JP2002356791A - Surface treatment equipment - Google Patents
Surface treatment equipmentInfo
- Publication number
- JP2002356791A JP2002356791A JP2001160242A JP2001160242A JP2002356791A JP 2002356791 A JP2002356791 A JP 2002356791A JP 2001160242 A JP2001160242 A JP 2001160242A JP 2001160242 A JP2001160242 A JP 2001160242A JP 2002356791 A JP2002356791 A JP 2002356791A
- Authority
- JP
- Japan
- Prior art keywords
- surface treatment
- opening
- work
- liquid
- treatment step
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G3/00—Apparatus for cleaning or pickling metallic material
- C23G3/02—Apparatus for cleaning or pickling metallic material for cleaning wires, strips, filaments continuously
- C23G3/021—Apparatus for cleaning or pickling metallic material for cleaning wires, strips, filaments continuously by dipping
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G3/00—Apparatus for cleaning or pickling metallic material
- C23G3/02—Apparatus for cleaning or pickling metallic material for cleaning wires, strips, filaments continuously
- C23G3/027—Associated apparatus, e.g. for pretreating or after-treating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、第1処理液を用い
てワークに表面処理を施す第1表面処理工程と,この第
1表面処理終了後のワークに第2処理液を用いて表面処
理を施す第2表面処理工程とをこの順で実行する表面処
理装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a first surface treatment step of performing a surface treatment on a work using a first treatment liquid, and a surface treatment using a second treatment liquid on the work after the first surface treatment. And a second surface treatment step of performing the above steps in this order.
【0002】[0002]
【背景技術】例えば図6に示す如く、第1処理液28P
を用いてワーク(被処理物)Wに表面処理を施す第1表
面処理工程と,この第1表面処理終了後のワークWに第
2処理液38Pを用いて表面処理を施す第2表面処理工
程とをこの順で実行する表面処理装置が公知である。2. Description of the Related Art For example, as shown in FIG.
A first surface treatment step of performing a surface treatment on a work (object to be processed) W by using the first treatment, and a second surface treatment step of performing a surface treatment by using a second treatment liquid 38P on the work W after the completion of the first surface treatment Are performed in this order.
【0003】詳しくは、図6において、全工程浸漬方式
装置での第1表面処理槽20Pおよび第2表面処理槽3
0Pは、ワークWの搬送(H…H1,H2,H3)方向
に直列配設されている。なお、第1表面処理槽20Pよ
り上流側(図で左側)[および第2表面処理槽30Pよ
り下流側(図で右側)]にも、前処理槽(後処理槽),
その他の槽が直列配設されている。More specifically, in FIG. 6, a first surface treatment tank 20P and a second surface treatment tank 3
0P are arranged in series in the direction of conveyance (H... H1, H2, H3) of the work W. Note that the pretreatment tank (post-treatment tank), the upstream side (left side in the figure) of the first surface treatment tank 20P, and the downstream side (right side in the figure) of the second surface treatment tank 30P.
Other tanks are arranged in series.
【0004】ワークWは、前置処理槽(図示省略)から
H1方向の水平搬送終了後にD1方向に下降されて第1
処理液28Pが液建てされた第1表面処理槽20Pに浸
漬されかつ第1表面処理工程が実行される。The work W is lowered in the D1 direction after the horizontal transfer in the H1 direction from the pre-treatment tank (not shown), and
The treatment liquid 28P is immersed in the first surface treatment tank 20P in which the liquid is built, and the first surface treatment step is performed.
【0005】この第1表面処理工程の実行終了後に、ワ
ークWはU1方向に上昇されかつ次いでH2方向に水平
搬送される。After the completion of the first surface treatment step, the work W is lifted in the U1 direction and then horizontally conveyed in the H2 direction.
【0006】引続き、ワークWは、D2方向に下降され
て第2処理液38Pが液建てされた第2表面処理槽30
Pに浸漬されかつ第2表面処理工程が実行される。Subsequently, the work W is lowered in the direction D2 and the second surface treatment tank 30 in which the second treatment liquid 38P is deposited.
P and a second surface treatment step is performed.
【0007】この第2表面処理工程の実行終了後に、ワ
ークWはU2方向に上昇されかつその他の処理工程や後
処理工程のためにH3方向に水平搬送される。After the execution of the second surface treatment step, the work W is lifted in the U2 direction and is horizontally conveyed in the H3 direction for other processing steps and post-processing steps.
【0008】[0008]
【発明が解決しようとする課題】ところで、高品質製品
(例えば、電子部品等)の製造現場では、第1表面処理
工程終了後のワークWに可及的速やかに第2表面処理工
程を施したいとの要請が高まる一方である。しかし、技
術的,設備コスト的,レイアウト的な諸事情の観点か
ら、U1方向の上昇搬出,H2方向の水平搬送およびD
2方向の下降搬入の各時間短縮化にも限度がある。On the other hand, at a manufacturing site of high-quality products (for example, electronic parts, etc.), it is desired that the work W after the completion of the first surface treatment step be subjected to the second surface treatment step as soon as possible. The demand is increasing. However, from the viewpoints of technical, equipment cost and layout-related circumstances, ascending unloading in the U1 direction, horizontal transfer in the H2 direction and D
There is also a limit in shortening each time for carrying in two directions.
【0009】かくして、第1表面処理が例えばエッチン
グ処理でかつ第2表面処理が例えば水洗処理である場合
において、第1表面処理工程終了後から第2表面処理工
程開始までの空中放置時間が要請時間よりも長いと、薬
液の反応スピードが速いためにワークWの表面に付着残
存したエッチング処理液で過剰エッチングが起こりある
いはムラが生じ、酸化膜が生成されてしまう等の不都合
(品質劣悪化)が誘発される。換言すれば、品質を一段
と向上させることができない。Thus, when the first surface treatment is, for example, an etching treatment and the second surface treatment is, for example, a water washing treatment, the air standing time from the end of the first surface treatment step to the start of the second surface treatment step is a required time. If the length is longer than that, the reaction speed of the chemical solution is high, so that excessive etching occurs or unevenness occurs in the etching treatment liquid adhering and remaining on the surface of the work W, resulting in inconvenience (deterioration in quality) such as formation of an oxide film. Triggered. In other words, the quality cannot be further improved.
【0010】また、H2方向の水平搬送中にワークWか
ら付着残存した第1処理液が飛散するので、周囲を汚し
また液性状によっては人的危険の虞もある。さらに、第
1処理液の組成によっては、上部開放状態の第1表面処
理槽から多量のガスやミストが発生するので、作業環境
が悪くその改善が求められている。Further, since the first processing liquid adhering and remaining from the work W is scattered during the horizontal transfer in the H2 direction, there is a possibility that the surroundings are soiled and that there is a risk of human danger depending on the properties of the liquid. Further, depending on the composition of the first treatment liquid, a large amount of gas and mist is generated from the first surface treatment tank in the upper open state, so that the working environment is poor and improvement is required.
【0011】本発明の目的は、第1表面処理工程終了後
から第2表面処理工程開始までの空中放置時間を大幅に
短縮することができる表面処理装置を提供することにあ
る。An object of the present invention is to provide a surface treatment apparatus capable of greatly reducing the time in air from the end of the first surface treatment step to the start of the second surface treatment step.
