JP2003015277A - Photosensitive composition and method for manufacturing article covered with patterned film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To manufacture an article covered with a patterned film which can be formed by short-time irradiation with light followed by development with high sensitivity and has superior pattern accuracy. SOLUTION: In the method for manufacturing an article covered with a patterned film, a substrate is coated with a photosensitive composition containing a metal alkoxide and β-diketone, the resulting coating film is patternwise irradiated with light, the exposed area of the coating film is polymerized and the unexposed area is dissolved and removed. The photosensitive composition further contains acrylic acid or methacrylic acid besides the metal alkoxide and β-diketone.

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to a photosensitive composition and a method for producing a patterned film-coated article. More specifically, it relates to a photosensitive composition containing an organometallic compound having photosensitivity and a method for producing a patterned film-coated article by applying the photosensitive composition on a substrate, irradiating it with light and removing the unexposed portion.

[0002]

2. Description of the Related Art The development of a photosensitive material for forming this pattern film has been advanced and many proposals have been made. The following characteristics are generally required for photosensitive materials. High sensitivity to the energy applied. High resolution, that is, excellent pattern accuracy and workability. High adhesion to the substrate, etc. Up to now, it has been known to use a photosensitive sol-gel material as a method for forming a pattern of a metal oxide thin film.

As a photosensitive sol-gel material, it is known to use a photosensitive metal alkoxide in which a zirconium or aluminum metal alkoxide ligand is replaced with a photosensitive ligand in order to enhance the photosensitivity of the metal alkoxide. There is. Jpn.J.Appl.Phys.Vol.33 (1994) pp.L1181 ~ L1184,
In Part 2, No.8B, 15 August 1994, the photo-curing property of zirconium butoxide chelated with acetylacetone was reported, and the collection of polymer papers, Vol.53, No.4, p.
pp. 253-259 (Apr., 1996) reports on the photosensitivity of various .beta.-diketone modified aluminum-sec-butoxides. Also, Applied Optics.Vol.3
9, No. 4, pp. 489-493 and JP-A-2000-321415.
For coating, a photosensitive liquid composition containing a metal alkoxide and β-diketone is applied to a substrate, and the exposed portion of the coating film is polymerized by irradiating with interference light, and then the unexposed portion is dissolved (leaching) and removed. To produce a diffraction grating. Further, in JP-A-2000-322777, a photosensitive liquid composition containing a metal alkoxide, a β-diketone and a sensitizer (for example, benzophenone) is applied to a substrate, and after irradiation with ultraviolet rays through a photomask, development and It is described to form a metal oxide layer having fine irregularities by firing.

[0004]

However, the laser light (irradiation intensity 1) necessary for curing these photosensitive materials is used.
Since the irradiation time of 0 mW / cm ² ) is as long as 10 minutes to 30 minutes and the productivity is low, a photosensitive organometallic compound having higher sensitivity has been demanded. Further, the above-mentioned JP-A-200-200, which uses a sensitizer
With 0-322777, although the exposure time can be shortened, a large amount of sensitizer is required, so that the shrinkage of the film becomes large at the time of firing, and the accuracy of the obtained pattern film is likely to decrease.

An object of the present invention is to use a metal alkoxide as a main raw material to form a film by light irradiation for a short time, to have high sensitivity in development (dissolution and removal of unexposed areas) after light irradiation, and what is called leaching. An object of the present invention is to produce a patterned film-coated article excellent in pattern accuracy with good breakage (to the extent that unexposed portions near the edges of the patterned film are dissolved and removed cleanly) and a photosensitive composition therefor.

Another object of the present invention is to provide a method for producing a patterned film-coated article excellent in various properties as described above, using the above-mentioned photosensitive composition. Further objects and advantages of the present invention will be apparent from the following description.

[0007]

That is, the present invention is to apply a photosensitive composition containing a metal alkoxide and β-diketone to a substrate and irradiate it with light to polymerize the exposed portion of the coating film.
A method for producing a patterned film-coated article for dissolving and removing an unexposed portion, wherein the composition contains acrylic acid or methacrylic acid in addition to the metal alkoxide and the β-diketone. Is a manufacturing method.

The present invention is also a photosensitive composition containing a metal alkoxide, β-diketone and acrylic acid or methacrylic acid as main components.

