JP2002230719A - Thin film magnetic head, manufacturing method therefor and magnetic reproducing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a thin film magnetic head by which information recorded on a magnetic recording medium in high density is reproduced with satisfactory characteristics. SOLUTION: The reproduction efficiency can be enhanced by providing a magneto-resistive effect layer 11 on the surface opposed to the magnetic recording medium 12. By providing a pair of conductive members 32 opposed to each other via an insulting layer 31 on the surface opposite to the magnetic recording medium 12 of the magneto-resistive effect layer 11, the resolution can be easily controlled by the thickness of the insulating layer 31 and higher recording density can be realized than that in a conventional shield type thin film magnetic head. In this constitution, the reproduction efficiency hardly changed, even if the thickness of the insulating layer 31 is reduced to increase the resolution.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin-film magnetic head used in a magnetic recording / reproducing device (for example, an HDD device), and more particularly, to a magneto-resistance effect type floating device which performs high-density reproduction using a magneto-resistance effect layer. The present invention relates to a thin-film magnetic head, a method of manufacturing the same, and a magnetic reproducing apparatus using the thin-film magnetic head.

[0002]

2. Description of the Related Art In recent years, in recording / reproducing to / from a magnetic recording medium such as a magnetic recording / reproducing apparatus, the necessity of improving the processing speed and increasing the recording capacity has been increasing. It is being strengthened.

Hereinafter, a conventional thin film magnetic head will be described with reference to the drawings.

FIGS. 38 and 39 show the structure of a conventional thin-film magnetic head. FIG. 38 is a schematic perspective view, and FIG. 39 is a schematic front view seen from a magnetic recording medium side.

[0005] In FIG. 38, permalloy, Co-based Al ₂ O ₃ on the amorphous magnetic film or Fe-based alloy magnetic film of soft magnetic material a lower shield layer 361 which is formed by,
A lower gap insulating layer 362 is formed using a non-magnetic insulating material such as AlN or SiO _2, and a magnetoresistive layer 363 is further formed on the lower gap insulating layer 362. A material such as a CoPt alloy is formed on both sides of the magnetoresistive layer 363. And the magnetoresistive layer 36
3, a bias layer 364 for applying a bias magnetic field is formed.

Further, as shown in FIG. 38, the bias layer 3
A conductive layer 365 is formed on the upper surface of the substrate 64 using a material such as Cu, Cr, or Ta.

Next, the conductive layer 365 and the magnetoresistive layer 36
3 on the exposed part, Al ₂ O ₃ , AlN or Si
Upper gap insulating layer 3 using a non-magnetic insulating material such as O ₂
66 is formed. Further, on the upper gap insulating layer 366, a permalloy, Co-based amorphous magnetic film or Fe
The upper shield layer 367 is formed by using a soft magnetic material such as a system alloy magnetic film to form the magnetoresistive thin film magnetic head 368 for reproduction. Such a thin-film magnetic head having a structure in which the magnetoresistive layer exists in a region sandwiched between the upper and lower shields is called a shield-type thin-film magnetic head.

Next, the upper surface of the upper shield layer 367 is
_A recording gap layer 371 is formed using a nonmagnetic insulating material such as ₂ O ₃ , AlN or SiO ₂ , and further faces the upper shield layer 367 via the recording gap layer 371, and
The upper magnetic pole 372 which is in contact with the upper shield layer 367 at other portions (not shown) is formed using a soft magnetic material, and the upper shield layer 367 and the upper magnetic pole 372 are opposed to each other via the recording gap layer 371. A winding coil insulated from the upper shield layer 367 and the upper magnetic pole 372 via an insulating material (not shown) between the portion and the portion (not shown) where the upper magnetic pole 372 is in contact with the upper shield layer 367 373 are provided to constitute a recording induction type thin-film magnetic head unit 370. Here, the upper shield layer 367 has a function having both a shield function of the reproducing magnetoresistive thin film magnetic head 368 and a lower magnetic pole function of the recording inductive thin film magnetic head 370.

FIG. 39 is a schematic front view showing the vicinity of a magnetoresistive layer in a reproducing head portion of a thin film magnetic head. In this figure, the giant magnetoresistance effect (so-called GM
An example is shown in which a (R effect) layer (hereinafter referred to as a GMR layer) is used. On the lower gap insulating layer 362 formed on the upper surface of the lower shield layer 361, a FeMn-based alloy film, PtMn
Alloy film, IrMn alloy film, NiO alloy film, Fe ₂
Antiferromagnetic layer 374 made of a material such as an O ₃ -based alloy film, Ni
Fixed magnetic layer 375 made of Fe-based alloy film, Co, CoFe alloy film or the like, nonmagnetic conductive layer 37 made of Cu or the like
6. GMR composed of a free magnetic layer 377 made of NiFe-based alloy film, Co, CoFe alloy film or the like
A layer 378 is formed, a pair of bias layers 364 is formed in contact with both side end surfaces of the GMR layer 378, and a pair of conductive layers 365 are formed thereon. Further, an upper gap insulating layer 366 is formed thereon, and an upper shield layer 367 is further formed thereon.

In recent years, the upper and lower shield intervals 379 have been increasingly reduced in order to reproduce short-wavelength recorded signals corresponding to higher recording densities.

The operation will be described again with reference to FIG. When the recording current is supplied to the winding coil 373, the upper magnetic pole 3 of the inductive thin-film magnetic recording head 370 for recording is supplied.
A recording magnetic field is generated between the upper magnetic layer 72 and the upper shield layer 367, and a leakage magnetic flux is generated between the upper magnetic pole 372 and the upper shield layer 367 which face each other via the recording gap layer 371, and a recording signal is recorded on the magnetic recording medium. The signal magnetic field from the magnetic recording medium on which the signal is recorded is reproduced by the reproducing magnetoresistive thin film magnetic head 368, and the magnetoresistive layer 363 is reproduced.
A reproduction signal corresponding to the resistance change due to the (GMR layer 378) is detected from the terminal of the conductive layer 365.

[0012]

However, in the reproducing head of the thin film magnetic head having such a structure,
In order to increase the resolution in order to reproduce a signal recorded at a short wavelength on a magnetic recording medium, it is necessary to reduce the distance between the upper and lower shields. Since the distance between the upper and lower shields is determined by the distance from the upper surface of the lower shield layer to the lower surface of the upper shield layer, that is, the sum of the film thicknesses of the lower gap insulating layer, the magnetoresistive layer, and the upper gap insulating layer, Had limitations.

In other words, the critical wavelength achievable with a shielded thin-film magnetic head depends on the critical film thickness of the insulating layer for securing insulation and the minimum film thickness of the magnetoresistive layer having sensitivity for securing reproduction output. Has been determined, and there is a problem that there is a limit to shortening the wavelength.

When the distance between the upper and lower shields is reduced,
The magnetic resistance between the free magnetic layer and the shield decreases,
Accordingly, the magnetic flux generated from the magnetic recording medium tends to escape to the shield. Therefore, there is a problem that the amount of magnetic flux flowing through the free magnetic layer is reduced, and the reproduction efficiency is reduced.

The present invention solves these problems, makes it possible to make the limit wavelength shorter than that of a conventional shielded thin-film magnetic head, suppresses a decrease in reproduction efficiency at short wavelengths, and provides good reproduction performance. It is an object of the present invention to provide a magnetoresistive thin-film magnetic head capable of obtaining the above, a method of manufacturing the same, and a magnetic reproducing apparatus using the thin-film magnetic head.

[0016]

In order to achieve this object, a thin-film magnetic head according to the present invention comprises a support base formed from a pair of conductive members and an insulating layer disposed therebetween. A magnetoresistive layer is formed on one surface where the insulating layer is exposed, and a pair of conductive members are used as electrode terminals of the magnetoresistive layer.

With such a configuration, the magnetoresistive layer is directly opposed to the magnetic recording medium, so that the amount of magnetic flux induced in the magnetoresistive layer can be increased.

Further, with such a structure, the size of the sense region of the thin-film magnetic head can be easily controlled by the thickness of the insulating layer, so that the sense region can be made smaller than that of the conventional shielded thin-film magnetic head. And the limit wavelength can be shortened.

Further, with such a configuration, even if the sense area of the thin-film magnetic head is reduced, the amount of magnetic flux generated from the magnetic recording medium flowing into the free magnetic layer does not decrease. A thin-film magnetic head which does not cause the problem can be realized.

Further, according to the method of manufacturing a thin film magnetic head of the present invention, a first conductive layer, an insulating layer, and a second conductive layer are sequentially laminated on a substrate, and then other portions are left except for required portions. Is removed, a passivation layer is formed, the substrate is cut, and the cut surface is polished to obtain a first conductive layer, an insulating layer, and a second conductive layer.
Characterized in that a polished surface having the conductive layer is formed, and a magnetoresistive layer is formed on the polished surface.

Through such steps, the thin-film magnetic head of the present invention can be easily manufactured. Further, since the insulating layer can be formed thin, a high-resolution thin-film magnetic head having a short limit wavelength and a high resolution can be manufactured.

Further, the magnetic reproducing apparatus of the present invention provides a thin-film magnetic head of the present invention, a rotatable magnetic recording medium, a support member for supporting the thin-film magnetic head so as to face the magnetic recording medium, and a magnetic recording medium. Means for rotating the thin-film magnetic head, the means for moving the thin-film magnetic head along the film surface of the magnetic recording medium, the thin-film magnetic head, the rotating means and the moving means being electrically coupled to the thin-film magnetic head. Processing means for exchanging signals, controlling the rotation of the magnetic recording medium, and controlling the movement of the thin-film magnetic head.

With this configuration, it is possible to realize a magnetic reproducing apparatus having a shorter limit wavelength and a higher resolution than a magnetic reproducing apparatus using a conventional shield type thin film magnetic head.

[0024]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A thin-film magnetic head according to the present invention comprises a support base comprising a pair of conductive members, an insulating layer disposed between the conductive members, and insulating between the conductive members. A magnetoresistive layer formed on one surface on which the insulating layer is exposed, wherein the conductive member is an electrode terminal of the magnetoresistive layer, wherein the magnetoresistive layer is a magnetic recording medium. Therefore, the amount of magnetic flux induced in the magnetoresistive layer can be increased.

Further, the size of the sense region of the thin-film magnetic head can be easily controlled by the thickness of the insulating layer.
The sensing area can be made smaller than that of the conventional shield type thin film magnetic head, and the limit wavelength can be shortened.

Furthermore, even if the sense area of the thin-film magnetic head is reduced, the amount of magnetic flux generated from the magnetic recording medium flowing into the free magnetic layer does not decrease. Can be realized.

If the conductive member is formed of a non-magnetic material, a thin-film magnetic head with higher reproduction efficiency can be obtained.