【0012】[0012]
【課題を解決するための手段】請求項1の発明は、第1
処理液を用いてワークWに表面処理を施す第1表面処理
工程と,この第1表面処理終了後のワークに第2処理液
を用いて表面処理を施す第2表面処理工程とをこの順で
実行する表面処理装置において、前記第1表面処理工程
を第1表面処理槽に液建てされた前記第1処理液内に浸
漬した状態で実行可能かつ前記第2表面処理工程をシャ
ワー室内でワークWに前記第2処理液をシャワーしつつ
実行可能に形成し、第1表面処理槽を下側にかつシャワ
ー室を上側に配設するとともに第1表面処理槽とシャワ
ー室との間に開閉蓋付きの上下仕切構造を設け、ワーク
を上方外部からシャワー室および開放された開閉蓋を通
過させて第1表面処理槽内に下降搬入可能かつこの下降
搬入後に開閉蓋を閉鎖された状態で第1表面処理工程を
実行可能であるとともに、第1表面処理工程終了後のワ
ークを開放された開閉蓋を通過させてシャワー室内に上
昇可能かつこの上昇後に開閉蓋を閉鎖された状態で第2
表面処理工程を実行可能に形成し、第2表面処理工程終
了後のワークをシャワー室から上方外部へ上昇搬出可能
に形成された表面処理装置である。According to the first aspect of the present invention, there is provided the following:
A first surface treatment step of performing a surface treatment on the work W using the treatment liquid, and a second surface treatment step of performing a surface treatment on the work after the completion of the first surface treatment using the second treatment liquid are performed in this order. In the surface treatment apparatus for performing, the first surface treatment step can be performed in a state where the first surface treatment step is immersed in the first treatment liquid buried in the first surface treatment tank, and the second surface treatment step is performed in the shower room by the work W The second processing liquid is formed so as to be executable while being showered, and the first surface treatment tank is disposed below and the shower room is disposed above, and an opening / closing lid is provided between the first surface treatment tank and the shower room. The work is allowed to descend into the first surface treatment tank by passing the work from above and outside through the shower room and the open / close lid, and the first surface is opened and closed with the open / close lid closed. That the process can be performed Moni, in a state where the lid is closed after raisable and this rises Shower passed through the opened lid to work after the end of the first surface treatment step second
The surface treatment apparatus is formed so that the surface treatment step can be executed, and the workpiece after the second surface treatment step can be lifted out of the shower room to the outside.
【0013】かかる発明では、ワークは、上方外部から
シャワー室内に搬入されかつ開放された開閉蓋を通過さ
せて第1表面処理槽内に下降搬入される。下降搬入後に
開閉蓋を閉鎖する。そして、開閉蓋を閉鎖した状態でか
つ第1表面処理槽に液建てされた第1処理液内にワーク
を浸漬した状態で、第1表面処理工程が実行される。In this invention, the work is carried into the shower room from above and outside, passes through the openable lid, and is carried down into the first surface treatment tank. After dropping in, close the open / close lid. Then, the first surface treatment step is performed with the opening / closing lid closed and the work immersed in the first treatment liquid laid in the first surface treatment tank.
【0014】第1表面処理工程終了後に開閉蓋が開放さ
れ、ワークは直ちに開放された開閉蓋を通過させてシャ
ワー室内に上昇される。この上昇後に開閉蓋が閉鎖され
る。そして、開閉蓋が閉鎖した状態でかつ第2処理液を
ワーク表面にシャワーしつつ第2表面処理工程が実行さ
れる。第2表面処理工程終了後のワークは、シャワー室
から上方外部へ上昇搬出される。After the completion of the first surface treatment step, the opening / closing lid is opened, and the work immediately passes through the opened opening / closing lid and is raised into the shower room. After this rise, the opening / closing lid is closed. Then, the second surface treatment step is performed while the opening / closing lid is closed and the second treatment liquid is showered on the work surface. The work after the completion of the second surface treatment step is lifted and carried out of the shower room to the upper outside.
【0015】したがって、第1表面処理工程終了後から
第2表面処理工程開始までの空中放置時間を大幅に短縮
することができるとともに、品質向上および作業環境改
善を図れる。第1表面処理槽から多量のガスやミストが
漏れかつ外部に飛散することがないので、作業環境を一
段と良好に保てる。Therefore, it is possible to drastically shorten the time in air from the end of the first surface treatment step to the start of the second surface treatment step, and to improve the quality and the working environment. Since a large amount of gas and mist do not leak from the first surface treatment tank and scatter outside, the working environment can be further improved.
【0016】また、請求項2の発明は、第1処理液を用
いてワークWに表面処理を施す第1表面処理工程と,こ
の第1表面処理終了後のワークに第2処理液を用いて表
面処理を施す第2表面処理工程とをこの順で実行する表
面処理装置において、上部開放ブースの中間を中間仕切
で仕切った下方側を第1表面処理槽に形成しかつその上
昇側をシャワー室に形成し、該中間仕切に前記ワークW
を上下方向に通過可能な開口部とこの開口部を開閉可能
な開閉蓋とを設け、第1表面処理槽に液建てされた前記
第1処理液内にワークを浸漬した状態でかつ開閉蓋が閉
鎖された状態で前記第1表面処理工程を実行可能である
とともに開閉蓋が閉鎖された状態でかつシャワー室内で
ワークに前記第2処理液をシャワーしつつ前記第2表面
処理工程を実行可能に形成された表面処理装置である。Further, according to the invention of claim 2, a first surface treatment step of subjecting the work W to a surface treatment using the first treatment liquid, and using the second treatment liquid for the work after completion of the first surface treatment. And a second surface treatment step of performing a surface treatment in this order, wherein the lower part of the middle of the upper open booth partitioned by an intermediate partition is formed in a first surface treatment tank, and the rising side thereof is a shower room. And the work W is formed in the intermediate partition.
And an opening / closing lid capable of opening and closing the opening, and the opening / closing lid is provided in a state where the workpiece is immersed in the first processing liquid laid in the first surface treatment tank. The first surface treatment step can be executed in a closed state, and the second surface treatment step can be executed while showering the second treatment liquid on a work in a shower room with an opening / closing lid closed. The formed surface treatment device.
【0017】かかる発明では、開閉蓋を開放して中間仕
切の開口部を開いた状態で、ワークを外部上方からシャ
ワー室および開口部を通過させて第1表面処理槽に下降
搬入させかつその後に開閉蓋を閉鎖して開口部を閉じ
る。すなわち、第1表面処理槽に液建てされた第1処理
液内にワークを浸漬した状態でかつ開閉蓋が閉鎖された
状態で、第1表面処理工程を実行する。In this invention, with the opening / closing lid opened and the opening of the intermediate partition opened, the work is passed down through the shower room and the opening from the outside to the first surface treatment tank, and is then carried down to the first surface treatment tank. Close the opening / closing lid and close the opening. That is, the first surface treatment step is performed in a state where the work is immersed in the first treatment liquid buried in the first surface treatment tank and the opening / closing lid is closed.
【0018】第1表面処理工程の実行終了後に、開閉蓋
を開放して開かれた開口部を通してワークを直ちにシャ
ワー室に上昇搬出する。そして、開閉蓋を閉鎖して開口
部を閉じる。すなわち、開閉蓋が閉鎖された状態でかつ
シャワー室内でワークに第2処理液をシャワーしつつ第
2表面処理工程を実行する。この第2表面処理工程の終
了後にワークは上方外部へ上昇搬出される。この際、開
閉蓋は閉鎖されたままである。After the completion of the first surface treatment step, the work is immediately lifted and carried out to the shower room through the opened opening by opening the opening / closing lid. Then, the opening / closing lid is closed to close the opening. That is, the second surface treatment step is performed while the second treatment liquid is showered on the work in the shower room with the opening / closing lid closed. After the end of the second surface treatment step, the work is lifted and carried out to the outside. At this time, the opening / closing lid remains closed.
