JP2002348388A - Polyimide film and its production method - Google Patents

Polyimide film and its production method

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Publication number
JP2002348388A
JP2002348388A JP2001153694A JP2001153694A JP2002348388A JP 2002348388 A JP2002348388 A JP 2002348388A JP 2001153694 A JP2001153694 A JP 2001153694A JP 2001153694 A JP2001153694 A JP 2001153694A JP 2002348388 A JP2002348388 A JP 2002348388A
Authority
JP
Japan
Prior art keywords
film
polyimide film
filter
polyamic acid
defects
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001153694A
Other languages
Japanese (ja)
Other versions
JP2002348388A5 (en
JP4753167B2 (en
Inventor
Masakazu Okabashi
正和 岡橋
Yoshinori Goto
芳徳 後藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Du Pont Toray Co Ltd
Original Assignee
Du Pont Toray Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont Toray Co Ltd filed Critical Du Pont Toray Co Ltd
Priority to JP2001153694A priority Critical patent/JP4753167B2/en
Publication of JP2002348388A publication Critical patent/JP2002348388A/en
Publication of JP2002348388A5 publication Critical patent/JP2002348388A5/ja
Application granted granted Critical
Publication of JP4753167B2 publication Critical patent/JP4753167B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Moulding By Coating Moulds (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a polyimide film improved in the surface defects caused by a polymer-modification product and an imide-modification product; and a production method for the same. SOLUTION: This polyimide film is characterized in that the density of defects caused by a polymer modification product and an imide modification product on the film surface is 6.0×10<-3> /m<2> or lower. The density of defects is obtained by a method comprising exposing the film surface to incandescence or polarized light, counting the number of projections having lengths of at least 300 μm and holes and air bubbles having lengths of at least 75 μm present on the surface of at least 170 m<2> by using a surface inspection apparatus, and calculating the density of defects by using the above-counted number as the number of defects.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、銅箔を代表とす
る金属箔または金属薄膜が積層された電気配線板の支持
体として使用されるか、またはフレキシブル印刷回路保
護用カバーレイフィルムとして使用されるのに適したポ
リイミドフィルム及びその製造方法に関する。より具体
的には、フィルム表面に付着する欠点が改善されたポリ
イミドフィルムとその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is used as a support for an electric wiring board on which a metal foil represented by a copper foil or a metal thin film is laminated, or as a coverlay film for protecting a flexible printed circuit. And a method for producing the same. More specifically, the present invention relates to a polyimide film having an improved defect attached to the film surface and a method for producing the same.

【0002】[0002]

【従来の技術】ポリイミドフィルムは高耐熱性、高電気
絶縁性を有することから耐熱性を必要とする電気絶縁素
材として広範な産業分野で使用されており、特に銅箔が
積層された電気配線板の支持体としての用途においては
例えばIC等の電気部品と銅箔との接続にはんだを使用
することができ、電気配線の小型軽量化が可能となっ
た。これに伴い、フレキシブル印刷回路基板は、その使
用に範囲が広がり、ポリイミドフィルムの需要も伸びて
いる。しかしながら電気配線板の用途の多様化と共に配
線数の高密度化の進展に伴って電気絶縁支持体としての
性能の向上及び加工性改善の要求が高まってきた。ポリ
イミドフィルムは従来より、テトラカルボン酸成分とジ
アミン成分とを、略等モル、有機極性溶媒中で重合した
ポリアミド酸溶液をキャスティングドラム、ベルトの支
持体上に押出しにより口金からキャストして、加熱し、
化学的または、熱的に閉環または、乾燥して自己支持性
を備える程度に固化させた後、キャスティングドラム又
はエンドレスベルトからフィルム状の樹脂を剥離させて
テンターで加熱、延伸、熱処理され製造されていた。
2. Description of the Related Art Polyimide films are used in a wide range of industrial fields as electrical insulating materials requiring heat resistance because of their high heat resistance and high electrical insulation properties. In the use as a support, for example, solder can be used to connect an electric component such as an IC to a copper foil, and the electric wiring can be reduced in size and weight. Accordingly, the use of flexible printed circuit boards has been expanded, and demand for polyimide films has been growing. However, with the diversification of uses of the electric wiring board and the increase in the number of wirings, the demand for improvement in performance as an electric insulating support and improvement in workability has increased. Conventionally, a polyimide film has a tetracarboxylic acid component and a diamine component, which are substantially equimolar, and a polyamide acid solution polymerized in an organic polar solvent is cast from a die by extrusion onto a casting drum, a support of a belt, and heated. ,
After chemically or thermally ring-closing or drying and solidifying to the extent that it has self-supporting properties, the film-shaped resin is peeled off from the casting drum or endless belt, heated, stretched, and heat-treated with a tenter. Was.

【0003】しかし、ポリイミドフィルム表面の欠点の
生成は、その大部分がフィルム中に存在するポリマー変
性成状物やイミド化変性状物に起因した突起物と穴と気
泡であり、フィルム表面欠点となる問題があった。
However, most of the defects on the polyimide film surface are formed by protrusions, holes and bubbles caused by polymer-modified or imidized-modified substances present in the film. There was a problem.

【0004】ポリマー変性状物とはポリイミドの前駆体
であるポリアミド酸重合中に発生する高粘度ゲル状物で
あり、イミド変性状物とは、重合完了後のポリアミド酸
溶液に脱水剤と脱水触媒を混合時発生する部分イミド化
した不溶性ポリアミド酸である。 ポリイミドフィルム
は、耐熱フレキシブル印刷回路(FPC)等の電子部品
などに使用される場合は、耐熱接着剤をポリイミドフィ
ルム表面に塗布すると塗布ムラ、接着剤ハジキとなり、
歩留まりの低下をきたしていた。
[0004] The polymer-modified product is a high-viscosity gel-like product generated during the polymerization of polyamic acid, which is a precursor of polyimide, and the imide-modified product is a dehydrating agent and a dehydration catalyst added to a polyamic acid solution after polymerization is completed. Is a partially imidized insoluble polyamic acid generated upon mixing. When a polyimide film is used for electronic parts such as a heat-resistant flexible printed circuit (FPC), if a heat-resistant adhesive is applied to the surface of the polyimide film, application unevenness and adhesive cissing occur.
The yield was decreasing.

【0005】一方、特開昭62−156132号には、
100ポイズ以下の低粘度重合液を金属短繊維焼結金属
フィルターで異物を除去する例が示されているが、この
例では、溶媒中の異物や微少なポリマー変性状物を除去
には有効であるもの、300ポイズ以上の粘度で発生す
る高粘度ポリマー変性物除去には効果がなく、FPC等
の歩留まり改善効果がない。また、特開平5−1548
92号では熱可塑性ポリイミド樹脂の押し出し成形に空
孔径が3μm〜50μmの金属焼結フィルターを用いる
例があるが、熱可塑性ポリイミドフィルムは、はんだ耐
熱性が悪く不十分であり、かつ金属粉末燒結金属フィル
ターを使用していなく、ポリマー変性状物の除去には有
効でない。欠点の少ないポリエステルフィルムが、フレ
キシブルプリント回路に使用されることもあるが、はん
だ耐熱性が悪く不十分である。
On the other hand, Japanese Patent Application Laid-Open No. 62-156132 discloses that
An example is shown in which a low-viscosity polymer solution having a viscosity of 100 poises or less is removed with a metal short fiber sintered metal filter. In this example, however, it is effective for removing foreign matter and minute polymer denatured substances in a solvent. However, there is no effect on removing a high-viscosity polymer denatured product generated at a viscosity of 300 poise or more, and there is no effect of improving yield such as FPC. Also, Japanese Patent Application Laid-Open No. H5-1548
In No. 92, there is an example in which a metal sintered filter having a pore diameter of 3 μm to 50 μm is used for extrusion molding of a thermoplastic polyimide resin. However, a thermoplastic polyimide film has insufficient solder heat resistance and is insufficient, and a metal powder sintered metal is used. Since no filter is used, it is not effective for removing polymer-modified substances. Polyester films with few defects are sometimes used for flexible printed circuits, but have insufficient solder heat resistance and are insufficient.

【0006】[0006]

【発明が解決しようとする課題】本発明はかかるポリイ
ミドフィルムの問題点を根本的に解決し、従来のポリイ
ミドフィルとは異なるフィルム表面上のポリマー変性状
物とイミド変性状物起因の欠点が改良されたポリイミド
フィルムとその製造法を提供するものである。
SUMMARY OF THE INVENTION The present invention fundamentally solves the problems of such a polyimide film, and improves the disadvantages caused by polymer-modified products and imide-modified products on a film surface different from the conventional polyimide film. And a method for producing the same.

