JP2002299311A - Leakage cutoff method for gas in vessel and vessel equipped with leakage cutoff structure - Google Patents

Leakage cutoff method for gas in vessel and vessel equipped with leakage cutoff structure

Info

Publication number
JP2002299311A
JP2002299311A JP2001099127A JP2001099127A JP2002299311A JP 2002299311 A JP2002299311 A JP 2002299311A JP 2001099127 A JP2001099127 A JP 2001099127A JP 2001099127 A JP2001099127 A JP 2001099127A JP 2002299311 A JP2002299311 A JP 2002299311A
Authority
JP
Japan
Prior art keywords
container
liquid
lid
gas
concave groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001099127A
Other languages
Japanese (ja)
Other versions
JP3428969B2 (en
Inventor
Shigeru Mizukawa
茂 水川
Katsutoshi Nakada
勝利 中田
Shunji Matsumoto
俊二 松元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Precision Products Co Ltd
Original Assignee
Sumitomo Precision Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Precision Products Co Ltd filed Critical Sumitomo Precision Products Co Ltd
Priority to JP2001099127A priority Critical patent/JP3428969B2/en
Priority to TW091104160A priority patent/TW535201B/en
Priority to KR1020027011887A priority patent/KR20030023614A/en
Priority to PCT/JP2002/002222 priority patent/WO2002082520A1/en
Priority to CNB028000307A priority patent/CN1215536C/en
Publication of JP2002299311A publication Critical patent/JP2002299311A/en
Application granted granted Critical
Publication of JP3428969B2 publication Critical patent/JP3428969B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67126Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Weting (AREA)
  • Closures For Containers (AREA)
  • Gasket Seals (AREA)
  • Containers And Packaging Bodies Having A Special Means To Remove Contents (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a vessel equipped with a leakage cutoff structure for internal gas which can surely prevent internal gas from leaking out, and also have a lid body attached and detached readily in a short time, etc. SOLUTION: The container 2 is composed of a container body 3 has an opening atop and has fixed internal capacity and the lid body 21, which is mounted on the container body 3 and closes the opening part 11. An annular recessed groove part 21, having an opening atop is formed at the outer periphery of the upper end part 10 of the container body 3, and liquid pooled in the recessed groove part; and a hanging part, which hangs from the peripheral edge part of the lid body 21, is formed at the peripheral edge and fitted onto the upper end part 10 of the container body 3, while being dipped in the liquid in the recessed groove 12.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、上部が開口した、
一定の内容積を有する容器本体と、該容器本体上に載置
され、前記開口部を閉塞する蓋体とから構成される容器
において、該容器内から気体が漏出するのを遮断する方
法、並びに内部気体の漏出遮断構造を備えた容器に関す
る。
[0001] The present invention relates to a method for manufacturing a semiconductor device,
In a container composed of a container body having a constant internal volume, and a lid placed on the container body and closing the opening, a method for blocking gas from leaking from inside the container, and The present invention relates to a container provided with a structure for blocking leakage of internal gas.

【0002】[0002]

【従来の技術】例えば、液晶基板を構成するTFT基板
は、種々の工程を経て製造され、各工程では、現像液や
レジスト膜の塗布、その剥離用の薬液,エッチング液或
いは洗浄液の塗布など、TFT基板に対して各種の処理
液が塗布される。
2. Description of the Related Art For example, a TFT substrate constituting a liquid crystal substrate is manufactured through various processes. In each process, a developing solution or a resist film is applied, and a chemical solution for removing the resist film, an etching solution or a cleaning solution is applied. Various processing liquids are applied to the TFT substrate.

【0003】この内、例えば、エッチング工程では、基
板を支持する支持手段や、基板の上方に配置され、基板
に対してエッチング液を噴射するエッチング液噴射手段
などを所定の容器内に適宜配設した構成のエッチング装
置が用いられている。尚、前記支持手段には、支持した
基板を水平回転させるようになったものや、基板を水平
方向に搬送するようになったものなどがある。
For example, in the etching step, for example, a supporting means for supporting the substrate, an etching liquid jetting means which is disposed above the substrate and jets an etching liquid to the substrate, and the like are appropriately disposed in a predetermined container. An etching apparatus having the above configuration is used. The supporting means includes a means for rotating the supported substrate horizontally and a means for transferring the substrate in the horizontal direction.

【0004】かかるエッチング装置では、容器内部の汚
れを定期的に浄化して、容器内を清潔にする必要があ
り、また、前記支持手段やエッチング液噴射手段を構成
する部品などが損傷した場合には、これを交換する必要
がある。そこで、このようなメンテナンス作業を行なう
ために、前記エッチング装置を構成する容器は、上部が
開口した構造を備えるとともに、この開口部を蓋体によ
って閉塞した構造を備え、その前記上部開口部からメン
テナンス作業を行なうことができるようになっている。
In such an etching apparatus, it is necessary to periodically clean dirt inside the container and clean the inside of the container. Need to replace this. Therefore, in order to perform such maintenance work, the container constituting the etching apparatus has a structure having an open top and a structure in which this opening is closed by a lid, and the maintenance is performed from the upper opening. Work can be performed.

【0005】ところで、上述のエッチングに使用される
エッチング液は腐食性が高く、しかも気化し易いという
性状を備えており、また、エッチング液噴射手段から噴
射される際にミスト状になったりする。そして、このよ
うに気化したエッチングガスやミストが容器外に漏出す
ると、装置周辺の機械,器具や人体に悪影響を与える。
[0005] The etching solution used for the above-described etching is highly corrosive and has a property of being easily vaporized. Further, when the etching solution is jetted from the etching solution jetting means, it forms a mist. When the vaporized etching gas or mist leaks out of the container, it adversely affects machines, instruments, and human bodies around the apparatus.

