JP2002210765A - Solution forming film low in generation frequency of pinholes and method for manufacturing the same - Google Patents

Solution forming film low in generation frequency of pinholes and method for manufacturing the same

Info

Publication number
JP2002210765A
JP2002210765A JP2001015473A JP2001015473A JP2002210765A JP 2002210765 A JP2002210765 A JP 2002210765A JP 2001015473 A JP2001015473 A JP 2001015473A JP 2001015473 A JP2001015473 A JP 2001015473A JP 2002210765 A JP2002210765 A JP 2002210765A
Authority
JP
Japan
Prior art keywords
film
solution
solvent
pinholes
tex
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001015473A
Other languages
Japanese (ja)
Other versions
JP4632109B2 (en
JP2002210765A5 (en
Inventor
Ayahiro Kurosawa
理弘 黒澤
Wasuke Yoneyama
和祐 米山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP2001015473A priority Critical patent/JP4632109B2/en
Publication of JP2002210765A publication Critical patent/JP2002210765A/en
Publication of JP2002210765A5 publication Critical patent/JP2002210765A5/en
Application granted granted Critical
Publication of JP4632109B2 publication Critical patent/JP4632109B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a film not generating pinholes, which is a problem peculiar to solution film forming, in its surface and a method for manufacturing the same. SOLUTION: The solution forming film low in the generation frequency of pinholes is characterized by that the thickness of the product film measured by an electronic microthickness meter is not more than 5 μm and the number of pinholes of 100 μm or more in the product film is 1 or less per 1,000 m2. In manufacturing the solution film, the temperature Tatm of an atmosphere coming into contact with the solvent of a polymer solution and the temperature Tex of a solvent exhaust port satisfy Tex-100<=Tatm<=Tex-1 [ deg.C] and the region L up to the exhaust port immediately after casting is set to 10<=L<=1,000 [cm] and, thereafter, the solution forming film is manufactured through a wet process and stretching.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明に属する技術分野】本発明は、ポリマ溶液を支持
体上に流延して形成される溶液製膜フィルム、および、
フィルムに成形した後、湿式工程にフィルムを導入し、
フィルムを搬送する工程を有する溶液製膜フィルムの製
造方法に関するものである。
TECHNICAL FIELD The present invention relates to a solution casting film formed by casting a polymer solution on a support, and
After forming into a film, the film is introduced into the wet process,
The present invention relates to a method for producing a solution casting film having a step of transporting a film.

【0002】[0002]

【従来の技術】一般にその融点以上の温度で溶融状態と
なる有機ポリマを口金から溶融膜として吐出するとフィ
ルムが成形される。しかし、融点と分解温度の近い、ま
たは融点が分解温度より高いポリマは、溶融と同時に分
解が起こるため、適当な溶媒にポリマを溶かし、得られ
たポリマ溶液を支持体上にキャストして、その後溶媒を
除去する溶液製膜法によりフィルムに成形される。溶液
製膜により成形されるポリマとしては、例えば、セルロ
ース、酢酸ビニル、あるいは芳香族ポリアミド、芳香族
ポリイミドなどが挙げられる。例えばパラ系芳香族ポリ
アミドフィルムは、その耐熱性、高剛性を活かして、磁
気記録分野等に使用されているが、近年、磁気記録媒体
の高密度化、小型化などの要請からより一層の表面品質
の向上による高機能化が求められるようになっている。
2. Description of the Related Art In general, a film is formed when an organic polymer which is in a molten state at a temperature higher than its melting point is discharged from a die as a molten film. However, polymers having a melting point close to the decomposition temperature, or a melting point higher than the decomposition temperature, are decomposed simultaneously with melting, so the polymer is dissolved in an appropriate solvent, and the obtained polymer solution is cast on a support, and then The film is formed by a solution casting method for removing the solvent. Examples of the polymer formed by solution casting include cellulose, vinyl acetate, aromatic polyamide, aromatic polyimide, and the like. For example, para-aromatic polyamide films have been used in the field of magnetic recording, etc., taking advantage of their heat resistance and high rigidity. Higher functions are required by improving quality.

【0003】乾湿式法では、支持体上に流延されたポリ
マ溶液は自己保持性を持つまで溶媒を除去した後、支持
体より剥離し、湿式工程に導入される。ここでフィルム
中に含有されているイオン性無機化合物や不純物が除去
され、各種工程を経てフィルムが得られる(芳香族ポリ
アミドの例としては特開平4−139229号公報があ
る。)。湿式法では、支持体上に流延されたポリマ溶液
を支持体とともに水中に浸漬し凝固させた後、支持体よ
り剥離し、水槽中に導入し、この後各種工程を経てフィ
ルムが得られる(芳香族ポリアミドの例としては特開平
2−28222号公報がある。)。
[0003] In the dry-wet method, a polymer solution cast on a support is stripped from the support after removing the solvent until it has a self-holding property, and is introduced into a wet process. Here, the ionic inorganic compound and impurities contained in the film are removed, and the film is obtained through various steps (an example of an aromatic polyamide is disclosed in JP-A-4-139229). In the wet method, a polymer solution cast on a support is immersed in water together with the support, solidified, then separated from the support, introduced into a water tank, and then subjected to various steps to obtain a film ( An example of the aromatic polyamide is described in JP-A-2-28222.)

