JP2002282717A - Method for producing unwashed rice and apparatus thereof - Google Patents

Abstract

PROBLEM TO BE SOLVED: To remove bran and fine ruggedness remaining on the surface of polished rice without damaging the polished rice additionally. SOLUTION: Grinding material which has a hardness lower than the surface hardness of polished rice, has no adhesiveness and has a particle size of <=12 mesh and >=100 mesh is mixed with the polished rice and the grinding is performed while applying a prescribed pressure to the polished rice and the grinding material. When the grinding is completed, the polished rice, the grinding material and the bran, crushed rice and rice powder which are generated by the grinding are separated from each other, the polished rice which is ground is mixed with the grinding material and the grinding is repeated by the prescribed number while applying a prescribed pressure to the polished rice and the grinding material.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for producing unwashed rice that can be cooked without washing the rice.

[0002]

2. Description of the Related Art Conventionally, various methods and apparatuses for producing polished rice (hereinafter referred to as unwashed rice) capable of cooking rice without washing the rice have been provided. Here, the cause of the turbidity generated when the rice is washed is the bran remaining on the surface of the polished rice and the starch grains that have melted out from the fine irregularities existing on the surface of the polished rice.

[0003] In Japanese Patent Application Laid-Open No. 6-343882, a process of polishing and polishing polished rice by mixing defatted bran and an abrasive with polished rice, a process of separating and removing defatted bran and an abrasive from polished rice, and adhering to polished rice. A method for producing refined rice, comprising: removing fine powder. Further, in this refined rice production method, it is disclosed that rice is polished while applying a predetermined pressure in the rice polishing step.

[0004] Also, in Japanese Patent No. 2983010, 100 mesh parts or less of polished polished rice is 10 mesh or less.
After mixing and stirring the polished rice of 50 mesh or more in a ratio of 10 to 200 parts by weight to grind the polished rice and peel off and remove the bran remaining on the polished rice surface, the polished rice is separated from the polished rice. A method for producing washed non-washed rice is provided.

[0005]

However, in the method described in JP-A-6-343882, the abrasive is
For example, it is a granular material of ceramics, which is larger than the diameter of polished rice or smaller than the diameter of polished rice. Therefore, according to this method, the bran remaining on the surface of the polished rice can be reliably removed and the irregularities can be polished.However, since the ceramic is higher than the surface hardness of the polished rice, There is a problem that fine scratches are newly formed. As a result, the turbidity of washing rice cannot be effectively eliminated.

Further, in the method of Japanese Patent No. 2983010, polished rice is polished by stirring it with crushed rice, and since this crushed rice has the same hardness as polished rice,
As described above, the surface of the polished rice is newly finely scratched by polishing, and the turbidity when the rice is washed cannot be efficiently eliminated.

[0007] Therefore, an object of the present invention is to provide a method and an apparatus for producing unwashed rice, which can polish bran and fine irregularities remaining on the surface without newly damaging the polished rice. is there.

[0008]

Means for Solving the Problems To solve the above-mentioned problems, a method for producing unwashed rice according to the present invention is characterized in that polished rice has a hardness lower than the surface hardness of polished rice, has no adhesiveness, and has a particle size of 12 mesh or less. A polishing material having a mesh or more is mixed and polished while applying a predetermined pressure to the polished rice and the polishing material.

According to the above manufacturing method, since the hardness of the abrasive is lower than the surface hardness of the polished rice, even if the polished rice is mixed with the abrasive and polished, a new scratch is formed on the surface of the polished rice. Can be prevented. In addition, since a predetermined pressure is applied at the time of this polishing, irregularities on the surface of the polished rice can be surely polished even with an abrasive having a low hardness. Furthermore, since the abrasive has no adhesiveness, it can be prevented from attaching to the surface of the polished rice during polishing. Furthermore, the particle size is 12
Since the size is smaller than the mesh, the bran adhering to the grooves existing in the rice can also be reliably separated. The particle size is 100
Since the mesh is larger than the mesh, it is possible to prevent the fluidity from deteriorating and the handling to be difficult, and also to prevent the problem of hardening together with the polished rice when pressure is applied.