【0007】[0007]

【課題を解決するための手段】すなわち、本発明はフィ
ルム表面上のポリマー変性状物とイミド変性状物起因に
よる欠点の密度が、6.0×10-3個/m2以下である
ことを特徴とするポリイミドフィルムであり、また、ポ
リアミド酸溶液を押し出して、化学的、熱的に閉環して
ポリイミドフィルムを製膜する過程において、フィルタ
ーとして目開きが1〜30μmの金属粉末焼結金属フィ
ルターを用いてポリアミド酸溶液を濾過することを特徴
とする上記ポリイミドフィルムの製造方法である。
That is, the present invention relates to a method wherein the density of defects caused by a polymer-modified product and an imide-modified product on a film surface is 6.0 × 10 −3 / m 2 or less. In the process of extruding a polyamic acid solution and chemically and thermally closing the polyimide film to form a polyimide film, a metal powder sintered metal filter having a mesh size of 1 to 30 μm as a filter. And filtering the polyamic acid solution using the method.

【0008】本発明の方法を持ちいて製造されたポリイ
ミドフィルムの表面上のポリマー変性状物とイミド化変
性状物起因による欠点を、6.0×10-3個/m2以下
以下にすることにより、フレキシブルプリント回路で問
題となる接着剤はじきの発生が大幅に減少し、歩留まり
が改善できる。
[0008] The defect caused by the polymer-modified product and the imidized-modified product on the surface of the polyimide film produced by the method of the present invention is reduced to not more than 6.0 × 10 -3 / m 2 or less. Accordingly, the occurrence of adhesive repelling, which is a problem in flexible printed circuits, is greatly reduced, and the yield can be improved.

【0009】[0009]

【発明の実施の形態】本発明において、フィルム表面上
のポリマー変性状物とイミド変性状物起因による欠点の
密度とは、フィルム上に現れる突起及び穴の数の密度で
あり、次のようにして測定できる。 <欠点の密度の測定方法>白熱光又は偏光をフィルム表
面に当て、少なくとも170m2以上の表面上に存在す
る長径300μm以上の突起物と長径さ75μm以上の
穴と気泡の数を表面検査装置でカウントし、この数を欠
点の数として、欠点の密度を計算する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention, the density of defects caused by a polymer-modified product and an imide-modified product on the film surface is the density of the number of projections and holes appearing on the film. Can be measured. <Measuring method of defect density> The incandescent light or the polarized light is applied to the film surface, and the number of the protrusions having a long diameter of 300 μm or more, the holes having the long diameter of 75 μm or more, and the number of bubbles existing on the surface of at least 170 m 2 or more are measured with a surface inspection device. Count and use this number as the number of defects to calculate the density of the defects.

【0010】本発明においてはこの欠点の密度が、6.
0×10-3個/m2以下であることが必要である。
In the present invention, the density of this defect is 6.
It is necessary to be 0 × 10 −3 / m 2 or less.

【0011】本発明におけるポリイミドの先駆体である
ポリアミド酸は芳香族テトラカルボン酸類と芳香族ジア
ミン類とからなり次の式1に示される繰り返し単位で構
成されものである。
The polyamic acid, which is a precursor of the polyimide in the present invention, comprises an aromatic tetracarboxylic acid and an aromatic diamine and is composed of a repeating unit represented by the following formula 1.

【0012】[0012]

【化1】 上記式においてR1は少なくとも1個の芳香族環を有す
る4価の有機基で、その炭素数は25以下であるものと
してR1に結合する2つのカルボキシル基の夫々はR1
における芳香族環のアミド基が結合する炭素原子とは相
隣接する炭素原子に結合しているものであり、またR2
は少なくとも1個の芳香族環を有する2価の有機基で、
その炭素数は25以下であるものとし、アミノ基はR2
における芳香族環の炭素原子に結合しているものであ
る。
Embedded image In the above formula, R1 is a tetravalent organic group having at least one aromatic ring, the number of carbon atoms of which is 25 or less, and each of the two carboxyl groups bonded to R1 is R1.
And the carbon atom to which the amide group of the aromatic ring is bonded is a carbon atom bonded to an adjacent carbon atom.
Is a divalent organic group having at least one aromatic ring,
The carbon number is 25 or less, and the amino group is R2
Is bonded to a carbon atom of an aromatic ring.

【0013】上記の芳香族テトラカルボン酸類の具体例
としては、ピロメリット酸、3,3’,4,4’−ビフ
ェニルテトラカルボン酸、2,3’,3,4’−ビフェ
ニルテトラカルボン酸、3,3’,4,4’−ベンゾフ
ェノンテトラカルボン酸、2,3,6,7−ナフタレン
ジカルボン酸、2,2−ビス(3,4−ジカルボキシフ
ェニル)エーテル、ピリジンー2,3,5,6−テトラ
カルボン酸及びこれらのアミド形成性誘導体が挙げられ
る。ポリアミド酸の製造にあたってはこれらの酸無水物
が好ましく使用される。
Specific examples of the above aromatic tetracarboxylic acids include pyromellitic acid, 3,3 ′, 4,4′-biphenyltetracarboxylic acid, 2,3 ′, 3,4′-biphenyltetracarboxylic acid, 3,3 ′, 4,4′-benzophenonetetracarboxylic acid, 2,3,6,7-naphthalenedicarboxylic acid, 2,2-bis (3,4-dicarboxyphenyl) ether, pyridine-2,3,5 6-tetracarboxylic acids and their amide-forming derivatives. In the production of polyamic acid, these acid anhydrides are preferably used.

【0014】上記の芳香族ジアミン類の具体例として
は、パラフェニレンジアミン、メタフェニレンジアミ
ン、ベンチジン、パラキシリレンジアミン、4,4’−
ジアミノジフェニルエーテル、4,4’−ジアミノジフ
ェニルメタン、4,4’−ジアミノジフェニルスルホ
ン、3,3’−ジメチル−4,4’−ジアミノジフェニ
ルメタン、1,5−ジアミノナフタレン、3,3’−ジ
メトキシベンチジン、1,4−ビス(3メチル−5アミ
ノフェニル)ベンゼン及びこれらのアミド形成性誘導体
が挙げられる。中でも、少なくともパラフェニレンジア
ミンを含有させることが好ましい。
Specific examples of the above aromatic diamines include paraphenylenediamine, metaphenylenediamine, benzidine, paraxylylenediamine, 4,4'-
Diaminodiphenyl ether, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylsulfone, 3,3'-dimethyl-4,4'-diaminodiphenylmethane, 1,5-diaminonaphthalene, 3,3'-dimethoxybenzidine , 1,4-bis (3methyl-5aminophenyl) benzene and amide-forming derivatives thereof. Especially, it is preferable to contain at least paraphenylenediamine.

【0015】本発明で使用される有機溶媒の具体例とし
ては、N,N−ジメチルホルムアミド、N,N−ジメチ
ルアセトアミド、N−メチル−2−ピロリドンなども有
機極性アミド系溶媒が挙げられ、これらの有機溶媒は単
独で、又は2つ又はそれ以上を組み合わせて使用して
も、又はベンゼン、トルエン、キシレンのような非溶媒
と組み合わせて使用してもよい。本発明で用いるポリア
ミド酸の有機溶媒溶液は固形分を5〜40重量%、好ま
しくは10〜30重量%を含有しており、またその粘度
はブルックフィールド粘度計による測定値で500〜2
0000ポイズ、好ましくは、1000〜10000ポ
イズのものが安定した送液のために好ましい。また有機
溶媒溶液中のポリアミド酸は部分的にイミド化されても
よく、少量の無機化合物を含有してもよい。
Specific examples of the organic solvent used in the present invention include N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone and the like. May be used alone or in combination of two or more, or may be used in combination with a non-solvent such as benzene, toluene and xylene. The organic solvent solution of polyamic acid used in the present invention contains 5 to 40% by weight, preferably 10 to 30% by weight of solids, and its viscosity is 500 to 2 as measured by a Brookfield viscometer.
0000 poise, preferably 1,000 to 10,000 poise is preferable for stable liquid sending. Further, the polyamic acid in the organic solvent solution may be partially imidized, and may contain a small amount of an inorganic compound.

