JP2003023057A - Apparatus and method for opening/closing substrate- housing cassette - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an apparatus and a method for opening/closing substrate- housing cassette capable of eliminating a fault occurring due to a clearance between a key hole which is not decided by standards and a key decided by the standards. SOLUTION: The method for opening/closing the substrate-housing cassette comprises steps of setting the key hole 36a to a predetermined normal angle by further rotating the key 8 in the clockwise direction, for example, 1 deg. to 3 deg. and locking since the hole 36a will not be set to the predetermined angle by the clearance between the key 8 and the hole 36a as it is, if the key 8 is rotated in the clockwise direction by 90 deg.. That is, the method comprises steps of increasing the rotation of the key 8 as compared with the normal locking angle of the hole 36a, and locking.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate accommodating cassette opening / closing device and a substrate accommodating cassette opening / closing method for opening and closing a substrate accommodating cassette for transporting a semiconductor wafer substrate between devices in a clean room in the manufacture of semiconductor devices.

[0002]

2. Description of the Related Art In the manufacture of semiconductor devices, a resist film is formed on the surface of a semiconductor wafer (hereinafter referred to as "wafer"), the resist film is exposed to a predetermined pattern, and then a developing process and an etching process are performed to perform a predetermined process. Circuit pattern is formed. Among these processes, the resist film formation and the development process have been conventionally performed by an integrated coating and development processing apparatus as an apparatus. This coating and developing treatment apparatus is arranged in a clean room in a factory together with an etching apparatus and a CVD apparatus, and wafers are transferred between these apparatuses by accommodating, for example, 25 wafers in a carrier cassette for accommodating substrates. Is being done in.

In recent years, a FOUP (Front Opening Unified Pod) has been used as the above-mentioned carrier cassette in order to transfer wafers in an environment of higher cleanliness.
There is an increasing use of cassettes with high tightness called. This hoop is defined by the SEMI standard, and the cassette body is provided with a lid for internal sealing that can be locked by a latch mechanism.

In the coating and developing apparatus, the hoop cassette containing the wafer is placed on the cassette station of the apparatus, and the lid of the hoop cassette is unlocked and opened by an opener device having a key provided in the apparatus. It is like this. Then, the wafer in the cassette is taken out by the transfer robot installed in the cassette station, and processing such as resist coating and development is performed in the processing section.

[0005]

However, although the key size on the opener side is specified by the SEMI standard,
Since there is no regulation on the size of the keyhole provided on the lid side into which the key is inserted, there is a difference in the clearance between the key and the keyhole depending on the hoop manufacturer. As a result, when the clearance is relatively large, even if the key is rotated by a predetermined angle to lock and unlock the lid,
The key runs idle in the keyhole by the clearance, and there is a problem that locking and unlocking cannot be performed completely.

When the lid is closed, that is, when locked,
Even if the key is rotated by a predetermined angle and locked, the angle of the keyhole deviates from the angle at the time of the predetermined locking by the above clearance. If you try to insert the keyhole again at a predetermined angle, it may not come in.

In view of the above-mentioned circumstances, an object of the present invention is to solve the problem caused by the clearance between the key hole not defined by the standard and the key defined by the standard. Another object of the present invention is to provide a method for opening and closing a substrate housing cassette.

[0008]

To achieve the above object, a substrate accommodating cassette opening / closing device of the present invention has a key insertable into a keyhole provided in a lid of a cassette accommodating a substrate. An opening / closing mechanism for opening and closing the lid by rotating the key so that the keyhole has a predetermined normal angle in a state where the key is inserted into the hole, and the key is included in the opening / closing mechanism. A first key operation part for locking the lid so that the keyhole is at the normal angle by rotating the key in a predetermined direction by a first angle larger than the normal angle; Included in the mechanism, after locking the lid by the key operation unit, the key is rotated by a second angle in a direction opposite to the predetermined direction to set the angle of the key with respect to the keyhole. ; And a second key operation section for.