【0004】しかし、薄膜化、安定供給性の要請に伴
い、ピンホール改善に対する要求が特に強くなった今日
において、フィルムの表面に穴(ピンホール)があきや
すい溶液製膜フィルム製造における固有の問題が顕在化
し、後の塗布工程において歩留まりが低下する問題を抱
えている。
[0004] However, with the demand for pinhole improvement becoming particularly strong along with the demand for thinning and stable supply, a problem inherent in the production of a solution casting film in which holes (pinholes) tend to be formed on the surface of the film. And the problem that the yield decreases in the subsequent coating process.

【0005】[0005]

【発明が解決しようとする課題】そこで本発明の課題
は、薄膜化等により顕在化した上記問題を解消し、後の
塗布もしくは蒸着工程において安定した加工性が得られ
る、ピンホール発生頻度の低い芳香族ポリアミドフィル
ム等の溶液製膜フィルム、およびその製造方法を提供す
ることにある。
SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to solve the above-mentioned problems that have become apparent due to thinning and the like, and to obtain a stable workability in a subsequent coating or vapor deposition step, and to reduce the frequency of pinhole occurrence. An object of the present invention is to provide a solution casting film such as an aromatic polyamide film and a method for producing the same.

【0006】[0006]

【課題を解決するための手段】上記課題を解決するため
に、本発明に係るピンホール発生頻度の低い溶液製膜フ
ィルムは、電子マイクロ厚さ計で測定した製品フィルム
厚みが5μm以下であり、製品フィルム中の100μm以上
のピンホール数が1000m2あたりに1個以下であることを
特徴とするものからなる。溶液製膜フィルムとしては、
とくに芳香族ポリアミドフィルムが好ましい。
Means for Solving the Problems In order to solve the above-mentioned problems, a solution casting film having a low pinhole occurrence frequency according to the present invention has a product film thickness of 5 μm or less measured by an electronic micro thickness gauge, It is characterized in that the number of pinholes of 100 μm or more in the product film is 1 or less per 1000 m 2 . As a solution casting film,
Particularly, an aromatic polyamide film is preferable.

【0007】また、本発明に係る溶液製膜フィルムの製
造方法は、ポリマ溶液を支持体上に流延してフィルムに
成形した後、湿式工程にフィルムを導入しフィルムを搬
送する工程において、ポリマ溶液の溶媒と接触する雰囲
気の温度Tatmと溶媒の排気口の温度Texとが、 Tex-100≦Tatm≦Tex-1 [℃] の関係を満たす流延直後から排気口までの領域Lが、 10≦L≦1000 [cm] 存在することを特徴とする方法からなる。
Further, in the method for producing a solution casting film according to the present invention, the polymer solution is cast on a support and formed into a film, and then the film is introduced into a wet process and the film is transported. The region L from immediately after casting to the exhaust port satisfying the relationship of Tex-100 ≦ Tatm ≦ Tex-1 [° C.] .Ltoreq.L.ltoreq.1000 [cm] A method characterized by being present.

【0008】[0008]

【発明の実施の形態】以下に、本発明について、望まし
い実施の形態とともに詳細に説明する。本発明でいうフ
ィルムとは、ポリマと溶媒を主成分とする溶液を口金よ
り支持体上にキャストされ、支持体から剥離後湿式工程
に導入され、フィルム中に含有されているイオン性無機
化合物や不純物が除去され、場合によっては縦に延伸さ
れた後、各種工程を経て成形される溶液製膜フィルムで
ある。溶媒の種類はポリマを溶解するものであれば特に
限定はされない。また、溶液中のポリマの濃度はポリマ
の種類にもよるが、一般的に4〜40wt%であり、溶
液中にはポリマと溶媒以外に目的に応じて、滑剤、可塑
剤、導電性粒子、酸化防止剤その他の添加剤がブレンド
されていても差し支えない。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail with preferred embodiments. The film referred to in the present invention is a solution containing a polymer and a solvent as main components, which is cast on a support from a die, introduced into a wet process after peeling from the support, and an ionic inorganic compound contained in the film. This is a solution casting film that is formed through various steps after the impurities are removed and, if necessary, stretched in the longitudinal direction. The type of the solvent is not particularly limited as long as it dissolves the polymer. The concentration of the polymer in the solution depends on the type of the polymer, but is generally 4 to 40% by weight. In the solution, a lubricant, a plasticizer, conductive particles, Antioxidants and other additives may be blended.

【0009】本発明の溶液製膜フィルムの製造方法が適
用されるポリマは特に限定されないが、好ましくは、芳
香族ポリアミド、芳香族ポリイミド、ポリアリレート、
ポリカーボネート、二酢酸セルロースや三酢酸セルロー
スなどのセルロースポリマ、酢酸ビニル、ポリビニルア
ルコールなどが挙げられ、特に、芳香族ポリアミドが好
ましい。
The polymer to which the method for producing a solution casting film of the present invention is applied is not particularly limited, but is preferably aromatic polyamide, aromatic polyimide, polyarylate, or the like.
Examples include polycarbonate, cellulose polymers such as cellulose diacetate and cellulose triacetate, vinyl acetate, polyvinyl alcohol, and the like, with aromatic polyamide being particularly preferred.

