JP2003073163A - Low temperature sintered compact - Google Patents
Low temperature sintered compactInfo
- Publication number
- JP2003073163A JP2003073163A JP2002167045A JP2002167045A JP2003073163A JP 2003073163 A JP2003073163 A JP 2003073163A JP 2002167045 A JP2002167045 A JP 2002167045A JP 2002167045 A JP2002167045 A JP 2002167045A JP 2003073163 A JP2003073163 A JP 2003073163A
- Authority
- JP
- Japan
- Prior art keywords
- crystal phase
- low temperature
- low
- sintered body
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Inorganic Insulating Materials (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、多層回路基板用の
低温焼成焼結体に関するものであり、とりわけ半導体素
子や各種電子部品を搭載した多層に積層して成る複合回
路基板等に適用される銅配線可能な高周波用の低温焼成
焼結体に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a low temperature sintered body for a multi-layer circuit board, and is particularly applied to a multi-layer composite circuit board on which semiconductor elements and various electronic components are mounted. The present invention relates to a high-temperature low-temperature sintered body capable of copper wiring.
【0002】[0002]
【従来技術】近年、高度情報化時代を迎え、情報伝達は
より高速化、高周波化が進み、搭載される半導体素子も
より高速化、高集積化され、更に実装のより高密度化が
要求されるようになり、従来より多用されてきたアルミ
ナ製の各種回路基板では、比誘電率が3GHzで9〜
9.5とかなり誘電率が大きいことから、昨今の高周波
用の回路基板等には不適当であると言われている。2. Description of the Related Art In recent years, with the advent of advanced information technology, information transmission has become faster and higher in frequency, semiconductor elements to be mounted have become faster and more highly integrated, and higher packaging density has been required. As a result, various circuit boards made of alumina, which have been frequently used, have a relative permittivity of 9 to 9 at 3 GHz.
Since the dielectric constant is 9.5, which is considerably large, it is said to be unsuitable for recent high frequency circuit boards and the like.
【0003】即ち、信号を高速で伝搬させるためには基
板材料には、より低い誘電率が要求されており、更に、
多層回路基板に種々の電子部品や入出力端子等を接続す
る工程で該基板に加わる応力から基板自体が破壊した
り、欠けを生じたりすることを防止するために、機械的
強度がより高いことも要求されている。That is, in order to propagate a signal at high speed, the substrate material is required to have a lower dielectric constant.
Higher mechanical strength in order to prevent the substrate itself from being destroyed or chipped from the stress applied to the substrate in the process of connecting various electronic components and input / output terminals to the multilayer circuit substrate. Is also required.
【0004】そこで前記要求を満足させるために、例え
ば、SiO2、Al2O3、MgOを主成分とするガラス
組成物から成るガラス焼結体が提案されているが、かか
る提案のガラス焼結体では誘電率が低いという特性を奏
するというものの、機械的強度が低いという問題が残
り、完全に前記要求を満足するものではなく、そのため
に係る問題を解消せんとして種々の研究開発が進められ
ている。Therefore, in order to satisfy the above requirements, for example, a glass sintered body made of a glass composition containing SiO 2 , Al 2 O 3 and MgO as a main component has been proposed. Although the body has the property of having a low dielectric constant, the problem of low mechanical strength remains, and it does not completely satisfy the above requirements, and various research and development have been advanced in order to solve the problem for that. There is.
【0005】その結果、低誘電率でかつ高強度を有する
組成物として、例えば、熱処理によりムライトとコーデ
ィエライトを主たる結晶相として析出するガラス組成物
が提案されている(特開平05−298919号公報参
照)。As a result, as a composition having a low dielectric constant and high strength, for example, a glass composition in which mullite and cordierite are precipitated as a main crystal phase by heat treatment has been proposed (Japanese Patent Laid-Open No. 05-298919). See the bulletin).
【0006】[0006]
【発明が解決しようとする課題】しかしながら、前記提
案のガラス組成物から成る多層回路基板は、とりわけ高
周波用の回路基板として要求される誘電率や誘電正接、
及び機械的強度等の諸特性全てを必ずしも満足するもの
ではないという課題があった。However, the multilayer circuit board made of the glass composition proposed above has a dielectric constant and a dielectric loss tangent which are required especially as a circuit board for high frequencies.