According to this structure, the keyhole is locked at the predetermined normal locking angle by rotating the key by the first angle, so that the keyhole which is not specified by the SEMI standard is locked. Regardless of the size, it is possible to securely lock the lid. Further, by locking the keyhole at a predetermined normal angle, it is possible to solve the problem that the key cannot be inserted when the key is inserted next time. Moreover, since the angle of the key with respect to the keyhole is made to coincide by rotating by a second angle in the direction opposite to the predetermined direction, the key can be smoothly removed from the keyhole.

According to one aspect of the present invention, the first key operation unit includes a rotating member connected to the key and a piston for rotating the rotating member. And a cylinder mechanism that operates by means of gas pressure or hydraulic pressure.

According to an aspect of the present invention, the second key operation portion is arranged inside the cylinder of the cylinder mechanism so as to be connected to the piston, and the piston moves the key in the predetermined direction. The elastic member is provided with an elastic force for rotating the key by a second angle in a direction opposite to the predetermined direction when the key is rotated by a first angle larger than the normal angle. As a result, the key can be reliably returned to the predetermined normal angle, and the key can be smoothly removed from the keyhole. Further, since the operation of rotating by the second angle is performed by a simple mechanism in which the elastic member is provided inside the cylinder, it is possible to prevent a cost increase.

According to one aspect of the present invention, the force when the piston rotates the key in the predetermined direction by a first angle larger than the normal angle is a predetermined value defined by the SEMI standard. The elastic force of the elastic member is set to a value that does not exceed. As described above, since the force of the piston that does not exceed the predetermined value defined by the SEMI standard is exerted by the simple mechanism of the elastic member provided inside the cylinder, the cost increase is prevented. be able to.

According to one aspect of the present invention, the force when the piston rotates the key in the predetermined direction by a first angle larger than the normal angle is a predetermined value defined by the SEMI standard. A stopper for stopping the rotation of the rotation member in the predetermined direction is further provided at a position that does not exceed the above. In this way, the force of the piston that does not exceed the predetermined value defined by the SEMI standard is performed by a simple mechanism in which the stopper that stops the rotation of the rotation member in the predetermined direction is performed. Therefore, it is possible to prevent the cost from rising.

According to one aspect of the present invention, the second key operation unit is configured such that when the piston rotates the key in the predetermined direction by a first angle larger than the normal angle. , A damper that applies an elastic force to the rotating member for rotating the key in a direction opposite to the predetermined direction by a second angle. As a result, the key can be reliably returned to the predetermined normal angle, and the key can be smoothly removed from the keyhole. In addition, since the operation of rotating by the second angle is performed by a simple mechanism called a damper, it is possible to prevent a cost increase.

According to one aspect of the present invention, the key is rotated by a first angle larger than the normal angle and is rotated by a second angle in a direction opposite to the predetermined direction. It further comprises a sensor for detecting, and means for controlling the operation of the piston in the cylinder mechanism based on the detection result of the sensor. By providing the sensor as described above, the operation of the key at a predetermined angle can be reliably performed, and the lid can be reliably locked.

According to the substrate accommodating cassette opening / closing method of the present invention, there is provided a key that can be inserted into a keyhole provided in a lid of a cassette that accommodates a substrate, and the key is inserted into the keyhole, In a substrate accommodating cassette opening / closing method for opening / closing the lid by rotating the key so that the keyhole has a predetermined normal angle, a first angle larger than the normal angle is set in the predetermined direction. By rotating the keyhole so that the keyhole has a predetermined normal angle, and locking the lid, and by rotating the keyhole by a second angle in a direction opposite to the predetermined direction, Matching the angle of the key with respect to the hole.

According to this structure, the keyhole is locked at the predetermined normal locking angle by rotating the key by the first angle, so that the keyhole which is not specified by the SEMI standard is locked. Locking can be reliably performed regardless of the size. Further, by locking the keyhole at a predetermined normal angle, it is possible to solve the problem that the key cannot be inserted when the key is inserted next time. Moreover, since the angle of the key with respect to the keyhole is made to coincide by rotating by a second angle in the direction opposite to the predetermined direction, the key can be smoothly removed from the keyhole.

Further features and advantages of the present invention will become more apparent with reference to the accompanying drawings and the description of the embodiments of the invention.