【0006】そこで、従来、前記容器の開口部周縁と蓋
体との当接部にパッキンなどのシール部材を介在させ、
この状態で容器と蓋体とを多数のボルトによって締結
し、前記気化ガスやミストが容器外に漏出するのを防止
していた。
Therefore, conventionally, a sealing member such as packing is interposed at a contact portion between the periphery of the opening of the container and the lid,
In this state, the container and the lid are fastened with a number of bolts to prevent the vaporized gas and mist from leaking out of the container.

【0007】[0007]

【発明が解決しようとする課題】ところが、上記のよう
に容器と蓋体とを多数のボルトによって締結した構造で
は、前記気化ガスやミストの漏出防止に対しては相応の
効果を奏するものの、上記メンテナンス作業を行なう際
には、多数のボルトの取り外しと再締結を行なう必要が
あるため、その作業が極めて煩雑なものとなる。また、
このために、メンテナンス作業に長時間を要することと
なり、結果、エッチング装置の稼働率が低下するという
問題を生じる。
However, in the structure in which the container and the lid are fastened by a large number of bolts as described above, although the vapor gas and the mist can be prevented from leaking out, the above-mentioned structure has a corresponding effect. When performing maintenance work, it is necessary to remove and refasten a large number of bolts, which makes the work extremely complicated. Also,
For this reason, a long time is required for the maintenance work, and as a result, there arises a problem that the operation rate of the etching apparatus is reduced.

【0008】本発明は、以上の実情に鑑みなされたもの
であって、内部気体の漏出を確実に防止することがで
き、しかも蓋体の着脱を容易且つ短時間で行なうことが
できるようになった容器内気体の漏出遮断方法及び内部
気体の漏出遮断構造を備えた容器の提供を目的とする。
The present invention has been made in view of the above circumstances, and it is possible to reliably prevent internal gas from leaking, and to easily attach and detach a cover in a short time. It is an object of the present invention to provide a method for blocking leakage of gas in a container and a container provided with a structure for blocking leakage of internal gas.

【0009】[0009]

【課題を解決するための手段及びその効果】上記課題を
解決するための本発明の請求項1に記載した発明は、上
部が開口し、一定の内容積を有する容器本体と、該容器
本体上に載置され、前記開口部を閉塞する蓋体とから構
成される容器において、該容器内から気体が漏出するの
を遮断する方法であって、前記容器本体の上端部外周
に、上部が開口した環状の凹溝部を形成して、該凹溝内
に液体を貯留せしめるとともに、前記蓋体の周縁に、該
周縁部から下方に垂下する垂下部を形成して、該垂下部
を、その下端部が前記凹溝内の液体中に浸漬されるよう
に、前記容器本体の上端部に外嵌せしめて、容器内雰囲
気と外部雰囲気とを前記凹溝内の液体によって遮断する
ようにしたことを特徴とする容器内気体の漏出遮断方法
に係る。
Means for Solving the Problems and Their Effects According to the invention described in claim 1 of the present invention for solving the above problems, a container body having an open upper portion and a constant internal volume, And a lid configured to close the opening, wherein the container is configured to block gas from leaking from the inside of the container. Forming a recessed annular groove to store liquid in the groove, and forming a hanging part hanging down from the peripheral part on the periphery of the lid, and forming the hanging part at the lower end thereof. The part is externally fitted to the upper end of the container body so that the part is immersed in the liquid in the groove, and the atmosphere in the container and the external atmosphere are shut off by the liquid in the groove. The invention relates to a method for shutting off leakage of gas in a container.

【0010】また、本発明の請求項4に記載した発明
は、上部が開口し、一定の内容積を有する容器本体と、
該容器本体上に載置され、前記開口部を閉塞する蓋体と
から構成される容器であって、前記容器本体の上端部外
周に、上部が開口した環状の凹溝部を形成し、該凹溝部
内に液体を貯留せしめるとともに、前記蓋体の周縁に、
該周縁部から下方に垂下する垂下部を形成し、該垂下部
を、その下端部が前記凹溝部内の液体中に浸漬された状
態で前記容器本体の上端部に外嵌可能に成したことを特
徴とする内部気体の漏出遮断構造を備えた容器に係る。
Further, according to the invention described in claim 4 of the present invention, a container body having an opening at an upper portion and having a constant internal volume;
A lid placed on the container body and comprising a lid closing the opening, wherein an annular concave groove having an open top is formed on an outer periphery of an upper end of the container body; While storing the liquid in the groove, at the periphery of the lid,
A hanging part hanging downward from the peripheral part is formed, and the hanging part can be externally fitted to an upper end part of the container main body with its lower end part immersed in the liquid in the concave groove part. The present invention relates to a container provided with an internal gas leakage blocking structure.

【0011】上記各発明によれば、蓋体の周縁に形成し
た垂下部を、その下端部が凹溝部内に貯留せしめた液体
中に浸漬されるように、容器本体の上端部に外嵌せしめ
ることにより、容器内雰囲気と外部雰囲気とが凹溝部内
の液体によって遮断される。容器内雰囲気は容器本体と
蓋体との間の隙間から凹溝部内の液体と接触可能である
が、直接外部雰囲気と連通することはない。これによ
り、容器内の気体が外部に漏出するのが確実に防止され
る。また、蓋体は容器本体上に載置されているだけであ
るので、その取り外しが容易であり、これを短時間のう
ちに取り外すことができる。
According to the above inventions, the hanging part formed on the peripheral edge of the lid is fitted to the upper end of the container body such that the lower end is immersed in the liquid stored in the concave groove. Thereby, the atmosphere in the container and the external atmosphere are shut off by the liquid in the groove. The atmosphere in the container can come into contact with the liquid in the groove from the gap between the container body and the lid, but does not directly communicate with the external atmosphere. This reliably prevents the gas in the container from leaking to the outside. In addition, since the lid is merely placed on the container body, it is easy to remove the lid, and the lid can be removed in a short time.