【0016】本発明において芳香族テトラカルボン酸類
と芳香族ジアミン類とはそれぞれのモル数が大略等しく
なる割合で重合されるかその一方が10モル%、好まし
くは5モル%の範囲内で他方に対して過剰に配合されて
もよい。重合反応は有機溶媒中で攪拌そして/または混
合しながら0〜80度の温度の範囲で10分〜30時間
連続して進められるが、必要により重合反応を分割した
り、温度を上下させてもかまわない。両反応体の添加順
序には特に制限はないが、芳香族ジアミン類の溶液中に
芳香族テトラカルボン酸類を添加するのが好ましい。重
合反応中に真空脱法することは良質なポリアミド酸の有
機溶媒溶液を製造するのに有効な方法である。また重合
反応の前に芳香族ジアミン類に少量の末端封止剤を添加
して重合反応を制御することを行ってもよい。
In the present invention, the aromatic tetracarboxylic acid and the aromatic diamine are polymerized in such a ratio that their mole numbers are substantially equal, or one of them is in the range of 10 mol%, preferably 5 mol%, and the other is in the range of 5 mol%. It may be excessively mixed. The polymerization reaction is carried out continuously for 10 minutes to 30 hours at a temperature of 0 to 80 ° C. with stirring and / or mixing in an organic solvent. However, if necessary, the polymerization reaction may be divided or the temperature may be increased or decreased. I don't care. The order of addition of both reactants is not particularly limited, but it is preferable to add aromatic tetracarboxylic acids to the solution of aromatic diamines. Vacuum removal during the polymerization reaction is an effective method for producing a high quality polyamic acid in an organic solvent solution. Before the polymerization reaction, a small amount of a terminal blocking agent may be added to the aromatic diamine to control the polymerization reaction.

【0017】本発明で使用される閉環触媒の具体例とし
てはトリメチルアミン、トリエチレンジアミン等の脂肪
族第3級アミン、及びイソキノリン、ピリジン、ベータ
ピコリン等の複組環第3級アミンがあげられるが、複組
環式第3級アミンから選ばれる少なくとも一種類のアミ
ンを使用するのが好ましい。
Specific examples of the ring-closing catalyst used in the present invention include aliphatic tertiary amines such as trimethylamine and triethylenediamine, and double-branched tertiary amines such as isoquinoline, pyridine and betapicoline. It is preferable to use at least one kind of amine selected from a polycyclic tertiary amine.

【0018】本発明で使用される脱水剤の具体例として
は無水酢酸、無水プロピオン酸、無水酪酸等の脂肪族カ
ルボン酸無水物、および無水安息香酸等の芳香族カルボ
ン酸無水物があげられるが無水酢酸および/または無水
安息香酸が好ましい。
Specific examples of the dehydrating agent used in the present invention include aliphatic carboxylic anhydrides such as acetic anhydride, propionic anhydride and butyric anhydride, and aromatic carboxylic anhydrides such as benzoic anhydride. Acetic anhydride and / or benzoic anhydride are preferred.

【0019】ポリアミド酸に対する閉環触媒及び脱水剤
の含有量は次の式1、2
The content of the ring-closing catalyst and dehydrating agent with respect to the polyamic acid is represented by the following formulas

【0020】[0020]

【数1】 (Equation 1)

【0021】[0021]

【数2】 となるようにするのが好ましい。またアセチルアセトン
等のゲル化遅延剤を併用してもよい。
(Equation 2) It is preferable that Further, a gel retarder such as acetylacetone may be used in combination.

【0022】ポリアミド酸の有機溶媒からポリイミドフ
ィルムを製造する方法としては、閉環触媒及び脱水剤を
含有しなポリアミド酸の有機溶媒溶液をスリット付き口
金から支持体上に流延してフィルムに成形し、支持体上
で加熱乾燥することにより自己支持性を有するゲルフィ
ルムとなしたる後、支持体より剥離し、更に高温下で乾
燥熱処理することによりイミド化する熱閉環法、及び閉
環触媒及び脱水剤を含有せしめたポリアミド酸の有機溶
媒をスリット付き口金から支持体上に流延してフィルム
状に成形し、支持体上でイミド化を一部進行させて自己
支持性を有するゲルフィルムとした後、支持体より剥離
し、加熱乾燥/イミド化し、熱処理を行う化学閉環法が
代表的な方法である。本発明では、どちらの閉環方法を
採用してもよいが、化学閉環法はポリアミド酸の有機溶
媒溶液に閉環触媒および脱水剤を含有設備を必要とする
が、自己支持性を有するゲルフィルムが短時間で得られ
るのでより好ましい。
As a method for producing a polyimide film from an organic solvent of polyamic acid, an organic solvent solution of polyamic acid containing no ring-closing catalyst and a dehydrating agent is cast from a die having a slit on a support and formed into a film. A thermal ring-closing method in which a gel film having self-supporting properties is formed by heating and drying on a support, then peeled from the support, and further subjected to drying and heat treatment at a high temperature for imidization; and a ring-closing catalyst and dehydration. An organic solvent of polyamic acid containing the agent was cast from a die with a slit onto a support, formed into a film, and partially imidized on the support to form a gel film having self-supporting properties. After that, a typical method is a chemical ring closure method in which the substrate is peeled off from the support, dried by heating / imidization, and heat-treated. In the present invention, either ring-closing method may be adopted, but the chemical ring-closure method requires a facility containing a ring-closing catalyst and a dehydrating agent in an organic solvent solution of polyamic acid, but a gel film having self-supporting properties is short. It is more preferable because it can be obtained in time.

【0023】ポリアミド酸に閉環触媒及び脱水剤を含有
せしめる方法としては、ポリアミド酸の有機溶媒溶液と
閉環触媒及び脱水剤を回転式混合機で混合する方法、ポ
リアミド酸の有機溶媒溶液を静的混合機に送り込みなが
ら該静的混合機の直前で閉館触媒及び脱水剤を注入する
方法、ポリアミド酸の有機溶媒溶液を支持体上に流延し
た後閉環触媒及び脱水剤に接触させる方法等があげられ
るが、閉環触媒及び脱水剤の含有量及びその均一性の面
から混合機で混合して閉環触媒と脱水剤とポリアミド酸
の有機溶媒溶液との混合液をスリット状口金に送り込む
方法が好ましい。該混合液の粘度が100〜10000
ポイズとなるように固形分濃度と温度を調整する必要が
ある。該混合液はポリアミド酸が熱閉環反応し粘度が著
しく高くなり口金から吐出できなくなる性質を持ってい
るため、低温(例えば−10℃)に保持する必要があ
る。
The method for incorporating the ring-closing catalyst and the dehydrating agent into the polyamic acid includes a method in which the organic solvent solution of the polyamic acid and the ring-closing catalyst and the dehydrating agent are mixed by a rotary mixer, a method in which the organic solvent solution of the polyamic acid is statically mixed. A method of injecting a closing catalyst and a dehydrating agent immediately before the static mixer while feeding the mixture into a mixing machine, a method of casting an organic solvent solution of polyamic acid on a support, and then contacting the solution with a ring closing catalyst and a dehydrating agent. However, in view of the content of the ring-closing catalyst and the dehydrating agent and the uniformity thereof, a method of mixing with a mixer and feeding a mixture of the ring-closing catalyst, the dehydrating agent and the organic solvent solution of polyamic acid to the slit die is preferable. The viscosity of the mixture is 100 to 10,000
It is necessary to adjust the solid content concentration and the temperature so as to become poise. Since the polyamic acid has a property in which the viscosity becomes extremely high due to the thermal ring-closing reaction of the polyamic acid and cannot be discharged from the mouthpiece, it needs to be kept at a low temperature (for example, -10 ° C).

【0024】該混合液はスリット状口金を通ってフィル
ム状に成型され、加熱された支持体上に流延され、支持
体上で熱閉環反応をし、自己支持性を有するゲルフィル
ムとなって支持体から剥離される。支持体は金属製の回
転ドラムやエンドレスベルトであり、その温度は液体ま
たは気体の熱媒により、および/または電気ヒーター等
の輻射熱により制御される。
The mixed solution is formed into a film through a slit die, cast on a heated support, and subjected to a thermal ring closure reaction on the support to form a self-supporting gel film. Peeled from the support. The support is a metal rotating drum or an endless belt, the temperature of which is controlled by a liquid or gaseous heating medium and / or by radiant heat such as an electric heater.

【0025】ゲルフィルムは支持体からの受熱および/
または熱風や電気ヒータ等の熱源からの受熱により30
〜200℃、好ましくは40〜150℃に加熱されて閉
環反応し、遊離した有機溶媒等の揮発分を乾燥させるこ
とにより自己支持性を有するようになり、支持体から剥
離される。
The gel film receives heat from the support and / or
Alternatively, heat is received from a heat source, such as hot air or an electric heater, so that 30
Heating to 200 ° C, preferably 40-150 ° C, causes a ring-closing reaction, and by drying the volatile components such as the released organic solvent, the resin has self-supporting properties and is separated from the support.

【0026】支持体から剥離されたゲルフィルムは回転
ロールにより走行速度を規制しながら走行方向に延伸さ
れるのが好ましい。延伸は140℃以下の温度で1.0
5〜1.9倍、好ましくは、1.1〜1.6倍、さらに
好ましくは、1.1〜1.5倍の倍率で実施される。
The gel film peeled from the support is preferably stretched in the running direction while controlling the running speed by a rotating roll. Stretching is performed at a temperature of 140 ° C.
It is performed at a magnification of 5 to 1.9 times, preferably 1.1 to 1.6 times, and more preferably 1.1 to 1.5 times.