【0019】したがって、請求項1の発明の場合と同様
な作用効果を奏することができることに加え、さらにシ
ャワー室と第1表面処理槽とが一体構造のブースから構
成されているので、液密性を一段と高く保持できるとと
もに構造簡単でコスト低減を図れる。Therefore, in addition to providing the same operation and effect as the case of the first aspect of the present invention, since the shower room and the first surface treatment tank are constituted by an integrated booth, the liquid tightness is achieved. Can be held higher and the structure can be simplified and the cost can be reduced.
【0020】また、請求項3の発明は、前記第1処理液
が薬剤溶融液でかつ前記第2処理液が水とされた表面処
理装置である。The invention according to claim 3 is a surface treatment apparatus in which the first treatment liquid is a drug melt and the second treatment liquid is water.
【0021】かかる発明では、第1処理液が薬剤溶融液
で、引き続いて表面処理を施す第2処理液が水であるか
ら、第1表面処理工程実行後のワークに付着残存する薬
剤溶融液を迅速に水で洗い流すことができるから、請求
項1および請求項2の各発明の場合と同様な作用効果を
奏することができることに加え、さらに第1表面処理工
程実行後の各ワーク表面品質を一定にかつ一段と良好に
維持できる。In this invention, since the first processing liquid is a chemical liquid and the second processing liquid to be subsequently subjected to surface treatment is water, the chemical liquid adhering and remaining on the workpiece after the execution of the first surface processing step is removed. Since it can be quickly washed away with water, the same operation and effect as those of the first and second aspects of the invention can be obtained, and the surface quality of each workpiece after the execution of the first surface treatment step can be kept constant. And can be maintained even better.
【0022】さらに、請求項4の発明は、前記第1処理
液がエッチング処理液または剥離処理液でかつ前記第2
処理液が水とされた表面処理装置である。Further, in the invention according to claim 4, the first processing liquid is an etching processing liquid or a stripping processing liquid and the second processing liquid is a second processing liquid.
This is a surface treatment apparatus in which the treatment liquid is water.
【0023】かかる発明では、第1処理液が反応スピー
ドの速いエッチング処理液(または、剥離処理液)で、
引き続いて表面処理を施す第2処理液が水であるから、
第1表面処理工程実行後のワークに付着残存するエッチ
ング処理液(または、剥離処理液)を迅速に水で洗い流
すことができるから、請求項1および請求項2の各発明
の場合と同様な作用効果を奏することができることに加
え、さらにエッチング処理(または、剥離処理)実行後
のワークが過剰処理(過剰エッチングまたは過剰剥離)
されたり、ムラが発生してしまうことがなく、一段の高
品質化を図れる。In this invention, the first processing liquid is an etching processing liquid (or a stripping processing liquid) having a high reaction speed,
Since the second treatment liquid to be subsequently subjected to the surface treatment is water,
Since the etching treatment liquid (or the peeling treatment liquid) remaining on the work after the execution of the first surface treatment step can be quickly washed away with water, the same operation as in each of the first and second aspects of the present invention. In addition to achieving the effect, the workpiece after the etching process (or the peeling process) is over-processed (excessive etching or excessive peeling)
And higher quality can be achieved without causing unevenness or unevenness.
【0024】[0024]
【発明の実施の形態】以下、本発明の実施の形態につい
て、図面を参照して詳細に説明する。Embodiments of the present invention will be described below in detail with reference to the drawings.
【0025】本表面処理装置は、図1〜図5に示す如
く、基本的機能が従来例の場合(図6)の場合と同様に
ワークWに第1表面処理を施す第1表面処理工程と,こ
の第1表面処理終了後のワークWに第2表面処理を施す
第2表面処理工程とをこの順で実行可能で、さらに第1
表面処理工程を第1表面処理槽20に液建てされた第1
処理液28内に浸漬した状態で実行可能かつ第2表面処
理工程をシャワー室30内でワーク(被処理物)Wに第
2処理液38をシャワーしつつ実行可能に形成し、第1
表面処理槽20を下側にかつシャワー室30を上側に配
設するとともに第1表面処理槽20とシャワー室30と
の間に開閉蓋55付きの上下仕切構造(50)を設け、
ワークWを上方外部からシャワー室30および開放され
た開閉蓋55を通過させて第1表面処理槽20内に下降
搬入可能かつこの下降搬入後に開閉蓋55を閉鎖した状
態で第1表面処理工程を実行可能であるとともに、第1
表面処理工程終了後のワークWを開放された開閉蓋55
を通過させてシャワー室30内に上昇可能かつこの上昇
後に開閉蓋55を閉鎖した状態で第2表面処理工程を実
行可能に形成し、第2表面処理工程終了後のワークWを
シャワー室30から上方外部へ上昇搬出可能に形成され
ている。As shown in FIGS. 1 to 5, the present surface treatment apparatus has a first surface treatment step of performing a first surface treatment on a work W in the same manner as in the case of the conventional example (FIG. 6). And a second surface treatment step of subjecting the workpiece W after the first surface treatment to a second surface treatment in this order.
The first surface treatment step is performed in the first surface treatment tank 20.
The second surface treatment step can be executed while being immersed in the treatment liquid 28 and the second treatment liquid 38 can be executed while showering the second treatment liquid 38 on the work (workpiece) W in the shower room 30.
The surface treatment tank 20 is disposed on the lower side and the shower room 30 is disposed on the upper side, and a vertical partition structure (50) with an opening / closing lid 55 is provided between the first surface treatment tank 20 and the shower room 30;
The first surface treatment step can be performed in a state where the work W can be lowered and carried into the first surface treatment tank 20 through the shower room 30 and the openable opening / closing lid 55 from above and outside, and the opening / closing lid 55 is closed after the lowering. Feasible and the first
Opening / closing lid 55 that has opened the work W after the surface treatment step
Can be passed into the shower room 30 and the second surface treatment step can be executed with the opening / closing lid 55 closed after the rise, and the work W after the second surface treatment step is removed from the shower room 30 It is formed so that it can be lifted and carried out to the outside.
【0026】具体的には、この実施の形態では、上部開
放ブース10の中間を中間仕切50で仕切った下方側を
第1表面処理槽20に形成しかつその上昇側をシャワー
室30に形成し、中間仕切50にワークWを上下方向に
通過可能な開口部51とこの開口部51を開閉可能な開
閉蓋55とを設け、第1表面処理槽20に液建てされた
第1処理液28内にワークWを浸漬した状態でかつ開閉
蓋55が閉鎖された状態で第1表面処理工程を実行可能
であるとともに開閉蓋55が閉鎖された状態でかつシャ
ワー室30内でワークWに第2処理液38をシャワーし
つつ第2表面処理工程を実行可能に形成してある。Specifically, in this embodiment, the lower side of the middle of the upper open booth 10 partitioned by the intermediate partition 50 is formed in the first surface treatment tank 20 and the rising side thereof is formed in the shower room 30. The intermediate partition 50 is provided with an opening 51 through which the work W can pass in the vertical direction and an opening / closing lid 55 capable of opening and closing the opening 51. The first processing liquid 28 built in the first surface processing tank 20 is provided. The first surface treatment step can be executed in a state where the work W is immersed in the work piece and the opening and closing cover 55 is closed, and the second processing is performed on the work W in the shower room 30 while the opening and closing cover 55 is closed. The second surface treatment step can be performed while showering the liquid 38.
