JP2002279974A - Method of manufacturing electrode for secondary battery - Google Patents
Method of manufacturing electrode for secondary batteryInfo
- Publication number
- JP2002279974A JP2002279974A JP2001078203A JP2001078203A JP2002279974A JP 2002279974 A JP2002279974 A JP 2002279974A JP 2001078203 A JP2001078203 A JP 2001078203A JP 2001078203 A JP2001078203 A JP 2001078203A JP 2002279974 A JP2002279974 A JP 2002279974A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- electrode
- active material
- secondary battery
- current collector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、リチウム二次電池
などの二次電池用電極を製造する方法及びこの方法によ
り製造された二次電池用電極に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an electrode for a secondary battery such as a lithium secondary battery and an electrode for a secondary battery manufactured by this method.
【０００２】[0002]
【従来の技術】近年、リチウム二次電池の開発が盛んに
行われている。リチウム二次電池は、用いられる電極活
物質により、充放電電圧、充放電サイクル寿命特性、保
存特性などの電池特性が大きく左右される。2. Description of the Related Art In recent years, lithium secondary batteries have been actively developed. In a lithium secondary battery, battery characteristics such as charge / discharge voltage, charge / discharge cycle life characteristics, and storage characteristics greatly depend on the electrode active material used.
【０００３】リチウムを吸蔵・放出することができる電
極活物質の中でも、シリコンは、リチウムと合金化する
ことによりリチウムを吸蔵することができる物質であ
り、その理論容量が大きいことから種々検討されてい
る。しかしながら、シリコンは合金化によりリチウムを
吸蔵するものであるので、充放電反応に伴う体積の膨張
収縮が大きい。このため、シリコン粒子を活物質として
用いたリチウム二次電池用電極では、活物質の微粉化や
集電体からの剥離が起こるなどの理由により、充放電サ
イクル特性が悪く、実用化されるに至っていない。[0003] Among the electrode active materials capable of inserting and extracting lithium, silicon is a material capable of inserting lithium by alloying with lithium, and has been studied variously because of its large theoretical capacity. I have. However, since silicon absorbs lithium by alloying, volume expansion and contraction associated with charge / discharge reactions are large. For this reason, electrodes for lithium secondary batteries using silicon particles as an active material have poor charge / discharge cycle characteristics due to the fact that the active material is pulverized and peeled off from the current collector, and thus are not put into practical use. Not reached.
【０００４】[0004]
【発明が解決しようとする課題】本出願人は、電解銅箔
などの銅箔の上にＣＶＤ法やスパッタリング法により形
成したシリコン薄膜からなる電極を、リチウム二次電池
用電極として用いることにより、放電容量が高く、かつ
充放電サイクル寿命特性に優れたリチウム二次電池が得
られることを見出している（特願２０００−３２１２０
１号）。これらの電極においては、充放電反応により薄
膜の厚み方向に切れ目が形成されることにより、薄膜が
柱状に分離され、柱状部分の周辺には空隙が形成され
る。このような空隙により、充放電反応の際の活物質の
体積の膨張収縮を緩和することができるものと思われ
る。SUMMARY OF THE INVENTION The present applicant uses an electrode made of a silicon thin film formed on a copper foil such as an electrolytic copper foil by a CVD method or a sputtering method as an electrode for a lithium secondary battery. It has been found that a lithium secondary battery having a high discharge capacity and excellent charge-discharge cycle life characteristics can be obtained (Japanese Patent Application No. 2000-32120).
No. 1). In these electrodes, a cut is formed in the thickness direction of the thin film by the charge / discharge reaction, whereby the thin film is separated into a columnar shape, and a void is formed around the columnar portion. It is thought that such voids can reduce expansion and contraction of the volume of the active material during the charge / discharge reaction.
【０００５】しかしながら、このような電極において
は、充放電反応による活物質の体積の膨張収縮による応
力が集電体に働き、集電体に皺が発生する場合があっ
た。集電体に皺が発生すると、電池缶内に収納した時の
体積当たりのエネルギー密度が低下することとなる。[0005] However, in such an electrode, stress due to expansion and contraction of the volume of the active material due to a charge / discharge reaction acts on the current collector, and wrinkles may occur in the current collector. When wrinkles occur in the current collector, the energy density per volume when stored in the battery can is reduced.
【０００６】本発明の目的は、放電容量が高く、充放電
サイクル寿命特性に優れ、かつ充放電反応に伴う皺が集
電体に生じにくい二次電池用電極の製造方法を提供する
ことにある。An object of the present invention is to provide a method for producing an electrode for a secondary battery having a high discharge capacity, excellent charge-discharge cycle life characteristics, and in which wrinkles due to a charge-discharge reaction are unlikely to occur on a current collector. .
【０００７】[0007]
【課題を解決するための手段】本発明は、集電体上に活
物質薄膜を堆積させて形成する二次電池用電極の製造方
法であり、集電体の上方にメッシュを配置し、該メッシ
ュを通して活物質薄膜を堆積させることを特徴としてい
る。SUMMARY OF THE INVENTION The present invention is a method of manufacturing an electrode for a secondary battery formed by depositing an active material thin film on a current collector, wherein a mesh is arranged above the current collector, and It is characterized in that an active material thin film is deposited through a mesh.
【０００８】本発明によれば、メッシュの孔に対応する
集電体の領域には、相対的に厚みが厚くなるように活物
質薄膜が形成される。また、メッシュの枠に相当する領
域には相対的に厚みが薄い活物質薄膜が形成されるか、
あるいは活物質薄膜が形成されない。一般に、集電体の
近くにメッシュを配置することにより、メッシュの枠部
分に相当する領域に形成される薄膜の厚みが薄くなる傾
向にあり、メッシュの枠に相当する領域において活物質
薄膜を形成させないようにするためには、できるだけメ
ッシュを集電体の近くに配置する。好ましくは、集電体
に密着するようにメッシュを配置する。According to the present invention, an active material thin film is formed in a region of the current collector corresponding to the hole of the mesh so as to be relatively thick. Also, a relatively thin active material thin film is formed in a region corresponding to the mesh frame,
Alternatively, no active material thin film is formed. Generally, by arranging a mesh near the current collector, the thickness of a thin film formed in a region corresponding to a frame portion of the mesh tends to be thin, and an active material thin film is formed in a region corresponding to a mesh frame. To avoid this, the mesh is placed as close as possible to the current collector. Preferably, a mesh is arranged so as to be in close contact with the current collector.
【０００９】本発明によれば、活物質薄膜の厚みの厚い
領域がメッシュの孔に対応して島状に分散して存在する
活物質薄膜を形成することができる。本発明に従い形成
された活物質薄膜では、厚みの厚い島状の領域における
体積の膨張収縮を、その周囲の厚みの薄い領域あるいは
薄膜が存在しない領域で吸収することができるので、活
物質薄膜の体積の膨張及び収縮による応力が集電体に働
くのを緩和することができ、集電体に皺が発生するのを
抑制することができる。According to the present invention, it is possible to form an active material thin film in which thick regions of the active material thin film are dispersed in an island shape corresponding to the holes of the mesh. In the active material thin film formed according to the present invention, the expansion and contraction of the volume in the thick island-like region can be absorbed in the surrounding thin region or the region where the thin film does not exist. It is possible to alleviate the stress due to the expansion and contraction of the volume acting on the current collector, and to suppress the occurrence of wrinkles in the current collector.