【0027】走行方向に延伸されたゲルフィルムは、テ
ンター装置に導入され、テンタークリップに幅方向両端
部を把持されて、テンタークリップと共に走行しなが
ら、幅方向へ延伸される。乾燥ゾーンで、ゲルフィルム
は、乾燥される。
The gel film stretched in the running direction is introduced into a tenter device, and both ends in the width direction are gripped by a tenter clip, and stretched in the width direction while running with the tenter clip. In the drying zone, the gel film is dried.

【0028】以下、本発明の濾過方法を説明する。Hereinafter, the filtration method of the present invention will be described.

【0029】本発明で使用するフィルターは、金属粉末
を均一に積層焼結されたものであり、目開きが1〜30
μmの範囲にあることが好ましく、そして空隙率が25
〜80%の範囲にあることが好ましい。目開きが1μm
以下では、フィルターの圧力損失が大きくなりすぎて、
生産性が低下する。また目開きが30μmを超えるとポ
リマー変性状物の除去が悪くなり、欠点の減少に効果が
ない。金属粉末は、耐腐食性のあるものであれば良い
が、ステンレス綱やハステロイ系等が好ましい。更に、
フィルター形状は、スクリーン型、リーフ型、ペンシル
型等、押し出しの形態やゲル量やフィルターの寿命に応
じて選ぶことができる。また、金属粉末焼結金属フィル
ター前後に他の種類のフィルター、例えば金属短繊維金
属フィルターを組み合わせて使用してよい。金属短繊維
燒結金属フィルターは、繊維を焼結しているため、高粘
度のポリアミド酸溶液を濾過した場合にフィルターの濾
圧が高くなり、金属繊維で形成された網状構造が変形し
て、ポリマー変性状物のように柔軟な構造を持つものを
通してしまうが、金属粉末焼結金属フィルターは、微細
な粉体が3次元編み目構造状に結合しているため、金属
繊維に比べ、高圧で変形することなく、ポリマー変性状
物を破砕、捕捉してしまい、ポリアミド酸溶液のポリマ
ー変成状物の除去には有効である。ポリマー濾過方法
は、粘度100〜10000ポイズのポリアミド酸溶液
の濾過に金属粉末焼結金属フィルターを使用する。好ま
しくは、重合完了後の500〜10000ポイズのアミ
ド酸溶液を金属粉末焼結金属フィルターで濾過する。重
合完了前の100ポイズ未満の低粘度のアミド酸溶液を
濾過すると、その後の重合で高重合なポリマー変性状物
が形成されるので効果がない。
The filter used in the present invention is obtained by uniformly laminating and sintering a metal powder, and has an aperture of 1 to 30.
μm, and a porosity of 25 μm.
It is preferably in the range of 〜80%. 1 μm opening
Below, the pressure loss of the filter becomes too large,
Productivity decreases. On the other hand, if the opening exceeds 30 μm, removal of the polymer-modified substance becomes poor, and there is no effect in reducing defects. The metal powder may be any as long as it has corrosion resistance, but stainless steel, Hastelloy, or the like is preferable. Furthermore,
The shape of the filter can be selected according to the form of extrusion, the amount of gel, and the life of the filter, such as a screen type, a leaf type, and a pencil type. Further, other types of filters, for example, a metal short fiber metal filter may be used in combination before and after the metal powder sintered metal filter. Since metal short-sintered metal filters are made by sintering fibers, the filtration pressure of the filter increases when a high-viscosity polyamic acid solution is filtered, and the network structure formed by metal fibers is deformed, causing Although it passes through a material with a flexible structure such as a denatured material, the metal powder sintered metal filter deforms at a higher pressure than metal fibers because the fine powder is bonded in a three-dimensional stitch structure. Without this, the modified polymer is crushed and trapped, which is effective for removing the modified polymer from the polyamic acid solution. The polymer filtration method uses a metal powder sintered metal filter for filtering a polyamic acid solution having a viscosity of 100 to 10,000 poise. Preferably, the 500 to 10,000 poise amic acid solution after the completion of the polymerization is filtered through a metal powder sintered metal filter. Filtration of a low-viscosity amic acid solution having a viscosity of less than 100 poise before the completion of the polymerization is not effective because a high-polymer modified product is formed in the subsequent polymerization.

【0030】また、化学閉環プロセスでは、脱水剤、脱
水触媒等を混合して口金から支持体にキャストされるた
め、ポリアミド酸溶液を金属粉末焼結金属フィルターで
濾過後、脱水剤と脱水触媒等を混合後口金の間で、目開
きが2〜35μmのフィルターを用いて濾過することが
好ましい。この工程では、イミド化が進行してイミド変
性状物が発生する。フィルターについては、耐腐食性の
あるものであれば良いが、ステンレス綱やハステロイ系
等が好ましい。目開きが2μm以下では、フィルターの
圧力損失が大きくなりすぎて、生産性が低下する。また
目開きが35μmを超えるとイミド変性状物の除去が悪
くなり、欠点の減少に効果がない。フィルターの形式
は、金属繊維焼結金属、金属粉末焼結金属どちらのタイ
プでも良い。
In the chemical ring closure process, a dehydrating agent, a dehydrating catalyst, and the like are mixed and cast from a die to a support. Is preferably filtered using a filter having openings of 2 to 35 μm between the bases after mixing. In this step, imidization proceeds and imide-modified substances are generated. Any filter may be used as long as it has corrosion resistance, but stainless steel, Hastelloy, or the like is preferable. When the opening is 2 μm or less, the pressure loss of the filter becomes too large, and the productivity is reduced. On the other hand, if the opening exceeds 35 μm, the removal of the imide-modified substance becomes poor, and there is no effect on the reduction of defects. The type of filter may be either a metal fiber sintered metal or a metal powder sintered metal.

【0031】[0031]

【実施例】以下実施例により本発明を説明するが、本発
明はこれらの実施例に限定されない。実施例の説明の前
に実施例において使用する評価法を説明する。 <欠点の密度の測定方法>白熱光又は偏光をフィルム表
面に当て、市販のフィルム検査装置(ヒューテック社製
PMAX)を用いてフィルムを走行させ、少なくとも1
70m2以上の表面上に存在する長径300μm以上の
突起物と長径さ75μm以上の穴と気泡の数を表面検査
装置でカウントし、この数を欠点の数として、欠点の密
度を計算した。
EXAMPLES The present invention will be described below with reference to examples, but the present invention is not limited to these examples. Before describing the embodiments, the evaluation method used in the embodiments will be described. <Method of measuring the density of defects> The film was exposed to incandescent light or polarized light, and the film was run using a commercially available film inspection device (PMAX manufactured by Hutec), and at least 1
The number of protrusions having a long diameter of 300 μm or more, holes having a long diameter of 75 μm or more, and bubbles existing on a surface of 70 m 2 or more was counted by a surface inspection device, and the number of defects was calculated using this number as the number of defects.

【0032】実施例1 乾燥したN、N−ジメチルアセトアミド1900.6k
g中に4,4’−ジアミノジフェニールエーテル20
0.024kg(1kmol)を溶解し、20℃で攪拌
しながら、精製した粉末状のピロメリット酸二無水物2
18.12kg(1kmol)を少量ずつ添加し、1時
間攪拌し続けて、透明なポリアミド酸溶液を得た。この
溶液は、20℃で3500ポイスの粘度であった。この
ポリアミド酸溶液を第1フィルターとして20μmの目
開きで空隙率36%の金属粉末焼結金属フィルターで濾
過後、無水酢酸をポリアミド酸単位に対して2.5mo
l、ピリジンをポリアミド酸単位に対して2.0mol
を冷却しながら混合し、第2フィルターとして20μm
の目開きで空隙率71%の金属繊維焼結金属フィルター
で濾過後ポリアミド有機溶媒溶液を得た。このポリアミ
ド酸の有機溶液を−10℃に冷却して、定量供給して製
膜した。口金スリット幅は、1.3mm、長さ1800
mmのTダイから押し出した。90℃の金属エンドレス
ベルト上に流延し、自己支持性のあるゲルフィルムを得
た。ゲルフィルムを金属エンドレスベル上から剥離し
て、65℃の温度で、走行方向に延伸してついでテンタ
で幅方向に延伸した。ゲルフィルムは、260℃の温度
で40秒間乾燥し、ついで430℃で1分間熱処理し
て、冷却ゾーンでリラックスさせながら30秒間冷却
し、フィルムをエッジカットし、フィルム表面を市販の
ウエブクリーナでクリーニング後、幅2000mm、厚
さ25μmのポリイミドフィルムを500m得た。
Example 1 Dried N, N-dimethylacetamide 1900.6 k
4,4'-diaminodiphenyl ether 20 in g
Dissolve 0.024 kg (1 kmol) and stir at 20 ° C. while purifying powdered pyromellitic dianhydride 2
18.12 kg (1 kmol) was added little by little, and stirring was continued for 1 hour to obtain a transparent polyamic acid solution. The solution had a viscosity of 3500 poise at 20 ° C. This polyamic acid solution was used as a first filter, filtered through a metal powder sintered metal filter having a porosity of 36% with 20 μm openings, and acetic anhydride was added in an amount of 2.5 mol per polyamic acid unit.
1, 2.0 mol of pyridine per polyamic acid unit
Is mixed while cooling, and as a second filter, 20 μm
After filtering through a metal fiber sintered metal filter having a porosity of 71% with a mesh opening, a polyamide organic solvent solution was obtained. The organic solution of the polyamic acid was cooled to −10 ° C. and supplied in a fixed amount to form a film. The base slit width is 1.3mm, length 1800
extruded from a mm T die. It was cast on a metal endless belt at 90 ° C. to obtain a self-supporting gel film. The gel film was peeled off from the metal endless bell, stretched in the running direction at a temperature of 65 ° C., and then stretched in the width direction with a tenter. The gel film is dried at a temperature of 260 ° C. for 40 seconds, then heat-treated at 430 ° C. for 1 minute, cooled for 30 seconds while relaxing in a cooling zone, edge-cut the film, and the film surface is cleaned with a commercially available web cleaner. Thereafter, 500 m of a polyimide film having a width of 2000 mm and a thickness of 25 μm was obtained.