【0010】本発明にかかる溶液製膜フィルムの厚さ
は、とくに磁気記録媒体の高密度化・小型化の要求を満
たす観点から、5μm以下が対象とされ、好ましくは
4.5μm以下、より好ましくは4.4μm以下の範囲
であり、とくにかかる薄膜を製造するにあたっては、流
延したポリマと支持体との隙間にエアの混入等によりピ
ンホールが発生しやすくなるため、本発明による効果が
大きい。
The thickness of the solution casting film according to the present invention is 5 μm or less, preferably 4.5 μm or less, and more preferably 4.5 μm or less, from the viewpoint of satisfying the demand for higher density and smaller size of the magnetic recording medium. Is in the range of 4.4 μm or less, and particularly in producing such a thin film, a pinhole is easily generated due to air mixing or the like in a gap between the cast polymer and the support, and the effect of the present invention is large. .

【0011】本発明に係るフィルムを磁気記録媒体にお
ける基材フィルムとする場合、基材フィルムの少なくと
も一方向に引張りヤング率は、800kg/mm2以上あること
が好ましく、より好ましくは900kg/mm2以上、更に好ま
しくは1000kg/mm2以上である。このような引張りヤング
率にすることにより、塗布層もしくは蒸着層形成、バッ
クコート層形成工程などの磁気記録媒体形成時にかかる
テンションにも耐えることができるようになり、加工上
も有利であるので望ましい。
When the film according to the present invention is used as a base film in a magnetic recording medium, the base material film preferably has a tensile Young's modulus of at least 800 kg / mm 2 , more preferably 900 kg / mm 2. It is more preferably 1000 kg / mm 2 or more. By setting the tensile Young's modulus to such a value, it becomes possible to withstand the tension applied during the formation of the magnetic recording medium such as the step of forming the coating layer or the vapor deposition layer and the step of forming the back coat layer, which is advantageous in terms of processing and is therefore desirable. .

【0012】また、本発明に係るフィルムを用いた磁気
記録媒体においては、基材フィルムの少なくとも一方向
のヤング率が800kg/mm2以上であれば、該基材フィルム
の長手方向にテンシライズまたは幅方向にテンシライズ
されても差し支えない。テンシライズの度合いは特に限
定されないが、伸度、引き裂き抵抗等の特性を考慮に入
れると、長手方向の引張りヤング率Emdと幅方向の引張
りヤング率Etdが、0.5≦Emd/Etd≦2の範囲にあるの
が実用的である。
In a magnetic recording medium using the film according to the present invention, if the Young's modulus of at least one direction of the base film is 800 kg / mm 2 or more, the base film is tensilized or width-wise in the longitudinal direction. It can be tensilized in any direction. The degree of tensilization is not particularly limited, but taking into account properties such as elongation and tear resistance, the tensile Young's modulus in the longitudinal direction Emd and the tensile Young's modulus in the width direction Etd are 0.5 ≦ Emd / Etd ≦ 2. It is practical to be in the range.

【0013】また、磁気記録媒体における基材フィルム
の少なくとも一方向の伸度は、10%以上、より好まし
くは20%以上、更に好ましくは30%以上であること
が望ましい。これにより、テープの適度な柔軟性を持つ
ことができる。
The elongation in at least one direction of the base film in the magnetic recording medium is preferably at least 10%, more preferably at least 20%, further preferably at least 30%. This allows the tape to have an appropriate flexibility.

【0014】また、磁気記録媒体における基材フィルム
の吸湿率は、5%以下、より好ましくは3%以下、更に
好ましくは2%以下であるのが望ましい。これにより、
湿度変化によるテープの寸法変化が小さく良好な電磁変
換特性を保てるようになる。
The moisture absorption of the base film in the magnetic recording medium is preferably 5% or less, more preferably 3% or less, and further preferably 2% or less. This allows
Dimensional change of the tape due to humidity change is small and good electromagnetic conversion characteristics can be maintained.

【0015】また、磁気記録媒体における基材フィルム
の1000mm幅、10m長さのフィルムの片伸び量が
±40mm以下であることが、蛇行防止、磁性層形成工
程での良好な加工性の観点から好ましく、より好ましく
は±30mm以下、更に好ましくは±20mm以下であ
ることが望ましい。
Further, from the viewpoint of preventing meandering and good workability in the step of forming a magnetic layer, it is required that the one-sided elongation of the base film of the magnetic recording medium having a width of 1000 mm and a length of 10 m is ± 40 mm or less. Preferably, it is more preferably ± 30 mm or less, and still more preferably ± 20 mm or less.

