JP2002269852A - Optical information recording medium manufacturing device - Google Patents

Optical information recording medium manufacturing device

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Publication number
JP2002269852A
JP2002269852A JP2001069785A JP2001069785A JP2002269852A JP 2002269852 A JP2002269852 A JP 2002269852A JP 2001069785 A JP2001069785 A JP 2001069785A JP 2001069785 A JP2001069785 A JP 2001069785A JP 2002269852 A JP2002269852 A JP 2002269852A
Authority
JP
Japan
Prior art keywords
recording medium
information recording
optical information
deposition
optical recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001069785A
Other languages
Japanese (ja)
Other versions
JP2002269852A5 (en
Inventor
Kenichi Aihara
謙一 相原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP2001069785A priority Critical patent/JP2002269852A/en
Publication of JP2002269852A publication Critical patent/JP2002269852A/en
Publication of JP2002269852A5 publication Critical patent/JP2002269852A5/ja
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To improve an yield and to improve a device working rate in the manufacturing process of an optical recording medium using a dielectric layer, especially an MO, an MD, a CD-RW and a DVD-RW/+RW/-RAM disk. SOLUTION: For this optical information recording medium manufacturing device, in a polygonal vacuum film deposition device manufacturing the thin film of the optical recording medium, a deposition shield plate is provided on a holder part holding the optical recording medium and the deposition shield plate is attachable and detachable at a part other than a vacuum film formation vessel.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、光記録媒体、特に
誘電体膜を使用する光記録媒体の製造方法及び製造装
置、特に、光磁気記録ディスク、書き換え可能なコンパ
クトディスク(CD−RW)及びデジタルビデオディス
ク(DVD−RW/+RW/−RAM)の製造方法及び
装置に応用されるものである。
The present invention relates to a method and an apparatus for manufacturing an optical recording medium, particularly an optical recording medium using a dielectric film, and more particularly to a magneto-optical recording disk, a rewritable compact disk (CD-RW) and It is applied to a method and an apparatus for manufacturing a digital video disk (DVD-RW / + RW / -RAM).

【0002】[0002]

【従来の技術】電磁波、特にレーザービームの照射によ
る記録、再生及び消去可能な光メモリー媒体の一つとし
て、結晶−非結晶相間或いは結晶−結晶相間の転移を利
用するいわゆる相変化型記録媒体がよく知られている。
特に、光磁気メモリーでは、困難な単一ビームによるオ
ーバーライトが可能であり、ドライブ側の光学系より単
純であること等から、最近その研究開発が活発になって
きている。
2. Description of the Related Art As one of optical memory media capable of recording, reproducing and erasing by irradiation of electromagnetic waves, especially laser beams, a so-called phase-change type recording medium utilizing a transition between a crystal and an amorphous phase or between a crystal and a crystal phase is known. well known.
In particular, research and development on magneto-optical memories have recently been active because overwriting with a difficult single beam is possible and the optical system is simpler than the optical system on the drive side.

【0003】一方、近年CD(コンパクトディスク)の
急速な普及に伴い、一回だけの書き込みが可能な追記型
コンパクトディスク(CD−R)が開発され、市場に普
及され始めた。しかし、CD−Rでは、書き込み時に一
度でも失敗すると修正不可能なため、そのディスクは使
用不能となってしまい廃棄せざるを得ない。したがっ
て、その欠点を補える書き替え可能なコンパクトディス
クの実用化が待望されていた。
On the other hand, with the rapid spread of CDs (compact discs) in recent years, write-once write-once compact discs (CD-Rs) that can be written only once have been developed and have begun to spread on the market. However, in the case of a CD-R, if the write operation fails even once, it cannot be corrected, and the disk becomes unusable and must be discarded. Therefore, there has been a long-awaited demand for a rewritable compact disc that can compensate for the disadvantage.