In the above-mentioned manufacturing method, when the polishing is completed, the polished rice, the abrasive, the bran generated by the polishing, the crushed rice and the rice flour are separated, and the polished polished rice is mixed with the abrasive to a predetermined amount. It is preferable that polishing is repeated a predetermined number of times while applying pressure. In this way, even a polishing material having a surface hardness lower than that of the polished rice can be reliably polished to a desired polishing level.

It is preferable that the separated abrasive is further mixed with polished rice and used repeatedly. In this way, waste of the abrasive can be prevented.

Further, the washing-free rice manufacturing apparatus applied to the above-mentioned manufacturing method comprises a milled rice tank for storing milled rice, a hardness lower than the surface hardness of the milled rice, no adhesion, a grain size of 12 mesh or less and 100 mesh. An abrasive tank for storing the above abrasives, a hopper for containing and mixing the milled rice and the abrasive transported from these tanks, and applying a predetermined pressure to the milled rice and the abrasive supplied from the hopper. And a polishing apparatus having a polishing chamber for stirring and polishing while stirring.

[0013] In the apparatus for producing non-washed rice, it is preferable to further provide a polished rice discharged from the polishing apparatus, an abrasive, and a sorting apparatus for separating and discharging bran, ground rice and rice flour generated by polishing.

It is preferable that a circulating supply device for circulating the polished rice and the abrasive discharged from the sorting device to the polished rice tank and the abrasive tank is further provided.

Further, it is preferable that a circulation device for circulating and supplying the milled rice to the milled rice tank is provided with a distribution device for distributing the milled rice to other devices.

Furthermore, it is preferable that the abrasive is defatted bran. This defatted bran is softer than polished rice and has no adhesion, so it does not damage the surface of polished rice,
The bran remaining in the milled rice grooves can also be reliably removed.

[0017]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows an apparatus for producing rice without washing to which the method for producing rice without washing according to the present invention is applied. This washing-free rice production apparatus generally comprises milled rice tanks 1A and 1B for storing milled rice.
An abrasive tank 3 for storing abrasives, a first transporting device 5 for transporting polished rice, a second transporting device 8 for transporting abrasives, a polishing device, a sorting device 33, and a circulating supply device 3.
6, 40.

The polished rice tanks 1A and 1B have a cylindrical shape with a lower end and a vertical opening with a reduced diameter, and a distribution mechanism 39 of a first circulating supply device 36, which will be described later, is provided with a well-known supply mechanism such as a chute or pipe. (1) to store the milled rice supplied by The polished rice tanks 1A and 1B are provided with opening / closing means including shutters at discharge ports 2A and 2B at lower ends thereof.

The abrasive tank 3 comprises a milled rice tank 1
Similarly to A and 1B, the polishing material is formed in a cylindrical shape with a lower end and a vertical opening with a reduced diameter, and is supplied from a second circulation supply device 40 described later by a well-known supply mechanism (not shown) such as a chute or a pipe. To store. This abrasive tank 3
Is provided with an opening / closing means comprising a shutter at the discharge port 4 at the lower end.

The first transport device 5 is provided with a polishing device 1 to be described later from outlets 2A and 2B of the milled rice tanks 1A and 1B.
The casing 6 includes a casing 6 disposed over one hopper 13 and a helical screw 7 rotatably disposed inside the casing. Then, the rotation of the screw 7 presses and feeds the milled rice supplied by the blades from the inflow section corresponding to the discharge ports 2A and 2B to the outflow section corresponding to the hopper 13 by its blades.

