いるのがより好ましい。また塩素ガスを吸収したと
きに生じた次亜塩素酸塩を分解する光照射強度として
は、波長３６０ｎｍ近辺にピークを持つ光源の例では、
数百μＷ／ｃｍ２（３００ｎｍ〜４００ｎｍ間を測定）
の強度で実用上十分の分解が進む。(Light Irradiating Means) As the light irradiating means which can be used in the present invention, any means may be used so far as it decomposes a reaction product generated by a treating agent used for absorbing chlorine gas, for example, hypochlorite. , For example, wavelength 300
Light of ˜500 nm is preferable, and light of 350 to 450 nm is more preferably used. Further, as the light irradiation intensity for decomposing hypochlorite generated when chlorine gas is absorbed, in the example of the light source having a peak near the wavelength of 360 nm,
Several hundred μW / cm 2 (measured between 300 nm and 400 nm)
With sufficient strength, practically sufficient decomposition proceeds.
【００２３】光の照射量は、１０μＷ／ｃｍ２〜１０ｍ
Ｗ／ｃｍ２より詳しくは、５０μＷ／ｃｍ２〜５ｍＷ／
ｃｍ２が望ましい。The light irradiation amount is 10 μW / cm 2 to 10 m
For more than W / cm 2 is, 50μW / cm 2 ~5mW /
cm 2 is desirable.
【００２４】本発明では光として人体に影響の大きい２
５０ｎｍ付近若しくはそれ以下の波長の紫外光を用いる
必要が全くないため光照射をおこなう液槽等にガラスや
プラスティック等の使用が可能である。In the present invention, the light has a great influence on the human body.
Since it is not necessary to use ultraviolet light having a wavelength of about 50 nm or less, glass, plastic, or the like can be used in a liquid tank or the like for light irradiation.
【００２５】そしてこの様な光の光源としては自然光
（例えば、太陽光等）または人工光（水銀ランプ、ブラ
ックライト、カラー蛍光ランプ、短波長（５００ｎｍ以
下）発光ダイオード等）を用いることができる。As a light source of such light, natural light (for example, sunlight) or artificial light (mercury lamp, black light, color fluorescent lamp, short wavelength (500 nm or less) light emitting diode, etc.) can be used.
【００２６】光照射は液槽の外部から行なっても良い
し、鞘管などを用いて内部から照射しても良い。The light irradiation may be performed from the outside of the liquid tank, or may be performed from the inside by using a sheath tube or the like.
【００２７】光照射を効率的におこなうため、実施形態
に示すように液槽部全体を反射鏡もしくは光反射素材で
覆うと良い。In order to efficiently perform light irradiation, it is preferable to cover the entire liquid tank section with a reflecting mirror or a light reflecting material as shown in the embodiment.
【００２８】光照射は液槽に限らず、吸収塔内の気液接
触時におこなっても良い。またポンプによる循環経路内
に光照射を行なっても良いし、液槽５からの排水部に光
照射をおこなってもよい。The light irradiation is not limited to the liquid tank, and may be performed at the time of gas-liquid contact in the absorption tower. Further, the pump may irradiate light into the circulation path, or the drainage from the liquid tank 5 may be irradiated with light.
【００２９】光による分解反応を促進するために、液槽
内に粉砕したガラス、白金黒等の触媒を混入することも
効果的である。In order to accelerate the decomposition reaction by light, it is also effective to mix a catalyst such as crushed glass or platinum black in the liquid tank.
【００３０】［塩素吸収手段：処理剤］処理剤の一形態
である水溶液と排出された塩素を含む浄化ガスとの接触
手段はいかなる形態でもよいが、上記の吸収塔等の反応
層よる気液の接触以外に、例えば、アルカリ性の水溶液
中に塩素を含むガスを導入したり、これを用いて曝気し
たりして気液の接触をしてもよい。[Chlorine Absorbing Means: Treating Agent] The means for contacting the aqueous solution, which is one form of the treating agent, with the discharged purified gas containing chlorine may be any form, but the gas-liquid by the reaction layer such as the absorption tower is In addition to the above contact, for example, a gas containing chlorine may be introduced into an alkaline aqueous solution, or aeration may be performed using the gas to contact the gas and the liquid.