【0004】現在までに研究開発された一例として、光
磁気ディスクを利用した書き替え可能なコンパクトディ
スクがあるが、オーバライトの困難さや、CD−RO
M、CD−Rとの互換がとり難い等の欠点を有するた
め、原理的に互換確保に有利な相変化型光ディスクの実
用化開発が活発化してきた。また、1996年10月に
は、書き替え可能なコンパクトディスク(CD−RW)
としてオレンジブックパートIII(Ver.1.0)
が、1998年9月には1xから4x記録に関するVe
r.2.0が発行された。
As an example of research and development to date, there is a rewritable compact disk using a magneto-optical disk. However, it is difficult to overwrite and a CD-RO.
Due to its drawbacks such as difficulty in compatibility with M and CD-R, practical development of phase-change optical disks, which is advantageous in principle for ensuring compatibility, has been activated. In October 1996, a rewritable compact disc (CD-RW)
As Orange Book Part III (Ver. 1.0)
However, in September 1998, Ve for 1x to 4x records
r. 2.0 has been issued.

【0005】一般に、光磁気記録媒体やCD−RWディ
スク等の相変化型光記録媒体は、記録層の上下を誘電体
層で挟むという多層構造のものが多い。通常これらの記
録媒体の作製方法はポリカーボネート等の基板上にスパ
ッタリングで各層を積層させるという作製方法を用い
る。特に、最近は枚葉型スパッタリング装置がその高ス
ループット、コンパクトさ及び低価格等の理由から主流
となっている。
Generally, many phase-change optical recording media such as a magneto-optical recording medium and a CD-RW disk have a multilayer structure in which a recording layer is sandwiched between dielectric layers above and below. Usually, as a method for manufacturing these recording media, a manufacturing method is used in which each layer is laminated on a substrate such as polycarbonate by sputtering. In particular, recently, single-wafer sputtering apparatuses have become mainstream because of their high throughput, compactness and low cost.

【0006】また、記録メディアにおいてコストパフォ
ーマンスは非常に重要であり、それによって売れ行きが
左右されると言っても過言ではない。したがって、同種
のメディア間では、その価格が消費者にとって大きな関
心事であり、メーカー側としては、いかに安価に作れる
かというのが重要な鍵となっている。書換え型記録媒体
は、成膜装置という高額な製造設備が必要なため設備産
業的側面を持つ。そのため、安価に作るには設備償却費
を低く抑える必要がある。設備償却費を抑えるために
は、ハイタクトで、稼働率が高く、購入費用が安い必要
がある。またコンパクトさも単位床面積当りの土地代
(建造物も含む)の点で有利になる。
Further, it is no exaggeration to say that cost performance is very important in a recording medium, and that sales performance is influenced by cost performance. Therefore, the price is of great concern to consumers among similar media, and the key to the manufacturer is how cheap it can be made. The rewritable recording medium has an industrial aspect because it requires expensive manufacturing equipment called a film forming apparatus. Therefore, in order to make it cheap, it is necessary to keep equipment depreciation costs low. In order to reduce equipment depreciation costs, it is necessary to have high tact, high occupancy rates, and low purchase costs. Compactness is also advantageous in terms of land costs per unit floor area (including buildings).

【0007】現在までに製品化されている枚用型スパッ
タリング装置として、Balzers社のBig Sp
rinterやCube、日本真空株式会社製のSMO
−01型などがある。また、近年枚葉型スパッタ装置と
自公転型スパッタ装置の双方のメリットを持った方式の
スパッタ装置も製品化されている(芝浦メカトロニクス
株式会社製OCTAVA)。これらの装置は種々の点で
優れた製造装置であるが、書換え型光記録媒体を製造す
る際に根本的不具合がある。
[0007] Balzers' Big Sp Sputtering Apparatus has been commercialized so far.
writer, Cube, SMO manufactured by Nihon Vacuum Co., Ltd.
-01 type. In recent years, a sputtering apparatus having a merit of both a single-wafer sputtering apparatus and a revolving-type sputtering apparatus has been commercialized (OCTAVA manufactured by Shibaura Mechatronics Co., Ltd.). Although these devices are excellent in various points, they have fundamental problems in manufacturing rewritable optical recording media.