Preferred examples of the metal alkoxide contained in the photosensitive composition of the present invention include titanium, zirconium and aluminum alkoxides. Among them, titanium or zirconium tetraalkoxide and aluminum trialkoxide are more preferably used. Examples of the tetraalkoxide and aluminum trialkoxide include zirconium tetrapropoxide, zirconium tetrabutoxide, titanium tetraisopropoxide, titanium tetrabutoxide, and aluminum tributoxide. Of these, titanium tetrabutoxide is particularly preferably used. The metal alkoxide is preferably 2 to 20 in the photosensitive composition.
It is contained in mol%.

In the present invention, β-diketone which is a chelating agent for metal alkoxide and acrylic acid or methacrylic acid are used together with β-diketone. β-diketone is a component that imparts photosensitivity to the photosensitive composition. Then, by using acrylic acid or methacrylic acid, the photosensitivity of the coating film is improved and the light irradiation time is shortened, and the non-exposed film portion after the light irradiation can be accurately dissolved and removed to obtain a finer pattern. Can be created. It is considered that this is because acrylic acid or methacrylic acid reduces the size of the colloidal particles in the photosensitive composition and in the sol film after coating.

Examples of β-diketones include β-diketones having 5 to 13 carbon atoms such as acetylacetone, benzoylacetone, ethylacetoacetate and dibenzoylmethane. Among these, acetylacetone,
Benzoylacetone is preferably used, and benzoylacetone is particularly preferably used.

The content of acrylic acid (or methacrylic acid) and β-diketone in the photosensitive composition is represented by a molar ratio of (acrylic acid or methacrylic acid) / β-diketone, and 0.33 ≦ ((acrylic Acid or methacrylic acid) / β-
It is preferably in the range of diketone) ≦ 6, more preferably in the range of 1.0 ≦ ((acrylic acid or methacrylic acid) / β-diketone) ≦ 3. When the molar ratio of acrylic acid (or methacrylic acid) to β-diketone is less than 0.33, the photosensitivity of the gel film is not improved as compared with the case where only β-diketone is coordinated. On the other hand, when the molar ratio of acrylic acid (or methacrylic acid) and β-diketone is larger than 6, the film is likely to be cracked. β-diketone is preferably 1.0 to 20 mol% in the photosensitive composition.
Contained. Acrylic acid or methacrylic acid is preferably contained in the photosensitive composition in an amount of 1.0 to 20 mol%.

If the ratio of the content of the β-diketone and the content of acrylic acid or methacrylic acid to the content of the metal alkoxide in the photosensitive composition is too large or too small, the photosensitivity of the photosensitive composition decreases. To do. Therefore, it is preferable that the total amount of β-diketone and acrylic acid or methacrylic acid is 1 to 3 mol per 1 mol of alkoxide. More preferably 1.5-
It is 2.5 mol.

The photosensitive composition of the present invention usually contains an organic solvent. The organic solvent used depends on the method of forming the coating. As the film forming method, for example, a casting method, a dip coating method, a gravure coating method, a flexographic printing method, a roll coating method and the like are preferably used. As the organic solvent used in the casting method or the dip coating method, a solvent having a high evaporation rate is suitable. This means that if the evaporation rate of the solvent is too slow, the coating film dries slowly, and the fluidity of the liquid becomes high, so that a uniform coating film may not be formed. Therefore, alcohol-based solvents having a high evaporation rate, such as methanol, ethanol, isopropyl alcohol, and tert-butoxy alcohol, can be preferably used. On the other hand, as the organic solvent used in the gravure coating method, the flexographic printing method, and the roll coating method, a solvent having a slow evaporation rate is suitable. This is because with a solvent having a high evaporation rate, the solvent may evaporate before sufficient leveling is performed, and the appearance of coating may become dirty.

The evaporation rate of the solvent is 1 times that of butyl acetate.
It is generally evaluated by a relative evaporation rate index of 00. A solvent having a value of 40 or less is classified as a solvent having an extremely slow evaporation rate, and such a solvent is preferable as an organic solvent for the gravure coating method, the flexographic printing method, and the roll coating method. Examples thereof include ethyl cellosolve, butyl cellosolve, cellosolve acetate, diethylene glycol monoethyl ether, hexylene glycol, diethylene glycol, ethylene glycol, tripropylene glycol, diacetone alcohol, and tetrahydrofurfuryl alcohol.

The solvent of the photosensitive composition used in the present invention preferably contains at least one kind of such a solvent. A plurality of the above solvents may be used in combination depending on the coating method and the characteristics of the coating liquid.
The solvent content in the photosensitive composition is preferably 40 to 94 mol%, more preferably 50 to 92 mol%.

