JP2002287120A - Resin substrate and method for manufacturing resin substrate type liquid crystal cell - Google Patents

Resin substrate and method for manufacturing resin substrate type liquid crystal cell

Info

Publication number
JP2002287120A
JP2002287120A JP2001086710A JP2001086710A JP2002287120A JP 2002287120 A JP2002287120 A JP 2002287120A JP 2001086710 A JP2001086710 A JP 2001086710A JP 2001086710 A JP2001086710 A JP 2001086710A JP 2002287120 A JP2002287120 A JP 2002287120A
Authority
JP
Japan
Prior art keywords
resin substrate
liquid crystal
substrate
cutting
crystal cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001086710A
Other languages
Japanese (ja)
Other versions
JP2002287120A5 (en
JP4551580B2 (en
Inventor
Yasushi Hosaka
康 保坂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Watch Co Ltd
Original Assignee
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Watch Co Ltd filed Critical Citizen Watch Co Ltd
Priority to JP2001086710A priority Critical patent/JP4551580B2/en
Publication of JP2002287120A publication Critical patent/JP2002287120A/en
Publication of JP2002287120A5 publication Critical patent/JP2002287120A5/ja
Application granted granted Critical
Publication of JP4551580B2 publication Critical patent/JP4551580B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a method for cutting out one or more pieces of single cells from a sheet of resin substrate type liquid crystal cells with a CO2 laser so as not to contaminate the inside of the liquid crystal cell with any molten material remaining attached to a liquid crystal injection hole part 12. SOLUTION: In a process for manufacturing a sheet of the resin substrate type liquid crystal cells, immediately after a display pattern forming step, a hollowed out part 11 with a previously specified dimension is provided in a region designed to be a liquid crystal injection hole along a substrate cutting line. Furthermore, immediately after formation of the hollowed out part 11, the molten material remaining on and around a cutting plane for the hollowed out part 11 is completely removed with cleaning treatment. Subsequently the resin substrate provided with the hollowed out part 11 is used for the following steps of the display pattern forming step so as to turn it into a sheet of the resin substrate type liquid crystal cell.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は2枚の透明な樹脂基
板を重ね合わせ、これを切断して複数個の液晶セルを製
造する方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a plurality of liquid crystal cells by laminating two transparent resin substrates and cutting the substrates.

【0002】[0002]

【従来の技術】2枚の透明な樹脂基板を重ね合わせ、こ
れを切断して複数個の液晶セルを製造する方法につい
て、以下に図2及び図3を用いて極簡単に述べる。
2. Description of the Related Art A method of manufacturing a plurality of liquid crystal cells by laminating two transparent resin substrates and cutting the substrates will be described below with reference to FIGS. 2 and 3. FIG.

【0003】液晶表示装置には、モノクローム、カラ
ー、アクティブ型、パッシブ型、TN型、STN型、強
誘電型、反強誘電型等々方式の違いにより構造が異な
る。以下の説明は、STNパッシブ型モノクローム液晶
表示装置を代表例として行う。図2は樹脂基板の上面か
らみた平面図、図3は図2のA−A断面における断面図
である。なお図2及び図3では、シール材21以外は省
略してある。樹脂基板は通常、一度に複数個の液晶セル
を取り出すため、図2に示すように、大きな基板に、独
立した画素の表示パターンを複数個パターニングしたも
のを使用する。つまり、図2の基板からは、最終的に4
台の液晶セルが製造できる事になる。
The structure of a liquid crystal display device is different depending on the type of monochrome, color, active type, passive type, TN type, STN type, ferroelectric type, antiferroelectric type and the like. In the following description, a STN passive type monochrome liquid crystal display device will be described as a representative example. FIG. 2 is a plan view of the resin substrate as viewed from above, and FIG. 3 is a cross-sectional view taken along the line AA of FIG. 2 and 3 except for the sealing material 21 are omitted. Since a plurality of liquid crystal cells are taken out at once from a resin substrate, a large substrate obtained by patterning a plurality of display patterns of independent pixels on a large substrate is used as shown in FIG. That is, from the substrate of FIG.
One liquid crystal cell can be manufactured.

【0004】まず、第1の基板17上にスパッタリング
法または真空蒸着法等により透明電極となる酸化インジ
ュウム錫膜を形成し、フォトエッチング法により所定の
表示パターン部16にパターンを形成する。次に、透明
電極の上に、液晶の配向方向を決定するための配向膜と
して、ポリイミド等の透明樹脂を、印刷法により形成す
る。また、第2の基板18上にもスパッタリング法また
は真空蒸着法等により透明電極となる酸化インジュウム
錫膜を形成し、フォトエッチング法により所定のパター
ンを形成し、透明電極の上に、配向膜としてポリイミド
等の透明樹脂を印刷法により形成する。さらに、ラビン
グにより、第1の基板17及び第2の基板18上に形成
した配向膜の配向方向を決定する。
First, an indium tin oxide film serving as a transparent electrode is formed on a first substrate 17 by a sputtering method or a vacuum evaporation method, and a pattern is formed on a predetermined display pattern portion 16 by a photoetching method. Next, a transparent resin such as polyimide is formed by a printing method on the transparent electrode as an alignment film for determining the alignment direction of the liquid crystal. In addition, an indium tin oxide film serving as a transparent electrode is formed also on the second substrate 18 by a sputtering method or a vacuum evaporation method, and a predetermined pattern is formed by a photoetching method. A transparent resin such as polyimide is formed by a printing method. Further, the orientation direction of the orientation film formed on the first substrate 17 and the second substrate 18 is determined by rubbing.

