JP2002332314A5 - - Google Patents

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JP2002332314A5
JP2002332314A5 JP2001140775A JP2001140775A JP2002332314A5 JP 2002332314 A5 JP2002332314 A5 JP 2002332314A5 JP 2001140775 A JP2001140775 A JP 2001140775A JP 2001140775 A JP2001140775 A JP 2001140775A JP 2002332314 A5 JP2002332314 A5 JP 2002332314A5
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JP2002332314A (en
JP4691826B2 (en
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【特許請求の範囲】
【請求項1】(A)フマル酸ジエステルに基づく構成単位と(B)カルボキシル基含有単量体に基づく構成単位を含むポリフマレート。
【請求項2】(A)下記式(1)で表されるフマル酸ジエステルに基づく構成単位と(B)カルボキシル基含有単量体に基づく構成単位を1個以上有する化合物であって、分子量が1,000〜300,000で、かつその酸価が50〜250mgKOH/gであるポリフマレート。
【化1】

Figure 2002332314
(ただし、式中のX1およびX2は同一でも異なっていてもよく、炭素数3〜8の分岐アルキル基もしくは置換分岐アルキル基、または炭素数4〜8のシクロアルキル基もしくは置換シクロアルキル基を表す。)
【請求項3】(A)下記式(1)で表されるフマル酸ジエステルに基づく構成単位と(B)カルボキシル基含有単量体に基づく構成単位を有する化合物であって、分子中に(A)、(B)成分が70重量%以上で、(A)成分が50〜95重量%であり、分子量が5,000〜200,000で、その酸価が70〜200mgKOH/gであるポリフマレート。
【化2】
Figure 2002332314
(ただし、式中のX1およびX2は前記と同じものを表す。)
【請求項4】(A)下記式(1)で表されるフマル酸ジエステルに基づく構成単位と(B)下記式(2)で表される繰り返し構成単位、下記式(5)で表される繰り返し構成単位および下記式(6)で表される繰り返し構成単位からなるブロックカルボン酸に基づく構成単位群から選ばれる1種以上の構成単位とからなる共重合体前駆体を脱ブロック反応することにより得られる請求項1〜3のいずれか1項に記載のカルボキシル基を有するポリフマレート。
【化3】
Figure 2002332314
(ただし、式中のX1およびX2は同一でも異なっていてもよく、炭素数3〜8の分岐アルキル基もしくは置換分岐アルキル基、または炭素数4〜8のシクロアルキル基もしくは置換シクロアルキル基を表す。)
【化4】
Figure 2002332314
(ただし、式中のY1およびY2は同一でも異なっていてもよく、炭素数3〜8の分岐アルキル基もしくは置換分岐アルキル基、または炭素数4〜8のシクロアルキル基もしくは置換シクロアルキル基を示し、分子中のY1またはY2の少なくとも一方は下記式(3)または(4)で表される基を示す。)
【化5】
Figure 2002332314
【化6】
Figure 2002332314
(ただし、式(3)、(4)中のR1、R2およびR3はそれぞれ水素原子もしくは炭素数1〜18の有機基であり、R4は炭素数1〜18の有機基であり、そしてZ1は酸素原子またはイオウ原子である。R5とR6は炭素数1〜18の有機基を示す。)
【化7】
Figure 2002332314
(ただし、式中のY1およびY2は前記式(2)と同じものを表す。)
【化8】
Figure 2002332314
(ただし、式中のY3は下記式(3)または(4)で表される。またDはベンジル基であり、nは0または1であり、Eは水素原子またはメチル基を表す。)
【化9】
Figure 2002332314
【化10】
Figure 2002332314
(ただし、式(3)、(4)中のR1、R2、R3、R4およびR5は前記と同じものを表す。)
【請求項5】請求項1〜3のいずれか1項に記載のカルボキシル基を有するポリフマレートの製造方法であって、下記の第1および第2の工程からなることを特徴とするポリフマレートの製造方法。
第1の工程:下記式(7)で表されるフマル酸ジエステルと、下記式(8)で表される重合性単量体、下記式(9)で表される重合性単量体および下記式(10)で表される重合性単量体からなる群から選ばれる1種以上の重合性単量体とを共重合することにより共重合体前駆体を得る、第2の工程:第1の工程で得られた共重合体前駆体を脱ブロック反応する。
【化11】
Figure 2002332314
(ただし、式中のX1およびX2は同一でも異なっていてもよく、炭素数3〜8の分岐アルキル基または置換分岐アルキル基、または炭素数4〜8のシクロアルキル基もしくは置換シクロアルキル基を表す。)
【化12】
Figure 2002332314
(ただし、式中のY1およびY2は同一でも異なっていてもよく、炭素数3〜8の分岐アルキル基もしくは置換分岐アルキル基、または炭素数4〜8のシクロアルキル基もしくは置換シクロアルキル基を示し、分子中のY1またはY2の少なくとも一方は下記式(3)または(4)で表される基を示す。)
【化13】
Figure 2002332314
【化14】
Figure 2002332314
(ただし、式(3)、(4)中のR1、R2およびR3はそれぞれ水素原子もしくは炭素数1〜18の有機基であり、R4は炭素数1〜18の有機基であり、そしてZ1は酸素原子またはイオウ原子である。R5とR6は炭素数1〜18の有機基である。)
【化15】
Figure 2002332314
(ただし、式中のY1およびY2は前記式(2)と同じものを表す。)
【化16】
Figure 2002332314
(ただし、式中のY3、D、nおよびEは前記と同じものを表す。)
【請求項6】請求項1〜4のいずれか1項に記載のカルボキシル基を有するポリフマレートからなる感光性樹脂組成物用アルカリ現像性ベース樹脂。 [Claims]
1. A polyfumarate comprising (A) a structural unit based on a fumaric diester and (B) a structural unit based on a carboxyl group-containing monomer.
2. A compound having (A) a structural unit based on a fumaric acid diester represented by the following formula (1) and (B) one or more structural units based on a carboxyl group-containing monomer, and having a molecular weight of: A polyfumarate having an acid value of 1,000 to 300,000 and an acid value of 50 to 250 mgKOH / g.
Embedded image
Figure 2002332314
(However, X 1 and X 2 in the formula may be the same or different, and are a branched alkyl group or substituted branched alkyl group having 3 to 8 carbon atoms, or a cycloalkyl group or substituted cycloalkyl group having 4 to 8 carbon atoms.) Represents.)
3. A compound having (A) a structural unit based on a fumaric acid diester represented by the following formula (1) and (B) a structural unit based on a carboxyl group-containing monomer, wherein (A) And (B) 70% by weight or more, (A) 50 to 95% by weight, a molecular weight of 5,000 to 200,000, and an acid value of 70 to 200 mgKOH / g.
Embedded image
Figure 2002332314
(However, X 1 and X 2 in the formula represent the same as described above.)
