JP2003022527A - Method for manufacturing master carrier for magnetic transfer - Google Patents

Abstract

PROBLEM TO BE SOLVED: To manufacture a master carrier having a pattern of soft magnetic layer accurately corresponding to the fine pattern on a substrate and to realize a magnetic transfer having a high transferring quality. SOLUTION: A collimator member 7 which has a parallel path 7a perpendicular to the surface of the substrate 31 and eliminates a diagonal component of a steam flow to make the flow have straight component is installed between the substrate 31 on which the pattern is formed and the evaporation source 6 of a soft magnetic material when the master carrier 3 for magnetic transfer is manufactured by forming a soft magnetic layer 32 on the pattern formed on the substrate 31, thus the soft magnetic layer 32 is accurately formed on the substrate 31 through the collimator member 7.

Description

Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a magnetic transfer master carrier used in a magnetic transfer method for magnetic transfer from a master carrier carrying information to a slave medium. Is. 2. Description of the Related Art A magnetic transfer method is a magnetic field for transfer in a state where a master carrier carrying transfer information by means of a fine uneven pattern of a magnetic material and a slave medium having a magnetic recording portion to be transferred are in close contact. Is applied, and a magnetization pattern corresponding to information (for example, servo signal) carried on the master carrier is transferred and recorded on the slave medium. As this magnetic transfer method, for example, Japanese Patent Laid-Open No. 63-183623,
Japanese Patent Laid-Open Nos. 10-40544 and 10-2695
66 and the like. A master carrier used for magnetic transfer is formed by forming a concave / convex pattern with a magnetic material by subjecting a silicon substrate, a glass substrate, or the like to treatments such as photofabrication, sputtering, and etching. Further, it is considered that a master carrier for magnetic transfer is produced by applying a lithography technique used in a semiconductor or the like, or a stamper producing technique used for producing an optical disc stamper. Here, an embodiment of the basic process of magnetic transfer which is the object of the present invention will be described with reference to FIG. This example is based on in-plane recording. First, a slave medium 2 having a magnetic recording layer to be subjected to magnetic transfer, and a soft magnetic layer 32 covered with a fine uneven pattern of a substrate 31 as shown in FIG. A master carrier 3 having a pattern is prepared. And first, FIG.
As shown in (a), initial magnetization (DC demagnetization) is performed in advance by applying an initial static magnetic field Hin to the slave medium 2 in one direction in the track direction. Thereafter, as shown in FIG. 2 (b), the magnetic recording surface of the slave medium 2 and the soft magnetic layer 32 of the master carrier 3.
And a convex magnetic field pattern for the transfer in the direction opposite to the initial magnetic field Hin in the track direction of the slave medium 2.
Is applied to perform magnetic transfer. As a result of the transfer magnetic field Hdu being sucked into the convex pattern by the soft magnetic layer 32, the magnetization of this portion is not reversed, and the magnetization of the other portion is reversed.
As shown in (c), a magnetization pattern corresponding to the concavo-convex pattern of the soft magnetic layer 32 of the master carrier 3 is transferred and recorded on the track of the slave medium 2. Even in the perpendicular recording method, magnetic transfer can be performed on a slave medium by using a master carrier having a concavo-convex pattern with a soft magnetic layer substantially the same as described above. However, in order to improve the transfer quality in the magnetic transfer as described above, it is necessary to form a transfer pattern using the soft magnetic layer 32 on the master carrier 3 with high accuracy. For example, with respect to the substrate 31 on which fine irregularities are formed in a predetermined pattern by a stamper method or the like, a soft magnetic material is formed on the fine pattern by a vacuum film forming means such as a vacuum deposition method, a sputtering method, or an ion plating method. The soft magnetic layer 32 is formed in a concavo-convex pattern similar to the concavo-convex pattern of the substrate 31. When the soft magnetic layer 32 is formed on the fine pattern of the substrate 31, if the film is formed uniformly from the direction perpendicular to the surface of the substrate 31, ideally, as shown in FIG. As shown, the master carrier 3 in which the soft magnetic layer 32 is coated only on the top surface and the bottom surface of the concave portion of the pattern of the substrate 31 is obtained, and the magnetization pattern can be transferred according to the pattern. However, in reality, a soft magnetic layer evaporation source (sputter source) in various film forming means has a certain solid angle and vapor flows from multiple directions reach the substrate, and the corners of the projections. In addition, film formation on the side surface is also performed. Even in such a case, when the uneven width of the fine pattern is on the order of 0.3 μm, the signal shape after magnetic transfer is a problem for the pattern shape of the soft magnetic layer affected by the vapor flow (diagonal component) other than the straight component. It was not. However, when the uneven width of the pattern is reduced to about 0.2 μm or less in response to an increase in recording density, etc.,
