JP2002195758A - Melting apparatus - Google Patents

Melting apparatus

Info

Publication number
JP2002195758A
JP2002195758A JP2000396713A JP2000396713A JP2002195758A JP 2002195758 A JP2002195758 A JP 2002195758A JP 2000396713 A JP2000396713 A JP 2000396713A JP 2000396713 A JP2000396713 A JP 2000396713A JP 2002195758 A JP2002195758 A JP 2002195758A
Authority
JP
Japan
Prior art keywords
crucible
heater
melting apparatus
mold
melting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000396713A
Other languages
Japanese (ja)
Inventor
Yoshiaki Yumoto
芳明 湯本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2000396713A priority Critical patent/JP2002195758A/en
Publication of JP2002195758A publication Critical patent/JP2002195758A/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/25Process efficiency

Abstract

PROBLEM TO BE SOLVED: To solve the problem that conventionally when there is used a melting apparatus of the type where a stock material put in a crucible in a vacuum container is heated and melted with heating means into a molten solution, and then the crucible is inclined and cast iron is poured into a mold, resistance heating type heater is difficult to use as the heating means so that an expensive induction heating type heating means has had to be used. SOLUTION: A melting apparatus is provided, in which a stock material put in a crucible in a vacuum container is heated and melted with heating means into a molten solution, and then the crucible is inclined to pour cast iron into a mold. In the melting apparatus, a heat-insulating material is provided on the side surface of the crucible, and a resistance heating heater is provided at an upper portion and a lower portion of the crucible, and further, the crucible is inclined toward the mold, independently of the foregoing resistance-heating type heater.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は溶解装置に関し、特
にシリコンなどの半導体材料を鋳造するための鋳造装置
などに用いられる溶解装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a melting apparatus, and more particularly to a melting apparatus used for a casting apparatus for casting a semiconductor material such as silicon.

【0002】[0002]

【従来の技術】従来、真空容器内のるつぼに入れたシリ
コンなどの原料を加熱手段で加熱して溶解し、原料が融
液になった後に、るつぼを傾けて鋳型内に注湯する方式
の鋳造装置としては、図4に示すようなものがあった。
図4において、21は鋳造室、22はシリコンなどの半
導体材料(不図示)を加熱して溶解させるための誘導加
熱式の溶解装置、23は溶解した半導体材料を凝固させ
るための鋳型である。
2. Description of the Related Art Conventionally, a raw material such as silicon put in a crucible in a vacuum vessel is heated and melted by a heating means, and after the raw material turns into a melt, the crucible is tilted and poured into a mold. As the casting apparatus, there was one as shown in FIG.
In FIG. 4, reference numeral 21 denotes a casting chamber, 22 denotes an induction heating type melting apparatus for heating and melting a semiconductor material (not shown) such as silicon, and 23 denotes a mold for solidifying the melted semiconductor material.

【0003】鋳造室21内は半導体材料が酸化しないよ
うに真空に排気した後にアルゴンガス等の不活性ガスを
導入した雰囲気に保たれる。この鋳造室21内に溶解装
置22と鋳型23とを設け、この溶解装置22に、この
溶解装置22を所定角度まで傾動させて注湯できるよう
にするための傾動機構(不図示)を設けると共に、鋳型
23を注湯位置から凝固状態を制御するためのヒータ2
4が設けられた位置まで搬送するための搬送機構25を
設け、鋳型23が鋳造室21内で上下動および水平移動
できるようにしたものである。
The interior of the casting chamber 21 is kept in an atmosphere in which an inert gas such as an argon gas is introduced after evacuation is performed so that the semiconductor material is not oxidized. A melting device 22 and a mold 23 are provided in the casting chamber 21. The melting device 22 is provided with a tilting mechanism (not shown) for tilting the melting device 22 to a predetermined angle so that the molten metal can be poured. , Heater 2 for controlling the solidification state of mold 23 from the pouring position
A transport mechanism 25 for transporting the mold 4 to the position where the mold 4 is provided is provided so that the mold 23 can move up and down and horizontally in the casting chamber 21.