Further, if the conductive member is formed of a soft magnetic material, a thin film magnetic head having a high effect of reducing noise in adjacent tracks can be obtained.

If the conductive member is formed of a non-magnetic insulating layer and a conductive layer formed on the surface thereof, a thin-film magnetic head having a high degree of freedom in the shape of the supporting base can be obtained.

If the conductive layer is formed of a non-magnetic material, a thin-film magnetic head having higher reproduction efficiency can be obtained.

If the conductive layer is formed of a soft magnetic material, a thin-film magnetic head having a high effect of reducing noise in adjacent tracks can be obtained.

Further, if the interface direction between the insulating layer and the conductive member is substantially perpendicular to the direction of the film surface of the magnetoresistive layer, the manufacture of the thin film magnetic head can be simplified.

If the interface direction between the insulating layer and the conductive member and the moving direction of the magnetic recording medium are substantially perpendicular to each other, the resolution in the wavelength direction at the time of reproduction can be easily adjusted by the thickness of the insulating layer. Can be controlled.

Further, if the interface direction between the insulating layer and the conductive member is configured to be substantially parallel to the moving direction of the magnetic recording medium, the reproduction track width can be easily controlled by the thickness of the insulating layer. Can be.

Further, if the conductive member is formed wider than the magnetoresistive layer in the direction intersecting the interface between the insulating layer and the conductive member and the film surface of the magnetoresistive layer, the thickness of the insulating layer can be reduced. The size of the sense region can be easily controlled by the width of the magnetoresistive layer.

Further, an interface between the insulating layer and the conductive member,
If the magnetoresistive layer is formed wider than the conductive member in the direction of intersection with the film surface of the magnetoresistive layer, the size of the sense region can be easily controlled by the thickness of the insulating layer and the width of the conductive layer. can do.

By forming the magnetoresistive layer with at least an antiferromagnetic layer, a pinned magnetic layer, a nonmagnetic conductive layer, and a free magnetic layer, a high-output thin-film magnetic head with higher reproducing efficiency is obtained. be able to.

Further, by configuring the magnetization direction of the fixed magnetic layer so as to be substantially parallel to the moving direction of the magnetic recording medium during reproduction, when the magnetic recording medium is an in-plane longitudinal recording medium and a perpendicular recording medium, An optimal thin-film magnetic head can be provided.

Further, by configuring the magnetization direction of the fixed magnetic layer to be parallel to the film surface of the magnetoresistive effect layer and substantially perpendicular to the moving direction of the magnetic recording medium during reproduction, It is possible to provide an optimum thin film magnetic head in the case of an in-plane lateral recording medium.

Further, by providing a pair of bias layers for applying a bias magnetic field to the magnetoresistive layer, the bias magnetic field for making the magnetization direction of the free magnetic layer orthogonal to the magnetization direction of the fixed magnetic layer is ensured. Can be applied.

Further, by providing a pair of high resistance bias layers for applying a bias magnetic field to the magnetoresistive layer, it is possible to suppress a decrease in reproduction output due to leakage of the sense current Is to the bias layer. .

Further, by providing a protective layer for covering the magnetoresistive layer on the surface of the support base on which the magnetoresistive layer is formed, it is possible to prevent the thin-film magnetic head and the magnetic recording medium from being inadvertently contacted by impact or the like. In this case, the thin-film magnetic head can be protected from damage, oxidation and the like.

Next, in the method of manufacturing a thin film magnetic head according to the present invention, a first step of forming a first conductive layer on a substrate, and after the first step, an insulating layer is formed on the first conductive layer. Forming a second conductive layer on the insulating layer after the second step, and forming the first conductive layer, the insulating layer, and the like after the third step. 4th shaving unnecessary portion of the second conductive layer
And a fourth step of forming a passivation layer after the fourth step, a sixth step of cutting the substrate after the fifth step, and a cut surface after the sixth step. A step of forming a polished surface having a first conductive layer, an insulating layer, and a second conductive layer by polishing the surface of the substrate, and forming a magnetoresistive layer on the polished surface after the seventh step By including the eighth step, the thin-film magnetic head of the present invention can be easily manufactured.

Further, since the insulating layer can be formed thin, a high-resolution thin-film magnetic head having a short limit wavelength and a high resolution can be manufactured.

In the method of manufacturing a thin-film magnetic head according to the present invention, a first step of forming a first conductive layer on a substrate and a required portion of the first conductive layer after the first step are performed. Removing the remaining portion to expose the end surface of the first conductive layer;
Forming a first conductive layer and an insulating layer so as to cover the end surface of the first conductive layer after the second step, and forming the insulating layer on the insulating layer after the third step. Forming a second conductive layer on the first conductive layer, and after the fourth step, the first conductive layer;
A fifth step of shaving unnecessary portions of the insulating layer and the second conductive layer, a sixth step of forming a passivation layer after the fifth step, and a planar polishing by performing planar polishing after the sixth step. A seventh step of forming a polished surface having the first conductive layer, the insulating layer, and the second conductive layer; and an eighth step of forming a magnetoresistive layer on the polished surface after the seventh step. With this, the thin-film magnetic head of the present invention can be manufactured more easily.

Further, in the method of manufacturing a thin-film magnetic head according to the present invention, a first step of forming a first conductive layer on a substrate and a required portion of the first conductive layer after the first step are performed. A second step of exposing the end face of the first conductive layer by removing the remaining portion and leaving the first conductive layer after the second step;
Forming an insulating layer so as to cover an end face of the first conductive layer;
And a fourth step of forming a second conductive layer on the insulating layer after the third step, and a first conductive layer, an insulating layer, and a second conductive layer after the fourth step. A fifth step of shaving unnecessary portions of the first step, a sixth step of forming a first passivation layer after the fifth step, and a plane polishing after the sixth step to perform the first conductive layer, A seventh step of forming a first polished surface having an insulating layer and a second conductive layer, an eighth step of forming a second passivation layer after the seventh step, and an eighth step. A ninth step of cutting the substrate,
After the ninth step, the cut surface is planarly polished to have a first conductive layer, an insulating layer, and a second conductive layer, and a second polished surface substantially orthogonal to the first polished surface is formed. A thin film magnetic head of the present invention is easily manufactured by including a tenth step of forming and an eleventh step of forming a magnetoresistive layer on the second polished surface after the tenth step. be able to.

Further, by including the step of shaping the magnetoresistive layer to form a film surface shape, it is possible to manufacture the thin film magnetic head of the present invention in which the conductive member is formed wider than the magnetoresistive layer.

Further, even when the magnetoresistive layer is formed selectively, the thin film magnetic head of the present invention in which the conductive member is formed wider than the magnetoresistive layer can be manufactured.

Further, by including the step of forming a pair of hard magnetic layers or antiferromagnetic layers, the thin film magnetic head of the present invention having a bias layer can be manufactured.

Further, by including the step of forming a pair of high-resistance hard magnetic layers, the thin-film magnetic head of the present invention having a high-resistance hard magnetic layer as a bias layer can be manufactured.

Next, the magnetic reproducing apparatus of the present invention comprises a thin-film magnetic head of the present invention, a rotatably supported magnetic recording medium, and a support member for supporting the thin-film magnetic head so as to face the magnetic recording medium. Means for rotating the magnetic recording medium, coupled to the support member, means for moving the thin film magnetic head along the film surface of the magnetic recording medium, electrically coupled with the thin film magnetic head, rotating means and moving means, By exchanging signals with the thin-film magnetic head, controlling the rotation of the magnetic recording medium, and having processing means for controlling the movement of the thin-film magnetic head, compared to a magnetic reproducing apparatus using a conventional shielded thin-film magnetic head, A magnetic reproducing device having a short limit wavelength and high resolution can be realized.

In addition, when the thin film magnetic head of the present invention is used, the magnetization direction of the fixed magnetic layer is parallel to the film surface of the magnetoresistive layer and substantially parallel to the moving direction of the magnetic recording medium. The direction of the recorded magnetization of the magnetic recording medium is
It is possible to provide a magnetic reproducing apparatus suitable for an in-plane longitudinal recording medium, having a configuration substantially parallel to the rotation direction of the magnetic recording medium.

Further, when the thin film magnetic head according to the present invention is used, the magnetization direction of the fixed magnetic layer is parallel to the film surface of the magnetoresistive layer and substantially parallel to the moving direction of the magnetic recording medium. The direction of the recorded magnetization of the magnetic recording medium is
It is possible to provide a magnetic reproducing apparatus suitable for a so-called perpendicular recording medium, wherein the magnetic reproducing apparatus has a configuration substantially perpendicular to the surface of the magnetic recording medium.

Further, by using the thin-film magnetic head of the present invention in which the magnetization direction of the fixed magnetic layer is parallel to the film surface of the magnetoresistive layer and substantially perpendicular to the moving direction of the magnetic recording medium, The direction of the recorded magnetization of the magnetic recording medium is substantially parallel to the radial direction of the magnetic recording medium,
A magnetic reproducing apparatus suitable for an in-plane lateral recording medium can be provided.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.

(First Embodiment) FIG. 1 is a front view of a thin-film magnetic head according to a first embodiment of the present invention as viewed from the magnetic recording medium 12, and FIG. FIG. 2 is a cross-sectional view taken along the plane AA in FIG. 1 for illustrating the structure of the thin-film magnetic head according to the first embodiment.

In the present embodiment, the support base 14 is formed by sandwiching the insulating layer 31 between the pair of conductive members 32, and the pair of conductive members 32 is insulated. The magnetoresistive layer 11 is configured to cover the entire surface on which the layer 31 is exposed and which is to face the magnetic recording medium 12.

The insulating layer 31 is made of an insulating material such as Al
_The conductive member 3 is formed using at least one material selected from ₂ O ₃ , SiO ₂ , AlN or TiN.
2 is a conductive material such as Cu, Cr, Ta or Au
And at least one material selected from the group consisting of:

The interface between the conductive member 32 and the insulating layer 31 is
The configuration is substantially perpendicular to the film surface of the magnetoresistive layer 11.

On both sides of the conductive member 32 and the insulating layer 31 in the z-axis direction in the drawing, a passivation layer 34 is formed of an insulator so that a short circuit does not occur between the pair of conductive members 32. .

FIG. 3 is a sectional view showing the structure of the magnetoresistive layer 11 of the thin-film magnetic head according to the first embodiment of the present invention. The magnetoresistive layer 11 shown in FIG. 3 is a so-called giant magnetoresistive layer (hereinafter, referred to as a GMR layer).
An antiferromagnetic layer 61 made of a material selected from a Ni-based alloy film, a FeMn-based alloy film, or a PtMn-based alloy film is formed, and then a material selected from a NiFe-based alloy film, a Co film, and a CoFe-based alloy film Fixed magnetic layer 62 made of Cu, nonmagnetic conductive layer 63 made of Cu, and then N
A free magnetic layer 64 made of a material selected from an iFe-based alloy film, a Co film, and a CoFe-based alloy film is sequentially stacked,
The magnetoresistive layer 11 is formed.

