EA009013B1 - Comprehensive front end method and system for automatically generating and processing photomask orders - Google Patents

Abstract

The present invention relates to a comprehensive front-end method and system for automatically generating and processing photomask orders. This method and system includes two separate, but related software components. The first software component of the present invention is used to generate a photomask order in a specified format. The second software component of the present invention processes at least a portion of the photomask order (which was generated using the first software component) into a substantially ready-to-write jobdeck file and/or a substantially ready-to-write inspection file, which in turn is transferred to a remote photomask manufacturer's system to manufacture a photomask. These software components can be installed as separate programs on a computer system or operate as a single software package performing multiple functions.

Description

Links to related applications

The application for this patent is a partial continuation of the following simultaneously pending patent applications: (1) application for US patent No. 10/852532, filed May 24, 2004 with the name "Automated production process and method for processing photomasks", which is a continuation of the application US patent No. 10/099522, filed March 14, 2002 (currently US patent No. 6760640), and (2) application for US patent No. 10/981201, filed November 3, 2004 with the name "Based on convenient for user rules system and methods for automatically the creation of orders for photomasks ", which is a continuation of the application for US patent No. 10/877001, filed June 25, 2004, which is a partial continuation of the application for US patent No. 10/209254, filed July 30, 2002 (currently patent US No. 6842881). The full content of each of these applications is fully included in this description.

FIELD OF THE INVENTION

This invention relates generally to an integrated interface method and system for automatically creating and processing photomask orders. In particular, this invention relates to a software-based application program that creates an order for a photomask in a predetermined format and then processes this order for a photomask, essentially, into a ready-to-write job package file and, essentially, a ready-to-write inspection file , which in turn is transmitted to the remote system of the manufacturer of photomasks for the manufacture of photomasks.

State of the art

Photomasks are high-precision plates containing microscopic images of electronic circuits. Photomasks are usually made of very flat pieces of quartz or glass with a layer of chrome on one side. A part of the electronic circuit design is etched in chrome. The design of the circuit on the photomask is also called "geometry."

A typical photomask used to fabricate semiconductor devices is formed from a “clean” or “undeveloped” photomask. As shown in FIG. 1, a typical blank photomask 10 consists of three or four layers. The first layer 11 is a layer of quartz or another substantially transparent material, commonly referred to as a substrate. The next layer is usually a layer of opaque material 12, such as Cr, which often includes a third layer of antireflection material 13, such as Cr. The antireflective layer may or may not be included in any given photomask. The top layer is typically a layer of photosensitive resistive material 14. Other types of photo masks are also known and used, including, but not limited to, phase shifting masks, built-in phase shifting masks with attenuation (EAP8M) and phase shifting masks with variable aperture (AAP8M). These types of phase-shift masks are characterized by design features, including opaque zones and partially transparent zones, through which the light phase shifts, for example, by approximately 180 °. Examples of such masks are described in US patent No. 6682861, in the publication of US patent No. 2004-0185348 A1, in the publication of US patent No. 2005-0026053 and in the publication of US patent No. 2005-0053847, all firms Ryoitoshs8, 1 ps., The full contents of which are included in this description.

The photomask manufacturing process involves many stages and can take a lot of time. Moreover, for the manufacture of the photomask, the desired pattern of the opaque material 12 to be created on the photomask 10 is usually specified by an electronic data file loaded into the exposure system, which usually scans an electron beam or laser beam in a raster or vector manner using a clean photomask. An example of such a raster exposure system is described in US Pat. No. 3,900,737 to Collier. Each individual exposure system has its own software and data processing format for issuing commands to equipment when exhibiting a clean photomask. When scanning an electron beam or laser beam through a clean photomask 10, the exposure system directs the electron beam or laser beam to addressable locations on the photomask in accordance with the electronic data file. Zones of photosensitive resistive material that are exposed by an electron beam or laser beam become soluble, while unexposed parts remain insoluble.

To determine where the electron beam or the laser beam should expose the photoresist 14 on a clean photomask 10, and where not, it is necessary to provide the processing equipment with the appropriate commands in the form of a task package. To create a job package, the images of the desired pattern are split (or split) into small standard shapes, such as rectangles or trapezoids. The crushing process can be very time consuming. After crushing, the image must be further modified, for example, if necessary, to resize the data, if necessary, rotate the data, supplement it with starting and internal reference marks, etc. Typically, a specialized computer system is used to perform crushing and / or creating a job package. Then the data of the task package must be transferred to the processing tooling to provide this tooling with the necessary commands to expose the photomask.

- 1 009013

After the exposure system scans the desired image onto the photosensitive resistive material 14, as shown in FIG. 2, the soluble photosensitive resistive material is removed by means well known in the art, and the unexposed, insoluble photosensitive resistive material 14 'remains adhered to the opaque material 13 and 12. Thus, the pattern to be formed on the photomask 10 is formed by the remaining photosensitive resistive material 14 '.

Then, the pattern is transferred from the remaining photoresistive material 14 'to the photomask 10 using the known etching process to remove the antireflection material 13 and opaque material 12 in areas that are not covered by the remaining photoresist 14'. There are a large number of etching processes known in the art, including dry etching as well as wet etching, and thus various equipment is used to perform such etching. After etching is completed, the remaining photoresistive material 14 'is removed or removed and a finished photomask is obtained, as shown in FIG. 3. In the finished photomask, the pattern, originally defined by the remaining antireflection material 13 'and opaque material 12', is located in areas where the residual photoresist 14 'remains after the removal of soluble materials in the previous stages.

To determine the presence of any unacceptable errors in a particular photomask, it is necessary to inspect the photomask. An error is any defect that affects the design of the circuit. This includes unwanted chrome zones (chrome spots, protruding parts of chromium, chromium bridges between structural elements of the circuit), or unwanted clean zones (thin holes, clean protruding parts, clean breaks). A defect can lead to the failure of a circuit made using a photomask. The customer in his specification of defects indicates the size of the defects that may interfere with the operation of the circuit. All defects of this size and larger must be fixed, or, if they cannot be fixed, the mask goes into marriage and is recorded again.

Automatic mask inspection systems, such as those manufactured by KTL-Teieog or Arrieb Ma1epak, are usually used to detect defects. Such automatic systems direct the illuminating beam to the photomask and measure the intensity of the part of the light beam passing through the mask and reflected back from the photomask. Then, the measured light intensity is compared with the expected light intensity, and the deviation is recorded as a defect. A detailed description of the system is presented in US patent No. 5563702 issued to the company KTA-Tepeog.

After passing the inspection, the finished mask is cleaned of contaminants. Then, a film can be applied to the finished photomask to protect its especially important area of the pattern from contaminants in the air. After applying the film, a defect check can be performed. In some cases, the photomask is cut before or after applying the film.

Before performing each of the above stages of manufacture, the manufacturer of semiconductor devices (for example, the customer) must supply the manufacturer of photomasks with data of various types related to the photomask to be manufactured. For this purpose, the customer usually provides an order for a photomask, which includes information of various types and data necessary for the manufacture and processing of the photomask, including, for example, data related to the construction of the photomask, the materials used, delivery dates, billing information and other information necessary for order processing and manufacturing photomasks.

A long-standing problem in the manufacture of photomasks is the amount of time it takes to produce a photomask after receiving an order for a photomask from the customer. This total time required for processing the order for the photomask and the manufacture of the photomask can be long, and thus the total output of the photomasks is not maximum. Part of this problem depends on the fact that many customers who order photomasks often submit their orders in several different formats, which are often not compatible with the computer system of the manufacturer of the photomask and / or with the equipment for their manufacture. In accordance with this, the manufacturer of the photomask often needs to reformat the data and conditions of the order, convert and / or add them to another format that is compatible with the computer system and / or equipment for the manufacture, which can take a very large amount of time and thereby lengthen the production time of the photomask .

As an attempt to solve this problem, various standard formats for photomask orders were developed in the photomask industry, in which photomask orders must be executed. For example, the 8ΕΜΙ P-10 standard is one standard format used to make photo masks. In addition, some manufacturers of semiconductor devices have developed their own photomask order format, in which photomask orders should be executed, instead of adapting to the standard format. These standard and proprietary photomask order formats were created in order to receive photomask orders from customers in a unified format in order to reduce the total time required to produce photomasks.

Although the use of such standard or proprietary photomask order formats is useful for shortening photomask manufacturing time, many semiconductor manufacturers

- 2,009,013 devices are reluctant to fulfill their orders for photomasks in such standard and / or proprietary formats for many reasons. For example, the standard order format 8ΕΜΙ P-10 is quite complex and requires the customer to complete the order with special working knowledge related to this standard. Since many manufacturers of semiconductor devices do not make photomasks, such manufacturers may not have the means, time and ability to study the intricacies of such a standard format. Thus, manufacturers of semiconductor devices often provide the photomask manufacturer with order data for the photomask in an unorganized and often incomplete form. As a result, the manufacturer of the photomask must analyze this data and organize it into the format used (for example, the format 8ΕΜΙ P-10). In addition, in cases where the manufacturer of photomasks is provided with incomplete order data for the photomask, this manufacturer is forced to request the missing information from the customer. As a result, a large amount of time is often spent in the process of obtaining a complete and accurate order for a photomask, and thereby the total time for manufacturing a photomask is much longer. Others are trying to solve these problems with automated systems. However, these systems, known from the prior art, have several disadvantages.

For example, in the past, LeipVie Sotrotiop (the predecessor of ΡΗοΐτοηίοδ, 1 ps.) Attempted to transfer electronic data using an Internet-based delivery system. However, although LeipVie SotrotaDop was able to quickly deliver photomask data from the customer to the computer system of the mask manufacturer and was able to evaluate the accuracy of these data in real time, this known system did not automatically create order data for the photomask in a single standard and / or proprietary format. Thus, after receiving data from the customer, standard data modifications must also be entered manually using operators. Each manual entry of the changed data increases the risk of human error and thereby increases the overall processing time of the order.

Since then, other systems have been disclosed in which manufacturing and billing data for payments has been downloaded via the Internet and verified automatically online. One such system is described in PCT 02/03141, published January 10, 2002 and owned by EiRop! Ryooshosh8k, 1ps., Which is also the subject of US Pat. No. 6,622,295. In particular, EnRoSh's PCT publication discloses a system in which customer data for a photomask is entered online by a customer and transmitted to the photomask manufacturer for processing. In this system, the customer receives prompts for entering order data for the photomask. This data is transmitted to the manufacturer of the photomask, which in turn carries out a diagnostic evaluation of the data. If some data is incomplete or inaccurate, the system sends a message to the customer about this error. After that, the user must correct the error. After evaluating the data by the manufacturer (and, if necessary, after correction), the manufacturer of the photomask processes this data and translates it into a standard (or proprietary) format, such as the standard 8ΕΜΙ P-10 format.

Although the system is EiRop! useful for diagnostic purposes, it is very cumbersome and provides the user with very little flexibility when formulating an order for a photomask depending on the customer whose data is entered. EiRop system! does not provide profiling of customer information based on the entered general information. Another drawback of the EiRogI system is that the customer must re-enter the specific information related to the order every time the customer uses the system and cannot use the information entered in previous orders. Thus, the use of the EnRosh system to create an order for a photomask takes a lot of time.

According to the prior art, after receiving the order for the photomask from the customer and transferring to the correct format, it is necessary to process this order so that the photomask can be recorded using the corresponding production equipment and checked using the corresponding production equipment. In the normal process of making a photomask, many of the steps necessary to make a finished photomask are performed manually or automatically. As a result, methods and systems known from the prior art for performing these steps are not effective, time consuming and highly dependent on the human factor.