[0019]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

1 to 3 are views showing the entire constitution of a coating and developing treatment system to which the present invention is applied. FIG. 1 is a plan view thereof, FIG. 2 is a front view thereof, and FIG. 3 is a rear view thereof.

In the coating / developing processing system 1, a plurality of semiconductor wafers W as substrates to be processed are transferred into or out of the system in units of a plurality of wafer cassettes CR, for example, 25 wafers, or wafers are transferred to the wafer cassette CR. A cassette station 10 for loading / unloading W, and a processing station in which various single-wafer processing units for performing a predetermined process on the wafer W one by one in a coating / developing process are arranged in multiple stages at predetermined positions. 11 and an interface section 12 for transferring a wafer W between the processing station 11 and an exposure apparatus (not shown) provided adjacent to the processing station 11 are integrally connected.

In the cassette station 10, as shown in FIG. 1, four slide stages 14 that slide, for example, in the X direction are arranged on the cassette mounting table 20, and when the cassette CR is mounted on each slide stage 14, the three
The one projection 14a allows the cassette CR to be positioned by moving a lid 17 of the cassette CR, which will be described later, toward the processing station 11 in the Y direction. Further, the opening / closing device 15 according to the present invention is arranged so as to face the lid 17 of each cassette CR. This will be described later.

In the cassette station 10, the cassette arrangement direction (X direction) and the wafer cassette CR are arranged.
A wafer transfer body 21 movable in the wafer arrangement direction (Z direction) of the wafers stored therein selectively accesses each wafer cassette CR. Further, the wafer transfer body 21 is configured to be rotatable in the θ direction,
As will be described later, the third group G3 on the processing station 11 side
Of the alignment unit (AL
IM) and extension unit (EXT) are also accessible.

As shown in FIG. 1, the processing station 11 is provided with a vertical transfer type main wafer transfer mechanism 22 at the center thereof, and all the processing units are surrounded by one set or a plurality of sets of multi-stages. It is located in. In this example, 5
In the multi-stage arrangement configuration of the groups G1, G2, G3, G4, G5, the multi-stage units of the first and second groups G1 and G2 are juxtaposed on the front side (front side in FIG. 1) of the system, and the third group G3 The multistage unit is arranged adjacent to the cassette station 10, the multistage unit of the fourth group G4 is arranged adjacent to the interface unit 12, and the multistage unit of the fifth group G5 is arranged on the back side. The fifth group G5 is
Rail 2 for maintenance of main wafer transfer mechanism 22
It is configured to be movable along 5.

As shown in FIG. 2, in the first set G1, two spinner type processing units, for example, a resist coating processing unit (COT), which place a wafer W on a spin chuck in a cup CP and perform a predetermined process. And the development processing units (DEV) are stacked in two stages in order from the bottom. Also in the second group G2, two spinner type processing units, for example, a resist coating processing unit (COT) and a development processing unit (DEV) are stacked in two stages in order from the bottom. In the resist coating processing unit (COT), draining of the resist solution is troublesome both mechanically and in terms of maintenance. Therefore, it is preferable to arrange the resist solution in the lower stage. But,
It is also possible to arrange them in the upper stage if necessary.

As shown in FIG. 3, in the third group G3, an oven type processing unit for placing a wafer W on a mounting table and performing a predetermined process, for example, a cooling unit (COL) and an adhesion unit in order from the bottom. (AD), alignment unit (ALIM), extension unit (EXT), pre-baking unit (PREBAK)
E) and the post-baking unit (POBAKE) are stacked. Also in the fourth group G4, an oven type processing unit, for example, a cooling unit (CO
L) has 2 stages, extension cooling unit (EXTCOL), extension unit (EX
T), a pre-baking unit (PREBAKE) and a post-baking unit (POBAKE) are stacked.

As described above, the cooling units (COL) and (EXTCOL) having a low processing temperature are arranged in the lower stage, and the baking units (PREBAKE) and the post-baking units (POBAKE) having a high processing temperature are arranged in the upper stage. Thermal mutual interference between them can be reduced. However, a random multi-stage arrangement is also possible.