【0012】ところで、容器内部に気化ガスや液体がミ
スト状になったものが存在する場合、この気化ガスやミ
ストが凹溝内の液体に対し可溶であれば、凹溝内の液体
と接触した際にこれに溶融するが、容器内の気化ガスや
ミストがそのまま外部に漏出することはない。したがっ
て、例え、これが現像液,エッチング液や剥離液といっ
た極めて腐食性が高いものであったとしても、容器周辺
の機械,器具や人体に悪影響を与えることはない。
By the way, when a vaporized gas or liquid is in the form of a mist in the container, if the vaporized gas or the mist is soluble in the liquid in the groove, the gas or the mist contacts the liquid in the groove. However, the vaporized gas and mist in the container do not leak to the outside as it is. Therefore, even if it is extremely corrosive such as a developing solution, an etching solution or a stripping solution, it does not adversely affect machines, instruments and human bodies around the container.

【0013】この場合、請求項5に記載した発明のよう
に、前記蓋体の外周縁より内側の下面に、前記垂下部に
沿って前記下面から下方に垂下する第2垂下部を形成
し、該第2垂下部を前記容器本体の上端部に内嵌させる
ようにすると良い。このようにすれば、前記蓋体の垂下
部と第2垂下部との間に容器本体の上端部が挿入された
状態のラビリンス構造が形成され、容器本体内の気化ガ
スやミストが前記凹溝内の液体により達し難くなる。
In this case, as in the invention according to claim 5, a second hanging portion is formed on the lower surface inside the outer peripheral edge of the lid along the hanging portion and hanging downward from the lower surface, It is preferable that the second hanging portion is fitted inside the upper end of the container body. With this configuration, a labyrinth structure in which the upper end portion of the container body is inserted between the hanging portion of the lid and the second hanging portion is formed, and the vaporized gas and mist in the container body are removed by the concave groove. Harder to reach due to the liquid inside.

【0014】また、本発明の請求項3に記載した発明
は、前記容器本体の上縁部に、弾性体からなり、前記蓋
体の内面に気密状に当接する環状のシール部材を設け、
容器本体内の気体が外部に漏出するのを該シール部材に
よって防止するようにしたことを特徴とする容器内気体
の漏出遮断方法に係り、請求項6に記載した発明は、前
記容器本体の上縁部に、弾性体からなり、前記蓋体の内
面に気密状に当接する環状のシール部材を設けたことを
特徴とする内部気体の漏出遮断構造を備えた容器に係る
が、これらの発明によれば、容器本体の上縁部に設けた
環状のシール部材によって、容器本体内の気体が外部に
漏出するのが防止される。したがって、容器内部に気化
ガスやミストが存在する場合でも、かかる気化ガスやミ
ストは更に前記凹溝内の液体に達し難くい。
According to a third aspect of the present invention, there is provided an annular sealing member made of an elastic material and provided in an airtight manner on an inner surface of the lid at an upper edge portion of the container body.
The invention according to claim 6 relates to a method for shutting off leakage of gas in a container, characterized in that the gas inside the container body is prevented from leaking to the outside by the seal member. The invention relates to a container provided with an internal gas leakage blocking structure, wherein an edge is provided with an annular seal member made of an elastic body and abutting against the inner surface of the lid in an airtight manner. According to this, the annular seal member provided on the upper edge portion of the container body prevents the gas in the container body from leaking to the outside. Therefore, even when the vaporized gas or mist exists inside the container, the vaporized gas or mist is less likely to reach the liquid in the concave groove.

【0015】本発明の請求項2に記載した発明は、前記
凹溝内に液体を連続的に供給するとともに、凹溝内の液
体を連続的に排出して、前記凹溝内の液体が連続的に置
換され、且つその貯留量が一定に保たれるようにしたこ
とを特徴とする容器内気体の漏出遮断方法に係り、請求
項7に記載した発明は、前記凹溝内に液体を供給する液
体供給手段を設けるとともに、凹溝内の液体を排出する
液体排出手段を設けたことを特徴とする内部気体の漏出
遮断構造を備えた容器に係る。
According to the invention described in claim 2 of the present invention, the liquid in the groove is continuously supplied while the liquid in the groove is continuously discharged, and the liquid in the groove is continuously discharged. The invention described in claim 7 relates to a method for shutting off leakage of gas in a container, characterized in that the liquid is replaced in the container and that the stored amount is kept constant. And a liquid discharging means for discharging the liquid in the concave groove.

【0016】上述したように、容器内部に気化ガスやミ
ストが存在する場合、この気化ガスやミストが凹溝内の
液体に対し可溶であれば、凹溝内の液体と接触した際に
これに溶融する。したがって、これを放置すると、凹溝
内の液体に溶融する気化ガス成分やミスト成分の濃度が
増加することになる。
As described above, when the vaporized gas or mist is present in the container, if the vaporized gas or mist is soluble in the liquid in the groove, the vaporized gas or mist is dissipated when it comes into contact with the liquid in the groove. Melts. Therefore, if this is left untreated, the concentration of the vaporized gas component and the mist component dissolved in the liquid in the groove increases.

【0017】上記請求項2記載の発明及び請求項7に記
載の発明によれば、前記凹溝内の液体が連続的に新しい
液体によって置換されるので、凹溝内の液体に溶融する
気化ガス成分やミスト成分の濃度が増加するのを防止す
ることができる。
According to the second and seventh aspects of the present invention, since the liquid in the groove is continuously replaced by a new liquid, the vaporized gas that is melted in the liquid in the groove. It is possible to prevent the concentration of the component or the mist component from increasing.

