JP2003037037A - System and method for product quality information management - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a product quality management method for products such as reticle used for manufacturing semiconductor device so that users who have acquired products can also obtain easily the data of such products. SOLUTION: A particular pattern 3 which is the intrinsic code of a product 1 or its accessory 4 is given to the product 1 or to the accessory 4. The particular pattern 3 is converted into a authentication code. Therefore, it is possible to log in to a quality database 5 of the product 1 using the authentication code.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a product quality information management system and a product quality information management method. More specifically, the present invention relates to a product quality information management system using a computer and communication for quality information about products such as reticles used for manufacturing semiconductor devices. The present invention relates to a management system or management method.

[0002]

2. Description of the Related Art Product quality information is generally provided to the user by a manufacturer by attaching an inspection result to the product at the time of shipping the product. The same applies when the reticle used for manufacturing the semiconductor device is shipped from the manufacturer to the user. When a reticle manufacturer ships a reticle to a user, as shown in FIG. 1, reticle information is written on a paper check sheet and submitted to the user. Then, the user who uses the reticle decides the reticle combination condition and the exposure condition in the wafer photo process based on the reticle information written on such paper.

By the way, when the reticle is transferred to another factory due to the change of the wafer processing factory or when the reticle information is not notified to the factory, the reticle quality information is newly obtained from the manufacturer who is the manufacturer. There is a need. Although the quality information from the manufacturer is only the information at the time of reticle manufacturing, about the pellicle information covering the reticle, the re-pellicle information, the reticle phase result information, etc.
Since the contents may change from the time of shipping, it is necessary to manage reticle information regarding changes in information after shipping.

It should be noted that attaching an ID label to a pellicle in order to eliminate an error in selecting a pellicle is disclosed in Japanese Patent Laid-Open No. 11-
Although described in Japanese Patent No. 237729, the ID label is not used for managing reticle information.

[0005]

It is also possible to build a reticle information management system at a reticle shop. In this case, if user authentication is performed using an electronic key (key), the destination of the electronic key will be incorrect. Get lost
Alternatively, if the electronic key is lost or forgotten, the reticle information management system cannot be used. Further, the ID information and password information authorized by the system administrator may be leaked to a third party, and this alone is not sufficient and not sufficient for protecting confidential information.

Moreover, when the reticle user is changed due to a change in the IC manufacturing factory, the work of canceling the old user authentication and registering the new user authentication is performed for each reticle in order to disclose the reticle information. It takes time and effort. From the above, it is difficult to identify the user in real time in the information management system, and in reality, the quality information necessary for using the reticle is not disclosed.

Therefore, as shown in FIG. 1, the quality information of the reticle to be used needs to be obtained from the manufacturer for each reticle to be used, but it is lost when the reticle quality is confirmed by the paper. There is a risk. Further, it is difficult for the reticle management source or the transferred user to acquire the quality information added or changed when the reticle is used. Even if the engineer on the user side measures the reticle information after shipping the reticle or manually calculates the data and writes it on paper for later use, it can not be taken out instantly from the archive, Moreover, the paper is easy to lose.
Further, the reticle quality control source has not been able to confirm that the reticle quality is maintained on the user side.

The object of the present invention is that the user who acquired the product can easily obtain the data related to the product while ensuring the security, or the manufacturer and the user can manage the change of the product data after shipping the product information. To provide a management system.

[0009]

[Means for Solving the Problems] The above-mentioned problems are related to an authentication code conversion means for converting data of a specific pattern attached to a product or its accessory into an authentication code, and the product using the authentication code. The product quality information management system is characterized by having a login means for logging in to the quality database and a disclosure means for extracting data from the logged-in quality database and disclosing it to the user.

The above-mentioned problem is that a specific pattern, which is a code unique to a product, is attached to the product or its accessory,
This is solved by a product quality information management method, characterized in that the specific pattern is converted into an authentication code, and the authentication code is used to log in to a quality database for the product. In the product quality information management system or method, for example, the product is a reticle used for manufacturing a semiconductor device, and the accessory is a pellicle.