【0033】このフィルムの表面欠点の種類と長さを測
定して、個数をカウントしたところ、フィルム表面上の
ポリマー変性状物とイミド変性状物起因の欠点の個数
は、3個で、密度が、3.0×10-3個/m2であっ
た。また、このフィルムに、ポリエステル/エポキシ系
の接着剤をロールコータで塗布して、160℃でドライ
ヤーで乾燥した。このフィルムの該接着面を塗布した面
に電解銅箔を130℃で加圧ラミネートし、24時間キ
ュアーしてフレキシブル銅張りポリイミドシ−トを得
た。接着剤のはじきは、少なく 良好な歩留まりを得
た。
When the type and length of the surface defects of this film were measured and the number thereof was counted, the number of defects caused by the polymer-modified substance and the imide-modified substance on the film surface was 3, and the density was lower. 3.0 × 10 −3 pieces / m 2 . Further, a polyester / epoxy adhesive was applied to this film with a roll coater, and dried at 160 ° C. with a drier. An electrolytic copper foil was laminated under pressure at 130 ° C. on the surface of the film coated with the adhesive surface, and cured for 24 hours to obtain a flexible copper-clad polyimide sheet. Repelling of the adhesive was small and a good yield was obtained.

【0034】実施例2 実施例1において方法は同様にして、第1フィルターの
金属繊維焼結金属フィルターの目開きを30μmとし
た。口金スリット幅は、1.5mm、長さ1500mm
のTダイから押し出した。ゲルフィルムは、260℃の
温度で5分間乾燥し、ついで430℃で10分間熱処理
して、冷却ゾーンでリラックスさせながら60秒間冷却
し、フィルムをエッジカットし、幅1400mm、厚さ
125μmのポリイミドフィルムを300m得た。
Example 2 In the same manner as in Example 1, the aperture of the sintered metal fiber filter of the first filter was set to 30 μm. Cap slit width is 1.5mm, length 1500mm
Extruded from the T-die. The gel film was dried at a temperature of 260 ° C. for 5 minutes, and then heat-treated at 430 ° C. for 10 minutes, cooled in a cooling zone for 60 seconds while relaxing, and edge-cut the film to obtain a polyimide film having a width of 1400 mm and a thickness of 125 μm. 300 m was obtained.

【0035】このフィルムの表面欠点の種類と長さを測
定して、数たところ、フィルム表面上のポリマー変性状
物とイミド変性状物起因による欠点の個数は、2個で、
密度が、4.8×10-3個/m2であった。また、この
フィルムに、ポリエステル/エポキシ系の接着剤をロー
ルコータで塗布して、160℃でドライヤーで乾燥し
た。このフィルムの該接着面を塗布した面に電解銅箔を
130℃で加圧ラミネートし、24時間キュアーしてフ
レキシブル銅張りポリイミドシ−トを得た。接着剤のは
じきは、少なく良好な歩留まりを得た。
The types and lengths of the surface defects of this film were measured and counted. As a result, the number of defects caused by the polymer-modified substance and the imide-modified substance on the film surface was two.
The density was 4.8 × 10 −3 pieces / m 2 . Further, a polyester / epoxy adhesive was applied to this film with a roll coater, and dried at 160 ° C. with a drier. An electrolytic copper foil was laminated under pressure at 130 ° C. on the surface of the film coated with the adhesive surface, and cured for 24 hours to obtain a flexible copper-clad polyimide sheet. Repelling of the adhesive was small and a good yield was obtained.

【0036】実施例3 実施例1において方法は同様にして、第1フィルターの
金属繊維焼結金属フィルターの目開きを5μmとした。
口金スリット幅は、1.2mm、長さ1800mmのT
ダイから押し出した。ゲルフィルムは、260℃の温度
で20分間乾燥し、ついで450℃で30秒間熱処理し
て、冷却ゾーンでリラックスさせながら10秒間冷却
し、フィルムをエッジカットし、幅2000mm、厚さ
12.5μmのポリイミドフィルムを1000m得た。
このフィルムの表面欠点の種類と長さを測定して、個数
を数たところ、フィルム表面上のポリマー変性状物とイ
ミド変性状物起因の欠点の個数は、7個で、密度が、
3.5×10-3個/m2であった。また、このフィルム
に、ポリエステル/エポキシ系の接着剤をロールコータ
で塗布して、160℃でドライヤーで乾燥した。このフ
ィルムの該接着面を塗布した面に電解銅箔を130℃で
加圧ラミネートし、24時間キュアーしてフレキシブル
銅張りポリイミドシ−トを得た。接着剤のはじきは、少
なく良好な歩留まりを得た。
Example 3 In the same manner as in Example 1, the aperture of the metal fiber sintered metal filter of the first filter was set to 5 μm.
The base slit width is 1.2mm, length 1800mm T
Extruded from the die. The gel film was dried at a temperature of 260 ° C. for 20 minutes, then heat-treated at 450 ° C. for 30 seconds, cooled for 10 seconds while relaxing in a cooling zone, edge-cut the film, 2000 mm wide and 12.5 μm thick. 1000 m of a polyimide film was obtained.
The type and length of the surface defects of this film were measured, and the number was counted. The number of defects caused by the polymer-modified product and the imide-modified product on the film surface was 7, and the density was:
It was 3.5 × 10 −3 pieces / m 2 . Further, a polyester / epoxy adhesive was applied to this film with a roll coater, and dried at 160 ° C. with a drier. An electrolytic copper foil was laminated under pressure at 130 ° C. on the surface of the film coated with the adhesive surface, and cured for 24 hours to obtain a flexible copper-clad polyimide sheet. Repelling of the adhesive was small and a good yield was obtained.

【0037】実施例4 実施例1において方法は同様にして、第2フィルターの
20μmの目開きで空隙率71%の金属繊維焼結金属フ
ィルターの代わりに、35μmの目開きで空隙率71%
の金属繊維焼結金属フィルターを使用した。幅2000
mm、厚さ25μmのポリイミドフィルムを500m得
た。
Example 4 In the same manner as in Example 1, the metal filter sintered metal filter having a pore size of 35 μm and a pore ratio of 71% was used instead of the metal fiber sintered metal filter having a pore size of 20 μm and a pore ratio of 71%.
Was used. 2000 width
A polyimide film having a thickness of 25 mm and a thickness of 25 μm was obtained in an amount of 500 m.

【0038】このフィルムの表面欠点の種類を測定し
て、個数を数たところ、フィルム表面上のポリマー変性
状物とイミド変性状物起因の欠点の個数は、5個で、密
度が、5.0×10-3個/m2であった。また、このフ
ィルムに、ポリエステル/エポキシ系の接着剤をロール
コータで塗布して、160℃でドライヤーで乾燥した。
このフィルムの該接着面を塗布した面に電解銅箔を13
0℃で加圧ラミネートし、24時間キュアーしてフレキ
シブル銅張りポリイミドシ−トを得た。接着剤のはじき
は、少なく良好な歩留まりを得た。
The types of surface defects of this film were measured and counted. As a result, the number of defects caused by the polymer-modified product and the imide-modified product on the film surface was 5, and the density was 5. It was 0 × 10 −3 pieces / m 2 . Further, a polyester / epoxy adhesive was applied to this film with a roll coater, and dried at 160 ° C. with a drier.
Electrolytic copper foil is applied to the surface of the film coated with the adhesive
The laminate was pressure-laminated at 0 ° C and cured for 24 hours to obtain a flexible copper-clad polyimide sheet. Repelling of the adhesive was small and a good yield was obtained.