4. A structural unit based on (A) a fumaric acid diester represented by the following formula (1), (B) a repeating structural unit represented by the following formula (2), and a structural unit represented by the following formula (5) By performing a deblocking reaction on a copolymer precursor comprising at least one structural unit selected from a structural unit group based on a block carboxylic acid comprising a repeating structural unit and a repeating structural unit represented by the following formula (6): The obtained polyfumarate having a carboxyl group according to claim 1.
Embedded image
Figure 2002332314
(However, X 1 and X 2 in the formula may be the same or different, and are a branched alkyl group or substituted branched alkyl group having 3 to 8 carbon atoms, or a cycloalkyl group or substituted cycloalkyl group having 4 to 8 carbon atoms.) Represents.)
Embedded image
Figure 2002332314
(However, Y 1 and Y 2 in the formula may be the same or different, and are a branched alkyl group or substituted branched alkyl group having 3 to 8 carbon atoms, or a cycloalkyl group or substituted cycloalkyl group having 4 to 8 carbon atoms. And at least one of Y 1 and Y 2 in the molecule represents a group represented by the following formula (3) or (4).)
Embedded image
Figure 2002332314
Embedded image
Figure 2002332314
(However, R 1 , R 2 and R 3 in the formulas (3) and (4) are each a hydrogen atom or an organic group having 1 to 18 carbon atoms, and R 4 is an organic group having 1 to 18 carbon atoms. , And Z 1 is an oxygen atom or a sulfur atom. R 5 and R 6 represent an organic group having 1 to 18 carbon atoms.)
Embedded image
Figure 2002332314
(However, Y 1 and Y 2 in the formula represent the same as in the formula (2).)
Embedded image
Figure 2002332314
(However, Y 3 in the formula is represented by the following formula (3) or (4). D is a benzyl group, n is 0 or 1, and E represents a hydrogen atom or a methyl group.)
Embedded image
Figure 2002332314
Embedded image
Figure 2002332314
(However, R 1 , R 2 , R 3 , R 4 and R 5 in the formulas (3) and (4) represent the same as described above.)
5. A method for producing a polyfumarate having a carboxyl group according to any one of claims 1 to 3, which comprises the following first and second steps: .
First step: a fumaric acid diester represented by the following formula (7), a polymerizable monomer represented by the following formula (8), a polymerizable monomer represented by the following formula (9), and A second step of obtaining a copolymer precursor by copolymerizing with one or more polymerizable monomers selected from the group consisting of polymerizable monomers represented by the formula (10): Deblocking reaction of the copolymer precursor obtained in the step.
Embedded image
Figure 2002332314
(However, X 1 and X 2 in the formula may be the same or different, and are a branched alkyl group or substituted branched alkyl group having 3 to 8 carbon atoms, or a cycloalkyl group or substituted cycloalkyl group having 4 to 8 carbon atoms.) Represents.)
Embedded image
Figure 2002332314
(However, Y 1 and Y 2 in the formula may be the same or different, and are a branched alkyl group or substituted branched alkyl group having 3 to 8 carbon atoms, or a cycloalkyl group or substituted cycloalkyl group having 4 to 8 carbon atoms. And at least one of Y 1 and Y 2 in the molecule represents a group represented by the following formula (3) or (4).)
Embedded image
Figure 2002332314
Embedded image
Figure 2002332314
(However, R 1 , R 2 and R 3 in the formulas (3) and (4) are each a hydrogen atom or an organic group having 1 to 18 carbon atoms, and R 4 is an organic group having 1 to 18 carbon atoms. And Z 1 is an oxygen atom or a sulfur atom. R 5 and R 6 are an organic group having 1 to 18 carbon atoms.)
Embedded image
Figure 2002332314
(However, Y 1 and Y 2 in the formula represent the same as in the formula (2).)
Embedded image
Figure 2002332314
(However, Y 3 , D, n and E in the formula represent the same as described above.)
6. An alkali-developable base resin for a photosensitive resin composition comprising the polyfumarate having a carboxyl group according to claim 1.