According to the present invention, a unique special pattern attached to a product is used to convert into an authentication code, and the authentication code is used to log in to a quality information management system to acquire quality information. . In this case, the code of the specific pattern attached to the product is not used as a password as it is, but based on this, the authentication code obtained by conversion by the predetermined software in the computer is used as one code for login. use.

Therefore, for the login to the product quality database, double security is established by the user code, the specific pattern and the authentication code. Moreover, the user is authenticated by the system to prove that he is a legitimate user who has the reticle, and the target product information is assigned from the system side so that the legitimate user can obtain the product information safely. it can.

Thus, by using the reticle quality information used in the wafer photo step for condition setting of the wafer photo step, the condition of the fine processing can be set in a short time, and it is added in the wafer photo step. By adding new conditions, it is possible to obtain the latest reticle quality information even at a new factory where the product type has been transferred. There is no other way to calculate the user account authentication code using the special pattern of the product, and it is very effective in disclosing confidential information only to a specific user.

[0014]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. FIG. 2 is a plan view showing a reticle to be managed by the product quality information management system of the present invention. In FIG. 2, a main pattern region 1a, a frame-shaped scribe line region 1b surrounding the main pattern region 1a, and a scribe line region 1b are formed on a light transmitting substrate 2 made of quartz, glass, or the like that constitutes the reticle 1. A surrounding frame-shaped peripheral pattern region 1c is defined, and a pattern is formed in these regions 1a, 1b, 1c.

In the main pattern region 1a, a predetermined pattern such as wiring, electrodes or holes which form the semiconductor device is formed. In addition, in the peripheral pattern area 1c,
Although not particularly shown, alignment patterns, monitor patterns, etc. are formed. Further, although not shown, a pattern that does not affect the reticle pattern, for example, a pattern for evaluation purposes such as a dimension measurement pattern is mainly formed in the scribe line region.

The above pattern is formed by patterning a light shielding film such as chromium, but in the case of the reticle 1 having a phase shift structure, it is also formed by processing the light transmitting substrate 2. The reticle 1 having areas corresponding to a plurality of functions as described above has a specific pattern 3 as shown in FIG.
Is drawn. In the specific pattern 3, the code necessary for accessing the server having the reticle information is written,
This code is a symbol or figure for calculating the user authentication code required when logging in to the server. The administrator and owner of the server are the reticle manufacturers, and the user of reticle 1 is a person who can legitimately access or retrieve reticle information from its database or add or modify data by accessing the server. Is.

The reticle manufacturer uses a drawing device to draw patterns on the main pattern region 1a, the scribe pattern region 1b, and the peripheral pattern region 1c, respectively, and at the same time, draws the specific pattern 3 on the light transmitting substrate 2 in a submicron size. The drawing position of the specific pattern 3 is set to a position that does not affect the original design pattern in the drawing data arrangement process before exposure drawing. The arrangement position of the specific pattern 3 is designated in advance by the reticle manufacturer and the user. The user in this case is a semiconductor device manufacturer or a semiconductor device manufacturing factory. In addition, the manufacturer may be a division of a semiconductor device manufacturer.

Although the specific pattern 3 is drawn in the scribe line area 1b in FIG. 2, if there is a vacant area even in the main pattern area 1a, the peripheral pattern area 1c or the area around them, there is a vacant area. You may draw. Further, the specific pattern 3 shown in FIG. 3 does not necessarily have to be drawn on the light transmitting substrate 2 of the reticle 1, and for example, as shown in FIG. The specific pattern 3 may be imprinted with a laser marker. The marking of the specific pattern 3 may be performed on the side surface of the pellicle frame 4b before the pellicle film 4a is attached to the pellicle frame 4b.

The specific pattern 3 of the reticle 1 or the pellicle 4 as described above is drawn or engraved by the reticle manufacturer, and is a code unique to each reticle 1 in principle. Only the owner of can recognize. The reticle 1 as described above is shipped from the manufacturer to the user, and the reticle quality information is managed and browsed according to the system as described below.

FIG. 5 shows the flow from reticle production to shipment. First, the reticle manufacturer exchanges rules with the user such as the addition of the user code and the arrangement position of the specific pattern 3 (a _{0 in} FIG. 5). The user code is
Also called "parent code". The user code, the specific pattern layout position, etc. may be notified from the user to the reticle manufacturer by e-mail (a _{1 in} FIG. 5).

