JP2002361558A - Method of shot-peening for coiled spring - Google Patents

Method of shot-peening for coiled spring

Info

Publication number
JP2002361558A
JP2002361558A JP2001171671A JP2001171671A JP2002361558A JP 2002361558 A JP2002361558 A JP 2002361558A JP 2001171671 A JP2001171671 A JP 2001171671A JP 2001171671 A JP2001171671 A JP 2001171671A JP 2002361558 A JP2002361558 A JP 2002361558A
Authority
JP
Japan
Prior art keywords
shot
coil spring
shot peening
degrees
spring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001171671A
Other languages
Japanese (ja)
Inventor
Norimitsu Amano
礼光 天野
Takayuki Sakakibara
隆之 榊原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chuo Hatsujo KK
Chuo Spring Co Ltd
Original Assignee
Chuo Hatsujo KK
Chuo Spring Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chuo Hatsujo KK, Chuo Spring Co Ltd filed Critical Chuo Hatsujo KK
Priority to JP2001171671A priority Critical patent/JP2002361558A/en
Publication of JP2002361558A publication Critical patent/JP2002361558A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a shot peening method capable of uniformly adding a compressive residual stress by shot peening to the inside and outside of a coiled spring. SOLUTION: In this shot peening method, shot particles 2 are projected from nozzles 1 and 1 while the coiled spring 3 is rotated around a spring center shaft 31. A projection angle γ for projecting the shot particles 2 from the nozzle 1 is set at a position deflected by 30 deg. or more, 37 deg. or below, and -30 deg. or more, and -37 deg. or below from a surface F orthogonal to the spring center axis 31.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、コイルばねの全
表面に均一に圧縮残留応力を付加するためのショットピ
ーニング方法に関する。
The present invention relates to a shot peening method for uniformly applying a compressive residual stress to the entire surface of a coil spring.

【0002】[0002]

【従来の技術】コイルばねの疲労強度を向上させるため
に、ショットピーニングによる圧縮残留応力の付加が実
施されている。このショットピーニングにおいては、コ
イルばねの全表面に均一にショット粒を当て、全表面に
均一にショット粒の衝突エネルギーを付加させ、均一な
圧縮残留応力層を形成することが耐久性の向上に重要で
ある。
2. Description of the Related Art In order to improve the fatigue strength of a coil spring, a compressive residual stress is applied by shot peening. In this shot peening, it is important to improve the durability by uniformly applying shot particles to the entire surface of the coil spring and applying the impact energy of the shot particles uniformly to the entire surface to form a uniform compressive residual stress layer. It is.

【0003】従来のショットピーニングは、図2に示す
如く、コイルばね3を中心軸周りに回転させると同時に
中心軸方向に移動させながら、中心軸と直交する方向か
らノズルでショット粒2を投射することが行われてい
る。この方法では、ショット粒はコイルばね3の外側に
多く衝突し内側に少なく衝突する。このため、外側の圧
縮残留応力層に比較して内側の圧縮残留応力層が薄くな
る。また、コイルばね3の搬送にはローラーやコンベア
が使用されるため、中心軸方向の移動によりコイルばね
3の側面にローラーなどとの摺動により微細な摩擦傷が
でき易い。これらの結果、従来のショットピーニング方
法では、コイルばね3の耐久性が不十分であった。
In conventional shot peening, as shown in FIG. 2, a shot grain 2 is projected by a nozzle from a direction perpendicular to the central axis while rotating the coil spring 3 about the central axis and moving the coil spring 3 in the central axis direction at the same time. That is being done. In this method, the shot particles collide with the outside of the coil spring 3 in a large amount and collide with the inside in a small amount. Therefore, the inner compressive residual stress layer becomes thinner than the outer compressive residual stress layer. In addition, since a roller or a conveyor is used to transport the coil spring 3, fine frictional scratches are likely to occur due to sliding with the roller or the like on the side surface of the coil spring 3 due to movement in the center axis direction. As a result, in the conventional shot peening method, the durability of the coil spring 3 was insufficient.