【0005】そして、第2の基板18上に、第1の基板
17と第2の基板18のギャップを均一に保つための内
部スペーサを、散布機によって一様に散布する。なお、
内部スペーサには、球形のシリカビーズや球形のプラス
チックビーズを使用する。
[0005] Then, an internal spacer for keeping the gap between the first substrate 17 and the second substrate 18 uniform is uniformly spread on the second substrate 18 by a sprayer. In addition,
For the internal spacer, spherical silica beads or spherical plastic beads are used.

【0006】また、第1の基板17の表示パターン16
周辺部に、第1の基板17と第2の基板18とを接着し
密閉するための熱硬化型のシール材21を、印刷法によ
り設ける。なお、シール材21には、第1の基板17と
第2の基板18のギャップを均一に保つためのシール内
スペーサが混入されている。シール内スペーサには、シ
リカビーズやグラスファイバーを使用する。
The display pattern 16 on the first substrate 17
A thermosetting sealing material 21 for bonding and sealing the first substrate 17 and the second substrate 18 is provided on the peripheral portion by a printing method. Note that a spacer in the seal for keeping the gap between the first substrate 17 and the second substrate 18 uniform is mixed in the sealant 21. Silica beads or glass fibers are used for the spacer in the seal.

【0007】次に、第1の基板17と第2の基板18
を、両基板の対向に設けたパターンが有効な画素を形成
できるように、両基板に設けられたアライメントマーク
を使って、アライメントして重ね合わせる。その後、セ
ルギャップ形成工程において、この重ね合わせた基板を
所定組数積層して加圧焼成し、所定の均一なギャップに
シール材を硬化させ、複数個の液晶セルが一体化した一
対の基板を作成する。
Next, a first substrate 17 and a second substrate 18
Are aligned and overlapped using alignment marks provided on both substrates so that a pattern provided on both substrates can form effective pixels. Thereafter, in a cell gap forming step, a predetermined number of the stacked substrates are stacked and baked under pressure, the sealing material is cured to a predetermined uniform gap, and a pair of substrates in which a plurality of liquid crystal cells are integrated is formed. create.

【0008】次に、一対の基板内における個々の複数の
液晶セルパターン境界を、スクライブマシンによって分
離切断し、複数個の液晶セルを取り出す。取り出した単
個の液晶セルに、液晶注入孔部12から液晶を注入す
る。そして、紫外線硬化樹脂により液晶を封止し、単個
の液晶セルが完成する。
Next, a plurality of liquid crystal cell pattern boundaries in a pair of substrates are separated and cut by a scribe machine to take out a plurality of liquid crystal cells. Liquid crystal is injected from the liquid crystal injection hole 12 into the single liquid crystal cell taken out. Then, the liquid crystal is sealed with an ultraviolet curable resin, and a single liquid crystal cell is completed.

【0009】その後、単個の液晶セルは、偏光フィルム
の張り付け、ICの実装、バックライトの実装等により
モジュール化され、液晶表示装置として機能するように
なる。
Thereafter, the single liquid crystal cell is modularized by attaching a polarizing film, mounting an IC, mounting a backlight, etc., and functions as a liquid crystal display device.

【0010】なお、ここで記載した一対の基板とは、2
枚1組の透光性基板で、2枚の基板の対向面には液晶表
示装置を実現するための画素パターンや、2枚の基板を
接着し液晶を封止するための熱硬化型シール材を有して
いるもので、さらには、まだ熱硬化型シール材が硬化し
ておらず、所定の均一なギャップを実現していない状態
のものを指す。さらに、液晶セルとは、液晶基板をギャ
ップ出し工程において、所定の均一なギャップでシール
材を硬化させたものを指す。
Note that the pair of substrates described here is
A pair of translucent substrates, a pixel pattern for realizing a liquid crystal display device on a facing surface of the two substrates, and a thermosetting sealing material for bonding the two substrates and sealing the liquid crystal. Further, it refers to a state in which the thermosetting sealing material has not yet been cured and a predetermined uniform gap has not been realized. Further, the liquid crystal cell refers to a liquid crystal substrate obtained by curing a sealing material at a predetermined uniform gap in a gap forming step.

【0011】本発明の液晶セル製造方法は、以上述べた
工程の中で、液晶セルの独立した複数のパターン境界を
分離切断する工程に関するものである。即ち、大版の基
板から作成した大版の一対の基板から、複数個の単個液
晶セルを取り出すために、また、それらの単個液晶セル
に入力電極端子を作成するために、大版の一対の基板の
切断工程が必要になる。
The method of manufacturing a liquid crystal cell according to the present invention relates to the step of separating and cutting a plurality of independent pattern boundaries of a liquid crystal cell in the above-described steps. That is, in order to take out a plurality of single liquid crystal cells from a pair of large-sized substrates created from the large-sized substrate, and to form input electrode terminals for these single-sized liquid crystal cells, A step of cutting a pair of substrates is required.