【0039】実施例5 乾燥したN,N−ジメチルアセトアミド1906kg中
に、4,4’−ジアミノジフェニールエーテル140.
02kg(0.7kmol)とパラフェニレンジアミン
32.36kg(0.3kmol)を溶解し、20℃で
攪拌しながら、精製した粉末状のピロメリット酸二無水
物218.12kg(1kmol)を少量ずつ添加し、
1時間攪拌し続けて、透明なポリアミド酸溶液を得た。
この溶液は、20℃で3500ポイスの粘度であった。
このポリアミド酸溶液を第1フィルターとして20μm
の目開きで空隙率36%の金属粉末焼結金属フィルター
で濾過後、このポリアミド酸溶液に、無水酢酸をポリア
ミド酸単位に対して2.5mol、ピリジンをポリアミ
ド酸単位に対して2.0molを冷却しながら混合し、
第2フィルターとして20μmの目開きで空隙率71%
の金属繊維焼結金属フィルターで濾過後ポリアミド有機
溶媒溶液を得た。このポリアミド酸の有機溶液を−10
℃に冷却して、定量供給して性膜した。口金スリット幅
は、1.3mm、長さ1800mmのTダイから押し出
した。90℃の金属エンドレスベルト上に流延し、自己
支持性のあるゲルフィルムを得た。ゲルフィルムを金属
エンドレスベル上から剥離して、65℃の温度で、走行
方向に延伸してついで図−1に示すテンタ装置に導入し
た。テンタで幅方向に延伸した。ゲルフィルムは、26
0℃の温度で40秒間乾燥し、ついで430℃で1分間
熱処理して、冷却ゾーンでリラックスさせながら30秒
間冷却し、フィルムをエッジカットし、幅2000m
m、厚さ25μmのポリイミドフィルムを500m得
た。
Example 5 140,4'-Diaminodiphenyl ether in 1906 kg of dried N, N-dimethylacetamide.
Dissolve 02 kg (0.7 kmol) and 32.36 kg (0.3 kmol) of paraphenylenediamine and add 218.12 kg (1 kmol) of purified powdered pyromellitic dianhydride little by little while stirring at 20 ° C. And
Stirring was continued for 1 hour to obtain a clear polyamic acid solution.
The solution had a viscosity of 3500 poise at 20 ° C.
This polyamic acid solution was used as a first filter at 20 μm.
After filtering through a metal powder sintered metal filter having a porosity of 36% through the openings of the above, 2.5 mol of acetic anhydride and 2.0 mol of pyridine with respect to the polyamic acid unit were added to the polyamic acid solution. Mix while cooling,
As a second filter, porosity is 71% with 20 μm aperture
After filtration through a metal fiber sintered metal filter, a polyamide organic solvent solution was obtained. This organic solution of polyamic acid was added to -10
After cooling to ° C., a fixed amount was supplied to form a film. The die slit width was extruded from a T die of 1.3 mm and length of 1800 mm. It was cast on a metal endless belt at 90 ° C. to obtain a self-supporting gel film. The gel film was peeled off from the metal endless bell, stretched in the running direction at a temperature of 65 ° C., and then introduced into a tenter device shown in FIG. The film was stretched in the width direction with a tenter. The gel film is 26
Dried at a temperature of 0 ° C. for 40 seconds, then heat-treated at 430 ° C. for 1 minute, cooled for 30 seconds while relaxing in a cooling zone, edge-cut the film, and 2,000 m wide.
m, a polyimide film having a thickness of 25 μm was obtained in an amount of 500 m.

【0040】このフィルムの表面欠点の種類と長さを測
定して、個数を数たところ、フィルム表面上のポリマー
変性状物とイミド変性状物起因の欠点の個数は、0個
で、密度が、0.0×10-3個/m2であった。また、
このフィルムに、ポリエステル/エポキシ系の接着剤を
ロールコータで塗布して、160℃でドライヤーで乾燥
した。このフィルムの該接着面を塗布した面に電解銅箔
を130℃で加圧ラミネートし、24時間キュアーして
フレキシブル銅張りポリイミドシ−トを得た。接着剤の
はじきは、少なく 良好な歩留まりを得た。
The type and length of the surface defects of this film were measured and the number was counted. As a result, the number of defects caused by the polymer-modified product and the imide-modified product on the film surface was 0, and the density was lower. , 0.0 × 10 −3 / m 2 . Also,
A polyester / epoxy adhesive was applied to this film with a roll coater and dried at 160 ° C. with a dryer. An electrolytic copper foil was laminated under pressure at 130 ° C. on the surface of the film coated with the adhesive surface, and cured for 24 hours to obtain a flexible copper-clad polyimide sheet. Repelling of the adhesive was small and a good yield was obtained.

【0041】実施例6 乾燥したN,N−ジメチルアセトアミド1942kg中
に、4,4’−ジアミノジフェニールエーテル160.
02kg(0.8kmol)とパラフェニレンジアミン
21.58kg(0.2kmol)を溶解し、20℃で
攪拌しながら、精製した粉末状のピロメリット酸二無水
物141.78kg(0.65kmol)と3,3’−
4,4’−ビフェニルテトラカルボン酸・二無水物10
2.98(0.35kmol)を少量ずつ添加し、1時
間攪拌し続けて、透明なポリアミド酸溶液を得た。この
溶液は、20℃で3500ポイスの粘度であった。この
ポリアミド酸溶液を第1フィルターとして20μmの目
開きで空隙率36%の金属粉末焼結金属フィルターで濾
過後、このポリアミド酸溶液に、無水酢酸をポリアミド
酸単位に対して2.5mol、ピリジンをポリアミド酸
単位に対して2.0molを冷却しながら混合し、第2
フィルターとして20μmの目開きで空隙率71%の金
属繊維焼結金属フィルターで濾過後ポリアミド有機溶媒
溶液を得た。このポリアミド酸の有機溶液を−10℃に
冷却して、定量供給して性膜した。口金スリット幅は、
1.3mm、長さ1800mmのTダイから押し出し
た。90℃の金属エンドレスベルト上に流延し、自己支
持性のあるゲルフィルムを得た。ゲルフィルムを金属エ
ンドレスベル上から剥離して、65℃の温度で、走行方
向に延伸してついでテンタ装置に導入した。テンタで幅
方向に延伸した。ゲルフィルムは、260℃の温度で4
0秒間乾燥し、ついで430℃で1分間熱処理して、冷
却ゾーンでリラックスさせながら30秒間冷却し、フィ
ルムをエッジカットし、幅2000mm、厚さ25μm
のポリイミドフィルムを500m得た。
Example 6 4,4'-Diaminodiphenyl ether in 1942 kg of dried N, N-dimethylacetamide
While dissolving 02 kg (0.8 kmol) and 21.58 kg (0.2 kmol) of paraphenylenediamine and stirring at 20 ° C., 141.78 kg (0.65 kmol) of purified powdery pyromellitic dianhydride and 3 , 3'-
4,4'-biphenyltetracarboxylic acid dianhydride 10
2.98 (0.35 kmol) was added little by little, and stirring was continued for 1 hour to obtain a transparent polyamic acid solution. The solution had a viscosity of 3500 poise at 20 ° C. This polyamic acid solution was used as a first filter, filtered through a metal powder sintered metal filter having a porosity of 36% with 20 μm openings, and then 2.5 mol of acetic anhydride and pyridine were added to the polyamic acid solution. 2.0 mol was mixed with the polyamide acid unit while cooling, and the second
As a filter, a polyamide organic solvent solution was obtained after filtration through a metal fiber sintered metal filter having a porosity of 71% with 20 μm openings. The organic solution of the polyamic acid was cooled to −10 ° C. and supplied quantitatively to form a film. The base slit width is
Extruded from a 1.3 mm, 1800 mm long T-die. It was cast on a metal endless belt at 90 ° C. to obtain a self-supporting gel film. The gel film was peeled off from the metal endless bell, stretched in the running direction at a temperature of 65 ° C., and then introduced into a tenter device. The film was stretched in the width direction with a tenter. The gel film is 4 times at a temperature of 260 ° C.
Dry for 0 seconds, then heat treat at 430 ° C. for 1 minute, cool for 30 seconds while relaxing in the cooling zone, cut the film edge, 2000 mm wide and 25 μm thick
500 m of a polyimide film was obtained.