With this configuration, in the thin-film magnetic head shown in FIGS. 1 and 2, when a pair of conductive members 32 is used as an electrode terminal and a sense current Is flows between them, the conductive member 32- A current flows in the order of the magnetoresistance effect layer 11 and the conductive member 32 near the insulating layer 31. That is, the sense current Is flows in a region located on the insulating layer 31 in the magnetoresistive layer 11. This region becomes the sense region 33.

With this configuration, the size of the sense region 33 of the thin-film magnetic head can be easily controlled.

First, in FIG. 2, when the insulating layer 31 is formed, the length in the x-axis direction in FIG. 1 of the sense region 33 can be easily controlled by adjusting the thickness in the x-axis direction. Can be.

Further, in FIG. 1, the length of the sense region 33 in the z-axis direction can be controlled by adjusting the length in the z-axis direction when the conductive member 32 and the insulating layer 31 are formed. good.

As a result, it is possible to provide a thin film magnetic head capable of easily controlling the resolution in the wavelength direction of the magnetic recording medium 12 and the reproduction track width.

For example, in FIG. 1, when the thin-film magnetic head is configured so that the recording wavelength direction of the magnetic recording medium 12 is set to be transverse to the paper surface (x-axis direction in the drawing), the insulating layer 31
, The resolution in the wavelength direction at the time of reproduction can be easily controlled, and the length of the conductive member 32 and the insulating layer 31 in the z-axis direction can be changed. This makes it possible to control the reproduction track width.

Similarly, in FIG. 1, when the thin-film magnetic head is configured such that the horizontal direction (x-axis direction in the drawing) is the reproduction track width direction of the magnetic recording medium 12 in FIG. The reproduction track width can be controlled by the length in the direction, and the resolution in the wavelength direction at the time of reproduction can be controlled by changing the length of the conductive member 32 and the insulating layer 31 in the z-axis direction.

Therefore, compared to the conventional shield type thin film magnetic head in which the resolution at the time of reproduction is restricted by the sum of the film thicknesses of the insulating layer and a plurality of layers such as the magnetoresistive layer, the film thickness of the insulating layer 31 depends on the film thickness. The thin-film magnetic head of the present invention, which can control the reproduction track width with high precision, can shorten the limit wavelength at the time of reading and narrow the reproduction track width.

In this embodiment, the conductive member 32
Is formed of a single conductive material. However, as shown in FIG. 4 or FIG. 5, the conductive member 32 may be constituted by the nonmagnetic insulating layer 35 and the conductive layer 15 formed on the surface thereof. The effect is the same. In this case, the sense current Is
4 or 5, a conductive layer 15 serving as an electrode terminal may be formed on the surface of the support base 14, as shown in FIG. 4 or FIG.

In this embodiment, the conductive member 32
Is formed using a metal conductive material, but needless to say, the use of an organic material other than metal, for example, does not affect the effects of the present invention as long as the material has conductivity.

In this embodiment, the insulating layer 31 is
Although formed using an inorganic material such as a metal oxide film or a metal nitride film, it goes without saying that the effects of the present invention are not affected even if an organic material such as a resin is used as long as the material has high resistance. .

In this embodiment, the free magnetic layer 64 in the magnetoresistive layer 11 is formed on the magnetic recording medium side, but the free magnetic layer 64 is on the support base 14 side and the antiferromagnetic layer 61 is on the magnetic recording medium side. Even if it is formed on the recording medium side, the effect of the present invention is obtained although the reproduction efficiency is slightly lowered. Also, an antiferromagnetic layer,
The same effect is obtained by using a GMR layer including a fixed magnetic layer, a nonmagnetic conductive layer, a free magnetic layer, a nonmagnetic conductive layer, a fixed magnetic layer, and an antiferromagnetic layer.

(Second Embodiment) FIG. 6A is a front view of a thin-film magnetic head according to a second embodiment of the present invention, as viewed from the magnetic recording medium 12, and FIG. FIG. 7 is a cross-sectional view showing a structure of a thin-film magnetic head according to a second embodiment of the present invention, taken along the plane BB of FIG. 6A.

In FIG. 6A and FIG. 6B, the same components as those in the first embodiment of the present invention are denoted by the same reference numerals.

In this embodiment, a magnetoresistive layer 11 is formed on the surface of the thin film magnetic head which is to face the magnetic recording medium 12 with a certain width in the z direction in the figure.

In the thin-film magnetic head shown in FIGS. 6A and 6B, when a sense current Is flows between the pair of conductive members 32, the magnetoresistance between the conductive member 32 and the insulating layer 31 is reduced. A current flows in the order of the effect layer 11 and the conductive member 32. At this time, when compared in the z-axis direction in FIG. 6A, since the magnetoresistive layer 11 is formed shorter than the conductive member 32, the magnetoresistive layer 11 covers the entire region in the z-axis direction. Therefore, the sense current Is flows only in a region in contact with the insulating layer 31 in the x-axis direction.
It becomes 3.

In the present embodiment, x of the insulating layer 31
The size of the sense region 33 can be easily controlled by changing the length in the axial direction and the length of the magnetoresistive layer 11 in the z-axis direction.

The resolution in the wavelength direction at the time of reproduction and the track width can be easily controlled by the arrangement direction of the thin-film magnetic head with respect to the magnetic recording medium when using the thin-film magnetic head according to the first embodiment of the present invention. Same as the head.

Next, the first embodiment and the second embodiment of the present invention will be described.
The effect of the thin-film magnetic head described in the embodiment will be described.

The thin-film magnetic head according to the first and second embodiments of the present invention has
Is directly opposed to the magnetic recording medium 12, so that much more magnetic flux can be taken in as compared with a conventional shielded thin film magnetic head.

FIGS. 8A and 8B are diagrams showing the flow of the magnetic flux generated from the magnetized area 21 recorded on the magnetic recording medium 12. FIG. FIG. 8B shows the flow of magnetic flux of the thin-film magnetic head having the structure shown in FIG. 7B as a conventional shielded thin-film magnetic head, and FIG. 7A shows a model of the thin-film magnetic head of the present invention. FIG. 8 (a) shows the flow of the magnetic flux in the case of assuming.

In the thin-film magnetic head of the present invention shown in FIG. 7A, the magnetoresistive layer 11 and the magnetic recording medium 12 face each other, and the entire magnetoresistive layer 11 is brought very close to the magnetic recording medium 12. be able to. In contrast, FIG.
In the conventional shielded thin-film magnetic head having the configuration shown in FIG. 2B, one end of the magnetoresistive layer 11 is very close to the magnetic recording medium 12 because the magnetoresistive layer 11 exists between the pair of shield layers 13. However, the other end is largely separated.

For this reason, as shown in FIGS. 8A and 8B, in the thin-film magnetic head of the present invention, the amount of magnetic flux flowing from the recorded magnetization region 21 to the sense region 33 is:
It increases compared with the amount of magnetic flux flowing in the sense region 33 of the conventional shield type thin film magnetic head. In the case of the thin-film magnetic head of the present invention, most of the magnetic flux generated from the recorded magnetized region 21 flows into the magneto-resistance effect layer 11, but in the case of the conventional shield type thin-film magnetic head, a part thereof Only the magnetic flux flows into the magnetoresistive layer 11.
Comparing the number of magnetic flux lines in FIGS. 8A and 8B, the thin film magnetic head of the present invention has six magnetic lines and the shielded thin film magnetic head of the related art has approximately two magnetic lines.
The magnetic flux lines of the sense region 33 (average value of the entire sense region 33)
3 is flowing.

Further, in the thin film magnetic head of the present invention, no matter how small the magnetic gap is, the magnetoresistive layer 11
The amount of magnetic flux flowing into the device does not decrease. FIG. 9 shows a change in the amount of magnetic flux flowing into the magnetoresistive layer 11 when the distance between the upper and lower shields, which is a magnetic gap in the conventional shield type thin film magnetic head, is changed, and a change in the magnetic gap in the thin film magnetic head of the present invention. 7 shows a change in the amount of magnetic flux flowing through the sense region 33 when this is performed.

As shown in FIG. 9, in the case of the conventional shield type thin film magnetic head, the amount of magnetic flux is greatly reduced by reducing the distance between the upper and lower shields. Even if is reduced, the amount of magnetic flux hardly changes.

In the conventional shield type thin film magnetic head, when the distance between the upper and lower shields is reduced, the magnetic resistance between the magnetoresistive layer 11 and the shield 13 is reduced. Is the shield layer 1
This is because it is easy to leak to No. 3. Therefore, when the distance between the shield layers 13 is shortened to shorten the wavelength, the amount of magnetic flux flowing through the magnetoresistive layer 11 decreases, and as a result, the reproduction efficiency decreases.

On the other hand, in the thin-film magnetic head of the present invention, even if the magnetic gap is reduced, the basic structure of the magnetic head does not change, and only the size of the sense region 33 through which the sense current Is flows changes. I do. Therefore, even if the magnetic gap is reduced to shorten the wavelength, the amount of magnetic flux flowing through the magnetoresistance effect layer 11 does not change, and the reproduction efficiency hardly changes.

As shown in FIG. 10A, the interface between the insulating layer 31 and the conductive member 32 and the magnetoresistive layer 11
1 and 2 of the present invention even when the film surface is not orthogonal to the film surface or when the length of the insulating layer 31 in the x-axis direction is not uniform as shown in FIG. Needless to say, the same effects as those of the thin film magnetic head shown in FIG. In addition, by using a resin material as well as a material such as a metal oxide film and a metal nitride film as an insulating layer,
The shape of the insulating layer 31 as shown in FIG. 10B can be easily formed.

In the thin-film magnetic head of the present invention, the sense current Is flows through the conductive member 32, the magnetoresistive layer 11 near the insulating layer 31, and the conductive member 32 in this order. The sense current Is needs to flow in the in-plane direction.

Therefore, as the magnetoresistive layer 11,
It is preferable that a change in resistance can be detected by flowing a sense current Is in the in-plane direction of the film. It is preferable to use, for example, an anisotropic magnetoresistance effect layer (hereinafter, referred to as an AMR layer) in addition to the GMR layer. it can. When a GMR layer is used, the AMR
Since the efficiency of the magnetoresistive effect is higher than in the case of using a layer, when a thin-film magnetic head is formed, its reproducing performance can be improved.