【0008】スパッタリングはターゲットと呼ばれる材
料にArなどの不活性ガスを衝突させ、飛び出してくる
材料によって成膜するという方法を取る。そのため、タ
ーゲットが減ってくると交換をせねばならず、その間の
ダウンタイムが装置の稼働率に大きな影響を与える。そ
のため、なるべく稼働率を上げるため、ターゲット交換
は同時に行なうようにするのが普通である。
[0008] Sputtering employs a method in which an inert gas such as Ar collides with a material called a target, and a film is formed from the material that comes out. Therefore, when the number of targets decreases, replacement must be performed, and downtime during that time greatly affects the operation rate of the apparatus. Therefore, in order to raise the operation rate as much as possible, it is common to exchange targets simultaneously.

【0009】通常、ダウンタイムを少なくするには、厚
いターゲットを用いるか、ターゲットの使用効率を良く
すれば良い。通常、書換え型記録媒体は下部保護層と上
部保護層に誘電体を用い、光磁気記録媒体ではSiN、
相変化記録媒体ではZnS/SiO2を誘電体層として
一般に用いる。また、防着板の材料は金属でできている
ことが熱伝導や加工性及び取扱いの点で優れている。と
ころが、この誘電体層は防着板への密着が悪く、剥離が
起き易い。剥離が起きると著しく歩留が悪くなり、シー
ルド板を交換せざるを得ない。
Normally, to reduce downtime, a thick target is used or the use efficiency of the target is improved. Normally, a rewritable recording medium uses a dielectric material for a lower protective layer and an upper protective layer, and a magneto-optical recording medium uses SiN,
In a phase change recording medium, ZnS / SiO 2 is generally used as a dielectric layer. The material of the deposition-preventing plate is made of metal, which is excellent in terms of heat conduction, workability, and handling. However, this dielectric layer has poor adhesion to the anti-adhesion plate, and easily peels off. If peeling occurs, the yield will be significantly reduced, and the shield plate must be replaced.

【0010】また、種々の表面処理を施すことにより密
着性を向上させることができるが、それにも限界があ
り、誘電体膜がある程度の厚さになると剥離が始まって
しまう。枚葉型真空成膜装置の場合、基板の回りの防着
板に多く付着し、防着板は真空成膜槽内に取り付けられ
ているため、交換の際には装置を停止し、真空を破らな
くてはならないという問題点がある。
The adhesion can be improved by performing various surface treatments, but there is a limit to this, and peeling starts when the dielectric film has a certain thickness. In the case of a single-wafer type vacuum film forming apparatus, a large amount adheres to a deposition prevention plate around a substrate, and since the deposition prevention plate is mounted in a vacuum deposition tank, the apparatus is stopped when replacing, and the vacuum is released. There is a problem that it must be broken.

【0011】また、枚葉型スパッタ装置と自公転型スパ
ッタ装置の双方のメリットを持った方式のスパッタ装置
では、複数のディスクに一度に膜をつけるため、その中
心部に著しく膜が付着し、この交換も装置を止めて行な
わないと脱着が不可能である。このシールド板交換まで
の時間は、ターゲット交換までの時間よりも著しく短
く、シールド板交換のサイクルが装置のダウンタイムサ
イクルを規定してしまっているのが現状である。
In a sputtering apparatus having a merit of both a single-wafer sputtering apparatus and a revolving-type sputtering apparatus, since a film is formed on a plurality of disks at once, the film is remarkably adhered to a central portion thereof. This replacement cannot be performed unless the device is stopped. The time until the replacement of the shield plate is significantly shorter than the time until the replacement of the target. At present, the cycle of the shield plate replacement defines the downtime cycle of the apparatus.