【００３１】塩素ガスの吸収に用いる処理剤は、塩素と
反応し溶液中に塩素を吸収するもので、アルカリ性の水
溶液が望ましく、例えば水酸化ナトリウム溶液、水酸化
カルシウム溶液、水酸化カリウム溶液溶液等が使用でき
る。その濃度は、吸収する塩素量に合わせて設定すれば
良いが、ｐＨで８以上１２以下が望ましい。それに続く
光反応で分解し得る次亜塩素酸塩を塩素との間で生成す
るものが望ましい。The treating agent used for absorbing chlorine gas absorbs chlorine in the solution by reacting with chlorine, and an alkaline aqueous solution is desirable. For example, sodium hydroxide solution, calcium hydroxide solution, potassium hydroxide solution solution, etc. Can be used. The concentration may be set according to the amount of chlorine to be absorbed, but a pH of 8 or more and 12 or less is desirable. Those which form hypochlorite with chlorine which can be decomposed by the subsequent photoreaction are desirable.
【００３２】勿論、アルカリ性の水溶液の選定に当たっ
ては、塩素吸収手段であるアルカリ水溶液から塩素ガス
が排出されないように注意しなくてはならない。Of course, in selecting an alkaline aqueous solution, care must be taken so that chlorine gas is not discharged from the alkaline aqueous solution which is the chlorine absorbing means.
【００３３】本発明によれば、光の照射によって反応物
である次亜塩素酸塩は塩素イオンに分解される。次亜塩
素酸塩は条件により簡単に塩素ガスを発生するが、塩素
イオンとなることでこの危険性は回避できる。また、次
亜塩素酸が分解されることで、次亜塩素酸の殺菌能力及
び酸化力からくる弊害を除去することができる。According to the present invention, the reaction product, hypochlorite, is decomposed into chlorine ions by irradiation with light. Hypochlorite easily generates chlorine gas depending on the conditions, but this danger can be avoided by becoming chlorine ions. Further, by decomposing the hypochlorous acid, it is possible to remove the harmful effects caused by the bactericidal ability and oxidizing power of the hypochlorous acid.
【００３４】次亜塩素酸を分解する手段としては、亜硫
酸ナトリウム等の薬剤を使用する例（特開平０７−０９
６１３３号公報）などもあるが、この方法では、薬剤供
給を常におこなうなどの装置稼動上のメンテナンスが必
要であり、また反応過程での硫化物への注意も必要であ
る。As a means for decomposing hypochlorous acid, an example of using a chemical agent such as sodium sulfite (JP-A-07-09)
6133) and the like, but this method requires maintenance on the operation of the apparatus such as always supplying a drug, and attention to sulfides in the reaction process.
【００３５】上記、塩素ガスの吸収とそれに伴う反応化
合物の光分解による塩素イオンの生成という本発明の構
成は、塩素ガスに限らず、他のハロゲンガスの処理にも
使用することができる。以下、本発明を更に詳しく説明
する。The above-mentioned constitution of the present invention of generating chlorine ions by absorbing chlorine gas and photolyzing the reaction compound accompanied therewith can be used not only for chlorine gas but also for treatment of other halogen gas. Hereinafter, the present invention will be described in more detail.
【００３６】（実施形態１）図２は本実施形態の概略図
である。(Embodiment 1) FIG. 2 is a schematic view of this embodiment.
【００３７】光照射手段８が図１の例では、液槽５の外
側に設置され外側から光照射をおこなっているが、本実
施形態では、液槽５の内側から照射している以外は、図
１とほぼ同様の稼動条件及び構成をしている。In the example of FIG. 1, the light irradiation means 8 is installed outside the liquid tank 5 and performs light irradiation from the outside, but in the present embodiment, except that irradiation is performed from the inside of the liquid tank 5, The operating conditions and the configuration are almost the same as those in FIG.