【0004】この鋳造装置では、鋳造室21内を不活性
ガス雰囲気に維持して溶解装置22内に投入された原料
を溶解装置22内で加熱して溶解した後に、この溶解装
置22を所定角度に傾斜させて、鋳型23内に注湯し
て、凝固状態を制御するためのヒータ24が設けられた
凝固位置へ搬送して凝固させていた。
In this casting apparatus, the raw material charged into the melting apparatus 22 is heated and melted in the melting apparatus 22 while maintaining the interior of the casting chamber 21 in an inert gas atmosphere. And poured into the casting mold 23, conveyed to a solidification position where a heater 24 for controlling the solidification state was provided, and solidified.

【0005】また、傾動式の溶解装置ではないが、シリ
コンの溶解装置として最も一般的なシリコン単結晶引き
上げ装置では、図5に示すように、黒鉛からなる抵抗加
熱式ヒータ31が加熱手段として用いられている。この
抵抗加熱式ヒータ31は円筒形状でるつぼの周囲に設置
されている。なお、図5中、32は石英るつぼ、33は
黒鉛るつぼ、34は種結晶、35は引き上げシャフト、
36は吸引口である。
[0005] Although not a tilting type melting apparatus, in a silicon single crystal pulling apparatus which is the most common as a silicon melting apparatus, as shown in FIG. 5, a resistance heating type heater 31 made of graphite is used as a heating means. Have been. The resistance heater 31 is provided around a crucible having a cylindrical shape. In FIG. 5, 32 is a quartz crucible, 33 is a graphite crucible, 34 is a seed crystal, 35 is a lifting shaft,
36 is a suction port.

【0006】[0006]

【発明が解決しようとする課題】ところが、図5に示す
ような抵抗加熱式ヒータ31を用いた溶解装置を図4に
示すような傾動式の溶解装置にしようとすると構造が複
雑になり、また、真空容器も大きなものが必要になる。
そのため、溶解装置を傾動式とする場合、従来は、加熱
手段には誘導加熱式のものが用いられていた。
However, if a melting apparatus using a resistance heater 31 as shown in FIG. 5 is replaced with a tilting melting apparatus as shown in FIG. 4, the structure becomes complicated, and In addition, a large vacuum container is required.
Therefore, when the melting apparatus is of a tilting type, an induction heating type has conventionally been used as a heating means.

【0007】ところが、誘導加熱式の加熱手段は抵抗加
熱式の加熱手段に比べて電源装置が非常に高価であると
いう問題がある。
However, the induction heating type heating means has a problem in that the power supply device is much more expensive than the resistance heating type heating means.

【0008】また、誘導加熱式の溶解装置において、シ
リコンのように電気抵抗が大きくて直接誘導加熱するこ
とが困難な原料を溶解する場合、黒鉛るつぼを誘導加熱
してその熱でシリコンなどの材料を加熱するが、黒鉛る
つぼはシリコンと反応するために、その内側に石英るつ
ぼを入れて、この石英るつぼ内で溶解する。ところが、
注湯して空になったるつぼを冷却するときに、石英と黒
鉛の熱膨張率の違いによってるつぼに熱応力が働いてる
つぼが割れるという問題がある。
[0008] In addition, in a melting apparatus of the induction heating type, when a raw material such as silicon which has a large electric resistance and is difficult to directly inductively heat is melted, a graphite crucible is induction-heated and the heat such as silicon is used. The graphite crucible reacts with silicon, so that a quartz crucible is put inside the graphite crucible and melted in the quartz crucible. However,
When a crucible that has been emptied by pouring is cooled, there is a problem that the crucible subjected to thermal stress is broken due to the difference in thermal expansion coefficient between quartz and graphite.

【0009】そこで、黒鉛るつぼを分割して熱膨張率の
違いによる熱応力を吸収することも考えられるが、黒鉛
るつぼが分割されていると、分割面でアーク放電が発生
して黒鉛るつぼが消耗してしまうという問題が発生す
る。したがって、誘導加熱式の溶解装置では、分割した
黒鉛るつぼを使用できないという問題がある。
Therefore, it is conceivable that the graphite crucible may be divided to absorb the thermal stress due to the difference in the coefficient of thermal expansion. However, if the graphite crucible is divided, an arc discharge occurs on the divided surface and the graphite crucible is consumed. Problem occurs. Therefore, there is a problem that the divided graphite crucible cannot be used in the induction heating type melting apparatus.