【0027】図1において、ブース10は上部開放かつ
有底の一体構造タンク形式で、このブース10の開放上
部は、開口部12を有する天蓋11で覆われている。開
口部12はワークWの下降搬入・上昇搬出に支障を来た
さない範囲内において開口面積を小さくすることが望ま
しい。水滴やミスの外部飛散量を最小限化のためであ
る。In FIG. 1, a booth 10 is an integrated tank having an open top and a closed bottom. The open top of the booth 10 is covered with a canopy 11 having an opening 12. It is desirable to reduce the opening area of the opening 12 within a range that does not hinder the lowering in / in of the work W. This is for minimizing the amount of water droplets and mistakes scattered outside.
【0028】中間仕切50は、折り曲げ板構造で中央に
開口部51が設けられている以外、下側の第1表面処理
槽20と上側のシャワー室30とを液密に仕切ることが
できる上下仕切構造(50)を形成する。開口部51の
開口面積は、開口部12の開口面積と同じとされてい
る。The intermediate partition 50 has a bent plate structure and is provided with an opening 51 at the center, and an upper and lower partition capable of liquid-tightly separating the lower first surface treatment tank 20 and the upper shower room 30. Form a structure (50). The opening area of the opening 51 is the same as the opening area of the opening 12.
【0029】つまり、シャワー室30と第1表面処理槽
20とがブース10内を中間仕切50で仕切った構造で
あるから、両者(30,20)間の液密性を高く保持で
き、構造簡単でコスト低減を図れると理解される。That is, since the shower room 30 and the first surface treatment tank 20 have a structure in which the inside of the booth 10 is partitioned by the intermediate partition 50, the liquid tightness between the two (30, 20) can be kept high, and the structure is simple. It is understood that the cost can be reduced.
【0030】なお、52は外側に向って低くなるように
傾斜された形態の廃液(排水)ガイド部で、53は廃液
溜め部で、54はドレン弁である。Reference numeral 52 denotes a waste liquid (drainage) guide portion which is inclined so as to become lower toward the outside, 53 denotes a waste liquid storage portion, and 54 denotes a drain valve.
【0031】開口部51は、ヒンジ部56を中心に回動
(右廻り回転、左廻り回転)可能に支持された開閉蓋5
5が設けられている。この開閉蓋55は、図2に示され
た駆動制御ユニット60によって回転制御される開閉モ
ータ58(ドライバ58D)で開閉作動され、開閉状態
は開閉センサー57で検出される。The opening portion 51 is provided with an opening / closing lid 5 that is supported so as to be rotatable (clockwise rotation and counterclockwise rotation) about a hinge portion 56.
5 are provided. The opening / closing lid 55 is opened / closed by an opening / closing motor 58 (driver 58D) whose rotation is controlled by the drive control unit 60 shown in FIG.
【0032】開閉蓋55の閉鎖状態では、両者(30,
20)間の液密性はもとより気密性も完全である。つま
り、シャワー水が下側の第1表面処理槽20内に侵入さ
せず、第1表面処理槽20から発生されたガスやミスト
がシャワー室30側に漏れることがない。In the closed state of the opening / closing lid 55, both (30,
The airtightness as well as the liquid tightness between 20) is perfect. That is, the shower water does not enter the lower first surface treatment tank 20, and the gas or mist generated from the first surface treatment tank 20 does not leak to the shower room 30 side.
【0033】なお、開閉蓋55が開放された際にシャワ
ー室30内に漏れたガスやミストは、天蓋11で上方外
部への飛散が最小化されるとともに、シャワー処理の際
にその水膜や水滴で捕捉されるので、外部へは殆んど飛
散することがない。The gas or mist leaking into the shower room 30 when the opening / closing lid 55 is opened is minimized by the canopy 11 from scattering upward and outside. Since it is captured by water droplets, it hardly scatters outside.
【0034】下側の第1表面処理を実行する第1表面処
理槽20には、第1処理液28が液建て(組成,温度,
液量等が管理された状態で満たされる。)されている。In the first surface treatment tank 20 for performing the first surface treatment on the lower side, a first treatment liquid 28 is liquid (composition, temperature,
The liquid amount and the like are filled in a controlled state. ) Has been.
【0035】本発明においては、反応スピードが速いも
の、有害性の虞あるガスやミストを発生し易い第1処理
液28を用いて第1表面処理工程の実行する場合に、奏
する作用効果が一段と大きい。In the present invention, when the first surface treatment step is performed using the first treatment solution 28 which has a high reaction speed and easily generates harmful gas or mist, the effect obtained is further enhanced. large.
【0036】この意味において対象とする第1処理液2
8としては、反応スピードが速いエッチング処理液や剥
離処理液、あるいは有害性(例えば、誘錆性,誘咳性)
の虞あるガスやミストを発生し易い薬液を溶融した薬液
溶融液である。In this sense, the target first processing liquid 2
8 is an etching solution or a stripping solution having a high reaction speed, or harmful (eg, rust-inducing, coughing-in)
This is a chemical liquid melt obtained by melting a chemical liquid that easily generates gas or mist.
【0037】この実施の形態では、第1表面処理工程終
了後にワークWを大気中に放置している時間が長くなる
と、過剰処理やムラが生じてしまうエッチング処理液
(剥離処理液の場合も同様である。)を採択してある。In this embodiment, if the time during which the workpiece W is left in the air after the end of the first surface treatment step is prolonged, an excessively large amount of processing or unevenness may occur. Is adopted.)
【0038】なお、図2に示す昇降モータ67(ドライ
バ67D)で駆動される昇降機構(図示省略)によって
下降されたワークWが第1表面処理槽20内の所定位置
(高さ)に到達したことを検出(図4のST12でYE
S)するための下降限センサー25が、第1表面処理槽
20に設けられている。The work W lowered by an elevating mechanism (not shown) driven by an elevating motor 67 (driver 67D) shown in FIG. 2 reaches a predetermined position (height) in the first surface treatment tank 20. (YE in ST12 of FIG. 4)
A lower limit sensor 25 for performing S) is provided in the first surface treatment tank 20.
【0039】中間仕切(上下仕切構造)50の上側のシ
ャワー室30内には、図1で1点鎖線で示された一対の
ノズルボックス31L,31Rが取り付けられており、
各ノズルボックス31L,31Rの複数のノズル32か
らシャワー位置センサー35で検出(図5のST19で
YES)されたシャワー位置にあるワーク表面に、第2
処理液38をシャワー可能に形成されている。In the shower room 30 above the intermediate partition (upper and lower partition structure) 50, a pair of nozzle boxes 31L and 31R shown by a chain line in FIG.
A second surface is provided on the work surface at the shower position detected by the shower position sensor 35 from the plurality of nozzles 32 of each of the nozzle boxes 31L and 31R (YES in ST19 of FIG. 5).
The processing liquid 38 is formed so as to be capable of showering.
【0040】第2処理液は、水である。この水には、常
温から加温された湯水も含まれる。また、純粋な水だけ
でなく、ある種の洗浄剤を溶解した水溶液も対象として
よい場合がある。つまり、一般的に水洗液,洗浄水,洗
浄液,湯洗液と呼ばれるものである。The second processing liquid is water. This water includes hot water heated from room temperature. In addition, not only pure water but also an aqueous solution in which a certain cleaning agent is dissolved may be a target. That is, they are generally called washing water, washing water, washing liquid and hot water washing liquid.
【0041】図2のその他機構・装置等100に含まれ
る搬送機構(図示省略)は、ワークWを図3(A)に示
すH1方向に水平搬送可能でかつ同図(E)に示すH2
方向に水平搬送することができる。駆動制御ユニット6
0で駆動制御される。A transport mechanism (not shown) included in the other mechanisms / devices 100 in FIG. 2 is capable of horizontally transporting the work W in the direction H1 shown in FIG. 3A and H2 shown in FIG.