When a GMR layer is used as the magnetoresistive layer 11, a fixed magnetic layer composed of a pair of ferromagnetic materials facing each other via a nonmagnetic material such as Ru may be used.
Needless to say, even when a free magnetic layer in which two or more types of ferromagnetic materials are stacked is used, the same effects as those of the thin-film magnetic heads of the first and second embodiments of the present invention are obtained.

Further, when the magnetoresistive layer 11 is formed, even if a base film or a passivation film, which is not described above, is formed, the first embodiment and the second embodiment of the present invention may be formed. Needless to say, it has the same effect as the thin film magnetic head.

As described above, according to the thin-film magnetic heads of the first and second embodiments of the present invention, it is possible to realize better reproduction efficiency than the conventional shield type thin-film magnetic head. it can.

The first embodiment and the second embodiment of the present invention
In the thin-film magnetic head of the embodiment, the sense region 3
The width of the magnetoresistive layer 11 or the conductive member 32 that can control 3 is the width of a portion near the insulating layer 31 sandwiched between the pair of conductive members 32. For this reason, as shown in FIG. 11A, even if the configuration of the magnetoresistive effect layer 11 is widened in a portion other than the vicinity of the insulating layer 31, as shown in FIG. The same effect as the thin film magnetic heads according to the first and second embodiments of the present invention can be obtained even if the configuration of the conductive member 32 is expanded so as to extend in a portion other than the vicinity of the insulating layer 31. It is clear.

(Third Embodiment) FIG. 12 is a front view of a thin-film magnetic head according to a third embodiment of the present invention as viewed from the magnetic recording medium 12, and FIG. 13 is a third embodiment of the present invention.
FIG. 3 is a cross-sectional view showing a structure of a thin-film magnetic head according to the embodiment.

The most different point of the thin film magnetic head according to the third embodiment of the present invention from the first embodiment and the second embodiment is that a pair of conductive films opposed to each other with an insulating layer 31 interposed therebetween. In that the elastic member 151 is made of a soft magnetic material. As the soft magnetic material, for example, a material selected from permalloy, a Co-based amorphous magnetic film, or an Fe-based fine particle magnetic film can be used.

In FIG. 12, a thin-film magnetic head is formed with the x-axis direction being the reproduction track width direction and the z-axis direction being the recording wavelength direction.

With such a configuration, the conductive member 151, which is a soft magnetic material, functions as a magnetic shield, so that it is difficult for the magnetic flux from the magnetization recorded on the adjacent track to flow to the sense region 33, that is, noise. The effect of reduction can be achieved.

This is because a conductive member 15 made of a soft magnetic material is provided on a portion of the magnetic recording medium 12 facing an adjacent track.
1 exists, the magnetic flux generated from the recording magnetization on the adjacent track has a conductive member 151 made of a soft magnetic material.
It is because it flows into. Therefore, noise from the adjacent track can be reduced. Even when a nonmagnetic conductive material is used as the conductive member, the same noise reduction effect can be obtained by increasing the size of the magnetoresistive layer 11 in a portion facing the adjacent track, but the conductive member made of a soft magnetic material The use of 151 is more effective in reducing noise because of its lower magnetic resistance.

FIG. 14 shows a flow of a magnetic flux generated from the magnetized area 21 recorded on the magnetic recording medium 12. According to this, the pair of conductive members 151 made of a soft magnetic material face each other with the insulating layer 31 interposed therebetween.
Many magnetic fluxes that pass through the insulating layer 31 without passing through 3 are generated.
Therefore, the reproduction efficiency is reduced as compared with the case where the conductive member is made of a non-magnetic conductive material as in the thin film magnetic head according to the first and second embodiments of the present invention.

However, it is apparent that the reproduction efficiency is improved as compared with the conventional shield type thin film magnetic head. A comparison of the magnetic flux flows shown in FIGS. 8A, 8B and 14 shows that the sense region 33 in the case where the conductive member is formed of a non-magnetic conductive material (FIG. 8A) While the amount of magnetic flux flowing is 6, the case where the conductive member is formed of a soft magnetic material (FIG. 14) is 4 and the case of the conventional shielded thin-film magnetic head (FIG. 8B) is 2. Ratio.

In the third embodiment of the present invention in which a soft magnetic material is used as the conductive member, for example, as shown in FIG.
By increasing the length of the insulating layer 31 in the x-axis direction other than the portion close to the above, the reproduction efficiency is improved, and the reproduction efficiency of the thin-film magnetic head when the conductive member is formed of a non-magnetic conductive material is improved. It is possible to get closer.

Further, even if the passivation layer 34 in FIG. 1 is formed of a high-resistance soft magnetic film, noise from adjacent tracks can be reduced.

In the thin-film magnetic head described in the first, second, or third embodiment of the present invention, the magneto-resistance effect layer 11 of the thin-film magnetic head faces the magnetic recording medium 12. If a protective layer is formed on the surface, the magnetoresistive layer 11 can be protected from damage, oxidation, and the like. As a material of the protective layer, for example, DLC (diamond-like carbon), TiN, CrN, BN, CN or ta-C (Tetrahedral Amorphous) is used.
s Carbon) can be used. Also in this case, the effect of the thin-film magnetic head of the present invention is not impaired.

(Fourth Embodiment) FIGS. 15 to 18 are schematic diagrams illustrating the steps for explaining a method of manufacturing a thin-film magnetic head according to a fourth embodiment of the present invention.

First, as shown in FIG.
C on a substrate 181 made of an insulating film, for example, Al ₂ O _3.
a material selected from the group consisting of r, Ta, and Au, or a soft magnetic material (magnetic conductive material) such as Permalloy;
The first conductive layer 182 is formed using a material selected from a Co-based amorphous magnetic film or a Fe-based fine particle magnetic film.

Next, as shown in FIG. 15B, an insulating layer 183 is formed thereon by using at least one kind of nonmagnetic insulating material, for example, a material selected from Al ₂ O ₃ , AlN, SiO ₂ or resin. To form

Next, as shown in FIG. 15C, a non-magnetic conductive material, for example, a material selected from Cu, Cr, Ta or Au, or a soft magnetic material (magnetic conductive material), for example, Permalloy, The second conductive layer 184 is formed using a material selected from a Co-based amorphous magnetic film or a Fe-based fine particle magnetic film.

Next, as shown in FIG. 15D, unnecessary portions of the first conductive layer 182, the insulating layer 183, and the second conductive layer 184 are removed.

Further, as shown in FIG. 15E, a passivation layer 185 is formed using a nonmagnetic insulating material, for example, a material made of Al ₂ O ₃ or resin.

Next, the substrate is cut along the z-axis direction in FIG. 16 to form a strip 191 in which a plurality of elements are arranged in one line, and as shown in FIG. A plurality of strips 191 are attached to the jig 201 with the parentheses) facing upward.

Next, the cut surface of the strip 191 is planarly polished to form a polished surface having the first conductive layer 182, the insulating layer 183, and the second conductive layer 184.

Next, as shown in FIG. 18, a magnetoresistive layer 211 is formed on the polished surface and cut into a predetermined size to form a thin-film magnetic head.

The cut surface of the strip 191 is planarly polished so that the magnetoresistive layer 21 having high performance and stable characteristics can be obtained.
1 and the first conductive layer 1
It is also possible to process the polished surface shapes of the insulating layer 183, the insulating layer 183, and the second conductive layer 184 with high accuracy.

Thus, the thin film magnetic head shown in FIGS. 1 and 2 according to the first embodiment of the present invention can be manufactured.

In other words, in the step shown in FIG. 15B, the thickness of the insulating layer 183 is formed, and in the step shown in FIG. 15D, the first conductive layer 182, the insulating layer 183,
In addition, by controlling the length in the z-axis direction when cutting the second conductive layer 184, the resolution of the readable recording wavelength and the reproduction track width can be easily controlled. Further, after the planar polishing, the polished surface is processed to form the first conductive layer 18.
2. Controlling the length of the first conductive layer 182 and the second conductive layer 184 near the insulating layer 183 in the z-axis direction by cutting unnecessary portions of the insulating layer 183 and the second conductive layer 184 Is also possible.

Note that a step of forming a protective layer may be provided after the step shown in FIG.

(Fifth Embodiment) A method of manufacturing a thin-film magnetic head according to a fifth embodiment of the present invention will be described with reference to FIG.

In the method of manufacturing the thin-film magnetic head according to the fifth embodiment of the present invention, the magneto-resistance effect layer 211 is selectively formed, thereby forming the book shown in FIGS. 6A and 6B. The thin-film magnetic head according to the second embodiment of the present invention can be manufactured. As shown in FIG. 19, as a method for selectively forming the magnetoresistive layer 211, after forming the magnetoresistive layer 211, a resist mask is formed using photolithography, and ion beam etching or the like is performed. There is a method of shaving other portions while leaving a necessary portion, or a method of shaving other portions while leaving a necessary portion by a FIB (Focused Ion Beam) method. Alternatively, it is also possible to form the magnetoresistive layer 211 after forming a resist mask using photolithography and perform lift-off. Further, since the thickness of the magnetoresistive layer 211 is as thin as several tens nm or less, a fine pattern can be formed with high accuracy.

That is, the thickness for forming the insulating layer 183 in the step shown in FIG. 15B and the length in the z-axis direction when forming the magnetoresistive layer 211 in the step shown in FIG. 19 are controlled. By doing so, it is possible to easily control the resolution of the readable recording wavelength and the reproduction track width.

The magnetoresistive layer 21 shown in FIG.
After the step of forming 1, a step of forming a protective layer may be provided.

(Sixth Embodiment) FIGS. 20 and 21
FIG. 14 is a schematic process explanatory view for explaining a manufacturing process of the thin-film magnetic head according to the sixth embodiment of the present invention. Hereinafter, a method of manufacturing the thin-film magnetic head will be described in order of each step with reference to the drawings.

As shown in FIG. 20A, a non-magnetic conductive material such as Cu, Cr, or the like is formed on a substrate 181 having AlTiC or the like as a material and having an insulating film thereon such as Al ₂ O ₃ thereon.
The first conductive layer 182 is formed using a material selected from Ta or Au, or a soft magnetic material (magnetic conductive material), for example, a material selected from permalloy, Co-based amorphous magnetic film, or Fe-based fine particle magnetic film. .

Next, as shown in FIG. 20B, a part of the first conductive layer 182 is shaved to expose an end face of the conductive layer.

Next, as shown in FIG. 20C, a non-magnetic insulating material, for example, Al ₂ O ₃ , AlN, SiO ₂
Alternatively, the insulating layer 183 is formed using at least one material selected from resins.

Next, as shown in FIG. 20D, a non-magnetic conductive material, for example, a material selected from Cu, Cr, Ta, or Au, or a soft magnetic material (magnetic conductive material), for example, Permalloy, The second conductive layer 184 is formed using a material selected from a Co-based amorphous magnetic film or a Fe-based fine particle magnetic film.