【0010】本発明は、このような従来装置の問題点に
艦みてなされたものであり、抵抗加熱式のヒータを用い
た溶解装置を傾動式にしようとすると構造が複雑になる
とともに、誘導加熱式のヒータを用いた溶解装置では、
黒鉛るつぼを分割式にできなという従来装置の問題点を
解消した溶解装置を提供することを目的とする。
The present invention has been made in view of the above-mentioned problems of the conventional apparatus. If the melting apparatus using the resistance heating type heater is made to be a tilting type, the structure becomes complicated and the induction heating is performed. In the melting device using the heater of the formula,
It is an object of the present invention to provide a melting apparatus which solves the problem of the conventional apparatus that a graphite crucible cannot be divided.

【0011】[0011]

【課題を解決するための手段】上記目的を達成するため
に、請求項1に係る溶解装置では、真空容器内のるつぼ
に入れた原料を加熱手段で加熱して溶解し、この原料が
融液になった後に、前記るつぼを傾けて鋳型に注湯する
溶解装置において、前記るつぼの側面に断熱材を設ける
と共に、このるつぼの上部と下部に抵抗加熱式ヒータを
設け、このるつぼが前記鋳型に向かって前記抵抗加熱式
ヒータとは別個に傾くことを特徴とする。
In order to achieve the above object, in the melting apparatus according to the first aspect, a raw material put in a crucible in a vacuum vessel is heated and melted by heating means, and the raw material is melted. After that, in a melting apparatus in which the crucible is tilted and poured into a mold, a heat insulating material is provided on the side surface of the crucible, and a resistance heating heater is provided on the upper and lower parts of the crucible, and the crucible is provided on the mold. It is characterized in that it is inclined separately from the resistance heater.

【0012】また、上記溶解装置では、前記るつぼの上
方側部に位置する水平な回転軸を中心にして前記上部ヒ
ータが回転することによって、前記るつぼの傾く領域が
確保されることが望ましい。
In the above melting apparatus, it is preferable that the upper heater is rotated about a horizontal rotation axis located on the upper side of the crucible to secure an inclined region of the crucible.

【0013】また、上記溶解装置では、前記るつぼの下
部の抵抗加熱式ヒータの位置が維持されたままで、前記
るつぼが傾くことが望ましい。
In the above melting apparatus, it is desirable that the crucible be tilted while the position of the resistance heating type heater below the crucible is maintained.

【0014】さらに、上記溶解装置では、前記るつぼが
石英からなる内るつぼと黒鉛からなる外るつぼで構成さ
れ、この外るつぼが縦方向に分割されたるつぼであるこ
とが望ましい。
Further, in the melting apparatus described above, it is preferable that the crucible is composed of an inner crucible made of quartz and an outer crucible made of graphite, and the outer crucible is a crucible divided in a vertical direction.

【0015】[0015]

【発明の実施の形態】以下、本発明を添付図面に基づき
詳細に説明する。図1は、本発明に係る溶解装置の一実
施形態を示す断面図であり、1(1a、1b)はるつ
ぼ、2は上ヒータ、3は下ヒータ、4はるつぼ側面の断
熱材、5は上ヒータの断熱材、6は下ヒータの断熱材、
7はるつぼの傾動軸である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a cross-sectional view showing one embodiment of a melting apparatus according to the present invention, wherein 1 (1a, 1b) is a crucible, 2 is an upper heater, 3 is a lower heater, 4 is a heat insulator on the side of the crucible, and 5 is Heat insulator for upper heater, 6 for lower heater,
7 is a tilting axis of the crucible.

【0016】これらは、すべて真空容器内に収められて
いる。材料が酸化しないように、容器内を真空に保つ
か、容器内を排気した後に、アルゴンガス等の不活性ガ
ス雰囲気に保つ。
These are all housed in a vacuum container. In order to prevent the material from being oxidized, the inside of the container is kept in a vacuum or the inside of the container is evacuated and then kept in an inert gas atmosphere such as argon gas.