Water is necessary for proceeding the hydrolysis / dehydration condensation reaction of the metal alkoxide. Water is preferably added in a stoichiometric ratio or more necessary for hydrolysis. The content of water in the photosensitive composition is preferably 2 to 20 mol% including water contained as an impurity in the solvent. Since the acrylic acid (or methacrylic acid) acts as a catalyst for the hydrolysis of the metal alkoxide, it is not necessary to add a catalyst.

Examples of the base material used in the present invention include lenses, lens arrays, optical parts such as polarizers, and plate-like bodies. In particular, when forming an antireflection film on a lens array such as a spherical surface or an aspherical surface, the material forming the lens is often UV or thermosetting resin having a high expansion coefficient, but generally the antireflection film is formed. Since the difference in the coefficient of thermal expansion between the dielectric film and the resin is large, cracks may occur in the film during heat treatment during the film formation process, or the adhesion between the film and the lens may be poor. Many.
Since the photosensitive composition of the present invention uses a metal alkoxide or β-diketone containing an organic part in the molecule, it can improve the adhesion to an optical element formed of an organic material such as a resin. It is possible to prevent the film from cracking. It is also possible to use a plate-shaped body as a base material, form an antireflection film on the surface thereof, or manufacture an optical element such as a diffraction grating or a waveguide.

In the present invention, the method of light irradiation includes
An exposure technique such as photolithography A laser two-beam interference exposure technique is preferably used. In addition, laser drawing technology and other methods can be applied. By these methods, the coating film of the photosensitive composition is irradiated with light in a pattern.

In the present invention, when light irradiation is carried out by utilizing photolithography, a substrate, preferably a transparent substrate such as an optical component, is coated with a photosensitive composition having a wet thickness of 0.5 μm to 200 μm. Form a film and dry.
A pattern mask or photomask having a pattern of a light transmitting region and a light shielding region of a predetermined shape is arranged on the coating film, and the light intensity at the irradiation position is 1 to 200 mW / cm 2 through the mask. ^The coating film is irradiated with ultraviolet light so as to be ^{2 for 1} to 60 minutes to polymerize the exposed coating film portion corresponding to the light transmitting region of the photomask. This polymerization includes polymerization of acrylic or methacrylic groups of acrylic acid or methacrylic acid in the coating film (by ring opening of C = C double bond) and decomposition of chelate ring of β-diketone, and hydrolysis / dehydration condensation of metal alkoxide. It is carried out by polymerizing the substance and progressing the gelation reaction. The unexposed coating film portion corresponding to the light-shielding region of the photomask is soluble in a solvent such as alcohol because the polymerization and gelation reaction of the acrylic group or methacrylic group has not progressed. Then, by leaching (dissolving and removing) the coating film portion of the non-exposed portion with an alcohol or alkaline aqueous solution, the thickness of the shape corresponding to the light transmitting region pattern of the photomask is 100 nm to
A 10 μm patterned coating is formed. Then 80-3
It is preferable to further cure the pattern coating by heating at 50 ° C. for 5 minutes to 5 hours. This 350 ℃
In the temperature rising process by heating up to, condensation polymerization occurs between the component insolubilized by the above-mentioned polymerization of the acrylic group or methacrylic group and the component formed by breaking the chelate bond between β-diketone and the metal such as titanium. It is considered to be something. At that time, it is considered that the polymer of acrylic acid or methacrylic acid gradually decomposes during the temperature rising process up to 350 ° C. The film thickness is reduced by about 70% compared to before the heat treatment, and the film is densified. Heating even higher temperature 3
By setting the temperature to more than 50 ° C. and 500 ° C., organic substances in the film are decomposed and evaporated to form a completely dense patterned film structure made of metal oxide.