In addition, there is a problem that not all properties such as mechanical strength are necessarily satisfied.
【0007】[0007]
【発明の目的】本発明は、前記課題を解消せんとして成
されたもので、その目的は、多層回路基板として十分な
機械的強度を有し、かつ高周波領域における比誘電率が
低く、誘電正接も低いという特性を併せ持ち、金(A
u)や銀(Ag)、銅(Cu)を配線導体とした多層化
が可能となる800〜1000℃という低温での焼成に
よって作製することのできる高周波用の低温焼成焼結体
を提供することにある。DISCLOSURE OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and its object is to have a sufficient mechanical strength as a multilayer circuit board, a low relative dielectric constant in a high frequency region, and a dielectric loss tangent. It also has the characteristic of low
To provide a low-temperature sintered body for high frequency, which can be produced by sintering at a low temperature of 800 to 1000 ° C., which enables multilayering using u), silver (Ag), and copper (Cu) as a wiring conductor. It is in.
【0008】[0008]
【課題を解決するための手段】本発明者は、上記問題点
を鋭意検討した結果、結晶相としてガーナイト結晶相
と、Zn2SiO4結晶相と、コーディエライト結晶相を
析出させることにより高周波領域での比誘電率を低く、
誘電正接を低くすることが可能であり、とりわけスピネ
ル型結晶であるガーナイト結晶相を析出させることによ
り、高強度化が可能であることを見いだした。Means for Solving the Problems As a result of intensive studies on the above-mentioned problems, the present inventor has found that a high frequency can be obtained by precipitating a garnite crystal phase, a Zn 2 SiO 4 crystal phase and a cordierite crystal phase as crystal phases. Low relative permittivity in the region,
It has been found that the dielectric loss tangent can be lowered, and in particular, the strength can be increased by precipitating the garnite crystal phase which is a spinel type crystal.
【0009】即ち、本発明は、800〜1000℃の低
温で焼成して作製された低温焼成焼結体であって、ガー
ナイト結晶相を主結晶相とし、Zn2SiO4結晶相と、
コーディエライト結晶相と、ガラス相とを含み、かつ3
GHzにおける誘電率が6未満、誘電正接が10×10
-4以下であることを特徴とするもので、さらに強度が2
5kg/mm2以上であることを特徴とするものであ
る。That is, the present invention is a low temperature firing sintered body produced by firing at a low temperature of 800 to 1000 ° C., in which the garnite crystal phase is the main crystal phase and the Zn 2 SiO 4 crystal phase is
Including a cordierite crystal phase and a glass phase, and 3
Dielectric constant less than 6 GHz, dielectric loss tangent 10 × 10
-4 or less, with a strength of 2
It is characterized by being 5 kg / mm 2 or more.
【0010】[0010]
【作用】本発明の低温焼成焼結体によれば、フィラー成
分として亜鉛酸化物を含むことから、低い誘電率と低い
誘電正接を示すガーナイト結晶相を主結晶相として析出
させ、さらにZn2SiO4結晶相を析出させ、ガラス相
より低い誘電率と小さな誘電正接を示すコーディエライ
ト結晶相を析出させることにより、誘電率をより低くか
つ誘電正接もより低くすることが可能となる。According to the low temperature sintered body of the present invention, since zinc oxide is contained as a filler component, a garnite crystal phase exhibiting a low dielectric constant and a low dielectric loss tangent is precipitated as a main crystal phase, and further Zn 2 SiO 2 is formed. 4 By precipitating a crystal phase and then a cordierite crystal phase having a lower dielectric constant and a smaller dielectric loss tangent than the glass phase, it becomes possible to lower the dielectric constant and lower the dielectric tangent.
【0011】また、スピネル型結晶であるガーナイト結
晶相を主として析出させることによって、焼結体の抗折
強度を高くすることができる。Further, by precipitating mainly the garnite crystal phase which is a spinel type crystal, the bending strength of the sintered body can be increased.