JP2001140775A 2001-05-10 2001-05-10 Carboxyl group-containing polyfumarate, production method and use Expired - Fee Related JP4691826B2 (en)

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JP2002332314A JP2002332314A (en) 2002-11-22
JP2002332314A5 true JP2002332314A5 (en) 2008-06-26
JP4691826B2 JP4691826B2 (en) 2011-06-01

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5338352B2 (en) * 2009-02-09 2013-11-13 日油株式会社 Positive photosensitive resin composition
JP5672827B2 (en) * 2010-08-03 2015-02-18 日油株式会社 Photosensitive resin composition and use thereof
JP5740971B2 (en) * 2010-12-24 2015-07-01 東ソー株式会社 Fumaric acid diester resin and retardation film using the same
JP5625898B2 (en) * 2010-12-28 2014-11-19 東ソー株式会社 Fumaric acid diester resin and retardation film using the same

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JPS61200945A (en) * 1985-02-28 1986-09-05 Nippon Oil & Fats Co Ltd Modification of polyfumaric acid diester
JPS61197606A (en) * 1985-02-28 1986-09-01 Nippon Oil & Fats Co Ltd Production of carboxyl group-containing vinyl copolymer
JP3686473B2 (en) * 1995-05-30 2005-08-24 株式会社日本触媒 Polymer having high acid value and use thereof
JP2000159970A (en) * 1998-11-30 2000-06-13 Nof Corp Fumaric acid diester-based resin composition for cross- linking and its cross-linked product

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