In the case of irradiating light using the two-beam interference exposure of a laser, 0.5 μm to
Apply the photosensitive composition to a wet thickness of 200 μm,
Form a coating and dry. Interference light is irradiated on the coating film by a two-beam interference exposure technique of a laser, and thereafter, the shadow portion (non-exposed portion) of the interference fringes of the film is leached (dissolved and removed) with an alcohol or alkaline aqueous solution to cause the above interference. The height corresponding to the exposed portion of the stripe is 100 nm to 10 μm.
At m, a one-dimensional pattern consisting of a number of parallel linear projections is coated. After irradiating the interference light, the film is further rotated by 90 degrees in the plane to irradiate the light,
Since the film-like exposed areas and the non-exposed areas are formed between the grids, the subsequent leaching allows the formation of a large number of minute recesses corresponding to the unexposed areas in a regular grid pattern. A two-dimensional pattern can be formed. For details of the irradiation method of this interference light, refer to the above-mentioned document (Applied Optic
s.Vol.39, No.4, pp.489-493). At this time, the exposed portions of the vertical lines and the horizontal lines of the lattice are dissolved by the solvent, but the light irradiation intensity is adjusted so that the exposed portions of the lattice are not dissolved by the solvent at the joints of the lattice (portions where the vertical and horizontal lines overlap). By adjusting so as to be small, it is possible to form a two-dimensional pattern in which a large number of minute cylindrical island-shaped convex portions corresponding to the twice-exposed portion are regularly arranged in a grid pattern. The "non-exposed area" in the present invention is defined as including an area that is weakly exposed to the extent that it is dissolved in a solvent as described above. This two-dimensional pattern shape can be formed by changing the rotation angle of the film, and while changing this rotation angle.
By irradiating with light, it is possible to control the formed convex portion or concave portion into an arbitrary shape such as a quadrangle or a hexagon.

As the light beam used for the above-mentioned light irradiation, it is preferable to use a light source that matches the sensitivity of the photosensitive composition. Specific light sources include, for example, mercury lamps, metal halide lamps, xenon lamps, excimer lasers, YAG
Light sources such as lasers (third harmonic and fourth harmonic) and He-Gd lasers are preferably used.

[0023]

BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be specifically described below. [Examples 1 to 4 and Comparative Examples 1 and 2 of titanium tetrabutoxide as the starting material _{(Ti (OC 4 H 9)} 4, referred to as "Ti (Obu) _4"), benzoyl acetone (C ₆ H chemical modifier ₅ COCH ₂ C
OCH ₃ , abbreviated as “BzAcH”) and methacrylic acid (CH ₂ = C (CH ₃ ) C
OOH, abbreviated as “MA”) or acrylic acid (CH ₂ = CHCOOH,
“AA”), methanol as solvent (abbreviated as “MeOH”)
Was used. In a clean room in which the relative humidity was controlled to 20% or less, methacrylic acid or acrylic acid was added little by little to titanium tetrabutoxide to cause a reaction by stirring, and benzoylacetone was further added and stirred for 30 minutes.
Further, methanol or methanol to which water was added was added, and the mixture was stirred until it became uniform to obtain each coating solution. Titanium tetrabutoxide (Ti (Obu) ₄ ), methacrylic acid (MA),
Acrylic acid (AA), benzoylacetone (BzAcH), methanol (MeOH) and water (H ₂ O) were used in the amounts shown in Table 1 (expressed in molar ratio) to prepare 6 types of coating solutions (Examples 1 to 1). Four
And Comparative Examples 1-2) were prepared.

[0024]

[Table 1] ────────────────────────────────── Example number Liquid composition (molar ratio) Ti (OBu) ₄ MA AA BzACH MeOH H ₂ O −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− Example 1 1.0 1.5 0 0.5 20 0.2 Example 2 1.0 1.0 0 1.0 20 1.2 Example 3 1.0 0.5 0 1.5 20 1.2 Example 4 1.0 0 0.5 1.5 20 1.2 Comparative Example 1 1.0 2.0 0 0 20 0.2 Comparative Example 2 1.0 0 0 1.5 20 1.2 ───── ─────────────────────────────