【0012】更に、本発明の低温焼成焼結体は、800
〜1000℃の低温度でAu、AgあるいはCuの内部
配線導体と同時に焼成することができることから、これ
らの配線導体を具備する多層回路基板や半導体素子収納
用パッケージの微細配線化が容易に達成できる。Further, the low temperature sintered body of the present invention is 800
Since it can be fired simultaneously with the internal wiring conductors of Au, Ag, or Cu at a low temperature of up to 1000 ° C., it is possible to easily achieve fine wiring of a multilayer circuit board or a package for housing a semiconductor element, which includes these wiring conductors. .
【0013】[0013]
【発明の実施の形態】本発明の低温焼成焼結体の組織の
概略図を図1に示す。本発明の低温焼成焼結体は、図1
に示すように、ガーナイト結晶相1を主結晶相とし、Z
n2SiO4結晶相2と、コーディエライト結晶相3と、
ガラス相4とから構成されている。BEST MODE FOR CARRYING OUT THE INVENTION A schematic diagram of the structure of a low temperature sintered body of the present invention is shown in FIG. The low temperature firing sintered body of the present invention is shown in FIG.
As shown in FIG.
n 2 SiO 4 crystal phase 2, cordierite crystal phase 3,
It is composed of a glass phase 4.
【0014】本発明によれば、このように焼結体中にガ
ーナイト結晶相を存在させ、同時にZn2SiO4結晶相
と、コーディエライト結晶相を存在させることにより、
低い比誘電率と低い誘電正接を得ることができる。According to the present invention, the presence of the garnite crystal phase in the sintered body, and at the same time the Zn 2 SiO 4 crystal phase and the cordierite crystal phase,
It is possible to obtain a low relative permittivity and a low dielectric loss tangent.
【0015】また、焼結体中にスピネル型結晶相である
ガーナイト結晶相を析出させることで各結晶相のネット
ワークを補強し、機械的強度の高い焼結体を得ることが
できる。Further, by precipitating a garnite crystal phase which is a spinel type crystal phase in the sintered body, the network of each crystal phase can be reinforced and a sintered body having high mechanical strength can be obtained.
【0016】そして、本発明の低温焼成焼結体は、測定
周波数3GHzにおいて誘電率が6未満、誘電正接が1
0×10-4以下の特性を有し、さらには強度が25kg
/mm2以上の優れた特性を有する。The low-temperature sintered body of the present invention has a dielectric constant of less than 6 and a dielectric loss tangent of 1 at a measurement frequency of 3 GHz.
It has characteristics of 0 × 10 -4 or less, and strength of 25 kg.
/ Mm 2 or more.
【0017】次に、本発明の低温焼成焼結体を製造する
具体的な方法としては、出発原料として、SiO2−A
l2O3−MgO−ZnO−B2O3系ガラスを50〜9
9.9重量%、特に望ましくは60〜95重量%と、フ
ィラー成分として亜鉛酸化物を0.1〜50重量%、特
にZnOを全量中5〜40重量%の割合になるように混
合する。Next, as a specific method for producing the low-temperature sintered body of the present invention, as a starting material, SiO 2 -A is used.
l 2 O 3 -MgO-ZnO-B 2 O 3 based glass in 50 to 9
9.9% by weight, particularly preferably 60 to 95% by weight, and zinc oxide as a filler component are mixed in an amount of 0.1 to 50% by weight, especially ZnO in an amount of 5 to 40% by weight based on the total amount.
【0018】このフィラー成分としては、ZnOの粉末
や、焼結過程でZnOを形成し得る炭酸塩、硝酸塩、酢
酸塩等の形態で添加できる。尚、亜鉛酸化物は、ガラス
との反応によりガーナイト結晶相、Zn2SiO4結晶相
を析出させることが重要であるため、前記亜鉛酸化物の
粉末は、1.5μm以下、特に1.0μm以下の微粉末
であることが望ましい。The filler component can be added in the form of ZnO powder, carbonate, nitrate, acetate or the like capable of forming ZnO during the sintering process. Since it is important for zinc oxide to precipitate a garnite crystal phase and a Zn 2 SiO 4 crystal phase by a reaction with glass, the zinc oxide powder has a particle size of 1.5 μm or less, particularly 1.0 μm or less. It is desirable that it is a fine powder.