The reticle manufacturer introduces the software of the reticle quality information management system into the database of the server 5, and subsequently puts in the server 5 the design data necessary for drawing the reticle 1 to be newly produced and the reticle 1 Generates the ID (reticle ID) of
The user code (parent code) determined by the meeting with the user and the position information of the specific pattern 3 are set in the database of the server 5 (a _{2 in} FIG. 5). The user also obtains the user code (a _{3 in} FIG. 5).

The software of the reticle quality information management system has the software of the reticle 1 verification system, quality check system, alarm notification system, child code dedicated analysis system, and authentication code analysis system. The reticle code is a lot number generated in the exposure process, and the reticle ID is a system ID registered when the reticle is ordered.

Next, the reticle manufacturer draws a pattern in each of the areas 1a to 1c on the light transmitting substrate 2 based on the design data, and also draws the reticle code, the specific pattern 3 and the like on the light transmitting substrate 2. To manufacture reticle 1 (FIG. 5)
B ₁ ). Further, the reticle manufacturer registers the reticle ID, reticle code, specific pattern code (child code), and mask coefficient data in the database of the reticle quality information management system (b _{2 in} FIG. 5). Details of the specific pattern code and the mask coefficient will be described later.

Further, the reticle manufacturer acquires and generates quality information in accordance with the progress of the reticle manufacturing process (c _{1 in} FIG. 5), and associates this quality information with the reticle ID in the database of the reticle quality information management system. Register (c _{2 in} FIG. 5). The quality information is, for example, data such as the measured value of the width and the film thickness of the manufactured reticle pattern and the error of the measured value with respect to the design value.

Information such as the reticle ID, reticle code, user code (parent code), specific pattern, specific pattern code (child code), authentication code, and mask coefficient in the reticle quality information management system of the server 5 is used. It is registered in the product quality database section through the security management section (e _{0 in} FIG. 5). In addition to reticle information, pellicle information is also registered in the product quality database section.

After the reticle 1 has been manufactured and the reticle information has been registered as described above, the reticle 1 is shipped to the user (d _{0 in} FIG. 5), and the user who has obtained the reticle 1 is as shown in FIG. Access the server 5 according to the flow to acquire reticle quality information and pellicle quality information,
Browse and add reticle quality information and pellicle quality information,
Make corrections.

First, the user needs to acquire the quality data of the reticle 1 when using the reticle 1 obtained. For this reason, the user has a specific pattern 3 at a predetermined position defined for each user code (parent code).
Is drawn (f _{1 in} FIG. 6). Then, the data represented by the specific pattern 3 is detected using a microscope, OCR, etc. (f _{2 in} FIG. 6). Specific pattern 3
For example, in the case of FIG. 3, the data of “≠ ΓΔΠ <<
ΡΖΟΟΨ "are Greek letters and symbols.

Then, the user, as shown in FIG.
A mask for each reticle ID acquired in advance in order to log in to the reticle quality information management system in the reticle manufacturer's server 5 through the Internet 7 by operating a computer (hereinafter also referred to as a user terminal or workstation) 6. The coefficient is calculated, and the specific pattern code and the authentication code are sequentially calculated using the data of the specific pattern 3 and the user code (parent code), reticle code, and mask coefficient (f _{3 in} FIG. 6). The specific pattern code is also called a child code.
The mask coefficient is a child code conversion coefficient for calculating the child code, and an integer value obtained by a random number of the child code dedicated analysis system is used.

The child code dedicated analysis system is installed in the server 5 of the manufacturer, but may be installed in the computer on the user side. Also,
The conversion process to the child code can be performed only by the child code analysis system, and the child code cannot be visually decoded. The calculation of the mask coefficient, the specific pattern code, the authentication code and the login to the database of the server 5 are performed according to the procedure shown in FIG. 9 using the data processing mechanism shown in FIG.