【0012】前述した液晶セルの製造方法は、基板にガ
ラス基板を使用しても、樹脂基板を使用しても、工程に
さほど差はない。ただし、透明な基板としてガラスを用
いて作成した液晶セルの場合、切断工程には、スクライ
ブ・ブレイク工程による分離切断が行われる。スクライ
ブ・ブレイク工程とは、超硬鋼刃やダイヤモンドカッタ
ー等によりガラスの所定の場所に線状に切り込みを入
れ、その後、切り込みを入れた部位の裏面側から切り込
みに沿って、ガラス表面に傷を付けない様な弾性部材等
で衝撃を与え、ガラスの厚み方向に切り込みを伝播させ
て所定の形状にガラスを破断させる工程である。
In the above-described method of manufacturing a liquid crystal cell, there is not much difference in the process between using a glass substrate and a resin substrate. However, in the case of a liquid crystal cell formed using glass as a transparent substrate, in the cutting step, separation and cutting are performed by a scribe and break step. The scribe-break process is to make a linear cut in a predetermined place on the glass with a carbide steel blade or diamond cutter, and then scratch the glass surface along the cut from the back side of the cut part. This is a step in which an impact is applied by an elastic member or the like which is not attached to the glass to propagate a cut in the thickness direction of the glass to break the glass into a predetermined shape.

【0013】ところで、樹脂基板は切り込み後の衝撃印
加による傷の伝播がほとんどないため、ガラス基板の切
断に普通に使用される、スクライブ・ブレイク工程が利
用できない。そこで、樹脂基板の切断ではダイシングや
超音波カッターまたはCO2レーザを用いて板厚分を完
全に切断するか、または、ある所定の深さまで切り込み
を入れた後、板を撓ませる曲げ応力の負荷により基板を
切断する。
By the way, since a resin substrate hardly propagates a flaw due to the application of an impact after cutting, a scribe-break process which is usually used for cutting a glass substrate cannot be used. Therefore, when cutting the resin substrate, use a dicing, ultrasonic cutter, or CO2 laser to completely cut the thickness of the board, or cut into a certain depth, and then apply a bending stress to bend the board. Cut the substrate.

【0014】[0014]

【発明が解決しようとする課題】樹脂基板の切断にダイ
シングや超音波カッターまたはCO2レーザを利用した
場合、切断の際に膨大な発塵や溶融物を発生する。ここ
で、図2及び図4から図6を用いて、CO2レーザを利
用した場合を一例として、樹脂基板の切断の際に課題と
なる現象を説明する。図4から図6では、樹脂基板の切
断方法として、基板にある所定の深さdまで切り込みを
入れた後、板を撓ませる曲げ応力の負荷により基板を切
断する方法で示してある。なお、図4から図6は、図2
で示したB−B断面を示すものである。
When dicing, an ultrasonic cutter, or a CO2 laser is used for cutting a resin substrate, an enormous amount of dust and melt are generated at the time of cutting. Here, with reference to FIG. 2 and FIG. 4 to FIG. 6, a phenomenon that will be a problem when cutting a resin substrate will be described using a case where a CO2 laser is used as an example. FIGS. 4 to 6 show a method of cutting the resin substrate by making a cut to a predetermined depth d in the substrate and then applying a bending stress to bend the plate. 4 to 6 correspond to FIG.
3 shows a BB cross section indicated by.

【0015】図4は樹脂基板の切断線をCO2レーザで
切断した直後の液晶注入孔部12の断面を示し、図5は
溶融物41洗浄直後の液晶注入孔部12の断面を示し、
さらに図6は曲げ応力により液晶セルを完全に切断した
直後の液晶注入孔部12の断面を示す。
FIG. 4 shows a cross section of the liquid crystal injection hole 12 immediately after the cutting line of the resin substrate is cut by a CO 2 laser. FIG. 5 shows a cross section of the liquid crystal injection hole 12 immediately after cleaning the melt 41.
FIG. 6 shows a cross section of the liquid crystal injection hole 12 immediately after completely cutting the liquid crystal cell by bending stress.

【0016】まず図4に示すように、CO2レーザで第
1の基板の切断線13に沿って所定の深さdまで切り込
みを入れる。なお、所定の深さdとは、樹脂基板の種類
により異なるが、樹脂基板に曲げ応力を負荷した時に、
切断線に沿って樹脂基板を容易に切断できるのに十分な
深さである。このようにCO2レーザで樹脂基板に切り
込みを入れると、切断面とその周辺に樹脂基板の溶融物
41が付着残留する。
First, as shown in FIG. 4, a cut is made to a predetermined depth d along a cutting line 13 of the first substrate with a CO 2 laser. The predetermined depth d depends on the type of the resin substrate, but when a bending stress is applied to the resin substrate,
The depth is sufficient to easily cut the resin substrate along the cutting line. When the cut is made in the resin substrate by the CO2 laser in this manner, the melt 41 of the resin substrate adheres and remains on the cut surface and its periphery.