The pattern shape of the soft magnetic layer formed on the substrate does not reflect the uneven pattern of the substrate due to the vapor flow of the oblique component during the formation of the soft magnetic layer. In some cases, the soft magnetic layer is bonded so as to fill the concave portion across the convex portion, and the surface of the formed soft magnetic layer is flattened. In such a master carrier, no magnetic flux is generated outside the soft magnetic layer pattern at the time of magnetic transfer, so that there is a problem that the magnetization of the slave medium is not reversed according to the transfer pattern, and good magnetic transfer cannot be performed. The present invention has been made in view of such problems, and has a pattern with a soft magnetic layer that accurately corresponds to a fine pattern on a substrate, and can perform magnetic transfer with high transfer quality. The object is to provide a method for producing a carrier. A method for producing a magnetic transfer master carrier according to the present invention is a method for producing a magnetic transfer master carrier comprising a soft magnetic layer formed on a pattern formed on a substrate. When the soft magnetic layer is formed, between the substrate on which the pattern is formed and the evaporation source of the soft magnetic material,
Installing a collimator member having a parallel passage perpendicular to the surface of the substrate, removing a slant component of the vapor flow to make a straight component, and forming a soft magnetic layer on the substrate through the collimator member; It is a feature. The soft magnetic layer is preferably formed by vacuum film forming means such as a vacuum deposition method, a sputtering method, or an ion plating method using a soft magnetic material. Further, the collimator member preferably has a honeycomb structure having a finely divided parallel passage such as a lattice shape, a honeycomb shape, or a corrugated cardboard shape in which corrugated plates and flat plates are laminated. The master carrier prepared by the method of the present invention is placed between the evaporation source of the soft magnetic material on the substrate on which the pattern is formed, and a collimator having parallel passages perpendicular to the surface of the substrate. Through the meter member, a slant component is removed and a soft magnetic layer is formed by vapor flow with a straight component. According to the present invention as described above, when forming a master carrier by forming a soft magnetic layer on a pattern formed on the substrate, the substrate on which the pattern is formed, By installing a collimator member having a parallel passage perpendicular to the surface of the substrate between the evaporation source of the magnetic material and forming a soft magnetic layer on the substrate through the collimator member, the collimator member Since the soft magnetic layer is formed by the straight component vapor flow from which the oblique component is removed by the step, the unevenness width of the pattern is 0.2 μm corresponding to the increase in recording density, etc.
Even if it becomes narrower than about m, the pattern shape of the soft magnetic layer accurately reflects the concave / convex pattern of the substrate, so that magnetic transfer with high transfer quality can be performed well and reliability can be improved. DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described in detail below. FIG. 1 is a schematic view of a film forming apparatus for forming a soft magnetic layer in one embodiment. As shown in FIG. 2, the magnetic transfer master carrier 3 has a soft magnetic layer 32 formed on a substrate 31 on which a fine concavo-convex pattern having a form corresponding to the information to be transferred is formed. It becomes. On the surface of the substrate 31, fine uneven patterns are formed by various production methods, and the substrate 31 is transported to the film forming apparatus 1 to form a soft magnetic layer 32 on the pattern of the substrate 31. A film forming apparatus 1 shown in FIG. 1 includes a vacuum chamber 4 that is depressurized by a vacuum pump (not shown), a substrate holder 5 that holds a substrate 31 on which a pattern is formed, in the vacuum chamber 4, and the substrate holder. Substrate 31 held by 5
An evaporation source 6 of a soft magnetic material installed at a position opposite to
A collimator member 7 is provided between the substrate 31 and the evaporation source 6. As the basic structure of the film forming apparatus 1, a conventionally known film forming apparatus such as a vacuum vapor deposition method, a sputtering method, or an ion plating method is used. The collimator member 7 has a parallel passage 7a perpendicular to the surface of the substrate 31, and removes an oblique component of the vapor flow of the soft magnetic material from the evaporation source 6 to obtain a straight component. The soft magnetic layer 32 is formed on the substrate 31 through the parallel passage 7a of the collimator member 7. Although the collimator member 7 is not shown in detail, the collimator member 7 has a honeycomb structure having finely divided parallel passages 7a such as a lattice shape, a honeycomb shape, and a corrugated cardboard shape in which corrugated plates and flat plates are laminated. Composed of things. Then, a vapor flow is generated from the soft magnetic material evaporation source 6 using the film forming apparatus 1 under predetermined film forming conditions, and a collimator having parallel passages 7a perpendicular to the surface of the substrate 31. The substrate 31 held on the substrate holder 5 by the vapor flow due to the straight traveling component with the oblique component removed through the member 7.
