JP2678821B2 - Thin plate blasting surface treatment method - Google Patents

Thin plate blasting surface treatment method

Info

Publication number
JP2678821B2
JP2678821B2 JP2289807A JP28980790A JP2678821B2 JP 2678821 B2 JP2678821 B2 JP 2678821B2 JP 2289807 A JP2289807 A JP 2289807A JP 28980790 A JP28980790 A JP 28980790A JP 2678821 B2 JP2678821 B2 JP 2678821B2
Authority
JP
Japan
Prior art keywords
thin plate
plate material
projection
surface treatment
blasting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2289807A
Other languages
Japanese (ja)
Other versions
JPH04164575A (en
Inventor
等 六反田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sintokogio Ltd
Original Assignee
Sintokogio Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sintokogio Ltd filed Critical Sintokogio Ltd
Priority to JP2289807A priority Critical patent/JP2678821B2/en
Publication of JPH04164575A publication Critical patent/JPH04164575A/en
Application granted granted Critical
Publication of JP2678821B2 publication Critical patent/JP2678821B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、薄板材に塗膜、コーティング、溶射等を施
す際の密着性をよくするために行なわれるブラスト下地
処理方法に関する。
Description: TECHNICAL FIELD The present invention relates to a blasting surface treatment method performed to improve adhesion when a thin plate material is coated, coated, sprayed, or the like.

(従来技術と問題点) 近年、軽薄短小、高機能、高品質化の技術動向に伴な
い高級材料(SUS,Cu,Al合金等)を薄板段階でブラスト
下地処理する要求が高まってきている。しかしこのよう
な高級材料は高級ゆえに非常に薄く、場合によっては0.
3mm以下の厚さになっている。このため下地処理の表面
凹凸程度もミクロンオーダのものが要求され、粒径の微
細な投射材が使用されるようになるが、投射材の粒径が
微細になると、単位重量当りの粒数が非常に多くなり、
従来のブラスト処理方法をそのまま実施した場合は、反
射する投射材と投射された投射材との間で衝突を起した
り、あるいは薄板材の表面に堆積する投射材を除去しき
れなかったり、薄板材の表面に投射材の流れが生じて投
射された投射材と衝突を起し、ブラスト効率を悪くする
問題があった。
(Prior art and problems) In recent years, along with technological trends of lightness, thinness, shortness, high functionality, and high quality, there is an increasing demand for blasting undercoating of high-grade materials (SUS, Cu, Al alloys, etc.) at the thin plate stage. However, such high-grade materials are very thin due to the high quality, and in some cases 0.
It has a thickness of 3 mm or less. For this reason, the surface roughness of the surface treatment is required to be in the order of micron, and a shot material having a fine particle size is used. However, when the particle size of the shot material becomes fine, the number of particles per unit weight becomes small. Very many,
If the conventional blast treatment method is carried out as it is, collision may occur between the reflecting projection material and the projected projection material, or the projection material accumulated on the surface of the thin plate material may not be removed completely, There is a problem that the flow of the shot material is generated on the surface of the plate material and collides with the projected shot material to deteriorate the blast efficiency.

さらに薄板材は、通常のブラスト処理方法では薄板材
に歪みを発生させる問題もあり、0.3mm以下の薄板材の
ブラスト下地処理は実施されていないのが状況である。
Further, the thin plate material has a problem that the normal blasting method causes a distortion in the thin plate material, and the situation is that the blasting base treatment of the thin plate material of 0.3 mm or less is not carried out.

(目的) 本発明は上記の問題に鑑みて成されたもので、ブラス
ト効果を低下させたり、薄板材に歪みを発生させたりす
ることなく、薄板材のブラスト下地処理をするのに好適
な方法を提供することを目的とするものである。
(Object) The present invention has been made in view of the above problems, and is a method suitable for blasting a thin plate material without lowering the blasting effect or causing distortion in the thin plate material. It is intended to provide.

(問題点を解決するための手段) 上記目的を達成するために本発明における薄板材のブ
ラスト下地処理方法は、0.3mm以下の薄板材を垂直に立
てた状態にして支持すると共に垂直状態の該薄板材を横
延長線方向に水平移動させながら該薄板材に対し該薄板
材の進行方向後方から前方に向け、50〜75度の衝突角度
をもつて0.1〜0.5mmのグリット状投射材を投射速度15〜
75m/secの速度で垂直両面に同時に衝突させることを特
徴とするものである。
(Means for Solving Problems) In order to achieve the above object, the blasting surface treatment method for a thin plate material according to the present invention is carried out by supporting a thin plate material of 0.3 mm or less in a vertically standing state and at the same time in the vertical state. While horizontally moving the thin plate material in the lateral extension line direction, project a grit-shaped projection material of 0.1 to 0.5 mm with a collision angle of 50 to 75 degrees from the rear direction to the front direction of the thin plate material with respect to the thin plate material. Speed 15 ~
The feature is that they are made to collide with both vertical surfaces at a speed of 75 m / sec at the same time.