【0004】[0004]

【発明が解決しようとする課題】特開平7−13693
3号公報では、螺旋(ピッチ)角度αのコイルばねの中
心軸に対して傾斜(投射)角度β(α<β)を有する方
向からショット粒を投射するショットピーニング方法が
提案されている。しかるにこのショットピーニング方法
では、コイルばねを鼓形回転させる必要があり、ワーク
移動装置の複雑化を招く問題がある。
Problems to be Solved by the Invention
No. 3 proposes a shot peening method in which shot grains are projected from a direction having an inclination (projection) angle β (α <β) with respect to the center axis of a coil spring having a spiral (pitch) angle α. However, in this shot peening method, it is necessary to rotate the coil spring in a drum shape, which causes a problem that the work moving device becomes complicated.

【0005】この発明の目的は、コイルばねの内側と外
側とに均一にショットピーニングによる圧縮残留応力の
付加が可能なショットピーニング方法の提供にある。請
求項2に記載の発明の目的は、コイルばねの内側と外側
との衝突エネルギーの差を低減できるとともに、コイル
ばねの側面に搬送装置のローラーとの摺動による摩擦傷
が防止できるショットピーニング方法の提供にある。請
求項3に記載の発明の目的は、請求項1または2に記載
のショットピーニング方法において、効率が向上でき、
生産性に優れたショットピーニング方法の提供にある。
An object of the present invention is to provide a shot peening method capable of uniformly applying a compressive residual stress by shot peening to the inside and outside of a coil spring. A second object of the present invention is to provide a shot peening method capable of reducing a difference in collision energy between the inside and the outside of a coil spring, and preventing frictional flaws caused by sliding of a side of the coil spring with a roller of a conveying device. In the offer. The object of the invention described in claim 3 is that in the shot peening method according to claim 1 or 2, the efficiency can be improved,
An object of the present invention is to provide a shot peening method having excellent productivity.

【0006】[0006]

【課題を解決するための手段】この発明は、コイルばね
をばね中心軸周りに回転させながら、ノズルからショッ
ト粒を投射させるショットピーニング方法において、前
記ノズルからショット粒を投射させる投射角度γを、前
記ばね中心軸と直交する直交面から30度以上、37度
以下偏向した位置に設定したことを特徴とする。
According to the present invention, in a shot peening method for projecting shot grains from a nozzle while rotating a coil spring around a spring center axis, a projection angle γ for projecting shot grains from the nozzle is defined as: It is characterized by being set at a position deflected by 30 degrees or more and 37 degrees or less from an orthogonal plane orthogonal to the spring center axis.

【0007】[0007]

【発明の作用、効果】この発明では、ノズルのばね中心
軸に対する投射角度γが30度以上、37度以下に設定
してある。このためコイルばねの内側と外側とに均一に
ショットピーニングによる圧縮残留応力の付加が可能と
なる。
According to the present invention, the projection angle γ of the nozzle with respect to the spring center axis is set to 30 degrees or more and 37 degrees or less. Therefore, it is possible to uniformly apply a compressive residual stress by shot peening to the inside and outside of the coil spring.

【0008】請求項2に記載の構成では、コイルばねを
ばね中心軸に対して直交方向に搬送させながら中心軸周
りに転動させる。この結果、コイルばねの側面にローラ
ー、コンベアなど搬送装置との摺動による摩擦傷が防止
できるとともに、内側と外側との衝突エネルギーが均一
化できる。
According to the second aspect of the present invention, the coil spring is rolled around the central axis while being transported in a direction perpendicular to the spring central axis. As a result, it is possible to prevent frictional damage due to sliding with a transfer device such as a roller or a conveyor on the side surface of the coil spring, and to make uniform the collision energy between the inside and the outside.

【0009】請求項3に記載の構成では、ノズルは複数
であり前記ばね中心軸に対する投射角度γが30度以
上、37度以下、およびマイナス30度以上、マイナス
37度以下としている。この構成では、ショットピーニ
ング加工の効率が向上でき、生産性が向上する。
According to the third aspect of the present invention, a plurality of nozzles are provided, and the projection angle γ with respect to the center axis of the spring is 30 degrees or more and 37 degrees or less, and -30 degrees or more and minus 37 degrees or less. With this configuration, the efficiency of shot peening can be improved, and the productivity is improved.