【0019】更に、出発原料として、SiO2−Al2O
3−MgO−ZnO−B2O3系ガラスを用いるのは、こ
の系のガラスを用いることによりスピネル型結晶相が析
出し、この結晶相はガラスのネットワークを補強する形
態で存在し、高強度の焼結体を得ることができるからで
ある。Further, as a starting material, SiO 2 --Al 2 O
3 to use -MgO-ZnO-B 2 O 3 based glass, spinel-type crystal phase is deposited by the use of glass of this system, the crystal phase present in the form of reinforcing the network of the glass, high-strength This is because the sintered body of can be obtained.
【0020】本発明によれば、少なくともSiO2、A
l2O3、MgO、ZnO及びB2O3を含むガラス量が5
0重量%より少ないか、言い換えればZnの酸化物換算
による量が50重量%より多いと、800〜1000℃
の温度で磁器は十分に緻密化することができない。According to the invention, at least SiO 2 , A
The amount of glass containing l 2 O 3 , MgO, ZnO and B 2 O 3 is 5
If it is less than 0% by weight, in other words, if the amount of Zn converted to oxide is more than 50% by weight, it is 800 to 1000 ° C.
The porcelain cannot be fully densified at this temperature.
【0021】逆に、前記ガラス量が99.9重量%より
多いか、言い換えればZnの酸化物換算による量が0.
1重量%より少ないと誘電正接が10×10-4より大と
なる。On the contrary, if the amount of glass is more than 99.9% by weight, in other words, the amount of Zn in terms of oxide is less than 0.
When it is less than 1% by weight, the dielectric loss tangent becomes larger than 10 × 10 −4 .
【0022】従って、前記ガラスの含有量は50〜9
9.9重量%に特定され、より望ましくは60〜95重
量%の範囲となる。Therefore, the content of the glass is 50 to 9
It is specified to be 9.9% by weight, and more preferably in the range of 60 to 95% by weight.
【0023】一方、前記ガラスのより具体的な組成とし
てはSiO2が40〜50重量%、Al2O3が25〜3
0重量%、MgOが8〜12重量%、ZnOが6〜9重
量%、B2O3が8〜11重量%が望ましい。On the other hand, as a more specific composition of the glass, SiO 2 is 40 to 50% by weight and Al 2 O 3 is 25 to 3 %.
0 wt%, MgO 8-12 wt%, ZnO 6-9 wt%, and B 2 O 3 8-11 wt% are desirable.
【0024】上記のような割合で添加混合した混合粉末
に適宜バインダーを添加した後、所定形状に成形し、N
2、Ar等の非酸化性雰囲気中において800〜100
0℃の温度で0.1〜5時間焼成する。この時の焼成温
度が800℃より低いと、磁器が十分に緻密化せず、1
000℃を越えると金、銀、銅の導体を用いることがで
きなくなる。After appropriately adding a binder to the mixed powder which has been added and mixed in the above proportions, it is molded into a predetermined shape and N
2 , 800 to 100 in a non-oxidizing atmosphere such as Ar
Baking at a temperature of 0 ° C. for 0.1 to 5 hours. If the firing temperature at this time is lower than 800 ° C, the porcelain will not be sufficiently densified and
If the temperature exceeds 000 ° C, the conductors of gold, silver and copper cannot be used.
【0025】また、本発明の低温焼成焼結体を用いて配
線基板を作製する場合には、例えば、上記のようにして
調合した混合粉末を公知のテープ成形法、例えばドクタ
ーブレード法、圧延法等に従い、絶縁層形成用のグリー
ンシートを成形した後、そのシートの表面に配線層用の
メタライズとして、Au、AgやCuの粉末、特にCu
粉末を含む金属ペーストを用いて、シート表面に配線パ
ターンをスクリーン印刷、グラビア印刷、オフセット印
刷等の手段により形成し、場合によってはシートにスル
ーホールを形成してホール内に上記ペーストを充填す
る。その後、複数のシートを積層圧着した後、上述した
条件で焼成することにより、配線層と絶縁層とを同時に
焼成することができる。In the case of producing a wiring board using the low temperature sintered body of the present invention, for example, the mixed powder prepared as described above is subjected to a known tape forming method such as a doctor blade method or a rolling method. Etc., a green sheet for forming an insulating layer is formed, and then a powder of Au, Ag or Cu, especially Cu
A wiring pattern is formed on the surface of the sheet by means of screen printing, gravure printing, offset printing or the like using a metal paste containing powder, and in some cases a through hole is formed in the sheet to fill the hole with the paste. After that, a plurality of sheets are laminated and pressure-bonded, and then the wiring layer and the insulating layer can be simultaneously fired by firing under the above-described conditions.