【００３８】光照射は、３００ｎｍ以上の波長の光を放
出するブラックライト蛍光ランプ（東芝製：ＦＬ２０Ｓ
・ＢＬＢ）を用い、このランプを３００ｎｍ以上の波長
の光を透過するガラス容器の中に設置して、この光照射
ユニット（図２中の８）を液槽内に配し、内側から光照
射をおこなう。尚、吸収塔１から大気中に蒸発する水分
を補給するために、液槽へ適宜、新水を補給する。The light irradiation is a black light fluorescent lamp (Toshiba: FL20S, which emits light with a wavelength of 300 nm or more).
BLB), this lamp is installed in a glass container that transmits light with a wavelength of 300 nm or more, and this light irradiation unit (8 in FIG. 2) is placed in the liquid tank and light is irradiated from the inside. Perform. In order to replenish the water vaporized from the absorption tower 1 to the atmosphere, fresh water is replenished to the liquid tank as appropriate.
【００３９】液槽部の溶液量を２００リットルとし、光
照射ユニット内のブラックライト蛍光ランプの本数を１
２本とした。また、１日の水酸化ナトリウムの使用量は
１０％水酸化ナトリウムで５Ｌであった。The amount of solution in the liquid tank is 200 liters, and the number of black light fluorescent lamps in the light irradiation unit is 1.
I made two. The daily usage of sodium hydroxide was 5 L with 10% sodium hydroxide.
【００４０】このように処理を行った時の大気中への放
出ガスの塩素濃度は、処理前入口濃度８０ｐｐｍの時で
０．１ｐｐｍ以下であった。また、液槽内の塩素吸収溶
液中の残留塩素濃度もしくは液槽から排出される溶液の
残留塩素濃度は常に１０ｍｇ／ｌ以下であった。The chlorine concentration of the gas released into the atmosphere when the treatment was performed as described above was 0.1 ppm or less when the inlet concentration before treatment was 80 ppm. Further, the residual chlorine concentration in the chlorine absorbing solution in the liquid tank or the residual chlorine concentration in the solution discharged from the liquid tank was always 10 mg / l or less.
【００４１】比較例１
光照射の効果を確かめるため、光照射手段を取り除いた
以外はほぼ実施形態１と同様の実験をおこなったとこ
ろ、大気中への放出ガスの塩素濃度は、処理前入口濃度
８０ｐｐｍの時で０．１ｐｐｍ以下であったが、液槽内
の塩素吸収溶液中の残留塩素濃度もしくは液槽から排出
される溶液の残留塩素濃度は３０００〜４０００ｍｇ／
ｌであった。Comparative Example 1 In order to confirm the effect of light irradiation, an experiment similar to that of the first embodiment was carried out except that the light irradiation means was removed, and the chlorine concentration of the gas released into the atmosphere was found to be the concentration before treatment. It was 0.1 ppm or less at 80 ppm, but the residual chlorine concentration in the chlorine absorbing solution in the liquid tank or the residual chlorine concentration in the solution discharged from the liquid tank was 3000 to 4000 mg /
It was l.
【００４２】（実施形態２）図３は本実施形態の概略図
である。(Second Embodiment) FIG. 3 is a schematic view of the present embodiment.
【００４３】本実施形態では、液槽５を覆うように反射
板１０が配されている以外は、実施形態１の図２とほぼ
同様の稼動条件及び構成をしている。In this embodiment, the operating conditions and the configuration are substantially the same as those of the first embodiment shown in FIG. 2 except that the reflecting plate 10 is arranged so as to cover the liquid tank 5.
【００４４】反射板は分解に必要な光を効率よく反射す
るものならば、ステンレス板、金属蒸着をほどこしたも
の、反射鏡、アルミ箔等如何なるものでも良い。The reflection plate may be any one such as a stainless plate, a metal vapor-deposited material, a reflecting mirror, an aluminum foil, etc., as long as it efficiently reflects the light required for decomposition.
【００４５】また、図では液槽と反射板の間にスペース
があるが密着していてもよい。Although there is a space between the liquid tank and the reflection plate in the figure, they may be in close contact with each other.
【００４６】反射板を含む構成は図１のごとき液槽５の
外側から光照射する構成においても、使用することがで
きる。The structure including the reflection plate can also be used in the structure in which light is irradiated from the outside of the liquid tank 5 as shown in FIG.
