DE19882473T1 - Process and device for generating steam and applying layers - Google Patents

Process and device for generating steam and applying layers

Info

Publication number
DE19882473T1
DE19882473T1 DE19882473T DE19882473T DE19882473T1 DE 19882473 T1 DE19882473 T1 DE 19882473T1 DE 19882473 T DE19882473 T DE 19882473T DE 19882473 T DE19882473 T DE 19882473T DE 19882473 T1 DE19882473 T1 DE 19882473T1
Authority
DE
Germany
Prior art keywords
generating steam
applying layers
layers
applying
steam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE19882473T
Other languages
German (de)
Inventor
James J Sun
Benjamin Y H Liu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MSP Corp
Original Assignee
MSP Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MSP Corp filed Critical MSP Corp
Publication of DE19882473T1 publication Critical patent/DE19882473T1/en
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
DE19882473T 1997-06-02 1998-06-01 Process and device for generating steam and applying layers Ceased DE19882473T1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US86734097A 1997-06-02 1997-06-02
PCT/US1998/011090 WO1998055668A1 (en) 1997-06-02 1998-06-01 Method and apparatus for vapor generation and film deposition

Publications (1)

Publication Number Publication Date
DE19882473T1 true DE19882473T1 (en) 2002-01-31

Family

ID=25349592

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19882473T Ceased DE19882473T1 (en) 1997-06-02 1998-06-01 Process and device for generating steam and applying layers

Country Status (3)

Country Link
JP (1) JP2002502465A (en)
DE (1) DE19882473T1 (en)
WO (1) WO1998055668A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012203212A1 (en) * 2012-03-01 2013-09-05 Osram Opto Semiconductors Gmbh Coating system useful for producing layer on substrate using growth process, preferably for performing atomic layer deposition, comprises supply container, in which liquid starting material for layer is provided, and evaporator unit
DE102016225257A1 (en) 2016-12-16 2018-06-21 Robert Bosch Gmbh Apparatus and method for vaporizing a starting material

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6045864A (en) * 1997-12-01 2000-04-04 3M Innovative Properties Company Vapor coating method
US6012647A (en) * 1997-12-01 2000-01-11 3M Innovative Properties Company Apparatus and method of atomizing and vaporizing
JP2006299335A (en) * 2005-04-19 2006-11-02 Fujimori Gijutsu Kenkyusho:Kk Film deposition method, film deposition apparatus used for the same, and vaporization device
FR2900070B1 (en) * 2006-04-19 2008-07-11 Kemstream Soc Par Actions Simp DEVICE FOR INTRODUCING OR INJECTING OR SPRAYING A MIXTURE OF VECTOR GAS AND LIQUID COMPOUNDS AND METHOD FOR CARRYING OUT SAID DEVICE.
TW200912031A (en) * 2007-09-04 2009-03-16 Tera Semicon Corp Apparatus for supplying source gas
US8511583B2 (en) * 2010-02-05 2013-08-20 Msp Corporation Fine droplet atomizer for liquid precursor vaporization
JP6078335B2 (en) * 2012-12-27 2017-02-08 株式会社日立国際電気 Substrate processing apparatus, semiconductor device manufacturing method, vaporization system, vaporizer, and program
CN110965026A (en) * 2018-09-30 2020-04-07 深圳市引擎门科技有限公司 Steam continuous supply system and method
SE543029C2 (en) * 2018-11-16 2020-09-29 Stora Enso Oyj Method for hydrophobizing a cellulose substrate by utilizing a fatty acid halide

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2092908A (en) * 1981-02-18 1982-08-25 Nat Res Dev Method and apparatus for delivering a controlled flow rate of reactant to a vapour deposition process
US4970093A (en) * 1990-04-12 1990-11-13 University Of Colorado Foundation Chemical deposition methods using supercritical fluid solutions
JP3222518B2 (en) * 1991-12-26 2001-10-29 キヤノン株式会社 Liquid source vaporizer and thin film forming device
DE69218152T2 (en) * 1991-12-26 1997-08-28 Canon Kk Manufacturing process of a deposited layer by means of CVD, using liquid raw material and suitable device
FR2707671B1 (en) * 1993-07-12 1995-09-15 Centre Nat Rech Scient Method and device for introducing precursors into a chemical vapor deposition chamber.

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012203212A1 (en) * 2012-03-01 2013-09-05 Osram Opto Semiconductors Gmbh Coating system useful for producing layer on substrate using growth process, preferably for performing atomic layer deposition, comprises supply container, in which liquid starting material for layer is provided, and evaporator unit
DE102016225257A1 (en) 2016-12-16 2018-06-21 Robert Bosch Gmbh Apparatus and method for vaporizing a starting material

Also Published As

Publication number Publication date
WO1998055668A1 (en) 1998-12-10
JP2002502465A (en) 2002-01-22

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8131 Rejection