As shown in FIG. 3, the main wafer transfer mechanism 22 is equipped with a wafer transfer device 46 which is vertically movable (Z direction) inside a cylindrical support 49. The cylindrical support 30 is connected to a rotating shaft of a motor (not shown), and is rotated integrally with the wafer transfer device 46 by the rotational driving force of this motor. The transfer base 4 of the wafer transfer device 46
Three arms 48, for example, are provided on the seven. These arms 48 are configured to be movable back and forth along the X direction. Then, the main wafer transfer mechanism 22 accesses the processing stations arranged around the arm 48 to transfer the wafer W to and from these processing stations.

The interface section 12 has the same size as the processing station 11 in the depth direction, but is made small in the width direction. A portable pickup cassette CR and a stationary buffer cassette BR are arranged in two stages on the front surface of the interface portion 12, a peripheral exposure device 23 is arranged on the rear surface, and a wafer carrier 24 is arranged on the central portion. It is provided. This wafer carrier 24
Moves in the X and Z directions to access both cassettes CR and BR and the peripheral exposure device 23. Further, the wafer carrier 24 is configured to be rotatable in the θ direction, and is transferred to the extension unit (EXT) belonging to the multistage unit of the fourth group G4 on the processing station 11 side and the wafer transfer on the adjacent exposure apparatus side. A platform (not shown) is also accessible.

Regarding the series of processing steps of the coating and developing treatment system 1 described above, first, when the cassette CR is placed on the slide stage 14 of the cassette station 10, the slide stage 14 is in a state where the cassette CR is placed. And slide toward the opening 26. Then, after this slide stops at a predetermined position, a shutter mechanism (not shown) opens. The lid 17 of the cassette CR by the opening / closing device 15
Is unlocked and opened, and the opening / closing device 15 is driven by the drive unit 31.
Moves down with the lid 17 held.

Next, the wafer transfer body 21 accesses the cassette CR which contains the unprocessed wafers on the cassette mounting table 20, takes out one semiconductor wafer W from the cassette CR, and the alignment unit (ALIM). ) Is transported to. After the wafer W is aligned by the alignment unit (ALIM), it is transferred to the adhesion unit (AD) by the main wafer transfer mechanism 22 and subjected to the hydrophobic treatment, and then the cooling unit (C).
A predetermined cooling process is performed in (OL). Then, it is conveyed to a resist coating processing unit (COT) and spin coating of resist is performed. Then, a predetermined heating process is performed in the pre-baking unit (PREBAKE), a cooling process is performed in the cooling unit (COL), and then an exposure process is performed by the wafer transfer body 24 via the interface unit 14 by an exposure device (not shown). After the exposure processing is completed, the wafer W is transferred to the development processing unit (D
After being conveyed to EV), development processing is performed, and a predetermined heating processing is performed in a post baking unit (POBAKE). Then, the wafer W is subjected to a predetermined cooling process in the cooling unit (COL) and returned to the cassette CR via the extension unit (EXT).

After this, the opening / closing device 1 holding the lid 17
5 moves up by the drive of the drive unit 31 and approaches the opening of the cassette CR. Then, the lid 17 is locked and closed by the opening / closing device 15.

FIG. 4 is a partially cutaway front view showing the opening / closing device according to the present invention with a part of the cassette station 10 cut away. The transfer chamber 18 of the cassette station 10 is separated from the clean room atmosphere by a first vertical partition plate 19. The vertical partition plate 19 is made of, for example, an acrylic plate or stainless steel. For example, four openings 26 are formed in the first vertical partition plate 19, and four opening / closing devices 15 are arranged so as to face these openings 26. A shutter mechanism (not shown) is provided in the opening 26.

The opening / closing device 15 is movable in the Z direction and the X direction via a supporting member 32 by a driving unit 31 provided in the lower portion. The opening / closing device 15 can open and remove the lid 17 of the cassette CR by moving in the X direction, and the removed lid can be lowered by moving in the Z direction. As a result, the wafer carrier 21 can take out the wafer W in the cassette CR.