The second transporting device 8, like the first transporting device 5, removes the hopper 13 of the polishing device 11 from the abrasive tank 3.
And a helical screw 10 rotatably disposed inside the casing. Then, the hopper 13 is moved from the inflow section corresponding to the discharge port 4.
The abrasive supplied by the blades is pressed and fed by the rotation of the screw 10 to the outflow portion corresponding to.

The polishing apparatus 11 is, as shown in FIG.
A hopper 13 disposed above the exterior body 12 and an exterior body 12;
, A stirring member 17 disposed in the polishing chamber 14, and a driving mechanism 23 for the stirring member 17.
And a resistance mechanism 2 disposed at an outlet 16 of the polishing chamber 14.
7

The hopper 13 is formed in a conical cylindrical shape whose upper and lower sides are opened and the cross-sectional area of the lower end is reduced, and stores the polished rice and the abrasive supplied by the first and second conveying devices 5 and 8. These are supplied to the polishing chamber 14 while being mixed by gravity and naturally dropped.

The polishing chamber 14 has a cylindrical shape, and an inlet 15 is provided at the upper right end corresponding to the hopper 13. The inner diameter of the polishing chamber 14 is reduced in the middle of the polishing chamber 14 so that the resistance increases toward the discharge port 16 at the left end.

The agitating member 17 agitates (grinds) the polished rice and the abrasive supplied into the polishing chamber 14 while applying pressure, thereby feeding the polished rice to the discharge port 16 while polishing. It is. Specifically, the stirring member 17
Is provided with a shaft 18 that penetrates a wall surface of the inflow port 15 of the polishing chamber 14. A pulley 19 is provided at an end of the shaft 18 penetrating from the inlet 15 side. Further, the shaft 18 is provided with a screw portion 20 helically projecting from the outer peripheral surface to a predetermined region in the polishing chamber 14, and a stirring blade portion 21 located on the side of the discharge port 16. I have. The stirring blade 21 is inclined at a slight angle with respect to the axial direction so as to send the polished rice and the abrasive to the discharge port 16 side. In addition,
In the figure, reference numeral 22 denotes a bearing.

The drive mechanism 23 is a motor, and its output shaft 24 is provided with a pulley 25. An endless belt 26 is wound between the pulley 25 and the pulley 19 of the stirring member 17.

The resistance mechanism 27 includes a resistance plate 28 for closing the outlet 16 and a support mechanism 29 for the resistance plate 28. The support mechanism 29 includes a substantially L-shaped arm 30 rotatably connected, and the resistance plate 28 is disposed at an end of the arm 30. A bar 31 is protruded from the arm 30, and a weight 32 having a predetermined weight is detachably attached to the bar 31. By using the weights 32 having different mounting positions, numbers, and weights, the resistance of the resistance plate 28 that presses the discharge port 16 can be adjusted.

In this embodiment, the polishing apparatus 11
And the amount of the polished rice and the abrasive to be charged into the polishing chamber 14,
The rotation speed of the stirring member 17 and the milled rice
The pressure for pressurizing the abrasive and the abrasive is 1.3 kg / cm²that's all
And 50kg / cm²It is as follows. Where the pressure
1.3kg / cm²If lower, the polishing effect of polished rice
It has little fruit, and even if it is polished several times, rice is
This is because the turbidity when immersed does not improve. On the other hand, pressure
Force is 50kg / cm²If higher, the polishing chamber 1
Abrasive material melts and hardens in 4 and is discharged
The inconvenience of being unable to do so occurs. Also this pressure
Is 20 kg / cm in the allowable range.²Above,
40kg / cm²The following is preferred. Here, when the pressure is 20
kg / cm ²If lower, pass through polishing chamber 14
If you do not increase the number of polishing by
Can not be. On the other hand, the pressure is 40 kg / cm²Than
If it is high, the surface of the polished rice will have new scratches,
Starch may dissolve out of the water and cause turbidity.