【0018】尚、上述した外嵌とは、垂下部が容器本体
の上端部に対し、しっくりと嵌め合わされる場合の他、
かなりの遊びをもって嵌め合わされる場合を含み、内嵌
も同様に、第2垂下部が前記容器本体の上端部に対し、
しっくりと嵌め合わされる場合の他、かなりの遊びをも
って嵌め合わされる場合を含む。
In addition, the above-mentioned outer fitting means that the hanging part is fitted to the upper end of the container body exactly,
Including the case where the fitting is performed with considerable play, the inner fitting similarly has the second hanging portion with respect to the upper end portion of the container body.
In addition to the case where the fitting is performed exactly, the case where the fitting is performed with considerable play is included.

【0019】[0019]

【発明の実施の形態】以下、本発明の具体的な実施形態
について、添付図面に基づき説明する。図1は、本発明
の一実施形態に係るエッチング装置を示した平面図であ
り、図2は、図1における矢示B−B方向の断面図であ
り、図3は、図2におけるA部を拡大して示した拡大図
である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, specific embodiments of the present invention will be described with reference to the accompanying drawings. FIG. 1 is a plan view showing an etching apparatus according to an embodiment of the present invention, FIG. 2 is a cross-sectional view in the direction of arrows BB in FIG. 1, and FIG. It is the enlarged view which expanded and showed.

【0020】本例のエッチング装置1はTFT基板にエ
ッチング処理を施す装置であって、図1及び図2に示す
ように、上部が開口した容器本体(以下、槽本体とい
う)3と、この槽本体3の開口部11を閉塞する閉蓋2
0とからなる容器(以下、エッチング槽という)2、前
記槽本体3内に配設されたエッチング液噴射装置40、
及び基板Kを水平方向に搬送する搬送装置50などから
なる。また、図1に示すように、本例のエッチング装置
1は、その複数が直線状に連設されている。
The etching apparatus 1 of this embodiment is an apparatus for performing an etching process on a TFT substrate. As shown in FIGS. 1 and 2, a container body (hereinafter, referred to as a tank body) 3 having an open top and a tank Lid 2 for closing opening 11 of body 3
A container (hereinafter, referred to as an etching tank) 2 comprising: an etching solution spraying device 40 disposed in the tank body 3;
And a transfer device 50 for transferring the substrate K in the horizontal direction. Further, as shown in FIG. 1, a plurality of the etching apparatuses 1 according to the present embodiment are arranged in a straight line.

【0021】図1乃至図3に示すように、前記槽本体3
は、矩形状をした底板8と、この底板8の周縁に立設せ
しめられた側面板4,5,6,7と、底板8の上方にこ
れに対向して配設された天板9からなり、これら底板
8、側面板4,5,6,7及び天板9によって囲繞され
た所定の内容積を有している。
As shown in FIG. 1 to FIG.
Is composed of a rectangular bottom plate 8, side plates 4, 5, 6 and 7 erected on the periphery of the bottom plate 8, and a top plate 9 disposed above and opposed to the bottom plate 8. And has a predetermined internal volume surrounded by the bottom plate 8, the side plates 4, 5, 6, 7 and the top plate 9.

【0022】前記側面板4,5,6,7はそれぞれ前記
天板9から上方に延出した状態に設けられており、図1
及び図2では、当該各延出部に符号4a,5a,6a,
7aを付している。また、天板9は矩形状をした開口部
11を備えており、この開口部11の周縁に縁板10が
立設せしめられている。斯くして、これら延出部4a,
5a,6a,7a、天板9及び縁板10によって、前記
開口部11の周りに環状の凹溝12が形成される。ま
た、前記縁板10の上端部には、横断面H形状をしたパ
ッキン30が装着され、更に、パッキン30の上溝30
a内にOリング31が内装されている。
The side plates 4, 5, 6, and 7 are provided so as to extend upward from the top plate 9, respectively.
In FIG. 2 and FIG. 2, reference numerals 4a, 5a, 6a,
7a is attached. The top plate 9 has a rectangular opening 11, and an edge plate 10 is provided upright on the periphery of the opening 11. Thus, these extension portions 4a,
An annular groove 12 is formed around the opening 11 by 5a, 6a, 7a, the top plate 9 and the edge plate 10. A packing 30 having an H-shaped cross section is attached to the upper end of the edge plate 10.
An O-ring 31 is provided inside a.

【0023】前記閉蓋20は、矩形状をした蓋本体21
と、この蓋本体21の周縁に、これから下方に垂下せし
められた第1垂下部22と、前記蓋本体21の周縁より
内側の下面に、前記第1垂下部22と平行にこれに沿っ
て垂下せしめられた第2垂下部23からなる。そして、
この閉蓋20は、第1垂下部22,第2垂下部23間に
前記槽本体3の縁板10が挿入された状態、即ち、第1
垂下部22が縁板10に外嵌され、且つ第2垂下部23
が縁板10に内嵌された状態で、その下面がOリング3
1と気密的に当接するように当該Oリング31上に載置
され、前記槽本体3の開口部11を閉塞する。
The closing lid 20 has a lid body 21 having a rectangular shape.
A first hanging portion 22 hanging down from the periphery of the lid body 21, and a lower surface inside the periphery of the lid body 21 hanging down along and parallel to the first hanging portion 22. It is made up of a second hanging part 23 that is stiffened. And
The lid 20 is in a state where the edge plate 10 of the tank body 3 is inserted between the first hanging portion 22 and the second hanging portion 23, that is, the first hanging portion 22.
The hanging part 22 is fitted on the edge plate 10 and the second hanging part 23
Is fitted in the edge plate 10 and the lower surface thereof is
1 is placed on the O-ring 31 so as to be in contact with the O-ring 31 in an airtight manner, and closes the opening 11 of the tank body 3.