【0017】るつぼ1はシリコンなどの半導体材料を加
熱溶解して融液を鋳型(不図示)に注湯するものであ
り、内側に設けられた石英るつぼ1aと外側に設けられ
た黒鉛るつぼ1bから成る。なお、石英るつぼ1aで溶
解されて鋳型に注湯されて凝固したシリコン材料は、例
えば太陽電池用シリコン基板などに用いられる。石英る
つぼ1aは、投入されたシリコンなどの半導体材料を溶
解するものであり、耐火強度と半導体材料中に不純物が
混入しないことを考慮して、材質は一般的に石英になっ
ている。石英るつぼ1aは高温になると軟化して形を保
てないため、黒鉛るつぼ1bにより石英るつぼ1aを保
持する。るつぼ1の大きさは溶解する半導体材料の量な
どによって決められる。
The crucible 1 heats and melts a semiconductor material such as silicon and pours a melt into a mold (not shown). The crucible 1 includes a quartz crucible 1a provided inside and a graphite crucible 1b provided outside. Become. The silicon material melted in the quartz crucible 1a, poured into a mold, and solidified is used, for example, for a silicon substrate for a solar cell. The quartz crucible 1a dissolves a semiconductor material such as silicon that has been put into it, and is generally made of quartz in consideration of fire resistance and that no impurities are mixed into the semiconductor material. Since the quartz crucible 1a is softened at a high temperature and cannot keep its shape, the quartz crucible 1b is held by the graphite crucible 1b. The size of the crucible 1 is determined by the amount of the semiconductor material to be dissolved and the like.

【0018】るつぼ1の上には上ヒータ2が設けられて
いるとともに、るつぼ1の下には下ヒータ3が設けられ
ている。これらヒータ2、3は電流によって発生するジ
ュール熱で加熱される抵抗加熱式ヒータである。これら
ヒータ2、3でるつぼ1の中に充填したシリコンなどの
半導体材料を加熱溶解する。上ヒータ2と下ヒータ3は
直列又は並列に接続して一電源で加熱してもよいし、そ
れぞれのヒータ2、3を独立した電源で別々に加熱して
もよい。ヒータ2、3は、上ヒータ2のみを設置するこ
とも可能であり、また下ヒータ3のみを設置することも
可能である。但し、上と下の両方にヒータ2、3を設置
した方が熱効率の点で有利となる。
An upper heater 2 is provided on the crucible 1, and a lower heater 3 is provided below the crucible 1. These heaters 2 and 3 are resistance heating type heaters heated by Joule heat generated by an electric current. Semiconductor materials such as silicon filled in the crucible 1 are heated and melted by the heaters 2 and 3. The upper heater 2 and the lower heater 3 may be connected in series or in parallel and may be heated by one power supply, or the respective heaters 2 and 3 may be separately heated by independent power supplies. As for the heaters 2 and 3, only the upper heater 2 can be provided, or only the lower heater 3 can be provided. However, installing the heaters 2 and 3 on both the upper and lower sides is advantageous in terms of thermal efficiency.

【0019】上ヒータ2とその周囲の断熱材5は、図2
に示すように、回転してるつぼ1の横に移動する構造に
する。るつぼ1を傾ける際には、その前に上ヒータ2及
び上ヒータの断熱材5を図2に示すように回動して上方
に移動させる。このように上ヒータ2及び上ヒータの断
熱材5を回動して上方に移動にさせる場合に限らず、水
平方向に回転させたり、水平方向に直線的に移動させて
もよい。但し、図2に示すような移動方式は、できるだ
け小さな真空容器内に溶解装置を収めようとする場合に
有利となる。
The upper heater 2 and the surrounding heat insulating material 5 are shown in FIG.
As shown in (1), it is structured to rotate and move to the side of the crucible 1. Before tilting the crucible 1, the upper heater 2 and the heat insulating material 5 of the upper heater are rotated and moved upward as shown in FIG. Thus, the present invention is not limited to the case where the upper heater 2 and the heat insulating material 5 of the upper heater are rotated to move upward, but may be rotated in the horizontal direction or linearly moved in the horizontal direction. However, the moving method as shown in FIG. 2 is advantageous when the melting apparatus is to be housed in a vacuum vessel as small as possible.