In particular, after the manufacturer receives the order for the photomask from the customer, the operators must sort the information received and manually send it to a suitable processing site or to the appropriate department for which the information is intended. For example, billing information needs to be sent to the finance department, and the picture data needed for crushing should be entered into the crushing computer, and the rest of the job package information should be sent to the corresponding processing section. If the information is provided in a format other than that of the manufacturer’s computer, this is also manually recognized, and then the file is converted to the appropriate format. If the manufacturer of the photomask wishes to track the passage of the photomask through the manufacturing process, it was necessary to separately contact each site and find out the status of the photomask from the operator. Due to the fact that the manufacturer of semiconductor devices requires that the same pattern be used by many different machines, the operator must manually program the crushing computer to perform the corresponding modifications.

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Similarly, since the format specified by some customers needs to be modified in accordance with the photomask manufacturing process used, these data modifications entered into the crushing computer must also be entered manually by the operator. Systems according to the prior art do not provide the ability to automatically record and process these changes.

A long-standing problem in the industry for the manufacture of photomasks is the problem of reducing the time from receiving an order from the customer to the manufacture and delivery of processed photomasks. One of the ways used in the past to solve this problem is to create industry standards, such as the 8ΕΜΙ P-10 standard, which has been modified and updated over the years, which establishes the form in which it is necessary to electronically provide data to manufacturers of photomasks. Although these standards are useful, they do not in themselves provide a seamless automation of the processing of information necessary for the manufacture of photomasks.

After completion of the above stages of manufacturing, the finished photomask is sent to the customer for use in the manufacture of semiconductor or other products. In particular, photomasks are commonly used in the semiconductor industry to transfer microscopic images defining a semiconductor circuit onto a silicon or gallium arsenide substrate or plate. The process of transferring an image from a photomask to a silicon substrate or wafer is usually called lithography or microlithography. Typically, as shown in FIG. 4, the manufacturing process of the semiconductor device comprises the steps of deposition, photolithography, and etching. During deposition, a layer of either an electrically insulating or electrically conductive material (such as metal, polysilicon or oxide) is applied to the surface of the silicon wafer. This material is then coated with a photosensitive resist. Then use a photomask like using a photographic negative to take a photograph. Photolithography involves projecting a photomask image onto a plate. If the image from the photomask is projected several times next to each other on the plate, then this technique is known as step-by-step multiplication, and the photomask is called the photo original.

As shown in FIG. 5, to create an image 21 on the semiconductor wafer 20, a photomask 10 is placed between the semiconductor wafer 20, which includes a layer of photosensitive material, and the optical system 22. The energy generated by the energy source 23, usually called the step multiplier, cannot pass through the zones of the photomask 10, where there is opaque material. The energy from the step multiplier 23 passes through the transparent parts of the quartz substrate 11 that are not coated with an opaque material 12 and antireflective material 13. The optical system 22 projects a large-scale image 24 of an opaque material 12 and 13 onto a semiconductor wafer 20 and causes the photosensitive material to react on the semiconductor wafer. The solubility of the photosensitive material varies in areas open to energy. In the case of a positive photolithographic process, the exposed photosensitive material becomes soluble and can be removed. In the case of a negative photolithographic process, the exposed photosensitive material becomes insoluble and the unexposed soluble photosensitive material is removed.

After removal of the soluble photosensitive material, the image or pattern formed in the insoluble photosensitive material is transferred to the substrate using a process well known in the art and commonly referred to as etching. After etching the pattern on the substrate material, the remaining resist is removed to obtain the finished product. Then a new layer of material and resist is deposited onto the plate and the image of the next photomask is projected onto it. This process is repeated until the completion of the circuit. Since several layers can be deposited in a typical semiconductor device, several different photo masks may be needed to make even a single semiconductor device. In fact, if a semiconductor device manufacturer uses more than one piece of equipment to manufacture a semiconductor device, then more than one photomask may be required even for each layer. In addition, since different types of equipment can be used to expose the photoresist on different production lines, even for many photo masks with the same pattern, additional changes in size, orientation, scale and other attributes may be required to take into account differences in equipment for the manufacture of semiconductor devices. Similar adjustments may be necessary to account for differences in the lithographic equipment of the photomask manufacturer. These differences must be taken into account during the production of photomasks.

SUMMARY OF THE INVENTION

Although the prior art is of interest, known methods and devices according to the prior art have several limitations that this invention seeks to overcome.

In particular, the purpose of this invention is to provide an integrated interface method and system for creating and processing orders for photomasks.

Another objective of this invention is the creation of a rule-based system and method for automatically creating an order for a photomask in one or more standard and / or proprietary formats, the rules can be adapted or modified to fit any number of different standard and / or proprietary formats known in present or developed

- 4,009,013 data later.

Another objective of this invention is the creation of a rule-based system and method for automatically creating an order for a photomask in one or more standard and / or proprietary formats, the system and method requiring the user to follow a set of rules associated with a standard and / or proprietary format orders for photomasks.

Another objective of this invention is the creation of a rule-based system and method for automatically creating an order for a photomask in one or more standard and / or proprietary formats, the order being created by merging an existing order (s) for the photomask and / or templates containing photomask data in one new order.

Another objective of the present invention is the creation of a rule-based system and method for reducing the time it takes to create an order for a photomask and enter data.

Another objective of the present invention is the creation of a rule-based system and method for increasing the overall performance of manufactured mask masks.

Another objective of the present invention is to provide a rule-based system and method for reducing transcription errors associated with manually entering photomask orders.

Another objective of this invention is the elimination of manual interference in the transmission and processing of order data for the photomask for the manufacture of photomasks.

Another objective of this invention is to reduce the preparatory time and the total processing time from the time the manufacturer receives the photomask necessary for processing information from the interface processor of the photomask to the time of delivery of the finished photomask to the interface processor of the photomask.

Another objective of this invention is to improve the accuracy and efficiency of processing photomask data and transmission for manufacturing.

Another objective of this invention is to eliminate the disadvantages of the prior art.

Other objectives follow from the foregoing description.

It was found that the above and related objectives of the present invention are achieved using an interface method and system for automatically creating and processing at least parts of orders for photomasks, essentially in a format ready for recording and, essentially, ready for inspection format.

In particular, this invention relates to a method for processing mask data by converting design data as an electronic circuit design data file for use in the manufacture of a photomask having substantially transparent and substantially opaque elements into a data format suitable for a given processing for the manufacture of photomasks. This method comprises the following steps: inputting design data using a given form of electronic circuit design data; entering requirements for processing the order for the photomask made in accordance with the design data; resizing structural data to facilitate the process of moving substantially transparent and substantially opaque elements in the photomask; crushing at least a portion of the construction data substantially into a record-ready format compatible with a predetermined processing for making a photomask; checking the integrity of fragmented structural data; merging two or more datasets created from one or more of the following data types: (1) entered design data; (ίί) resized design data; (ίίί) fragmented data; and (ίν) verified fragmented data; forming a data set to ensure compatibility with the mask manufacturing process; and transmitting electronic signals corresponding to the generated data set to a remote manufacturing system associated with a predetermined processing for manufacturing the photomask.

Similarly, the present invention relates to a method for processing mask data by converting design data into an electronic circuit design data file for use in the manufacture of a photomask having phase-shifting and substantially opaque elements into a data format suitable for a given processing for manufacturing a photomask. The method comprises the steps of inputting design data using a predetermined form of electronic circuit design data; entering requirements for processing the order for the photomask made in accordance with the design data; the use of near optical correction to facilitate the process of moving phase-shifting and essentially opaque elements in the photomask; crushing at least a portion of the construction data substantially into a readable format compatible with a predetermined processing for making a photomask; checking the integrity of fragmented structural data; merging two or more data sets of one or more of the following data types: (ί) the entered design data; (ίί) resized design data; (ίίί) fragmented data; and (ίν) verified fragmented data; forming a data set to ensure compatibility with the mask manufacturing process; and transmitting electronic signals corresponding to the generated data set to a remote manufacturing system associated with a predetermined processing for manufacturing the photomask.

Additionally, this invention relates to an automated system for processing

- 5 009013 design data by converting the design data into an electronic circuit design data file for use in the manufacture of a photomask having substantially transparent and substantially opaque elements into a data format suitable for a given processing for manufacturing a photomask containing A computer-readable medium containing instructions. These commands are executed with the possibility of execution in a processor capable of performing the following steps: input of structural data using a given form of electronic circuit design data; entering requirements for processing the order for the photomask made in accordance with the design data; resizing structural data to facilitate the process of moving substantially transparent and substantially opaque elements in the photomask; crushing at least a portion of the construction data substantially into a record-ready format compatible with a predetermined processing for making a photomask; checking the integrity of fragmented structural data; merging two or more data sets from one or more of the following data types: (ί) the entered design data; (i) resized design data; (ίίί) fragmented data; and (ίν) verified fragmented data; forming a data set to ensure compatibility with the mask manufacturing process; and transmitting electronic signals corresponding to the generated data set to a remote manufacturing system associated with a predetermined processing for manufacturing the photomask.

The invention further relates to an automated system for processing structural data by converting structural data into an electronic circuit design data file for use in the manufacture of a photomask having substantially transparent and substantially opaque elements into a data format suitable for preset processing for the manufacture of photomasks. This system contains at least one server containing memory, a first software component and a second software component for processing mask data, while data related to the mask design is stored in memory, the first software component contains commands that control user input requirements for processing the order for the photomask, made in accordance with the design data, the second software component contains commands for parsing and mask pattern data and requirements data in a format suitable for manufacturing, while the second software component contains commands for performing the following tasks: (ί) resizing structural data to facilitate the process of moving essentially transparent and essentially opaque elements in the photomask; (ίί) crushing at least a portion of the structural data substantially into a record-ready format compatible with a predetermined processing for making a photomask; (ίίί) integrity checks of fragmented structural data; (ίν) merging two or more data sets from one or more of the following data types: (a) entered design data; (B) resized design data; (c) fragmented data; and (ά) verified fragmented data; (ν) generating a data set to ensure compatibility with the mask manufacturing process; and circuits for transmitting electronic signals corresponding to the generated data set to a remote manufacturing system associated with predetermined processing for manufacturing the photomask.

In addition, this invention relates to an automated system for processing structural data by converting structural data as an electronic circuit design data file for use in the manufacture of a photomask having phase-shifting and substantially opaque elements into a data format suitable for a given processing for manufacturing photomasks containing a computer-readable medium containing commands. These commands are executed with the possibility of execution in a processor capable of performing the following steps: input of structural data using a given form of electronic circuit design data; entering requirements for processing the order for the photomask made in accordance with the design data; the use of near optical correction to facilitate the process of moving phase-shifting and essentially opaque elements in the photomask; crushing at least a portion of the construction data substantially into a readable format compatible with a predetermined processing for making a photomask; checking the integrity of fragmented structural data; merging two or more data sets of one or more of the following data types: (ί) the entered design data; (ίί) resized design data; (ίίί) fragmented data; and (ίν) verified fragmented data; forming a data set to ensure compatibility with the mask manufacturing process; and transmitting electronic signals corresponding to the generated data set to a remote manufacturing system associated with a predetermined processing for manufacturing the photomask.