【0016】さらに、磁気記録媒体における基材フィル
ムにおいては、基材フィルムの幅方向についてフィルム
が5%伸長した際のフィルムの強度F−5値が、250kg/
mm2以上であることが好ましい。より好ましくは280kg/m
m2以上、さらに好ましくは320kg/mm2である。このよう
なF−5値を有することにより、磁性層形成、バックコ
ート層形成工程などの磁気記録媒体にかかるテンション
に耐えることができ、加工上有利である。
Further, in the base film of the magnetic recording medium, the strength F-5 value of the film when the film is stretched by 5% in the width direction of the base film is 250 kg /.
mm 2 or more. More preferably 280 kg / m
m 2 or more, more preferably 320 kg / mm 2 . By having such an F-5 value, it is possible to withstand the tension applied to the magnetic recording medium in the steps of forming the magnetic layer and forming the back coat layer, which is advantageous in processing.

【0017】本発明の溶液製膜フィルムの製造方法を、
芳香族ポリアミドフィルムを例にとって説明するが、こ
れに限定されるものではない。
The method for producing a solution casting film of the present invention comprises:
An aromatic polyamide film will be described as an example, but the present invention is not limited to this.

【0018】芳香族ポリアミドポリマは、酸クロリドと
ジアミンから得る場合は、N−メチルピロリドン(NM
P)、ジメチルアセトアミド(DMAc)、ジメチルホ
ルムアミド(DMF)などの非プロトン性有機極性溶媒
中で、溶液重合したり、水系媒体を使用する界面重合な
どで合成される。ポリマ溶液は、単量体として酸クロリ
ドとジアミンを使用すると塩化水素が副生するので、水
酸化カルシウム、炭酸カルシウム、炭酸リチウムなどの
無機の中和剤、またエチレンオキサイド、プロピレンオ
キサイド、アンモニア、トリエチルアミン、トリエタノ
ールアミン、ジエタノールアミンなどの有機の中和剤が
使用される。また、イソシアネートとカルボン酸との反
応により芳香族ポリアミドポリマを製造する場合は、非
プロトン性有機極性溶媒中、触媒の存在下で行なわれ
る。
When the aromatic polyamide polymer is obtained from acid chloride and diamine, N-methylpyrrolidone (NM
It is synthesized by solution polymerization in an aprotic organic polar solvent such as P), dimethylacetamide (DMAc), or dimethylformamide (DMF), or by interfacial polymerization using an aqueous medium. When acid chloride and diamine are used as monomers in the polymer solution, hydrogen chloride is produced as a by-product.Therefore, inorganic neutralizers such as calcium hydroxide, calcium carbonate, and lithium carbonate, and ethylene oxide, propylene oxide, ammonia, and triethylamine Organic neutralizing agents such as triethanolamine and diethanolamine are used. When an aromatic polyamide polymer is produced by a reaction between an isocyanate and a carboxylic acid, the production is carried out in an aprotic organic polar solvent in the presence of a catalyst.

【0019】これらのポリマ溶液はそのまま製膜原液と
して使用してもよく、あるいはポリマを一度単離してか
ら上記の有機溶媒や、硫酸等の無機溶剤に再溶解して製
膜原液を調製してもよい。
These polymer solutions may be used directly as a film forming stock solution, or the polymer may be isolated once and then redissolved in the above organic solvent or an inorganic solvent such as sulfuric acid to prepare a film forming stock solution. Is also good.

【0020】フィルムの表面に微細な凹凸をつけるため
には、粒子を添加することが好ましい。粒子の添加方法
は、粒子を予め溶媒中に十分スラリー化した後、重合用
溶媒または希釈用溶媒として添加する方法や、製膜原液
を調製した後に直接添加する方法などがあるが特に限定
されない。
In order to form fine irregularities on the surface of the film, it is preferable to add particles. The method of adding the particles is, for example, a method in which the particles are sufficiently slurried in a solvent in advance and then added as a solvent for polymerization or a solvent for dilution, or a method in which the particles are directly added after preparing a stock solution for film formation, but are not particularly limited.

【0021】製膜原液には溶解助剤として無機塩、例え
ば塩化カルシウム、塩化マグネシウム、塩化リチウム、
硝酸リチウムなどを添加する場合もある。製膜原液中の
ポリマ濃度は高い方が生産性向上につながるが、好まし
くは4〜40%である。
In the film forming solution, inorganic salts such as calcium chloride, magnesium chloride, lithium chloride,
In some cases, lithium nitrate or the like is added. Although a higher polymer concentration in the film forming solution leads to an improvement in productivity, it is preferably 4 to 40%.

【0022】上記のように調製された製膜原液は、いわ
ゆる溶液製膜法によりフィルムに成形される。溶液製膜
法には、製膜原液をエンドレスベルト、ドラム等の支持
体上にキャスト後、乾燥、フィルムの剥離、熱処理を行
う乾式法、製膜原液乾燥工程を経ずに直接水中に押し出
し、溶媒抽出後熱処理を行う湿式法、支持体上で乾燥、
フィルム剥離後湿式工程に導入する乾湿式法、支持体上
で乾燥後支持体ごと湿式工程に導入する半乾半湿式法な
どがあるが、本発明のフィルムを得るには湿式法また
は、溶液膜を支持体上にキャストする乾湿式法、半乾半
湿式法が好ましいが、ここでは乾湿式法を例にとって説
明する。
The stock solution thus prepared is formed into a film by a so-called solution casting method. In the solution casting method, the casting solution is cast on a support such as an endless belt or a drum, and then dried, peeled, and dried. Wet method with heat treatment after solvent extraction, drying on support,
There are a dry-wet method in which the film is introduced into the wet process after peeling, and a semi-dry semi-wet method in which the support is dried and then introduced into the wet process together with the support. Is preferably applied to a dry-wet method or a semi-dry semi-wet method, but the dry-wet method will be described here as an example.