【００１０】本発明に従う好ましい実施形態では、メッ
シュの孔に対応した領域にのみ活物質薄膜を堆積して形
成する。このようにして形成された活物質薄膜において
は、活物質薄膜の島状部分の周囲に活物質薄膜が存在し
ないため、活物質薄膜の体積膨張を十分に緩和すること
ができ、集電体に応力が働き集電体に皺が発生するのを
より効果的に防止することができる。In a preferred embodiment according to the present invention, the active material thin film is deposited and formed only in the region corresponding to the holes of the mesh. In the active material thin film formed in this way, since the active material thin film does not exist around the island-shaped portion of the active material thin film, the volume expansion of the active material thin film can be sufficiently reduced, and the It is possible to more effectively prevent the current collector from wrinkling due to the stress.
【００１１】本発明においては、集電体上に予め活物質
の連続した薄膜を形成しておき、この薄膜の上にメッシ
ュを通して活物質薄膜を堆積させてもよい。この下地層
となる連続薄膜は、例えば集電体の上方にメッシュを配
置せずに活物質薄膜を堆積させることにより形成するこ
とができる。このように連続した活物質薄膜を形成した
後、集電体の上方にメッシュを配置し、連続薄膜を形成
した時と同様の薄膜形成方法で活物質薄膜を形成するこ
とができる。このような方法によれば、同一の薄膜形成
装置内で下地層となる連続薄膜とその上に形成する活物
質薄膜を形成することができる。下地層となる連続した
活物質薄膜の厚みは、特に限定されるものではないが、
片面あたり１０μｍ以下であることが好ましい。In the present invention, a continuous thin film of the active material may be formed on the current collector in advance, and the active material thin film may be deposited on the thin film through a mesh. The continuous thin film serving as the underlayer can be formed, for example, by depositing an active material thin film without disposing a mesh above the current collector. After forming the continuous active material thin film in this manner, a mesh is arranged above the current collector, and the active material thin film can be formed by the same thin film forming method as when the continuous thin film is formed. According to such a method, a continuous thin film serving as a base layer and an active material thin film formed thereon can be formed in the same thin film forming apparatus. The thickness of the continuous active material thin film serving as an underlayer is not particularly limited,
It is preferably 10 μm or less per side.
【００１２】メッシュの孔に対応する部分にのみ活物質
薄膜を堆積させ、メッシュの枠に対応する部分に活物質
薄膜を堆積させないようにする場合には、集電体または
集電体上の上記連続薄膜の上にメッシュを密着させた状
態で活物質薄膜を堆積させることが好ましい。このよう
にして形成した活物質薄膜は、上記のように、島状部分
の周囲に薄膜が存在しないため、島状部分の体積膨張収
縮による応力を十分に緩和することができ、集電体に皺
が発生するのをより効果的に防止することができる。In the case where the active material thin film is deposited only on the portion corresponding to the hole of the mesh and the active material thin film is not deposited on the portion corresponding to the frame of the mesh, the above-mentioned current collector or the above-mentioned current collector may be used. It is preferable to deposit the active material thin film in a state where the mesh is in close contact with the continuous thin film. As described above, the active material thin film formed as described above does not have a thin film around the island portion, so that the stress due to the volume expansion and contraction of the island portion can be sufficiently relaxed, and the current collector The generation of wrinkles can be more effectively prevented.
【００１３】本発明に従い製造される二次電池用電極を
リチウム二次電池用電極として用いる場合、活物質薄膜
としては、リチウムを吸蔵・放出する活物質からなる薄
膜が形成される。リチウムを吸蔵・放出する活物質とし
て、リチウムを合金化することにより吸蔵する活物質が
挙げられる。このような活物質としては、シリコン、ゲ
ルマニウム、アルミニウム、スズなどの薄膜が挙げられ
る。これらの中でも、シリコンは、その充放電容量が高
いので、シリコン薄膜またはシリコンを含む薄膜が好ま
しく用いられる。シリコンを含む薄膜としては、シリコ
ンを５０原子％以上含む薄膜が好ましい。また、シリコ
ン薄膜またはシリコンを含む薄膜は、非晶質または微結
晶薄膜であることが好ましい。When the electrode for a secondary battery manufactured according to the present invention is used as an electrode for a lithium secondary battery, the active material thin film is formed of a thin film made of an active material that absorbs and releases lithium. Examples of the active material that stores and releases lithium include an active material that stores and absorbs lithium by alloying. Examples of such an active material include thin films of silicon, germanium, aluminum, tin, and the like. Among these, silicon has a high charge / discharge capacity, and therefore, a silicon thin film or a thin film containing silicon is preferably used. As the thin film containing silicon, a thin film containing 50 atomic% or more of silicon is preferable. Further, the silicon thin film or the thin film containing silicon is preferably an amorphous or microcrystalline thin film.
【００１４】本発明における活物質薄膜の形成方法とし
ては、気相から薄膜を形成する方法及び液相から薄膜を
形成する方法が挙げられる。気相から薄膜を堆積して形
成する方法としては、スパッタリング法、真空蒸着法、
ＣＶＤ法、溶射法などが挙げられる。また、液相から薄
膜を堆積する方法としては、電解めっき法及び無電解め
っき法などが挙げられる。The method for forming an active material thin film in the present invention includes a method for forming a thin film from a gas phase and a method for forming a thin film from a liquid phase. As a method of depositing and forming a thin film from a gas phase, a sputtering method, a vacuum deposition method,
CVD method, thermal spraying method and the like can be mentioned. Examples of the method for depositing a thin film from a liquid phase include an electrolytic plating method and an electroless plating method.
【００１５】本発明において用いるメッシュは、そのメ
ッシュの孔に対応した領域において厚みが厚くなるよう
に活物質薄膜が形成されるものであるので、厚みを厚く
形成したい領域の大きさに応じて、適宜選択して用いら
れるものである。例えば、その孔の大きさが２μｍ〜１
ｍｍの範囲のものを用いることができる。In the mesh used in the present invention, the active material thin film is formed so as to be thicker in a region corresponding to the hole of the mesh. It is appropriately selected and used. For example, the size of the hole is 2 μm to 1 μm.
mm range.
【００１６】本発明において使用するメッシュとして、
エレクトロフォームドスクリーンと呼ばれるメッシュが
好ましく用いられる。これは、電成ふるいとも呼ばれる
ものであり、電気化学的な方法で作製されたスクリーン
である。As the mesh used in the present invention,
A mesh called an electroformed screen is preferably used. This is also called an electric sieve, and is a screen produced by an electrochemical method.