The present invention also relates to an automated system for processing structural data by converting structural data as an electronic circuit design data file for use in the manufacture of a photomask having phase-shifting and substantially opaque elements into a data format suitable for a given processing for manufacturing a photomask. The system comprises at least one server containing memory, a first software component and a second software component for processing mask data, wherein data related to the mask structure is stored in memory, the first component

- 6 009013 software provides commands that control the user entering the requirements data for processing the photomask order made in accordance with the design data, the second software component contains commands for parsing mask pattern data and requirements data into a format suitable for manufacturing, while the second software component contains commands for performing the following tasks: (1) resizing structural data to facilitate the process of moving the phase shift lev els and substantially opaque elements in the photomask; (i) crushing at least a portion of the structural data substantially into a record-ready format compatible with a predetermined processing for making a photomask; (iii) integrity checks of fragmented structural data; (ίν) merging two or more data sets from one or more of the following data types: (a) entered design data; (B) resized design data; (c) fragmented data; and (b) verified fragmented data; (ν) generating a data set to ensure compatibility with the mask manufacturing process; and circuits for transmitting electronic signals corresponding to the generated data set to a remote manufacturing system associated with predetermined processing for manufacturing the photomask.

Brief Description of the Drawings

The above and related objectives, features and advantages of the present invention follow from the following detailed description of a preferred, albeit illustrative, embodiment of the present invention with reference to the accompanying drawings, in which FIG. 1 - clean or undeveloped photomask according to the prior art;

FIG. 2 - photomask according to FIG. 1 after partial processing;

FIG. 3 - photomask according to FIG. 1 and 2 after complete processing;

FIG. 4 is a graphical diagram of a method of using a processed photomask for manufacturing or processing a semiconductor wafer;

FIG. 5 is a manufacturing process of a semiconductor device using a stepwise plate multiplier;

FIG. 6 is a graphical diagram of a general process for creating and processing photomask orders in accordance with this invention;

FIG. 7 illustrates a photomask order creation system according to one embodiment of the invention; FIG. 8 is an example of a graphical user interface used in the invention for directing user input of predetermined data;

FIG. 9 is a block diagram of a configuration of an automated manufacturing system according to this invention;

FIG. 10 is a screen shot of a data matrix implemented in a processing server according to this invention;

FIG. 11 is a screen shot of a data submatrix associated with a hyperlink to a data matrix according to FIG. 10 implemented in a processing server according to this invention; and FIG. 12 is a block diagram of an alternative multi-purpose configuration of the present invention shown in FIG. nine.

Detailed Description of the Preferred Embodiment (s)

This invention relates to a comprehensive interface method and system for automatically creating and processing orders for photomasks. This method and system includes two separate but related software components. The first software component according to this invention is used to create a photomask order in a given format. The second software component according to this invention processes at least a portion of the photomask order (which was created using the first software component) into a substantially ready-to-write job package file and / or essentially a ready-to-write inspection file, which in turn is transmitted to the remote system of the manufacturer of the photomask for the manufacture of the photomask. These software components can be installed as separate programs in a computer system or used as a single software package that performs many functions. A general graphical diagram of the system and method according to the invention is shown in FIG. 6, and details of this system and method are shown in FIG. 7-12.

As shown in FIG. 6, the design data of the photomask and the requirements for the manufacturing process are obtained from one object (for example, from a computer system of the designer of a semiconductor device) who wants to order a photomask. This computer system of the designer of the semiconductor device may be part or executed separately from the computer network of the interface processor. If it is remotely connected, it can be connected using an ETP connection (data transfer protocol), secure communication via the Internet or a service data network (as will be described below) or using other technology known or developed in the future. The first software component according to this invention is installed in the computer system of the photomask order processor and is used to enter and process the data of the manufacturing process requirements in a given format (for example, 8ΕΜΙ P-10). In the preferred embodiment, you

- 7 009013, the second software component according to this invention is also installed in the same system as the first software component. Alternatively, the second software component may be installed in a separate computer system, which is connected to the first component as the first computer system, for example, through a network, a service data network, as will be described below.

The second software component according to this invention receives photomask design data that has already been entered into the system as an electronic file. The second software component then processes the received design data and requirements data. For this, the second software component (ί) changes the size of the design data for binary photomask designs or performs correction of the optical approximation of the design data for phase-shift mask designs; (i) performs crushing of structural data; (w) verify the integrity of the fragmented data; (ίν) merges the data sets created during the processing of structural data and requirements data; and (ν) forms these combined data sets into substantially ready for inspection and / or substantially ready for recording data files. After completing these steps, the generated data is transmitted using an electronic signal (eg, email) to the manufacturer of the photomask for processing. In one embodiment, before completing these steps, an electronic signal (eg, email) is transmitted to the photomask manufacturer indicating that a photomask order has been entered, and requesting the photomask manufacturer about information related to the manufacturing equipment and associated tooling used for manufacturing photomasks. The manufacturer, in turn, sends an electronic signal to the photomask processor system that provides this information. This information is taken into account when completing data entry for the manufacturer. Although in a preferred embodiment, these steps are performed as shown in FIG. 6 order, it should be understood that the present invention and the attached claims are not limited to this order of the stages, which can be modified to meet the requirements of a particular order and manufacturing process.

Before describing the software components and the associated method according to this invention, it is first necessary to provide a description of the type of information necessary to create an order for a photomask and to manufacture a photomask in accordance with this order. In particular, as indicated above, a photomask is usually necessary for the manufacture of semiconductor and other devices. Often, before making a mask, an object wishing to have a photomask must first construct a photomask to be manufactured. To do this, this object develops certain data and technical requirements that must be provided to the manufacturer of the photomask. In particular, this object creates drawing data in its computer (1); and (2) other specified requirements related to a given task, which are often provided in an industry standard format, such as standard 8ΕΜΙ P-10, but may be presented in other custom formats.

Pattern data is usually created in the form of a drawing and usually shows various shapes and lines to be included in the photomask. However, the figure data is not necessarily complete. In other words, the pattern data does not necessarily include the necessary descriptions corresponding to the pattern data, including, but not limited to, information such as critical dimensions of the pattern, color shades used in different areas of the pattern, registration information, actual mask pattern location, exposure information Inspection information to name a few. Instead, the pattern data shows only the general shape of the pattern to be etched on the photomask. Figure data can be provided in any electronic format that can be parsed.

In accordance with this, in addition to presenting the figure data, the object constructing the photomask must also provide additional necessary information to the manufacturer in order to complete the processing steps, usually in the form of 8ΕΜΙ P-10. 8ΕΜΙ P-10 is a description of a data structure designed to facilitate the transfer of photomask order data between software systems to ensure that such orders are automatically processed by the photomask manufacturer. Form 8ΕΜΙ P-10, which has been improved over many years, includes such information as, for example, customer information, critical size information, shade information, registration information, billing information, format codes for drawing information provided separately , sizes and scale factors for the finished photomask, crushing scale, types of substrate and film, to name a few. Standard 8ΕΜΙ P-10, as well as its predecessors, is included in this description as an identification of the type of information that can be included in the exchange of data between the customer and the manufacturer of the photomask. For simplicity of designation, non-drawing information that is submitted electronically is called in this case a photomask order. However, it should be noted that this invention is not limited to the current version of the 8ΕΜΙ P-10 standard and can be easily modified to meet any future changes to this standard. In addition, the invention is not limited even to standard formats and is also applicable to custom formats, which are also for

- 8 009013 simplicity of designation is indicated in this case as an order for photomask. According to this invention, the first software component and the associated method are used to guide the user in the order entry process in order to create an order in a specific format.

In particular, according to this invention, a rules-based computerized system and method for creating orders for photomasks in a predetermined format is created, while an object wishing to have a manufactured photomask (hereinafter referred to as the “interface photomask processor”) is sent in the process of entering the order data necessary for the manufacture of photomasks, so that the data is complete and accurate and meets the requirements of a given order format. Examples of an interface photomask handler include, but are not limited to, a photomask designer, a semiconductor device manufacturer, a photomask manufacturer client, to name a few.

To perform these functions in the system and method, the first software component is used, which includes a combination of one or more of the following five subcomponents to create an order for the photomask in the desired format: (1) templates into which data is entered; (2) rules for converting data entered into templates into a given standard and / or proprietary format; (3) a method of using templates to create an order for a photomask in a given format; (4) a separate set of rules for verifying the correctness of an order for a photomask with respect to a given standard format; and (5) specification indicators, which are one or more unique attribute objects associated with a photomask template or order and that can be transferred using a template or order.

The software is implemented in the system according to this invention for associating specific patterns with specific rules in order to ensure that the interface handler of the photomask provides full and accurate information about the order for the photomask. Similarly, the software is implemented in the system according to this invention for linking specific photomask orders with specific rules in order to ensure that the photomask interface handler provides complete and accurate photomask order information. Specification metrics can be considered reference data and applied to the template, order, or template used to create the order. The presence of templates and orders that include specification indicators as reference data makes it easy to update a large number of templates and / or orders by changing only a small number of specification indicators.

Before describing the software, you must first provide a description of the method in which templates, orders and rules are stored and organized. In particular, the system includes a server including at least one processor and one external storage medium stored in the server. Rules and templates to facilitate the entry of photomask order data and order creation are stored in an external storage medium. An external storage medium may be a storage medium of various types, including, but not limited to, a relational database, an object-oriented class, an XMB file, and other similar storage media known or developed in the future. By storing the storage medium outside the system and by providing flexibility of the type of storage medium that can be used in the system and method, according to the present invention, many different users and automated systems can dynamically use a system with many different platforms.

In a preferred embodiment, a set of templates and orders is created based on the requirements of a private standard and / or proprietary format for ordering a photomask. For this, templates and orders are organized in the form of a hierarchy of components and subcomponents, with each component and subcomponent being determined by the requirements of a private standard and / or proprietary format for ordering a photomask. For example, a private photomask order format may require that the mask data component include certain subcomponents, such as name, barcode, and pattern data, to name a few. Each of these subcomponents can have more detailed subcomponents (“child components”). For example, a drawing data component, which is a subcomponent of mask data, may have a set of child components associated with it. Depending on the requirements of the standard and / or proprietary photomask order format, these child components may also have additional subcomponents, which in turn may have their own subcomponents, etc.

Each of the components and their associated subcomponents are defined as a set of attributes (for example, binary, chain, integer, data, Boolean expression, list, etc.). Since templates are used to create orders for photomasks, the rules (a detailed description of which will be given below) associated with any given template are a subset of the rules associated with the order for the photomask, which is executed according to the template. According to this invention, templates, orders, components, subcomponents, etc. can be stored separately. This allows the user not to use certain components or subcomponents in the template, but to use these separately stored components and subcomponents as reference indicators for the template. If you create a new order for the photomask according to this template, you can make changes to these components and under

- 9 009013 components, and you can only make changes to separately stored specification data without changing the template.

The table shows an example of organizing components and subcomponents of templates and orders in accordance with the standard and / or proprietary format for ordering a photomask.

Table

Order Supplied Pattern Data Drawing group Figure Location Mask data Title Bar code OCR Definition Matrix Registration Criteria File Registration Crystal Data Inspection Crystal Inspection Surface definition Drawings Critical size Crystal Data Inspection Crystal Inspection Field Drawings Critical size Crystal Data Inspection Crystal Inspection

In the table, input to the first (leftmost) column is the parent for input to the second column (child), and input to the second column is parent to input to the third column, etc. As an alternative solution, any two adjacent columns can define components (left column) and subcomponents (right column). As shown in the table, the same components may appear as subcomponents for other components. For example, critical-size data appears as a subcomponent for the pattern data in column 4 and column 5 of the table. Since each component and its associated subcomponents can be stored separately from each other and from the order or template, any of them can also be copied from one part of the order to another part of the same order or another order, template, component, subcomponent, etc. . This flexibility of copying and pasting components and subcomponents allows the user to quickly create many orders for photomasks without having to enter the same order information.