【0017】付着残留した溶融物41が液晶注入孔部1
2に残っていると、液晶を樹脂基板液晶セルに注入する
行程で溶融物が液晶とともに樹脂基板液晶セル内に浸入
してしまい、液晶ディスプレイとしての表示品質に大幅
な欠陥が発生する。
The melt 41 remaining on the liquid crystal injection hole 1
If the liquid crystal remains, the molten material infiltrates into the resin substrate liquid crystal cell together with the liquid crystal in the process of injecting the liquid crystal into the resin substrate liquid crystal cell, causing a significant defect in the display quality of the liquid crystal display.

【0018】そこで、CO2レーザで樹脂基板を切断し
た直後は、特に液晶注入孔部12に付着残留した溶融物
41を溶剤や表面活性剤などの洗浄液を用いて洗浄処理
する。しかしながら、溶融物41の洗浄処理において樹
脂基板液晶セルを溶剤や表面活性剤などの洗浄液で超音
波などを利用した自動洗浄を行うと、溶剤や表面活性剤
などの洗浄液が樹脂基板液晶セルの端部から樹脂基板液
晶セル内に浸入してしまい、その結果、樹脂基板液晶セ
ルは最終的に液晶ディスプレイとして機能しなくなる。
Therefore, immediately after the resin substrate is cut by the CO2 laser, the melt 41 particularly adhering to the liquid crystal injection hole 12 is subjected to a cleaning treatment using a cleaning liquid such as a solvent or a surfactant. However, when the resin substrate liquid crystal cell is subjected to automatic cleaning using ultrasonic waves or the like with a cleaning liquid such as a solvent or a surfactant in the cleaning process of the melt 41, the cleaning liquid such as the solvent or the surfactant is not cleaned at the edge of the resin substrate liquid crystal cell. The resin liquid crystal cell invades the resin substrate liquid crystal cell from the portion, and as a result, the resin substrate liquid crystal cell eventually does not function as a liquid crystal display.

【0019】また、切断線及びその周辺を溶剤や表面活
性剤などの洗浄液を含ませた布などを利用して溶融物4
1を拭うように洗浄しても、所定の深さdまで切り込ん
だ溝に付着した溶融物41の洗浄は難しく、完全には溝
から除去する事ができない。さらに、溶剤や表面活性剤
などの洗浄液を含んだ布などを利用した切断線及びその
周辺を拭うような洗浄処理では、切断線を拭う際の圧力
により切断線の切り込みが少なからず伝搬して、所々に
小さな貫通孔が開いてしまう。その小さな貫通孔が液晶
注入孔部12で開いてしまうと、溶剤や表面活性剤など
の洗浄液が樹脂基板液晶セル内に浸入してしまい、その
結果として樹脂基板液晶セルが最終的に液晶ディスプレ
イとして機能しなくなる。
Further, the cutting line and its surroundings are melted by using a cloth or the like containing a cleaning liquid such as a solvent or a surfactant.
Even if it is cleaned by wiping, it is difficult to clean the melt 41 adhered to the groove cut to a predetermined depth d, and it cannot be completely removed from the groove. Furthermore, in a cleaning process using a cloth or the like containing a cleaning solution such as a solvent or a surfactant, the cutting line and the periphery thereof are wiped. Small through holes are opened in some places. When the small through hole is opened in the liquid crystal injection hole 12, a cleaning liquid such as a solvent or a surfactant penetrates into the resin substrate liquid crystal cell. As a result, the resin substrate liquid crystal cell finally becomes a liquid crystal display. Will not work.

【0020】以上述べた事柄は、樹脂基板の切断にダイ
シングや超音波カッター等を利用した場合も同様に問題
となる。
The above-described matter also causes a problem when dicing or an ultrasonic cutter is used for cutting the resin substrate.

【0021】[発明の目的]本発明の目的は、上記課題
を解決し、一対の樹脂基板を単個の樹脂基板液晶セルに
切断する際、残留する溶融物41や切り屑などの異物を
液晶注入孔部12から完全に除去し、液晶注入処理で液
晶以外の異物が液晶とともに樹脂基板液晶セル内に浸入
する事のない樹脂基板液晶セルの製造方法を提供する事
である。
[Object of the Invention] An object of the present invention is to solve the above-mentioned problems, and to remove a foreign substance such as a molten material 41 and chips when a pair of resin substrates are cut into a single resin substrate liquid crystal cell. An object of the present invention is to provide a method of manufacturing a resin substrate liquid crystal cell which is completely removed from the injection hole portion 12 and in which foreign substances other than liquid crystal do not enter the resin substrate liquid crystal cell together with the liquid crystal in the liquid crystal injection process.

【0022】[0022]

【課題を解決するための手段】上記目的を達成するため
に、本発明の樹脂基板液晶セルの製造方法は、下記記載
の構成を採用する。
In order to achieve the above object, a method of manufacturing a resin substrate liquid crystal cell according to the present invention employs the following constitution.