Can be transported horizontally in any direction. Drive control unit 6
Drive control is performed at 0.
【0042】また、昇降機構(図示省略)は、H1方向
に水平搬送されて来たワークWを上昇限(上昇位置)か
ら図3(B)を経た同図(C)に示す下昇限(下降位
置)まで、一気(D1方向)に下降搬入することができ
る。上昇限(上昇位置)は、天蓋11に取り付けられた
図2に示す上昇限センサー15で検出され、下降限(下
降位置)は下降限センサー25で検出されるThe lifting mechanism (not shown) lowers the work W, which has been horizontally conveyed in the H1 direction, from the upper limit (up position) to the lower limit shown in FIG. Until the lowering position), it can be lowered and carried in at a stretch (D1 direction). The ascending limit (ascending position) is detected by an ascending limit sensor 15 shown in FIG. 2 attached to the canopy 11, and the ascending limit (ascending position) is detected by a descending limit sensor 25.
【0043】また、上昇搬出に関しては、下降限(下降
位置)からシャワー室30内のシャワー位置まで図3
(D)に示すU11方向に上昇搬出でき、シャワー終了
後にシャワー位置から上昇限まで図3(E)に示すU1
2方向に上昇搬出される。シャワー位置は、図2に示す
シャワー位置センサー35で検出される。Further, as regards ascending and unloading, from the lowering limit (lowering position) to the showering position in the shower room 30, FIG.
3D, it can be lifted and carried out in the U11 direction, and after the end of the shower, from the shower position to the upper limit, U1 shown in FIG.
It is lifted out in two directions. The shower position is detected by the shower position sensor 35 shown in FIG.
【0044】蓋開閉機構は、駆動制御ユニット60によ
って、開閉センサー57の検出結果を監視しつつ開閉モ
ータ57を可逆回転駆動制御することにより、開閉制御
される。The lid opening and closing mechanism is controlled to be opened and closed by the drive control unit 60 controlling the opening and closing motor 57 to perform reversible rotation while monitoring the detection result of the opening and closing sensor 57.
【0045】かかる実施の形態では、図3(A)に示す
状態において、開閉蓋55(開口部51)が閉鎖状態で
あるから、第1表面処理槽20から発生し得るガスやミ
ストはシャワー室30、最終的にはシャワー室30から
上方外部へ漏れることがない。In this embodiment, in the state shown in FIG. 3A, since the opening / closing lid 55 (opening 51) is in the closed state, the gas and mist that can be generated from the first surface treatment tank 20 are in the shower room. 30, and finally, there is no leakage from the shower room 30 to the outside.
【0046】ワークWが、図3(A)に示すH1方向か
ら水平搬送されて来た場合、駆動制御ユニット60は、
開閉モータ58を回転駆動して開閉蓋55を図3(B)
に示すようにヒンジ部56を中心に右廻り回転させて開
放(図4のST10)する。つまり、開口部51が開か
れる。When the work W is horizontally conveyed from the direction H1 shown in FIG. 3A, the drive control unit 60
The opening / closing cover 55 is rotated by driving the opening / closing motor 58 so that the opening / closing lid 55 is moved as shown in FIG.
As shown in (2), it is rotated clockwise around the hinge 56 to open (ST10 in FIG. 4). That is, the opening 51 is opened.
【0047】なお、下降搬入されつつあるワークWが開
口部51を通過する時期までに、開口部51を全開して
おけるならば、ワーク下降開始後に開放作動に入っても
よい。第1表面処理槽20から発生したガスやミストの
シャワー室30への漏れ量を一段と軽微量化できるから
である。Incidentally, if the opening 51 can be fully opened by the time when the workpiece W being lowered and carried in passes through the opening 51, the opening operation may be started after the lowering of the workpiece is started. This is because the amount of gas or mist generated from the first surface treatment tank 20 leaking into the shower room 30 can be further reduced.
【0048】さて、駆動制御ユニット60は、昇降モー
タ67を回転駆動して昇降機構を駆動制御する。ワーク
Wを昇降機構の昇降支持部(図示省略)で支持しつつ下
降開始する(ST11)。詳しくは、図3(A),
(B)に示すように、ワークWを上方外部から天蓋11
の開口部12,シャワー室30および開放された開閉蓋
55(開口部51)を通過させて、第1表面処理槽20
内にD1方向で一気に下降搬入させることができる。The drive control unit 60 drives the lift motor 67 to rotate and controls the drive of the lift mechanism. The work W is started to descend while being supported by an elevating support part (not shown) of the elevating mechanism (ST11). For details, see FIG.
As shown in (B), the work W is moved from the upper outside to the canopy 11.
Through the opening 12, the shower room 30, and the openable opening / closing lid 55 (opening 51).
, And can be carried down at a stretch in the D1 direction.
【0049】駆動制御ユニット60は、下降限センサー
25の検出信号からワークWが下降限になったと判断
(ST12でYES)すると、昇降機構(昇降モータ6
7)を回転停止する(ST13)。なお、ワークWを第
1表面処理槽20内の支持部(図示省略)に引き渡す
と、昇降機構の昇降支持部は、上方外部に昇降されて待
機できるように形成されている。When the drive control unit 60 determines from the detection signal of the lower limit sensor 25 that the work W has reached the lower limit (YES in ST12), the lift mechanism (the lift motor 6)
7) is stopped (ST13). When the work W is delivered to a support (not shown) in the first surface treatment tank 20, the elevating support of the elevating mechanism is formed so as to be raised and lowered to the outside and stand by.
【0050】この下降搬入後に、開閉モータ58を反対
方向に回転駆動して開閉蓋55(開口部51)を左廻り
回転させて閉鎖(ST14)する。つまり、開閉蓋55
は、ワークWが開口部51を通過する期間だけ開放状態
にしておくだけでよいことが分かる。After the lower carry-in, the opening / closing motor 58 is driven to rotate in the opposite direction, and the opening / closing lid 55 (opening 51) is rotated counterclockwise to close (ST14). That is, the opening / closing lid 55
It can be understood that it is only necessary to keep the workpiece W in the open state while the workpiece W passes through the opening 51.
【0051】そして、図3(C)に示す開閉蓋55(開
口部51)を閉鎖した状態でかつワークWが第1表面処
理槽20に液建てされたエッチング処理液(第1処理
液)28内に浸漬した状態で、エッチング処理工程(第
1表面処理工程)が実行(ST15)される。実行時間
は、駆動制御ユニット60のCPUで時間管理されてい
る。Then, with the opening / closing lid 55 (opening 51) shown in FIG. 3C closed, the workpiece W is an etching treatment liquid (first treatment liquid) 28 built in the first surface treatment tank 20. An etching process (first surface treatment process) is performed in a state of being immersed in the inside (ST15). The execution time is managed by the CPU of the drive control unit 60.
【0052】したがって、エッチング処理工程の実行
(ST15)が終了したと判断(ST16でYES)し
た後に、駆動制御ユニット60は開閉蓋55を開放(S
T17)して開口部51を開く。Therefore, after determining that the execution of the etching process (ST15) is completed (YES in ST16), the drive control unit 60 opens the opening / closing lid 55 (S15).
T17) to open the opening 51.