Templates and orders can be created manually using the graphical user interface. Templates and orders can also be created or modified automatically using information from the order, an external storage medium, including, but not limited to, non-formatted text files, XMB files, or any type of data from a device or data storage mechanism. For example, a photomask handler interface computer may include such files, databases, or other electronic information that is useful for creating a new template or order, or provides information for an existing template or order. The data processing mechanism can be used to transfer the necessary information from these external storage media to new or existing templates or photomasks. For example, you can use conversion or distribution software to convert files or databases of the front-end photomask handler into the format you need for your application. A commercially available example of such software is 1) a! A, ΙιιικΤιοη, a visual design tool for quickly integrating and converting data between hundreds of applications and structured data formats. However, you can use any suitable commercial or proprietary software to accomplish this task. External information can be entered into templates or on-site orders in the order processing system or using an existing external network, such as a global network, or a local network, or the Internet, etc. They can be recognized.

- 10 009013 also by other well-known technologies, such as the RTP protocol (data transfer protocol), e-mail, 1Shr, proprietary protocols or any other known protocols that may be available for information transfer. When using the graphical user interface, the user can receive prompts for entering specially numbered data. In FIG. Figure 8 shows a typical graphical user interface that can be used in the photomask ordering system. In this example, shown in FIG. 8, the graphical user interface gives the user prompting commands for entering descriptive information related to the photomask to be ordered. In this example, information is entered, including the name of the mask, state, type of product, to name some of them. In some cases, such as with the name of the mask, information is directly printed. In other cases, information can be selected from the drop-down menu, for example, as in the case of a product type category.

Templates and orders can also be created and modified automatically using information from other external media, including, but not limited to, unformatted text files, XMB files, or other types of devices or mechanisms for storing data. For example, a photomask handler front-end computer may include such files, databases, or other electronic information useful for creating a new template or order or providing missing information for an existing template or order. Similarly, order template, component, subcomponent, etc. can be transferred electronically, for example, using a scanner or other file conversion technology, so that you can convert and reformat a pre-existing order, template, component or subcomponent for use in the photomask order creation system. For example, you can use conversion or distribution software to convert files or databases of the front-end photomask handler into a format that you need to use. A commercially available example of such software is Ea1a1ps1yup, a visual design tool for quickly integrating and converting data between hundreds of applications and structured data formats. However, you can use any suitable commercial or proprietary software to accomplish this task. External information can be entered into templates or orders on the spot in the order processing system or using an existing external network, such as a global network, or a local network, or the Internet, etc. They can also be recognized by other well-known technologies, such as the RTR protocol, email, 1Shr. proprietary protocols or any other known protocols.

All operations performed by a person using a graphical user interface can also be performed, at least in part, automatically without direct information from a person. According to the present invention, this is achieved using scripting technology based on a set of clear text commands or a command line. A set of clear-text commands is a high-level programming language that can be interpreted in the application programming interface to issue instructions to an application to execute a sequence of operations. For example, a command line that says “replace the name of device A with the name of device B” can be transmitted by the user to the network of the interface handler of the photomask or automatically, as mentioned above. When the system accepts this command line, it replaces the device name in a specific template or order for a new device name. Naturally, this is just one example of the use of a set of commands and should not limit the invention. You can create custom modules for use in the system interface handler of the photomask to access this command using any programming language that can create an A8SP or a binary file and execute an operating system command. Automated execution allows authorized users to access any authorized system through an existing network connection. You can use the usual security measures, such as a firewall, registrations, passwords, etc. to protect privacy and protect database data and mask ordering system.

Thus, templates, orders, components, subcomponent, etc. can be created and / or modified using scripting technology using the command line or any other design environment. The scripting technology preferably includes a command line program that takes as an argument the script name entered by the user, which contains several commands for processing orders, templates, components and / or subcomponents, etc. in a specific way. Some or all of the editing functions that are available to the user through the graphical user interface can preferably be made available in the scripting technology using scripting commands.

In a preferred embodiment, the script commands can be used for editing functions such as creating new orders, editing existing orders, creating orders from templates, adding new components or subcomponents to an order, template, components or subcomponents, modifying components or subcomponents, saving orders, creating 8EM files! P-10 or files in another comparable format or standard from orders, to name not

- 11 009013 of which. In addition, scripting technology can query data and perform batch editing of multiple orders and templates at the same time.

The script file used in scripting technology may be in the form of a plain text file that contains one or more script commands.

A script command may include functions such as a variable description, purpose, function call, if statement for each operator, a loop operator with a continuation condition, to name a few. The variable description command is used to describe the variable to be used before using it to store the amount of data for later use. The variable description command may contain a description of the data type of the variable to be used. The data type of a variable can be one of the following: chain, number, Boolean expression, date, list, tree element. A string can represent a sequence of zero or more characters. The number may be an integer or fractional number of any practical size, which may be positive, zero or negative. A boolean expression can be true or false. The date may represent a specific day and may also include the time of day. The list may represent a list of data values of the same type. A tree element can represent an object from the hierarchical tree of the photomask order system, such as an order, photomask, template or drawing, etc.

Using the function call command, you can make a call a function in the system library. Functions that can be called from the system library may include functions for general management of orders, templates, components and subcomponents, functions for handling individual tree elements, functions for handling fields of a private tree element, functions for processing data values, functions for processing lists quantities and other functions of general or special purpose.

Examples of calling functions for general management of orders, templates, components and subcomponents may include, but are not limited to, creating an order (to create a new empty order), creating an order from a template (to create a new order from a given template), opening an order (to open an existing order), creating a template (to create a new template), opening a template (to open an existing template for editing), applying a date schedule (to use an existing pre-defined date schedule for running ska order or template from a given date), save (to save changes to the order template in the database), create a file 8ΕΜΙ P-10 (to create a file 8ΕΜΙ P-10 from this order), create and transfer a file 8ΕΜΙ P-10 (for creating an 8ΕΜΙ P-10 file from a given order and transferring it using a specified transfer method, for example, using a protocol for transferring data via the Internet to a specified location), erasing an order (to erase a given order from the database), erasing a template (to erase a given template from the database) to name some of the n them.

Examples of calling functions to process individual tree elements may include, but are not limited to, creating a tree element (to create a new, empty tree element of a given type), copying a tree element (to create an exact copy of a tree element, including related child tree elements) , search for a tree element (to determine the location of a given type anywhere below another tree element that meets certain specified criteria), search for a parent (to obtain the parent tree element for th element of the tree), a tree, a replacement (to replace this part of the text in all the text fields within specified type, starting from a specified object), to name a few.

Examples of calling functions for processing fields of a tree element may include, but are not limited to, searching for a field (to obtain the field value of a tree element), setting a field (to set the field value of a tree element), adding a field element (to add a new value to a field of a tree element that appears in the type list), deleting a field element (to remove an element from the field of a tree element that appears in the list), to name some of them.

Examples of calling functions to process date values may include, but are not limited to, creating a date (to create a new date with a given value), adding a date (to add a given time period to a date), subtracting a date (to subtract a given time period from a date) to name a few.

Examples of calling functions to process lists of values may include, but are not limited to, adding an item to the list (to add a new item to the list, the new item being the same type as the other items in the list), deleting the list item (to delete an element from the list), the contents of the lists (to determine whether a given value is contained in the list), the size of the list (to determine the number of elements in the list), to name some of them.

Examples of common or special purpose functions may include, but are not limited to: zero (to determine if a value is a zero value), print (to print a message on a screen), to name a few. Any type or type of function that the user may consider desirable may be included as functions in the system library. The list of function calls in the system library can be updated or reviewed at any time.

- 12 009013

Assignment commands assign a new value to a variable. The if statement allows the script to make decisions based on some criteria. A command for each operator or for each of the operators provides an iteration in some given list. A loop operator command with a continuation condition is a generalized cyclic logical structure. The enable command specifies that another script must be run at a given time.

Basically, command lines can appear in any order. However, usually the sequence should follow the logic, since the commands are usually executed sequentially. The command line may or may not be case sensitive, depending on the preferences of the system designer.

Comment lines can be included as text in the script file to improve the readability of the script file by explaining in the user's native language (for example, English, Russian, etc.) what is being done. Typically, when comment lines are included in a script file, this information is ignored when the script file is executed. In addition, the script file may be formatted to allow the user to include spaces or empty carriage returns to facilitate reading the file without adversely affecting the execution of the script file.

After full or partial creation, in one embodiment of the system according to the invention, orders, templates, components and / or subcomponents can be transferred or made available to various users of the system or various systems according to this invention. For example, one user in a photomask interface processor can send a template or order by email or another way to another user of this photomask interface processor or another photomask interface processor, so that the transferred template or order can be used to execute a new or modified template or order. Naturally, this transmission can occur using other transmission methods, such as the ETP protocol, or transmission on a disk or other storage medium. As a security measure, you can use access codes or other technologies to restrict access to orders, templates, components and / or subcomponents, etc. to prevent unauthorized access and / or modification.

When making an order for a photomask, interface photomask processors may not have access or know all the necessary information to complete the order. In the past, the lack of such information slowed down the order completion process and required the manual collection of the required information from suitable sources.

According to one embodiment of the invention, such information is automatically extracted, at least in part, from other sources that have the necessary information and require little or no input from the interface of the photomask processor. For example, in the case when it is necessary to enter information in an order that is controlled by the first set of rules that is not available for the interface mask processor, the data processing mechanism according to this invention provides access to data service agents that provide the ability to search for the necessary information. One example of such a data service agent includes 8egu1ceOb_) ek18, which provides users with simultaneous access to Internet sites, databases, intranets and other internal and external resources, as if the content existed in one place, and to packet information such as transport information, in a format accessible by other programs. In this example, the application sends a date request to the data service agent, which searches for transportation options that are available for the photomask to be ordered. The data service agent in turn forwards the requested information back to the application program, which then provides the information to the front-end photomask processor using the application program. Other types of data service agents can be involved for information such as logistics, inventory, supply characteristics, equipment availability, start-up time, tool processing time, load levels, performance information, or any other such information that the front-end photo mask processor wants the purpose of preparing a specific order for photomask. You can also create script commands to access data through data service agents or otherwise.

The data service agent can be located on-site in the computer or network of the front-end photomask handler, or remotely from the order processing system of the front-end photomask handler, and can itself access data from any number or type of remote computer systems (for example, computer systems of logistics service sellers , computer systems of parts suppliers, computer systems of equipment suppliers, etc.) through an interface known to both the application program and the data service agent, and can use Use This Criterion any number of available protocols, including, for example, 8OLR, XML, XML-RNC eHM, HTML, etc. The data service agent can search (for example, by querying) these remote systems to obtain information not available to the front-end photomask handler, and retrieve this data when gaining access. Optionally, the data service agent may, if necessary.

- 13 009013 to be configured to verify data. The data service agent search mechanism can be performed based on the information desired by the user (for example, logistics, deliveries, processing time, etc.) based on any number of possible parameters (for example, cost, time, name of the interface mask mask handler, mask size , equipment of the step multiplier to be used, etc.) provided by the user system.