Next, as shown in FIG. 21A, unnecessary portions of the first conductive layer 182, the insulating layer 183, and the second conductive layer 184 are removed.

Next, as shown in FIG. 21B, a passivation layer 185 is formed thereon using a non-magnetic insulating material, for example, a material selected from Al ₂ O ₃ or resin.

Next, as shown in FIGS. 21 (c) and 21 (d), the first conductive layer 182 and the insulating layer 1 are polished.
A polished surface including the second conductive layer 83 and the second conductive layer 184 is formed.

Next, as shown in FIG. 21E, a magnetoresistive layer 211 is formed on the polished surface to form a thin-film magnetic head.

When a part of the first conductive layer 182 shown in FIG. 20B is shaved, not only the first conductive layer 182 but also the substrate 181 under the first conductive layer 182 is removed. The portion may be cut off or a part of the first conductive layer 182 in the thickness direction may be left.

When unnecessary portions of the first conductive layer 182, the insulating layer 183, and the second conductive layer 184 shown in FIG. It goes without saying that a part of the 181 may be removed.

After forming the second conductive layer 184 shown in FIG. 20D, the first conductive layer 182, the insulating layer 183, and the second conductive layer 184 shown in FIG. Before the unnecessary portions are removed, a plane polishing step of the xz plane may be performed. By shaving unnecessary portions of the first conductive layer 182, the insulating layer 183, and the second conductive layer 184 after planar polishing, it is possible to perform photolithography on a flat surface and to reduce a film thickness which needs to be shaved. . Therefore, the dimensional accuracy of the part to be left can be improved.

Although the present embodiment does not show steps other than those directly related to the present invention, it goes without saying that other steps may be provided.

Thus, the thin-film magnetic head shown in FIGS. 1 and 2 according to the first embodiment of the present invention can be manufactured.

That is, by controlling the thickness of the insulating layer 183 in the step shown in FIG.
The resolution of the readable recording wavelength and the reproduction track width can be easily controlled.

Further, similarly to the fifth embodiment of the present invention, as shown in FIG. 19, by selectively forming the magnetoresistive effect layer 211, the structure shown in FIGS. )
Can be manufactured.

Further, according to the method of manufacturing the thin-film magnetic head of the sixth embodiment of the present invention, the method of manufacturing the thin-film magnetic head shown in the fourth and fifth embodiments of the present invention. Thus, a desired thin-film magnetic head can be obtained without going through a complicated process such as tilting the direction of the strips 90 ° and rearranging them.

After the step shown in FIG.
The method may include a step of forming a protective layer.

(Seventh Embodiment) FIGS. 22 to 26 are schematic views showing the steps of a method of manufacturing a thin-film magnetic head according to a seventh embodiment of the present invention.

First, as shown in FIG.
On a substrate 181 made of C and having an insulating film of Al ₂ O ₃ thereon, a non-magnetic conductive material such as Cu, Cr, Ta
Alternatively, the first conductive layer 182 is formed using a material selected from Au or a soft magnetic material (magnetic conductive material), for example, a material selected from permalloy, a Co-based amorphous magnetic film, or an Fe-based fine particle magnetic film.

Next, as shown in FIG. 22 (b), the remaining portion of the first conductive layer 182 is cut away,
The end face is exposed.

Next, as shown in FIG. 22C, a non-magnetic insulating material such as Al ₂ O ₃ , AlN, SiO ₂
Alternatively, the insulating layer 183 is formed to cover the first conductive layer 182 using at least one material selected from resins.

Next, as shown in FIG. 22D, a nonmagnetic conductive material, for example, a material selected from Cu, Cr, Ta or Au, or a soft magnetic material (magnetic conductive material), for example, Permalloy, The second conductive layer 184 is formed using a material selected from a Co-based amorphous magnetic film or a Fe-based fine particle magnetic film.

Next, as shown in FIG. 23A, the remaining portions of the first conductive layer 182, the insulating layer 183, and the second conductive layer 184 are cut away except for required portions.

Further, as shown in FIG. 23B, a passivation layer 185 is formed using a non-magnetic insulating material, for example, a material selected from Al ₂ O ₃ and resin.

Next, as shown in FIG. 23 (c) and FIG. 23 (d), the first conductive layer 182 and the insulating layer 1 are polished.
A polished surface including the second conductive layer 83 and the second conductive layer 184 is formed.

Next, as shown in FIG. 23E, a passivation layer 186 is formed on the polished surface.

Next, the substrate is cut along the x-axis direction in FIG. 24 to form a strip-shaped body 291 in which a plurality of elements are arranged in one line, and as shown in FIG. A plurality of strips 291 are attached to the jig 201 so that the parentheses) are on top.

Next, the cut surface of the strip 291 is planarly polished to form a polished surface having the first conductive layer 182, the insulating layer 183, and the second conductive layer 184.

Next, as shown in FIG. 26, a magnetoresistive layer 211 is formed on the polished surface to form a thin-film magnetic head. Thus, the thin-film magnetic head according to the first embodiment of the present invention shown in FIGS. 1 and 2 can be manufactured.

After the formation of the magnetoresistive effect layer 211, as in the fifth embodiment of the present invention, FIG.
6A and 6B, unnecessary portions of the magnetoresistive layer 211 are removed or selectively formed when the magnetoresistive layer 211 is formed.
Can be manufactured.

After forming the second conductive layer 184 shown in FIG. 22D, the first conductive layer 182, the insulating layer 183, and the second conductive layer 184 shown in FIG. Before the unnecessary portions are removed, a plane polishing step of the xy plane may be included. By shaving unnecessary portions of the first conductive layer 182, the insulating layer 183, and the second conductive layer 184 after planar polishing, it is possible to perform photolithography on a flat surface and to reduce a film thickness which needs to be shaved. . Therefore, the dimensional accuracy of the part to be left can be improved.

A step of forming a protective layer may be provided after the step shown in FIG.

(Eighth Embodiment) In the thin-film magnetic head of the present invention, it is possible to provide a head configuration corresponding to various magnetic recording media 12. This is referred to as the eighth aspect of the present invention.
An embodiment will be described.

FIG. 27 is a schematic view of a main part of a thin-film magnetic head according to the eighth embodiment of the present invention. FIG. 27 is a front view of the sense region 33 of the thin-film magnetic head of the present invention viewed from the magnetic recording medium 12 side. In this case, the vertical direction with respect to the paper is the recording wavelength direction of the magnetic recording medium, and the horizontal direction is the reproduction track width direction of the magnetic recording medium.

The magnetoresistive layer in FIG. 27 is constituted by the GMR layer shown in FIG. 3, and is shown in FIGS. 27 (a) and 27 (b).
FIG. 27C and FIG. 27D show the case where the magnetization direction of the fixed magnetic layer 62 matches the wavelength direction.
Shows the case where the magnetization direction of the readout track coincides with the reproduction track width direction.

FIGS. 27 (a) and 27 (c) show the case where the sense current Is flows in the wavelength direction, and FIGS. 27 (b) and 27 (d) show the case where the sense current Is flows in the reproduction track width direction. It is.

In order to reproduce the signal recorded on the magnetic recording medium 12 well, the magnetization direction of the fixed magnetic layer 62 in the GMR layer and the magnetic flux generated from the magnetic recording medium
The direction when flowing into the layer must be substantially parallel (the resistance decreases when the magnetization direction of the fixed magnetic layer 62 and the direction of the magnetic flux are parallel and in the same direction, and when the direction is parallel and opposite, the resistance decreases). 27 (a) and 27 (b).
27, the magnetic flux flows in the wavelength direction, and in the configurations of FIGS. 27 (c) and 27 (d), it must flow in the reproduction track width direction.

That is, in the thin film magnetic head having the structure shown in FIGS. 27A and 27B, the longitudinal recording medium (the direction of the recorded magnetization is the wavelength direction) or the perpendicular recording medium (the recorded magnetization is The magnetic flux generated from the direction perpendicular to the medium film surface can be reproduced as a signal. In the thin-film magnetic head having the configuration shown in FIGS. 27C and 27D, the in-plane lateral recording medium ( The magnetic flux from the direction of the recorded magnetization (the direction of the track width) can be reproduced as a signal.

In order to reproduce the signal recorded on the magnetic recording medium 12 well, the fixed magnetic layer 6 in the GMR layer is required.
The magnetization direction 2 and the magnetization direction of the free magnetic layer 64 need to be substantially orthogonal to each other when there is no magnetic flux from the magnetic recording medium 12 (due to the symmetry of reproduction output, etc.). That is, FIG.
7A and FIG. 27B, the free magnetic layer 64 is used.
27 (c) and 27 (d), the magnetization direction of the free magnetic layer 64 needs to be oriented in the wavelength direction.

In the thin-film magnetic head having the structure shown in FIGS. 27A to 27D, the main magnetic field applied to the free magnetic layer 64 in the GMR layer is the magnetic recording medium 1
2, the coupling magnetic field with the fixed magnetic layer 62 (the direction parallel to the magnetization direction of the fixed magnetic layer 62), the fixed magnetic layer 62,
From the sense magnetic field (the direction parallel to the magnetization direction of the fixed magnetic layer 62) and the current magnetic field (the sense current I
(a direction orthogonal to s).

Of these, the magnitude and sign of the coupling magnetic field with the fixed magnetic layer 62 can be changed by changing the thickness of the nonmagnetic conductive layer 63 between the free magnetic layer 64 and the fixed magnetic layer 62. It is possible.

Next, the magnitude and sign of the static magnetic field from the fixed magnetic layer 62 are changed by changing the film configuration of the fixed magnetic layer 62 (eg, using a pair of ferromagnetic layers via a nonmagnetic conductive layer). Can be changed.

Further, the film configuration of the GMR layer is changed (for example, a conductive layer is added next to the free magnetic layer 64, or the thickness of each layer is changed), or the magnitude or sign of the sense current Is is changed. By doing so, the magnitude and sign of the current magnetic field from the sense current Is can also be changed.

By controlling the magnitude and sign of the magnetic field using these methods, the configuration shown in FIG.
The magnetic field applied in the wavelength direction (the coupling magnetic field with the fixed magnetic layer 62 and the static magnetic field from the fixed magnetic layer 62) can be adjusted to be approximately zero. Since the magnetic field for directing the magnetization direction of the free magnetic layer 64 in the reproduction track width direction includes a current magnetic field due to the sense current Is, the magnetization direction of the free magnetic layer 64 can be easily changed to a direction perpendicular to the fixed magnetic layer 62. It is possible to turn to.