【0024】尚、蓋本体21の上面には取手24が固設
されており、この取手24を把持して閉蓋20を槽本体
3に対して着脱することができるようになっている。ま
た、蓋本体21には、透明な板材によって閉じられた覗
き窓25が形成されており、この覗き窓25から槽本体
3内を観察することができるようになっている。
A handle 24 is fixed on the upper surface of the lid body 21, and the handle 20 is gripped so that the lid 20 can be attached to and detached from the tank body 3. In addition, a viewing window 25 closed by a transparent plate material is formed in the lid body 21, and the inside of the tank body 3 can be observed from the viewing window 25.

【0025】前記槽本体3の凹溝12内には、給水源
(図示せず)に接続された吐水部35が配設されてお
り、この吐水部35から凹溝12内に水が吐出されるよ
うになっている。また、同凹溝12内には、排水部36
が設けられており、前記吐水部35から凹溝12内に吐
出され、貯留された水がこの排水部36から排水される
ようになっている。尚、凹溝12内に貯留される水量
は、その水位が前記第1垂下部22の下端より上方に位
置するように保たれる。
A water discharge portion 35 connected to a water supply source (not shown) is provided in the groove 12 of the tank body 3, and water is discharged from the water discharge portion 35 into the groove 12. It has become so. In the groove 12, a drainage part 36 is provided.
The water is discharged from the water discharge part 35 into the concave groove 12 and the stored water is drained from the drain part 36. The amount of water stored in the concave groove 12 is maintained such that the water level is located above the lower end of the first hanging portion 22.

【0026】図2に示すように、前記搬送装置50は、
上下に並設され、且つ紙面に対し直交する方向に多列に
配設された搬送ローラ51,52を備えてなり、基板K
を搬送ローラ51,52間に挟持した状態で、紙面に対
して直交する方向(図1における矢示C方向)に搬送す
る。
As shown in FIG. 2, the transfer device 50 comprises:
The substrate K is provided with conveying rollers 51 and 52 arranged vertically one above another and arranged in multiple rows in a direction orthogonal to the paper surface.
Is transported in a direction perpendicular to the sheet of paper (the direction indicated by the arrow C in FIG. 1) in a state of being sandwiched between the transport rollers 51 and 52.

【0027】同図2に示すように、前記エッチング液噴
射装置40は、複数のエッチング液噴射ノズル41と、
加圧されたエッチング液を前記エッチング液噴射ノズル
41に供給するエッチング液供給手段(図示せず)など
からなる。エッチング液噴射ノズル41は、搬送ローラ
51,52によって搬送される基板Kの上方に、その幅
方向及び搬送方向に沿って配列され、搬送ローラ51,
52によって搬送される基板Kの上面にエッチング液を
噴射する。尚、基板Kの搬送方向に沿ったその両側に
は、それぞれ適宜洗浄液供給手段(図示せず)に接続さ
れた洗浄液噴射ノズル42が配列されており、この洗浄
液噴射ノズル42から前記蓋本体21の下面及び第2垂
下部23に向けて洗浄液が噴射されるようになってい
る。
As shown in FIG. 2, the etching liquid ejecting apparatus 40 includes a plurality of etching liquid ejecting nozzles 41,
An etching solution supply means (not shown) for supplying a pressurized etching solution to the etching solution spray nozzle 41 is provided. The etching liquid jet nozzles 41 are arranged along the width direction and the transport direction above the substrate K transported by the transport rollers 51 and 52, and
The etching liquid is sprayed on the upper surface of the substrate K conveyed by 52. Cleaning liquid jet nozzles 42 connected to cleaning liquid supply means (not shown) are arranged on both sides of the substrate K in the transport direction. The cleaning liquid is sprayed toward the lower surface and the second hanging part 23.

【0028】以上の構成を備えた本例のエッチング装置
1によると、搬送ローラ51,52によって基板Kがそ
の搬送方向に搬送され、搬送される基板Kの上面にエッ
チング液噴射ノズル41からエッチング液が噴射され
る。尚、基板Kは直線状に連設されるエッチング装置1
に順次搬送され、各エッチング装置1においてそれぞれ
エッチングされる。
According to the etching apparatus 1 of the present embodiment having the above-described configuration, the substrate K is transported in the transport direction by the transport rollers 51 and 52, and the etchant is sprayed from the etchant spray nozzle 41 onto the upper surface of the transported substrate K. Is injected. Note that the substrate K is an etching apparatus 1 that is linearly connected in series.
, And are etched in each of the etching apparatuses 1.

【0029】ところで、エッチング液は、気化し易いと
いう性状を備えており、また、エッチング液噴射ノズル
41から噴射される際にミスト状になったりする。そし
て、このように気化したエッチングガスやミストが槽本
体3内に充満する。かかる気化したエッチングガスやミ
ストは極めて腐食性が高く、これが槽本体3から外部に
漏出すると、装置周辺の機械,器具や人体に悪影響を与
える。
By the way, the etching liquid has a property that it is easily vaporized, and when the etching liquid is jetted from the etching liquid jet nozzle 41, it forms a mist. Then, the etching gas or mist vaporized in this way fills the inside of the tank body 3. Such a vaporized etching gas or mist is extremely corrosive, and if leaked from the tank body 3 to the outside, it adversely affects machines, instruments, and human bodies around the apparatus.