On this pattern, a soft magnetic layer 32 is formed to form a master carrier 3. According to this embodiment, on the pattern of the substrate 31, the oblique component is removed by the collimator member 7, and the soft magnetic layer 32 is formed by the vapor flow from the evaporation source 6 of the soft magnetic material by the straight component. For this reason, the master carrier 3 thus prepared accurately reflects the concavo-convex pattern of the substrate 31 even when the concavo-convex width of the pattern is narrowed to about 0.2 μm or less. Figure 2 (b)
It can be formed close to the ideal shape, and magnetic transfer with high transfer quality becomes possible with the high pattern accuracy. The prepared master carrier 3 is conveyed to a magnetic transfer device, and is brought into close contact with the slave medium 2 that has been previously magnetized in the track direction or the vertical direction in the basic process as shown in FIG. In this state, a magnetic field for transfer is applied in a direction substantially opposite to the initial magnetization direction by a magnetic field application device such as an electromagnet device, and a magnetization pattern corresponding to the transfer information of the master carrier 3 is transferred and recorded on the slave medium 2. As the substrate 31 of the master carrier 3, nickel, silicon, aluminum, an alloy or the like is used. The formation of the concavo-convex pattern is performed by a stamper method or the like. In the stamper method, a photoresist is formed on a glass plate (or quartz plate) having a smooth surface by spin coating or the like, and laser light (or modulated in response to a servo signal while rotating the glass plate) (or An electron beam is irradiated to expose a predetermined pattern, for example, a pattern corresponding to a servo signal. Thereafter, the photoresist is developed, the exposed portion is removed, and a master having a concavo-convex shape by the photoresist is obtained. Next, based on the concavo-convex pattern on the surface of the master, plating (electroforming) is performed on the surface to create a substrate having a positive concavo-convex pattern, and the substrate is peeled off.
The depth of the concavo-convex pattern of the substrate 31 (the height of the protrusion) is 80
The range of nm to 800 nm is preferable, more preferably 1
00 nm to 600 nm. In addition, a second master is produced by plating the master, and plating is performed using the second master.
You may create the board | substrate which has a negative uneven | corrugated pattern. Furthermore, the second master may be plated or a resin solution may be pressed and cured to create a third master, and the third master may be plated to create a substrate having a positive uneven pattern. . On the other hand, after forming a pattern with a photoresist on the glass plate, etching may be performed to form a hole in the glass plate to obtain a master from which the photoresist has been removed, and the substrate may be formed in the same manner as described above. As described above, the soft magnetic layer 32 is formed by depositing a soft magnetic material by a vacuum film forming means such as a vacuum deposition method, a sputtering method, or an ion plating method. As the magnetic material, Co, Co alloy (CoN
i, CoNiZr, CoNbTaZr, etc.), Fe, Fe
Alloy (FeCo, FeCoNi, FeNiMo, FeA
lSi, FeAl, FeTaN), Ni, Ni alloy (N
iFe) can be used. Particularly preferably FeC
o, FeCoNi. The thickness of the soft magnetic layer 32 is 50
The range of nm-500 nm is preferable, More preferably, it is 100 nm-400 nm.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view of a film forming apparatus for forming a soft magnetic layer according to one embodiment of the present invention. FIG. 2 is a view showing one mode of a basic process of magnetic transfer. DESCRIPTION OF SYMBOLS 1 Deposition device 2 Slave medium 3 Master carrier 7 Collimator member 7a Parallel path 31 Substrate 32 Magnetic layer

──────────────────────────────────────────────────── ─── Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme code (reference) G11B 5/86 101 G11B 5/86 101B

Claims (1)

What is claimed is: 1. A method for producing a master carrier for magnetic transfer comprising a soft magnetic layer formed on a pattern formed on a substrate, wherein the pattern is formed when the soft magnetic layer is formed. A collimator member having a parallel passage perpendicular to the surface of the substrate is installed between the substrate on which the substrate is formed and an evaporation source of the soft magnetic material, and a soft magnetic layer is formed on the substrate through the collimator member. A method of producing a master carrier for magnetic transfer, characterized by forming a film.