Next, in the case of the configuration shown in FIG. 27D, the magnetic field (the coupling magnetic field with the fixed magnetic layer 62 and the static magnetic field from the fixed magnetic layer 62) applied in the reproduction track width direction is adjusted to be approximately zero. It is possible. Since the magnetic field for directing the magnetization direction of the free magnetic layer 64 to the wavelength direction includes a current magnetic field due to the sense current Is, the magnetization direction of the free magnetic layer 64 is easily directed to a direction orthogonal to the fixed magnetic layer 62. It is possible.

27B and 27C, however, the coupling magnetic field with the fixed magnetic layer 62, the static magnetic field from the fixed magnetic layer 62, and the current magnetic field due to the sense current Is are all parallel. And the magnetization direction of the pinned magnetic layer 62 is also parallel. Therefore, these magnetic fields can be adjusted to approximately zero by adjusting them, but there is no magnetic field for directing the magnetization direction of the free magnetic layer 64 in a direction orthogonal to the fixed magnetic layer 62. Therefore, a bias layer as used in the conventional shield type thin film magnetic head is required. FIG.
In both the configuration shown in FIG. 7B and the configuration shown in FIG. 27C, it is necessary to apply a bias magnetic field in parallel with the direction in which the sense current Is flows.

However, by applying such a bias magnetic field, in the thin-film magnetic head having the configuration shown in FIGS. 27A and 27B, the in-plane longitudinal recording medium (the direction of the recorded magnetization is 27) or a magnetic flux generated from a perpendicular recording medium (the direction of the recorded magnetization is perpendicular to the medium film surface) can be reproduced as a signal.
In the thin-film magnetic head having the configuration shown in FIG. 27C and FIG. 27D, it is possible to reproduce a signal from a magnetic flux from an in-plane lateral recording medium (the recorded magnetization direction is the track width direction).

As described above, according to the thin-film magnetic head of the present invention, an optimum thin-film magnetic head can be provided according to the recording system of the magnetic recording medium 12.

(Ninth Embodiment) Next, a ninth embodiment of the present invention will be described.
The thin film magnetic head according to the embodiment will be described. As shown in the eighth embodiment of the present invention, FIG.
In either case of FIG. 27B and FIG. 27C, it is necessary to apply a bias magnetic field in parallel with the direction in which the sense current Is flows. FIG. 28 shows a structure as a thin film magnetic head in this case.

FIG. 28 is a sectional view of a thin-film magnetic head having a structure including the bias layer 131. FIG. 28A shows a bias layer 131 formed between the magnetoresistive layer 11 and the magnetic recording medium 12 (not shown). FIGS. 28B and 28C show the magnetoresistive layer. The bias layer 131 is formed at almost the same height as the bias layer 131. In FIG. 28D, a bias layer 131 is formed between the magnetoresistance effect layer 11 and the conductive member 32. In the case of the configuration of FIG.
Due to the presence of the bias layer 131, the distance between the magnetic recording medium 12 and the magnetoresistive layer 11 (especially, the sense region 33) increases, and the reproduction efficiency decreases.

Therefore, FIG.
This is the configuration of FIG. By adopting such a configuration, the reproduction efficiencies of the thin film magnetic heads shown in FIGS. 28 (b), 28 (c) and 28 (d) can be made substantially equal.

The material of the bias layer 131 is as follows.
A hard magnetic material, for example, a CoPt alloy, or an antiferromagnetic layer material, for example, a material selected from IrMn, αFe ₂ O ₃ , a FeMn-based alloy film, or a PtMn-based alloy film can be used.

Also, in the thin film magnetic head having the structure shown in FIGS. 27A and 27D, the bias layer 131 can be used in order to further apply a bias magnetic field. 27A and 27D, it is sufficient to apply a bias magnetic field in a direction orthogonal to the direction of the sense current Is.

FIG. 29 is a sectional view of a thin-film magnetic head having a configuration using the bias layer in this case. FIG. 29A shows the case of the configuration of the thin-film magnetic head according to the second embodiment of the present invention in which the width of the conductive member 32 is longer than the width of the magnetoresistive layer 11, and a high resistance bias is used as the bias layer. Layer 14
By using 1, it is possible to prevent the sense current Is from being shunted to the high-resistance bias layer 141 and reducing the reproduction output.

The high resistance bias layer 141 in the case of the structure shown in FIG. 29A is a high resistance hard magnetic film.

Next, FIGS. 29 (b), 29 (c) and 29 (d) show that the width of the magnetoresistive layer 11 is
This is a case of the configuration of the thin film magnetic head shown in the first embodiment of the present invention, which is longer than the width of the bias layer 131, and the structure of the bias layer 131 is similar to that shown in FIG. Further, as the bias layer 131, either a hard magnetic film or an antiferromagnetic film can be used.

Next, a method of manufacturing a thin film magnetic head having such a bias layer will be described. In the method of manufacturing the thin-film magnetic head according to the fourth, fifth, sixth, or seventh embodiment of the present invention, the magnetoresistance effect layer 211 is formed. First, as shown in FIG. 30A, the conductive layers 182 and 184
Scraping a part of the surface of.

Next, as shown in FIG. 30B, a hard magnetic layer 231 is formed.

Next, as shown in FIG. 30C, planar polishing is performed to form a pair of hard magnetic layers 231.

Next, as shown in FIG. 30D, the magnetoresistive effect layer 211 is formed, and a thin-film magnetic head having the hard magnetic layer 231 is formed.

As another method, as shown in FIG. 31A, after forming the magnetoresistive effect layer 211, a T-shaped resist mask 241 is formed.

Next, as shown in FIG. 31B, unnecessary portions of the magnetoresistive layer 211 (portions without the T-shaped resist mask 241) are formed by ion beam etching or the like.
Shaving.

Next, as shown in FIG. 31C, a high-resistance hard magnetic layer 242 is formed. Next, the T-shaped resist mask 241 is removed, and a thin-film magnetic head having a high-resistance hard magnetic layer 242 is formed as shown in FIG.

In the method of manufacturing a thin-film magnetic head according to the present invention, a magnetic field is applied when an antiferromagnetic film is used as the magnetoresistive layer 211 or the bias layer or in order to control the anisotropy of the soft magnetic film. The method may include a step of applying heat and performing heat treatment (annealing) at a predetermined temperature and time.

In the case where a hard magnetic film is used as the bias layer, a step of magnetizing may be provided.

By applying these methods, FIG.
It is possible to form a thin-film magnetic head having a hard magnetic layer or a high-resistance hard magnetic layer having the configuration shown in FIG.

As described above, according to the thin-film magnetic head of the ninth embodiment of the present invention, it is possible to provide the thin-film magnetic head of the present invention when a bias layer is required.

In the thin-film magnetic head according to the ninth embodiment of the present invention, even when a bias layer is required, a hard magnetic material, a high-resistance hard magnetic material, or an antiferromagnetic material is used for the bias layer. A bias magnetic field can be easily applied.

It should be noted that the thin-film magnetic head according to the fourth, fifth, sixth, seventh, or ninth embodiment of the present invention can be modified as follows. In the manufacturing method, for example, when unnecessary portions of the first conductive layer 182, the insulating layer 183, and the second conductive layer 184 shown in FIG. A part of the surface of the substrate 181 may be cut.

Also, when unnecessary portions of the magneto-resistance effect layer 211 as shown in FIG. 19 are cut, not only the magneto-resistance effect layer 211 but also a part of the conductive layer 182 under the magneto-resistance effect layer 211 is removed. Needless to say, it can be cut.

In the method of manufacturing a thin-film magnetic head of the present invention, steps other than those directly related to the present invention are not shown, but it goes without saying that other steps may be included.

In the drawings used in the method of manufacturing a thin-film magnetic head of the present invention, the shape after the conductive members and the like have been cut is represented by a linear shape. It does not affect the effect of the invention.

In the method of manufacturing a thin-film magnetic head according to the present invention, only the steps of manufacturing the reproducing section are shown. However, the method of manufacturing the recording section does not affect the effects of the present invention.

When the reproduction track width or the like is controlled by the shape of the conductive member, for example, as shown in FIG. 22B, when a part of the first conductive layer 182 is cut, It is preferable that not only the conductive layer 182 but also the surface of the substrate 181 below the first conductive layer 182 be cut by an amount corresponding to the thickness of the insulating layer 183. By doing so, the size of the sense region 33 can be controlled with high accuracy.

(Tenth Embodiment) Next, the effects of the thin-film magnetic head of the present invention in the tenth embodiment will be described.

FIG. 32 shows a thin film magnetic head according to the present invention in which the x-axis direction is the recording wavelength direction on the magnetic recording medium 12 and the z-axis direction is the reproducing track width direction of the thin-film magnetic head having the structure shown in FIG. The comparison of the resistance change amount in the sense region between the head and the conventional shield type thin film magnetic head is shown. FIG. 33 shows the thin-film magnetic head of the present invention when the z-axis direction is the recording wavelength direction on the magnetic recording medium 12 and the x-axis direction is the reproduction track width direction of the thin-film magnetic head shown in FIG. A comparison of a resistance change amount in a sense region with a conventional shield type thin film magnetic head is shown.

The vertical axis of each graph of FIGS. 32 and 33 represents the ratio of the resistance change between the thin film magnetic head of the present invention and the conventional shield type thin film magnetic head. The horizontal axis is BPI
This is the ratio between (the shortest bit number per inch (25.4 mm)) and TPI (the number of tracks per inch).
Recording track width / track pitch is 0.64, 32/3
Four-conversion is used. Also, by using the thin-film magnetic head of the present invention, the reproduction efficiency can be reduced by one compared with the conventional shield type.
The results at double, double and triple times are shown. FIG.
2 and FIG. 33, (a) shows the case where the recording density is 100 Gbit / 1 square inch, (b) shows the case where the recording density is 200 Gbit / 1 square inch, and (c) shows the case where the recording density is 400 Gbit / 1 square inch.

As can be seen from FIG. 32, as the recording density increases or the BPI / TPI ratio decreases, the effect of the thin-film magnetic head of the present invention when the direction of the recording wavelength and the direction of the sense current flow are parallel. It turns out that it becomes.

From FIG. 33, as the recording density increases or the BPI / TPI ratio increases, the effect of the thin-film magnetic head of the present invention in which the direction of the reproduction track width and the direction in which the sense current flows is parallel becomes more remarkable. You can see that. However, even if the ratio of BPI / TPI greatly changes, the thin-film magnetic head of the present invention has a much larger resistance change amount than the conventional shield-type thin-film magnetic head, so that it is very effective.

As described above, according to the thin-film magnetic head of the present invention, its effect becomes more remarkable as the recording density increases, as compared with the conventional thin-film magnetic head. Therefore, it can be said that the thin film magnetic head is suitable for high recording density.