【0012】[0012]

【発明が解決しようとする課題】したがって、本発明の
目的は、上記従来技術における問題をすべて解消し、誘
電体層を用いる光記録媒体、特にMO、MD、CD−R
W及びDVD−RW/+RW/−RAMディスクの製造
工程における歩留向上および装置稼働率の向上にある。
SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to solve all of the above-mentioned problems in the prior art, and to provide an optical recording medium using a dielectric layer, particularly MO, MD, and CD-R.
An object of the present invention is to improve the yield and the device operation rate in the manufacturing process of W and DVD-RW / + RW / -RAM disks.

【0013】[0013]

【課題を解決するための手段】本発明者らは、光記録媒
体の製造方法及び製造装置の改善に鋭意研究を重ねた結
果、前記目的に合致する光記録媒体の製造方法及び製造
装置を見い出した。すなわち、上記課題は、本発明の
(1)「光記録媒体の薄膜を作製する多角形型真空成膜
装置において、光記録媒体を保持するホルダー部分に防
着板が具備され、且つその防着板が真空成膜槽以外の部
分で脱着可能であることを特徴とする光情報記録媒体作
製装置」、(2)「前記防着板が基板を脱着するロード
ロック室で脱着可能であることを特徴とする前記(1)
項に記載の光情報記録媒体作製装置」、(3)「前記防
着板が磁石の磁力によりホルダー部分に保持されること
を特徴とする前記(1)又は(2)項に記載の光情報記
録媒体作製装置」、(4)「前記防着板が磁石の磁力に
よりホルダー部分より取外しされることを特徴とする前
記(1)乃至(3)項のいずれかに記載の光情報記録媒
体作製装置」により達成される。
Means for Solving the Problems The inventors of the present invention have conducted intensive studies on the improvement of the method and apparatus for manufacturing an optical recording medium, and as a result, have found a method and apparatus for manufacturing an optical recording medium that meets the above-mentioned object. Was. That is, the above object is achieved by (1) a polygonal vacuum film forming apparatus for producing a thin film of an optical recording medium, wherein a holder for holding the optical recording medium is provided with an anti-adhesion plate, An optical information recording medium manufacturing apparatus characterized in that the plate is detachable in a part other than the vacuum film forming tank, (2) that the plate is detachable in a load lock chamber for detaching the substrate; Features (1)
(3) Optical information recording medium producing apparatus according to (1) or (2), wherein the adhesion preventing plate is held in a holder portion by a magnetic force of a magnet. (4) The optical information recording medium according to any one of (1) to (3), wherein the adhesion preventing plate is detached from a holder portion by a magnetic force of a magnet. Device ".

【0014】[0014]

【発明の実施の形態】以下、本発明を図面を用いて詳細
に説明する。図1は、本発明の枚葉型真空成膜装置の1
例を示したものであり、(1)は内マスク、(2)は基
板、(3)は外マスク、(4)は防着板、(5)はディ
スクホルダーを表わす。図2は、複数枚(3枚)取り真
空成膜装置の1例を示したものであり、図3は、複数枚
(4枚)取り真空成膜装置の1例を示したものである。
(同一符号のため、説明は省略する。)
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to the drawings. FIG. 1 shows a single wafer type vacuum film forming apparatus 1 according to the present invention.
An example is shown, wherein (1) represents an inner mask, (2) represents a substrate, (3) represents an outer mask, (4) represents an adhesion-preventing plate, and (5) represents a disk holder. FIG. 2 shows an example of a vacuum deposition apparatus for taking a plurality of (three) sheets, and FIG. 3 shows an example of a vacuum deposition apparatus for taking a plurality of (four) sheets.
(The description is omitted because it is the same symbol.)

