JP2002350593A - Method and device for condensing x-ray - Google Patents
Method and device for condensing x-rayInfo
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- JP2002350593A JP2002350593A JP2001154623A JP2001154623A JP2002350593A JP 2002350593 A JP2002350593 A JP 2002350593A JP 2001154623 A JP2001154623 A JP 2001154623A JP 2001154623 A JP2001154623 A JP 2001154623A JP 2002350593 A JP2002350593 A JP 2002350593A
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- ray
- wavelength
- zone plate
- dimensional
- rays
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Abstract
Description
【0001】[0001]
【発明の属する技術分野】本願発明は、X線を用いた分
析又は計測装置において用いられ、代表的なものとして
は、X線顕微鏡、X線マイクロプローブ等が挙げられ
る。X線を微小に集光して物体に照射すると、局所的な
情報が得られ、定量的な分析を行うことができる。測定
される物理量は、透過X線、蛍光X線、光電子等であ
る。さらにそれぞれの元素は、固有のX線吸収端を持
ち、吸収端の前後では、わずかなエネルギーの差でも吸
収係数(あるいは透過率)が1桁程度異なるという性質
があるので、この性質を利用した分析には特に有効に用
いられる発明である。BACKGROUND OF THE INVENTION The present invention is used in an analysis or measurement apparatus using X-rays, and typical examples include an X-ray microscope and an X-ray microprobe. When X-rays are slightly condensed and irradiated on an object, local information is obtained and quantitative analysis can be performed. Physical quantities to be measured include transmitted X-rays, fluorescent X-rays, and photoelectrons. Furthermore, each element has a characteristic X-ray absorption edge, and the absorption coefficient (or transmittance) differs by about one digit even before and after the absorption edge even with a slight energy difference. This is an invention particularly effectively used for analysis.
【0002】[0002]
【従来の技術】X線を集光する従来技術としては、フレ
ネル回折を利用した2次元のフレネルゾーンプレートが
挙げられる。これは図2に示すように、強度変調型の場
合、同心円状に、X線に対して不透明なゾーンと透明な
ゾーンとが交互に繰り返される円盤状となっている。波
長λのX線に対してn番目のゾーンの半径rnが近似的
に、 rn 2=nfλ の関係にあるとき、隣り合う透明ゾーンから透過するX
線の光路差がλ(位相差が2π)となり、集光点で互い
に強め合いレンズの役目を果たす。ここで、fは焦点距
離である。2. Description of the Related Art As a conventional technique for collecting X-rays, there is a two-dimensional Fresnel zone plate utilizing Fresnel diffraction. As shown in FIG. 2, in the case of the intensity modulation type, the intensity modulation type has a disk shape in which zones opaque to X-rays and zones transparent to X-rays are alternately repeated. In radius r n of the n th zone to the X-ray wavelength λ is approximately, when the relation of r n 2 = nfλ, X transmitted through a transparent zone adjacent
The optical path difference of the line becomes λ (the phase difference is 2π), and they strengthen each other at the light condensing point and serve as a lens. Here, f is a focal length.
【0003】この式から明らかなように、焦点距離f
は、波長λに反比例、すなわち、エネルギーに比例して
いる。As is clear from this equation, the focal length f
Is inversely proportional to wavelength λ, that is, proportional to energy.
【0004】[0004]
【発明が解決しようとする課題】元素は、固有のX線吸
収端を持ち、吸収端の前後では、わずかなエネルギーの
差でも吸収係数(あるいは透過率)が1桁程度異なると
いう性質があるので、この性質を利用すると特定の元素
のみを選択して分析できるようになり精密な分析が可能
となる。ところが、ゾーンプレートを集光素子に用いる
と、前述の式に示されるとおり、波長λに反比例(エネ
ルギーに比例)して、焦点距離fが変動するため、波長
を変化させるたびに試料位置を変えなければならないと
いう不具合が生じていた。The element has a characteristic X-ray absorption edge, and the absorption coefficient (or transmittance) differs by about one digit before and after the absorption edge, even with a slight difference in energy. By utilizing this property, it becomes possible to select and analyze only a specific element, thereby enabling precise analysis. However, when the zone plate is used for the light-collecting element, the focal length f varies in inverse proportion to the wavelength λ (proportional to the energy) as shown in the above equation, so that the sample position changes every time the wavelength is changed. There was a problem that it had to be done.