【0053】なお、開閉蓋55を開放させるために駆動
開始タイミングであるエッチング処理工程実行終了後
は、物理的に厳格に解することに限定されず、エッチン
グ処理工程実行終了の直前でもよい。シャワー室30へ
のミスト等の微量漏れによる不利益よりも水洗処理まで
の時間短縮化による利益の方が多い場合があるからであ
る。After the completion of the execution of the etching process, which is the drive start timing for opening the opening / closing lid 55, the invention is not limited to the physically strict solution, and may be immediately before the completion of the execution of the etching process. This is because there is a case where the benefit from shortening the time until the water washing process is more than the disadvantage due to a small amount of mist or the like leaking into the shower room 30.
【0054】引続き、昇降モータ67を駆動して下降さ
れた昇降機構の昇降支持部でワークWを支持させ、次い
で上昇駆動する。つまり、エッチング処理終了後のワー
クWを、図3(D)に示すように、ヒンジ部56を中心
に右廻り回転で開放された開閉蓋55(開口部51)を
通過させてシャワー室30内に上昇させる(図5のST
18)。Subsequently, the lifting / lowering motor 67 is driven to support the work W on the lifting / lowering support portion of the lowered lifting mechanism, and then the workpiece W is driven to rise. In other words, the workpiece W after the completion of the etching process is passed through the opening / closing lid 55 (opening 51) opened by rotating clockwise around the hinge 56 as shown in FIG. (ST in FIG. 5)
18).
【0055】そして、シャワー位置センサー57の検出
によりワークWが所定のシャワー処理位置に到達した場
合(ST19でYES)に、昇降モータ67を回転停止
して、ワークWを図3(D),(E)に示すシャワー位
置で上昇停止(ST20)させる。When the work W reaches the predetermined shower processing position by the detection of the shower position sensor 57 (YES in ST19), the rotation of the elevating motor 67 is stopped, and the work W is moved to the position shown in FIGS. At the shower position shown in E), the ascent is stopped (ST20).
【0056】図6に示された第1表面処理槽20Pにお
いて、ワークWを上昇限までU1方向に上昇させかつそ
の後にH2方向に水平搬送させ、さらにD2方向に下降
させて第2表面処理槽30P内に搬入させる従来例の場
合(図6)に比較して、シャワーを直ちに開始できるか
ら第1表面処理工程終了後のワークWの大気中放置時間
を飛躍的大幅に短縮することができるわけである。In the first surface treatment tank 20P shown in FIG. 6, the work W is raised in the U1 direction to the uppermost limit, and then horizontally conveyed in the H2 direction, and further lowered in the D2 direction to be moved to the second surface treatment tank. Since the shower can be started immediately as compared with the case of the conventional example in which the work W is carried into the 30P (FIG. 6), the time for leaving the workpiece W in the air after the first surface treatment step can be drastically reduced. It is.
【0057】この上昇停止後に開閉蓋55が閉鎖(ST
21)されて開口部51は閉じられる。After the ascent is stopped, the opening / closing lid 55 is closed (ST).
21) Then, the opening 51 is closed.
【0058】なお、上昇されたワークWが開口部51を
通過した直後に開閉蓋55の閉鎖作動に入るように形成
してもよい。かくすれば、第1表面処理槽20から発生
したガスやミストのシャワー室30への漏れ量を一段と
軽微化できる。It should be noted that the lifted work W may be formed so as to start the closing operation of the opening / closing lid 55 immediately after passing through the opening 51. In this way, the amount of gas and mist generated from the first surface treatment tank 20 leaking into the shower room 30 can be further reduced.
【0059】そして、図3(E)に示すように、開閉蓋
55(開口部51)が閉鎖した状態でかつ複数のノズル
32から噴出された水洗液(水)[第2処理液]でシャ
ワーしつつ、水洗処理工程(第2表面処理工程)が実行
(ST22)される。この水洗処理の実行時間も駆動制
御ユニット60のCPUで時間管理されている。Then, as shown in FIG. 3 (E), with the opening / closing lid 55 (opening 51) closed and showering with a washing liquid (water) [second processing liquid] spouted from the plurality of nozzles 32. Then, a water washing process (second surface treatment process) is performed (ST22). The execution time of the washing process is also managed by the CPU of the drive control unit 60.
【0060】なお、シャワー後の水滴は、シャワー室3
0内に浮遊するミスト等を吸収しつつ廃液ガイド部52
上を流下しあるいは直接に廃液溜め部53に回収され
る。It should be noted that the water droplets after the shower are applied to the shower room 3
Waste liquid guide 52 while absorbing mist floating inside
It flows down or is collected directly in the waste liquid reservoir 53.
【0061】したがって、水洗処理工程の実行(ST2
2)が終了したと判断(ST23でYES)した後に、
駆動制御ユニット60は昇降モータ67を駆動してワー
クWの上昇搬出を開始(ST24)する。そして、駆動
制御ユニット60は、上方外部に設けられた上昇限セン
サー15の検出結果を利用してワークWが上昇限に到達
したと判断(ST25でYES)すると、ワークWを上
昇停止(ST26)させる。Therefore, the water washing process is executed (ST2).
After it is determined that 2) has been completed (YES in ST23),
The drive control unit 60 drives the elevating motor 67 to start the ascending and unloading of the work W (ST24). When the drive control unit 60 determines that the work W has reached the ascending limit using the detection result of the ascending limit sensor 15 provided outside and above (YES in ST25), the work W is stopped ascending (ST26). Let it.
【0062】つまり、第2表面処理工程終了後のワーク
Wは、シャワー室30から上方外部へ上昇搬出される。
その後に、搬送機構により図3(E)に示すH2方向に
水平搬送される。That is, the work W after the completion of the second surface treatment step is lifted out of the shower room 30 to the outside.
Thereafter, the wafer is horizontally transported in the H2 direction shown in FIG. 3E by the transport mechanism.
【0063】したがって、エッチング処理工程(第1表
面処理工程)終了後から水洗処理工程(第2表面処理工
程)開始までの空中放置時間を大幅に短縮することがで
きるとともに、品質向上および作業環境改善を図れる。Accordingly, it is possible to drastically shorten the time in air from the end of the etching process (first surface treatment process) to the start of the water washing process (second surface treatment process), and to improve the quality and the working environment. Can be achieved.
【0064】また、搬送中におけるワークWからの付着
残存第1処理液28の飛散がないので、装置の周囲を汚
さずまた人的危険性も一掃化できる。さらに、第1表面
処理槽20から多量のガスやミストが漏れかつ装置外部
に飛散することがないので、作業環境を一段と良好に保
てる。Further, since there is no scattering of the first remaining treatment liquid 28 from the work W during the transportation, the surroundings of the apparatus are not polluted and the danger of human being can be eliminated. Furthermore, since a large amount of gas and mist do not leak from the first surface treatment tank 20 and do not scatter outside the apparatus, the working environment can be further improved.
【0065】また、シャワー室30と第1表面処理槽2
0とが一体構造のブース10から構成されているので、
液密性を一段と高く保持できるとともに構造簡単でコス
ト低減を図れる。The shower room 30 and the first surface treatment tank 2
0 is composed of a booth 10 having an integral structure,
The liquid tightness can be kept higher and the structure can be simplified and the cost can be reduced.
【0066】また、第1表面処理槽20からシャワー室
30内に漏れたミスト等はシャワー後の水膜,水滴で捕
捉されかつシャワー室30の上部が天蓋11で覆われて
いるので、この点からも装置周囲を汚さずまた人的危険
性も一掃化でき、作業環境を一段と良好に保てる。Further, mist and the like leaked into the shower room 30 from the first surface treatment tank 20 are trapped by the water film and water droplets after the shower and the upper part of the shower room 30 is covered with the canopy 11. Therefore, the surroundings of the apparatus are not contaminated and human dangers can be eliminated, and the working environment can be further improved.