【0026】[0026]
【実施例】以下、本発明の低温焼成焼結体について具体
的に詳述する。先ず、SiO2−Al2O3−MgO−Z
nO−B2O3系結晶性ガラスとして、
結晶性ガラスA:SiO2 44重量%−Al2O3 29重量%
−MgO11重量%−ZnO 7重量%−B2O3 9重量%
結晶性ガラスB:SiO2 50重量%−Al2O3 25重量%
−MgO9重量%−ZnO8重量%−B2O3 8重量%
の2種のガラスと、平均粒径が1μm以下のZnOを表
1の組成に従って混合した。EXAMPLES The low temperature sintered body of the present invention will be described in detail below. First, SiO 2 -Al 2 O 3 -MgO -Z
As nO-B 2 O 3 based crystalline glass, crystalline glass A: SiO 2 44 wt% -Al 2 O 3 29 wt% -MgO11 wt% -ZnO 7 wt% -B 2 O 3 9 wt% crystalline glass B: Two kinds of glass of 50% by weight of SiO 2 -25% by weight of Al 2 O 3 -9% by weight of MgO -8% by weight of ZnO -8% by weight of B 2 O 3 and ZnO having an average particle size of 1 μm or less are shown in Table 1. Mixed according to composition.
【0027】そして、この混合物に有機バインダー、可
塑剤、トルエンを添加し、ドクターブレード法により厚
さ300μmのグリーンシートを作製した。そして、こ
のグリーンシートを5枚積層し、50℃の温度で100
kg/cm2の圧力を加えて熱圧着した。得られた積層
体を水蒸気含有/窒素雰囲気中、700℃の温度で脱バ
インダーした後、乾燥窒素中、表1の条件で焼成して焼
結体を得た。Then, an organic binder, a plasticizer, and toluene were added to this mixture, and a green sheet having a thickness of 300 μm was prepared by the doctor blade method. Then, 5 sheets of this green sheet are laminated and 100 at a temperature of 50.
A pressure of kg / cm 2 was applied for thermocompression bonding. The obtained laminated body was debindered in a water vapor-containing / nitrogen atmosphere at a temperature of 700 ° C., and then fired in dry nitrogen under the conditions shown in Table 1 to obtain a sintered body.
【0028】得られた焼結体について誘電率、誘電正
接、抗折強度を以下の方法で評価した。誘電率、誘電正
接は、前記焼結体から直径50mm、厚さ1mmの試料
を切り出し、3.0GHzにてネットワークアナライザ
ー、シンセサイズドスイーパーを用いて空洞共振器法に
より測定した。測定では、サファイヤを充填した円筒空
洞共振器の間に試料の誘電体基板を挟んで測定し、共振
器のTE011 モードの共振特性より、誘電率、誘電
正接を算出した。The dielectric constant, dielectric loss tangent, and bending strength of the obtained sintered body were evaluated by the following methods. The dielectric constant and the dielectric loss tangent were measured by cutting out a sample having a diameter of 50 mm and a thickness of 1 mm from the sintered body, and measuring it at 3.0 GHz by a cavity resonator method using a network analyzer and a synthesized sweeper. In the measurement, the sample dielectric substrate was sandwiched between the sapphire-filled cylindrical resonators, and the permittivity and the dielectric loss tangent were calculated from the resonator's TE011 mode resonance characteristics.