【0010】[0010]

【発明の実施の形態】図1の(イ)および(ロ)はこの
発明のショットピーニング方法の概略図であり、一対の
ノズル1、1からショット粒2、2を投射してコイルば
ね3にショットピーニングを行う。コイルばね3は、搬
送装置4により1個づつショット粒2、2の投射域20
に搬送される。搬送装置4は、コンベア41と、コンベ
ア41に列設した細い横棒からなるキャリア42と、投
射域20内に設けた摩擦板43とを備える。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIGS. 1A and 1B are schematic views of a shot peening method according to the present invention, in which shot grains 2, 2 are projected from a pair of nozzles 1, 1 to a coil spring 3. FIG. Perform shot peening. The coil spring 3 is transferred to the projection area 20 of the shot grains 2 and 2 one by one by the transport device 4.
Transported to The transport device 4 includes a conveyor 41, a carrier 42 formed of thin horizontal bars arranged in a row on the conveyor 41, and a friction plate 43 provided in the projection area 20.

【0011】コイルばね3は、搬送装置4のキャリア4
2に遊嵌され、投射域20内において摩擦板43の上を
ばね中心軸31周りを転動するようになっている。ノズ
ル1、1は、図1(ロ)に示す如く、コイルばね3に対
して対称的に配置され、ばね中心軸31と直交する面F
に対し、30度以上、37度以下の投射角度γで、斜め
下方にショット粒2、2を投射する。
The coil spring 3 is mounted on the carrier 4 of the transfer device 4.
2 and rolls around the spring central axis 31 on the friction plate 43 in the projection area 20. The nozzles 1 and 1 are arranged symmetrically with respect to the coil spring 3 as shown in FIG.
On the other hand, the shot grains 2 and 2 are projected obliquely downward at a projection angle γ of 30 degrees or more and 37 degrees or less.

【0012】なお、ノズル1、1の軸(ショット粒2、
2の投射方向)は、ばね中心軸31と直交する面Fから
前後に傾斜した面に設定されていてもよい。この場合に
は、細い横棒からなるキャリア42が、コイルばね3の
内側へのショット粒2の衝突を妨害する不具合を解消で
きる。
The axes of the nozzles 1 and 1 (shot grains 2 and
The projection direction of (2) may be set to a plane inclined forward and backward from a plane F orthogonal to the spring center axis 31. In this case, it is possible to solve the problem that the carrier 42 formed of a thin horizontal bar hinders the collision of the shot particles 2 with the inside of the coil spring 3.

【0013】コイルばね3は、図2の(イ)、(ロ)に
示す如く、ピッチ角α、コイル直径D、素線径d、ピッ
チPとなっている。図3の(イ)は、ピッチ角αにより
素線径dが邪魔してコイルばね3の内側A点にショット
粒2が当たり難い方向B、Cを示す。図3の(ロ)は、
A点にショット粒が当たり難い方向Bの投射角度β、お
よび素線径dによるコイルばね3の内側にショット粒2
が当たり難い投射角度ξの範囲を図示する。
As shown in FIGS. 2A and 2B, the coil spring 3 has a pitch angle α, a coil diameter D, a wire diameter d, and a pitch P. 3A shows directions B and C in which the wire diameter d is disturbed by the pitch angle α and the shot particles 2 hardly hit the point A inside the coil spring 3. (B) of FIG.
The shot grain 2 is formed inside the coil spring 3 by the projection angle β in the direction B where the shot grain hardly hits the point A and the wire diameter d.
3 shows a range of the projection angle が where it is difficult to hit.

【0014】図4は、A点にショット粒2が当たり難い
投射角度βの計算式(1)および投射角度ξの計算式
(2)を示す。避けるべきノズル1の投射角度γnは、
計算式(3)となる。一方、コイルばね全体に均等にシ
ョット粒2が当たる最適投射角度γの近似式は、計算式
(4)となる。図5の(イ)は、ピッチ角αごとに衝突
エネルギーのばらつきが最も小さくなるような投射角度
を最適投射角度γとして求めたグラフである。計算式
(4)は図5の(イ)の特性曲線を近似式で表したもの
である。
FIG. 4 shows a formula (1) for calculating the projection angle β and a formula (2) for calculating the projection angle い at which the shot particles 2 hardly hit the point A. The projection angle γn of the nozzle 1 to be avoided is
Equation (3) is obtained. On the other hand, the approximate expression of the optimum projection angle γ at which the shot particles 2 are evenly applied to the entire coil spring is calculated by Expression (4). FIG. 5A is a graph in which the projection angle at which the variation in the collision energy is minimized for each pitch angle α is determined as the optimum projection angle γ. The calculation formula (4) expresses the characteristic curve of FIG.