【００１７】本発明において用いる集電体は、厚みの薄
いものであることが好ましく、金属箔であることが好ま
しい。リチウム二次電池用電極の場合、集電体として
は、リチウムと合金化しない材料から形成されているも
のが好ましく用いられる。このような集電体の具体例と
しては、銅、ニッケル、ステンレス、モリブデン、タン
グステン、及びタンタルから選ばれる少なくとも一種が
挙げられる。特に好ましい集電体としては、銅箔が用い
られる。銅箔としては、その表面が粗面化された銅箔が
好ましい。このような銅箔として電解銅箔が挙げられ
る。また、ニッケル箔などの他の金属箔の上に電解法に
より銅を析出させ、これによって表面を粗面化した金属
箔を用いてもよい。The current collector used in the present invention preferably has a small thickness, and is preferably a metal foil. In the case of a lithium secondary battery electrode, a current collector formed of a material that does not alloy with lithium is preferably used. Specific examples of such a current collector include at least one selected from copper, nickel, stainless steel, molybdenum, tungsten, and tantalum. As a particularly preferred current collector, a copper foil is used. As the copper foil, a copper foil whose surface is roughened is preferable. An electrolytic copper foil is mentioned as such a copper foil. Alternatively, a metal foil whose surface is roughened by depositing copper on another metal foil such as a nickel foil by an electrolytic method may be used.
【００１８】図１は、本発明の製造方法を説明するため
の模式的斜視図である。図１を参照して、集電体１とタ
ーゲットなどの蒸着源２との間にはメッシュ３が配置さ
れている。蒸着源２から発生した薄膜形成のための活性
種は、メッシュ３を通り集電体１の上に到達し、薄膜４
が形成される。蒸着源２と集電体１の間にメッシュ３を
設けることにより、図１に示すように、メッシュ３の孔
に対応した島状に分離された薄膜４が集電体１の上に形
成される。メッシュ３を集電体１に近づけることによ
り、メッシュ３の孔のパターンに対応したパターン形状
を有する島状の活物質薄膜４を形成することができる。
メッシュ３を集電体１から離すことにより、徐々に活物
質薄膜４の凹凸形状が緩やかになり、なだらかな凹凸表
面を有する活物質薄膜となる。FIG. 1 is a schematic perspective view for explaining the manufacturing method of the present invention. Referring to FIG. 1, a mesh 3 is arranged between a current collector 1 and an evaporation source 2 such as a target. The active species for forming a thin film generated from the evaporation source 2 reach the current collector 1 through the mesh 3 and reach the thin film 4.
Is formed. By providing the mesh 3 between the evaporation source 2 and the current collector 1, as shown in FIG. 1, a thin film 4 separated into islands corresponding to the holes of the mesh 3 is formed on the current collector 1. You. By bringing the mesh 3 closer to the current collector 1, an island-shaped active material thin film 4 having a pattern shape corresponding to the pattern of the holes of the mesh 3 can be formed.
By separating the mesh 3 from the current collector 1, the unevenness of the active material thin film 4 gradually becomes gentle, and the active material thin film has a smooth uneven surface.
【００１９】本発明の二次電池用電極は、上記本発明の
製造方法により製造された二次電池用電極であることを
特徴としている。本発明においてより限定された局面に
おける二次電池用電極は、集電体上の分離された複数の
島状領域に活物質薄膜が選択的に形成されたことを特徴
としている。The secondary battery electrode of the present invention is characterized in that it is a secondary battery electrode manufactured by the above-described manufacturing method of the present invention. The electrode for a secondary battery according to a more limited aspect of the present invention is characterized in that an active material thin film is selectively formed on a plurality of isolated island regions on a current collector.
【００２０】[0020]
【発明の実施の形態】以下、本発明を実施例により詳細
に説明するが、本発明は以下の実施例に何ら限定される
ものではなく、その要旨を変更しない範囲において適宜
変更して実施することが可能なものである。BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described below in detail with reference to examples, but the present invention is not limited to the following examples at all, and may be carried out by appropriately changing the scope of the present invention. It is possible.
【００２１】（実施例１及び２） ［電極の作製］４インチ（約１００ｍｍ）の単結晶Ｓｉ
をターゲットとして用い、ＲＦマグネトロンスパッタ装
置を使用して、集電体の上に活物質薄膜をスパッタリン
グ法により形成した。集電体としては、電解銅箔（厚み
１８μｍ）を用いた。この集電体を、回転式ドラムの円
筒状外周面に固定し、集電体の上にメッシュを密着させ
た状態で貼り付けた。メッシュとしては、エレクトロフ
ォームドスクリーン（電気化学的方法で作製された網）
を用いた。使用したエレクトロフォームドスクリーンは
２種類であり、２５０ＬＰＩ（厚み３４μｍ、空隙率３
８％）と４００ＬＰＩ（厚み２０μｍ、空隙率３４％）
を用いた。なお、ＬＰＩは、１インチ（２．５４ｃｍ）
当たりのメッシュの線の数を示しており、２５０ＬＰＩ
は、１インチ（２．５４ｃｍ）当たり２５０本の線が入
っているメッシュであることを示している。(Examples 1 and 2) [Preparation of electrode] 4 inch (about 100 mm) single crystal Si
Was used as a target, and an active material thin film was formed on the current collector by a sputtering method using an RF magnetron sputtering apparatus. As the current collector, an electrolytic copper foil (18 μm in thickness) was used. This current collector was fixed to the cylindrical outer peripheral surface of the rotary drum, and affixed to the current collector in a state where the mesh was in close contact with the current collector. Electroformed screen (mesh made by electrochemical method) as mesh
Was used. Two types of electroformed screens were used, 250 LPI (thickness 34 μm, porosity 3).
8%) and 400 LPI (thickness 20 μm, porosity 34%)
Was used. LPI is 1 inch (2.54 cm)
The number of mesh lines per mesh, 250 LPI
Indicates that the mesh has 250 lines per inch (2.54 cm).
【００２２】真空チャンバー内部を８×１０-4Ｐａ以下
になるまで排気した後、アルゴンガスを５０ｓｃｃｍの
流量で導入しながらスパッタリングを行い、集電体上に
非晶質シリコン薄膜を堆積させた。シリコン薄膜の堆積
量は、メッシュを配置しない場合において厚み１０μｍ
となる堆積量とした。ＲＦ電力は３５０Ｗとした。After the inside of the vacuum chamber was evacuated to 8 × 10 −4 Pa or less, sputtering was performed while introducing an argon gas at a flow rate of 50 sccm to deposit an amorphous silicon thin film on the current collector. The deposition amount of the silicon thin film is 10 μm when no mesh is arranged.
And the amount of deposition. The RF power was 350 W.
【００２３】図２は、メッシュとして用いた２００ＬＰ
Ｉのエレクトロフォームドスクリーンを示す光学顕微鏡
写真である。図３は、図２に示すメッシュを用いて集電
体である銅箔上にシリコン薄膜を堆積して形成した電極
を示す光学顕微鏡写真である。FIG. 2 shows a 200 LP used as a mesh.
1 is an optical micrograph showing an electroformed screen of I. FIG. 3 is an optical micrograph showing an electrode formed by depositing a silicon thin film on a copper foil as a current collector using the mesh shown in FIG.
【００２４】図４は、メッシュとして用いた４００ＬＰ
Ｉのエレクトロフォームドスクリーンを示す光学顕微鏡
写真である。図５は、図４に示すメッシュを用いて集電
体である銅箔の上にシリコン薄膜を堆積して形成した電
極を示す光学顕微鏡写真である。FIG. 4 shows 400 LP used as a mesh.
1 is an optical micrograph showing an electroformed screen of I. FIG. 5 is an optical microscope photograph showing an electrode formed by depositing a silicon thin film on a copper foil as a current collector using the mesh shown in FIG.