【0015】一般に、真空成膜方法は真空蒸着、イオン
プレーティング、スパッタリング等が挙げられるがコス
ト及び生産性の点でスパッタリングが好適である。スパ
ッタリング方法としてはRF方式、DC方式等があり、
材料特性により使用できる方式が決定されるが、装置の
簡易化、スパッタリングレート及びコントロール性から
DCスパッタリングの方が好ましい。
In general, vacuum deposition methods include vacuum deposition, ion plating, and sputtering, but sputtering is preferred in terms of cost and productivity. As a sputtering method, there are an RF method, a DC method, and the like.
The method that can be used is determined according to the material characteristics, but DC sputtering is more preferable because of simplification of the apparatus, sputtering rate and controllability.

【0016】書換え型記録媒体の中で、光磁気記録媒体
のようにSiNもDCスパッタリングできる技術が確立
されたものは、全ての真空成膜槽の構造は同一である。
ところが、相変化記録媒体は下部及び上部保護層にZn
S/SiO2が用いられるのが一般的であり、ZnS/
SiO2は誘電体であるため、現在のところ、DCスパ
ッタリングが不可能であり、RFスパッタリングが用い
られる。その他の層である記録層はDC又はRFスパッ
タリングが用いられ、反射層はDCスパッタリングが用
いられる。そのため、真空成膜槽の数及び構成は最初か
らある程度固定化される。
Among the rewritable recording media, those having established the technology capable of DC sputtering of SiN like the magneto-optical recording media have the same structure of all the vacuum film forming tanks.
However, the phase change recording medium uses Zn on the lower and upper protective layers.
In general, S / SiO 2 is used, and ZnS /
Since SiO 2 is a dielectric, DC sputtering is not possible at present and RF sputtering is used. DC or RF sputtering is used for the other recording layer, and DC sputtering is used for the reflective layer. Therefore, the number and configuration of the vacuum film forming tanks are fixed to some extent from the beginning.

【0017】一般に真空成膜槽の数は作製する光記録媒
体の層の数以上が好ましい。一般に普及している書換え
型光記録媒体は4層構造のものが多いので4槽以上が好
ましい。ロードロック室が複数の場合、ロードロック室
が3つ以上の構造になると、各ロードロック室間に4槽
を超える真空成膜槽を配置され、装置の大きさも大きく
なり、生産性、装置コスト上も好ましくない。そのため
ロードロック室の数は1つ或は2つが好適である。
In general, the number of vacuum film forming tanks is preferably equal to or more than the number of layers of the optical recording medium to be manufactured. Generally, rewritable optical recording media that are widely used generally have a four-layer structure, and therefore four or more tanks are preferable. When there are a plurality of load lock chambers and the load lock chamber has a structure of three or more, more than four vacuum film forming tanks are arranged between each load lock chamber, and the size of the apparatus is increased, and productivity and equipment cost are increased. Above is also not preferred. Therefore, the number of load lock chambers is preferably one or two.

【0018】また、防着板は非磁性体のSUSかアルミ
合金が望ましい。ただし、複数枚取りの中心部にある防
着板は面積の関係上、SUS410のようなマルテンサ
イト系のものでもかまわない。枚葉型の場合はディスク
の周囲に膜が付着するため、ディスクの周囲の防着板に
最も良く付着する。そのため、この周囲部分の防着板が
真空成膜槽以外で脱着可能である。その際に基板の脱着
とは別のロードロック室を設けた方が、通常オペレーシ
ョンの真空引き及び真空解除の時間短縮に有効であるた
め好ましい。図1の場合、脱着する防着板の大きさ、及
びディスクの外側にあるという位置関係から、非磁性体
の材料が好ましく、この防着板の保持は機械的保持方法
が好ましいが、磁石による磁力を用いてもかまわない。
It is desirable that the deposition-preventing plate is made of non-magnetic material such as SUS or aluminum alloy. However, the deposition-preventing plate at the center of the plural sheets may be a martensitic material such as SUS410 due to the area. In the case of a single-wafer type, since the film adheres to the periphery of the disk, it adheres best to the deposition-preventing plate around the disk. For this reason, the deposition-preventing plate at the peripheral portion can be detached and attached to a part other than the vacuum film forming tank. At that time, it is preferable to provide a load lock chamber separate from the substrate attachment / detachment because it is effective for shortening the time required for evacuation and release of the vacuum in the normal operation. In the case of FIG. 1, a non-magnetic material is preferable from the viewpoint of the size of the attachment-preventing plate to be detached and the position outside the disk. Magnetic force may be used.