All operations performed by a person using the graphical user interface can also be performed, at least in part, automatically, i.e. without human intervention. The present invention provides access to this function using a set of clear text commands or a command line. The set of plaintext commands is a high-level programming language that can be interpreted in the application programming interface to perform a sequence of operations. For example, a command line that says “replace the name of device A with the name of device B” can be transmitted by the user to the network of the interface handler of the photomask or automatically, as mentioned above. When the system accepts this command line, it replaces the device name in a specific template or order for a new device name. Naturally, this is just one example of the use of a set of commands and should not limit the invention. You can create custom modules for use in the system, an interface photomask handler to access this command using any programming language that can create an A8SP or a binary file and execute an operating system command. Automated execution allows authorized users to access any authorized system through an existing network connection. You can use the usual security measures, such as a firewall, registrations, passwords, etc. to protect privacy and protect database data and mask ordering system.

In FIG. 7 shows an example of various possible embodiments of the automated features of the present invention. As shown in FIG. 7, the photomask interface processor 110 has an order processing system 100 according to the present invention in its computer system or network. The user of this system can enter a partial or full order or template as indicated above. A file 130 located in the network of the interface mask handler is used to create or modify a template or order. In the event that any information necessary to complete the order is not entered directly using the interface mask photo processor, such information can be extracted using the order processing system 100 automatically from files, databases or other electronic information available in the interface mask photo processor system; from a system outside the interface handler of the photomask, access to which is carried out remotely; directly from one or more vendors or sellers of the interface mask mask handler and / or through a data service agent system. The interface mask mask handler can directly enter all the information needed to complete the order, some information necessary to complete the order, while the rest of the information comes from other sources, or initiate a process through an external application program that automatically creates a complete order without access to the graphical interface user order processing system. In the embodiment shown in FIG. 7, the information necessary to complete the order is retrieved from the data service agent system 120. The data service agent system 120 requests generated sources, such as data providers A and B, which may be, for example, suppliers or sellers of a photomask interface processor. System 120 may also collect information from the interface photomask handler itself. As shown in FIG. 6, information related to manufacturing equipment to be used to manufacture the photomask can be obtained from the manufacturer through the data service agent system 120. After extracting all the necessary information and entering it into the correct template, an order document 140 is created and transmitted to the photomask provider 150.

Performing any task in an automated manner may include a warning notification of any system failures or process malfunctions based on a set of rules. Notifications can be created by the end user, and they can be in the form of e-mail, messages, log files or database entries. In one embodiment, the notification flag automatically creates a message sent to the distribution list with the names of people who are associated with photomask orders. This distribution list can be created using any given criteria. After creating a message, each person from the distribution list automatically receives a notification that an order for a photomask has been created. Such notifications may include e-mail, ringing tones, standby messages, mobile phones, to name a few. This notification process can be installed anywhere on the network of the interface mask processor or even the manufacturer's network and can be initiated at any stage at the request of the interface processor mask. This example should not be construed as limiting the invention, but is merely an illustration of a notification system that may be included in the present invention.

After notification of the preparation of a new or modified order for the photomask given from

- 14 009013 application can automatically send the order to the manufacturer of the photomask if there are no errors, or wait for permission from the user of the interface processor of the photomask. If errors are identified, then the interface mask handler can manually edit the order to correct these errors and continue processing the order in the usual way. As an alternative, automatic error correction may be provided.

In another embodiment, an incomplete photomask order can be created that includes design information in a format that can be transmitted to the photomask manufacturer's processing system to enable the photomask manufacturer to verify the correctness, feasibility, and / or desirability of the design. For example, a photomask interface processor may transfer a partial photomask order, including instructions for crushing, which is then passed to the photomask manufacturer to verify the correctness, feasibility, and / or desirability of the proposed design. This can be done automatically, as indicated above, or manually. In the case of automatic execution, after receiving information related to the proposed partial order for the photomask, the system can create the information necessary for sending crushing commands to the supplier of the photomask for further analysis and evaluation. After receiving the information, the manufacturer of the photomask can then also propose alternative designs that may be more appropriate or desirable from the point of view of the manufacturer or the like. Then the results of the analysis of the photomask by the manufacturer can be transferred to the computer system of the interface processor of the photomask for further consideration by the interface processor of the photomask regarding the promotion of the photomask or modification of the proposed order.

Each of the templates, orders, components and subcomponents, etc. preferably stored in a database, however, may also be stored in other places. A search subsystem may be provided by which the user can search for a specific template, order, component or subcomponent, etc., stored in a database or in other places. Using the search subsystem, you can find suitable templates, components or subcomponents, etc., necessary to create an order in a specific order format. After the discovery of such patterns, components, subcomponents, etc., the data related to the photomask order is entered by the user (usually the interface photomask handler who wants to place the photomask order). The user can also use the search subsystem to detect existing orders for photomasks in order to complete or facilitate data entry or modification of their contents, as will be described below.

As indicated above, the interface mask photomask handler may not have sufficient knowledge about the requirements of a particular photomask order format and thus may not enter all the necessary information required by such a standard to complete an order. In addition to this, front-end photomask handlers can make data entry errors and thus provide inaccurate information. In accordance with this, the first and second set of rules are established and they are stored in the system to ensure that the interface handler of the photomask input the complete and correct data into the templates and orders, as required by the specific standard format and / or the proprietary format of the photomask manufacturer.

In the first preferred embodiment, the first and second set of rules are established to ensure that the user enters all the necessary data to issue a finished order for the photomask, in accordance with the requirements of a particular standard format and / or the manufacturer’s own format of the photomask. The first and second sets of rules are preferably set based on the requirements of the selected photomask order. For this, the first set of rules dictates which data “should” be entered, which “may” be entered and / or “may not be entered” into each component and subcomponent of the template or order, as required by the specified order format for the photomask. In addition to this, the first set of rules must be implemented so that they require the user to enter information into any other components that are required (as indicated in the specific standard and / or proprietary format of the photomask manufacturer) to complete the order for the photomask.

Thus, for example, as shown in the table, a specific standard order format may require a “drawing” template that is valid for all ELP8M orders: placement data and critical size data should be provided; crystal inspection data may be provided, and crystal data may not be provided. In accordance with this, rules are established and associated with the corresponding templates (both components and subcomponents), which require that (1) the user must include location data and data of critical dimensions; (2) the user can include crystal inspection data; and (3) the user may not include crystal data inspection data. Accordingly, in this example, when the user wants to create an order for the ELP8M photomask using the system and method according to the invention, the rules (1) require the user to enter location data and critical size data; (2) allow (but do not require) the user to enter crystal inspection data; and (3) prevent user input of crystal data inspection data. Additionally, the selected order format may require that in addition to the figure data

- 15 009013 matrix registration data must be entered to complete the order for the photomask. In accordance with this, the first set of rules is made so that after the user has completed entering all the data in the picture, the user is sent to the “matrix registration” template and receives prompts for entering all the necessary data into this template (and any other relevant subcomponents of this template ) Similarly, if the standard and / or proprietary photomask order format requires entering data into any other templates to complete the photomask order, the first set of rules directs the user to other such templates after the user enters all the data into the matrix registration template and issues the user prompts for entering all the required data into such a template (s). After the user enters all the required data, the user receives permission to complete the template (i.e., data entry in accordance with the second set of rules, the description of which will be given below).

Thus, it is obvious that the first set of rules according to this invention allows the user to enter the necessary information into suitable templates, as required by a particular standard and / or proprietary format to create an order for a photomask. In other words, the rules guide the user in the process of entering order data for the photomask in order to ensure that all necessary order information is entered into the templates.

In addition to this, the system and method also provide for a second set of rules that ensure that the user enters data in an accurate and correct format, as specified by a specific standard and / or proprietary format for ordering a photomask. As mentioned above, each component and subcomponent of a template is defined by a set of attributes (for example, in binary form, in the form of a chain, an integer, a real number, a Boolean expression, date, list, etc.). Thus, in a preferred embodiment, a second set of rules is established for each template and order that shows the user, “should”, “may” and / or “should not” have data entered in a specific template, a specific attribute, as required by a particular standard and / or proprietary format for ordering a photomask.

For example, as shown in the table, a particular standard and / or proprietary photomask order format may require that (1) the data entered into the layout template “must” be integers; (2) the data entered in the name template can be a chain; and (3) the data entered into the template of critical sizes “should not” be a chain. In accordance with this, rules are established for the layout pattern, which (1) require the user to enter an integer in the layout pattern; (2) allow the user to enter a chain in the name template; and (3) prevent the user from entering a string into a critical-size pattern. Thus, it is obvious that the rules according to this invention allow the user to enter information and data of a suitable type into each template, as required by a particular standard and / or proprietary photomask order format to create a photomask order. In other words, the second set of rules allows the user to enter only data of a certain type into the template, and thereby reduces the possibility of design errors and / or data entry errors in the process of placing an order for photomasks.

In a preferred embodiment, said first and second rule sets are created and stored separately. As mentioned above, the rules can be stored inside the system or outside the system in any different number of dynamic formats (for example, in the form of a database, an object-oriented class, XMB file, etc.), so that the system can be adapted to run any number of platforms, in depending on the preferences of the user and / or the automated system. However, it should be noted that you can create and store a single set of rules, provided that such a single set of rules allows the user to enter the complete information about the order for the photomask (as described in relation to the first set of rules) and the exact information of the order for the photomask (as described in relation to the second set of rules). In addition, the first and second rule sets can be similarly combined into a single set of rules.

As indicated above, the present invention includes a function of associating predetermined first and second sets of rules with predetermined patterns to ensure the creation of an order for the photomask in a complete and accurate manner. In a preferred embodiment, this function is provided in the form of a software-based application installed in the computer of an object wishing to place an order for a photomask, such as a manufacturer of semiconductor devices. Unlike the prior art, this software is independent of the manufacturing process of the photomask manufacturer. Instead, the software of the present invention can be used as a stand-alone secure application, a distributed network application, or a network-based UCN application for “weak clients”. The software is preferably used in a client-server system, with a graphical user interface (eg, client) connecting and retrieving data from the server database. In all cases, the interface mask mask processor executing the software of the present invention must not be accessed and / or registered in any external local network of the mask mask manufacturer to place an order.

The following is a description of the way in which the software is given

- 16 009013 this invention associates the given rules with the given patterns. In particular, since templates are hierarchical data sets, each element of the template is interpreted using a related software object. In a preferred embodiment, the rules are embedded inside the software objects and are responsible for collecting the data entered into the templates. These rules are constraints or instructions, such as an algorithm, and usually relate to one or more attributes of a software object. Accordingly, using this system, you can enter a complete and accurate order for the photomask, because the rules and patterns are appropriately linked to each other.

In addition to this, the system is preferably configured to update, if necessary, individually rules and patterns. At the same time, the standard format 8EM1 R-10 is known as a modern format for ordering a photomask. However, with technological progress, we should expect the development of a new standard format, including the achievement of this progress, which will replace the current standard format 8EM1 P-10. In addition to this, there are currently many other international standard order formats that are used by foreign manufacturers of photo masks. As in the case of the 8EM1 P-10 format, it is expected that these international formats will also change and will be replaced over time. Thus, the system according to this invention provides the ability to update the rules and patterns in accordance with these changes. In particular, the first and second rule sets are preferably stored as separate files for each of the templates, which in turn are also stored as separate files. By storing the rules and templates separately, any modification of one of them does not affect the other. Moreover, when the rules and patterns are modified, there is no need to change the correlation code with the corresponding element, which indicates the lack of communication by modifying neighboring features. In addition, due to the separate storage of rules and templates, it is possible to eliminate the possibility of a jamming of the system (for example, when unexpected changes in the built-in or inside an element can lead to an unexpected failure). Moreover, if the rules and patterns were not stored separately, there would be no possibility of independent modification. Each of the existing templates, which may be thousands, if not more, would need to be modified individually to include new rules. Thus, it is obvious that the system and method according to this invention are not limited to any particular standard format, but can simply be adapted in accordance with the requirements of any modern or newly developed standard order for photomasks. Similarly, the photomask front-end processor can change its own order format to meet any requirements related to newly developed or improved technologies.