The pressurization in the polishing apparatus 11 is mostly based on the amounts of the milled rice and the abrasive, and the rotation speed of the stirring member 17. That is, when the polished rice and the abrasive are fed while being stirred by the stirring member 17, they are firstly pressed toward the discharge port 16 along the axial direction by the screw portion 20 as shown in FIG. 2. . Then, stirring blade part 2
When it reaches the area of No. 1, it is pressed in the polishing chamber 14 in the radial direction. Therefore, a resistance is generated due to the difference in the pumping speed in these regions, and the milled rice and the abrasive are stirred and polished while applying a predetermined pressure in the above range.

The sorting device 33, as shown in FIG.
It separates into polished rice polished by the polishing device 11, abrasives, and bran generated in the course of polishing, and discharges them to the outside through different discharge ports 34a, 34b, 34c. Specifically, the sorting device 33 includes a sorting net having holes smaller than the polished rice and larger than the size of the abrasive, which will be described later, and separates the polished rice, the abrasive and the bran by the sorting net. In addition, the abrasive and the bran are separated by wind or by finer knitting at the lower part of the screening net. Then, the polished polished rice is conveyed from a discharge port 34a to a first circulating supply device 36 described later. The abrasive is transported from the outlet 34b to a second circulating supply device 40 described later. Further, the bran generated by the polishing is put into a bran storage bag 35 such as a paper bag from the outlet port 34c.

The circulating supply devices 36 and 40 circulate and supply the polished rice and the abrasive separated and discharged by the sorting device 33 to the polished rice tanks 1A and 1B or the abrasive tank 3. The first circulating rice supply device 36 includes a lift 37 and a distribution mechanism 39. The elevator 37 is provided with an inlet 38 into which the polished rice discharged from the sorting device 33 is introduced, and conveys the polished rice introduced into the inlet 38 to the upper distribution mechanism 39. The distributing mechanism 39 is disposed at the upper end position of the elevator 37, and transfers the transported milled rice to the first milled rice tank 1A, the second milled rice tank 1B, or a well-known weighing and packaging device ( (Not shown). The second circulating abrasive supply device 40 includes an elevator 41 having an inflow port 42 into which the abrasive is injected, and circulates and supplies the abrasive injected into the inflow port 42 to the abrasive tank 3.

The abrasive is desirably a powder or granules having a hardness lower than the surface hardness of the polished rice, having no adhesion, not changing its properties even when the pressure is applied, and having a size of 12 mesh or less and 100 mesh or more. .

Here, when an abrasive having a hardness equal to or higher than the surface hardness of the polished rice, for example, a rice powder obtained by crushing iron powder or polished rice, is applied, if it is polished under pressure, it adheres to the surface of the polished rice. The rice bran can be easily scraped off and the surface of the polished rice can be smoothed to some extent, but at the same time, the surface of the polished rice is innumerably finely scratched. Then, when the rice is immersed in water, the starch starts to dissolve in the water from the myriad of fine scratches, making the water cloudy. On the other hand, when an abrasive having a surface hardness lower than that of the polished rice is used, polishing can be performed without damaging the surface of the polished rice. The hardness of the polished rice is preferably less than Hv20 because the hardness of the polished rice is about Hv20 by micro Vickers.

In addition, when the above-mentioned abrasive material having adhesiveness, for example, non-defatted bran (raw bran) is applied, it adheres to the surface of the polished rice at the time of polishing, and protects the surface of the polished rice, contrary to polishing. Will do. Also, when the polished rice is separated from the polished rice by the sorting device 33 lastly, there is an inconvenience that the polished material adheres to the surface of the polished rice and remains.

The term "abrasive material whose properties change when pressure is applied" means a material which hardens, conversely softens, or breaks down more finely when temperature and pressure are applied. For example, one or two of starch and flour
If the material obtained by extruding the seeds or more from the die of a high-pressure granulator and extruding them is crushed and sized, and the resulting abrasive is applied, if the temperature and pressure are high, the material becomes soft and cannot be applied. .