【0023】透明な樹脂基板を用いた液晶セル製造工程
であって、パターン形成工程で基板に表示パターンを形
成し、配向処理工程で配向処理を施して液晶基板を製造
し、基板重ね合わせ工程で液晶基板を重ね合わせて接着
した後、基板を切断して1個または複数個の液晶セルを
製造する方法であって、基板のパターン形成直後に液晶
注入孔想定部に予め基板切断線に沿って所定の寸法の刳
り貫きを設け、さらに、刳り貫き部形成直後に刳り貫き
部の切断面と、その周辺に残留する切り屑あるいは溶融
物を洗浄処理により、完全に除去する事を特徴とする。
In a liquid crystal cell manufacturing process using a transparent resin substrate, a display pattern is formed on the substrate in a pattern forming process, an alignment process is performed in an alignment process, and a liquid crystal substrate is manufactured. A method of manufacturing one or more liquid crystal cells by cutting a substrate after laminating and adhering liquid crystal substrates, and immediately following a substrate cutting line at a liquid crystal injection hole assumed portion immediately after pattern formation of the substrate. A hollow having a predetermined size is provided, and further, a cut surface of the hollow and a chip or a molten material remaining around the hollow immediately after the formation of the hollow are completely removed by a cleaning process.

【0024】[作用]樹脂基板のパターニング処理直後
に第1の基板17及び第2の基板18それぞれの液晶注
入孔想定部位に、ダイシングや超音波カッターまたはC
O2レーザなどを利用して樹脂基板の切断線に沿って所
定の寸法の刳り貫き部を設ける。
[Operation] Immediately after the patterning process of the resin substrate, dicing, an ultrasonic cutter or C is applied to each of the liquid crystal injection holes on the first substrate 17 and the second substrate 18.
A hollow portion having a predetermined size is provided along a cutting line of the resin substrate using an O2 laser or the like.

【0025】次に、刳り貫き部を設けた樹脂基板を溶剤
や表面活性剤などの洗浄液を用いて洗浄処理する。洗浄
処理には、樹脂基板がまだ一対の樹脂基板体ではないた
め、超音波などを利用した自動洗浄処理が容易に行え、
さらに、異物は、完全に切断された樹脂基板の断面に付
着しているものであるため、樹脂基板から完全に除去で
きる。溶融物41や切り屑などの異物を樹脂基板から完
全に除去した後、表示パターン形成処理後の組立工程に
樹脂基板を投入する。
Next, the resin substrate provided with the hollow portion is subjected to a cleaning process using a cleaning liquid such as a solvent or a surfactant. In the cleaning process, since the resin substrate is not yet a pair of resin substrate bodies, an automatic cleaning process using ultrasonic waves or the like can be easily performed.
Further, since the foreign matter is attached to the cross section of the completely cut resin substrate, it can be completely removed from the resin substrate. After completely removing foreign matters such as the melt 41 and chips from the resin substrate, the resin substrate is put into an assembly process after the display pattern forming process.

【0026】そして、樹脂基板を重ね合わせ、ギャップ
出し工程を経て樹脂基板を液晶セルとした後、単個セル
を複数個取り出すために再度樹脂基板を切断処理する
が、その際には液晶注入孔部12は既に刳り貫き部とし
て切断しているため、液晶注入孔部12を切断する必要
がない。その結果、樹脂基板液晶セルから単個セルを取
り出すために切断処理をしても、液晶注入孔部12に溶
融物41や切り屑などの異物が付着する事がない。
Then, after the resin substrates are overlapped and the resin substrate is made into a liquid crystal cell through a gap forming step, the resin substrate is cut again to take out a plurality of single cells. Since the portion 12 has already been cut as a hollow portion, there is no need to cut the liquid crystal injection hole portion 12. As a result, even if a cutting process is performed to take out a single cell from the resin substrate liquid crystal cell, foreign matters such as the melt 41 and chips are not attached to the liquid crystal injection hole portion 12.

【0027】従って、液晶注入処理で、注入孔部12か
ら液晶以外の異物が樹脂液晶セル内に浸入する事を防
ぎ、最終的に液晶ディスプレイとして完全に機能する樹
脂基板液晶セルを製造する事が可能となる。
Therefore, in the liquid crystal injection process, foreign substances other than liquid crystal can be prevented from entering the resin liquid crystal cell from the injection hole portion 12, and finally, a resin substrate liquid crystal cell completely functioning as a liquid crystal display can be manufactured. It becomes possible.

【0028】[0028]

【発明の実施の形態】以下図1を用いて本発明の実施形
態における樹脂基板液晶セルの製造方法を説明する。な
お、本明細書の発明の実施の形態では、樹脂基板の例と
して、板厚が0.4mmのアクリル系樹脂製基板の場合
について説明する。また、樹脂基板の切断には、CO2
レーザを利用した場合について述べる。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A method for manufacturing a resin substrate liquid crystal cell according to an embodiment of the present invention will be described below with reference to FIG. In the embodiments of the present invention, a case of an acrylic resin substrate having a thickness of 0.4 mm will be described as an example of the resin substrate. For cutting the resin substrate, use CO2
The case where a laser is used will be described.