【００２５】図２〜図５から明らかなように、メッシュ
の孔（空隙部）に対応したパターン形状の、島状に分離
したシリコン薄膜が集電体上に形成されている。メッシ
ュの枠に相当する領域にはシリコン薄膜が形成されてお
らず、銅箔の表面が露出した状態となっている。As is apparent from FIGS. 2 to 5, an island-like silicon thin film having a pattern corresponding to the holes (voids) of the mesh is formed on the current collector. No silicon thin film is formed in a region corresponding to the mesh frame, and the surface of the copper foil is exposed.
【００２６】以上のようにして集電体の片面上にシリコ
ン薄膜を形成した電極を２ｃｍ×２ｃｍの大きさに切り
出し、これを作用極として用いて単極試験セルを作製し
た。なお、２５０ＬＰＩのメッシュを用いて作製した電
極を実施例１とし、４００ＬＰＩのメッシュを用いて作
製した電極を実施例２とした。An electrode having a silicon thin film formed on one side of the current collector as described above was cut into a size of 2 cm × 2 cm, and a monopolar test cell was prepared using the electrode as a working electrode. Note that an electrode manufactured using a 250 LPI mesh was referred to as Example 1, and an electrode manufactured using a 400 LPI mesh was referred to as Example 2.
【００２７】［単極試験セルの作製］上述のように実施
例１及び実施例２の電極を作用極として用い、対極及び
参照極として金属リチウムを用いて試験セルを作製し
た。電解液としてはエチレンカーボネートとジエチルカ
ーボネートとの体積比１：１の混合溶媒にＬｉＰＦ6を
１モル／リットル溶解させたものを用いた。なお、単極
試験セルにおいては、作用極の還元を充電とし、酸化を
放電としている。[Preparation of Single Electrode Test Cell] As described above, a test cell was prepared using the electrodes of Examples 1 and 2 as a working electrode and metallic lithium as a counter electrode and a reference electrode. As the electrolytic solution, one obtained by dissolving 1 mol / liter of LiPF 6 in a mixed solvent of ethylene carbonate and diethyl carbonate at a volume ratio of 1: 1 was used. In the unipolar test cell, the reduction of the working electrode is charged and the oxidation is discharge.
【００２８】（比較例１）比較として、メッシュを集電
体上に配置せずにシリコン薄膜を集電体上に堆積させる
以外は、上記実施例と同様にして、集電体である銅箔上
にシリコン薄膜を形成し、これを比較例１の電極とし
た。この電極を用いて、上記と同様にして単極試験セル
を作製した。Comparative Example 1 As a comparison, a copper foil as a current collector was prepared in the same manner as in the above example except that a silicon thin film was deposited on the current collector without disposing a mesh on the current collector. A silicon thin film was formed thereon, and this was used as an electrode of Comparative Example 1. Using this electrode, a monopolar test cell was produced in the same manner as described above.
【００２９】［充放電試験］上記のようにして作製した
実施例１及び２並びに比較例１の試験セルについて、２
５℃で充放電試験を行った。実施例１及び２の試験セル
については４ｍＡの定電流で、比較例１の試験セルにつ
いては２ｍＡの定電流で、参照極を基準とする電位が０
Ｖに達するまで充電した後、２．０Ｖに達するまで放電
を行った。これを１サイクルの充放電とし、１０サイク
ルまで充放電を行った。[Charge / Discharge Test] With respect to the test cells of Examples 1 and 2 and Comparative Example 1 produced as described above,
A charge / discharge test was performed at 5 ° C. The test cells of Examples 1 and 2 had a constant current of 4 mA, the test cell of Comparative Example 1 had a constant current of 2 mA, and the potential with respect to the reference electrode was 0.
After charging until the voltage reached V, the battery was discharged until the voltage reached 2.0 V. This was defined as one cycle of charge and discharge, and charge and discharge were performed up to 10 cycles.
【００３０】１０サイクルまでの間の各試験セルの電極
面積１ｃｍ2当たりの最大の放電容量を、最大容量とし
て表１に示す。また、１０サイクル後の電極の厚みをマ
イクロメータで測定し、充電前の電極の厚みと１０サイ
クル後の電極の厚みから電極の厚み変化を求めた。電極
により最大容量に若干のばらつきが認められため、電極
の厚み変化を最大容量で割り、１ｍＡｈ当たりの厚み変
化として、これを「電極厚み変化」として表１に示す。The maximum discharge capacity per 1 cm 2 of the electrode area of each test cell up to 10 cycles is shown in Table 1 as the maximum capacity. The thickness of the electrode after 10 cycles was measured with a micrometer, and the change in electrode thickness was determined from the thickness of the electrode before charging and the thickness of the electrode after 10 cycles. Since a slight variation was observed in the maximum capacity depending on the electrode, the change in electrode thickness was divided by the maximum capacity, and the change in thickness per 1 mAh is shown in Table 1 as “change in electrode thickness”.
【００３１】[0031]
【表１】 表１から明らかなように、本発明に従い製造した実施例
１及び実施例２の電極は、比較例１の電極に比べ、電極
厚み変化が小さいことがわかる。また、実施例１及び２
の電極は、比較例１の電極に比べ、集電体に発生する皺
が著しく少ないことが肉眼により観察されている。実施
例１及び２の電極厚み変化が比較例１の電極厚み変化に
比べ小さくなっているのは、実施例１及び２の電極にお
いては充放電に伴う集電体における皺の発生が抑制され
ているためである。[Table 1] As is clear from Table 1, the electrodes of Examples 1 and 2 manufactured according to the present invention have a smaller change in electrode thickness than the electrode of Comparative Example 1. Examples 1 and 2
It has been observed with the naked eye that the wrinkle generated on the current collector of the electrode of Comparative Example 1 was significantly smaller than that of the electrode of Comparative Example 1. The reason why the change in the electrode thickness in Examples 1 and 2 is smaller than the change in the electrode thickness in Comparative Example 1 is that in the electrodes of Examples 1 and 2, the generation of wrinkles in the current collector due to charging and discharging is suppressed. Because it is.
【００３２】従って、実施例１及び２の電極を電池缶内
に収納した場合、比較例１の電極に比べ体積当たりのエ
ネルギー密度を高めることができる。 （実施例３） ［電極の作製］実施例１と同様の集電体、ターゲット及
び装置を用い、メッシュを用いずに集電体の上に約２μ
ｍの非晶質シリコン薄膜を形成した。次に、集電体上に
形成したシリコン薄膜の上に、２５０ＬＰＩのエレクト
ロフォームドスクリーンを貼り付け、再び実施例１と同
様の条件で非晶質シリコン薄膜を堆積させた。メッシュ
を配置した状態で約６μｍシリコン薄膜を堆積させた。Therefore, when the electrodes of Examples 1 and 2 are housed in a battery can, the energy density per volume can be increased as compared with the electrode of Comparative Example 1. (Example 3) [Preparation of electrode] Using the same current collector, target and apparatus as in Example 1, about 2 μm was formed on the current collector without using a mesh.
m amorphous silicon thin films were formed. Next, an electroformed screen of 250 LPI was attached on the silicon thin film formed on the current collector, and an amorphous silicon thin film was deposited again under the same conditions as in Example 1. An approximately 6 μm silicon thin film was deposited with the mesh arranged.