FIG. 5 is a perspective view showing a state where the lid 17 of the cassette CR is removed. The lid 17 can be locked and unlocked with respect to the main body 35 of the cassette CR, and the locking and unlocking mechanism is constituted by a simple latch mechanism provided in the lid 17. For example, a keyhole 36a is formed in the rotatable rotation member 36, and the rotation member 36 is provided with a movable member 34 that can be moved up and down by rotation of the rotation member 36 within a maximum range of 90 °. It is connected. By the vertical movement of the movable member 34, both ends of the movable member 34 are fitted into the grooves 33 formed in the main body 35, and the lid 17
Is locked to the main body 35 so that the inside of the main body is sealed.

FIG. 6 is a front view of the above-described opening / closing device according to one embodiment of the present invention, and FIG. 7 is a line AA in FIG.
It is a line sectional view.

The opening / closing device 15 has two key portions 3 in a case 28 and two holding portions 2 for holding the lid 17 of the cassette CR. The holder 2 has a suction cup 13 for vacuum suction and a protrusion 6 that fits into a hole 17a provided on the lid 17 side, and holds the lid 17.

The cylinder portion 16 of the key portion 3 moves the piston 4 by, for example, gas pressure or hydraulic pressure. For example, a rotary shaft member 27 provided at one end of the piston 4 is connected to a projecting member 5 provided on a rotary disc 7, and a key 8 is fixed to the rotary disc 7. The moving force of the piston 4 causes the key 8 to rotate, for example, clockwise and counterclockwise. The gas pressure or hydraulic pressure of the cylinder portion 16 is controlled by a control system such as a switching valve described later.

Inside the cylinder portion 16, the piston 4
A spring 37 is provided as an elastic member at the other end of the. Further, the key portion 3 is a sensor 4 that detects the amount of movement of the piston 4 (for example, the position of the rotary shaft member 27 at the tip portion).
1 and 42 are provided. Optical sensors are used as the sensors 41 and 42, for example. The operation of the spring 37 and the sensors 41 and 42 will be described later.

According to the SEMI standard, this cassette CR is used.
Although the turning power of the key 8 on the opening / closing device 15 side is set to such a degree that the latch mechanism of is not broken, this specified torque is
It is set at 1.7 N · m or less. Therefore, in the opening / closing device 15 according to the present embodiment, the protruding member 5 is provided in the direction in which the clockwise rotation of the rotating disk 7 is stopped so that the key 8 does not exceed the torque of 1.7 N · m. Stopper 9 that gives force against
Is provided. However, even if the stopper 9 is not provided, the set value of the elastic force of the spring 37 may be set so as not to exceed the torque of 1.7 N · m.

Next, the unlocking and locking operation of the lid 17 by the opening / closing device 15 will be described.

First, as shown in FIG. 8A, the key 8 is inserted into the keyhole 36a. The cylinder portion 16
Is stationary, the 3-port switching valve 40 for operating the cylinder portion 16 is open to the atmosphere as shown in FIG. 8A (for example, when the cylinder portion 16 is operated by gas pressure). . At this time, the sensor 42 confirms the tip portion of the piston. The position of this piston is hereinafter referred to as the "latch position". Then, as shown in FIG. 7B, air is introduced from the port A and the key 8 is rotated 90 °.
The optical sensor 43 is rotated counterclockwise to a position where the tip of the piston 4 is confirmed (port B is open to the atmosphere). The position of this piston is hereinafter referred to as the "unlatch position". As a result, the movable member 34 is moved to the cassette CR.
It is removed from the groove 33 of the main body 35 at, and the lid 17 is removed and opened.