【0005】[0005]
【課題を解決するための手段】本願発明は、2個の1次
元フレネルゾーンプレートを用い、X線のエネルギーの
変動に対応して該1次元フレネルゾーンプレートの傾き
を調整することにより焦点位置を不動にするものであ
る。図1に示すように2個のゾーンプレートは、直交し
て配置され、それぞれ入射角を自由に設定できる回転台
に保持されている。そしてそれらは、それぞれ、水平方
向、垂直方向の集光に用いられる。斜め入射の場合、入
射角をθとすると(垂直入射の時θ=90度)、 rn=(nfλ)1/2/sinθ と表せるので、波長を短くしても入射角θを小さくする
ことにより、同じ長さの焦点距離fを得ることができ
る。The present invention uses two one-dimensional Fresnel zone plates, and adjusts the tilt of the one-dimensional Fresnel zone plate in accordance with the fluctuation of the energy of X-rays to thereby adjust the focal position. To immobilize. As shown in FIG. 1, the two zone plates are arranged orthogonally and are held on a turntable that can freely set an incident angle. They are used for light collection in the horizontal and vertical directions, respectively. In the case of oblique incidence, assuming that the incident angle is θ (θ = 90 degrees at normal incidence), it can be expressed as rn = (nfλ) 1/2 / sin θ. As a result, the same focal length f can be obtained.
【0006】[0006]
【発明の実施の形態】例えば、波長2.3nmから4.
4nmの間のX線は水ではほとんど吸収されないが、蛋
白質には1桁以上大きく吸収される。この波長域のX線
を用いれば水中の生物や水を含む生物の内部組織を高い
コントラストで観察することができる。さらには炭素の
吸収端の波長は4.48nmであるが、波長4.4nm
のX線は波長4.5nmのX線より1桁程度炭素中で吸
収されやすいという性質を持つ。同様に窒素の吸収端の
波長は3.16nmであり、3.1nmから4.5nm
までの波長域を一つの素子で集光・分析できれば、炭素
と窒素の成分比も分析可能となる。本発明によると全て
の元素について同様のことが可能となる。DESCRIPTION OF THE PREFERRED EMBODIMENTS For example, a wavelength of 2.3 nm to 4.
X-rays with a wavelength of 4 nm are hardly absorbed by water, but are absorbed by an order of magnitude or more by proteins. By using X-rays in this wavelength range, it is possible to observe the organisms in water and the internal tissues of the organisms including water with high contrast. Further, the wavelength at the absorption edge of carbon is 4.48 nm, but the wavelength is 4.4 nm.
X-rays have a property of being more easily absorbed in carbon by about one digit than X-rays having a wavelength of 4.5 nm. Similarly, the wavelength at the absorption edge of nitrogen is 3.16 nm, and is 3.1 nm to 4.5 nm.
If it is possible to collect and analyze the wavelength range up to one element, the component ratio of carbon and nitrogen can also be analyzed. According to the present invention, the same can be performed for all the elements.
【0007】ゾーンプレートの作製は、紫外光ホログラ
フィック・リソグラフィーあるいは電子ビーム・リソグ
ラフィーによって行うことができる。紫外光ホログラフ
ィック・リソグラフィーとは、ドイツ国のゲッチンゲン
大学において開発された手法であり、波長400nm程
度の2つのレーザーを光源とし、それらによる干渉縞に
より直接ゾーンプレートのパターンを作り、フォトレジ
ストを露光し、反応性イオンエッチング等により作製す
る手法である。[0007] The zone plate can be manufactured by ultraviolet holographic lithography or electron beam lithography. Ultraviolet holographic lithography is a technique developed at the University of Göttingen in Germany. Two lasers with a wavelength of about 400 nm are used as light sources, and the pattern of the zone plate is directly formed by interference fringes from the lasers, exposing the photoresist. Then, it is a method of manufacturing by reactive ion etching or the like.
【0008】電子ビーム・リソグラフィーは、X線ゾー
ンプレートの作製上、現在、最も多く用いられている方
法で、細く絞った電子ビームでゾーンプレートのパター
ンを走査し、ポリメチルメタクリレート等のレジストを
露光し、同様に反応性イオンエッチング等で加工する方
法である。[0008] Electron beam lithography is a method most widely used at present for producing an X-ray zone plate. The pattern of the zone plate is scanned with a narrowly focused electron beam to expose a resist such as polymethyl methacrylate. Then, similarly, it is a method of processing by reactive ion etching or the like.
【0009】ゾーンプレートの材料としては、使用する
X線のエネルギーに応じて、金、銀、ニッケル、タンタ
ル、ゲルマニウム等が用いられる。これまでに作製され
たゾーンプレートで、最も小さい最外ゾーン幅は、数十
nmである。As a material for the zone plate, gold, silver, nickel, tantalum, germanium, or the like is used according to the energy of the X-ray used. The smallest outermost zone width of the zone plate manufactured so far is several tens nm.
【0010】[0010]
【実施例】一次元ゾーンプレートで目的とする波長λを
4.5nm、焦点距離fを20mmとすると、n=30
00程度で線幅は86nm程度になる。この場合ゾーン
プレート全体の大きさは約1mmである。ゾーンプレー
トの材料としてニッケルを用いるとすると、この場合8
0nm程度の厚さで約15%の集光効率が得られる。こ
れを傾けながら波長を走査すると集光点が一定のまま連
続的に変化し34度傾けたところで波長は、3.1nm
であった。DESCRIPTION OF THE PREFERRED EMBODIMENTS Assuming that a target wavelength λ is 4.5 nm and a focal length f is 20 mm in a one-dimensional zone plate, n = 30.