【0029】透明な樹脂基板を用意し、樹脂基板液晶セ
ルの表示パターンとなるパターンを形成するを表示パタ
ーン形成工程を行い、その後刳り貫き部形成工程とし
て、第1の基板17及び第2の基板18それぞれのシー
ル材想定位置15に対応した液晶注入孔部12側に、第
1の基板の切断線13及び第2の基板の切断線14それ
ぞれに沿って、幅W高さHの刳り貫き部11をCO2レ
ーザによって設ける。なお、刳り貫き部11の幅Wは、
最終的に樹脂基板液晶セルから取り出す単個セルの、液
晶注入孔部12側のセル幅と同じである。さらに、刳り
貫き部11の高さは3〜5mmで十分である。本実施の
形態では、1つの樹脂基板から4個の樹脂基板液晶セル
をとるため、刳り貫き部は4個形成した。
A transparent resin substrate is prepared, a display pattern forming step is performed to form a pattern to be a display pattern of the resin substrate liquid crystal cell, and then a first substrate 17 and a second substrate 17 are formed as a hollowed out portion forming step. 18 A hollow portion having a width W and a height H is formed along the cutting line 13 of the first substrate and the cutting line 14 of the second substrate on the liquid crystal injection hole 12 side corresponding to each of the assumed sealing material positions 15. 11 is provided by a CO2 laser. The width W of the hollow portion 11 is
The cell width of the single cell finally taken out of the resin substrate liquid crystal cell is the same as the cell width on the liquid crystal injection hole 12 side. Furthermore, it is sufficient that the height of the hollow portion 11 is 3 to 5 mm. In the present embodiment, in order to obtain four resin substrate liquid crystal cells from one resin substrate, four hollow portions are formed.

【0030】次に、樹脂基板洗浄工程として、樹脂基板
の刳り貫き部11の切断面に付着残留した溶融物41を
除去するために、第1の基板17と第2の基板18を溶
剤や界面活性剤などの洗浄液と超音波を利用した基板洗
浄機に掛けて完全に除去する工程を行う。この時、樹脂
基板はこの時点でまだセル体でないため、自動洗浄処理
が容易に行え、さらに、溶融物41は樹脂基板の完全に
切断された切断面に付着残留しているものであるため、
この洗浄処理により樹脂基板から容易に除去できる。
Next, in a resin substrate cleaning step, the first substrate 17 and the second substrate 18 are mixed with a solvent or an interface in order to remove the melt 41 remaining on the cut surface of the hollow portion 11 of the resin substrate. A process of completely removing the substrate by using a cleaning solution such as an activator and ultrasonic waves in a substrate cleaning machine is performed. At this time, since the resin substrate is not yet a cell body at this time, the automatic cleaning process can be easily performed. Further, since the molten material 41 is adhered and remains on the completely cut cut surface of the resin substrate,
This cleaning process allows easy removal from the resin substrate.

【0031】次に、樹脂基板洗浄後、配向膜を形成し
て、配向処理を行う配向処理工程をとるため組立工程に
樹脂基板を投入する。 そして、樹脂基板を重ね合わせ
る重ね合わせ工程としてギャップ出し工程を経て、樹脂
基板を一対の樹脂基板とした後、単個の樹脂基板液晶セ
ルを複数個取り出すために、切断工程としてCO2レー
ザで第1の基板の切断線13及び第2の基板の切断線1
4それぞれに沿って切断処理を施す。その際、液晶注入
孔部12は既に刳り貫き部11として予め切断している
ため、液晶注入孔部12をここで切断する必要がない。
Next, after washing the resin substrate, an alignment film is formed, and the resin substrate is put into an assembling process to perform an alignment process for performing an alignment process. Then, after the resin substrate is made into a pair of resin substrates through a gap setting process as a superposition process of superposing the resin substrates, a first process using a CO2 laser is performed as a cutting process to take out a plurality of single resin substrate liquid crystal cells. Cutting line 13 of the second substrate and cutting line 1 of the second substrate
(4) A cutting process is performed along each of them. At this time, since the liquid crystal injection hole 12 has already been cut in advance as the hollow portion 11, there is no need to cut the liquid crystal injection hole 12 here.

【0032】その結果、樹脂基板液晶セルから単個セル
を取り出すためにCO2レーザにより切断処理を施して
も、単個セルの液晶注入孔部12に溶融物41が付着残
留する事を防ぐ事ができる。従って、液晶注入工程で、
液晶注入孔部12から液晶以外の異物が樹脂基板液晶セ
ル内に浸入する事を防ぐ事ができ、最終的に液晶ディス
プレイとして完全に機能する樹脂基板液晶セルを製造す
る事が可能となる。
As a result, even if a cutting process is performed by a CO 2 laser to take out a single cell from the liquid crystal cell on the resin substrate, it is possible to prevent the melt 41 from adhering and remaining in the liquid crystal injection hole 12 of the single cell. it can. Therefore, in the liquid crystal injection step,
It is possible to prevent foreign matters other than liquid crystal from entering the resin substrate liquid crystal cell from the liquid crystal injection hole portion 12, and finally, it is possible to manufacture a resin substrate liquid crystal cell that completely functions as a liquid crystal display.