Then, when the wafer W which has been subjected to each of the above processes is housed in the cassette CR and then the lid 17 is locked and closed, air is introduced from the port B as shown in FIG. 9A. Turn the key 8 clockwise from the unlatch position to 9
Rotate 0 °. However, in this state, the clearance between the key 8 and the keyhole 36a causes the keyhole 36a to
Is not set to a predetermined angle, the key 41 is further rotated clockwise as shown in FIG.
For example, the tip end portion is rotated by 1 ° to 3 ° to the position for confirmation (port A is open to the atmosphere). The position of the piston at this time is hereinafter referred to as "overdrive position". In this way, the keyhole 36a is locked at a predetermined normal angle. That is, the key 8 is locked by making the rotation of the key 8 larger than the normal locking angle of the keyhole 36a. At this time,
As described above, the stopper 9 functions with respect to the projecting member 5 so that the torque of the key 8 does not exceed 1.7 N · m. It is also possible to adjust the torque.

Finally, as shown in FIG. 10, by opening both the A port and the B port of the cylinder 16 to the atmosphere, the key 8 is returned to the latch position by the elastic force of the spring 37. As a result, the key 8 becomes the keyhole 36a.
The key 8 is smoothly pulled out from the keyhole 36a because it coincides with the normal angle. At this time, the sensor 42 determines whether it is in the latch position.

As described above, the key 8 is inserted into the keyhole 36a.
The keyhole 36a is rotated at a larger angle than the predetermined normal locking angle to bring the keyhole 36a to the overdrive position at the predetermined normal locking angle.
Can be locked reliably regardless of the size of.

Further, by locking the keyhole 36a at a predetermined normal angle, it is possible to eliminate the problem that the key 8 cannot be inserted when the key 8 is inserted into the keyhole 36a next time.

Further, since the operation of returning the key 8 to the latch position is performed by using the simple mechanism of the spring 37, the cost increase can be prevented.

The present invention is not limited to the embodiment described above, and various modifications can be made.

For example, although the spring 37 is used as the elastic member in the above embodiment, the present invention is not limited to this, and any material that can obtain elastic force, such as rubber or sponge, or a shock absorber utilizing the resistance of fluid, can be used. It is applicable to the invention.

Further, as shown in FIG. 11, for example, instead of the stopper 9 in the above embodiment, a damper 45 utilizing a spring 44 can be used. For example, the same effect as that of the above-described embodiment can be obtained by setting the latch position as shown in the figure in a state where the spring 44 of the damper 45 is not biased. Also,
In this case, it is not necessary to provide the spring 37 as described above in the cylinder portion 16, but it is also possible to provide the spring 37 and set it so as to take the latch position together with the damper 45. The damper 45 is not limited to the spring 44, and other elastic members such as sponge and rubber may be used.

Further, in each of the above embodiments, the key 8 may be returned to the latch position by controlling the gas pressure or hydraulic pressure inside the cylinder without using the spring 37, the damper 45 or the stopper 9 as the elastic member. Good.

Further, the sensors 41, 42 and 43 are not limited to the optical sensors and may be other sensors as long as the latch position, the overdrive position and the unlatch position can be confirmed. In addition, these sensors are cylinders 16
It may be provided inside.

Furthermore, in the above embodiment, the coating / developing processing system for resist processing on the semiconductor wafer has been described, but the present invention is not limited to this, and the present invention can be applied to a system for coating / forming an interlayer insulating film. Further, the present invention can be applied to a system for processing a glass substrate used for a liquid crystal display or the like.

[0054]

As described above, according to the present invention,
It is possible to solve the problem caused by the clearance between the key hole not defined by the standard and the key defined by the standard.

[Brief description of drawings]

FIG. 1 is a plan view of a coating and developing treatment system to which the present invention is applied.

FIG. 2 is a front view of the coating and developing treatment system shown in FIG.

3 is a rear view of the coating and developing treatment system shown in FIG.

4 is a partially cutaway front view of the cassette station shown in FIG. 1. FIG.

FIG. 5 is a perspective view showing a state where a lid of the substrate housing cassette is removed.

FIG. 6 is a front view of the opening / closing device according to the embodiment of the present invention.

7 is a cross-sectional view taken along the line AA in FIG.

FIG. 8 is a schematic diagram showing the unlocking action of the lid.

FIG. 9 is a schematic diagram showing a locking action of the lid.

FIG. 10 is a schematic view showing a locking action of the lid.

FIG. 11 is a schematic view of a key unit according to another embodiment.