【0030】本例のエッチング装置1によれば、槽本体
3を構成する縁板10の上端部に、パッキン30を装着
し、装着したパッキン30の上溝30a内にOリング3
1を内装し、このOリング31に対して気密的に当接し
た状態で、当該Oリング31上に閉蓋20を載置せしめ
た構造としているので、槽本体3内の雰囲気とその外部
の雰囲気とが、このOリング31によって遮断される。
したがって、前記エッチングガスやミストが槽本体3内
から外部に漏出するのが、かかるOリングによって1次
的に防止される。
According to the etching apparatus 1 of the present embodiment, the packing 30 is mounted on the upper end of the edge plate 10 constituting the tank main body 3, and the O-ring 3 is inserted into the upper groove 30a of the mounted packing 30.
1 and the lid 20 is placed on the O-ring 31 in a state of being in airtight contact with the O-ring 31. The atmosphere is shut off by the O-ring 31.
Therefore, leakage of the etching gas or mist from the inside of the tank body 3 to the outside is primarily prevented by the O-ring.

【0031】また、本例のエッチング装置1では、槽本
体3の開口部11の周りに環状の凹溝12を形成すると
ともに、この凹溝12内に水を貯留せしめ、閉蓋20の
第1垂下部22下端を、この水内に浸漬せしめた構造と
しているので、槽本体3内の雰囲気と外部の雰囲気と
が、かかる凹溝12内の水によって遮断される。閉蓋2
0はOリング31上に載置されているだけであるので、
蓋本体21とOリング31との間の気密性は必ずしも十
分なものではなく、蓋本体21下面とOリング31との
間に生じた隙間から、槽本体3内のエッチングガスやミ
ストが外部に漏出するおそれがある。しかしながら、本
例のエッチング装置1では、上述したように、第1垂下
部22,縁板10,パッキン30及びOリング31によ
り囲まれる雰囲気が、凹溝12内に貯留せしめた水によ
って外部雰囲気と遮断されているので、蓋本体21下面
とOリング31との間の隙間から漏出したエッチングガ
スやミストの外部への漏出が凹溝12内の水によって2
次的に阻止される。斯くして、かかる凹溝12内の水及
び前記Oリング31の協働作用によって、槽本体3内に
存在するエッチングガスやミストの外部への漏出が確実
に防止される。
In the etching apparatus 1 of this embodiment, an annular groove 12 is formed around the opening 11 of the tank body 3, and water is stored in the groove 12. Since the lower end of the hanging part 22 has a structure immersed in the water, the atmosphere in the tank body 3 and the outside atmosphere are shut off by the water in the concave groove 12. Lid 2
Since 0 is only placed on the O-ring 31,
The airtightness between the lid main body 21 and the O-ring 31 is not always sufficient, and the etching gas and mist in the tank main body 3 are exposed to the outside from the gap generated between the lower surface of the lid main body 21 and the O-ring 31. May leak. However, in the etching apparatus 1 of the present embodiment, as described above, the atmosphere surrounded by the first hanging portion 22, the edge plate 10, the packing 30, and the O-ring 31 is changed to the external atmosphere by the water stored in the concave groove 12. Since the gas is blocked, the etching gas and mist leaked from the gap between the lower surface of the lid body 21 and the O-ring 31 to the outside are prevented from leaking to the outside by water in the groove 12.
It is subsequently stopped. Thus, the cooperative action of the water in the concave groove 12 and the O-ring 31 prevents leakage of the etching gas and mist existing in the tank body 3 to the outside.

【0032】ところで、蓋本体21下面とOリング31
との間の隙間から漏れ出たエッチングガスやミストが、
凹溝12内の水に対し可溶であれば、凹溝12内の水と
接触した際にこれに溶融するが、かかるエッチングガス
やミストがそのまま外部に漏出することはない。したが
って、例え、これが極めて腐食性が高いものであったと
しても、容器周辺の機械,器具や人体に悪影響を与える
ことはない。
The lower surface of the lid body 21 and the O-ring 31
Etching gas and mist leaked from the gap between
If it is soluble in the water in the concave groove 12, it melts when it comes into contact with the water in the concave groove 12, but such an etching gas or mist does not leak to the outside as it is. Therefore, even if it is extremely corrosive, it does not adversely affect machines, instruments and human bodies around the container.

【0033】その一方、これを放置すると、凹溝12内
の水に溶融するエッチングガスやミスト成分の濃度が増
加することになる。本例では、吐水部35から凹溝12
内に水を供給する一方、凹溝12内に貯留された水を排
水部36から排水して、凹溝12内の水を連続的に新し
い水によって置換するようにしているので、凹溝12内
の水に溶融するエッチングガスやミスト成分の濃度が増
加するのを防止することができる。
On the other hand, if this is left, the concentration of the etching gas or mist component dissolved in the water in the groove 12 will increase. In the present example, the water is discharged from the water discharging portion 35 to the concave groove 12.
While the water is supplied to the inside, the water stored in the groove 12 is drained from the drainage portion 36, and the water in the groove 12 is continuously replaced with new water. It is possible to prevent an increase in the concentration of the etching gas or the mist component that is dissolved in the water inside.

【0034】また、前記閉蓋20の第1垂下部22と第
2垂下部23との間に槽本体3の縁板10を挿入した状
態にしているので、これらによってラビリンス構造が形
成され、槽本体3内のエッチングガスやミストが蓋本体
21下面とOリング31との間に生じた隙間により達し
難いものとなっている。したがって、かかる構造によっ
ても、槽本体3内のエッチングガスやミストの外部への
漏出が防止される。
Also, since the edge plate 10 of the tank body 3 is inserted between the first hanging portion 22 and the second hanging portion 23 of the lid 20, a labyrinth structure is formed by these. The etching gas and the mist in the main body 3 are hard to reach due to the gap generated between the lower surface of the lid main body 21 and the O-ring 31. Therefore, even with this structure, the leakage of the etching gas and the mist in the tank main body 3 to the outside is prevented.

