JP2002543463A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2002543463A5 JP2002543463A5 JP2000615380A JP2000615380A JP2002543463A5 JP 2002543463 A5 JP2002543463 A5 JP 2002543463A5 JP 2000615380 A JP2000615380 A JP 2000615380A JP 2000615380 A JP2000615380 A JP 2000615380A JP 2002543463 A5 JP2002543463 A5 JP 2002543463A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/304,437 US6516085B1 (en) | 1999-05-03 | 1999-05-03 | Apparatus and methods for collecting global data during a reticle inspection |
| US09/304,437 | 1999-05-03 | ||
| PCT/US2000/011768 WO2000066549A2 (en) | 1999-05-03 | 2000-04-28 | Apparatus and methods for collecting global data during a reticle inspection |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002543463A JP2002543463A (ja) | 2002-12-17 |
| JP2002543463A5 true JP2002543463A5 (US06573293-20030603-C00198.png) | 2007-06-21 |
| JP4588222B2 JP4588222B2 (ja) | 2010-11-24 |
Family
ID=23176510
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000615380A Expired - Fee Related JP4588222B2 (ja) | 1999-05-03 | 2000-04-28 | レチクル検査中にグローバルデータを収集するための装置および方法 |
Country Status (4)
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6516085B1 (en) * | 1999-05-03 | 2003-02-04 | Kla-Tencor | Apparatus and methods for collecting global data during a reticle inspection |
| JP2002132986A (ja) * | 2000-10-18 | 2002-05-10 | Canon Inc | 情報提供方法及び情報提供システム |
| US6617087B1 (en) * | 2001-06-27 | 2003-09-09 | Advanced Micro Devices, Inc. | Use of scatterometry to measure pattern accuracy |
| US6882745B2 (en) * | 2002-12-19 | 2005-04-19 | Freescale Semiconductor, Inc. | Method and apparatus for translating detected wafer defect coordinates to reticle coordinates using CAD data |
| US7271891B1 (en) | 2003-08-29 | 2007-09-18 | Kla-Tencor Technologies Corporation | Apparatus and methods for providing selective defect sensitivity |
| US7450748B2 (en) * | 2003-12-02 | 2008-11-11 | International Business Machines Corporation | Mask inspection process accounting for mask writer proximity correction |
| US7303842B2 (en) * | 2005-04-13 | 2007-12-04 | Kla-Tencor Technologies Corporation | Systems and methods for modifying a reticle's optical properties |
| US7297453B2 (en) * | 2005-04-13 | 2007-11-20 | Kla-Tencor Technologies Corporation | Systems and methods for mitigating variances on a patterned wafer using a prediction model |
| US7300729B2 (en) * | 2005-04-13 | 2007-11-27 | Kla-Tencor Technologies Corporation | Method for monitoring a reticle |
| US7300725B2 (en) * | 2005-04-13 | 2007-11-27 | Kla-Tencor Technologies Corporation | Method for determining and correcting reticle variations |
| US7617477B2 (en) * | 2005-09-09 | 2009-11-10 | Brion Technologies, Inc. | Method for selecting and optimizing exposure tool using an individual mask error model |
| US8321422B1 (en) | 2009-04-23 | 2012-11-27 | Google Inc. | Fast covariance matrix generation |
| US8611695B1 (en) | 2009-04-27 | 2013-12-17 | Google Inc. | Large scale patch search |
| US8396325B1 (en) | 2009-04-27 | 2013-03-12 | Google Inc. | Image enhancement through discrete patch optimization |
| US8391634B1 (en) * | 2009-04-28 | 2013-03-05 | Google Inc. | Illumination estimation for images |