【0019】また、図2、図3のように複数枚取りの場
合、ディスク間の中心部分に最も良く付着する。そのた
めこの防着板が真空成膜槽以外で脱着可能である。その
際に基板の脱着と同一のロードロック室で行なうこと
が、装置の大きさ上もコストの点でも有利であるため好
ましい。この際、脱着する防着板の大きさ及びディスク
の内側にあるという位置関係から、磁性体の材料でもか
まわない。この防着板の保持はその大きさから磁石によ
る磁力を用いるのが好ましいが、械的保持方法を用いて
もかまわない。
Also, in the case of taking a plurality of sheets as shown in FIGS. 2 and 3, it adheres best to the central portion between the disks. For this reason, this adhesion-preventing plate can be detached and attached in places other than the vacuum film forming tank. At this time, it is preferable that the substrate is attached and detached in the same load lock chamber because it is advantageous in terms of the size of the apparatus and the cost. At this time, a magnetic material may be used depending on the size of the attachment / detachment prevention plate and the positional relationship between the attachment prevention plate and the disk. It is preferable to use the magnetic force of a magnet for holding the deposition-preventing plate because of its size, but a mechanical holding method may be used.

【0020】ロードロック部において防着板を脱着する
際に、真空槽内は真空に保たれる。枚葉型の場合は機械
的に取り外し機に保持されることが好ましいが磁石によ
る磁力を用いてもかまわない。複数枚取りの場合は磁石
による磁力により取り外し機に保持されるのが好ましい
が、機械的に取り外し機に保持されてもかまわない。
When the attachment plate is detached from the load lock section, the inside of the vacuum chamber is kept at a vacuum. In the case of a single-wafer type, it is preferable to be mechanically held by a detacher, but a magnetic force by a magnet may be used. In the case of taking a plurality of sheets, it is preferable that the sheet is held by the detacher by the magnetic force of the magnet, but it may be mechanically held by the detacher.

【0021】[0021]

【発明の効果】以上、詳細且つ具体的な説明より明らか
なように、本発明の装置を用いることにより、誘電体層
を用いる光記録媒体、特にMO、MD、CD−RW及び
DVD−RW/+RW/−RAMディスクの製造工程に
おける歩留の向上、および装置稼働率の向上を達成する
ことができる。
As is apparent from the detailed and concrete description above, by using the apparatus of the present invention, an optical recording medium using a dielectric layer, in particular, MO, MD, CD-RW and DVD-RW / It is possible to achieve an improvement in the yield in the manufacturing process of the + RW / -RAM disk and an improvement in the operation rate of the device.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の枚葉型真空成膜装置の1例を示した図
である。
FIG. 1 is a view showing one example of a single wafer type vacuum film forming apparatus of the present invention.

【図2】本発明の枚葉型真空成膜装置の他の1例を示し
た図である。
FIG. 2 is a view showing another example of the single-wafer vacuum film forming apparatus of the present invention.

【図3】本発明の枚葉型真空成膜装置の更に他の1例を
示した図である。
FIG. 3 is a view showing still another example of the single wafer type vacuum film forming apparatus of the present invention.