【００３３】作製した電極について光学顕微鏡で観察し
たところ、下地層となるシリコン薄膜の上にメッシュの
孔に対応したパターン形状で島状のシリコン薄膜が形成
されていることが確認された。Observation of the fabricated electrode with an optical microscope confirmed that an island-shaped silicon thin film was formed on the silicon thin film serving as a base layer in a pattern corresponding to the holes of the mesh.
【００３４】[0034]
【発明の効果】本発明によれば、放電容量が高く、充放
電サイクル寿命特性に優れ、かつ充放電に伴う皺が集電
体に生じにくい二次電池用電極とすることができる。According to the present invention, an electrode for a secondary battery having a high discharge capacity, excellent charge / discharge cycle life characteristics, and less wrinkling due to charge / discharge on a current collector can be obtained.
【図１】本発明の製造方法を説明するための模式的斜視
図。FIG. 1 is a schematic perspective view for explaining a manufacturing method of the present invention.
【図２】本発明の実施例においてメッシュとして用いた
２５０ＬＰＩのエレクトロフォームドスクリーンを示す
平面図。FIG. 2 is a plan view showing a 250 LPI electroformed screen used as a mesh in the embodiment of the present invention.
【図３】本発明の実施例において図２に示すメッシュを
用いて作製した電極の表面状態を示す平面図。FIG. 3 is a plan view showing a surface state of an electrode manufactured using the mesh shown in FIG. 2 in the example of the present invention.
【図４】本発明の実施例においてメッシュとして用いた
４００ＬＰＩのエレクトロフォームドスクリーンを示す
平面図。FIG. 4 is a plan view showing a 400 LPI electroformed screen used as a mesh in the embodiment of the present invention.
【図５】本発明の実施例において図４に示すメッシュを
用いて作製した電極の表面状態を示す平面図。FIG. 5 is a plan view showing a surface state of an electrode manufactured using the mesh shown in FIG. 4 in the example of the present invention.
１…集電体 ２…蒸着源 ３…メッシュ ４…活物質薄膜 DESCRIPTION OF SYMBOLS 1 ... Current collector 2 ... Evaporation source 3 ... Mesh 4 ... Active material thin film
───────────────────────────────────────────────────── フロントページの続き (72)発明者 樽井 久樹 大阪府守口市京阪本通２丁目５番５号 三 洋電機株式会社内 Ｆターム(参考） 5H029 AJ03 AJ05 AL12 AM03 AM07 CJ24 5H050 AA07 AA08 BA16 CB12 DA03 DA04 GA24 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Hisaki Tarui 2-5-5 Keihanhondori, Moriguchi-shi, Osaka Sanyo Electric Co., Ltd. F-term (reference) 5H029 AJ03 AJ05 AL12 AM03 AM07 CJ24 5H050 AA07 AA08 BA16 CB12 DA03 DA04 GA24
Claims (10)
成する二次電池用電極の製造方法において、 集電体の上方にメッシュを配置し、該メッシュを通して
活物質薄膜を堆積させることを特徴とする二次電池用電
極の製造方法。1. A method for manufacturing an electrode for a secondary battery in which an active material thin film is formed by depositing an active material thin film on a current collector, wherein a mesh is arranged above the current collector, and the active material thin film is deposited through the mesh. A method for producing an electrode for a secondary battery, comprising:
上の分離された島状領域の上に前記活物質薄膜が堆積し
て形成されていることを特徴とする請求項１に記載の二
次電池用電極の製造方法。2. The active material thin film according to claim 1, wherein the active material thin film is formed on an isolated island region on the current collector corresponding to the hole of the mesh. A method for manufacturing an electrode for a secondary battery.
膜が形成されており、該薄膜の上に前記メッシュを通し
て活物質薄膜を堆積させることを特徴とする請求項１ま
たは２に記載の二次電池用電極の製造方法。3. The active material thin film according to claim 1, wherein a continuous thin film of the active material is previously formed on the current collector, and the active material thin film is deposited on the thin film through the mesh. Method for producing an electrode for a secondary battery.
シュを配置させずに形成した薄膜であり、該薄膜を形成
した後、集電体の上方にメッシュを配置し、前記連続薄
膜と同様の薄膜形成方法で活物質薄膜を形成することを
特徴とする請求項３に記載の二次電池用電極の製造方
法。4. The continuous thin film is a thin film formed without disposing a mesh above the current collector. After the thin film is formed, a mesh is disposed above the current collector, and the continuous thin film is formed. The method for manufacturing an electrode for a secondary battery according to claim 3, wherein the active material thin film is formed by a similar thin film forming method.
続薄膜に密着して配置されていることを特徴とする請求
項１〜４のいずれか１項に記載の二次電池用電極の製造
方法。5. The method for manufacturing an electrode for a secondary battery according to claim 1, wherein the mesh is disposed in close contact with the current collector or the continuous thin film. .
する薄膜であり、二次電池用電極がリチウム二次電池用
電極であることを特徴とする請求項１〜５のいずれか１
項に記載の二次電池用電極の製造方法。6. The electrode according to claim 1, wherein the active material thin film is a thin film for inserting and extracting lithium, and the electrode for a secondary battery is an electrode for a lithium secondary battery.
13. The method for producing an electrode for a secondary battery according to the above item.
リコンを含む薄膜であることを特徴とする請求項１〜６
のいずれか１項に記載の二次電池用電極の製造方法。7. The thin film of the active material is a silicon thin film or a thin film containing silicon.
The method for producing an electrode for a secondary battery according to any one of the above.
真空蒸着法、またはＣＶＤ法により形成されることを特
徴とする請求項１〜７のいずれか１項に記載の二次電池
用電極の製造方法。8. The method according to claim 1, wherein the active material thin film is formed by a sputtering method,
The method for producing an electrode for a secondary battery according to any one of claims 1 to 7, wherein the electrode is formed by a vacuum deposition method or a CVD method.