【0023】乾湿式法で製膜する場合は、まず該溶液を
口金からドラムやエンドレスベルト等の支持体上に押し
出して薄膜とする。次いでかかる薄膜層から溶媒を飛散
させ薄膜が自己保持性をもつまで乾燥する。このように
支持体上にキャストされた溶液膜は熱風、支持体加熱あ
るいは赤外線加熱などの方法により乾燥を受け溶媒が除
去される。乾燥条件は室温〜溶媒の沸点+20℃、60
分以内の範囲であり、好ましくは室温〜溶媒の沸点の範
囲である。尚、Tex-100≦Tatm[℃]≦Tex-1を満たす領
域、好ましくはTex-30≦Tatm≦Tex-10を満たす流延直後
から排気口までの領域Lが、10≦L[cm]≦1000の範囲で存
在すると好ましく、より好ましくは20≦L[cm]≦200の範
囲で存在することである。また、溶媒の排気量は総排気
量に対して0.2vol%以下であることが好ましく、より好
ましくは0.1vol%以下である。
When a film is formed by a dry-wet method, the solution is first extruded from a die onto a support such as a drum or an endless belt to form a thin film. Next, the solvent is scattered from the thin film layer and dried until the thin film has self-holding property. The solution film thus cast on the support is dried by a method such as hot air, heating of the support or infrared heating to remove the solvent. Drying conditions are from room temperature to the boiling point of the solvent + 20 ° C, 60
Minutes, preferably in the range of room temperature to the boiling point of the solvent. In addition, a region satisfying Tex-100 ≦ Tatm [° C.] ≦ Tex-1, preferably a region L from immediately after casting that satisfies Tex-30 ≦ Tatm ≦ Tex-10 to an exhaust port is 10 ≦ L [cm] ≦ It is preferably present in the range of 1000, more preferably in the range of 20 ≦ L [cm] ≦ 200. Further, the displacement of the solvent is preferably 0.2 vol% or less, more preferably 0.1 vol% or less, based on the total displacement.

【0024】上記乾式工程を終えたフィルムは、支持体
から剥離されて湿式工程に導入され、ここでフィルム中
に含有されている溶媒や不純物が除去される。この浴は
一般に水系媒体からなるものであり、水の他に有機溶媒
や無機塩等を含有してもよい。一般には水分量は30%
以上、好ましくは50%以上含有され、浴温度は通常、
0〜100℃で使用される。
The film after the above-mentioned dry process is peeled from the support and introduced into the wet process, where the solvent and impurities contained in the film are removed. This bath is generally composed of an aqueous medium, and may contain an organic solvent, an inorganic salt or the like in addition to water. Generally, the water content is 30%
Or more, preferably 50% or more, and the bath temperature is usually
Used at 0-100 ° C.

【0025】この湿式工程では、剥離されたフィルムは
かかる浴中に緊張下で浸漬され、フィルム中の無機化合
物が、0.1%未満、好ましくは0.05%以下になる
まで抽出される。この湿式工程では、フィルムは浴入出
口のニップロールと浴中のロールを介して搬送される。
湿式工程を出たフィルムは更に乾燥、熱処理が行われて
フィルムとなる。そのときの温度は200〜450℃
で、時間は20秒以上20分以下である。
In this wet process, the exfoliated film is immersed in such a bath under tension and the inorganic compounds in the film are extracted until it is less than 0.1%, preferably less than 0.05%. In this wet process, the film is conveyed through a nip roll at the bath port and a roll in the bath.
The film that has passed through the wet process is further dried and heat-treated to form a film. The temperature at that time is 200-450 ° C
And the time is 20 seconds or more and 20 minutes or less.

【0026】このように形成されるフィルムはその製膜
工程中で、機械特性向上の目的で延伸が行なわれてもよ
い。延伸倍率は、巻き取り速度をキャスト速度で除した
値である縦延伸倍率が0.95〜2.0倍、面倍率で
0.8〜4.0倍(面倍率とは延伸後のフィルム面積を
延伸前のフィルムの面積で除した値で定義する。1以下
はリラックスを意味する。)の範囲内であると局所厚み
むら、機械特性の点から好ましく、より好ましくは縦延
伸倍率が1.05〜1.5倍、面倍率が1.1〜3.0
倍の範囲である。
The film thus formed may be stretched during the film forming process for the purpose of improving mechanical properties. The stretching ratio is a value obtained by dividing the winding speed by the casting speed, the longitudinal stretching ratio is 0.95 to 2.0 times, and the area ratio is 0.8 to 4.0 times (the area ratio is the area of the film after stretching. Is defined as a value obtained by dividing by the area of the film before stretching. 1 or less means relaxation.) In the range of local thickness unevenness and mechanical properties, and more preferably the longitudinal stretching ratio is 1. 05-1.5 times, area magnification 1.1-3.0.
Range of double.