【0020】るつぼ1の上部に原料の追加装入機構を設
ければ、溶解の途中で原料を追加装入することが可能に
なる。この場合、原料をるつぼ1内に追加装入するとき
には、注湯のときと同様に、上ヒータ2及び上ヒータの
断熱材5を図2に示すように移動させて行う。
If an additional raw material charging mechanism is provided on the upper part of the crucible 1, it becomes possible to additionally charge the raw material during melting. In this case, when the raw material is additionally charged into the crucible 1, the upper heater 2 and the heat insulator 5 of the upper heater are moved as shown in FIG.

【0021】るつぼ1の周囲には、るつぼ1の側面から
熱が逃げるのを防ぐためのるつぼ1の側面の断熱材4が
設けられている。るつぼ1の側面の断熱材4はるつぼ1
を支持した状態でるつぼ1の傾動の回転軸7を中心にし
て回転するようになっている。回転軸7を図1および図
3に示すように、注湯する鋳型(不図示)に近い位置に
すると、るつぼ1の側面の断熱材4は、鋳型側に注湯完
了の状態まで傾けても、下ヒータ3や下ヒータの断熱材
6に当たることがない。従って、るつぼ1の傾動の回転
軸7をこのような位置にすることにより、下ヒータ3を
移動させる必要がなくなり、下ヒータ3は固定式でよい
ことになる。るつぼ1の中のシリコンなどの半導体材料
がすべて溶解したら、るつぼ1の側面の断熱材4をるつ
ぼ1を支持した状態でるつぼ1の傾動の回転軸7を中心
にして傾けて、るつぼ1内の融液を鋳型(不図示)に注
湯する。るつぼ1の側面の断熱材4を傾けたときの状態
を図3に示す。
Around the crucible 1, a heat insulating material 4 on the side of the crucible 1 for preventing heat from escaping from the side of the crucible 1 is provided. The heat insulating material 4 on the side of the crucible 1 is the crucible 1
Are supported, and the crucible 1 is rotated about a rotation axis 7 for tilting. As shown in FIGS. 1 and 3, when the rotating shaft 7 is located near a casting mold (not shown), the heat insulating material 4 on the side of the crucible 1 is inclined toward the casting mold until the casting is completed. The lower heater 3 and the heat insulator 6 of the lower heater. Therefore, by setting the rotation axis 7 of the crucible 1 to such a position, it is not necessary to move the lower heater 3, and the lower heater 3 may be of a fixed type. When all of the semiconductor material such as silicon in the crucible 1 is melted, the heat insulating material 4 on the side of the crucible 1 is tilted about the rotation axis 7 of the crucible 1 with the crucible 1 supported, and the crucible 1 The melt is poured into a mold (not shown). FIG. 3 shows a state in which the heat insulating material 4 on the side surface of the crucible 1 is tilted.

【0022】また、黒鉛るつぼ1bは図1の縦方向に2
分割されている。黒鉛るつぼ1bが一体型であると、注
湯して空になったるつぼ1を冷却するときに、石英と黒
鉛の熱膨張率の違いによってるつぼ1に熱応力が働き、
るつぼ1が割れてしまう。黒鉛るつぼ1bを2分割構造
にすることで、冷却の際のるつぼ1の破損を防ぐことが
できる。
Further, the graphite crucible 1b is arranged in the vertical direction in FIG.
Has been split. If the graphite crucible 1b is of an integral type, when the crucible 1 is cooled by pouring, thermal stress acts on the crucible 1 due to the difference in the coefficient of thermal expansion between quartz and graphite.
Crucible 1 breaks. By forming the graphite crucible 1b into a two-part structure, damage to the crucible 1 during cooling can be prevented.

【0023】溶解装置を上記の構造にすることにより、
抵抗加熱式ヒータを加熱手段に用いた溶解装置でありな
がら、単純な構造で、且つ、誘導加熱式の加熱手段を用
いた溶解装置と同等のスペースに設置できるようにな
る。
By making the melting apparatus have the above structure,
Although it is a melting device using a resistance heating type heater as a heating means, it can be installed with a simple structure and in the same space as a melting device using an induction heating type heating means.