【００４７】反射板を含む図３の構成で、塩素ガスの処
理を行った。具体的には、液槽５をアルミ箔で覆い光照
射手段からの光が液槽５から漏れないようにした。Chlorine gas was treated with the structure shown in FIG. 3 including the reflector. Specifically, the liquid tank 5 was covered with an aluminum foil so that light from the light irradiation means did not leak from the liquid tank 5.
【００４８】この時の大気中への放出ガスの塩素濃度
は、処理前入口濃度８０ｐｐｍの時で０．１ｐｐｍ以下
であった。また、液槽内の塩素吸収溶液中の残留塩素濃
度は１ｍｇ／ｌ以下であった。At this time, the chlorine concentration of the gas released into the atmosphere was 0.1 ppm or less when the pretreatment inlet concentration was 80 ppm. The residual chlorine concentration in the chlorine absorbing solution in the liquid tank was 1 mg / l or less.
【００４９】そこで、光照射ユニット内のブラックライ
ト蛍光ランプの本数を１０本として同様の検討をしたと
ころ、処理前入口の塩素濃度８０ｐｐｍの時、排出口で
０．１ｐｐｍ以下であり、また、液槽内の塩素吸収溶液
中の残留塩素濃度は１ｍｇ／ｌ以下であった。Therefore, when the same examination was conducted using 10 black light fluorescent lamps in the light irradiation unit, when the chlorine concentration at the pretreatment inlet was 80 ppm, it was 0.1 ppm or less at the discharge outlet, and The residual chlorine concentration in the chlorine absorbing solution in the tank was 1 mg / l or less.
【００５０】[0050]
【発明の効果】本発明の処理方法は請求項記載の構成に
より、薬品量を節約した危険性の少ない簡易な塩素ガス
処理が実現できるものである。The treatment method of the present invention can realize a simple chlorine gas treatment in which the amount of chemicals is saved and the risk is low, by virtue of the constitution described in the claims.
【図１】本発明の一実施態様にかかる処理装置の概略図
である。FIG. 1 is a schematic diagram of a processing apparatus according to an embodiment of the present invention.
【図２】本発明の他の実施態様にかかる処理装置の概略
図である。FIG. 2 is a schematic view of a processing apparatus according to another embodiment of the present invention.
【図３】本発明の他の実施態様にかかる処理装置の概略
図である。FIG. 3 is a schematic diagram of a processing apparatus according to another embodiment of the present invention.
１ 吸収塔 ２ 流入口 ３ 排出管 ４ 反応層 ５ 液槽 ６ ポンプ ７ 噴射口 ８ 光照射手段 ９ 処理剤供給装置 １０ 光反射手段 1 absorption tower 2 Inlet 3 discharge pipe 4 Reaction layer 5 liquid tank 6 pumps 7 injection port 8 light irradiation means 9 Treatment agent supply device 10 Light reflection means
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｂ０１Ｊ 35/02 Ｆターム(参考） 4D002 AA18 BA09 CA07 DA02 DA03 DA05 DA12 DA70 EA02 GA01 GB20 4D048 AA11 AB03 AC10 BA05X BA30X CA03 EA01 4G069 AA02 AA03 BA14A BA14B BA48A BC75A BC75B CA02 CA10 CA11 4G075 AA37 BA04 BA05 CA33 CA54 CA57 DA02 DA18 EB31 FB06─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) B01J 35/02 F term (reference) 4D002 AA18 BA09 CA07 DA02 DA03 DA05 DA12 DA70 EA02 GA01 GB20 4D048 AA11 AB03 AC10 BA05X BA30X CA03 EA01 4G069 AA02 AA03 BA14A BA14B BA48A BC75A BC75B CA02 CA10 CA11 4G075 AA37 BA04 BA05 CA33 CA54 CA57 DA02 DA18 EB31 FB06
Claims (20)
を吸収し除去する処理装置において、上記塩素ガスと処
理剤との反応物に光を照射する手段を有する処理装置。1. A processing apparatus for contacting chlorine gas with a processing agent to absorb and remove the chlorine gas, the processing apparatus having a means for irradiating a reaction product of the chlorine gas and the processing agent with light.