| US8385662B1 (en) | 2009-04-30 | 2013-02-26 | Google Inc. | Principal component analysis based seed generation for clustering analysis |
| US8735030B2 (en) | 2010-04-15 | 2014-05-27 | Carl Zeiss Smt Gmbh | Method and apparatus for modifying a substrate surface of a photolithographic mask |
| US8798393B2 (en) | 2010-12-01 | 2014-08-05 | Google Inc. | Removing illumination variation from images |
| FR2974414B1 (fr) * | 2011-04-22 | 2013-04-12 | Saint Gobain | Procede d'analyse de la qualite d'un vitrage |
| US9208552B2 (en) | 2011-04-26 | 2015-12-08 | Kla-Tencor Corporation | Method and system for hybrid reticle inspection |
| US10401305B2 (en) | 2012-02-15 | 2019-09-03 | Kla-Tencor Corporation | Time-varying intensity map generation for reticles |
| US8938119B1 (en) | 2012-05-01 | 2015-01-20 | Google Inc. | Facade illumination removal |
| US9448343B2 (en) | 2013-03-15 | 2016-09-20 | Kla-Tencor Corporation | Segmented mirror apparatus for imaging and method of using the same |
| US9518935B2 (en) * | 2013-07-29 | 2016-12-13 | Kla-Tencor Corporation | Monitoring changes in photomask defectivity |
| US9875534B2 (en) | 2015-09-04 | 2018-01-23 | Kla-Tencor Corporation | Techniques and systems for model-based critical dimension measurements |
| US10451563B2 (en) | 2017-02-21 | 2019-10-22 | Kla-Tencor Corporation | Inspection of photomasks by comparing two photomasks |
| US11416982B2 (en) * | 2019-10-01 | 2022-08-16 | KLA Corp. | Controlling a process for inspection of a specimen |
Family Cites Families (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2129547B (en) * | 1982-11-02 | 1986-05-21 | Cambridge Instr Ltd | Reticle inspection |
| US4717644A (en) | 1982-12-20 | 1988-01-05 | International Business Machines Corporation | Hybrid electron beam and optical lithography method |
| JPS59157505A (ja) * | 1983-02-28 | 1984-09-06 | Hitachi Ltd | パタ−ン検査装置 |
| JPS6057929A (ja) * | 1983-09-09 | 1985-04-03 | Hitachi Ltd | パターン欠陥検出装置 |
| US4805123B1 (en) * | 1986-07-14 | 1998-10-13 | Kla Instr Corp | Automatic photomask and reticle inspection method and apparatus including improved defect detector and alignment sub-systems |
| US5267175A (en) | 1986-09-12 | 1993-11-30 | Digital Equipment Corporation | Data base access mechanism for rules utilized by a synthesis procedure for logic circuit design |
| US5150308A (en) | 1986-09-12 | 1992-09-22 | Digital Equipment Corporation | Parameter and rule creation and modification mechanism for use by a procedure for synthesis of logic circuit designs |
| US5097422A (en) | 1986-10-10 | 1992-03-17 | Cascade Design Automation Corporation | Method and apparatus for designing integrated circuits |
| US4989255A (en) | 1988-03-25 | 1991-01-29 | Texas Instruments Incorporated | Expansion of compact database for pattern inspector or writer |
| JPH02170279A (ja) * | 1988-12-23 | 1990-07-02 | Hitachi Ltd | 被検査対象パターンの欠陥検出方法及びその装置 |
| US5287290A (en) | 1989-03-10 | 1994-02-15 | Fujitsu Limited | Method and apparatus for checking a mask pattern |
| US5113451A (en) | 1989-10-16 | 1992-05-12 | Vlsi Technology, Inc. | Method for labelling polygons |
| JPH03278057A (ja) * | 1990-02-14 | 1991-12-09 | Toshiba Corp | パターン検査装置 |
| US5230075A (en) | 1990-06-04 | 1993-07-20 | General Electric Company | Database shadowing system with data tags that select an operation of the save command |