Further, when the size of the abrasive is larger than 12 mesh, it becomes difficult to remove the bran attached to the inside of the groove existing in the rice. On the other hand, if the mesh size is less than 100 mesh, the abrasive becomes difficult to flow, and handling becomes difficult. Further, when pressure is applied, there is an inconvenience that the rice is hardened together with the polished rice in the polishing device 11.

In this embodiment, degreased bran is used as an abrasive satisfying the above conditions. Here, this defatted bran is a variety of bran from red rice, yellow bran, and white bran discharged from a rice mill, boiled in, for example, a pot, then only the liquid is discarded and the residue is dried. is there. As described above, the boiled bran dissolves the bran oil and the rice flour contained in the bran and does not include it as a residue. Since the defatted bran is softer than the polished rice, the bran remaining in the groove of the polished rice can be reliably removed without damaging the surface of the polished rice. In addition, when non-defatted bran is applied, the oil and fat contained therein acts as a lubricating oil, hinders polishing, and adheres to the surface of polished rice, but loses adhesion by degreasing. .

Next, the production of non-washed rice by the above-described apparatus for producing non-washed rice will be described. First, the washing-free rice production equipment
Switching is performed by the distribution mechanism 39 of the circulation supply device 36 so that the polished rice is supplied to the first polished rice tank 1A. At this time, the discharge ports 2A, 2B, 4 of the milled rice tanks 1A, 1B and the abrasive tank 3 are kept closed. Then, the milled rice is conveyed to the inlet 38 of the first circulation supply device 36, and the milled rice is charged into the first milled rice tank 1A. When the specified amount of polished rice is stored in the first polished rice tank 1 </ b> A, the conveyance of the polished polished rice is stopped, and the distribution mechanism 39 of the first circulating supply device 36 causes the polished rice to be conveyed by the inflow port 38. Switching is performed so that the white rice is supplied to the empty second polished rice tank 1B.

Next, the discharge port 2A of the first milled rice tank 1A is opened, and the first transport device is driven to grind the milled rice in the first milled rice tank 1A.
To the hopper 13. At the same time, the discharge port 4 of the abrasive tank 3 is opened, and the second transport device 8 is driven to supply the degreased bran in the abrasive tank 3 to the hopper 13 of the polishing device 11. Here, by adjusting the rotation speed of the screw 7 of the first transport device 5 and the screw 10 of the second transport device 8, the mixing ratio of the milled rice and the defatted bran to be supplied to the polishing device 11 can be adjusted. . The mixing ratio is such that the introduced polished rice does not come into contact with each other, for example, from 0.5 to 1 abrasive to 1 polished rice.
Is preferred.

Then, the polishing device 11 polishes the surface of the polished rice, grinds the bran remaining on the surface and the existing irregularities, and supplies the polished rice to the sorting device 33.

In this sorting device 33, polished rice, defatted bran,
And, it is classified into three kinds: bran generated by polishing, ground rice and rice flour. Then, the selected polished rice is discharged from the discharge port 34a and supplied to the inflow port 38 of the first circulating supply device 36.
The selected defatted bran is discharged from the discharge port 34b,
It is supplied to the inlet 42 of the circulation supply device 40. Further, the selected bran, ground rice and rice flour are discharged from the discharge port c and supplied to the bran storage 35 for disposal.

In the first circulation supply device 36, the polished rice polished by the switched distribution mechanism 39 is supplied to the second polished rice tank 1B. Also, the second circulation supply device 4
At 0, the defatted bran used for polishing is supplied to the abrasive tank 3 again.

When polishing of the polished rice in the first polished rice tank 1A is completed and all the polished rice is stored in the second polished rice tank 1A, the outlet 2A of the first polished rice tank 1A is closed. Thereafter, the outlet 2B of the second milled rice tank 1B is opened. Further, the distribution mechanism 39 of the first circulation supply device 36 is switched to supply the milled rice to the first milled rice tank 1A.