First, the user calls the user code input screen from the server 5 to the computer 6 via the Internet and displays it on the display unit 10. Then, the user code d ₀ is input to the screen of the display unit 10 by operating the data input unit 11 to access the reticle quality control system (a in FIG. 9). After confirming the user code d ₀ from the user in the code discriminating unit 12, the reticle quality control system sends the input screen of the child code dedicated analysis system from the child code / authentication code converting unit 13 to the user 6.

Next, the user displays the reticle I on the input screen.
Dd₁And the code d of specific pattern 3 ₂Enter (Fig. 9
B). As a result, the child code / authentication code conversion unit 13
The child code dedicated analysis system of
De d₂Corresponds to the character code table for each digit character, symbol, etc.
Then, the corresponding value is subjected to decimal conversion (see FIG. 9).
c ₁) At the same time, reticle IDd₁Is a random number table based on
Mask coefficient d₃(C in FIG. 9)₂). Then,
Mode d₂Decimal conversion value d for each digit of_nEach trout
Coefficient d₃And then summing them up,
Sub-code d for sum value _Four(D in FIG. 9). Furthermore, parents
Code (user code) d₀Child code d _FourAdded
The value is the authentication code d_Five(E in FIG. 9). Those operations
The processing is performed by the child code / authentication code conversion unit 13.

After this, the user calls the screen 8 for system login as shown in FIG. 10, and the account information used for system login, that is, user code d ₀ , child code d ₄ , authentication code d ₅ and The reticle code d ₆ is input (f in FIG. 9), this is collated with the registered values of each code in the database (DB) 15 in the login means 14 of the reticle quality information management system, and the registered values of those codes are input. Only if the values match
Log in to the database 15 of the reticle quality information management system (f ₄ in FIG. 6, g in FIG. 9). In the initial stage of the database 15, data is written by the manufacturer input / output unit 16.

As a result, the user obtains the design line width, the actual measurement line width, and other reticle quality information about the reticle 1 that has been obtained from the database 15 on the display unit 10 or the like (g in FIG. 6). Further, after the use of the reticle 1 is started, after logging in, the data such as the number of times the reticle is used, the number of times of cleaning, the presence or absence of pellicle exchange and the number of times are browsed from the database 15, or the data is additionally written to the database 15. Alternatively, the quality standard can be checked for each lot action by setting the quality standard by the user in the database 15 (h in FIG. 6).

Such data is written by the user, and the state of the reticle, which changes as the number of times the reticle is used, for example, the change in line width, is known, which facilitates changing the setting conditions of the exposure stepper. In addition, the quality data criterion determination unit 17 on the server 5 side checks the quality according to changes in the reticle information in the database 15, and if the reticle data deviates from a predetermined condition, for example, the number of cleanings may exceed the reference value. In such a case, an alarm is given to the display unit 10 or the voice unit (not shown) of the user's workstation 6 to call attention (j in FIG. 6).

Such an operation is similarly performed even if the user of the reticle is changed, and the reticle quality control information can be easily obtained by the computer operation without inquiring the manufacturer by a paper or a telephone every time it is used ( Figure 6
K). Next, the calculation of the authentication code will be described. When the user gets the reticle 1 or pellicle 4,
The system ID in the computer 6 on the user side and the user code (parent code) are already registered in the order process. The user can recognize the specific pattern 3 attached to the specific position of the reticle 1 or the pellicle 4. Further, the computer 6 uses the reticle I
For each D, an integer value generated by a random number in the child code dedicated analysis system in the reticle quality information management system, for example, "10"
9 ”is calculated and registered as a mask coefficient.

Then, a code value is obtained for each digit described in the specific pattern 3 based on the character code table of the child code dedicated analysis system. As the character code table, for example, the JIS first level kanji code table and the JIS second level kanji code table are used. JIS corresponding to the symbols, characters, and alphanumerics of each digit described in the specific pattern 3
The code value is expressed in hexadecimal system, and this is subjected to decimal conversion.
Further, a mask coefficient is added to each of the decimal-transformed values of each digit of the specific pattern 3, the sum of these values is defined as a child code, and the value obtained by adding the parent code to this child code is defined as an authentication code.