[Explanation of symbols]

W ... Semiconductor wafer substrate 3 ... Key part 4 ... piston 5 ... Projection member 7 ... Rotating disk 8 ... key 15 ... Switchgear 16 ... Cylinder part 17 ... Lid 35 ... Cassette body 36a ... Keyhole 37 ... Spring 40 ... 3 port switching valve 41, 42, 43 ... Sensor 44 ... Spring 45 ... Damper

   ─────────────────────────────────────────────────── ─── Continued front page    F-term (reference) 5F031 CA02 CA05 DA08 EA12 EA14                       FA01 FA05 FA12 FA15 GA02                       GA25 GA36 GA47 GA48 GA49                       GA50 JA02 JA14 JA17 JA22                       LA15 MA02 MA04 MA24 MA26                       NA02 NA10

Claims (8)

[Claims] 1. A key that can be inserted into a keyhole provided in a lid of a cassette that accommodates a substrate, and the keyhole has a predetermined normal angle when the key is inserted into the keyhole. An opening / closing mechanism for opening and closing the lid by rotating the key, and by rotating the key in a predetermined direction by a first angle larger than the normal angle included in the opening / closing mechanism. A first key operation unit for locking the lid so that the keyhole is at the normal angle; and a key included in the opening / closing mechanism for locking the lid by the key operation unit, And a second key operation unit for matching the angle of the key with respect to the keyhole by rotating the key by a second angle in the opposite direction to the predetermined direction. . 2. The substrate accommodating cassette opening / closing apparatus according to claim 1, wherein the first key operation unit includes a rotating member connected to the key, and a piston for rotating the rotating member. And a cylinder mechanism for operating this piston by gas pressure or hydraulic pressure. 3. The substrate accommodating cassette opening / closing device according to claim 2, wherein the second key operating portion is arranged inside the cylinder of the cylinder mechanism so as to be connected to the piston, and the piston is configured to operate the key. Elasticity that gives an elastic force for rotating the key by a second angle in a direction opposite to the predetermined direction when the key is rotated in a predetermined direction by a first angle larger than the normal angle. A substrate accommodating cassette opening / closing device, which is a member. 4. The substrate accommodating cassette opening / closing device according to claim 3, wherein a force when the piston rotates the key in the predetermined direction by a first angle larger than the normal angle is S.
To a value that does not exceed the specified value specified by the EMI standard,
The substrate accommodating cassette opening / closing device, wherein the elastic force of the elastic member is set. 5. The substrate accommodating cassette opening / closing device according to claim 1, wherein a force applied when the piston rotates the key in the predetermined direction by a first angle larger than the normal angle. Is S
The substrate accommodating cassette opening / closing device further comprising a stopper that stops rotation of the rotating member in the predetermined direction at a position that does not exceed a predetermined value defined by the EMI standard. 6. The substrate accommodating cassette opening / closing device according to claim 2, wherein the second key operation unit causes the piston to rotate the key in the predetermined direction by a first angle larger than the normal angle. A substrate accommodating cassette opening / closing device, which is a damper that gives an elastic force to the rotating member for rotating the key by a second angle in a direction opposite to the predetermined direction when moved. . 7. Any one of claims 2 to 6
The substrate accommodation cassette opening / closing device according to the item 1, wherein it is detected that the key is rotated by a first angle larger than the normal angle and rotated by a second angle in a direction opposite to the predetermined direction. The substrate accommodating cassette opening / closing device further comprising a sensor, and means for controlling the operation of the piston in the cylinder mechanism based on the detection result of the sensor. 8. A key which can be inserted into a keyhole provided in a lid of a cassette for accommodating a substrate, and in which the keyhole is in a predetermined normal angle when the key is inserted into the keyhole. A method of opening and closing the lid by opening and closing the lid by rotating the key in a direction such that the key is larger than the normal angle in a predetermined direction.
The step of locking the lid so that the keyhole is at a predetermined normal angle by rotating the keyhole, and rotating by a second angle in a direction opposite to the predetermined direction, A method of opening and closing a substrate accommodating cassette, comprising: matching the angle of the key with respect to the keyhole.