【0042】このフィルムの表面欠点の種類と長さを測
定して、個数を数たところ、フィルム表面上のポリマー
変性状物とイミド変性状物起因の欠点の個数は、0個
で、密度が、0.0×10-3個/m2であった。また、
このフィルムに、ポリエステル/エポキシ系の接着剤を
ロールコータで塗布して、160℃でドライヤーで乾燥
した。このフィルムの該接着面を塗布した面に電解銅箔
を130℃で加圧ラミネートし、24時間キュアーして
フレキシブル銅張りポリイミドシ−トを得た。接着剤の
はじきは、少なく良好な歩留まりを得た。
When the type and length of surface defects of this film were measured and the number thereof was counted, the number of defects caused by the polymer-modified product and the imide-modified product on the film surface was 0, and the density was lower. , 0.0 × 10 −3 / m 2 . Also,
A polyester / epoxy adhesive was applied to this film with a roll coater and dried at 160 ° C. with a dryer. An electrolytic copper foil was laminated under pressure at 130 ° C. on the surface of the film coated with the adhesive surface, and cured for 24 hours to obtain a flexible copper-clad polyimide sheet. Repelling of the adhesive was small and a good yield was obtained.

【0043】上記実施例の結果を表1にまとめた。Table 1 summarizes the results of the above examples.

【0044】[0044]

【表1】 比較例1 実施例5において方法は同様にして、無水酢酸をポリア
ミド酸単位に対して2.5mol、ピリジンをポリアミ
ド酸単位に対して2.0molを冷却しながら混合し、
第1フィルターの20μmの目開きで空隙率71%の金
属繊維焼結金属フィルターを使用しないで、ポリアミド
有機溶媒溶液を得た。幅2000mm、厚さ25μmの
ポリイミドフィルムを500m得た。
[Table 1] Comparative Example 1 In the same manner as in Example 5, acetic anhydride was mixed with 2.5 mol based on the polyamic acid unit, and pyridine was mixed with 2.0 mol based on the polyamic acid unit while cooling the mixture.
A polyamide organic solvent solution was obtained without using a metal fiber sintered metal filter having a pore size of 20% of the first filter and a porosity of 71%. 500 m of a polyimide film having a width of 2000 mm and a thickness of 25 μm was obtained.

【0045】このフィルムの表面欠点の種類と長さを測
定して、個数を数たところ、フィルム表面上のポリマー
変性状物とイミド変性状物起因の欠点の個数は、60個
で、密度が、60.0×10-3個/m2であった。ま
た、このフィルムに、ポリエステル/エポキシ系の接着
剤をロールコータで塗布して、160℃でドライヤーで
乾燥した。このフィルムの該接着面を塗布した面に電解
銅箔を130℃で加圧ラミネートし、24時間キュアー
してフレキシブル銅張りポリイミドシ−トを得た。接着
剤のはじきは、多発して、歩留まりは悪かった。
The type and length of the surface defects of this film were measured, and the number was counted. As a result, the number of defects caused by the polymer-modified product and the imide-modified product on the film surface was 60, and the density was lower. , 60.0 × 10 −3 pieces / m 2 . Further, a polyester / epoxy adhesive was applied to this film with a roll coater, and dried at 160 ° C. with a drier. An electrolytic copper foil was laminated under pressure at 130 ° C. on the surface of the film coated with the adhesive surface, and cured for 24 hours to obtain a flexible copper-clad polyimide sheet. The adhesive was repelled frequently and the yield was poor.

【0046】比較例2 実施例5において方法は同様にして、第1フィルターの
20μmの目開きで空隙率36%の金属粉末繊維焼結金
属フィルターの代わりに、20μmの目開きで空隙率7
1%の金属繊維焼結金属フィルターを使用して、幅20
00mm、厚さ25μmのポリイミドフィルムを100
0m得た。
Comparative Example 2 In the same manner as in Example 5, instead of the metal powder fiber sintered metal filter having a porosity of 36% with a 20 μm opening of the first filter, a porosity of 7 with a 20 μm opening was used.
Using a 1% metal fiber sintered metal filter, width 20
100 mm polyimide film 25 μm thick
0 m was obtained.

【0047】このフィルムの表面欠点の種類と長さ測定
して、個数を数たところ、フィルム表面上のポリマー変
性状物とイミド変性状物起因の欠点の個数は、65個
で、密度が、32.5×10-3個/m2であった。ま
た、このフィルムに、ポリエステル/エポキシ系の接着
剤をロールコータで塗布して、160℃でドライヤーで
乾燥した。このフィルムの該接着面を塗布した面に電解
銅箔を130℃で加圧ラミネートし、24時間キュアー
してフレキシブル銅張りポリイミドシ−トを得た。接着
剤のはじきは、多発して、歩留まりは悪かった。
The type and length of the surface defects of this film were measured and the number was counted. The number of defects caused by the polymer-modified product and the imide-modified product on the film surface was 65, and the density was: It was 32.5 × 10 −3 pieces / m 2 . Further, a polyester / epoxy adhesive was applied to this film with a roll coater, and dried at 160 ° C. with a drier. An electrolytic copper foil was laminated under pressure at 130 ° C. on the surface of the film coated with the adhesive surface, and cured for 24 hours to obtain a flexible copper-clad polyimide sheet. The adhesive was repelled frequently and the yield was poor.

【0048】比較例3 実施例5において方法は同様にして、第1フィルターの
20μmの目開きで空隙率36%の金属粉末繊維焼結金
属フィルターの代わりに、35μmの目開きで空隙36
%の金属粉末焼結金属フィルターを使用して、幅200
0mm、厚さ25μmのポリイミドフィルムを1000
m得た。
COMPARATIVE EXAMPLE 3 The same procedure as in Example 5 was repeated, except that the metal powder fiber sintered metal filter having a porosity of 36% with a 20 μm mesh of the first filter was replaced with a 35 μm mesh with a gap of 36 mm.
% Metal powder using a sintered metal filter
0mm, 25μm thick polyimide film 1000
m was obtained.

【0049】このフィルムの表面欠点の種類と長さを測
定して、個数を数たところ、フィルム表面上のポリマー
変性状物とイミド変性状物起因の欠点の個数は、20個
で、密度が、10×10-3個/m2であった。また、こ
のフィルムに、ポリエステル/エポキシ系の接着剤をロ
ールコータで塗布して、160℃でドライヤーで乾燥し
た。このフィルムの該接着面を塗布した面に電解銅箔を
130℃で加圧ラミネートし、24時間キュアーしてフ
レキシブル銅張りポリイミドシ−トを得た。接着剤のは
じきは、多発して、歩留まりは悪かった。
The type and length of the surface defects of this film were measured, and the number was counted. As a result, the number of defects caused by the polymer-modified product and the imide-modified product on the film surface was 20, and the density was lower. 10 × 10 −3 / m 2 . Further, a polyester / epoxy adhesive was applied to this film with a roll coater, and dried at 160 ° C. with a drier. An electrolytic copper foil was laminated under pressure at 130 ° C. on the surface of the film coated with the adhesive surface, and cured for 24 hours to obtain a flexible copper-clad polyimide sheet. The adhesive was repelled frequently and the yield was poor.

【0050】比較例4 実施例6において方法は同様にして、第1フィルターの
20μmの目開きで空隙率36%の金属粉末繊維焼結金
属フィルターの代わりに、0.9μmの目開きで空隙1
0%の金属粉末焼結金属フィルターを使用した。濾過圧
が上がりすぎて、製膜が安定しなく、ポリイミドフィル
ムを得ることができなかった。
Comparative Example 4 In the same manner as in Example 6, instead of the metal powder fiber sintered metal filter having the porosity of 36% with the aperture of 20 μm of the first filter, the gap of the pore 1 with the aperture of 0.9 μm was used.
A 0% metal powder sintered metal filter was used. The filtration pressure was too high, the film formation was not stable, and a polyimide film could not be obtained.

【0051】比較例5 実施例6において方法は同様にして、第2フィルターの
20μmの目開きで空隙率71%の金属繊維焼結金属フ
ィルターの代わりに、40μmの目開きで空隙率71%
の金属繊維焼結金属フィルターを使用した。幅2000
mm、厚さ25μmのポリイミドフィルムを1000m
得た。
COMPARATIVE EXAMPLE 5 In the same manner as in Example 6, the metal filter sintered metal filter having a porosity of 71% with a 20 μm aperture of the second filter was replaced with a porosity of 71% with a 40 μm aperture.
Was used. 2000 width
mm, 25μm thick polyimide film 1000m
Obtained.

【0052】このフィルムの表面欠点の種類と長さを測
定して、個数を数たところ、フィルム表面上のポリマー
変性状物とイミド変性状物起因の欠点の個数は、20個
で、密度が、10×10-3個/m2であった。また、こ
のフィルムに、ポリエステル/エポキシ系の接着剤をロ
ールコータで塗布して、160℃でドライヤーで乾燥し
た。このフィルムの該接着面を塗布した面に電解銅箔を
130℃で加圧ラミネートし、24時間キュアーしてフ
レキシブル銅張りポリイミドシ−トを得た。接着剤のは
じきは、多発して、歩留まりは悪かった。
The type and length of the surface defects of this film were measured and the number was counted. As a result, the number of defects caused by the polymer-modified substance and the imide-modified substance on the film surface was 20, and the density was lower. 10 × 10 −3 / m 2 . Further, a polyester / epoxy adhesive was applied to this film with a roll coater, and dried at 160 ° C. with a drier. An electrolytic copper foil was laminated under pressure at 130 ° C. on the surface of the film coated with the adhesive surface, and cured for 24 hours to obtain a flexible copper-clad polyimide sheet. The adhesive was repelled frequently and the yield was poor.