(Eleventh Embodiment) FIGS. 34 to 37
The drawings described above are schematic explanatory diagrams for explaining the magnetic reproducing apparatus according to the eleventh embodiment of the present invention.

As shown in FIG. 34, at least one magnetic recording medium 321 is supported on a spindle 322 and rotated by a spindle motor 323. Further, at least one thin film magnetic head 324 of the present invention is connected to the actuator arm 326 via the suspension 325.
And the actuator arm 326
Is attached to the actuator 327.

Thus, the thin-film magnetic head 324 can be moved by the operation of the actuator 327. The thin-film magnetic head 324 is disposed so as to face the surface of the magnetic recording medium 321, and the entire surface of the magnetic recording medium 321 is rotated by rotation of the magnetic recording medium 321 and radial movement of the thin-film magnetic head 324. Signal can be read and written.

A control circuit 328 controls the rotation of the magnetic recording medium 321, the position of the thin-film magnetic head 324, the control of recording / reproducing signals, and the like.

As the thin-film magnetic head 324, a thin-film magnetic head having the structure shown in FIGS. 27A and 27B of the present invention was used, and the magnetic recording medium 321 was recorded as shown in FIG. By using the magnetic recording medium 331 (in-plane longitudinal recording medium) whose magnetization direction is substantially parallel to the rotation direction of the magnetic recording medium, it is possible to realize a high-density magnetic reproducing apparatus using the in-plane longitudinal recording medium. Can be.

As shown in FIG. 36, a thin film magnetic head 324 according to the present invention shown in FIGS.
By using the thin-film magnetic head having the configuration shown in (d) and using the magnetic recording medium 341 (in-plane lateral recording medium) in which the direction of the recorded magnetization is substantially parallel to the radial direction of the magnetic recording medium, in-plane lateral recording is performed. A magnetic recording device with a high recording density using a medium can be realized.

Further, as shown in FIG. 37, a thin film magnetic head 324 according to the present invention shown in FIGS.
By using the thin-film magnetic head having the configuration (b) and using the magnetic recording medium 351 (perpendicular recording medium) in which the direction of the recorded magnetization is almost perpendicular to the surface of the magnetic recording medium, the perpendicular recording medium can be used. Thus, a magnetic recording device having a high recording density can be realized.

As described above, according to the eleventh embodiment of the present invention, a high magnetic recording medium of any of an in-plane longitudinal recording medium, an in-plane lateral recording medium and a perpendicular recording medium can be used. It is possible to realize a magnetic reproducing device having a high recording density.

[0212]

As described above, in the thin-film magnetic head of the present invention, since the magnetoresistive layer is directly opposed to the magnetic recording medium, the amount of magnetic flux induced in the magnetoresistive layer can be increased.

Also, since the size of the sense region of the thin-film magnetic head can be easily controlled by the thickness of the insulating layer,
The sensing area can be made smaller than that of the conventional shield type thin film magnetic head, and the limit wavelength can be shortened.

Furthermore, even if the sense area of the thin-film magnetic head is reduced, the amount of magnetic flux generated from the magnetic recording medium that flows into the free magnetic layer does not decrease, so that the thin-film magnetic head does not cause a reduction in reproduction efficiency due to the shorter wavelength. Can be realized.

Further, the method of manufacturing a thin-film magnetic head of the present invention can easily manufacture the thin-film magnetic head of the present invention. In addition, since the thickness of the insulating layer can be reduced and formed with high accuracy, a high-resolution thin-film magnetic head with a short limit wavelength can be manufactured.

Further, the magnetic reproducing apparatus of the present invention can realize a magnetic reproducing apparatus having a shorter limit wavelength and a higher resolution than a magnetic reproducing apparatus using a conventional shield type thin film magnetic head.

[Brief description of the drawings]

FIG. 1 is a schematic front view showing the structure of a thin-film magnetic head according to a first embodiment of the present invention.

FIG. 2 is a schematic sectional view showing the structure of the thin-film magnetic head according to the first embodiment of the present invention;

FIG. 3 is a schematic sectional view showing a structure of a magnetoresistive layer of the thin-film magnetic head according to the first embodiment of the present invention;

FIG. 4 is a schematic sectional view showing the structure of the thin-film magnetic head according to the first embodiment of the present invention;

FIG. 5 is a schematic sectional view showing the structure of the thin-film magnetic head according to the first embodiment of the present invention;

FIG. 6 is a schematic front view and a schematic sectional view showing the structure of a thin-film magnetic head according to a second embodiment of the present invention.

FIG. 7 is a schematic cross-sectional view showing a structural model of a magnetic head for describing an effect of the thin-film magnetic head according to the second embodiment of the present invention;

FIG. 8 is a diagram (flux diagram) showing the flow of magnetic flux generated from a magnetic recording medium for describing the effect of the thin-film magnetic head of the present invention in the second embodiment of the present invention.

FIG. 9 is a view for explaining a second embodiment of the present invention;
Graph of the relationship between the thickness of the insulating layer (distance between shields) and the amount of magnetic flux flowing into the magnetoresistive layer

FIG. 10 is a schematic cross-sectional view of a thin-film magnetic head showing another example of the first embodiment and the second embodiment of the present invention.

FIG. 11 is a schematic front view of a thin-film magnetic head showing another example of the first embodiment and the second embodiment of the present invention.

FIG. 12 is a schematic front view showing a thin-film magnetic head according to a third embodiment of the present invention;

FIG. 13 is a schematic sectional view showing a thin-film magnetic head according to a third embodiment of the present invention;

FIG. 14 is a magnetic flux diagram showing a flow of a magnetic flux generated from a magnetic recording medium, for explaining a third embodiment of the present invention;

FIG. 15 is a schematic process diagram showing a method of manufacturing a thin-film magnetic head according to a fourth embodiment of the present invention.

FIG. 16 is a schematic process diagram showing a method of manufacturing a thin-film magnetic head according to a fourth embodiment of the present invention.

FIG. 17 is a schematic process diagram showing a method of manufacturing a thin-film magnetic head according to a fourth embodiment of the present invention.

FIG. 18 is a schematic process diagram showing a method of manufacturing a thin-film magnetic head according to a fourth embodiment of the present invention.

FIG. 19 is a schematic process diagram showing a method of manufacturing a thin-film magnetic head according to a fifth embodiment of the present invention.

FIG. 20 is a process schematic view showing the method of manufacturing the thin-film magnetic head according to the sixth embodiment of the present invention.

FIG. 21 is a schematic process diagram showing a method of manufacturing a thin-film magnetic head according to a sixth embodiment of the present invention.

FIG. 22 is a schematic process diagram showing the method of manufacturing the thin-film magnetic head according to the seventh embodiment of the present invention.

FIG. 23 is a schematic process diagram showing a method of manufacturing a thin-film magnetic head according to a seventh embodiment of the present invention.

FIG. 24 is a schematic process diagram showing a method of manufacturing a thin-film magnetic head according to a seventh embodiment of the present invention.

FIG. 25 is a schematic process diagram showing the method of manufacturing the thin-film magnetic head according to the seventh embodiment of the invention.

FIG. 26 is a process schematic diagram showing a method of manufacturing a thin-film magnetic head according to the seventh embodiment of the present invention.

FIG. 27 is a schematic front view of a sense region of a thin-film magnetic head for explaining an eighth embodiment of the present invention;

FIG. 28 is a schematic sectional view showing the structure of a thin-film magnetic head according to a ninth embodiment of the present invention;

FIG. 29 is a schematic sectional view showing the structure of a thin-film magnetic head according to a ninth embodiment of the present invention;

FIG. 30 is a process schematic view showing the method of manufacturing the thin-film magnetic head according to the ninth embodiment of the present invention.

FIG. 31 is a process schematic view showing the method of manufacturing the thin-film magnetic head according to the ninth embodiment of the present invention.

FIG. 32 is a diagram showing a resistance change ratio between the thin-film magnetic head of the present invention and a conventional thin-film magnetic head according to the tenth embodiment of the present invention.

FIG. 33 is a diagram showing a resistance change ratio between the thin-film magnetic head of the present invention and the conventional thin-film magnetic head in the tenth embodiment of the present invention.

FIG. 34 is a schematic front view showing the configuration of a magnetic reproducing apparatus according to an eleventh embodiment of the present invention.

FIG. 35 is a diagram showing a magnetic recording medium according to an eleventh embodiment of the present invention.

FIG. 36 is a view showing another magnetic recording medium according to the eleventh embodiment of the present invention;

FIG. 37 is a view showing another magnetic recording medium according to the eleventh embodiment of the present invention;

FIG. 38 is a schematic perspective view showing the structure of a conventional thin-film magnetic head.

FIG. 39 is a schematic front view showing the structure of a conventional thin-film magnetic head.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 11 Magnetoresistive layer 12 Magnetic recording medium 13 Shield layer 14 Support base 15 Conductive layer 21 Recorded magnetized region 31 Insulating layer 32 Conductive member 33 Sense region 34 Passivation layer 35 Nonmagnetic insulating layer 61 Antiferromagnetic layer 62 Fixed magnetism Layer 63 Nonmagnetic conductive layer 64 Free magnetic layer 131 Bias layer 141 High resistance bias layer 151 Conductive member made of soft magnetic material 181 Substrate 182 First conductive layer 183 Insulating layer 184 Second conductive layer 185 Passivation layer 186 Passivation layer 191 A strip-shaped body in which a plurality of elements are arranged in a line 201 Jig 211 A magnetoresistive layer 231 A hard magnetic layer 241 A resist mask 242 A high-resistance hard magnetic layer 291 A strip-shaped body in which a plurality of elements are arranged in a line 321 Magnetic recording medium 322 Spindle 323 spindle motor Data 324 Thin-film magnetic head 325 Suspension 326 Actuator arm 327 Actuator 328 Control circuit 331 Magnetic recording medium (In-plane longitudinal recording medium) 341 Magnetic recording medium (In-plane horizontal recording medium) 351 Magnetic recording medium (Perpendicular recording medium) 361 Lower shield Layer 362 Lower gap insulating layer 363 Magnetoresistive layer 364 Bias layer 365 Conductive layer 366 Upper gap insulating layer 367 Upper shield layer 368 Reproducing magnetoresistive thin film magnetic head 370 Recording inductive thin film magnetic head 371 Recording gap layer 372 Upper magnetic pole 373 Winding coil 374 Antiferromagnetic layer 375 Fixed magnetic layer 376 Non-magnetic conductive layer 377 Free magnetic layer 378 GMR layer 379 Upper and lower shield interval Is Sense current

Claims (45)