(作用) 上記のような薄板材のブラスト下地処理方法を採用す
ることにより、薄板材の歪み発生を防止しながら投射材
同志の衝突、干渉等をなくし、効率よくブラスト下地処
理ができる。
(Operation) By adopting the blasting surface treatment method for a thin plate material as described above, it is possible to efficiently perform the blasting surface treatment while preventing the occurrence of distortion of the thin plate material while eliminating the collision, interference and the like of the projection materials.

(発明の経過) 発明者は、薄板材の下地処理条件として表面粗さ(凹
凸)を15μm程度以下にする要求が多く出て来ているこ
とに注目し、この条件をまず満足できる方法として表面
粗さの要求に合わせて、投射材の粒径を変えることを考
えた。しかし、この解決手段は特に微細粒子の投射材に
おいて、これを各種のものに変えることは、実用機の機
械構造、その他の面から困難であることが判明した。
(Progress of Invention) The inventor has noticed that there are many demands for surface roughness (irregularities) of about 15 μm or less as a condition for the surface treatment of a thin plate material. We considered changing the particle size of the shot material according to the demand for roughness. However, it has been found that this solution is difficult to change into various kinds, especially in the case of a fine particle projection material, from the mechanical structure of a practical machine and other aspects.

そこで投射材の粒径を一定にして他の投射条件を変え
ることにより粗面(凹凸)程度をコントロールできない
ものかと種々テストを繰り返し、それをまとめたのが第
1図である。
Therefore, various tests were repeated to determine whether the rough surface (irregularities) can be controlled by changing the other projection conditions while keeping the particle size of the shot material constant, and the results are summarized in FIG.

すなわち、第1図のグラフは、ステンレス板材に対し
粒径0.1〜0.5mmのグリット状(下地処理として有効)の
投射材を、衝突角度50度、投射速度15〜20m/secで投射
した場合の表面粗さを示す線を(A)、衝突角度75度、
投射速度75m/secで投射した場合の表面粗さを示す線を
(B)でそれぞれ示してある。
That is, the graph of FIG. 1 shows a case where a grit-like (effective as a base treatment) projection material having a particle size of 0.1 to 0.5 mm is projected onto a stainless steel plate material at a collision angle of 50 degrees and a projection speed of 15 to 20 m / sec. A line showing the surface roughness (A), collision angle 75 degrees,
Lines showing the surface roughness when projected at a projection speed of 75 m / sec are shown in (B), respectively.

このテストの結果から、微細粒径のグリット状投射材
によりブラスト処理される薄板材は要求の多い15μm以
下の凹凸面にするには粒径0.3mm以下のグリット状投射
材を使用することによって達成でき、しかも、投射材の
粒径が同じであっても衝突角度あるいは、投射速度を変
えることによって表面粗さをコントロールできることが
判った。
From the results of this test, the thin plate material to be blasted with the grit-like shot material with a fine particle size is achieved by using the grit-like shot material with a particle size of 0.3 mm or less to make the uneven surface of 15 μm or less, which is often required. It was found that the surface roughness can be controlled by changing the collision angle or the projection speed even if the particle size of the shot material is the same.

さらに発明者は、投射後反射する投射材と投射された
投射材とが干渉しないようにするには薄板材への投射材
の衝突角度を90度以下にすることを考え、投射する投射
材の量と薄板材への衝突角度の関係を調べたのが第2図
である。
Furthermore, the inventor considers that the collision angle of the projection material with respect to the thin plate material is 90 degrees or less in order to prevent the projection material reflected after projection from colliding with the projected projection material. The relationship between the amount and the angle of collision with the thin plate material was investigated in FIG.