【0024】シリコンの溶解装置としては、図5に示す
シリコン単結晶引き上げ装置のように、るつぼ1の周囲
に円筒形の抵抗加熱式ヒータを設置した構造のものが用
いられていた。この構造では傾動式とするのが難しく、
できたとしても本発明と比較するとかなり大きな装置に
なることは明らかである。
As a dissolving apparatus for silicon, one having a structure in which a cylindrical resistance heating type heater is installed around a crucible 1 like a silicon single crystal pulling apparatus shown in FIG. 5 has been used. With this structure it is difficult to make it tiltable,
Obviously, even if it could be done, it would be a fairly large device when compared to the present invention.

【0025】また、本発明の装置の場合、断熱材の内側
の表面積がシリコン単結晶引き上げ装置のような溶解装
置と比較して小さくなるので、熱が逃げ難く、熱効率を
向上させ易くなる。さらに、本発明の装置の場合、大き
な円筒形のヒータを必要とせず、比較的小さな平板状の
ヒータで済むため、ヒータのコストも小さくできる。
Further, in the case of the apparatus of the present invention, since the surface area inside the heat insulating material is smaller than that of a melting apparatus such as a silicon single crystal pulling apparatus, heat does not easily escape, and thermal efficiency is easily improved. Further, in the case of the apparatus of the present invention, a relatively small flat heater is sufficient without requiring a large cylindrical heater, so that the cost of the heater can be reduced.

【0026】さらに、誘導加熱式の場合、溶解中に誘導
コイルを流れる冷却水が停止するとるつぼ1や融液の熱
で誘導コイルが破損する可能性がある。誘導コイルが破
損すると漏れ出した冷却水で水蒸気爆発を起こす危険性
がある。このため、誘導加熱式の溶解炉の場合は、非常
用の冷却水設備を設置することが一般的である。これに
対し、本発明の抵抗加熱式の場合は、水冷式の誘導コイ
ルを使用しないので、水蒸気爆発の危険がなく、安全性
が高い。
Furthermore, in the case of the induction heating type, if the cooling water flowing through the induction coil is stopped during melting, the induction coil may be damaged by the heat of the crucible 1 or the melt. If the induction coil is damaged, there is a danger of steam explosion caused by leaking cooling water. For this reason, in the case of the induction heating type melting furnace, it is common to install an emergency cooling water facility. On the other hand, in the case of the resistance heating type of the present invention, since a water-cooled induction coil is not used, there is no danger of steam explosion and the safety is high.

【0027】[0027]

【発明の効果】以上のように、本発明に係る溶解装置に
よれば、真空容器内のるつぼに入れた原料を加熱手段で
加熱して溶解し、この原料が融液になった後に、前記る
つぼを傾けて鋳型に注湯する溶解装置において、前記る
つぼの側面に断熱材を設けると共に、このるつぼの上部
と下部に抵抗加熱式ヒータを設け、このるつぼが前記鋳
型に向かって前記抵抗加熱式ヒータとは別個に傾くこと
から、抵抗加熱式ヒータを加熱手段に用いた溶解装置で
ありながら、単純な構造で、且つ、誘導加熱式の加熱手
段を用いた溶解装置と同等のスペースに設置できるよう
になり、傾動注湯式の溶解装置においても、高価な誘導
加熱式の加熱手段を用いる必要がなくなる。
As described above, according to the melting apparatus of the present invention, the raw material put in the crucible in the vacuum vessel is heated and melted by the heating means. In a melting apparatus in which a crucible is tilted and poured into a mold, a heat insulating material is provided on the side of the crucible, and a resistance heating type heater is provided on an upper portion and a lower portion of the crucible, and the crucible faces the mold with the resistance heating type. Since it is tilted separately from the heater, it is a melting apparatus using a resistance heating type heater as a heating means, but it can be installed in a space with a simple structure and equivalent to a melting apparatus using an induction heating type heating means. As a result, it is not necessary to use expensive induction heating type heating means even in the tilting pouring type melting apparatus.

【0028】また、抵抗加熱式ヒータを加熱手段に用い
ることで、分割式の黒鉛るつぼ1bが使えるようになる
ことから、冷却のときの熱応力によるるつぼの破損を容
易に防ぐことができるようになる。
Further, by using the resistance heating type heater as the heating means, the divided type graphite crucible 1b can be used, so that the crucible can be easily prevented from being damaged by thermal stress during cooling. Become.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る溶解装置の一実施形態を示す図で
ある。
FIG. 1 is a view showing one embodiment of a melting apparatus according to the present invention.