The above photosensitive composition was applied to one surface of a quartz substrate of 2.5 cm × 2.5 cm and 2 mm thickness by dip coating method, and then dried at room temperature for 30 minutes to obtain a photomask (mask size of 2 cm × 2 cm). Width 10μ
m, 2 cm long stripe-shaped ultraviolet light transmitting parts with a space of 1
About 1000 to be 0 μm (center-to-center distance 20 μm)
(Provided in parallel with each other) were placed on top of the coating film and irradiated with a high pressure mercury lamp through a photomask at an intensity of 10 mW / cm ² to form a film having a pattern of exposed and unexposed parts. . The exposed quartz substrate with a coating film is rinsed with ethanol to dissolve and remove the non-exposed area, and then 200 ° C
Was heated for 1 hour to complete the hydrolysis / dehydration polycondensation reaction of titanium tetrabutoxide and methacrylic acid or acrylic acid in the exposed film portion to obtain a patterned film attached on the quartz substrate. As a result of SEM (scanning electron microscope) observation, the obtained patterned film had a thickness as shown in Table 2. The size of each convex portion of the film is 10 μm in width, the height is equal to the film thickness shown in Table 2, and the length is 2 cm.
They were arranged in parallel at intervals of 10 μm (center interval of convex portions 20 μm). The irradiation time (curing time) until curing is shown in Table 2
It was shown to. The irradiation time (curing time) is a value when the film thickness is 1.0 μm. In Examples 1 to 4, the leaching of the ultraviolet ray non-irradiated portion was also performed neatly, and clear pattern resolution was obtained. This quartz substrate with a film functioned as a diffraction grating. Oscillate from He-Ne laser 632.
When observing the diffraction state using a beam of 8 nm,
Both the first-order diffracted light and the second-order diffracted light were clearly observed. As a result of SEM (scanning electron microscope) observation, no unexposed portion residue was observed at the quartz substrate portion between the convex portions of the diffraction grating. On the other hand, in Comparative Example 1, cracks were generated in the film after the heat treatment at 200 ° C. for 1 hour. In Comparative Example 2, the irradiation time until curing (curing time) was 10 minutes, and the irradiation time was longer than the curing times of 1 to 5 minutes in Examples 1 to 4.

After coating the composition used in Example 3 and Comparative Example 2 on a silicon (Si) substrate, 10 mW / c was applied through a mask having a fine pattern for resolution inspection.
UV irradiation was performed using a m ² high-pressure mercury lamp as a light source, and leaching was performed using ethanol as a solvent. Optical microscope photographs of gel films formed from the compositions of Example 3 and Comparative Example 2 after leaching are shown in FIGS. 1 and 2, respectively. In the figure, the black part is the film part which was exposed and polymerized and not dissolved, and the light part is the silicon surface of the substrate. As shown in FIG. 1, in the composition of Example 3, the smallest pattern of 2 μm represented by the three thinnest black lines on the right side of the figure is clearly observed, whereas in FIG. Comparative Example 2 shown in
It was observed that the composition of Example 1 had the same pattern with poor resolution and the image was blurred.

[0027]

[Table 2] ─────────────────────── Example number Film thickness (μm) Curing time −−−−−−−−−−−−−−−−−−−−−− Example 1 0.4 to 0.7 1 minute Example 2 0.5-1.0 2 minutes 40 seconds Example 3 0.8-1.1 5 minutes Example 4 0.8-1.2 5 minutes Comparative example 1 0.1 to 0.2 1 minutes Comparative example 2 0.8 to 1.3 10 minutes ───────────────────────

[Embodiment 5] A radius of curvature of 100 on one surface of a quartz plate of 1.5 cm × 2.5 cm and 0.5 mm thickness.
A microlens array plate was prepared in which 120 convex lenses made of a UV curable resin having a substantially semicircular cross section of μm were regularly arranged. A photosensitive titanium alkoxide film having the same composition as in Example 1 was formed on both surfaces of this microlens array plate by a spin coating method to a film thickness of about 200 nm. He-Gd laser from the surface side opposite to the surface on which the lens array of this microlens array plate is provided.
Using the two-beam interference exposure (325 nm), the films on both surfaces of the microlens array plate were subjected to interference exposure with a period of about 0.5 μm for 3 minutes. Further, the sample was rotated by 90 °, and another two-beam interference exposure was performed for 3 minutes. Then, the coating film in the non-exposed portion (the shaded portion of the interference fringes and the vertical and horizontal lines of the light of the interference fringes) was dissolved and removed with ethanol to perform development, and further heated at 300 ° C. for 20 minutes. As a result, a large number of cylindrical island-shaped projections each having a diameter of 200 nm and a height of about 200 nm are formed in a checkerboard pattern with a 0.5 μm cycle, corresponding to the exposed portion (the portion where the vertical and horizontal lines of the interference fringes overlap). An antireflection film having an arrayed two-dimensional periodic structure was formed on each of both surfaces of the microlens array plate.