この結果によると、薄板材への投射材の衝突角度を75
度以下にすることにより、一般的なブラストマシンに支
障のない能力である投射量600kg/minを確保した状態で
ブラスト処理をしても投射材同志が干渉し合わないこと
を見つけ出した。しかし、薄板材の表面粗さの程度を安
定させるためには投射材の衝突下限角度を50度程度まで
にするのが望ましいことも表面粗さチェックにおいて判
った。(第2図で斜線の範囲) さらに加えて投射材を薄板材上に堆積させたり投射材
の流れを生じさせることがないようにするため薄板材を
垂直に立てた状態に支持し、これを薄板材の横延長線方
向に水平移動させながら、上記各テスト結果から得られ
たブラスト下地処理として最適な条件、すなわち、投射
材の粒径を0.3mm以下にし、かつ投射材の薄板材への衝
突角度を50〜75度の範囲にし、さらに薄板材の歪を防止
するために投射材を薄板材の表裏両面に同時に投射する
ようにして本発明を完成させたのである。
According to this result, the impact angle of the shot material on the thin plate is set to 75
It was found that the blasting materials do not interfere with each other even if the blasting is performed in a state where the projection rate of 600 kg / min, which is a capability that does not hinder the general blasting machine, is secured by setting the temperature to less than or equal to the degree. However, it was also found in the surface roughness check that it is desirable to set the collision lower limit angle of the projectile material to about 50 degrees in order to stabilize the degree of surface roughness of the thin plate material. (A shaded area in FIG. 2) Furthermore, in order to prevent the shot material from being deposited on the thin plate material or causing the flow of the shot material, the thin plate material is supported in a vertically standing state, and this is supported. While moving horizontally in the direction of the horizontal extension line of the thin plate, the optimum conditions for the blasting surface treatment obtained from the above test results, that is, the particle size of the shot material is 0.3 mm or less, and The present invention has been completed by setting the collision angle in the range of 50 to 75 degrees and further projecting the projection material onto both the front and back surfaces of the thin plate material in order to prevent distortion of the thin plate material.

(効果) 本発明は上記の説明から明らかなように薄板材を垂直
に立てた状態に支持して水平方向に移動させながら微細
な投射材を使用して投射衝突角度を限定すると共薄板材
の表裏両面に同時に投射衝突させるものであるから、一
般の実用ブラストマシンを使用して効率よくブラスト下
地処理を行ない得ると同時に、薄板材の歪発生を防止で
きる等種々の効果がある。
(Effect) As is clear from the above description, according to the present invention, if the projection collision angle is limited by using a fine projection material while supporting the thin plate material in a vertically standing state and moving it horizontally, Since the projection collision is made on both the front and back sides at the same time, it is possible to efficiently perform the blasting base treatment using a general practical blasting machine, and at the same time, there are various effects such as the occurrence of distortion of the thin plate material can be prevented.

【図面の簡単な説明】[Brief description of the drawings]

第1図は投射材粒径及び投射条件を変化させてブラスト
処理した場合の薄板材の表面粗さとの関係を示すグラ
フ、第2図は投射材の薄板材への衝突角度と、投射材の
投射量(投射材同志の干渉しない範囲)の関係を示すグ
ラフである。
FIG. 1 is a graph showing the relationship with the surface roughness of the thin plate material when the blasting treatment is performed by changing the particle size of the blast material and the blasting conditions, and FIG. 2 is the collision angle of the blast material with the thin plate material, and the It is a graph which shows the relationship of the amount of projections (range which the projection materials do not interfere).

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】0.3mm以下の薄板材を垂直に立てた状態に
して支持すると共に垂直状態の該薄板材を横延長方向に
水平移動させながら、該薄板材に対し該薄板材の進行方
向後方から前方に向け50〜75度の衝突角度をもって0.1
〜0.5mmのグリット状投射材を投射速度15〜75m/secの速
度で垂直両面に同時に衝突させることを特徴とする薄板
材のブラスト下地処理方法。
1. A thin plate having a thickness of 0.3 mm or less is vertically supported and supported, and the thin plate in a vertical state is horizontally moved in a lateral extension direction, while the thin plate is rearward with respect to the traveling direction of the thin plate. From the front to 0.1 with a collision angle of 50-75 degrees
A blasting surface treatment method for thin plate materials, characterized in that a grit-like shot material of ~ 0.5 mm is made to collide with both vertical surfaces at a speed of 15 ~ 75 m / sec.
JP2289807A 1990-10-26 1990-10-26 Thin plate blasting surface treatment method Expired - Fee Related JP2678821B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2289807A JP2678821B2 (en) 1990-10-26 1990-10-26 Thin plate blasting surface treatment method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2289807A JP2678821B2 (en) 1990-10-26 1990-10-26 Thin plate blasting surface treatment method

Publications (2)

Publication Number Publication Date
JPH04164575A JPH04164575A (en) 1992-06-10
JP2678821B2 true JP2678821B2 (en) 1997-11-19

Family

ID=17748025

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2289807A Expired - Fee Related JP2678821B2 (en) 1990-10-26 1990-10-26 Thin plate blasting surface treatment method

Country Status (1)

Country Link
JP (1) JP2678821B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5569536B2 (en) * 2009-11-17 2014-08-13 新東工業株式会社 Rolling steel cleaning equipment

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5318086A (en) * 1976-08-02 1978-02-18 Ishikawajima Harima Heavy Ind Co Ltd Method and device for making injection device follow material
JPS6411764A (en) * 1987-07-01 1989-01-17 Howa Machinery Ltd Grit

Also Published As

Publication number Publication date
JPH04164575A (en) 1992-06-10

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