Thus, the rice polishing tanks 1A and 1B for supplying the rice are sequentially switched, and the polishing is repeatedly performed until the desired polishing level is reached. When the polishing to the desired polishing level is completed, the distribution mechanism 39 of the first circulating supply device 36 is switched to the next measuring and packaging step, and the polished rice is sequentially conveyed. The number of times that the polished rice is repeatedly polished is, for example, 20 kg / cm
^In the case where the setting is made to apply the pressure of ² , it is preferable to perform about 5 to 10 times.

On the other hand, in the rice-free rice production apparatus, the polished rice and the defatted bran supplied to the polishing device 11
3 are mixed according to the reduction of the cross-sectional area and supplied into the polishing chamber 14. In the polishing chamber 14, the surface of the polished rice and the degreased bran rub against each other while being pressed against the discharge port 16 by the rotation of the stirring member 17 and applying a predetermined pressure by the stirring member 17 and the resistance mechanism 27. Combine and stir. As a result, the bran remaining on the surface of the polished rice is separated, and the existing unevenness is scraped off to obtain a smooth surface. As a result, on the discharge port 16 side of the polishing chamber 14, there are polished rice, defatted bran, and bran, ground rice and rice flour generated by polishing.

Further, the milled rice, the defatted bran, and the bran, crushed rice and rice flour generated by the polishing, which have been fed to the discharge port 16 side of the polishing chamber 14, are pressed by the stirring member 17 so that the resistance plate of the resistance mechanism 27 is pressed. 28 is pushed open and supplied to the sorting device 33.

The refined rice, defatted bran, and the bran, crushed rice, and rice flour generated by polishing are supplied to the sorting device 33. And rice flour. Also,
Bran, crushed rice and rice flour generated by defatted bran and polishing,
By wind or fine sorting knitting, it is divided into defatted bran, bran generated by polishing, crushed rice and rice flour. Then, the polished rice is discharged from the discharge port 34a, and the first circulating supply device 3
6. The defatted bran is discharged from the discharge port 34b and supplied to the second circulation supply device 40. further,
The bran, ground rice and rice flour are discharged from the discharge port 34c, stored in the bran storage 35, and discarded.

As described above, in this embodiment, defatted bran having a hardness lower than the surface hardness of the polished rice, having no adhesion, and having a particle size of 12 mesh or less and 100 mesh or more is used as the abrasive. Therefore, by mixing with the polished rice and polishing while applying a predetermined pressure, the polished rice can be polished without any new scratches. Also,
Since pressure is applied, the unevenness existing on the surface can be polished, even though the defatted bran is softer than the polished rice.
Furthermore, since the defatted bran has no adhesive property, it does not adhere to the surface of the polished rice during polishing. Furthermore, since the particle size is 12 mesh or less, bran attached to the inside of the groove existing in rice can be reliably separated. The particle size is 10
Since it is 0 mesh or more, it is possible to prevent the fluidity from deteriorating and the handling to be difficult, and it is not hardened together with the polished rice when pressure is applied.

Further, when one polishing step is completed, the polished rice, defatted bran, and the bran generated by polishing, the crushed rice and the rice flour are separated, and the polished polished rice is mixed with the defatted bran to a predetermined amount. The polishing is repeated a predetermined number of times while applying the pressure described above. Furthermore, since the separated defatted bran is further mixed with polished rice and used repeatedly, waste of the defatted bran can be prevented. At this time, since the bran generated by polishing, the crushed rice and the rice flour are separated from the defatted bran, there is an inconvenience that the bran or the rice flour may cause adhesion or damage the polished rice polished with the crushed rice. Can be prevented.

The method and the apparatus for producing unwashed rice of the present invention are not limited to the configuration of the above embodiment. For example, although defatted bran is used as the abrasive in the above-described embodiment, the same action and effect can be obtained by applying a material obtained by grinding walnuts or the like, or a material obtained by pulverizing paper fibers or paper. .

