JP2002502465A5 - - Google Patents
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- Publication number
- JP2002502465A5 JP2002502465A5 JP1999502644A JP50264499A JP2002502465A5 JP 2002502465 A5 JP2002502465 A5 JP 2002502465A5 JP 1999502644 A JP1999502644 A JP 1999502644A JP 50264499 A JP50264499 A JP 50264499A JP 2002502465 A5 JP2002502465 A5 JP 2002502465A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Description
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US86734097A | 1997-06-02 | 1997-06-02 | |
| US08/867,340 | 1997-06-02 | ||
| PCT/US1998/011090 WO1998055668A1 (en) | 1997-06-02 | 1998-06-01 | Method and apparatus for vapor generation and film deposition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002502465A JP2002502465A (en) | 2002-01-22 |
| JP2002502465A5 true JP2002502465A5 (en) | 2005-12-22 |
Family
ID=25349592
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50264499A Ceased JP2002502465A (en) | 1997-06-02 | 1998-06-01 | Method and apparatus for steam generation and film deposition |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2002502465A (en) |
| DE (1) | DE19882473T1 (en) |
| WO (1) | WO1998055668A1 (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6012647A (en) * | 1997-12-01 | 2000-01-11 | 3M Innovative Properties Company | Apparatus and method of atomizing and vaporizing |
| US6045864A (en) | 1997-12-01 | 2000-04-04 | 3M Innovative Properties Company | Vapor coating method |
| JP2006299335A (en) * | 2005-04-19 | 2006-11-02 | Fujimori Gijutsu Kenkyusho:Kk | Film deposition method, film deposition apparatus used for the same, and vaporization device |
| FR2900070B1 (en) | 2006-04-19 | 2008-07-11 | Kemstream Soc Par Actions Simp | DEVICE FOR INTRODUCING OR INJECTING OR SPRAYING A MIXTURE OF VECTOR GAS AND LIQUID COMPOUNDS AND METHOD FOR CARRYING OUT SAID DEVICE. |
| TW200912031A (en) * | 2007-09-04 | 2009-03-16 | Tera Semicon Corp | Apparatus for supplying source gas |
| KR101387634B1 (en) * | 2010-02-05 | 2014-04-22 | 엠 에스피 코포레이션 | Fine droplet atomizer for liquid precursor vaporization |
| DE102012203212A1 (en) * | 2012-03-01 | 2013-09-05 | Osram Opto Semiconductors Gmbh | Coating system useful for producing layer on substrate using growth process, preferably for performing atomic layer deposition, comprises supply container, in which liquid starting material for layer is provided, and evaporator unit |
| JP6078335B2 (en) * | 2012-12-27 | 2017-02-08 | 株式会社日立国際電気 | Substrate processing apparatus, semiconductor device manufacturing method, vaporization system, vaporizer, and program |
| DE102016225257A1 (en) | 2016-12-16 | 2018-06-21 | Robert Bosch Gmbh | Apparatus and method for vaporizing a starting material |
| CN110965026A (en) * | 2018-09-30 | 2020-04-07 | 深圳市引擎门科技有限公司 | Steam continuous supply system and method |
| SE543029C2 (en) * | 2018-11-16 | 2020-09-29 | Stora Enso Oyj | Method for hydrophobizing a cellulose substrate by utilizing a fatty acid halide |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0058571A1 (en) * | 1981-02-18 | 1982-08-25 | National Research Development Corporation | Method and apparatus for delivering a controlled flow rate of reactant to a vapour deposition process |
| US4970093A (en) * | 1990-04-12 | 1990-11-13 | University Of Colorado Foundation | Chemical deposition methods using supercritical fluid solutions |
| EP0548990B1 (en) * | 1991-12-26 | 1997-03-12 | Canon Kabushiki Kaisha | Chemical vapor deposition method for forming a deposited film with the use of a liquid raw material and apparatus suitable for practising said method |
| JP3222518B2 (en) * | 1991-12-26 | 2001-10-29 | キヤノン株式会社 | Liquid source vaporizer and thin film forming device |
| FR2707671B1 (en) * | 1993-07-12 | 1995-09-15 | Centre Nat Rech Scient | Method and device for introducing precursors into a chemical vapor deposition chamber. |
-
1998
- 1998-06-01 WO PCT/US1998/011090 patent/WO1998055668A1/en active Application Filing
- 1998-06-01 JP JP50264499A patent/JP2002502465A/en not_active Ceased
- 1998-06-01 DE DE19882473T patent/DE19882473T1/en not_active Ceased