|
EP1102305B1
(en)
*
|
1999-11-17 |
2003-05-07 |
European Community (EC) |
Plasma processing apparatus with an electrically conductive wall
|
|
US7047023B1
(en)
*
|
2000-12-01 |
2006-05-16 |
Sirf Technology, Inc. |
GPS RF front end IC with frequency plan for improved integrability
|
|
US6664740B2
(en)
*
|
2001-02-01 |
2003-12-16 |
The Regents Of The University Of California |
Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma
|
|
US6611106B2
(en)
*
|
2001-03-19 |
2003-08-26 |
The Regents Of The University Of California |
Controlled fusion in a field reversed configuration and direct energy conversion
|
|
JP2007251223A
(ja)
*
|
2001-06-01 |
2007-09-27 |
Tokyo Electron Ltd |
プラズマ処理装置
|
|
US6946054B2
(en)
|
2002-02-22 |
2005-09-20 |
Tokyo Electron Limited |
Modified transfer function deposition baffles and high density plasma ignition therewith in semiconductor processing
|
|
US8031824B2
(en)
|
2005-03-07 |
2011-10-04 |
Regents Of The University Of California |
Inductive plasma source for plasma electric generation system
|
|
US9123512B2
(en)
*
|
2005-03-07 |
2015-09-01 |
The Regents Of The Unviersity Of California |
RF current drive for plasma electric generation system
|
|
US9607719B2
(en)
*
|
2005-03-07 |
2017-03-28 |
The Regents Of The University Of California |
Vacuum chamber for plasma electric generation system
|
|
NZ560659A
(en)
*
|
2005-03-07 |
2011-11-25 |
Univ California |
Plasma electric generation system for driving plasma ions and electrons in a field reversed configuration
|
|
US7713430B2
(en)
*
|
2006-02-23 |
2010-05-11 |
Micron Technology, Inc. |
Using positive DC offset of bias RF to neutralize charge build-up of etch features
|
|
US7605008B2
(en)
*
|
2007-04-02 |
2009-10-20 |
Applied Materials, Inc. |
Plasma ignition and complete faraday shielding of capacitive coupling for an inductively-coupled plasma
|
|
SI23611A
(sl)
|
2011-01-20 |
2012-07-31 |
Institut@@quot@JoĹľef@Stefan@quot |
Metoda in naprava za vzbujanje visokofrekvenčne plinske plazme
|
|
EP2671430B1
(en)
|
2011-02-03 |
2018-05-16 |
Tekna Plasma Systems Inc. |
High performance induction plasma torch
|
|
US9966236B2
(en)
|
2011-06-15 |
2018-05-08 |
Lam Research Corporation |
Powered grid for plasma chamber
|
|
CA2855698C
(en)
|
2011-11-14 |
2020-03-10 |
The Regents Of The University Of California |
Systems and methods for forming and maintaining a high performance frc
|
|
ES2658084T3
(es)
|
2013-09-24 |
2018-03-08 |
Tae Technologies, Inc. |
Método para formar y mantener una FRC de alto rendimiento
|
|
MX387752B
(es)
|
2014-10-13 |
2025-03-18 |
Tri Alpha Energy Inc |
Sistemas y métodos para fusionar y comprimir toroides compactos.
|
|
CN111511087B
(zh)
|
2014-10-30 |
2023-08-11 |
阿尔法能源技术公司 |
用于形成和保持高性能frc的系统和方法
|
|
UA124492C2
(uk)
|
2015-05-12 |
2021-09-29 |
Тае Текнолоджиз, Інк. |
Системи і способи для зменшення небажаних вихрових струмів
|
|
SG10202008060UA
(en)
|
2015-11-13 |
2020-10-29 |
Tae Technologies Inc |
Systems and methods for frc plasma position stability
|
|
IL266075B2
(en)
|
2016-10-28 |
2024-06-01 |
Tae Tech Inc |
Systems and methods for improved sustainment of a high performance frc elevated energies utilizing neutral beam injectors with tunable beam energies
|
|
EP3535763B1
(en)
|
2016-11-04 |
2023-08-16 |
TAE Technologies, Inc. |
Arrangement of first and second capture vacuum pumps and system for generating and maintaining a field reversed plasma configuration
|
|
JP7266880B2
(ja)
|
2016-11-15 |
2023-05-01 |
ティーエーイー テクノロジーズ， インコーポレイテッド |
高性能ｆｒｃの改良された持続性および高性能ｆｒｃにおける高調高速波電子加熱のためのシステムおよび方法
|
|
TWI887254B
(zh)
*
|
2019-07-17 |
2025-06-21 |
美商得昇科技股份有限公司 |
利用可調式電漿電位的可變模式電漿室
|
|
AU2021209064A1
(en)
|
2020-01-13 |
2022-08-04 |
Tae Technologies, Inc. |
System and methods for forming and maintaining high energy and temperature FRC plasma via spheromak merging and neutral beam injection
|