FIG. 11 shows an example of the reticle ID, reticle code, user code, specific pattern code, authentication code, and mask coefficient when the specific pattern consists of only one character "≠". That is, after converting “≠” into the hexadecimal system “2162” from the JIS first level kanji code table shown in FIG. 12, “2162” is converted into a decimal number, which is “8546”. Further, if, for example, "109" is generated as a mask coefficient from the random number table based on the reticle ID "101", the value "8655" obtained by adding "109" to the decimal number "8546" is a child of "≠". It becomes a code. Finally, user code (parent code) "20408000" and child code "8546"
Is added to calculate "20416655", and this is used as the authentication code.

While the user code, the authentication code, the mask coefficient, and the specific pattern code (child code) are registered in the system database by the manufacturer, when the user wants to obtain reticle information, the workstation 6 uses the specific pattern 3 as a basis. The specific pattern code and the authentication code are calculated, and the login can be performed only when the calculation result matches the registered data in the system database.

Characters at each digit of the specific pattern shown in FIG.
Regarding the symbols, such logic is used in FIG.
Each character is converted into a hexadecimal JIS code value using the JIS level 1 Kanji code table shown in No. 3, and further decimal conversion is performed, and a mask coefficient is added to each converted numerical value to obtain a child code component. Then, the sum of these child code components is calculated, the calculation result is used as the final child code value of the specific pattern 3, and the numerical value of the user code is added to this to obtain the authentication code.

Therefore, the user code is "204080
00 "and the mask coefficient" 109 ", the child code of the specific pattern 3 in FIG. 3 is" 96600 "and the authentication code is" 20504600 ". The reticle quality information system confirms the matching of four items such as the user code, reticle code, specific pattern code and authentication code, and if this matches the data in the reticle quality information management system in the server, the target The reticle ID quality information can be obtained from the database 15 of the server 5.

By the way, the lot number described on the reticle may be used as the specific pattern. For example, a reticle code “G03600071” which is a lot number.
When "NQ" is attached to reticle 1, "G036"
"00071NQ" may be used as the specific pattern 3. In this case, as shown in FIG. 14, the user who has obtained the reticle 1 detects the lot number as the specific pattern 3 (d, f _{1 in} FIG. 14). Furthermore, in order to calculate an authentication code, to calculate the authentication code and the child code using the child code authentication system (f _3, f ₃₀ in FIG. 14).

The child code calculation and the authentication code are calculated according to the flow shown in FIG. 15 based on the JIS first-level kanji code table in the child code authentication system. The child code is "91261" and the authentication code is "20499261". Becomes Then, the user code, the reticle code, the specific pattern code (child code), and the authentication code are input to the screen shown in FIG. 10, and the reticle quality information management system in the server 5 performs the authentication process to log in (FIG. 14 f ₄ , f ₄₀ ).

In FIG. 15, the user code is "20.
408000 ”, the reticle ID given in the ordering process is“ 1001 ”, and the mask coefficient is“ 109 ”. According to the JIS Level 1 Kanji code table,
“G” becomes a JIS code value of “2346”, and when this is decimally processed, it becomes “9030”. "0" is JI
The S code value becomes "232F", and when this is decimally processed, it becomes "9007". "3" becomes JIS code value "2331", and when this is decimally processed, it becomes "90".
09 ". “6” is the JIS code value “2335”
When this is decimally processed, it becomes “9013”. "7" is a JIS code value of "2336", and when this is decimally processed, it becomes "9014". “N” is a JIS code value of “234D”, and when this is decimally processed, it becomes “9037”.

Therefore, the specific pattern "G0360007"
When the mask coefficient “109” is added to the value obtained by individually performing the decimal processing for each symbol of “1NQ” and the sum of them is obtained, the code conversion result is “91261”, which is the child code. And the child code "912
The value obtained by adding the parent code "20408000" to "61" is
The authentication code is “20499261”. Such child code may be performed by installing the child code dedicated analysis system in the workstation 6 on the user side.