| JP3329805B2 (ja) * | 1990-08-29 | 2002-09-30 | 株式会社日立製作所 | 自動外観検査装置及び外観検査方法 |
| IL125216A (en) | 1990-12-04 | 2001-07-24 | Orbot Instr Ltd | Apparatus and method for microscopic inspection of articles |
| US5563702A (en) * | 1991-08-22 | 1996-10-08 | Kla Instruments Corporation | Automated photomask inspection apparatus and method |
| US5416722A (en) | 1992-11-19 | 1995-05-16 | Vlsi Technology, Inc. | System and method for compacting integrated circuit layouts |
| US5483461A (en) | 1993-06-10 | 1996-01-09 | Arcsys, Inc. | Routing algorithm method for standard-cell and gate-array integrated circuit design |
| JP3069215B2 (ja) * | 1993-06-30 | 2000-07-24 | ホーヤ株式会社 | フォトマスクパターンの評価方法及びその装置並びにパターン転写方法 |
| JPH0765040A (ja) | 1993-08-24 | 1995-03-10 | Matsushita Electric Ind Co Ltd | 機能データインターフェース方法および機能データインターフェース装置 |
| JPH07147309A (ja) * | 1993-11-25 | 1995-06-06 | Nikon Corp | 欠陥検査装置 |
| US5625568A (en) | 1993-12-22 | 1997-04-29 | Vlsi Technology, Inc. | Method and apparatus for compacting integrated circuits with standard cell architectures |
| JPH07249748A (ja) | 1994-03-14 | 1995-09-26 | Fujitsu Ltd | マスタースライス型ｌｓｉの設計装置 |
| JPH08137093A (ja) * | 1994-09-16 | 1996-05-31 | Toshiba Corp | 欠陥検査装置 |
| US5814829A (en) * | 1995-07-11 | 1998-09-29 | Qc Optics, Inc. | Multistation surface inspection system |
| US6292582B1 (en) | 1996-05-31 | 2001-09-18 | Lin Youling | Method and system for identifying defects in a semiconductor |
| JP3660763B2 (ja) * | 1996-06-26 | 2005-06-15 | 株式会社日立製作所 | 被検査パターンの検査方法及び製造プロセス診断方法並びに半導体基板の製造方法 |
| JP4001653B2 (ja) * | 1996-08-29 | 2007-10-31 | ケーエルエー・インストルメンツ・コーポレーション | 試料からの多重チャネル応答を用いた試料の光学的検査 |
| US5804340A (en) | 1996-12-23 | 1998-09-08 | Lsi Logic Corporation | Photomask inspection method and inspection tape therefor |
| JPH10213422A (ja) * | 1997-01-29 | 1998-08-11 | Hitachi Ltd | パタ−ン検査装置 |
| JPH10242038A (ja) | 1997-02-28 | 1998-09-11 | Toshiba Corp | パターン形成方法とリソグラフィシステム |
| JP3484042B2 (ja) | 1997-05-21 | 2004-01-06 | 株式会社日立製作所 | パターン検査方法およびその装置 |
| US6009251A (en) | 1997-09-30 | 1999-12-28 | Synopsys, Inc. | Method and system for layout verification of an integrated circuit design with reusable subdesigns |
| US6097884A (en) | 1997-12-08 | 2000-08-01 | Lsi Logic Corporation | Probe points and markers for critical paths and integrated circuits |
| JP4002655B2 (ja) * | 1998-01-06 | 2007-11-07 | 株式会社日立製作所 | パターン検査方法およびその装置 |
| US6282309B1 (en) | 1998-05-29 | 2001-08-28 | Kla-Tencor Corporation | Enhanced sensitivity automated photomask inspection system |
| US6529621B1 (en) * | 1998-12-17 | 2003-03-04 | Kla-Tencor | Mechanisms for making and inspecting reticles |
| US6516085B1 (en) * | 1999-05-03 | 2003-02-04 | Kla-Tencor | Apparatus and methods for collecting global data during a reticle inspection |
-
1999
- 1999-05-03 US US09/304,437 patent/US6516085B1/en not_active Expired - Lifetime
-
2000
- 2000-04-28 EP EP00928680.8A patent/EP1178961B1/en not_active Expired - Lifetime
- 2000-04-28 JP JP2000615380A patent/JP4588222B2/ja not_active Expired - Fee Related
- 2000-04-28 WO PCT/US2000/011768 patent/WO2000066549A2/en active Application Filing
-
2002
- 2002-12-04 US US10/314,030 patent/US6654489B2/en not_active Expired - Lifetime