【0035】また、本例では、蓋本体21を取り外す前
に、洗浄液噴射ノズル42から蓋本体21の下面及び第
2垂下部23に向けて洗浄液が噴射される。これによ
り、蓋本体21の下面や第2垂下部23に付着したエッ
チング液が洗い流され、蓋本体21を取り外す際に、エ
ッチング液が外部に持ち出されるのが防止される。
In this embodiment, the cleaning liquid is jetted from the cleaning liquid jet nozzle 42 toward the lower surface of the lid main body 21 and the second hanging portion 23 before the lid main body 21 is removed. As a result, the etchant attached to the lower surface of the lid body 21 and the second hanging portion 23 is washed away, and when the lid body 21 is removed, the etchant is prevented from being taken out.

【0036】更に、閉蓋20は槽本体3上に載置されて
いるだけであるので、その取り外しが容易であり、これ
を短時間のうちに取り外すことができる。したがって、
エッチング装置1内のメンテナンス作業を容易に行なう
ことができる。
Further, since the lid 20 is merely placed on the tank body 3, it can be easily removed, and can be removed in a short time. Therefore,
Maintenance work in the etching apparatus 1 can be easily performed.

【0037】以上、本発明の一実施形態について説明し
たが、本発明の採り得る具体的な態様は、何らこれに限
定されるものではない。例えば、上例では、本発明をエ
ッチング装置において具現化したが、これに限るもので
はなく、本発明は、この他に、例えば、現像液塗布装
置,レジスト膜形成装置,レジスト膜剥離装置や洗浄装
置など各種の装置に適用することができる。
As described above, one embodiment of the present invention has been described. However, specific embodiments that can be adopted by the present invention are not limited thereto. For example, in the above example, the present invention is embodied in an etching apparatus. However, the present invention is not limited to this. For example, the present invention also includes a developing solution applying apparatus, a resist film forming apparatus, a resist film removing apparatus, The present invention can be applied to various devices such as a device.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施形態に係るエッチング装置を示
した平面図である。
FIG. 1 is a plan view showing an etching apparatus according to an embodiment of the present invention.

【図2】図1における矢示B−B方向の断面図である。FIG. 2 is a cross-sectional view in the direction of arrows BB in FIG.

【図3】図2におけるA部を拡大して示した拡大図であ
る。
FIG. 3 is an enlarged view showing a portion A in FIG. 2 in an enlarged manner.

【符号の説明】[Explanation of symbols]

1 エッチング装置 2 エッチング槽(容器) 3 槽本体(容器本体) 4,5,6,7 側面板 8 底板 9 天板 10 縁板 11 開口部 12 凹溝 20 閉蓋 21 蓋本体 22 第1垂下部 23 第2垂下部 30 パッキン 31 Oリング 35 吐水部 36 排水部 40 エッチング液噴射装置 50 搬送装置 DESCRIPTION OF SYMBOLS 1 Etching apparatus 2 Etching tank (container) 3 Tank main body (container main body) 4, 5, 6, 7 Side plate 8 Bottom plate 9 Top plate 10 Edge plate 11 Opening 12 Groove 20 Closed lid 21 Lid main body 22 1st hanging part 23 Second hanging part 30 Packing 31 O-ring 35 Water discharging part 36 Drainage part 40 Etching liquid ejecting device 50 Transporting device

───────────────────────────────────────────────────── フロントページの続き (72)発明者 松元 俊二 兵庫県尼崎市扶桑町1番10号 住友精密工 業株式会社内 Fターム(参考) 3E084 AA05 AA14 AB10 BA02 CA03 CB04 DA03 FA09 GA08 GB12 GB17 HA03 HA04 HA10 HB08 HD01 3J040 AA02 AA17 BA02 BA05 CA04 EA06 EA16 EA25 FA05 HA01 HA03 HA07 5F043 AA10 AA22 DD13 EE03 EE15 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Shunji Matsumoto 1-10 Fuso-cho, Amagasaki City, Hyogo Prefecture F-term in Sumitomo Precision Industries, Ltd. (Reference) 3E084 AA05 AA14 AB10 BA02 CA03 CB04 DA03 FA09 GA08 GB12 GB17 HA03 HA04 HA10 HB08 HD01 3J040 AA02 AA17 BA02 BA05 CA04 EA06 EA16 EA25 FA05 HA01 HA03 HA07 5F043 AA10 AA22 DD13 EE03 EE15