As a result, a screen as shown in, for example, FIG. 16 appears on the display device of the workstation 6 on the user side where the login process is normally performed, and the reticle quality information result, reticle pattern image image result, or The image result of the dust defect image attached to the reticle pattern can be referred to. Further, as shown in FIG. 17, the user operates the workstation 6 to perform a login search for the database (DB) of the server 5 via the Internet based on the quality information management system login function and the authentication function (see FIG. 17). A ₁ , A ₂ ), which allows the quality information for each process to be input or fetched online, and the quality information input operation for inputting the failure status and reason can be performed (a in FIG. 17). In addition, it is possible to perform an information browsing operation on the screen to obtain the required reticle quality information at the required time (b in FIG. 17), and the required reticle pellicle quality information can be obtained, thus improving the pellicle life. And pellicle life information acquisition operation to know when to attach the pellicle again (Fig. 1
7c). Furthermore, the cleaning quality information acquisition operation is performed by acquiring the required reticle cleaning quality information on the screen and resetting the exposure amount of the stepper used for wafer processing based on the phase result of the recleaned reticle. Life cycle information acquisition operation such as managing the life cycle based on the number of reticle recleanings (d in FIG. 17) or using a safe reticle quality according to the system warning from the server (see FIG. 17). e) can be done.

FIG. 18 is a block diagram showing the management of the life cycle of the reticle and the life of the pellicle by adding and editing newly acquired information to the existing reticle quality information by the user. In FIG. 18, after the user obtains the reticle 1 shipped from the manufacturer, the user logs in the server 5 and browses the reticle information by the above-described operation (a and b in FIG. 18). The reticle quality information management system of the server 5 manages cleaning quality information, pellicle life information, reticle life cycle information, etc. (FIG. 18c), and checks quality standards according to input data for each action of the reticle 1 lot. (D in FIG. 18). Then, the user is warned each time the data whose quality exceeds the reference value (e, f in FIG. 18).

Other quality information includes dust inspection result information on the pellicle and reticle pattern, dimension inspection result information, phase information, shot number confirmation information, placement accuracy information, reticle recleaning information, pellicle life information, and foreign matter. There is information. Regarding the dust inspection result information on the pellicle and the reticle pattern, newly added foreign substances may affect the transfer of the pattern of the reticle 1 on the wafer in addition to the foreign substances attached at the time of inspection. It is necessary to collate with the inspection result of (1), and it is updated when the foreign matter inspection is performed (including when the pellicle is replaced).

The dimension inspection result information is required because it is necessary to correct the exposure amount of the stepper and scanner according to the size of the pattern dimension (thickness). This information is registered when the reticle is manufactured. This information is registered in the database during reticle production, registration / re-inspection, and re-sticking. The phase information is required because it is necessary to correct the exposure amount of the stepper and scanner depending on the size of the phase difference of the light-shielding film forming the reticle pattern.
Since the phase changes due to washing, the data input is changed at the time of washing again. For this information,
It is registered in the database at the time of registration / re-examination and re-pasting. The shot number confirmation information is necessary for confirming deterioration of the pellicle life, and the number of wafer shots is added when each reticle is used. This information is registered in the database during exposure on the wafer. As for the placement accuracy information, the scan correction of the scanner and the correction of X, Y, etc. of the iron plate are input according to the reduction ratio of the reticle. This information is registered in the database during reticle fabrication. The pellicle life information is necessary for grasping the number of uses because the pellicle life varies depending on the number of shots of the discarded par. The foreign substance information is necessary because it affects the reticle pattern depending on the environment in which the reticle is used.

After using the reticle 1, the user requests the reticle manufacturer or the like to reclean (g _{1 in} FIG. 18). The user logs in to the server 5 and writes the data of the number of times of recleaning into the database of the reticle quality information management system (g _{2 in} FIG. 18). Regarding the reticle re-cleaning information, the phase result fluctuates during re-cleaning of the reticle, and it is necessary to perform the exposure amount correction again. After shipping the recleaned reticle 1 (g ₃ and g _{4 in} FIG. 18), the user further uses the reticle 1.

After that, the user who uses the reticle 1 logs in the server 5 for each lot action and checks the reticle quality standard to know the quality condition of the reticle 1 at the time of use (d in FIG. 18). When the reticle quality information management system determines that the quality exceeds the standard, it activates the reticle quality assurance verification function such as the life cycle warning and the cleaning count warning, and mails the information warning via the Internet (see FIG. 18). h, f). Based on such mail information and browsing information, the user performs a recovery operation, calculates the reticle use condition, and optimizes the reticle exposure condition (j in FIG. 18).