[Claims] 1. A support base comprising a pair of conductive members, an insulating layer disposed between the conductive members, and insulating between the conductive members, and the insulating layer of the support base is exposed. And a magnetoresistive layer formed on one surface, wherein the conductive member is an electrode terminal of the magnetoresistive layer. 2. The thin-film magnetic head according to claim 1, wherein the conductive member is made of a non-magnetic material. 3. The thin-film magnetic head according to claim 1, wherein the conductive member is made of a soft magnetic material. 4. The thin-film magnetic head according to claim 1, wherein said conductive member comprises a non-magnetic insulating layer and a conductive layer formed on a surface thereof. 5. The thin-film magnetic head according to claim 4, wherein said conductive layer is made of a non-magnetic material. 6. The thin-film magnetic head according to claim 4, wherein said conductive layer is made of a soft magnetic material. 7. The apparatus according to claim 1, wherein an interface direction between the insulating layer and the conductive member is substantially orthogonal to a film surface direction of the magnetoresistive layer. The thin-film magnetic head according to any one of the above. 8. The thin-film magnetic head according to claim 7, wherein an interface direction between the insulating layer and the conductive member is substantially perpendicular to a moving direction of the magnetic recording medium. 9. The thin-film magnetic head according to claim 7, wherein an interface direction between the insulating layer and the conductive member is substantially parallel to a moving direction of the magnetic recording medium. 10. In an intersecting direction between an interface between the insulating layer and the conductive member and a film surface of the magnetoresistive layer,
The thin-film magnetic head according to any one of claims 1 to 9, wherein the conductive member is formed wider than the magnetoresistive layer. 11. In an intersecting direction between an interface between the insulating layer and the conductive member and a film surface of the magnetoresistive layer,
The thin-film magnetic head according to any one of claims 1 to 9, wherein the magnetoresistive layer is formed wider than the conductive member. 12. The apparatus according to claim 1, wherein said magnetoresistive layer comprises at least an antiferromagnetic layer, a fixed magnetic layer, a nonmagnetic conductive layer, and a free magnetic layer.
The thin-film magnetic head according to any one of the above. 13. The thin-film magnetic head according to claim 12, wherein a magnetization direction of the fixed magnetic layer is configured to be substantially parallel to a moving direction of the magnetic recording medium. 14. The magnetic recording medium according to claim 1, wherein a magnetization direction of said pinned magnetic layer is parallel to a film surface of said magnetoresistive layer and substantially perpendicular to a moving direction of said magnetic recording medium. 13. The thin film magnetic head according to item 12. 15. The thin-film magnetic head according to claim 12, wherein a pair of bias layers is provided for applying a bias magnetic field to said magnetoresistive layer. . 16. The thin film according to claim 12, wherein a pair of high resistance bias layers is provided for applying a bias magnetic field to said magnetoresistive layer. Magnetic head. 17. The method according to claim 1, wherein a protective layer for covering the magnetoresistive layer is provided on a surface of the support base on which the magnetoresistive layer is formed. Item 7. The thin-film magnetic head according to item 1. 18. A method for forming a first conductive layer on a substrate, comprising the steps of:
And a second step of forming an insulating layer on the first conductive layer after the first step; and a second conductive layer on the insulating layer after the second step. A third step of forming; a fourth step of shaving unnecessary portions of the first conductive layer, the insulating layer and the second conductive layer after the third step; A fifth step of forming a passivation layer; a sixth step of cutting the substrate after the fifth step; and a planar polishing of the cut surface after the sixth step. A seventh step of forming a polished surface having a first conductive layer, the insulating layer, and the second conductive layer; and a step of forming a magnetoresistive layer on the polished surface after the seventh step. 8. A method for manufacturing a thin-film magnetic head, comprising: 19. A first method for forming a first conductive layer on a substrate.
A second step of exposing an end face of the first conductive layer by removing a remaining part of the first conductive layer after leaving the required part thereof, after the first step, After the second step, the first conductive layer and the first conductive layer
A third step of forming an insulating layer so as to cover an end surface of the conductive layer, a fourth step of forming a second conductive layer on the insulating layer after the third step, A step of shaving unnecessary portions of the first conductive layer, the insulating layer, and the second conductive layer after the step; and a sixth step of forming a passivation layer after the fifth step. A seventh step of performing planar polishing after the sixth step to form a polished surface having the first conductive layer, the insulating layer, and the second conductive layer, and a seventh step An eighth step of forming a magnetoresistive layer on the polished surface after the step (b). 20. A method for forming a first conductive layer on a substrate, comprising the steps of:
A second step of exposing an end face of the first conductive layer by removing a remaining part of the first conductive layer after leaving the required part thereof, after the first step, After the second step, the first conductive layer and the first conductive layer
A third step of forming an insulating layer so as to cover an end surface of the conductive layer, a fourth step of forming a second conductive layer on the insulating layer after the third step, A fifth step of cutting unnecessary portions of the first conductive layer, the insulating layer, and the second conductive layer after the step; and a step of forming a first passivation layer after the fifth step. And a seventh step of performing planar polishing after the sixth step to form a first polished surface having the first conductive layer, the insulating layer, and the second conductive layer. An eighth step of forming a second passivation layer after the seventh step, a ninth step of cutting the substrate after the eighth step, and after the ninth step, The cut surface is planarly polished to have the first conductive layer, the insulating layer, and the second conductive layer. A tenth step of forming a second polished surface substantially orthogonal to the first polished surface, and an eleventh step of forming a magnetoresistive layer on the second polished surface after the tenth step And a method of manufacturing a thin film magnetic head. 21. The method of manufacturing a thin-film magnetic head according to claim 18, further comprising a step of shaping the magnetoresistive effect layer to form a film surface shape. 22. The method of manufacturing a thin-film magnetic head according to claim 18, wherein in the eighth step, a magnetoresistive layer is selectively formed. 23. The method according to claim 20, wherein, in the eleventh step, a magnetoresistive layer is selectively formed.
3. The method for manufacturing a thin-film magnetic head according to item 1. 24. The method for manufacturing a thin-film magnetic head according to claim 18, further comprising a step of forming a pair of hard magnetic layers. 25. The method according to claim 18, further comprising the step of forming a pair of high-resistance hard magnetic layers.
13. The method for manufacturing a thin-film magnetic head according to claim 1. 26. A support base comprising a pair of conductive members, an insulating layer disposed between the conductive members, and insulating between the conductive members, and the insulating layer of the support base is exposed. A thin-film magnetic head comprising: a magnetoresistive layer formed on one surface, wherein the conductive member is an electrode terminal of the magnetoresistive layer; a rotatably supported magnetic recording medium; and the thin-film magnetic head. A support member that supports the magnetic recording medium so as to face the magnetic recording medium; a unit that rotates the magnetic recording medium; And electrically connected to the thin-film magnetic head, the rotating means and the moving means, exchange signals with the thin-film magnetic head, control rotation of the magnetic recording medium, and move the thin-film magnetic head. Magnetic reproducing apparatus characterized by having a Gosuru processing means. 27. The magnetic reproducing apparatus according to claim 26, wherein the conductive member of the thin-film magnetic head is made of a non-magnetic material. 28. The magnetic reproducing apparatus according to claim 26, wherein the conductive member of the thin-film magnetic head is made of a soft magnetic material. 29. The magnetic reproducing apparatus according to claim 26, wherein the conductive member of the thin-film magnetic head comprises a non-magnetic insulating layer and a conductive layer formed on a surface thereof. 30. The magnetic reproducing apparatus according to claim 29, wherein the conductive layer of the thin-film magnetic head is made of a non-magnetic material. 31. The magnetic reproducing apparatus according to claim 29, wherein the conductive layer of the thin-film magnetic head is made of a soft magnetic material. 32. The thin-film magnetic head according to claim 26, wherein an interface direction between the insulating layer and the conductive member of the thin-film magnetic head is substantially orthogonal to a film surface direction of the magnetoresistive layer. The magnetic reproducing device according to any one of claims 31 to 31. 33. The thin-film magnetic head according to claim 32, wherein an interface direction between the insulating layer and the conductive member of the thin-film magnetic head is substantially orthogonal to a moving direction of the magnetic recording medium. Magnetic playback device. 34. The thin-film magnetic head according to claim 32, wherein an interface direction between the insulating layer and the conductive member of the thin-film magnetic head is substantially parallel to a moving direction of the magnetic recording medium. Magnetic playback device. 35. The conductive member, as compared with the magnetoresistive layer, in an intersecting direction between an interface between the insulating layer and the conductive member of the thin-film magnetic head and a film surface of the magnetoresistive layer. 27. The device according to claim 26, which is formed wide.
35. The magnetic reproducing apparatus according to claim 34. 36. The magneto-resistance effect layer is more laid than the conductive member in a direction intersecting an interface between the insulating layer and the conductive member of the thin-film magnetic head and a film surface of the magneto-resistance effect layer. 27. The device according to claim 26, which is formed wide.
35. The magnetic reproducing apparatus according to claim 34. 37. The thin-film magnetic head according to claim 26, wherein the magnetoresistive layer comprises at least an antiferromagnetic layer, a pinned magnetic layer, a nonmagnetic conductive layer, and a free magnetic layer. 37. The magnetic reproducing apparatus according to any one of 36 to 36. 38. The magnetic reproducing apparatus according to claim 37, wherein a magnetization direction of the fixed magnetic layer of the thin-film magnetic head is configured to be substantially parallel to a moving direction of a magnetic recording medium. 39. The thin-film magnetic head, wherein the magnetization direction of the fixed magnetic layer is parallel to a film surface of the magnetoresistive layer and substantially perpendicular to a moving direction of the magnetic recording medium. 38. The magnetic reproducing device according to claim 37, wherein: 40. A thin film magnetic head according to claim 37, wherein a pair of bias layers are provided for applying a bias magnetic field to said magnetoresistive layer.
The magnetic reproducing device according to any one of the above. 41. A thin-film magnetic head according to claim 37, wherein a pair of high-resistance bias layers are provided for applying a bias magnetic field to said magneto-resistance effect layer. Item 6. A magnetic reproducing device according to Item 1. 42. A protective layer for covering said magnetoresistive layer is provided on a surface of said thin-film magnetic head facing said magnetic recording medium. Item 6. A magnetic reproducing device according to Item 1. 43. The magnetic reproducing apparatus according to claim 38, wherein the direction of the recorded magnetization of the magnetic recording medium is substantially parallel to the rotation direction of the magnetic recording medium. 44. The magnetic reproducing apparatus according to claim 38, wherein a direction of a recorded magnetization of the magnetic recording medium is substantially orthogonal to a surface of the magnetic recording medium. 45. The magnetic reproducing apparatus according to claim 39, wherein a direction of magnetization recorded on the magnetic recording medium is substantially parallel to a radial direction of the magnetic recording medium.