【0067】また、第1処理液が反応スピードの速いエ
ッチング処理液(または、剥離処理液)28でかつ第2
処理液38が水であるから、第1表面処理工程実行後の
直後からワークWに付着残存するエッチング処理液(ま
たは、剥離処理液)を迅速に水で洗い流すことができる
から、エッチング処理(または、剥離処理)実行後のワ
ークWが過剰処理(過剰エッチングまたは過剰剥離)さ
れたり、ムラが発生してしまうことがなく、一段の高品
質化を図れる。The first processing liquid is an etching processing liquid (or a stripping processing liquid) 28 having a high reaction speed, and the second processing liquid is a second processing liquid.
Since the treatment liquid 38 is water, an etching treatment liquid (or a peeling treatment liquid) adhering and remaining on the work W can be quickly washed away with water immediately after the execution of the first surface treatment step. (Exfoliation processing) The work W after execution is not excessively processed (excessively etched or excessively peeled off), and unevenness does not occur, so that higher quality can be achieved.
【0068】なお、第1処理液を薬剤溶融液としかつ第
2処理液を水として選択すれば、第1表面処理工程実行
後の直後からワークWに付着残存する薬剤溶融液を迅速
に水で洗い流すことができるから、第1表面処理工程実
行後の各ワーク表面品質を一定にかつ良好に維持でき
る。If the first treatment liquid is selected as a medicine melt and the second treatment liquid is selected as water, the medicine melt adhering to and remaining on the workpiece W immediately after the execution of the first surface treatment step is quickly replaced with water. Since the washing can be performed, the surface quality of each workpiece after the execution of the first surface treatment step can be kept constant and excellent.
【0069】[0069]
【発明の効果】請求項1の発明によれば、第1表面処理
工程を下側の第1表面処理槽の第1処理液内に浸漬した
状態で実行させかつ第2表面処理工程を上側のシャワー
室内でワークに第2処理液をシャワーしつつ実行させ、
第1表面処理槽とシャワー室との間に設けた上下仕切構
造の開閉蓋をワークの昇降・下降時に開放可能かつ第1
および第2表面処理工程の各実行中に閉鎖可能に形成さ
れた表面処理装置であるから、次のような優れた効果を
奏することができる。According to the first aspect of the present invention, the first surface treatment step is performed in a state where the first surface treatment step is immersed in the first treatment liquid in the lower first surface treatment tank, and the second surface treatment step is performed in the upper side. The work is executed while showering the second processing liquid on the work in the shower room,
An opening / closing lid of a vertical partition structure provided between the first surface treatment tank and the shower room can be opened when the workpiece is raised and lowered and the first lid is opened.
Further, since the surface treatment apparatus is formed so as to be able to be closed during each execution of the second surface treatment step, the following excellent effects can be obtained.
【0070】第1表面処理工程終了後から第2表面処
理工程開始までの空中放置時間を大幅に短縮できる。 薬液の反応スピードが速い場合でもワークWの表面に
付着残存した第1処理液による過剰処理およびムラ発生
を防止できる。酸化膜の生成も回避できる。したがっ
て、品質を一段と向上できる。 搬送中におけるワークからの付着残存第1処理液の飛
散がないので、周囲を汚さずまた人的危険性も一掃化で
きる。 第1表面処理槽から多量のガスやミストが漏れかつ外
部に飛散することがないので、作業環境を一段と良好に
保てる。It is possible to drastically reduce the time in air from the end of the first surface treatment step to the start of the second surface treatment step. Even when the reaction speed of the chemical solution is high, it is possible to prevent excessive processing and unevenness due to the first processing liquid adhering and remaining on the surface of the work W. Generation of an oxide film can also be avoided. Therefore, the quality can be further improved. Since there is no scattering of the adhered first treatment liquid from the work during the transportation, the surroundings are not polluted and human danger can be eliminated. Since a large amount of gas and mist do not leak from the first surface treatment tank and scatter outside, the working environment can be further improved.
【0071】また、請求項2の発明によれば、上部開放
ブースの中間を中間仕切で仕切って下方側を第1表面処
理槽にその上昇側をシャワー室に形成し、第1表面処理
工程を第1表面処理槽の第1処理液内に浸漬した状態で
実行させかつ第2表面処理工程をシャワー室内でワーク
に第2処理液をシャワーしつつ実行させ、開閉蓋をワー
クの昇降・下降時に開放可能かつ第1および第2表面処
理工程の各実行中に閉鎖可能に形成された表面処理装置
であるので、請求項1の発明の場合と同様な効果を奏す
ることができることに加え、さらにシャワー室と第1表
面処理槽との液密性を高く保持できるとともに構造簡単
でコスト低減を図れる。According to the second aspect of the present invention, the middle of the upper open booth is partitioned by an intermediate partition, and the lower side is formed in the first surface treatment tank and the rising side thereof is formed in the shower room. The first surface treatment tank is immersed in the first treatment liquid, and the second surface treatment step is performed while showering the second treatment liquid on the work in the shower room. Since the surface treatment apparatus is formed so as to be openable and capable of being closed during the execution of each of the first and second surface treatment steps, the same effect as that of the first aspect of the invention can be obtained. The liquid tightness between the chamber and the first surface treatment tank can be kept high, and the structure can be simplified and the cost can be reduced.
【0072】また、請求項3の発明によれば、第1処理
液が薬剤溶融液で第2処理液が水であるから、請求項1
および請求項2の各発明の場合と同様な効果を奏するこ
とができることに加え、さらに第1表面処理工程実行後
の各ワーク表面品質を一定にかつ一段と良好に維持でき
る。According to the third aspect of the present invention, the first processing liquid is a chemical melt and the second processing liquid is water.
In addition to the effects similar to those of the inventions of the second aspect, the surface quality of each workpiece after the execution of the first surface treatment step can be kept constant and more excellently.
【0073】さらに、請求項4の発明によれば、第1処
理液が反応スピードの速いエッチング処理液(または、
剥離処理液)でかつ第2処理液が水であるから、請求項
1および請求項2の各発明の場合と同様な効果を奏する
ことができることに加え、さらにエッチング処理(また
は、剥離処理)実行後のワークが過剰処理(過剰エッチ
ングまたは過剰剥離)されたり、ムラが発生してしまう
ことがなく、一段の高品質化を図れる。Further, according to the invention of claim 4, the first processing liquid is an etching processing liquid having a high reaction speed (or
Since the second treatment liquid is water and the second treatment liquid is water, the same effects as those of the first and second aspects of the invention can be obtained, and furthermore, the etching treatment (or the detachment treatment) is performed. The subsequent work is not excessively processed (excessive etching or excessive peeling) or unevenness does not occur, and higher quality can be achieved.
【図1】本発明の実施の形態を説明するための構成図で
ある。FIG. 1 is a configuration diagram for explaining an embodiment of the present invention.
【図2】同じく、駆動制御ユニットを説明するためのブ
ロック図である。FIG. 2 is also a block diagram for explaining a drive control unit.
【図3】同じく、動作・処理工程実行順序を説明するた
めの図である。FIG. 3 is a view for explaining an operation / processing step execution order.
【図4】同じく、動作・処理工程実行順序を説明するた
めのフローチャート(1)である。FIG. 4 is also a flowchart (1) for explaining an operation / processing step execution order.
【図5】同じく、動作・処理工程実行順序を説明するた
めのフローチャート(2)である。FIG. 5 is also a flowchart (2) for explaining an operation / processing step execution order.
【図6】従来例を説明するための図である。FIG. 6 is a diagram for explaining a conventional example.