To modify the rules, software objects are set up so that the rules contained in them can affect one or more of their attributes, their children, or other rules contained in them. For this, the rules are set so that the rules only affect certain specified attributes. Thus, since software objects, like templates, are hierarchical in nature, they know both their parents and their daughters. Accordingly, in any modification to a child, it notifies its parent of the zone, rules or attributes affected by the change. As a result, any change made somewhere within the hierarchy of rules applies to the entire family. Accordingly, rules have the ability to force the addition or removal of any child of a parent. Thus, within an application program, each object can be individually updated or expanded through successive software editions. In addition, the object’s parents maintain a standard population for each type of child that can be added or removed during template construction.

Templates can also be modified in response to a modification of the standard and / or proprietary photomask order format, which requires the addition of new attributes and / or subcomponents to the hierarchical structure of orders or templates. In such cases, new relationships are defined for the affected components and / or subcomponents, and new rules are dynamically added to the scheme of existing rules.

To illustrate these features of the present invention, the following example is described. The current 8EM1 P-10 standard requires that an order for a photomask include, inter alia, the following: order for a mask [], mask set [], definition of a mask [] and definition of a pattern []. Thus, in accordance with this requirement, it is necessary to install the following templates: order template 8EM1, set template 8EM1, mask template 8EM1 and pattern template 8EM1. In addition to this, it is necessary to establish the first and second sets of rules for each of these patterns, which dictate whether data should be entered into each of the patterns and the type of data that can be entered into these patterns. However, in the future, the 8EM1 P-10 standard may be replaced by a new standard that requires a critical size component. Thus, existing templates (for example, the template of Figure 8EM1) can be modified to include, for example, a critical size component to meet the metrological aspect of the 8EM1 P-10 standard. In addition to this,

- 17 009013, you can create a new template to meet any newly added aspects (for example, registration) of the new 8ΕΜΙ standard. Similarly, you can adapt the already existing first and second sets of rules to the changes associated with the modified aspect of the critical size component of the current standard 8ΕΜΙ P-10. In addition to this, it is possible to create new first and second sets of rules to meet the new sign of registration of the new standard 8ΕΜΙ.

You can also use specification metrics as a mechanism for easily updating a specific data entry that is included in a large number of templates, orders, components, subcomponents, etc. In particular, in one embodiment of the present invention, a specification metric file may include given data or objects, which are considered desirable for future updates in many templates, orders, components, subcomponents, etc. In this case, various orders, templates, components, subcomponents, etc. will include a link to a specification metrics file for the given data in it, instead of storing the given data. Thus, these specified data or objects referenced can be updated in a large number of orders, templates, components, subcomponents, etc. by updating only the specification key figure file, instead of updating all orders, templates, components, subcomponents, etc., referring to this given data or objects.

For example, a specification metric may include a standard critical dimension line width (SC). which is considered acceptable for a particular interface photomask handler at this time. As photo mask technology develops, a change in the allowable line width of critical sizes is likely. Instead of individually updating each order, template, component, subcomponent, etc. that specify a specific critical size, the use of specification indicators allows you to update only the specification indicator file, and then all files related to this specification indicator file are updated automatically. Other examples of suitable variables for providing specification indicators in the context of a photomask order include dimensional tolerances associated with mask attributes that must be maintained by the photomask manufacturer to ensure that the mask complies with the specifications of the photomask interface processor; acceptable norms of defects associated with mask attributes that must be maintained by the photomask manufacturer to meet the specifications of the photomask interface processor; materials (substrate, films) associated with the manufacture of photomasks, which must correspond to the paid level of quality and are expected by the interface processor of the photomask; accounting information, including pricing and billing and delivery information; service information of the interface mask handler, such as contact name and phone number; the class of machines or special machines necessary to meet the internal requirements of the interface processor of the photomask necessary for the manufacture of the photomask; information about the location of the lithographic drawing, including, but not limited to, hue data, exposure to the beam, information about the location in X, Υ coordinates; information about data transfer, including, but not limited to, email addresses, file transfer protocol addresses, protocol, registration identifier and password, directory structure; and sellers' specific information related to the raw materials used in the manufacture of photomasks, including, but not limited to, substrates, films, compacts, resists and unique equipment used in the manufacture, such as Arrieb Μαίοπαΐδ A11a 3500 or KL 81at11da, to name some of them.

As mentioned above, a template or order consists of one or more related objects, such as components, subcomponents, data, etc. For example, a photomask can have one or more related attribute objects, such as registration, names, barcodes, etc. d. In one embodiment of the invention that uses specification metrics, a utility program may be provided to enable the end user to create one or more unique data or objects that may be associated with a template or order. These objects are stored separately from related orders or templates. In addition, these separately stored objects may have their own rule sets. When a template or order is created, the end user may be allowed to associate the template or order with some or all of the objects specified in the utility. After creating a template, order or order created from a stored template, all information objects stored in the utility that were associated with the template, order or template used to create the template can be considered as reference data and applied to the template, order or template used to create the template. Reference information objects can be updated or deleted based on “roles and responsibilities” assigned to the end user in the application security module. For example, less experienced end users may not be allowed to write on top of reference data stored in the utility. On the other hand, an experienced user may be allowed to modify the reference data.

Another aspect of the present invention is that it provides the ability to create new orders for photomasks by (1) merging data into a new order from an existing template containing the data contained therein; (2) merging data into a new order from an existing one

- 18 009013 of the order containing the data contained therein; (3) merging data into a new order from existing templates and orders; or (4) merging data into a new order from existing orders, templates, components and / or subcomponents. For this, each time a user enters data into a template or when creating an order, this template and / or order are saved in the system according to this invention. In addition, as indicated above, the components and subcomponents can be stored separately from the order or template in the system according to this invention. After that, the user is able to access existing templates, orders, components and / or subcomponents, and use the data stored in them to create a new order. By providing the user of the system with the ability to merge data from existing orders, templates, components and / or subcomponents, the process of entering order data for the photomask is greatly reduced, which reduces the total time required to make an order for the photomask. The following is a description of each of the four ways to merge data into an order.

In one embodiment, to create a new order from an existing template (s), the user receives prompts to create a new, clean order. Then the user gets the opportunity to select templates and / or orders that were created and saved from the previous order for the photomask. Depending on the type of photomask to be manufactured based on the new order, the user selects and downloads the most relevant template (s) stored in the relational database. The selected template is displayed for the user with previously entered data. For each non-zero object inside the template (for example, an object containing data), the user can either select previously entered data for a new order or write new data on top of this data. In addition, if a specific object inside the template is zero (for example, it is already empty), then the user can enter suitable data inside this object. Then, rules are set for this order, as indicated above, to ensure accurate and complete data entry. After that, the software processes this information and creates a new order based on this information.

The process of creating a new order from an existing order is similar to the process of creating a new order from an existing template. In this embodiment, to create a new order from an existing order (s), the user receives prompts to create a new, clean order. Then the user gets the opportunity to select templates and / or orders that were created and saved from the previous order for the photomask. Depending on the type of photomask to be manufactured based on the new order, the user selects and downloads the most relevant order (s) stored in the relational database. The selected order is displayed for the user with previously entered data. For each non-zero object within the template, the user can either select previously entered data for a new order, or record new data on top of this data. In addition, if a specific object inside the order is zero, then the user can enter suitable data inside this object. Then, rules are set for this order, as indicated above, to ensure accurate and complete data entry. After that, the software processes this information and creates a new order based on this information.

In yet another embodiment, to create a new order from both the existing template (s) and the order (s), the user receives prompts for creating a new, clean order. Then the user gets the opportunity to select templates and / or orders that were created and saved from the previous order for the photomask. Depending on the type of photomask to be manufactured based on the new order, the user selects and downloads the most relevant template (s) stored in the relational database. The selected template is displayed for the user with previously entered data. For each non-zero object within the template, the user can either select previously entered data for a new order, or record new data on top of this data. In addition, if a particular object inside the template is zero, then the user can enter suitable data inside this object. Then, rules are set for this order, as indicated above, to ensure accurate and complete data entry. In addition to this, previously saved orders can also be merged into the same order. To do this, the user can select and download the previously placed order (s) stored in the relational database. The selected order is displayed for the user with previously entered data. For each non-zero object inside the template (for example, an object containing data), the user can either select previously entered data for a new order or write new data on top of this data. In addition, if a specific object inside the order is zero, then the user can enter suitable data inside this object. Then, rules are set for this order, as indicated above, to ensure accurate and complete data entry. After merging suitable templates and orders into a new order, the software processes this information and creates a new order based on this information.

Existing components and / or subcomponents of a previous order or template can also be imported into a new order for a photo mask or template. For example, existing components and / or subcomponents related to billing and / or delivery address can be applied to an order

- 19 009013 or a pattern. In addition, one or more specification indicators defined within the application can be merged into a new order or template.

After the front-end photomask input of the order data using the software according to the first aspect of the present invention and the creation of photomask pattern data, the second software application automatically processes at least a portion of this information into a record-ready format and a format ready for inspection. In one embodiment, the software for performing this function is downloaded to the computer system of the interface mask processor. After that, the processed information is transferred to the data file in the manufacturer's external remote computer system for the manufacture of photomasks.

In particular, in one embodiment, the computer system of the photomask interface processor includes a server in which both the first and second software components are installed. The order data created by the front-end photomask handler and the picture data created by the front-end photomask handler are transferred to the server. In a preferred embodiment, the front-end photomask handler server contains parsing software for performing the process after setting and performing two basic functions. First, the parsing software checks the files that have just been transferred to the server and copies them in the specified way (and if it is capable of doing this) to pre-set the working data directories. Secondly, the parsing software records everything that it does in the audit trail of mail messages, which it then sends to any number of pre-created mail addresses. These mailing addresses can be programmed with the possibility of changing depending on the interface processor of the photomask or the means in which the processing takes place. This email message is both an acknowledgment of receipt for the interface mask mask handler and an internal notification that a data transfer has occurred.

In a preferred embodiment, the pattern data is sent by the parsing software to the combined memory pool connected to the file transfer protocol server, and stored therein for further processing. Alternatively, the pattern data can be transmitted through other channels, or they can be stored in a file transfer protocol server.

Similarly, in a preferred embodiment, the order is sent by the parsing software to another computer server of the interface mask processor (“processing server”), which is connected directly or remotely via a network connection to the file transfer protocol server. Alternatively, the file transfer protocol server and the processing server may be the same computer. The processing server contains software (“8ΕΜΙ software”) for order processing, which automatically extracts or syntactically extracts data from the order to be processed and / or formatted for use in manufacturing equipment. This processing and / or formatting can occur in the same computer server as the processing server, or in other computer servers in the network of the interface mask processor.