【0015】従って、最適投射角度γは、計算式(3)
および計算式(4)の双方を満足するものであることが
望ましい。以上から、ピッチ角αに応じて決定される最
適投射角度γは、30度から37度の範囲であり、ピッ
チ角αが20度以下の一般的なコイルばね3では、最適
投射角度γが35〜37度程度であることが判明する。
Therefore, the optimum projection angle γ is calculated by the following equation (3).
It is desirable that both of equation (4) and equation (4) be satisfied. From the above, the optimum projection angle γ determined according to the pitch angle α is in the range of 30 degrees to 37 degrees, and in a general coil spring 3 having a pitch angle α of 20 degrees or less, the optimum projection angle γ is 35 degrees. It turns out that it is about 37 degrees.

【0016】このため、ノズル1、1は、図5の(ロ)
に示す如く、ばね中心軸31に直交する角度から投射角
度γが30度以上、37度以下、およびマイナス30度
以上、マイナス37度以下であると、確実にコイルばね
1の内側にショット粒2が衝突する。この結果、コイル
ばね1の外側および内側を含む全表面に均一な厚さの圧
縮残留応力層を形成できる。
For this reason, the nozzles 1 and 1 are shown in FIG.
When the projection angle γ is 30 degrees or more and 37 degrees or less and -30 degrees or more and minus 37 degrees or less from the angle perpendicular to the spring center axis 31 as shown in FIG. Collide. As a result, a compressive residual stress layer having a uniform thickness can be formed on all surfaces including the outside and inside of the coil spring 1.

【0017】図6の(ハ)は、搬送中のコイルばね3の
ばね中心軸31の方向と、ノズル1から投射されるショ
ット粒2による、コイルばね3の内側、および外側に付
加されるエネルギー比の関係を示すグラフである。図6
の(イ)は、従来のショットピーニング方法のコイルば
ね3をばね中心軸31方向に搬送し、図6の(ロ)は、
この発明のショットピーニング方法のコイルばね3をば
ね軸31と直交する方向に搬送する場合を示す。
FIG. 6C shows the energy applied to the inside and outside of the coil spring 3 by the direction of the spring center axis 31 of the coil spring 3 being conveyed and the shot particles 2 projected from the nozzle 1. It is a graph which shows the relationship of a ratio. FIG.
(A) conveys the coil spring 3 of the conventional shot peening method in the direction of the spring center axis 31. (b) of FIG.
The case where the coil spring 3 is transported in a direction orthogonal to the spring shaft 31 in the shot peening method of the present invention is shown.

【0018】この発明のショットピーニング方法のコイ
ルばね3をばね中心軸31と直交する方向に搬送する場
合は、コイルばね3の内側と外側の衝突エネルギーに差
が小さいことが判明する。
When the coil spring 3 is transported in the direction perpendicular to the spring center axis 31 in the shot peening method of the present invention, it is found that the difference between the collision energies inside and outside the coil spring 3 is small.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明のショットピーニング方法を示す斜視
図である。
FIG. 1 is a perspective view showing a shot peening method of the present invention.

【図2】コイルばねの拡大図である。FIG. 2 is an enlarged view of a coil spring.

【図3】ショット粒が内側に衝突し難い投射角度β、ξ
を示す断面図である。
FIG. 3 shows projection angles β and い at which shot particles hardly collide with the inside.
FIG.

【図4】投射角度β、ξ、γnおよび最適投射角度γの
計算式である。
FIG. 4 is a formula for calculating the projection angles β, ξ, γn and the optimum projection angle γ.

【図5】最適投射角度γのグラフおよび断面図である。FIG. 5 is a graph and a sectional view of an optimum projection angle γ.

【図6】コイルばねの移動方向と内側、外側の衝突エネ
ルギー比のグラフである。
FIG. 6 is a graph showing a moving direction of a coil spring and an inner / outer collision energy ratio.