法で製造されたことを特徴とする二次電池用電極。9. An electrode for a secondary battery, manufactured by the method according to claim 1. Description:
に活物質薄膜が選択的に形成されたことを特徴とする二
次電池用電極。10. An electrode for a secondary battery, wherein an active material thin film is selectively formed on a plurality of isolated island regions on a current collector.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001078203A JP2002279974A (en) | 2001-03-19 | 2001-03-19 | Method of manufacturing electrode for secondary battery |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001078203A JP2002279974A (en) | 2001-03-19 | 2001-03-19 | Method of manufacturing electrode for secondary battery |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002279974A true JP2002279974A (en) | 2002-09-27 |
Family
ID=18934850
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001078203A Withdrawn JP2002279974A (en) | 2001-03-19 | 2001-03-19 | Method of manufacturing electrode for secondary battery |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002279974A (en) |
Cited By (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004036670A1 (en) * | 2002-10-15 | 2004-04-29 | Kabushiki Kaisha Toshiba | Nonacqueous electrolyte secondary cell |
| JP2005293960A (en) * | 2004-03-31 | 2005-10-20 | Jfe Chemical Corp | Anode for lithium ion secondary battery, and lithium ion secondary battery |
| KR100553826B1 (en) | 2003-09-22 | 2006-02-21 | 주식회사 엘지화학 | Electrode with a mesh structure of electronic conductor |
| WO2006043382A1 (en) * | 2004-10-21 | 2006-04-27 | Matsushita Electric Industrial Co., Ltd. | Negative electrode for nonaqueous electrolyte secondary battery and method for producing same |
| WO2007074654A1 (en) * | 2005-12-28 | 2007-07-05 | Matsushita Electric Industrial Co., Ltd. | Nonaqueous electrolyte secondary battery |
| WO2008044449A1 (en) | 2006-10-13 | 2008-04-17 | Panasonic Corporation | Negative electrode for nonaqueous electrolyte secondary battery, process for producing the same and nonaqueous electrolyte secondary battery utilizing the electrode |
| WO2008072460A1 (en) | 2006-12-13 | 2008-06-19 | Panasonic Corporation | Negative electrode for rechargeable battery with nonaqueous electrolyte, process for producing the negative electrode, and rechargeable battery with nonaqueous electrolyte using the negative electrode |
| WO2008072430A1 (en) | 2006-12-13 | 2008-06-19 | Panasonic Corporation | Negative electrode for nonaqueous electrolyte secondary battery and method for producing the same and nonaqueous electrolyte secondary battery employing it |
| US7407727B2 (en) | 2002-09-30 | 2008-08-05 | Hitachi Maxell Ltd. | Electrode used for a non-aqueous electrolyte secondary battery and a non-aqueous electrolyte secondary battery used the same for a negative electrode |
| US7432016B2 (en) | 2003-09-17 | 2008-10-07 | Hitachi Maxell, Ltd. | Electrode for non-aqueous secondary battery and non-aqueous secondary battery using the same |
| EP2003715A2 (en) | 2007-05-24 | 2008-12-17 | Nissan Motor Co., Ltd. | Current collector for nonaqueous solvent secondary battery, and electrode and battery, which use the current collector |
| US20100124706A1 (en) * | 2008-11-14 | 2010-05-20 | Sony Corporation | Secondary battery and anode |
| JP2010135332A (en) * | 2002-11-05 | 2010-06-17 | Nexeon Ltd | Structured silicon anode |
| EP2395579A1 (en) | 2010-06-08 | 2011-12-14 | Dainippon Screen Mfg., Co., Ltd. | Battery, vehicle, electronic device and battery manufacturing method |
| US8101298B2 (en) | 2006-01-23 | 2012-01-24 | Nexeon Ltd. | Method of fabricating fibres composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| JP2012048955A (en) * | 2010-08-26 | 2012-03-08 | Sanyo Electric Co Ltd | Negative electrode for lithium ion secondary battery, lithium ion secondary battery, and method for manufacturing negative electrode for lithium ion secondary battery |
| US8142931B2 (en) | 2006-10-19 | 2012-03-27 | Panasonic Corporation | Nonaqueous electrolyte secondary battery and method of manufacturing negative electrode thereof |
| US8148012B2 (en) | 2007-02-01 | 2012-04-03 | Panasonic Corporation | Method for forming active material on a current collector of negative electrode using feedback process with measuring collector |
| US8192864B2 (en) | 2007-02-01 | 2012-06-05 | Panasonic Corporation | Battery, examination method and manufacturing method for negative electrode thereof, and examination apparatus and manufacturing apparatus for negative electrode thereof |
| US8221915B2 (en) * | 2010-11-12 | 2012-07-17 | Leyden Energy, Inc. | High performance lithium or lithium ion cell |
| US8257869B2 (en) | 2007-06-01 | 2012-09-04 | Panasonic Corporation | Electrode for electrochemical element and electrochemical element using the electrode |
| US8257858B2 (en) * | 2006-11-01 | 2012-09-04 | Panasonic Corporation | Lithium ion secondary battery and method for forming negative electrode plate for lithium ion secondary battery |
| US8273136B2 (en) | 2007-03-16 | 2012-09-25 | Panasonic Corporation | Electrochemical element, and method and apparatus for manufacturing electrode thereof |
| US8334073B2 (en) | 2006-10-12 | 2012-12-18 | Panasonic Corporation | Non-aqueous electrolyte secondary battery and method of manufacturing negative electrode thereof |
| US8389156B2 (en) | 2006-08-25 | 2013-03-05 | Panasonic Corporation | Negative electrode for non-aqueous electrolyte secondary battery, method for producing the same, and non-aqueous electrolyte secondary battery |
| US8585918B2 (en) | 2006-01-23 | 2013-11-19 | Nexeon Ltd. | Method of etching a silicon-based material |
| US8642211B2 (en) | 2007-07-17 | 2014-02-04 | Nexeon Limited | Electrode including silicon-comprising fibres and electrochemical cells including the same |
| US8734997B2 (en) | 2006-10-10 | 2014-05-27 | Panasonic Corporation | Negative electrode for nonaqueous electrolyte secondary battery |
| US8772174B2 (en) | 2010-04-09 | 2014-07-08 | Nexeon Ltd. | Method of fabricating structured particles composed of silicon or silicon-based material and their use in lithium rechargeable batteries |
| WO2014156053A1 (en) * | 2013-03-26 | 2014-10-02 | 三洋電機株式会社 | Negative electrode for non-aqueous electrolyte secondary batteries and non-aqueous electrolyte secondary battery |
| US8870975B2 (en) | 2007-07-17 | 2014-10-28 | Nexeon Ltd. | Method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| US8932759B2 (en) | 2008-10-10 | 2015-01-13 | Nexeon Ltd. | Method of fabricating structured particles composed of silicon or a silicon-based material |
| US8945774B2 (en) | 2010-06-07 | 2015-02-03 | Nexeon Ltd. | Additive for lithium ion rechageable battery cells |
| US8962183B2 (en) | 2009-05-07 | 2015-02-24 | Nexeon Limited | Method of making silicon anode material for rechargeable cells |
| US8999587B2 (en) | 2010-09-28 | 2015-04-07 | SCREEN Holdings Co., Ltd. | Lithium-ion secondary battery, vehicle, electronic device and manufacturing method of lithium-ion secondary battery |
| US9012079B2 (en) | 2007-07-17 | 2015-04-21 | Nexeon Ltd | Electrode comprising structured silicon-based material |