と、塩素ガスと処理剤を接触させる反応層と、処理剤を
貯留する液槽と、塩素ガスの流入手段及び処理後のガス
を排出する手段からなる請求項１記載の処理装置。2. The processing apparatus circulates a processing agent, a reaction layer for bringing chlorine gas into contact with the processing agent, a liquid tank for storing the processing agent, a chlorine gas inflow means, and a gas after processing is discharged. The processing apparatus according to claim 1, further comprising:
求項１記載の処理装置。3. The processing apparatus according to claim 1, wherein the processing agent contains an alkaline aqueous solution.
ウム溶液、水酸化カルシウム溶液、水酸化カリウム溶液
から選ばれる少なくとも一種のアルカリ性水溶液である
請求項３に記載の気体の処理装置。4. The gas treating apparatus according to claim 3, wherein the alkaline aqueous solution is at least one alkaline aqueous solution selected from a sodium hydroxide solution, a calcium hydroxide solution and a potassium hydroxide solution.
である請求項１〜３記載の処理装置。5. The processing apparatus according to claim 1, wherein the reaction product irradiated with light is hypochlorite.
波長３００〜５００ｎｍの波長域の光を含む光である請
求項１記載の処理装置。6. The light emitted by the means for irradiating the light,
The processing apparatus according to claim 1, which is light including light in a wavelength range of 300 to 500 nm.
ｍＷ／ｃｍ２である請求項６記載の処理装置。7. The light irradiation amount is 10 μW / cm 2 to 10
The processing apparatus according to claim 6, which has a mW / cm 2 .
を照射する、光反射手段を有する請求項１記載の処理装
置。8. The processing apparatus according to claim 1, further comprising light reflecting means for reflecting the light from the light irradiating means and irradiating the reactant with the light.
手段をもつ請求項１記載の処理装置。9. The processing apparatus according to claim 1, wherein the processing agent has means for contacting the catalyst under light irradiation.
選ばれる少なくとも一種の触媒である請求項１記載の気
体の処理装置。10. The gas treating apparatus according to claim 1, wherein the catalyst is at least one catalyst selected from ground glass and platinum black.
スを吸収し除去する処理装置において、上記塩素ガスと
処理剤との反応物に光を照射する工程を有する処理方
法。11. A processing method, which comprises a step of irradiating a reaction product of the chlorine gas and the processing agent with light in a processing apparatus for absorbing and removing the chlorine gas by bringing the chlorine gas and the processing agent into contact with each other.
と、塩素ガスと処理剤を接触させる反応工程と、処理剤
を貯留する工程と、塩素ガスの流入工程及び処理後のガ
スを排出する工程からなる請求項１１記載の処理方法。12. The treatment method according to claim 1, wherein the treatment agent is circulated, a reaction step of bringing chlorine gas into contact with the treatment agent, a step of storing the treatment agent, a chlorine gas inflow step, and a treated gas is discharged. The processing method according to claim 11, which comprises a step.
請求項１１記載の処理方法。13. The processing method according to claim 11, wherein the processing agent contains an alkaline aqueous solution.
リウム溶液、水酸化カルシウム溶液、水酸化カリウム溶
液から選ばれる少なくとも一種のアルカリ性水溶液であ
る請求項１３に記載の気体の処理方法。14. The method for treating gas according to claim 13, wherein the alkaline aqueous solution is at least one alkaline aqueous solution selected from a sodium hydroxide solution, a calcium hydroxide solution and a potassium hydroxide solution.
塩である請求項１１〜１３記載の処理方法。15. The processing method according to claim 11, wherein the reaction product irradiated with light is hypochlorite.
が、波長３００〜５００ｎｍの波長域の光を含む光であ
る請求項１１記載の処理方法。16. The processing method according to claim 11, wherein the light radiated in the step of radiating the light is light including light in a wavelength range of 300 to 500 nm.