The transmittance of the obtained microlens array with antireflection film was measured and the wavelength was 1000 nm to 20 nm.
The average transmittance for light of 00 nm was 97.5% or more. This value was higher than the average transmittance value of 94% of the microlens array plate before coating this antireflection film, and a lens array having excellent antireflection performance and thus excellent transmission performance could be formed. This lens array is 85 ℃ -85
% Even after being left in the environment for 500 hours, the antireflection performance did not deteriorate, and it was confirmed that the antireflection film was firmly attached to the microlens array plate. A film was formed in the same manner except that the interference exposure time of 10 minutes was used instead of the interference exposure time of 3 minutes described above. Thickness about 200nm
In the film, a two-dimensional periodic structure was formed in which cylindrical recesses having a diameter of 200 nm and a depth of about 200 nm were arranged in a grid pattern with a period of 0.5 μm. When the transmittance of this film-attached microlens array was measured in the same manner as above, the average transmittance was 97.8%.

[0030]

As described above, according to the present invention, the sensitivity is higher and the light irradiation time is shorter than that of the conventional photosensitive sol-gel material, and the unexposed area is reached by leaching the unexposed area. It is possible to obtain a fine pattern film with excellent precision in which the boundaries of are clearly defined. Then, an antireflection pattern film-coated article having high properties such as heat resistance, water resistance and chemical resistance and a pattern film-coated article used as an optical element such as a diffraction grating and an optical waveguide can be obtained.

[Brief description of drawings]

FIG. 1 is a plan view (photograph) showing a patterned film according to an embodiment of the present invention.

FIG. 2 is a plan view (photograph) showing a patterned film according to a comparative example of the present invention.

Continued front page    (72) Inventor Mitsuhiro Kawazu             4-7-28 Kitahama, Chuo-ku, Osaka, Japan Plate             Glass Co., Ltd. (72) Inventor Koichiro Nakamura             4-7-28 Kitahama, Chuo-ku, Osaka, Japan Plate             Glass Co., Ltd. (72) Inventor Hiroaki Yamamoto             4-7-28 Kitahama, Chuo-ku, Osaka, Japan Plate             Glass Co., Ltd. F term (reference) 2H025 AB14 AC01 AD01 BC14 BC33                       BD01 CC20 FA03 FA15                 2H049 AA03 AA13 AA33 AA48 AA58                 2K009 AA03 BB11 CC24 CC45 DD02                       DD05 DD12 FF01

Claims (11)

[Claims] 1. A pattern in which a photosensitive composition containing a metal alkoxide and β-diketone is applied to a substrate, and the coated film is irradiated with light to polymerize the exposed part of the coated film and dissolve and remove the unexposed part. The method for producing a film-coated article, wherein the photosensitive composition contains acrylic acid or methacrylic acid in addition to the metal alkoxide and the β-diketone. 2. The photosensitive composition contains acrylic acid or methacrylic acid in an amount of 0.33 to 1 mol of β-diketone.
The method for producing a patterned film-coated article according to claim 1, wherein the patterned film-containing article is contained at a ratio of 6 mol. 3. The method for producing a patterned film-coated article according to claim 1, wherein the photosensitive composition contains acrylic acid or methacrylic acid in a ratio of 1 to 3 mol with respect to 1 mol of β-diketone. 4. The photosensitive composition contains the β-diketone and acrylic acid or methacrylic acid in a total ratio of 1 to 3 mol with respect to 1 mol of metal alkoxide. The method for producing a patterned film-coated article according to item 1. 5. The method for producing a patterned film-coated article according to claim 1, wherein the metal alkoxide is a titanium alkoxide and the β-diketone is benzoylacetone. 6. A photosensitive composition containing a metal alkoxide, β-diketone and acrylic acid or methacrylic acid as main components. 7. The photosensitive composition according to claim 6, wherein the metal alkoxide is an alkoxide of titanium, zirconium, or aluminum. 8. The photosensitive composition according to claim 6, wherein the metal alkoxide comprises a tetraalkoxide or trialkoxide of titanium or zirconium, or a trialkoxide of aluminum. 9. The photosensitive composition according to claim 6, wherein the metal alkoxide is titanium tetraisopropoxide or titanium tetrabutoxide. 10. The photosensitive composition according to claim 6, wherein the β-diketone is benzoylacetone or acetylacetone. 11. The photosensitive composition is, in mol%, 2 to 20% of metal alkoxide, 1.0 to 20% of β-diketone, 1.0 to 20% of acrylic acid or methacrylic acid, and 40 to 40% of solvent. 94% and water 2 to 20%, provided that the molar ratio of [acrylic acid or methacrylic acid] / [β-diketone] is 0.33 to 6 and [β-diketone + acrylic acid (Or methacrylic acid)] / [metal alkoxide] molar ratio is 1-3, The photosensitive composition of any one of Claims 6-10.