10 ブース 11 天蓋 12 開口部 15 上昇限センサー 20 第1表面処理槽 25 下降限センサー 28 第1処理液 30 シャワー室(第2表面処理室) 31 ノズルボックス 32 ノズル 35 シャワー位置センサー 38 第2処理液 39 廃液 50 中間仕切(上下仕切構造) 51 開口部 52 廃液ガイド部 53 廃液溜め部 54 ドレン弁 55 開閉蓋 56 ヒンジ部 57 開閉センサー 58 開閉モータ 60 駆動制御ユニット 67 昇降モータ W ワーク REFERENCE SIGNS LIST 10 booth 11 canopy 12 opening 15 ascent limit sensor 20 first surface treatment tank 25 ascent limit sensor 28 first treatment liquid 30 shower room (second surface treatment room) 31 nozzle box 32 nozzle 35 shower position sensor 38 second treatment liquid 39 Waste liquid 50 Intermediate partition (vertical partition structure) 51 Opening 52 Waste liquid guide part 53 Waste liquid storage part 54 Drain valve 55 Open / close lid 56 Hinge part 57 Open / close sensor 58 Open / close motor 60 Drive control unit 67 Lifting motor W Work
フロントページの続き Fターム(参考) 4D075 AB01 BB20Z BB66Y BB91Y 4K053 PA17 RA06 RA07 SA04 SA06 TA14 TA18 XA01 YA28 ZA04 4K057 WA01 WA20 WB20 WM03 WM06 WM18 WN01 Continued on the front page F term (reference) 4D075 AB01 BB20Z BB66Y BB91Y 4K053 PA17 RA06 RA07 SA04 SA06 TA14 TA18 XA01 YA28 ZA04 4K057 WA01 WA20 WB20 WM03 WM06 WM18 WN01
Claims (4)
施す第1表面処理工程と,この第1表面処理終了後のワ
ークに第2処理液を用いて表面処理を施す第2表面処理
工程とをこの順で実行する表面処理装置において、 前記第1表面処理工程を第1表面処理槽に液建てされた
前記第1処理液内に浸漬した状態で実行可能かつ前記第
2表面処理工程をシャワー室内でワークに前記第2処理
液をシャワーしつつ実行可能に形成し、 第1表面処理槽を下側にかつシャワー室を上側に配設す
るとともに第1表面処理槽とシャワー室との間に開閉蓋
付きの上下仕切構造を設け、 ワークを上方外部からシャワー室および開放された開閉
蓋を通過させて第1表面処理槽内に下降搬入可能かつこ
の下降搬入後に開閉蓋を閉鎖した状態で第1表面処理工
程を実行可能であるとともに、第1表面処理工程終了後
のワークを開放された開閉蓋を通過させてシャワー室内
に上昇可能かつこの上昇後に開閉蓋を閉鎖した状態で第
2表面処理工程を実行可能に形成し、第2表面処理工程
終了後のワークをシャワー室から上方外部へ上昇搬出可
能に形成した、表面処理装置。1. A first surface treatment step of subjecting a workpiece to a surface treatment using a first treatment liquid, and a second surface treatment of subjecting the work after the first surface treatment to a surface treatment using a second treatment liquid. And a second surface treatment step, wherein the first surface treatment step can be performed in a state where the first surface treatment step is immersed in the first treatment liquid buried in the first surface treatment tank. Is formed so as to be executable while showering the second treatment liquid on the work in the shower room, and the first surface treatment tank is disposed on the lower side and the shower room is disposed on the upper side. An upper / lower partition structure with an opening / closing lid is provided between them. The work can be passed down through the shower room and the opened / closed lid from above and outside and can be lowered into the first surface treatment tank, and closed after opening and closing. Execute the first surface treatment step It is possible to raise the work after completion of the first surface treatment step through the opened opening / closing lid into the shower room, and to execute the second surface treatment step with the opening / closing lid closed after this rise. A surface treatment apparatus wherein the work after the second surface treatment step is formed so as to be able to be lifted and carried out of the shower room to the upper outside.
施す第1表面処理工程と,この第1表面処理終了後のワ
ークに第2処理液を用いて表面処理を施す第2表面処理
工程とをこの順で実行する表面処理装置において、 上部開放ブースの中間を中間仕切で仕切った下方側を第
1表面処理槽に形成しかつその上昇側をシャワー室に形
成し、 該中間仕切に前記ワークを上下方向に通過可能な開口部
とこの開口部を開閉可能な開閉蓋とを設け、 第1表面処理槽に液建てされた前記第1処理液内にワー
クを浸漬した状態でかつ開閉蓋が閉鎖された状態で前記
第1表面処理工程を実行可能であるとともに開閉蓋が閉
鎖された状態でかつシャワー室内でワークに前記第2処
理液をシャワーしつつ前記第2表面処理工程を実行可能
に形成した、表面処理装置。2. A first surface treatment step of performing a surface treatment on a work using a first treatment liquid, and a second surface treatment of performing a surface treatment on the work after completion of the first surface treatment using a second treatment liquid. And a step for performing the steps in this order, wherein the lower side of the middle of the upper open booth is partitioned by an intermediate partition, the lower side is formed in a first surface treatment tank, and the rising side thereof is formed in a shower room. An opening capable of passing the work in the vertical direction and an opening / closing lid capable of opening / closing the opening are provided, and the work is immersed and opened / closed in the first processing liquid built in the first surface treatment tank. The first surface treatment step can be executed with the lid closed, and the second surface treatment step is executed while the second treatment liquid is being showered on the work in a shower room with the opening / closing lid closed. Surface treatment equipment formed as possible .
第2処理液が水である請求項1または請求項2記載の表
面処理装置。3. The surface treatment apparatus according to claim 1, wherein the first treatment liquid is a drug melt, and the second treatment liquid is water.
は剥離処理液でかつ前記第2処理液が水である請求項1
または請求項2記載の表面処理装置。4. The processing liquid according to claim 1, wherein the first processing liquid is an etching liquid or a stripping liquid, and the second processing liquid is water.
Or the surface treatment apparatus according to claim 2.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001160242A JP3487507B2 (en) | 2001-05-29 | 2001-05-29 | Surface treatment equipment |
KR1020020005557A KR20020090846A (en) | 2001-05-29 | 2002-01-31 | Surface treatment device |
CNB021216207A CN1247815C (en) | 2001-05-29 | 2002-05-29 | Surface treatment apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001160242A JP3487507B2 (en) | 2001-05-29 | 2001-05-29 | Surface treatment equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2002356791A true JP2002356791A (en) | 2002-12-13 |
JP3487507B2 JP3487507B2 (en) | 2004-01-19 |
Family
ID=19003687
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Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001160242A Expired - Fee Related JP3487507B2 (en) | 2001-05-29 | 2001-05-29 | Surface treatment equipment |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP3487507B2 (en) |
KR (1) | KR20020090846A (en) |
CN (1) | CN1247815C (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5613499B2 (en) * | 2010-08-25 | 2014-10-22 | アルメックスPe株式会社 | Surface treatment equipment |
-
2001
- 2001-05-29 JP JP2001160242A patent/JP3487507B2/en not_active Expired - Fee Related
-
2002
- 2002-01-31 KR KR1020020005557A patent/KR20020090846A/en not_active Application Discontinuation
- 2002-05-29 CN CNB021216207A patent/CN1247815C/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP3487507B2 (en) | 2004-01-19 |
CN1247815C (en) | 2006-03-29 |
KR20020090846A (en) | 2002-12-05 |
CN1403629A (en) | 2003-03-19 |
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