By using the reticle quality information management system as described above, the user code that the reticle manufacturer and the user can know, and the data of the specific pattern 3 that only the reticle manufacturer and the reticle owner can know are logged in for login as they are. Instead of inputting on the screen, the code obtained by calculating the authentication code based on those data is also used for inputting on the login screen, so it is not necessary to input visual data and calculation data. Security is established and the login code is less likely to be leaked to the outside, and reticle information security management is strictly performed.

Moreover, by inputting the given data and the calculated data to the computer, it becomes a proof of the legitimate user who owns the reticle, and the reticle information of interest is assigned from the system side to secure the legitimate user. Can be earned. Note that, in the above-described embodiment, the management of the quality control information about the reticle used for manufacturing the semiconductor device has been described, but the system described above can be applied to the management of the quality information of other products. For example, the reticle is replaced with an automobile production part, a specific pattern is attached to a specific part of the automobile production part according to the agreement between the manufacturer and the automobile production factory, and the child code and the authentication code are calculated using the specific pattern. By logging in to the parts quality information management system using the authentication code, the user code, the parts code, and the child code, the owner of the parts for automobile production can acquire the parts quality information while ensuring the security. (Supplementary Note 1) Authentication code conversion means for converting data of a specific specific pattern attached to a product or its accessories into an authentication code, and login means for logging in to a quality database for the product using the authentication code. A product quality information management system comprising: a disclosure means for extracting data from the logged-in quality database and disclosing the data to the user. (Supplementary Note 2) The product quality information management system according to Supplementary Note 1, wherein the product is a reticle used for manufacturing a semiconductor device, and the accessory is a pellicle. (Supplementary Note 3) Attaching a specific pattern, which is a code unique to a product, to the product or its accessory, converting the specific pattern into an authentication code, and using the authentication code to log in to the quality database for the product. Product quality information management method characterized by. (Supplementary Note 4) The product quality information management method according to Supplementary Note 3, wherein the product is a reticle used for manufacturing a semiconductor device, and the accessory is a pellicle. (Supplementary note 5) After logging in to the quality database,
5. The product quality information management method according to supplementary note 3 or supplementary note 4, wherein quality information of the product is externally fetched from the quality database. (Supplementary note 6) The product quality information management method according to any one of supplementary notes 3 to 5, wherein the login is performed through the Internet. (Supplementary Note 7) The conversion from the specific pattern to the authentication code is performed by converting the code displayed in the specific pattern into a numerical code and further using a code conversion coefficient for generating unique information for each product. 7. The product quality information management method according to any one of appendices 3 to 6, wherein the child code for the product is converted based on the calculated value. (Supplementary note 8) The product quality information management method according to supplementary note 7, wherein a value obtained by adding a user code for the product to the child code is used as the authentication code. (Supplementary Note 9) The supplementary note 3 characterized in that the data in the quality database is changed or added after being logged in.
Product quality information management method described in. (Supplementary Note 10) In Supplementary Note 9, characterized in that whether or not the changed or added data in the quality database exceeds a quality standard is determined by a quality standard determination unit and a warning is given by a display unit or a voice unit. Product quality information management method described. (Supplementary note 11) The product quality information management method according to supplementary note 9, wherein the data in the quality database is verified and appropriate measures are displayed on the display unit. (Supplementary Note 12) A security management method in which a specific pattern for user authentication is attached to the product itself to be symbolized, and the product quality information system is logged in based on the specific pattern. (Supplementary Note 13) The supplementary note 1 characterized in that the product is a reticle or a pellicle used for manufacturing a semiconductor device.
The security management method described in 2.

[0053]

As described above, according to the present invention, the authentication code is calculated by using the unique special pattern attached to the product, and the result of the calculation is used to log in to the quality information management system to obtain the quality. Since the information is acquired, it becomes possible to safely disclose information to the person who uses the management information of the product, for example, the reticle history information / quality information, and it is possible to guarantee the protection of confidential information. In particular, by using the reticle quality information used in the wafer photo process for condition setting of the wafer photo process, condition setting for fine processing can be performed in a short time,
Also, by adding new conditions added in the wafer photo process, it becomes possible to obtain the latest reticle quality information at the new factory to which the product type has been transferred.