【符号の説明】[Explanation of symbols]

1 ノズル 2 ショット粒 3 コイルばね 1 Nozzle 2 Shot grain 3 Coil spring

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 コイルばねをばね中心軸周りに回転させ
ながら、ノズルからショット粒を投射させるショットピ
ーニング方法において、 前記ノズルからショット粒を投射させる投射角度γを、
前記ばね中心軸と直交する直交面から30度以上、37
度以下偏向した位置に設定したことを特徴とするコイル
ばねのショットピーニング方法。
1. A shot peening method for projecting shot particles from a nozzle while rotating a coil spring about a spring center axis, wherein a projection angle γ for projecting shot particles from the nozzle is
30 degrees or more from an orthogonal plane orthogonal to the spring center axis, 37
A shot peening method for a coil spring, wherein the shot peening method is set at a position deviated by less than one degree.
【請求項2】 請求項1に記載のショットピーニング方
法において、前記コイルばねを、ばね中心軸に対して直
交する方向に搬送させることを特徴とするコイルばねの
ショットピーニング方法。
2. The shot peening method according to claim 1, wherein the coil spring is transported in a direction perpendicular to a center axis of the spring.
【請求項3】 請求項1または2のいずれかに記載のシ
ョットピーニング方法において、前記ノズルは複数であ
り、前記投射角度γが30度以上、37度以下と、マイ
ナス30度以上、マイナス37度以下の双方からショッ
ト粒を投射することを特徴とするコイルばねのショット
ピーニング方法。
3. The shot peening method according to claim 1, wherein the number of the nozzles is plural, and the projection angle γ is 30 degrees or more and 37 degrees or less, -30 degrees or more, and minus 37 degrees. A shot peening method for a coil spring, wherein shot grains are projected from both of the following.
JP2001171671A 2001-06-06 2001-06-06 Method of shot-peening for coiled spring Pending JP2002361558A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001171671A JP2002361558A (en) 2001-06-06 2001-06-06 Method of shot-peening for coiled spring

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001171671A JP2002361558A (en) 2001-06-06 2001-06-06 Method of shot-peening for coiled spring

Publications (1)

Publication Number Publication Date
JP2002361558A true JP2002361558A (en) 2002-12-18

Family

ID=19013400

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001171671A Pending JP2002361558A (en) 2001-06-06 2001-06-06 Method of shot-peening for coiled spring

Country Status (1)

Country Link
JP (1) JP2002361558A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6811149B1 (en) * 2003-10-27 2004-11-02 Daniel E. Johnson Fatigue and damage tolerant coil spring
WO2009133989A1 (en) 2008-04-30 2009-11-05 Daewon Kang Up Co., Ltd. Apparatus for stress shot peening of coil spring
US7984537B2 (en) * 2007-03-01 2011-07-26 Electronics Inc. Method of shot peening coil springs
WO2017146177A1 (en) 2016-02-23 2017-08-31 日本発條株式会社 Coil spring processing device
US10315287B2 (en) 2014-08-20 2019-06-11 Nhk Spring Co., Ltd. Vertical motion impeller-type shot peening device and coil spring

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02303770A (en) * 1989-05-16 1990-12-17 Nhk Spring Co Ltd Shot peening device for coil spring
JPH07314333A (en) * 1994-05-23 1995-12-05 Sankoole Kk Shot-peening method of spring with adherent part

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02303770A (en) * 1989-05-16 1990-12-17 Nhk Spring Co Ltd Shot peening device for coil spring
JPH07314333A (en) * 1994-05-23 1995-12-05 Sankoole Kk Shot-peening method of spring with adherent part

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6811149B1 (en) * 2003-10-27 2004-11-02 Daniel E. Johnson Fatigue and damage tolerant coil spring
US7984537B2 (en) * 2007-03-01 2011-07-26 Electronics Inc. Method of shot peening coil springs
WO2009133989A1 (en) 2008-04-30 2009-11-05 Daewon Kang Up Co., Ltd. Apparatus for stress shot peening of coil spring
EP2252434A1 (en) * 2008-04-30 2010-11-24 Dae Won Kang Up Co., Ltd. Apparatus for stress shot peening of coil spring
US8328603B2 (en) 2008-04-30 2012-12-11 Dae Won Kang Up Co., Ltd. Apparatus for stress shot peening of coil spring
EP2252434A4 (en) * 2008-04-30 2014-03-05 Dae Won Kang Up Co Ltd Apparatus for stress shot peening of coil spring
US10315287B2 (en) 2014-08-20 2019-06-11 Nhk Spring Co., Ltd. Vertical motion impeller-type shot peening device and coil spring
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