【0029】抗折強度は、前記焼結体から長さ70m
m、厚さ3mm、幅4mmの測定試料を作製し、JIS
−C−2141の規定に準じて3点曲げ試験を行った。The bending strength is 70 m from the sintered body.
m, thickness 3 mm, width 4 mm to prepare a measurement sample, JIS
A 3-point bending test was performed according to the regulations of C-2141.
【0030】また、比較例として、フィラー成分をZn
Oに代えて、CaO、SiO2を用い、前記同様に焼結
体を作製し評価した。As a comparative example, the filler component was Zn.
Instead of O, CaO and SiO 2 were used, and a sintered body was prepared and evaluated in the same manner as above.
【0031】更に、前記結晶性ガラスに代わり、
結晶性ガラスC:SiO2 55.2重量%−Al2O3 12重量%
−B2O3 4.4重量%−BaO20重量%−ZnO6.7重量%
−Na2O 1.6重量%−ZrO2 0.1重量%
結晶性ガラスD:SiO2 60.7重量%−Al2O3 9.3重量%
−B2O3 5重量%−SrO 15.4重量%
−ZnO 8.6重量%−K2 O1重量%
の2種のガラスを用いて、フィラーとしてさらに平均粒
径が1.0μmのCaO、SiO2を用いて同様に評価
した。Further, instead of the crystalline glass, crystalline glass C: SiO 2 55.2% by weight-Al 2 O 3 12% by weight-B 2 O 3 4.4% by weight-BaO 20% by weight-ZnO 6.7 wt% -Na 2 O 1.6 wt% -ZrO 2 0.1 wt% crystalline glass D: SiO 2 60.7 wt% -Al 2 O 3 9.3 wt% -B 2 O 3 5 wt% - SrO 15.4 wt% -ZnO 8.6 wt% -K 2 O 1 wt% two kinds of glass were used, and CaO and SiO 2 having an average particle diameter of 1.0 μm were further used as fillers, and similarly evaluated. .
【0032】[0032]
【表1】 [Table 1]
【0033】表1の結果から明らかなように、結晶相と
してガーナイト結晶相、Zn2SiO4結晶相、およびコ
ーディエライト結晶相が析出した本発明は、いずれも誘
電率が6未満、誘電正接が10×10-4以下、強度が2
5kg/mm2以上と高い値を示し、これらの中でも焼
成温度が850〜900℃のものは、誘電率が5.4以
下、誘電正接は9×10-4以下とより誘電特性に優れて
いる。As is clear from the results shown in Table 1, in the present invention in which the garnite crystal phase, the Zn 2 SiO 4 crystal phase and the cordierite crystal phase were precipitated as the crystal phases, the dielectric constant was less than 6 and the dielectric loss tangent was all in the present invention. Is 10 × 10 −4 or less, strength is 2
It shows a high value of 5 kg / mm 2 or more. Among these, those having a firing temperature of 850 to 900 ° C. have a dielectric constant of 5.4 or less and a dielectric loss tangent of 9 × 10 −4 or less, which are more excellent in dielectric properties. .
【0034】これに対して、ガラス量が50重量%未満
である試料番号1では、焼成温度を1400℃まで高め
ないと緻密化することができず、誘電正接も極めて高
く、ガラス量が99.9重量%を越えると、誘電正接が
10×10-4よりも大きくなるとともに、十分な強度を
確保できない。On the other hand, in sample No. 1 in which the amount of glass is less than 50% by weight, it cannot be densified unless the firing temperature is raised to 1400 ° C., the dielectric loss tangent is extremely high, and the amount of glass is 99. When it exceeds 9% by weight, the dielectric loss tangent becomes larger than 10 × 10 −4 and sufficient strength cannot be secured.
【0035】また、比較例として、CaOをフィラーに
用いた試料番号23は誘電率が7.0と大で、同じくS
iO2を用いた試料番号24では、誘電正接が50×1
0-4とかなり高くなった。As a comparative example, sample No. 23 using CaO as a filler has a large permittivity of 7.0, which is the same as S.
The sample No. 24 using iO 2 has a dielectric loss tangent of 50 × 1.
It was quite high, 0-4 .