０ｍＷ／ｃｍ２である請求項１６記載の処理方法。17. The light irradiation amount is 10 μW / cm 2 to 1
The processing method according to claim 16, which is 0 mW / cm 2 .
る工程を有する請求項１１記載の処理方法。18. The processing method according to claim 11, further comprising the step of reflecting light for irradiating the reaction product with light.
る工程をもつ請求項１１記載の処理方法。19. The treatment method according to claim 11, further comprising the step of bringing the treatment agent into contact with a catalyst under light irradiation.
選ばれる少なくとも一種の触媒である請求項１９記載の
気体の処理方法。20. The method for treating gas according to claim 19, wherein the catalyst is at least one catalyst selected from ground glass and platinum black.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001281500A JP2003080028A (en) | 2001-09-17 | 2001-09-17 | Method for treating gas and apparatus used therefor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001281500A JP2003080028A (en) | 2001-09-17 | 2001-09-17 | Method for treating gas and apparatus used therefor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2003080028A true JP2003080028A (en) | 2003-03-18 |
Family
ID=19105314
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001281500A Withdrawn JP2003080028A (en) | 2001-09-17 | 2001-09-17 | Method for treating gas and apparatus used therefor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003080028A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110124498A (en) * | 2019-06-17 | 2019-08-16 | 深圳市世和安全技术咨询有限公司 | A kind of vehicle-mounted chlorine treatment system and method |
| CN114984735A (en) * | 2022-06-14 | 2022-09-02 | 中盐内蒙古化工钠业有限公司 | Treatment method for chlorine absorption by sodium hydroxide solution |
-
2001
- 2001-09-17 JP JP2001281500A patent/JP2003080028A/en not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110124498A (en) * | 2019-06-17 | 2019-08-16 | 深圳市世和安全技术咨询有限公司 | A kind of vehicle-mounted chlorine treatment system and method |
| CN114984735A (en) * | 2022-06-14 | 2022-09-02 | 中盐内蒙古化工钠业有限公司 | Treatment method for chlorine absorption by sodium hydroxide solution |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101006780B1 (en) | Apparatus for generating radical by advanced oxidation process | |
| US6699370B2 (en) | Process and system for decomposing pollutants | |
| JPH1147771A (en) | Continuous water passing type water treatment apparatus | |
| JPH1133567A (en) | Ozone decomposing method and apparatus | |
| US20020103409A1 (en) | Method and apparatus for decomposing pollutant | |
| KR20150028155A (en) | sterilized water manufacturer | |
| JP4229363B2 (en) | Water treatment equipment | |
| JP2003080028A (en) | Method for treating gas and apparatus used therefor | |
| US20100025226A1 (en) | Configurations for Chlorine Dioxide Production | |
| EP0242941B1 (en) | Process and apparatus for the deodorization of air | |
| EP1310274A1 (en) | Method of treating substance to be degraded and its apparatus | |
| JP3365819B2 (en) | Method for producing dissolved oxygen in water | |
| JPH11244873A (en) | Photocatalyst reactor | |
| JP5581090B2 (en) | Method and apparatus for treating waste liquid containing acid or base and hydrogen peroxide | |
| GB1583394A (en) | Method and apparatus for sterilizing liquids | |
| JP3739169B2 (en) | Organochlorine compound decomposition equipment | |
| KR950008302Y1 (en) | Water purifier using ozone and ultraviolet rays | |
| JP2018202309A (en) | Water treatment device | |
| JP2002018240A (en) | Method and apparatus for treatment for rendering hazardous organic substance harmless | |
| US7018514B2 (en) | Method and apparatus for processing substances to be decomposed | |
| CN118724155A (en) | UV utilization222Cl-coupled UV222Novel process for efficiently degrading pollutants and reducing disinfection by-product generation by using Sulfite oxidation-reduction technology | |
| JP4824185B2 (en) | Method for decomposing and removing trichloroethane | |
| JPH11267669A (en) | Treating device using photocatalyst | |
| JP2000254439A (en) | Harmful gas decomposition device | |
| RU2246450C1 (en) | Method of removing hard-oxidizable organics from waste waters |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Application deemed to be withdrawn because no request for examination was validly filed |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20081202 |