| US9184438B2 (en) | 2008-10-10 | 2015-11-10 | Nexeon Ltd. | Method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| US9252426B2 (en) | 2007-05-11 | 2016-02-02 | Nexeon Limited | Silicon anode for a rechargeable battery |
| US9350017B2 (en) | 2010-11-12 | 2016-05-24 | A123 Systems Llc | High performance lithium or lithium ion cell |
| CN106463677A (en) * | 2014-05-27 | 2017-02-22 | 苹果公司 | Devices and methods for reducing battery defects |
| US9608272B2 (en) | 2009-05-11 | 2017-03-28 | Nexeon Limited | Composition for a secondary battery cell |
| US9647263B2 (en) | 2010-09-03 | 2017-05-09 | Nexeon Limited | Electroactive material |
| JP2017527094A (en) * | 2014-07-22 | 2017-09-14 | リクリッス カンパニー リミテッド | Micro battery, PCB substrate and semiconductor chip using the same |
| US9853292B2 (en) | 2009-05-11 | 2017-12-26 | Nexeon Limited | Electrode composition for a secondary battery cell |
| US9871248B2 (en) | 2010-09-03 | 2018-01-16 | Nexeon Limited | Porous electroactive material |
| KR20200030835A (en) * | 2018-09-13 | 2020-03-23 | 한국기계연구원 | An Anode for Secondary battery and Fabricating Method of the same |
-
2001
- 2001-03-19 JP JP2001078203A patent/JP2002279974A/en not_active Withdrawn
Cited By (73)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7407727B2 (en) | 2002-09-30 | 2008-08-05 | Hitachi Maxell Ltd. | Electrode used for a non-aqueous electrolyte secondary battery and a non-aqueous electrolyte secondary battery used the same for a negative electrode |
| WO2004036670A1 (en) * | 2002-10-15 | 2004-04-29 | Kabushiki Kaisha Toshiba | Nonacqueous electrolyte secondary cell |
| EP2363908A1 (en) * | 2002-11-05 | 2011-09-07 | Nexeon Ltd | Structured silicon anode |
| JP2010135332A (en) * | 2002-11-05 | 2010-06-17 | Nexeon Ltd | Structured silicon anode |
| US8384058B2 (en) | 2002-11-05 | 2013-02-26 | Nexeon Ltd. | Structured silicon anode |
| US7432016B2 (en) | 2003-09-17 | 2008-10-07 | Hitachi Maxell, Ltd. | Electrode for non-aqueous secondary battery and non-aqueous secondary battery using the same |
| KR100553826B1 (en) | 2003-09-22 | 2006-02-21 | 주식회사 엘지화학 | Electrode with a mesh structure of electronic conductor |
| JP2005293960A (en) * | 2004-03-31 | 2005-10-20 | Jfe Chemical Corp | Anode for lithium ion secondary battery, and lithium ion secondary battery |
| JP2006120445A (en) * | 2004-10-21 | 2006-05-11 | Matsushita Electric Ind Co Ltd | Anode for nonaqueous electrolyte secondary battery and its manufacturing method |
| KR100860927B1 (en) * | 2004-10-21 | 2008-09-29 | 마쯔시다덴기산교 가부시키가이샤 | Negative electrode for nonaqueous electrolyte secondary battery and method for producing same |
| WO2006043382A1 (en) * | 2004-10-21 | 2006-04-27 | Matsushita Electric Industrial Co., Ltd. | Negative electrode for nonaqueous electrolyte secondary battery and method for producing same |
| US7807294B2 (en) | 2004-10-21 | 2010-10-05 | Panasonic Corporation | Negative electrode for non-aqueous electrolyte secondary battery and method for producing the same |
| WO2007074654A1 (en) * | 2005-12-28 | 2007-07-05 | Matsushita Electric Industrial Co., Ltd. | Nonaqueous electrolyte secondary battery |
| JP4613953B2 (en) * | 2005-12-28 | 2011-01-19 | パナソニック株式会社 | Nonaqueous electrolyte secondary battery |
| JPWO2007074654A1 (en) * | 2005-12-28 | 2009-06-04 | パナソニック株式会社 | Nonaqueous electrolyte secondary battery |
| KR100901048B1 (en) | 2005-12-28 | 2009-06-04 | 파나소닉 주식회사 | Nonaqueous electrolyte secondary battery |
| US8597831B2 (en) | 2006-01-23 | 2013-12-03 | Nexeon Ltd. | Method of fabricating fibres composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| US8585918B2 (en) | 2006-01-23 | 2013-11-19 | Nexeon Ltd. | Method of etching a silicon-based material |
| US8101298B2 (en) | 2006-01-23 | 2012-01-24 | Nexeon Ltd. | Method of fabricating fibres composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| US9583762B2 (en) | 2006-01-23 | 2017-02-28 | Nexeon Limited | Method of fabricating fibres composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| US8389156B2 (en) | 2006-08-25 | 2013-03-05 | Panasonic Corporation | Negative electrode for non-aqueous electrolyte secondary battery, method for producing the same, and non-aqueous electrolyte secondary battery |
| US8734997B2 (en) | 2006-10-10 | 2014-05-27 | Panasonic Corporation | Negative electrode for nonaqueous electrolyte secondary battery |
| US8334073B2 (en) | 2006-10-12 | 2012-12-18 | Panasonic Corporation | Non-aqueous electrolyte secondary battery and method of manufacturing negative electrode thereof |
| WO2008044449A1 (en) | 2006-10-13 | 2008-04-17 | Panasonic Corporation | Negative electrode for nonaqueous electrolyte secondary battery, process for producing the same and nonaqueous electrolyte secondary battery utilizing the electrode |
| US8029933B2 (en) | 2006-10-13 | 2011-10-04 | Panasonic Corporation | Negative electrode for non-aqueous electrolyte secondary battery, method for manufacturing the same, and non-aqueous electrolyte secondary battery using the same |
| US8142931B2 (en) | 2006-10-19 | 2012-03-27 | Panasonic Corporation | Nonaqueous electrolyte secondary battery and method of manufacturing negative electrode thereof |
| US8257858B2 (en) * | 2006-11-01 | 2012-09-04 | Panasonic Corporation | Lithium ion secondary battery and method for forming negative electrode plate for lithium ion secondary battery |
| WO2008072430A1 (en) | 2006-12-13 | 2008-06-19 | Panasonic Corporation | Negative electrode for nonaqueous electrolyte secondary battery and method for producing the same and nonaqueous electrolyte secondary battery employing it |
| US7947396B2 (en) | 2006-12-13 | 2011-05-24 | Panasonic Corporation | Negative electrode for non-aqueous electrolyte secondary battery, method of manufacturing the same, and non-aqueous electrolyte secondary battery using the same |
| WO2008072460A1 (en) | 2006-12-13 | 2008-06-19 | Panasonic Corporation | Negative electrode for rechargeable battery with nonaqueous electrolyte, process for producing the negative electrode, and rechargeable battery with nonaqueous electrolyte using the negative electrode |
| US8192864B2 (en) | 2007-02-01 | 2012-06-05 | Panasonic Corporation | Battery, examination method and manufacturing method for negative electrode thereof, and examination apparatus and manufacturing apparatus for negative electrode thereof |
| US8148012B2 (en) | 2007-02-01 | 2012-04-03 | Panasonic Corporation | Method for forming active material on a current collector of negative electrode using feedback process with measuring collector |
| US8273136B2 (en) | 2007-03-16 | 2012-09-25 | Panasonic Corporation | Electrochemical element, and method and apparatus for manufacturing electrode thereof |
| US9871249B2 (en) | 2007-05-11 | 2018-01-16 | Nexeon Limited | Silicon anode for a rechargeable battery |
| US9252426B2 (en) | 2007-05-11 | 2016-02-02 | Nexeon Limited | Silicon anode for a rechargeable battery |
| EP2003715A2 (en) | 2007-05-24 | 2008-12-17 | Nissan Motor Co., Ltd. | Current collector for nonaqueous solvent secondary battery, and electrode and battery, which use the current collector |
| US9017877B2 (en) | 2007-05-24 | 2015-04-28 | Nissan Motor Co., Ltd. | Current collector for nonaqueous solvent secondary battery, and electrode and battery, which use the current collector |