【図2】本発明に係る溶解装置において上ヒータ及び上
ヒータの断熱材を移動させた状態を示す図である。
FIG. 2 is a view showing a state in which an upper heater and a heat insulating material of the upper heater are moved in the melting apparatus according to the present invention.

【図3】本発明に係る溶解装置においてるつぼ及びるつ
ぼ側面の断熱材を傾けた状態を示す図である。
FIG. 3 is a view showing a state in which a crucible and a heat insulator on the side of the crucible are inclined in the melting apparatus according to the present invention.

【図4】従来の溶解装置を用いた鋳造装置を示す図であ
る。
FIG. 4 is a view showing a casting apparatus using a conventional melting apparatus.

【図5】従来の別の溶解装置を示す図である。FIG. 5 is a view showing another conventional melting apparatus.

【符号の説明】[Explanation of symbols]

1(1a、1b):るつぼ、2:上ヒータ、3:下ヒー
タ、4:るつぼ側面の断熱材、5:上ヒータの断熱材、
6:下ヒータの断熱材、7:るつぼの傾動の回転軸
1 (1a, 1b): crucible, 2: upper heater, 3: lower heater, 4: heat insulator on the side of crucible, 5: heat insulator of upper heater,
6: Insulation material of lower heater, 7: Rotating axis of tilting crucible

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 真空容器内のるつぼに入れた原料を加熱
手段で加熱して溶解し、この原料が融液になった後に、
前記るつぼを傾けて鋳型に注湯する溶解装置において、
前記るつぼの側面に断熱材を設けると共に、このるつぼ
の上部と下部に抵抗加熱式ヒータを設け、このるつぼが
前記抵抗加熱式ヒータとは別個に前記鋳型に向かって傾
くことを特徴とする溶解装置。
1. A raw material put in a crucible in a vacuum vessel is heated and melted by a heating means, and after the raw material turns into a melt,
In a melting apparatus in which the crucible is tilted and poured into a mold,
A melting apparatus, wherein a heat insulating material is provided on a side surface of the crucible, and a resistance heating heater is provided at an upper portion and a lower portion of the crucible, and the crucible is inclined toward the mold separately from the resistance heating heater. .
【請求項2】 前記るつぼの上方側部に位置する水平な
回転軸を中心にして前記上部ヒータが回転することによ
って、前記るつぼが別個に傾く領域が確保されることを
特徴とする請求項1に記載の溶解装置。
2. The crucible according to claim 1, wherein the upper heater is rotated about a horizontal rotation axis located on the upper side of the crucible, so that the crucible is separately tilted. The dissolving apparatus according to claim 1.
【請求項3】 前記るつぼの下部の抵抗加熱式ヒータの
位置が維持されたままで、前記るつぼが別個に傾くこと
を特徴とする請求項1または請求項2に記載の溶解装
置。
3. The melting apparatus according to claim 1, wherein the crucible is separately tilted while the position of the resistance heater below the crucible is maintained.
【請求項4】 前記るつぼが石英からなる内るつぼと黒
鉛からなる外るつぼで構成され、この外るつぼが縦方向
に分割されたるつぼであることを特徴とする請求項1に
記載の溶解装置。
4. The melting apparatus according to claim 1, wherein the crucible is composed of an inner crucible made of quartz and an outer crucible made of graphite, and the outer crucible is a crucible divided in a vertical direction.
JP2000396713A 2000-12-27 2000-12-27 Melting apparatus Pending JP2002195758A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000396713A JP2002195758A (en) 2000-12-27 2000-12-27 Melting apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000396713A JP2002195758A (en) 2000-12-27 2000-12-27 Melting apparatus

Publications (1)

Publication Number Publication Date
JP2002195758A true JP2002195758A (en) 2002-07-10

Family

ID=18861956

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000396713A Pending JP2002195758A (en) 2000-12-27 2000-12-27 Melting apparatus

Country Status (1)

Country Link
JP (1) JP2002195758A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018059178A (en) * 2016-10-07 2018-04-12 太平洋セメント株式会社 Production device of alkali earth metal and production method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018059178A (en) * 2016-10-07 2018-04-12 太平洋セメント株式会社 Production device of alkali earth metal and production method

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