【0027】こうして得られたフィルムを巻き取って芳
香族ポリアミド製品フィルムが得られる。
The thus obtained film is wound up to obtain an aromatic polyamide product film.

【0028】[0028]

【実施例】以下、実施例を挙げて本発明を更に具体的に
説明する。 (1)製品フィルムロール中100μm以上のピンホール
個数Pin[個/1000m2]湿式工程を出た後、横延伸、乾燥、
熱処理、リラックスされて得られたフィルムの下部から
紫外線を照射し、フィルム上部に設置した紫外線のみを
透過するフィルターを介したCCDカメラに受光した回
数を、製品フィルム1000m2あたりに換算して求める。
EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples. (1) The number of pinholes of 100 μm or more in the product film roll Pin [pieces / 1000 m 2 ] After exiting the wet process, transverse stretching, drying,
The number of times that ultraviolet light is irradiated from the lower part of the film obtained by the heat treatment and the relaxation and the light is received by the CCD camera through the filter that transmits only the ultraviolet light installed on the upper part of the film is converted into 1000 m 2 of the product film.

【0029】(2)製品フィルムロール中に含まれる微
小ピンホール(50μm以上)の個数Poff[個/1000m2] フィルムの下部を金属ロールに接触させ、フィルム上部
から6.5kVの電荷を印加させ、通電した回数を製品
フィルム1000m2あたりに換算して求める。
(2) Number of fine pinholes (50 μm or more) contained in the product film roll Poff [pieces / 1000 m 2 ] The lower part of the film is brought into contact with the metal roll, and a charge of 6.5 kV is applied from the upper part of the film. obtained by converting the number of energized per product film 1000 m 2.

【0030】実施例1 N-メチル-2-ピロリドン(NMP)に芳香族ジアミン成分とし
て85モル%に相当する2-クロルパラフェニレンジアミン
と、15モル%に相当する4,4-ジアミノジフェニルエーテ
ルとを溶解させ、これに99モル%に相当する2-クロルテ
レフタル酸クロリドを添加し、重合前に45nm径のコロイ
ダルシリカを、ポリマ当たり0.2wt%になるように添加
して、2時間撹拌して重合を完了した。これを水酸化リ
チウムで中和して、ポリマ濃度10wt%、固有粘度2.6、
溶液粘度3500ポイズ(30℃)の芳香族ポリアミド溶液を得
た。
Example 1 N-methyl-2-pyrrolidone (NMP) was mixed with 2-chloroparaphenylenediamine corresponding to 85 mol% as an aromatic diamine component and 4,4-diaminodiphenyl ether corresponding to 15 mol%. Dissolve, add 99% by mole of 2-chloroterephthalic acid chloride, add colloidal silica with a diameter of 45 nm to 0.2 wt% per polymer before polymerization, and stir for 2 hours to polymerize. Completed. This is neutralized with lithium hydroxide, polymer concentration 10 wt%, intrinsic viscosity 2.6,
An aromatic polyamide solution having a solution viscosity of 3500 poise (30 ° C.) was obtained.

【0031】このポリマ溶液を1μmカットのフィルタ
ーを通した後、ステンレス製のエンドレスベルト上にキ
ャストし、その後流延直後から排気口までの領域Lが50c
mとなるような工程を、雰囲気温度Tatmを50℃、溶媒
の排気口の温度をTexを65℃となるように設定した。
また、NMP蒸発量の総排気量に対する比ηを0.09vol%と
した。
After passing the polymer solution through a 1 μm-cut filter, the polymer solution was cast on an endless belt made of stainless steel.
The process for obtaining the temperature m was set such that the ambient temperature Tatm was 50 ° C. and the temperature of the solvent exhaust port was Tex 65 ° C.
The ratio η of the NMP evaporation amount to the total exhaust amount was set to 0.09 vol%.

【0032】このベルト上でポリマ溶液を140℃の熱風
で2分間加熱して溶媒を蒸発させ、自己保持性を有する
フィルムをベルトから連続的に剥離した。次に50℃の水
槽内へフィルムを導入して残存溶媒と中和で生じた無機
塩などを抽出した。さらに245℃のテンタ−で30秒間水
分の乾燥と熱処理、ならびにリラックスを行って厚さ3.
6μmの芳香族ポリアミドフィルムを得た。この間にフ
ィルム長手方向と幅方向に各々1.15倍、1.45倍延伸を行
い、テンター内のフィルム最大幅に対するテンター出口
幅の比を0.98とした。尚フィルムの製膜は非常に安定し
ていた。
On this belt, the polymer solution was heated with hot air at 140 ° C. for 2 minutes to evaporate the solvent, and the film having self-holding property was continuously peeled off from the belt. Next, the film was introduced into a water bath at 50 ° C. to extract the residual solvent and the inorganic salts generated by the neutralization. Further, the moisture is dried and heat-treated for 30 seconds in a tenter at 245 ° C., and the thickness is reduced to 3.
A 6 μm aromatic polyamide film was obtained. During this time, the film was stretched 1.15 times and 1.45 times in the longitudinal direction and the width direction, respectively, and the ratio of the exit width of the tenter to the maximum width of the film in the tenter was set to 0.98. The film formation was very stable.