In a preferred embodiment, at the beginning of processing this data, the software 8ΕΜΙ automatically notifies persons associated with the manufacture of the photomask that an order for the photomask has been entered. This notification flag may start automatically when specification 8ΕΜΙ is adopted. In particular, when it is put into operation, the notification flag can automatically create a message sent to the distribution list of names of persons associated with the manufacture of the photomask, in accordance with specification 8ΕΜΙ. This distribution list can be created using any given criteria. In one embodiment, the distribution list is compiled at the location of the processing server in which the 8ΕΜΙ software is installed. Thus, for example, when the 8ΕΜΙ software is installed in a processing server located in a company in Singapore, the distribution list will only contain the names of people located in this company. Conversely, if, for example, the 8ΕΜΙ software is installed in a processing server located at an enterprise in Germany, then the distribution list will contain only the names of persons located at this enterprise. After creating the message, each person in the distribution list will receive a notification that the order for the photomask is accepted. Such notifications may include email, tone devices, mobile phones, etc. This automatic notification process can be installed anywhere on the network of the interface mask processor and can be triggered by any processing stage at the request of the interface mask processor. This example should not be construed as limiting the invention, but merely illustrating the type of notification system that may be included in the invention.

Then specification 8ΕΜΙ is processed. For this, software 8ΕΜΙ may include features that automatically extract data from the specification 8ΕΜΙ, organize the extracted data in accordance with the manufacturing tasks to be performed, and create

- 20 009013 data matrix in which systematized data are stored. In a preferred embodiment and as shown in FIG. 10, the data matrix includes information identifying the interface photomask processor (“enterprise”), production capacities for manufacturing plates of the interface photomask processor (ELB), the technology implemented (“technology”), job number, and design information on the photomask interface photomask processor (“device” "), A report on the production status of the photomask (" status "), and the date of the order (" accepted order "and / or the date of receipt of the order (" reception R-10 ").

However, it should be noted that the preferred data matrix can be easily modified to add, if necessary, additional descriptive categories or, if desired, to display a smaller number of categories. In addition, the data matrix may also include more detailed submatrices of data that are associated with any of the above categories of photomask information.

For example, a data submatrix may be hyperlinked to a specific task number. This data submatrix may include date and time information documenting each step performed in the manufacture of the photomask.

Additionally, a data submatrix may be hyperlinked to a device category. In a preferred embodiment, this data submatrix contains data that is retrieved from the order and organized for use with a variety of manufacturing tasks that need to be performed in the manufacture of the photomask. These fabrication tasks include, for example, but not limited to, processing a task package (“task package”), processing an 8EM1 specification (“8EM1”), bar coding (“bar code”), creating a measure registration file (KEO ME2), task data sizes (ba1a 8 / k), double check (eOnE C11k). Although not shown, this data submatrix may also include other fabrication tasks, such as, for example, crushing, grid testing, optical near-field correction, and marking.

As shown in FIG. 9, the processing software 8EM1 organizes and processes the extracted data in accordance with these manufacturing tasks to be performed. In addition, these data sub-matrices may contain other information, including, but not limited to, the name of the code to be executed on the photomask of the drawing (baueg), the control inventory number of the manufacturer (P1a1e No.), the order in which each photomask should be processed in accordance with with the preferences of the interface mask photomask handler (Pn), a report on the status of the photomask during the manufacturing process (Laueg §1a1i8), and the date the data were received by the processing software 8EM1 (Laeaa Keb).

The following is a description of how data is organized in this data submatrix. Processing a job package refers to a method by which commands are transmitted and processed by lithographic tools (e.g., electron beam and laser beam) and inspection equipment (e.g., KL or OG1O). In the case of processing the job package for lithography, some of the commands that must write the picture to the photomask form are extracted from the order and stored in the data submatrix shown in FIG. 10. These extracted job package commands are then processed by 8EM1 software for use in lithography tools. These commands indicate the location on the photomask where the various patterns should be located, as well as other functions to be performed by a particular tool, including, but not limited to, exposure control, scaling of patterns and shades. As an alternative solution, the extracted task package commands can be modified to take into account other information related to a particular interface mask processor, its department or internal manufacturing site, etc., in order to create suitable commands for lithographic tools or other processing equipment. For example, job package commands can be routinely modified for a particular manufacturing center for the interface photomask handler to take into account the fact that the commands provided by such an interface photomask handler require rotation of the drawing with lithographic tools, which can be a time-consuming process compared to rotation of the drawing when crushing data drawing.

As for the processing of the inspection task package, the relevant specifications are extracted from the order and organized for use by inspection equipment. Recoverable specifications for inspection equipment should be organized and formatted so that inspection equipment can inspect the photomask being processed for defects (for example, by comparing data with a crystal) and contamination (i.e. purity).

8EM1 approval refers to the process by which an order submitted by the front-end photomask handler is automatically modified to include additional details, reformat, or otherwise organize and / or delete extraneous details. For this, the 8EM1 processing software includes functions with which it can add various information to the order. For example, the business requirements of a photomask interface processor, such as a preferred delivery address, can be automatically added to the order and stored in 8EM1 software, as shown in FIG. 11. Similarly, manufacturing information can be added to the order and stored in the submatrix.

- 21,009013 data. For this, the δΕΜΙ software is programmed to regulate some data (e.g., critical dimensions, displacement information, film type) based on various circumstances (e.g., modifications based on the manufacturer’s equipment features or special requirements of the photomask interface processor) that arise during the manufacturing process and which were not taken into account by the interface mask handler or in the order of the interface mask mask handler.

In addition to this, the δ создает software automatically creates commands for the crushing subsystem to crush the pattern data. Crushing is a well-known process by which drawing data is divided (i.e., crushed) into shapes and segments that a lithographic tool can sense. In a preferred embodiment, the splitting commands can be created as an scc file. In one embodiment, automated conversion software (SLT8) is used to crush the pattern data and view it. SLT8 is a commercially available software that simulates job package schemes (for example, mask placement) to view data before the manufacturing process. However, it should be noted that crushing commands can also be created using other software in other formats. Crushing commands can be stored in the processing server or in a stand-alone separate disk storage pool. The crushing subsystem server interacts with the processing server or the disk storage pool to read crushing and crushing instructions for drawing data.

After splitting the image data, it is necessary to check the integrity of the fragmented data. The verification process includes any known or future technology used in the processing of photomasks.

In addition, bar coding refers to the process by which bar codes are applied to the photomask. In particular, some front-end photomask handlers may want to include a bar code in their photomasks for inventory tracking. Thus, when the interface mask photomask handler includes information for such barcodes in the order, the processing software δΕΜΙ extracts this data, formats it, and creates the pattern data in a form suitable for lithographic tools. Lithographic tools are sent to the data of the barcode of the drawing using the commands of the lithographic job package to record the barcode on the photomask.

The process of creating registration measures files refers to the method by which a file is created that contains the coordinates that are used by inspection tools to align the photomask. These coordinates can be used together to expose an image on a semiconductor. Registration information can also be used in the manufacturing process of a semiconductor device to align the photomask with a semiconductor wafer or other layers of the photomask. The δΕΜΙ software extracts the relevant data from the order to create a registration measure file and formats this data for equipment that performs the registration inspection process. For this, the registration files can be in various formats, including, but not limited to .ΜΡ2 files, .ΜΡ3 files, critical size files, etc. The process of resizing data and reversing refers to a method by which the size and shade data of a pattern are modified to facilitate the processing of photomasks in the manufacturing process. The δΕΜΙ software extracts the appropriate command from the order and creates crushing commands for the data resizing operation. These commands are usually stored in the sts file. The status of this process is tracked in Ea1a 8 / K. in FIG. nine.

In the case of the construction of the binary mask, the δΕΜΙ software automatically applies the data offset to the pattern data to provide a degree of geographical latitude to account for the movement of the substrate during the photomask manufacturing process. Thus, any movement of the substantially transparent and substantially opaque elements of the photomask is taken into account so that the photomask is manufactured in accordance with the design specifications. When applying data bias, factors should be considered that include, but are not limited to, process control marking, the facility at which the photomask will be manufactured (for example, the photomask manufacturer's factory, the photomask's front-end processor enterprise) and the conditions at that enterprise that can affect the production of the photomask (for example, resizing, shifting, special reservations, updating the names of the drawings, arranging the job package and loading the names of the pictures into a δΕΜΙ file or a ΜΕδ file).

In the case of the construction of a photomask with a phase shift ^ δ,), the software δΕΜΙ automatically applies optical short-range correction (OPC) to the image data to correct the critical size and resolution changes that usually occur in phase-shifting photomasks (for example, aaΡδΜ, ΕΑΡδΜ) and similar structures with variable resolution. For this, the software according to this invention uses optical near-field correction, which modifies the geometric shape of the mask design to take into account the systematic distortions introduced during manufacture.

- 22 009013

In addition, the manufacturing control labeling process refers to a feature that determines a suitable manufacturing facility in which a specific order of the interface mask processor will be processed. For example, when the photomask manufacturer has enterprises in Germany and Singapore, the 8EM1 software analyzes the order of the interface photomask processor and determines whether the photomask will be manufactured in Germany or Singapore, or some combination thereof. Signs of manufacturing control labeling can be set to fulfill this definition based on various criteria, including, but not limited to, lithographic tools used in each manufacturer's branch, preferences for the interface mask processor, and workload in each enterprise.

The double check feature refers to a process that compares the accuracy of drawing data that has been resized with specifications provided by the interface mask mask handler. 8EM1 software extracts data from the order and organizes it for reading by equipment that performs this double check feature.

Check on the grid refers to the process of comparing the location of the drawing data in the job package with the internal grid location of the lithographic tool. A drawing is considered off-grid if the final coordinate point of the location is between the points of the inner grid of the lithographic tool.

Another feature of the present invention is a sign of automatic message compilation, which is programmed to recognize and report errors and other events (for example, that the process has started or finished) to members of the above distribution list. This feature can be used as described above with respect to the file transfer protocol server and the processing server.

In addition, critical size electronic diagrams (E-SE ΡΙοΙδ) relate to the process by which the electronic image of the image data on the processed photomask is marked with internal reference marks for the quality management process. To do this, the 8EM1 processing software extracts the necessary commands for the E-SE diagrams from the order and usually creates the sts] file for the crushing subsystem for use in creating diagram files and storing them in the disk storage fund.

Depending on the format in which the order is submitted, some or all of the manufacturing tasks may or may not be performed. Thus, any of the manufacturing tasks listed in the data matrix can be optionally excluded. The way the data is organized for each of these processing functions changes in accordance with the specification provided by the interface mask mask handler. However, the data must be organized so that each of these functions can be performed.

This system also includes an automated and interactive monitoring system, which provides instant identification and notification of the status of any manufacturing task, as well as errors detected during these tasks. As shown in FIG. 9 and 10, in a preferred embodiment, this interactive monitoring system is designed as a VeL site on the intranet, which can be accessed using security authentication, including, but not limited to, a password. As an alternative solution, access to this VeB site can be provided through the global Internet hypertext system and / or another network, with or without authentication. After entering this VeB site, the operator can see the status of each manufacturing task. If errors occur, the operator can stop the specific manufacturing task, correct the error, and restart the process.

In addition to this, a manufacturing implementation system (ME8) can be installed on the client’s computer, which can be connected via an interface to the processing server. ME8 systems are well known in the art and provide the system user with the ability to track the manufacturing process, generate billing information, and download the results of these various manufacturing tasks.

The present invention can also be used to connect via an interface and automatically transfer pre-formed data to any ME8 system that implements a standard or user protocol, including, but not limited to XMB, 8Ь, eXMB, Eokey No. or any similar protocol.

Other tasks may be included, although not shown in FIG. 9, such as a process definition, which is an automated tool selection process. In particular, a specific block or type of processing equipment to be used in the manufacture of a photomask (for example, a special lithographic or inspection tool) is specified in the process definition.

