JP2002357381A5 - - Google Patents
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- Publication number
- JP2002357381A5 JP2002357381A5 JP2001166244A JP2001166244A JP2002357381A5 JP 2002357381 A5 JP2002357381 A5 JP 2002357381A5 JP 2001166244 A JP2001166244 A JP 2001166244A JP 2001166244 A JP2001166244 A JP 2001166244A JP 2002357381 A5 JP2002357381 A5 JP 2002357381A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- cooling
- supply means
- sample
- zureka
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007789 gas Substances 0.000 claims 30
- 238000001816 cooling Methods 0.000 claims 13
- 239000000112 cooling gas Substances 0.000 claims 13
- 239000001307 helium Substances 0.000 claims 4
- 229910052734 helium Inorganic materials 0.000 claims 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium(0) Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims 4
- 229910001873 dinitrogen Inorganic materials 0.000 claims 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- 238000001514 detection method Methods 0.000 claims 1
Claims (14)
前記冷却用ガスの周りに第２ガスを供給する第２ガス供給手段とを有し、
前記冷却用ガスはヘリウムガスであり、前記第２ガスは該ヘリウムガスよりも重いガスであることを特徴とする冷却装置。First gas supply means for supplying a cooling gas to the object;
Second gas supply means for supplying a second gas around the cooling gas;
The cooling apparatus, wherein the cooling gas is helium gas, and the second gas is heavier than the helium gas.
前記第１ガス供給手段は前記対象物に向けて開口する内管を有し、
前記第２ガス供給手段は前記内管の開口を中心とするリング状の開口が前記対象物に向けて形成されるように前記内管を包囲する外管を有する
ことを特徴とする冷却装置。In Zureka one claims 6 Neu claim 1,
The first gas supply means has an inner tube that opens toward the object;
The cooling apparatus according to claim 1, wherein the second gas supply means includes an outer pipe that surrounds the inner pipe so that a ring-shaped opening centered on the opening of the inner pipe is formed toward the object.
前記冷却手段は、
前記試料へ冷却用ガスを供給する第１ガス供給手段と、
前記冷却用ガスの周りに第２ガスを供給する第２ガス供給手段とを有し、
前記冷却用ガスはヘリウムガスであり、前記第２ガスは該ヘリウムガスよりも重いガスである
ことを特徴とするＸ線装置。An X-ray apparatus comprising: an X-ray source that generates X-rays; an X-ray detection unit that detects diffraction X-rays generated from a sample; and a cooling unit that supplies a cooling gas to the sample to cool the sample ,
The cooling means is
First gas supply means for supplying a cooling gas to the sample;
Second gas supply means for supplying a second gas around the cooling gas;
The X-ray apparatus according to claim 1, wherein the cooling gas is helium gas, and the second gas is heavier than the helium gas.
前記第１ガス供給手段は前記試料に向けて開口する内管を有し、
前記第２ガス供給手段は前記内管の開口を中心とするリング状の開口が前記試料に向けて形成されるように前記内管を包囲する外管を有する
ことを特徴とするＸ線装置。In one claims 13 Noi Zureka claims 8,
The first gas supply means has an inner tube that opens toward the sample;
The X-ray apparatus, wherein the second gas supply means has an outer tube surrounding the inner tube so that a ring-shaped opening centered on the opening of the inner tube is formed toward the sample.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001166244A JP2002357381A (en) | 2001-06-01 | 2001-06-01 | Cooling equipment and x-ray equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001166244A JP2002357381A (en) | 2001-06-01 | 2001-06-01 | Cooling equipment and x-ray equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002357381A JP2002357381A (en) | 2002-12-13 |
| JP2002357381A5 true JP2002357381A5 (en) | 2005-05-26 |
Family
ID=19008806
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001166244A Pending JP2002357381A (en) | 2001-06-01 | 2001-06-01 | Cooling equipment and x-ray equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002357381A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100462652C (en) * | 2006-10-18 | 2009-02-18 | 北京航空航天大学 | Ice crystal granule gas generation device |
| JP5346057B2 (en) * | 2011-04-26 | 2013-11-20 | 株式会社リガク | Sample cooling device for X-ray analyzer and X-ray analyzer |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04295782A (en) * | 1991-03-26 | 1992-10-20 | Hitachi Ltd | Surface analyzer, surface analyzing method and measuring device for magnetic resonance phenomenon |
| JPH06241671A (en) * | 1993-02-18 | 1994-09-02 | Rigaku Corp | Specimen cooling device |
| JPH08170948A (en) * | 1994-12-16 | 1996-07-02 | Rigaku Corp | Sample atmosphere regulator for x-ray apparatus |
| JP3331089B2 (en) * | 1995-05-15 | 2002-10-07 | 理学電機株式会社 | Sample cooling nozzle |
| JP3355258B2 (en) * | 1995-04-07 | 2002-12-09 | 理学電機株式会社 | Cooling system |
| JPH09306693A (en) * | 1996-05-10 | 1997-11-28 | Nippon Telegr & Teleph Corp <Ntt> | Laser plasma x-ray generating method and device |
| JP4059963B2 (en) * | 1996-10-23 | 2008-03-12 | 株式会社フジクラ | Manufacturing method of oxide superconductor |
| US6121570A (en) * | 1998-10-28 | 2000-09-19 | The Esab Group, Inc. | Apparatus and method for supplying fluids to a plasma arc torch |
| JP2000260839A (en) * | 1999-03-11 | 2000-09-22 | Mitsubishi Electric Corp | Low-temperature testing device |
| JP2000280087A (en) * | 1999-03-30 | 2000-10-10 | Hitachi Ltd | Device and method of underwater laser welding |
-
2001
- 2001-06-01 JP JP2001166244A patent/JP2002357381A/en active Pending
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