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 上部が開口した、一定の内容積を有する
容器本体と、該容器本体上に載置され、前記開口部を閉
塞する蓋体とから構成される容器において、該容器内の
気体が外部に漏出するのを遮断する方法であって、 前記容器本体の上端部外周に、上部が開口した環状の凹
溝部を形成して、該凹溝内に液体を貯留せしめるととも
に、 前記蓋体の周縁に、該周縁部から下方に垂下する垂下部
を形成して、該垂下部を、その下端部が前記凹溝内の液
体中に浸漬されるように、前記容器本体の上端部に外嵌
せしめて、容器内雰囲気と外部雰囲気とを前記凹溝内の
液体によって遮断するようにしたことを特徴とする容器
内気体の漏出遮断方法。
1. A container comprising a container main body having an open upper part and having a constant internal volume, and a lid placed on the container main body and closing the opening, wherein a gas in the container is provided. A method of blocking leakage of the liquid to the outside, wherein an annular concave groove having an open top is formed on the outer periphery of an upper end portion of the container body, and liquid is stored in the concave groove, and the lid body is formed. A hanging portion is formed on the periphery of the container, and the hanging portion is formed on the upper end of the container body so that the lower end is immersed in the liquid in the groove. A method for shutting off leakage of gas in a container, wherein the container is fitted so as to shut off the atmosphere inside the container and the outside atmosphere by the liquid in the concave groove.
【請求項2】 前記凹溝内に液体を連続的に供給すると
ともに、凹溝内の液体を連続的に排出して、前記凹溝内
の液体が連続的に置換され、且つその貯留量が一定に保
たれるようにしたことを特徴とする請求項1記載の容器
内気体の漏出遮断方法。
2. A liquid is continuously supplied into the concave groove, and the liquid in the concave groove is continuously discharged to replace the liquid in the concave groove continuously. 2. The method for shutting off leakage of gas in a container according to claim 1, wherein said method is kept constant.
【請求項3】 前記容器本体の上縁部に、弾性体からな
り、前記蓋体の内面に気密状に当接する環状のシール部
材を設け、容器本体内の気体が外部に漏出するのを該シ
ール部材によって防止するようにしたことを特徴とする
請求項1又は2記載の容器内気体の漏出遮断方法。
3. An annular seal member made of an elastic body and airtightly abutting on an inner surface of the lid is provided at an upper edge portion of the container main body to prevent gas in the container main body from leaking to the outside. 3. The method according to claim 1, wherein the leakage is prevented by a sealing member.
【請求項4】 上部が開口し、一定の内容積を有する容
器本体と、該容器本体上に載置され、前記開口部を閉塞
する蓋体とから構成される容器であって、 前記容器本体の上端部外周に、上部が開口した環状の凹
溝部を形成し、該凹溝部内に液体を貯留せしめるととも
に、 前記蓋体の周縁に、該周縁部から下方に垂下する垂下部
を形成し、該垂下部を、その下端部が前記凹溝部内の液
体中に浸漬された状態で前記容器本体の上端部に外嵌可
能に成したことを特徴とする内部気体の漏出遮断構造を
備えた容器。
4. A container, comprising: a container main body having an opening at an upper portion and having a constant internal volume; and a lid placed on the container main body and closing the opening. On the outer periphery of the upper end portion, an annular concave groove having an open upper part is formed, and a liquid is stored in the concave groove part.At the periphery of the lid, a drooping part hanging downward from the periphery is formed. A container provided with an internal gas leakage blocking structure, wherein the hanging portion can be externally fitted to an upper end portion of the container body in a state where a lower end portion of the hanging portion is immersed in the liquid in the concave groove portion. .
【請求項5】 前記蓋体の外周縁より内側の下面に、前
記垂下部に沿って前記下面から下方に垂下する第2垂下
部を形成し、該第2垂下部を前記容器本体の上端部に内
嵌可能に成したことを特徴とする請求項4記載の内部気
体の漏出遮断構造を備えた容器。
5. A second hanging part which is formed to extend downward from the lower surface along the hanging part on a lower surface inside the outer peripheral edge of the lid, and the second hanging part is an upper end part of the container body. 5. A container provided with an internal gas leakage blocking structure according to claim 4, wherein the container can be fitted inside the container.
【請求項6】 前記容器本体の上縁部に、弾性体からな
り、前記蓋体の内面に気密状に当接する環状のシール部
材を設けたことを特徴とする請求項4又は5記載の内部
気体の漏出遮断構造を備えた容器。
6. The inner part according to claim 4, wherein an annular seal member made of an elastic body and hermetically contacting an inner surface of the lid is provided on an upper edge portion of the container body. A container provided with a gas leakage blocking structure.
【請求項7】 前記凹溝内に液体を供給する液体供給手
段を設けるとともに、凹溝内の液体を排出する液体排出
手段を設けたことを特徴とする請求項4乃至6記載のい
ずれかの内部気体の漏出遮断構造を備えた容器。
7. The liquid supply device according to claim 4, further comprising a liquid supply means for supplying a liquid into the groove, and a liquid discharge means for discharging the liquid from the groove. Container with internal gas leakage blocking structure.
JP2001099127A 2001-03-30 2001-03-30 Container with internal gas leakage blocking structure Expired - Lifetime JP3428969B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2001099127A JP3428969B2 (en) 2001-03-30 2001-03-30 Container with internal gas leakage blocking structure
TW091104160A TW535201B (en) 2001-03-30 2002-03-06 Method of cutting out leakage of container gas and container with internal gas leakage cutout structure
KR1020027011887A KR20030023614A (en) 2001-03-30 2002-03-08 Leakage protection method of gas in a vessel and a vessel comprising leakage protection structure of inner gas
PCT/JP2002/002222 WO2002082520A1 (en) 2001-03-30 2002-03-08 Method of cutting out leakage of container gas and container with internal gas leakage cutout structure
CNB028000307A CN1215536C (en) 2001-03-30 2002-03-08 Method for stopping leakage of gas in container and container having such structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001099127A JP3428969B2 (en) 2001-03-30 2001-03-30 Container with internal gas leakage blocking structure

Publications (2)

Publication Number Publication Date
JP2002299311A true JP2002299311A (en) 2002-10-11
JP3428969B2 JP3428969B2 (en) 2003-07-22

Family

ID=18952712

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001099127A Expired - Lifetime JP3428969B2 (en) 2001-03-30 2001-03-30 Container with internal gas leakage blocking structure

Country Status (5)

Country Link
JP (1) JP3428969B2 (en)
KR (1) KR20030023614A (en)
CN (1) CN1215536C (en)
TW (1) TW535201B (en)
WO (1) WO2002082520A1 (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0410690Y2 (en) * 1987-05-14 1992-03-17
TW322605B (en) * 1995-12-07 1997-12-11 Tokyo Electron Co Ltd

Also Published As

Publication number Publication date
CN1215536C (en) 2005-08-17
KR20030023614A (en) 2003-03-19
JP3428969B2 (en) 2003-07-22
CN1455949A (en) 2003-11-12
WO2002082520A1 (en) 2002-10-17
TW535201B (en) 2003-06-01

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