【0053】比較例6 実施例6において方法は同様にして、第2フィルターの
20μmの目開きで空隙率71%の金属繊維焼結金属フ
ィルターの代わりに、1μmの目開きで空隙率50%の
金属繊維焼結金属フィルターを使用した。濾過圧が上が
りすぎて、製膜が安定しなく、ポリイミドフィルムを得
ることができなかった。
Comparative Example 6 In the same manner as in Example 6, the metal filter sintered metal filter having a porosity of 71% with a 20 μm opening of the second filter was replaced with a 50% porosity with a 1 μm opening. A metal fiber sintered metal filter was used. The filtration pressure was too high, the film formation was not stable, and a polyimide film could not be obtained.

【0054】上記比較例の結果を表2にまとめた。Table 2 summarizes the results of the above comparative example.

【0055】[0055]

【表2】 [Table 2]

【0056】[0056]

【発明の効果】ポリアミド酸溶液を押し出して、化学
的、熱的に閉環してポリイミドフィルムを製膜する過程
において、フィルターとして目開きが1〜30μmの金
属粉末焼結金属フィルターを用いて濾過するを特徴とす
るすることにより、フィルム表面上のポリマー変成状物
起因の欠点少ない良好なポリイミドフィルムができ、更
に、フィルム表面上のポリマー変性状物とイミド変性物
起因による欠点個数が、6.0×10-3個/m2以下に
することにより、微少な表面付着物により引き起こされ
る接着剤はじき欠点も大幅に減少して、FPCとして歩
留まりも良好であり、優れた効果を奏するものである。
According to the present invention, in the process of extruding a polyamic acid solution and chemically and thermally closing the ring to form a polyimide film, a metal powder sintered metal filter having a mesh size of 1 to 30 μm is filtered as a filter. Thus, a good polyimide film having few defects caused by the polymer denatured product on the film surface can be obtained, and the number of defects caused by the polymer modified product and the imide denatured product on the film surface is 6.0. When the content is not more than × 10 −3 / m 2 , the adhesive repelling defect caused by minute surface deposits is greatly reduced, and the yield as FPC is good, and excellent effects are exhibited.

フロントページの続き Fターム(参考) 4F071 AA60 AA88 AG02 AG28 AH13 BA02 BB02 BB06 BB08 BB12 BC13 BC14 4F205 AA40 AC05 AG01 AH36 GA07 GB02 GE02 GE16 Continued on the front page F term (reference) 4F071 AA60 AA88 AG02 AG28 AH13 BA02 BB02 BB06 BB08 BB12 BC13 BC14 4F205 AA40 AC05 AG01 AH36 GA07 GB02 GE02 GE16

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】フィルム表面上のポリマー変性状物とイミ
ド変性状物起因による欠点の密度が、下記測定方法で測
定した結果、6.0×10-3個/m2以下であることを
特徴とするポリイミドフィルム。 <欠点の密度の測定方法>白熱光又は偏光をフィルム表
面に当て、少なくとも170m2以上の表面上に存在す
る長径300μm以上の突起物と長径75μm以上の穴
と気泡の数を表面検査装置でカウントし、この数を欠点
の数として、欠点の密度を計算する。
The density of a defect caused by a polymer-modified product and an imide-modified product on the film surface is 6.0 × 10 −3 / m 2 or less as measured by the following measuring method. Polyimide film. <Measurement method of defect density> The incandescent light or polarized light was applied to the film surface, and the number of protrusions having a long diameter of 300 μm or more, holes having a long diameter of 75 μm or more, and bubbles existing on a surface of at least 170 m 2 was counted by a surface inspection device. Then, using this number as the number of defects, the density of the defects is calculated.
【請求項2】ポリイミドのアミン成分がパラフェニレン
ジアミンに由来するものを含んでいることを特徴とする
請求項1に記載のポリイミドフィルム。
2. The polyimide film according to claim 1, wherein the amine component of the polyimide contains one derived from paraphenylenediamine.
【請求項3】 ポリアミド酸溶液を押し出して、化学
的、熱的に閉環してポリイミドフィルムを製膜する過程
において、フィルターとして目開きが1〜30μmの金
属粉末焼結金属フィルターを用いてポリアミド酸溶液を
濾過するを特徴とする請求項1または2に記載のポリイ
ミドフィルムの製造方法。
3. In the process of extruding a polyamic acid solution and chemically and thermally closing a polyimide film to form a polyimide film, a polyamic acid sintered metal filter having a mesh size of 1 to 30 μm is used as a filter. 3. The method for producing a polyimide film according to claim 1, wherein the solution is filtered.
【請求項4】 ポリアミド酸溶液の粘度が、100ポイ
ズ以上であることを特徴とする請求項3に記載のポリイ
ミドフィルムの製造方法。
4. The method for producing a polyimide film according to claim 3, wherein the viscosity of the polyamic acid solution is 100 poise or more.
【請求項5】 フィルターとして目開きが1〜30μm
の金属粉末焼結金属フィルターを用いて濾過後、脱水
剤、脱水触媒を混合後、目開きが2〜35μmのフィル
ターを用いて濾過後口金から押し出して製膜することを
特徴とする請求項3または4に記載のポリイミドフィル
ムの製造方法。
5. A filter having an aperture of 1 to 30 μm.
4. Filtering using a metal powder sintered metal filter, mixing a dehydrating agent and a dehydrating catalyst, and extruding from a die after filtration using a filter having an aperture of 2 to 35 μm to form a film. Or the method for producing a polyimide film according to 4.
【請求項6】 ポリアミド酸が、アミン成分としてパラ
フェニレンジアミンを含むことを特徴とする請求項3〜
5のいずれかに記載のポリイミドフィルムの製造方法。
6. The polyamide acid according to claim 3, wherein the polyamic acid contains paraphenylenediamine as an amine component.
5. The method for producing a polyimide film according to any one of 5.
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008144099A (en) * 2006-12-13 2008-06-26 Toyobo Co Ltd Polyimide film and method for producing the same
US9024312B2 (en) 2009-09-30 2015-05-05 Dai Nippon Printing Co., Ltd. Substrate for flexible device, thin film transistor substrate for flexible device, flexible device, substrate for thin film element, thin film element, thin film transistor, method for manufacturing substrate for thin film element, method for manufacturing thin film element, and method for manufacturing thin film transistor
WO2020080598A1 (en) * 2018-10-19 2020-04-23 에스케이씨코오롱피아이 주식회사 Thick polyimide film having improved surface quality and method for manufacturing same

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JPH11156920A (en) * 1997-11-27 1999-06-15 Toray Ind Inc Manufacture of resin film
JPH10251420A (en) * 1998-04-06 1998-09-22 Ube Ind Ltd Preparation of self-supporting polyimide film containing inorganic fine particle
JP2000063542A (en) * 1998-08-18 2000-02-29 Toray Ind Inc Biaxially-oriented polyimide film
JP2000119521A (en) * 1998-10-16 2000-04-25 Du Pont Toray Co Ltd Copolymerized polyimide film, its production and metal wiring circuit board using the film as substrate
JP2001247689A (en) * 2000-03-07 2001-09-11 Asahi Kasei Corp Preparation method of heat-resistant film

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008144099A (en) * 2006-12-13 2008-06-26 Toyobo Co Ltd Polyimide film and method for producing the same
US9024312B2 (en) 2009-09-30 2015-05-05 Dai Nippon Printing Co., Ltd. Substrate for flexible device, thin film transistor substrate for flexible device, flexible device, substrate for thin film element, thin film element, thin film transistor, method for manufacturing substrate for thin film element, method for manufacturing thin film element, and method for manufacturing thin film transistor
KR20160130876A (en) 2009-09-30 2016-11-14 다이니폰 인사츠 가부시키가이샤 Substrate for flexible device, thin film transistor substrate for flexible device, flexible device, substrate for thin film element, thin film element, thin film transistor, method for manufacturing substrate for thin film element, method for manufacturing thin film element, and method for manufacturing thin film transistor
WO2020080598A1 (en) * 2018-10-19 2020-04-23 에스케이씨코오롱피아이 주식회사 Thick polyimide film having improved surface quality and method for manufacturing same
US11945922B2 (en) 2018-10-19 2024-04-02 Pi Advanced Materials Co., Ltd. Thick polyimide film having improved surface quality and method of manufacturing same

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