【0033】また、本実施の形態では刳り貫き部形成工
程及び切断工程にCO2レーザを用いたが、CO2レーザ
の変わりに超音波カッターを用いても、ダイシングを用
いても、同様の効果が得られる。
In this embodiment, the CO2 laser is used in the hollow portion forming step and the cutting step. However, the same effect can be obtained by using an ultrasonic cutter or dicing instead of the CO2 laser. Can be

【0034】[0034]

【発明の効果】以上の説明で明らかな様に、本発明の樹
脂基板液晶セル製造方法により、樹脂基板液晶セルから
1個または複数個の単個セルをCO2レーザやダイシン
グあるいは超音波カッターで切断して取り出す際に、液
晶注入孔部12を溶融物や切り屑で汚す事なく、液晶注
入処理において、樹脂基板液晶セル内に液晶以外の異物
を浸入させる事なく、完全に機能する樹脂基板液晶ディ
スプレイを得る事ができる。
As is apparent from the above description, according to the method for manufacturing a resin substrate liquid crystal cell of the present invention, one or more single cells are cut from a resin substrate liquid crystal cell by a CO2 laser, dicing or an ultrasonic cutter. The liquid crystal injection hole portion 12 is not contaminated with a melt or a chip when taken out, and in the liquid crystal injection process, no foreign matter other than liquid crystal enters the resin substrate liquid crystal cell. You can get a display.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施形態における樹脂基板の刳り貫き
部を示す平面図である。
FIG. 1 is a plan view showing a hollow portion of a resin substrate according to an embodiment of the present invention.

【図2】従来技術における樹脂基板液晶セルを示す平面
図である。
FIG. 2 is a plan view showing a resin substrate liquid crystal cell according to the related art.

【図3】従来技術における樹脂基板液晶セルを示す断面
図である。
FIG. 3 is a cross-sectional view showing a resin substrate liquid crystal cell according to the related art.

【図4】従来技術における樹脂基板液晶セルをCO2レ
ーザで所定の深さまで切断した直後の液晶注入孔部の断
面を示す模式図である。
FIG. 4 is a schematic diagram showing a cross section of a liquid crystal injection hole immediately after cutting a resin substrate liquid crystal cell to a predetermined depth by a CO2 laser in a conventional technique.

【図5】従来技術における樹脂基板液晶セルを切断後、
洗浄処理した直後の液晶注入孔部の断面を示す模式図で
ある。
FIG. 5 shows a conventional technique after cutting a resin substrate liquid crystal cell.
It is a schematic diagram which shows the cross section of the liquid crystal injection hole immediately after the washing process.

【図6】従来技術における樹脂基板液晶セルを所定の深
さまで切断した後、曲げ応力で完全に切断した直後の液
晶注入孔部の断面を示す模式図である。
FIG. 6 is a schematic view showing a cross section of a liquid crystal injection hole immediately after completely cutting a resin substrate liquid crystal cell to a predetermined depth and then completely cutting it with a bending stress in a conventional technique.

【符号の説明】[Explanation of symbols]

11 刳り貫き部 12 液晶注入孔部 13 第1の基板の切断線 14 第2の基板の切断線 15 シール材想定位置 16 表示パターン部 17 第1の基板 18 第2の基板 21 シール材 41 溶融物 REFERENCE SIGNS LIST 11 hollow portion 12 liquid crystal injection hole portion 13 cut line of first substrate 14 cut line of second substrate 15 assumed position of sealing material 16 display pattern portion 17 first substrate 18 second substrate 21 sealing material 41 melt