There is no other example in which the user account authentication code is calculated using the special pattern of the product, and it is very effective in disclosing confidential information only to a specific user. In the reticle quality information management system, implementation of such a function becomes indispensable, and such importance will increase as information disclosure is advanced in the future regarding protection of information security.

The life cycle of the conventional product is managed by the user who uses the reticle, but the user logs in to the quality information management system so that the manufacturer or the quality information management side manages the reticle quality information. This allows the product to be repaired before market complaints occur. For example, it becomes possible to support a re-pellicle and a re-manufactured reticle before a reticle has a claim.

[Brief description of drawings]

FIG. 1 is a diagram showing a flow of conventional reticle removal management.

FIG. 2 is a plan view of a reticle used in an embodiment of the present invention.

FIG. 3 is a plan view showing an example of a specific pattern used in the embodiment of the present invention.

FIG. 4 is a perspective view showing an example of a pellicle used in the embodiment of the present invention.

FIG. 5 is a flowchart (part 1) showing an example of quality information management according to the embodiment of the present invention.

FIG. 6 is a flowchart (part 2) showing an example of quality information management according to the embodiment of the present invention.

FIG. 7 is a diagram showing a communication mechanism of the quality information management system used in the embodiment of the present invention.

FIG. 8 is a flowchart showing a process up to login of the quality control system according to the embodiment of the present invention.

FIG. 9 is a diagram showing a login screen according to the embodiment of the present invention.

FIG. 10 is a configuration diagram of a data processing mechanism of the quality control system according to the embodiment of the present invention.

FIG. 11 is a login ID according to the embodiment of the present invention;
It is a figure which shows an example of a code.

FIG. 12 is a JIS first level kanji code table (1) used in the embodiment of the present invention.

FIG. 13 is a JIS first level Kanji code table (2) used in the embodiment of the present invention.

FIG. 14 is a flowchart showing a procedure for a user using a reticle to calculate an authentication code and log in to the system in the embodiment of the present invention.

FIG. 15 is a flowchart from pre-preparation for a code and ID to calculation of an authentication code in the embodiment of the present invention.

FIG. 16 is a diagram showing a display image of reticle data obtained after login in the embodiment of the present invention.

FIG. 17 is a diagram showing an example of a relationship between login and subsequent operations, browsing, and data acquisition in the embodiment of the present invention.

FIG. 18 is a flowchart showing rewashing, quality inspection, and warning according to the embodiment of the present invention.

[Explanation of symbols]

1 ... Reticle, 2 ... Light transmitting substrate, 3 ... Specific pattern, 4
... pellicle, 5 ... server, 6 ... computer, 7 ... Internet, 8 ... screen.

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Osamu Tsubaki             3-2-1 Sakado, Takatsu-ku, Kawasaki City, Kanagawa Prefecture               Fujitsu LSI Technology Co., Ltd.             Within F-term (reference) 2H095 BA02 BB31 BC31 BE04

Claims (5)

[Claims] 1. An authentication code conversion means for converting data of a specific specific pattern attached to a product or its accessories into an authentication code, and a login means for logging in to a quality database for the product using the authentication code. A product quality information management system comprising: a disclosure means for extracting data from the logged-in quality database and disclosing the data to the user. 2. The product quality information management system according to claim 1, wherein the product is a reticle used for manufacturing a semiconductor device, and the accessory is a pellicle. 3. A specific pattern, which is a code unique to a product, is attached to the product or its accessories, the specific pattern is converted into an authentication code, and the authentication code is used to log in to a quality database for the product. A product quality information management method characterized by the following. 4. The method for managing product quality information according to claim 3, wherein the product is a reticle used for manufacturing a semiconductor device, and the accessory is a pellicle. 5. The product quality information management method according to claim 3, wherein the quality information of the product is externally fetched from the quality database after logging in to the quality database.