| US8257869B2 (en) | 2007-06-01 | 2012-09-04 | Panasonic Corporation | Electrode for electrochemical element and electrochemical element using the electrode |
| US9871244B2 (en) | 2007-07-17 | 2018-01-16 | Nexeon Limited | Method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| US9012079B2 (en) | 2007-07-17 | 2015-04-21 | Nexeon Ltd | Electrode comprising structured silicon-based material |
| US8642211B2 (en) | 2007-07-17 | 2014-02-04 | Nexeon Limited | Electrode including silicon-comprising fibres and electrochemical cells including the same |
| US8870975B2 (en) | 2007-07-17 | 2014-10-28 | Nexeon Ltd. | Method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| US8940437B2 (en) | 2007-07-17 | 2015-01-27 | Nexeon Limited | Method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| US9184438B2 (en) | 2008-10-10 | 2015-11-10 | Nexeon Ltd. | Method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| US8932759B2 (en) | 2008-10-10 | 2015-01-13 | Nexeon Ltd. | Method of fabricating structured particles composed of silicon or a silicon-based material |
| US20100124706A1 (en) * | 2008-11-14 | 2010-05-20 | Sony Corporation | Secondary battery and anode |
| JP2010118287A (en) * | 2008-11-14 | 2010-05-27 | Sony Corp | Secondary battery and negative electrode |
| US8962183B2 (en) | 2009-05-07 | 2015-02-24 | Nexeon Limited | Method of making silicon anode material for rechargeable cells |
| US9553304B2 (en) | 2009-05-07 | 2017-01-24 | Nexeon Limited | Method of making silicon anode material for rechargeable cells |
| US9608272B2 (en) | 2009-05-11 | 2017-03-28 | Nexeon Limited | Composition for a secondary battery cell |
| US10050275B2 (en) | 2009-05-11 | 2018-08-14 | Nexeon Limited | Binder for lithium ion rechargeable battery cells |
| US9853292B2 (en) | 2009-05-11 | 2017-12-26 | Nexeon Limited | Electrode composition for a secondary battery cell |
| US8772174B2 (en) | 2010-04-09 | 2014-07-08 | Nexeon Ltd. | Method of fabricating structured particles composed of silicon or silicon-based material and their use in lithium rechargeable batteries |
| US8945774B2 (en) | 2010-06-07 | 2015-02-03 | Nexeon Ltd. | Additive for lithium ion rechageable battery cells |
| US9368836B2 (en) | 2010-06-07 | 2016-06-14 | Nexeon Ltd. | Additive for lithium ion rechargeable battery cells |
| US9017868B2 (en) | 2010-06-08 | 2015-04-28 | SCREEN Holdings Co., Ltd. | Battery, vehicle, electronic device and battery manufacturing method |
| EP2395579A1 (en) | 2010-06-08 | 2011-12-14 | Dainippon Screen Mfg., Co., Ltd. | Battery, vehicle, electronic device and battery manufacturing method |
| JP2012048955A (en) * | 2010-08-26 | 2012-03-08 | Sanyo Electric Co Ltd | Negative electrode for lithium ion secondary battery, lithium ion secondary battery, and method for manufacturing negative electrode for lithium ion secondary battery |
| US9947920B2 (en) | 2010-09-03 | 2018-04-17 | Nexeon Limited | Electroactive material |
| US9647263B2 (en) | 2010-09-03 | 2017-05-09 | Nexeon Limited | Electroactive material |
| US9871248B2 (en) | 2010-09-03 | 2018-01-16 | Nexeon Limited | Porous electroactive material |
| US8999587B2 (en) | 2010-09-28 | 2015-04-07 | SCREEN Holdings Co., Ltd. | Lithium-ion secondary battery, vehicle, electronic device and manufacturing method of lithium-ion secondary battery |
| US8221915B2 (en) * | 2010-11-12 | 2012-07-17 | Leyden Energy, Inc. | High performance lithium or lithium ion cell |
| US9350017B2 (en) | 2010-11-12 | 2016-05-24 | A123 Systems Llc | High performance lithium or lithium ion cell |
| US9263731B2 (en) | 2010-11-12 | 2016-02-16 | A123 Systems Llc | High performance lithium or lithium ion cell |
| WO2014156053A1 (en) * | 2013-03-26 | 2014-10-02 | 三洋電機株式会社 | Negative electrode for non-aqueous electrolyte secondary batteries and non-aqueous electrolyte secondary battery |
| CN106463677A (en) * | 2014-05-27 | 2017-02-22 | 苹果公司 | Devices and methods for reducing battery defects |
| US10115994B2 (en) * | 2014-05-27 | 2018-10-30 | Apple Inc. | Devices and methods for reducing battery defects |
| US11011773B2 (en) | 2014-05-27 | 2021-05-18 | Apple Inc. | Devices and methods for reducing battery defects |
| JP2017527094A (en) * | 2014-07-22 | 2017-09-14 | リクリッス カンパニー リミテッド | Micro battery, PCB substrate and semiconductor chip using the same |
| US10418661B2 (en) | 2014-07-22 | 2019-09-17 | Rekrix Co., Ltd. | Micro-battery, and PCB and semiconductor chip using same |
| KR20200030835A (en) * | 2018-09-13 | 2020-03-23 | 한국기계연구원 | An Anode for Secondary battery and Fabricating Method of the same |
| KR102165952B1 (en) * | 2018-09-13 | 2020-10-14 | 한국기계연구원 | An Anode for Secondary battery and Fabricating Method of the same |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2002279974A (en) | Method of manufacturing electrode for secondary battery | |
| JP3896025B2 (en) | Secondary battery electrode | |
| JP3733071B2 (en) | Lithium battery electrode and lithium secondary battery | |
| JP3733067B2 (en) | Lithium battery electrode and lithium secondary battery | |
| JP3733065B2 (en) | Lithium battery electrode and lithium secondary battery | |
| JP3733070B2 (en) | Electrode for lithium secondary battery and lithium secondary battery | |
| JP4642835B2 (en) | Current collector for electrode | |
| JP3733066B2 (en) | Electrode for lithium secondary battery and lithium secondary battery | |
| US6649033B2 (en) | Method for producing electrode for lithium secondary battery | |
| JP2002083594A (en) | Electrode for lithium battery, lithium battery using it and lithium secondary battery | |
| JP4245270B2 (en) | Method for manufacturing electrode for secondary battery | |
| JP4581029B2 (en) | Negative electrode for lithium secondary battery, lithium secondary battery including the same, and method for producing negative electrode for lithium secondary battery | |
| JP2009117267A (en) | Electrode for electrochemical element | |
| JP2004127561A (en) | Micro-patterned thin film electrode and lithium secondary battery using the same as negative electrode | |
| CN108886150B (en) | Negative electrode for secondary battery comprising lithium metal layer having fine pattern and protective layer thereof, and method for manufacturing same | |
| JP2001283834A (en) | Secondary battery | |
| JP2001266851A (en) | Manufacturing method of electrode for lithium secondary battery | |
| JPWO2009019869A1 (en) | ELECTRODE FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY HAVING THE SAME | |
| JP4330290B2 (en) | Method for producing electrode for lithium secondary battery | |
| JP2006269306A (en) | Electrode for lithium secondary battery and its manufacturing method | |
| JP2008243828A (en) | Negative electrode and manufacturing method for secondary battery | |
| JP3707617B2 (en) | Negative electrode and battery using the same | |
| JP2005085632A (en) | Battery | |
| US6610357B2 (en) | Method for fabricating electrode for lithium secondary battery | |
| JP3955727B2 (en) | Method for producing electrode for lithium secondary battery |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050208 |
|
| A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20061229 |