【0036】また、結晶性ガラスCおよびDを用いた比
較例の試料番号17〜22は、800〜1000℃で十
分に緻密化できず、いずれも低誘電率、低誘電正接、高
強度の焼結体は得ることができなかった。Further, the sample numbers 17 to 22 of the comparative examples using the crystalline glasses C and D could not be sufficiently densified at 800 to 1000 ° C., and all of them had a low dielectric constant, a low dielectric loss tangent and a high strength. No body could be obtained.
【0037】[0037]
【発明の効果】以上詳述した通り、本発明の低温焼成焼
結体は、高周波領域において誘電率が低く誘電正接が小
さいので、マイクロ波用回路素子等において最適であ
り、更に、基板材料の高強度化により入出力端子部に施
すリードの接合や、実装における基板の信頼性を向上で
きる上、800〜1000℃の低温度で焼成可能なた
め、Au、Ag、Cu等による配線導体を同時焼成によ
り形成することができ、各種多層配線基板や半導体素子
収納用パッケージ用の基板として適用できる。As described in detail above, the low-temperature fired sintered body of the present invention has a low dielectric constant and a low dielectric loss tangent in the high frequency region, and is therefore suitable for microwave circuit elements and the like. By increasing the strength, the leads can be joined to the input / output terminals, the reliability of the board during mounting can be improved, and since it can be fired at a low temperature of 800 to 1000 ° C, wiring conductors made of Au, Ag, Cu, etc. can be used at the same time. It can be formed by firing and can be applied as a substrate for various multilayer wiring boards and semiconductor element housing packages.
【図1】本発明の低温焼成焼結体の組織の概略図であ
る。FIG. 1 is a schematic view of a structure of a low temperature sintered body of the present invention.
1 ガーナイト結晶相 2 Zn2SiO4結晶相 3 コーディエライト結晶相 4 ガラス相1 Garnite crystal phase 2 Zn 2 SiO 4 crystal phase 3 Cordierite crystal phase 4 Glass phase
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H05K 3/46 C04B 35/00 P Fターム(参考) 4G030 AA07 AA08 AA32 AA35 AA36 AA37 BA09 BA12 CA01 CA08 GA27 HA18 HA25 5E346 AA12 BB01 CC18 CC32 CC38 CC39 DD02 DD34 EE24 EE29 GG02 GG04 HH06 HH11 5G303 AA05 AB06 AB07 AB15 BA09 CA03 CB01 CB02 CB17 CB30 CB38 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) H05K 3/46 C04B 35/00 PF term (reference) 4G030 AA07 AA08 AA32 AA35 AA36 AA37 BA09 BA12 CA01 CA08 GA27 HA18 HA25 5E346 AA12 BB01 CC18 CC32 CC38 CC39 DD02 DD34 EE24 EE29 GG02 GG04 HH06 HH11 5G303 AA05 AB06 AB07 AB15 BA09 CA03 CB01 CB02 CB17 CB30 CB38
Claims (2)
された低温焼成焼結体であって、ガーナイト結晶相を主
結晶相とし、Zn2SiO4結晶相と、コーディエライト
結晶相と、ガラス相とを含み、かつ3GHzにおける誘
電率が6未満、誘電正接が10×10-4以下であること
を特徴とする低温焼成焼結体。1. A low-temperature fired sintered body produced by firing at a low temperature of 800 to 1000 ° C., wherein a garnite crystal phase is a main crystal phase, a Zn 2 SiO 4 crystal phase, and a cordierite crystal phase. And a glass phase, a dielectric constant at 3 GHz of less than 6, and a dielectric loss tangent of 10 × 10 −4 or less.
特徴とする請求項1記載の低温焼成焼結体。2. The low temperature sintered body according to claim 1, which has a strength of 25 kg / mm 2 or more.
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JP33749695A Division JP3363297B2 (en) | 1995-12-25 | 1995-12-25 | Low temperature firing porcelain composition |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100842855B1 (en) | 2007-04-18 | 2008-07-02 | 요업기술원 | Microwave dielectric ceramics and the manufacturing method thereof |
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2002
- 2002-06-07 JP JP2002167045A patent/JP2003073163A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100842855B1 (en) | 2007-04-18 | 2008-07-02 | 요업기술원 | Microwave dielectric ceramics and the manufacturing method thereof |
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