【符号の説明】[Explanation of symbols]

1 内マスク 2 基板 3 外マスク 4 防着板 5 ディスクホルダー DESCRIPTION OF SYMBOLS 1 Inner mask 2 Substrate 3 Outer mask 4 Protective plate 5 Disk holder

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 光記録媒体の薄膜を作製する多角形型真
空成膜装置において、光記録媒体を保持するホルダー部
分に防着板が具備され、且つその防着板が真空成膜槽以
外の部分で脱着可能であることを特徴とする光情報記録
媒体作製装置。
1. A polygonal vacuum film forming apparatus for producing a thin film of an optical recording medium, wherein a holder for holding the optical recording medium is provided with a deposition-preventing plate, and the deposition-preventing plate is other than a vacuum deposition tank. An optical information recording medium manufacturing apparatus, which is detachable at a part.
【請求項2】 前記防着板が基板を脱着するロードロッ
ク室で脱着可能であることを特徴とする請求項1に記載
の光情報記録媒体作製装置。
2. The optical information recording medium manufacturing apparatus according to claim 1, wherein the attachment-preventing plate is detachable in a load lock chamber for detaching a substrate.
【請求項3】 前記防着板が磁石の磁力によりホルダー
部分に保持されることを特徴とする請求項1又は2に記
載の光情報記録媒体作製装置。
3. The optical information recording medium producing apparatus according to claim 1, wherein the attachment-preventing plate is held at a holder portion by a magnetic force of a magnet.
【請求項4】 前記防着板が磁石の磁力によりホルダー
部分より取外しされることを特徴とする請求項1乃至3
のいずれかに記載の光情報記録媒体作製装置。
4. The apparatus according to claim 1, wherein said attachment-preventing plate is detached from said holder by magnetic force of a magnet.
The optical information recording medium manufacturing apparatus according to any one of the above.
JP2001069785A 2001-03-13 2001-03-13 Optical information recording medium manufacturing device Pending JP2002269852A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001069785A JP2002269852A (en) 2001-03-13 2001-03-13 Optical information recording medium manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001069785A JP2002269852A (en) 2001-03-13 2001-03-13 Optical information recording medium manufacturing device

Publications (2)

Publication Number Publication Date
JP2002269852A true JP2002269852A (en) 2002-09-20
JP2002269852A5 JP2002269852A5 (en) 2005-12-02

Family

ID=18927774

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001069785A Pending JP2002269852A (en) 2001-03-13 2001-03-13 Optical information recording medium manufacturing device

Country Status (1)

Country Link
JP (1) JP2002269852A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003077244A1 (en) * 2002-03-08 2003-09-18 Tdk Corporation Disk-like substrate sputtering device, substrate chucking method in the device, method of producing disk-like recording medium using the device
WO2004001737A1 (en) * 2002-06-20 2003-12-31 Tdk Corporation Method for delivery of substrate to film forming device for disk-like substrate, substrate delivery mechanism and substrate holder used for the method, and method of manufacturing disk-like recording medium using the method
WO2004001738A1 (en) * 2002-06-20 2003-12-31 Tdk Corporation Method of delivering substrate to film forming device for disk-like substrate, mechanism for delivering substrate used for the method, substrate holder, and method of manufacturing disk-like recording medium using the method
KR100697165B1 (en) * 2002-06-20 2007-03-21 티디케이가부시기가이샤 Method of delivering substrate to film forming device for disk-like substrate, mechanism for delivering substrate used for the method, substrate holder, and method of manufacturing disk-like recording medium using the method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003077244A1 (en) * 2002-03-08 2003-09-18 Tdk Corporation Disk-like substrate sputtering device, substrate chucking method in the device, method of producing disk-like recording medium using the device
WO2004001737A1 (en) * 2002-06-20 2003-12-31 Tdk Corporation Method for delivery of substrate to film forming device for disk-like substrate, substrate delivery mechanism and substrate holder used for the method, and method of manufacturing disk-like recording medium using the method
WO2004001738A1 (en) * 2002-06-20 2003-12-31 Tdk Corporation Method of delivering substrate to film forming device for disk-like substrate, mechanism for delivering substrate used for the method, substrate holder, and method of manufacturing disk-like recording medium using the method
KR100697165B1 (en) * 2002-06-20 2007-03-21 티디케이가부시기가이샤 Method of delivering substrate to film forming device for disk-like substrate, mechanism for delivering substrate used for the method, substrate holder, and method of manufacturing disk-like recording medium using the method

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