[0051]

As is clear from the above description, in the method and the apparatus for producing unwashed rice of the present invention, since the hardness of the abrasive is lower than the surface hardness of the milled rice, the milled rice is mixed with the abrasive. Even if it is polished, it is possible to prevent new scratches on the surface of the polished rice. In addition, since a predetermined pressure is applied at the time of this polishing, the unevenness of the surface existing in the polished rice can be surely polished even with an abrasive having a low hardness. Furthermore, since the abrasive has no adhesiveness, it can be prevented from attaching to the surface of the polished rice during polishing. Furthermore, the particle size is 12
Since the size is smaller than the mesh, the bran adhering to the grooves existing in the rice can also be reliably separated. The particle size is 100
Since the mesh is larger than the mesh, it is possible to prevent the fluidity from deteriorating and the handling to be difficult, and also to prevent the problem of hardening together with the polished rice when pressure is applied.

When the polishing is completed, the polished rice is separated from the polished rice, the abrasive, the bran generated by the polishing, the crushed rice and the rice flour, and the polished polished rice is repeatedly polished a predetermined number of times. Even if the surface hardness is lower than the surface hardness, it can be reliably polished to a desired polishing level. Furthermore, in order to repeatedly use the separated abrasive, mixed with polished rice,
Abrasive material can be prevented from being wasted.

[Brief description of the drawings]

FIG. 1 is a configuration diagram showing an apparatus for producing rice without washing according to the present invention.

FIG. 2 is a sectional view showing the polishing apparatus of FIG.

[Explanation of symbols]

1A, 1B: polished rice tank, 3: abrasive tank, 5: first transport device, 8: second transport device, 11: polishing device, 27
... resistance mechanism, 33 ... sorting device, 35 ... bran storage bag, 36 ...
1st circulation supply device, 39 ... distribution mechanism, 40 ... 2nd circulation supply device.

Claims (8)

[Claims] 1. Polished rice having a hardness lower than the surface hardness of the polished rice and having no adhesion and a particle size of 12 mesh or less and 100 mesh or more is mixed with the polished rice, and a predetermined pressure is applied to the polished rice and the polished material. A method for producing non-washed rice, characterized by polishing while polishing. 2. When the polishing is completed, the milled rice, the abrasive, the bran generated by the polishing, the crushed rice, and the rice flour are separated, and the polished milled rice is mixed with the abrasive, and a predetermined pressure is applied. The method of claim 1, wherein the polishing is repeated a predetermined number of times while polishing. 3. The method for producing unwashed rice according to claim 2, wherein the separated abrasive is further mixed with polished rice and used repeatedly. 4. A polished rice tank for storing polished rice, and an abrasive tank for storing an abrasive having a hardness lower than the surface hardness of the polished rice, having no adhesion and having a particle size of 12 mesh or less and 100 mesh or more, A hopper for containing and mixing the milled rice and the abrasive transported from these tanks, and a polishing apparatus having a polishing chamber for stirring and polishing while applying a predetermined pressure to the milled rice and the abrasive supplied from the hopper; An apparatus for producing rice without washing, comprising: 5. The apparatus according to claim 4, further comprising a sorting device that separates and discharges the polished rice, the abrasive, and the bran, the crushed rice, and the rice flour that are discharged from the polishing device. A washing-free rice production apparatus as described. 6. The apparatus according to claim 5, further comprising a circulation supply device for circulating the polished rice and the abrasive discharged from the sorting device to the polished rice tank and the abrasive tank. Rice washing equipment. 7. The non-washed rice producing apparatus according to claim 6, wherein a circulation device for circulating and supplying the polished rice to the polished rice tank is provided with a distribution device for distributing the polished rice to another device. 8. The apparatus according to claim 4, wherein the abrasive is defatted bran.