【0033】実施例2 実施例1と同一のポリマ溶液を1μmカットのフィルタ
ーを通した後、ステンレス製のエンドレスベルト上にキ
ャストし、その後流延直後から排気口の領域Lが50cmと
なるような工程を、雰囲気温度Tatmを33℃、溶媒の排
気口の温度Texを42℃とした。また、NMP蒸発量の総排気
量に対する比ηを0.09vol%とした。この後の工程は、実
施例1と同様である。
Example 2 The same polymer solution as in Example 1 was passed through a 1 μm-cut filter, cast on a stainless steel endless belt, and immediately after casting, the area L of the exhaust port became 50 cm. In the process, the ambient temperature Tatm was 33 ° C., and the temperature Tex of the solvent exhaust port was 42 ° C. The ratio η of the NMP evaporation amount to the total exhaust amount was set to 0.09 vol%. The subsequent steps are the same as in the first embodiment.

【0034】比較例1 実施例1、2と同一のポリマ溶液を1μmカットのフィ
ルターを通した後、ステンレス製のエンドレスベルト上
にキャストし、その後流延直後から排気口の領域Lが50c
mとなるような工程を、雰囲気温度Tatmを70℃、溶媒の
排気口の温度Texを65℃とした。また、NMP蒸発量の総排
気量に対する比ηを0.09vol%とした。この後の工程は、
実施例1、2と同様である。
Comparative Example 1 The same polymer solution as in Examples 1 and 2 was passed through a 1 μm-cut filter, and then cast on an endless belt made of stainless steel.
In the process for obtaining the temperature m, the ambient temperature Tatm was set to 70 ° C., and the temperature Tex of the solvent exhaust port was set to 65 ° C. The ratio η of the NMP evaporation amount to the total exhaust amount was set to 0.09 vol%. The subsequent steps are:
This is similar to the first and second embodiments.

【0035】比較例2 実施例1、2と同一のポリマ溶液を1μmカットのフィ
ルターを通した後、ステンレス製のエンドレスベルト上
にキャストし、その後流延直後から排気口の領域Lが5cm
となるような工程を、雰囲気温度Tatmを33℃、溶媒の排
気口の温度Texを42℃とした。また、NMP蒸発量の総排気
量に対する比ηを0.09vol%とした。この後の工程は、実
施例1、2と同様である。
Comparative Example 2 The same polymer solution as in Examples 1 and 2 was passed through a 1 μm-cut filter, cast on an endless belt made of stainless steel, and immediately after casting, the area L of the exhaust port was 5 cm.
The ambient temperature Tatm was set to 33 ° C., and the temperature Tex of the solvent exhaust port was set to 42 ° C. The ratio η of the NMP evaporation amount to the total exhaust amount was set to 0.09 vol%. Subsequent steps are the same as in Examples 1 and 2.

【0036】比較例3 実施例1、2と同一のポリマ溶液を1μmカットのフィ
ルターを通した後、ステンレス製のエンドレスベルト上
にキャストし、その後流延直後から排気口の領域Lが50c
mとなるような工程を、雰囲気温度Tatmを33℃、溶媒の
排気口の温度Texを140℃とした。また、NMP蒸発量の総
排気量に対する比ηを0.09vol%とした。この後の工程
は、実施例1、2と同様である。
Comparative Example 3 The same polymer solution as in Examples 1 and 2 was passed through a 1 μm-cut filter, and then cast on an endless belt made of stainless steel.
In the process for obtaining the temperature m, the ambient temperature Tatm was set to 33 ° C., and the temperature Tex of the solvent exhaust port was set to 140 ° C. The ratio η of the NMP evaporation amount to the total exhaust amount was set to 0.09 vol%. Subsequent steps are the same as in Examples 1 and 2.

【0037】[0037]

【表1】 [Table 1]

【0038】[0038]

【発明の効果】以上説明したように、本発明に係るピン
ホール発生頻度の低い溶液製膜フィルムおよびその製造
方法によれば、フィルムの表面に溶液製膜固有の問題で
あるピンホールがほとんど存在しないようにすることが
できるため、本発明により製造されたフィルムを用いた
記録磁気媒体を製造する際に発生するロール汚れが抑制
され、更に品質安定化による歩留まり向上が期待でき
る。
As described above, according to the solution casting film having a low frequency of pinhole generation and the method for producing the same according to the present invention, the pinhole which is a problem inherent to the solution casting almost does not exist on the surface of the film. As a result, it is possible to suppress roll contamination that occurs when a recording magnetic medium using the film manufactured according to the present invention is manufactured, and to expect an improvement in yield by stabilizing quality.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) B29L 7:00 B29L 7:00 C08L 77:00 C08L 77:00 Fターム(参考) 4F071 AA56 AH14 BB02 BC01 BC12 BC13 4F205 AA29 AG01 AR06 AR12 GA07 GB02 GF01 GF24 GN19 GN24 GW31 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) B29L 7:00 B29L 7:00 C08L 77:00 C08L 77:00 F term (Reference) 4F071 AA56 AH14 BB02 BC01 BC12 BC13 4F205 AA29 AG01 AR06 AR12 GA07 GB02 GF01 GF24 GN19 GN24 GW31