This information can be set either by the interface handler of the photomask or as a result of choosing a site for a specific task.

After creating the relevant data files using the relevant features of the second software component according to this invention, in a preferred embodiment,

- 23 009013 these data files are merged into a single file. Optionally, these files can be saved as separate files or combined as a set of multiple files. The data file should include at least a portion of the order data and the drawing data, which are made essentially in a record-ready format and / or inspection-ready format. In other words, the data file must be in a format that, after being received by the manufacturer, can be entered into the appropriate equipment of the manufacturer, essentially for recording and inspecting the photomask in accordance with the specifications of the interface photomask processor. Naturally, some knowledge of the type of equipment used by the manufacturer may be necessary to ensure the correct data format for this equipment. Thus, if necessary, the interface mask processor should receive requirements for the manufacturer’s equipment (for example, lithographic instruments, inspection equipment, etc.) from the manufacturer and include this information in the data file. In one embodiment, this can be done by transmitting an electronic signal (for example, email) to the manufacturer by the interface handler of the photomask, indicating that he is entering the order, and requesting information related to the manufacturing facility and the corresponding tool to be used to make the photomask. The manufacturer, in turn, transmits an electronic signal to the interface processor of the photomask with this information. These signals must be transmitted before completing the order for the photomask. In one embodiment, these steps are performed using the data service network and method of the present invention.

After compiling the data file, the interface mask mask handler transfers this file through a network connection to the manufacturer's external, remote system for manufacturing. In one embodiment, the interface photomask processor electronically transmits this information to the manufacturer through a TCP / 1P based network (e.g., the Internet) using a file transfer protocol (TTP). Other protocols can also be used in the present invention, such as parsing an email connection or by downloading a file from another storage medium. After the manufacturer’s system receives the file, the manufacturer proceeds to manufacture the photomask in accordance with the commands and specifications contained therein. In some cases, it may be necessary for the manufacturer to perform some additional generation of this file after receiving it. After that, the photomask can be used to fabricate a semiconductor device using the above known technologies.

After presenting and describing in detail the preferred embodiments of the invention, various modifications and improvements become apparent to those skilled in the art. For example, in a preferred embodiment, the first and second software components are used by the photomask interface processor to enter the photomask order and process at least part of this order into a substantially ready-to-write file and / or essentially ready-for-inspection file, which, in turn, are transferred to a remote manufacturer. However, it is understood that the present invention can be modified so that the first software component is used by the photomask interface processor of the photomask interface processor, while the photomask interface processor transfers the order to the photomask processor, which in turn processes the order using the second software component according to this invention . In accordance with this, the idea and scope of the present invention should be understood broadly, and they are limited only by the attached claims, and not the previous description.

Claims (24)

CLAIM 1. A method of processing mask data by converting design data as an electronic circuit design data file for use in the manufacture of a photomask having transparent and opaque elements into a data format suitable for a given processing for manufacturing a photomask, comprising the steps of inputting design data using a given form electronic circuit design data; entering requirements for processing the order for the photomask made in accordance with the design data; resizing structural data to facilitate the process of moving transparent and opaque elements in the photomask; crushing at least a portion of the design data into a record-ready format compatible with a predetermined processing for making a photomask; checking the integrity of fragmented structural data; merging two or more datasets created from one or more of the following data types: (ί) entered design data; (o) resized construction data; (w) fragmented data; and (ίν) verified fragmented data; - 24 009013 the formation of the specified data set to ensure compatibility with the manufacturing process of the mask; and transmitting electronic signals corresponding to the generated data set to a remote manufacturer system associated with predetermined processing for manufacturing the photomask. 2. The method according to claim 1, further comprising the step of crushing at least a portion of the design data into a format ready for inspection compatible with a predetermined processing for making a photomask. 3. The method according to claim 1, in which the specified processing for the manufacture of photomasks contains an inspection package of tasks. 4. The method according to claim 1, in which the specified processing for the manufacture of photomasks contains a lithographic package of tasks. 5. The method according to claim 1, wherein said step of resizing further comprises a marking step for manufacturing control. 6. The method according to claim 1, wherein said step of resizing further comprises the step of determining the manufacturing enterprise. 7. The method according to claim 1, wherein said step of resizing further comprises the step of determining an offset based on the manufacturing enterprise. 8. The method according to claim 1, wherein said step of resizing further comprises the step of determining the enterprise manufacturing the photomask. 9. The method according to claim 1, wherein said step of resizing further comprises a step of generating data based on the photomask and the client’s enterprise. 10. The method according to claim 9, in which the specified stage of formation further comprises one or more of the following stages: (ί) resizing data; (ΐΐ) data shift; (iii) providing special comments related to data; (ίν) update of the name of the figure; (ν) creating a task package that uploads the names of the drawings to a file of the International Association of Semiconductor Equipment and Materials Manufacturers (8ΕΜΙ) and (νί) loading the names of the drawings into a file of the manufacturing implementation system (ΜΕ8). 11. The method according to claim 1, further comprising the step of processing at least one job package. 12. The method according to claim 1, additionally containing stages selected from the group consisting of compiling electronic critical sizes; formation of specifications 8ΕΜΙ; creating a bar code identifying the photomask to be manufactured; and marking the specified data with the identification of the manufacturing enterprise where the specified photomask is to be manufactured. 13. The method according to claim 1, wherein said step of marking is based on one or more of the following criteria: the type of lithographic tools used in the manufacturing enterprise; preferences of the interface handler of the photomask; and workload of each enterprise. 14. The method according to claim 1, in which these requirements are met in an industrial format for photomasks. 15. The method according to 14, in which the specified industrial format is a standard 8ΕΜΙ P-10. 16. The method according to claim 1, in which these requirements are met in their own format. 17. The method according to clause 16, in which the specified proprietary format is based on the design system interface photomask handler. 18. The method according to 17, in which the specified native format is based on the processing system of the manufacturer of the photomask. 19. The method according to claim 1, wherein said step of entering requirements is controlled by a first software component that comprises at least one subcomponent selected from the group consisting of (1) templates into which data is entered; (2) rules for converting data entered into templates into a specified format; (3) commands for using templates to create an order for a photomask in a given format; (4) a separate set of rules for verifying the authenticity of an order for a photomask with respect to a given format; and (5) at least one unique attribute object associated with the photomask template or order. 20. A method of processing mask data by converting design data in the form of an electronic circuit design data file for use in the manufacture of a photomask having phase-shifting and opaque elements into a data format suitable for this processing for manufacturing a photomask, comprising the steps of inputting design data using a given form electronic circuit design data; entering requirements for processing the order for the photomask made in accordance with the design data; the use of near optical correction to facilitate the process of moving phase-shifting and essentially opaque elements in the photomask; crushing at least part of the structural data, essentially, ready for reading - 25 009013 format compatible with the specified processing for the manufacture of photomasks; checking the integrity of fragmented structural data; merging two or more data sets of one or more of the following data types: (ί) the entered design data; (ίί) resized design data; (ίίί) fragmented data; and (ίν) verified fragmented data; forming a data set to ensure compatibility with the specified mask manufacturing process; and transmitting electronic signals corresponding to the generated data set to a remote manufacturer system associated with predetermined processing for manufacturing the photomask. 21. An automated system for processing structural data by converting structural data as an electronic circuit design data file for use in the manufacture of a photomask having substantially transparent and substantially opaque elements into a data format suitable for a given processing for manufacturing a photomask comprising a computer-readable medium containing instructions, the instructions being executed in a processor capable of performing the following steps: input design data using a given form of design data of the electronic circuit; entering requirements for processing the order for the photomask made in accordance with the design data; resizing design data to facilitate the process of moving substantially transparent and substantially opaque elements in the photomask; crushing at least a portion of the structural data substantially into a record-ready format compatible with a predetermined processing for making a photomask; checking the integrity of fragmented structural data; merging two or more data sets from one or more of the following data types: (ί) the entered design data; (ίί) resized design data; (ίίί) fragmented data; and (ίν) verified fragmented data; generating a data set to ensure compatibility with a given mask manufacturing process and transmitting electronic signals corresponding to the generated data set to a remote manufacturing system associated with a given processing for manufacturing a photomask. 22. An automated system for processing structural data by converting structural data as an electronic circuit design data file for use in the manufacture of a photomask having transparent and opaque elements into a data format suitable for a given processing for manufacturing a photomask containing at least one server, comprising memory, a first software component and a second software component for processing mask data, wherein said data relating to The masks related to the design are stored in the indicated memory, the first software component contains commands that control the user entering the requirements data for processing the photomask order executed in accordance with the design data, the second software component contains commands for parsing mask image data and requirements data in a format suitable for manufacturing, while the second software component contains commands for performing the following tasks: (ί) changing a size of structural data to facilitate the movement of substantially transparent and substantially opaque elements in the photomask; (ίί) crushing at least a portion of the structural data substantially into a record-ready format compatible with a predetermined processing for making a photomask; (ίίί) integrity checks of fragmented structural data; (ίν) merging two or more data sets from one or more of the following data types: (a) entered design data; (B) resized design data; (c) fragmented data; and (b) verified fragmented data; (ν) forming a data set to ensure compatibility with the specified mask manufacturing process; and circuits for transmitting electronic signals corresponding to the generated data set to a manufacturer's remote system associated with predetermined processing for manufacturing the photomask. 23. An automated system for processing structural data by converting structural data as an electronic circuit design data file for use in the manufacture of a photomask having phase-shifting and opaque elements into a data format suitable for a given processing for manufacturing a photomask containing a computer readable medium containing commands, while the commands are executed with the possibility of execution in a processor capable of performing the following stages: input design data using a given form of design data of the electronic circuit; - 26 009013 introduction of requirements for processing the order for the photomask made in accordance with the design data; the use of near optical correction to facilitate the process of moving phase-shifting and essentially opaque elements in the photomask; crushing at least part of the design data into a format ready for reading compatible with a given processing for making a photomask; checking the integrity of fragmented structural data; merging two or more data sets of one or more of the following data types: (1) the entered design data; (ίί) resized design data; (ίίί) fragmented data; and (ίν) verified fragmented data; generating a data set to ensure compatibility with the mask manufacturing process and transmitting electronic signals corresponding to the generated data set to the manufacturer’s remote system associated with a predetermined processing for manufacturing the photomask. 24. An automated system for processing structural data by converting structural data as an electronic circuit design data file for use in the manufacture of a photomask having phase-shifting and opaque elements into a data format suitable for a given processing for producing a photomask containing at least one server, comprising memory, a first software component and a second software component for processing mask data, wherein said data is masks related to the design are stored in memory, the first software component contains commands that control the user entering the requirements data for processing the photomask order executed in accordance with the design data, the second software component contains commands for parsing mask image data and requirements data in a format suitable for manufacturing, with the second software component containing instructions for performing the following tasks: (1) resizing OF DATA structure to facilitate the movement of the phase-shifting and substantially opaque elements in the photomask; (ίί) crushing at least a portion of the structural data substantially into a record-ready format compatible with a predetermined processing for making a photomask; (ίίί) integrity checks of fragmented structural data; (ίν) merging two or more data sets from one or more of the following data types: (a) entered design data; (B) resized design data; (c) fragmented data; and (b) verified fragmented data; (ν) generating a data set to ensure compatibility with the mask manufacturing process; and circuits for transmitting electronic signals corresponding to the generated data set to a manufacturer's remote system associated with predetermined processing for manufacturing the photomask.