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 透明な樹脂基板液晶セルを複数個作成す
るための樹脂基板であって、液晶注入部となる箇所に複
数個の刳り貫き部を有する樹脂基板。
1. A resin substrate for producing a plurality of transparent resin substrate liquid crystal cells, wherein the resin substrate has a plurality of hollow portions at a portion to be a liquid crystal injection portion.
【請求項2】 透明な樹脂基板を用意し、前記樹脂基板
の液晶注入孔となる箇所に刳り貫き部を形成する刳り貫
き部形成工程と、刳り貫き部形成工程後の樹脂基板を洗
浄する樹脂基板洗浄工程とを有する樹脂基板液晶セル用
の樹脂基板の製造方法。
2. A process for forming a transparent resin substrate, forming a hollow portion in a portion of the resin substrate to be a liquid crystal injection hole, and cleaning the resin substrate after the hollow portion forming process. A method for producing a resin substrate for a resin substrate liquid crystal cell, comprising a substrate cleaning step.
【請求項3】 透明な樹脂基板を用意し、樹脂基板液晶
セルの表示パターンを形成したパターン形成工程と、前
記樹脂基板液晶セルの液晶注入孔となる箇所に刳り貫き
部を形成する刳り貫き部形成工程と、刳り貫き部形成工
程後の樹脂基板を洗浄する樹脂基板洗浄工程と、樹脂基
板に配向処理を施す配向処理工程と、樹脂基板と樹脂基
板とを重ね合わせて接着した基板重ね合わせ工程と、重
ね合わせた樹脂基板を切断して、複数個の樹脂基板液晶
セルとする切断工程と、樹脂基板液晶セルに液晶を注入
する注入工程を有する樹脂基板液晶セルの製造方法。
3. A pattern forming step in which a transparent resin substrate is prepared and a display pattern of a resin substrate liquid crystal cell is formed, and a hollow portion is formed in a portion to be a liquid crystal injection hole of the resin substrate liquid crystal cell. A forming step, a resin substrate cleaning step of cleaning the resin substrate after the hollow part forming step, an alignment processing step of performing an alignment processing on the resin substrate, and a substrate laminating step of laminating and bonding the resin substrate and the resin substrate. And a cutting step of cutting the superposed resin substrates to form a plurality of resin substrate liquid crystal cells, and an injection step of injecting liquid crystal into the resin substrate liquid crystal cells.
【請求項4】 請求項2または請求項3に記載の刳り貫
き部形成工程または切断工程で、樹脂基板または重ね合
わせた樹脂基板の切断にCO2レーザを利用する事を特
徴とする樹脂基板または樹脂基板液晶セルの製造方法。
4. The resin substrate or the resin according to claim 2 or 3, wherein a CO2 laser is used for cutting the resin substrate or the superposed resin substrate in the hollow portion forming step or the cutting step. A method for manufacturing a substrate liquid crystal cell.
【請求項5】 請求項2または請求項3記載の刳り貫き
部形成工程または切断工程で、樹脂基板または重ね合わ
せた樹脂基板の切断に超音波カッターを利用する事を特
徴とする樹脂基板または樹脂基板液晶セルの製造方法。
5. The resin substrate or the resin according to claim 2 or 3, wherein an ultrasonic cutter is used for cutting the resin substrate or the superposed resin substrate in the hollowing portion forming step or the cutting step. A method for manufacturing a substrate liquid crystal cell.
【請求項6】 請求項2または請求項3記載の刳り貫き
部形成工程または切断工程で、樹脂基板または重ね合わ
せた樹脂基板の切断にダイシングを利用する事を特徴と
する樹脂基板または樹脂基板液晶セルの製造方法。
6. A resin substrate or a liquid crystal of a resin substrate, wherein dicing is used for cutting the resin substrate or the superposed resin substrate in the hollow part forming step or the cutting step according to claim 2 or 3. Cell manufacturing method.
JP2001086710A 2001-03-26 2001-03-26 Large resin substrate liquid crystal cell having a plurality of liquid crystal cell regions, a method for producing the same, and a method for producing a resin substrate liquid crystal cell based thereon Expired - Fee Related JP4551580B2 (en)

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JP2001086710A JP4551580B2 (en) 2001-03-26 2001-03-26 Large resin substrate liquid crystal cell having a plurality of liquid crystal cell regions, a method for producing the same, and a method for producing a resin substrate liquid crystal cell based thereon

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Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59123831U (en) * 1983-02-08 1984-08-21 シャープ株式会社 liquid crystal display element
JPH01196020A (en) * 1988-02-01 1989-08-07 Bio Toron:Kk Liquid crystal cell having plastic film substrate and surface cleaning method for plastic film substrate for said liquid crystal cell and surface treatment thereof
JPH0588136A (en) * 1991-09-30 1993-04-09 Sharp Corp Method for parting liquid crystal display element using plastic substrate
JPH0749474A (en) * 1993-08-04 1995-02-21 Idemitsu Kosan Co Ltd Device and method for cutting liquid crystal display film
JPH08201749A (en) * 1995-01-31 1996-08-09 Sanyo Electric Co Ltd Production of liquid crystal display device
WO1997016764A1 (en) * 1995-11-02 1997-05-09 Seiko Epson Corporation Method of production of liquid crystal panel
JP2000131661A (en) * 1998-10-28 2000-05-12 Optrex Corp Production of liquid crystal display element
JP2000267060A (en) * 1999-03-16 2000-09-29 Mitsui Chemicals Inc Method to divide liquid crystal display cell
JP2001066610A (en) * 1999-08-31 2001-03-16 Optrex Corp Sealing structure

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59123831U (en) * 1983-02-08 1984-08-21 シャープ株式会社 liquid crystal display element
JPH01196020A (en) * 1988-02-01 1989-08-07 Bio Toron:Kk Liquid crystal cell having plastic film substrate and surface cleaning method for plastic film substrate for said liquid crystal cell and surface treatment thereof
JPH0588136A (en) * 1991-09-30 1993-04-09 Sharp Corp Method for parting liquid crystal display element using plastic substrate
JPH0749474A (en) * 1993-08-04 1995-02-21 Idemitsu Kosan Co Ltd Device and method for cutting liquid crystal display film
JPH08201749A (en) * 1995-01-31 1996-08-09 Sanyo Electric Co Ltd Production of liquid crystal display device
WO1997016764A1 (en) * 1995-11-02 1997-05-09 Seiko Epson Corporation Method of production of liquid crystal panel
JP2000131661A (en) * 1998-10-28 2000-05-12 Optrex Corp Production of liquid crystal display element
JP2000267060A (en) * 1999-03-16 2000-09-29 Mitsui Chemicals Inc Method to divide liquid crystal display cell
JP2001066610A (en) * 1999-08-31 2001-03-16 Optrex Corp Sealing structure

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