At about 00, the line width becomes about 86 nm. In this case, the size of the entire zone plate is about 1 mm. If nickel is used as the material of the zone plate, in this case 8
A light collection efficiency of about 15% can be obtained with a thickness of about 0 nm. When the wavelength is scanned while tilting this, the focal point is continuously changed while being constant, and the wavelength is 3.1 nm when tilted by 34 degrees.
Met.
【0011】[0011]
【発明の効果】従来のX線の集光は、同心円状の2次元
ゾーンプレートにより行われていたが、これでは、入射
X線の波長λ(エネルギー)により焦点位置が変動して
いたが、本願発明の方法によれば、X線の波長が変化し
ても焦点位置を変化させる必要がない。As described above, the conventional X-ray focusing is performed by a concentric two-dimensional zone plate. In this case, the focal position fluctuates due to the wavelength λ (energy) of the incident X-ray. According to the method of the present invention, it is not necessary to change the focal position even when the wavelength of X-rays changes.
【図1】 本願発明の1次元ゾーンプレートの配置図FIG. 1 is a layout diagram of a one-dimensional zone plate of the present invention.
【図2】 従来の円盤状フレネルゾーンプレートの図FIG. 2 is a diagram of a conventional disk-shaped Fresnel zone plate.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) G01N 23/227 G01N 23/227 G02B 5/18 G02B 5/18 G21K 7/00 G21K 7/00 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) G01N 23/227 G01N 23/227 G02B 5/18 G02B 5/18 G21K 7/00 G21K 7/00
Claims (4)
光方法において、2個の1次元フレネルゾーンプレート
を直交してX線線路に配置することにより、焦点位置を
不動としたことを特徴とするX線集光方法。1. An X-ray focusing method using a Fresnel zone plate, wherein two one-dimensional Fresnel zone plates are orthogonally arranged on an X-ray line so that a focal position is fixed. X-ray focusing method.
入射X線の波長に応じて、上記1次元ゾーンプレートを
傾斜させたことを特徴とするX線集光方法。2. The X-ray focusing method according to claim 1, wherein
An X-ray focusing method, wherein the one-dimensional zone plate is inclined according to the wavelength of incident X-rays.
光装置において、2個の1次元フレネルゾーンプレート
を直交してX線線路に配置し、焦点位置を不動としたこ
とを特徴とするX線集光装置。3. An X-ray condensing apparatus using a Fresnel zone plate, wherein two one-dimensional Fresnel zone plates are orthogonally arranged on an X-ray line, and a focal position is fixed. Light collector.
入射X線の波長に応じて、上記1次元ゾーンプレートを
傾斜させたことを特徴とするX線集光装置。4. The X-ray focusing apparatus according to claim 3, wherein
An X-ray focusing apparatus wherein the one-dimensional zone plate is tilted according to the wavelength of incident X-rays.
Priority Applications (1)
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JP2001154623A JP3643866B2 (en) | 2001-05-23 | 2001-05-23 | X-ray focusing method and X-ray focusing apparatus |
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JP2001154623A JP3643866B2 (en) | 2001-05-23 | 2001-05-23 | X-ray focusing method and X-ray focusing apparatus |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012091269A1 (en) * | 2010-12-29 | 2012-07-05 | 포항공과대학교 산학협력단 | Method for manufacturing x-ray/γ-ray focusing optical system using atomic layer deposition |
JP2013002910A (en) * | 2011-06-15 | 2013-01-07 | Toshiba Corp | Pattern checking method and pattern checking apparatus |
CN102881347A (en) * | 2012-10-15 | 2013-01-16 | 中国科学院上海应用物理研究所 | Method for focusing cylindrical wave line source into point light spot by using zone plate |
-
2001
- 2001-05-23 JP JP2001154623A patent/JP3643866B2/en not_active Expired - Lifetime
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012091269A1 (en) * | 2010-12-29 | 2012-07-05 | 포항공과대학교 산학협력단 | Method for manufacturing x-ray/γ-ray focusing optical system using atomic layer deposition |
KR101195415B1 (en) | 2010-12-29 | 2012-10-29 | 포항공과대학교 산학협력단 | Manufacturing method of X-ray/Gamma-rayG-ray focusing optics using atomic layer deposition |
US9366786B2 (en) | 2010-12-29 | 2016-06-14 | Postech Academy-Industry Foundation | Method for manufacturing X-ray/γ-ray focusing optical system using atomic layer deposition |
JP2013002910A (en) * | 2011-06-15 | 2013-01-07 | Toshiba Corp | Pattern checking method and pattern checking apparatus |
CN102881347A (en) * | 2012-10-15 | 2013-01-16 | 中国科学院上海应用物理研究所 | Method for focusing cylindrical wave line source into point light spot by using zone plate |
CN102881347B (en) * | 2012-10-15 | 2015-05-20 | 中国科学院上海应用物理研究所 | Method for focusing cylindrical wave line source into point light spot by using zone plate |
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