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 電子マイクロ厚さ計で測定した製品フィ
ルム厚みが5μm以下であり、製品フィルム中の100μm
以上のピンホール数が1000m2あたりに1個以下であるこ
とを特徴とするピンホール発生頻度の低い溶液製膜フィ
ルム。
1. The product film thickness measured by an electronic micro thickness gauge is 5 μm or less, and 100 μm
A solution casting film having a low frequency of occurrence of pinholes, wherein the number of the above pinholes is one or less per 1000 m 2 .
【請求項2】 溶液製膜フィルムが芳香族ポリアミドフ
ィルムである、請求項1の溶液製膜フィルム。
2. The solution cast film according to claim 1, wherein the solution cast film is an aromatic polyamide film.
【請求項3】 ポリマ溶液を支持体上に流延してフィル
ムに成形した後、湿式工程にフィルムを導入しフィルム
を搬送する工程において、ポリマ溶液の溶媒と接触する
雰囲気の温度Tatmと溶媒の排気口の温度Texとが、 Tex-100≦Tatm≦Tex-1 [℃] の関係を満たす流延直後から排気口までの領域Lが、 10≦L≦1000 [cm] 存在することを特徴とする、溶液製膜フィルムの製造方
法。
3. After casting the polymer solution on a support to form a film, in the step of introducing the film into the wet process and transporting the film, the temperature of the atmosphere in contact with the solvent of the polymer solution and the temperature of the solvent are reduced. It is characterized in that a region L from immediately after casting to the exhaust port satisfies the relationship of Tex-100 ≦ Tatm ≦ Tex-1 [° C.] with the exhaust port temperature Tex, and 10 ≦ L ≦ 1000 [cm]. A method for producing a solution casting film.
【請求項4】 溶液製膜フィルムが芳香族ポリアミドフ
ィルムである、請求項3に記載の溶液製膜フィルムの製
造方法。
4. The method for producing a solution cast film according to claim 3, wherein the solution cast film is an aromatic polyamide film.
JP2001015473A 2001-01-24 2001-01-24 Method for producing solution-forming film Expired - Lifetime JP4632109B2 (en)

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Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02239914A (en) * 1989-03-14 1990-09-21 Kanegafuchi Chem Ind Co Ltd Continuous manufacture of resin film and its device and equipment
JPH05305642A (en) * 1992-04-28 1993-11-19 Kuraray Co Ltd Manufacture of polyvinyl alcohol-based polymer film and device thereof
JPH0957772A (en) * 1995-08-29 1997-03-04 Toray Ind Inc Manufacture of film
JPH115226A (en) * 1997-06-17 1999-01-12 Fuji Photo Film Co Ltd Method for drying molding containing combustible solvent and manufacture of polymer film
JPH1158425A (en) * 1997-08-27 1999-03-02 Fuji Photo Film Co Ltd Method and apparatus for making cast film
JPH11254469A (en) * 1998-03-13 1999-09-21 Toray Ind Inc Manufacture of solution membrane film
JP2000085007A (en) * 1998-09-10 2000-03-28 Du Pont Toray Co Ltd Biaxially oriented polyimide film and its production
JP2000191806A (en) * 1998-12-24 2000-07-11 Kanegafuchi Chem Ind Co Ltd Manufacturing method for polyimide film and manufacturing equipment
JP2000233439A (en) * 1999-02-17 2000-08-29 Toray Ind Inc Production of heat resistant resin film
JP2001113545A (en) * 1999-10-22 2001-04-24 Fuji Photo Film Co Ltd Method of manufacturing cellulose ester film

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02239914A (en) * 1989-03-14 1990-09-21 Kanegafuchi Chem Ind Co Ltd Continuous manufacture of resin film and its device and equipment
JPH05305642A (en) * 1992-04-28 1993-11-19 Kuraray Co Ltd Manufacture of polyvinyl alcohol-based polymer film and device thereof
JPH0957772A (en) * 1995-08-29 1997-03-04 Toray Ind Inc Manufacture of film
JPH115226A (en) * 1997-06-17 1999-01-12 Fuji Photo Film Co Ltd Method for drying molding containing combustible solvent and manufacture of polymer film
JPH1158425A (en) * 1997-08-27 1999-03-02 Fuji Photo Film Co Ltd Method and apparatus for making cast film
JPH11254469A (en) * 1998-03-13 1999-09-21 Toray Ind Inc Manufacture of solution membrane film
JP2000085007A (en) * 1998-09-10 2000-03-28 Du Pont Toray Co Ltd Biaxially oriented polyimide film and its production
JP2000191806A (en) * 1998-12-24 2000-07-11 Kanegafuchi Chem Ind Co Ltd Manufacturing method for polyimide film and manufacturing equipment
JP2000233439A (en) * 1999-02-17 2000-08-29 Toray Ind Inc Production of heat resistant resin film
JP2001113545A (en) * 1999-10-22 2001-04-24 Fuji Photo Film Co Ltd Method of manufacturing cellulose ester film

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