JP2002189019A5 - - Google Patents

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JP2002189019A5
JP2002189019A5 JP2000387308A JP2000387308A JP2002189019A5 JP 2002189019 A5 JP2002189019 A5 JP 2002189019A5 JP 2000387308 A JP2000387308 A JP 2000387308A JP 2000387308 A JP2000387308 A JP 2000387308A JP 2002189019 A5 JP2002189019 A5 JP 2002189019A5
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exhaust gas
distance
monitoring system
measurement
reference space
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JP2000387308A
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JP2002189019A (en
JP3986752B2 (en
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【0046】
更に、プラントの運転・操作が成熟するにつれて、前記“基準空間”と“重要なパラメータ”はカテゴリー化出来るので、効率の良いプラント操作を達成出来る。
尚、上記で用いているマハラノビスの距離を用いる多変量解析の手法については、例えば特開平10−124766号公報や特開2000−46701号公報に開示がある。
[0046]
Furthermore, as the driving-operation of the plant matures, the "reference space" and "critical parameter" Since coming out categories of, efficient plant operation and can be achieved.
The method of multivariate analysis using the Mahalanobis distance used above is disclosed, for example, in Japanese Patent Application Laid-Open Nos. 10-124766 and 2000-46701.

Claims (7)

廃棄物を焼却する焼却炉から排出される排ガスの計測と監視を行う排ガス計測・監視システムであって、
排ガスに含まれる複数の成分を計測する成分検出手段と、前記焼却炉の温度や圧力や流量等のプロセス変量を計測するプロセス変量センサと、前記成分検出手段やプロセス変量センサからの計測値を収集し排ガスの状態を監視する管理機器を備え、
前記管理機器は、前記焼却炉を運転した際に前記成分検出手段やプロセス変量センサから得られる計測値の情報を収集してマハラノビスの距離を求めることにより基準空間を作成し、当該基準空間作成以降の焼却炉の運転において発生する排ガスを前記成分検出手段及びプロセス変量センサからの計測値を基に監視時のマハラノビスの距離を求め、当該監視時のマハラノビスの距離と前記基準空間との距離を算出することを特徴とする排ガス計測・監視システム。
An exhaust gas measurement and monitoring system that measures and monitors the exhaust gas emitted from an incinerator that incinerates waste,
Component detection means for measuring a plurality of components contained in exhaust gas, Process variable sensors for measuring process variables such as temperature, pressure and flow rate of the incinerator, and measurement values collected from the component detection means and the process variable sensors Control equipment to monitor the status of the exhaust gas,
The management device creates a reference space by collecting information on measured values obtained from the component detection means and the process variable sensor when the incinerator is operated, and determining a Mahalanobis distance, and subsequent creation of the reference space The distance of the Mahalanobis at the time of monitoring is determined based on the measurement values from the component detection means and the process variable sensor, and the distance between the Mahalanobis at the time of monitoring and the reference space is calculated. An exhaust gas measurement and monitoring system characterized by
請求項1の排ガス計測・監視システムにおいて、
前記成分検出手段によって得られる成分は、炭化水素系物質と、クロロフェノール類やクロロベンゼン類の特定計測物質と、 SOX NOX 、塩化水素、一酸化炭素、二酸化炭素、酸素、水分であることを算出することを特徴とする排ガス計測・監視システム。
In the exhaust gas measurement and monitoring system according to claim 1,
The components obtained by the component detection means are calculated to be hydrocarbon substances, specific measurement substances of chlorophenols and chlorobenzenes, SOX , NOX , hydrogen chloride, carbon monoxide, carbon dioxide, oxygen, and moisture. An exhaust gas measurement and monitoring system characterized by
請求項の排ガス計測・監視システムにおいて、
前記基準空間作成時、または監視時のマハラノビスの距離算出時に収集するデータには、焼却炉に具備される電気集塵機の温度、ガス温度、ガス圧力、ガス流量、プロセスに投入される除去剤量等の焼却炉の運転制御情報が含まれることを特徴とする排ガス計測・監視システム。
In the exhaust gas measurement and monitoring system according to claim 1 ,
Data collected when creating the reference space or when calculating the Mahalanobis distance when monitoring includes the temperature, gas temperature, gas pressure, gas flow rate, amount of remover introduced into the process, etc. of the electrostatic precipitator equipped in the incinerator. Exhaust gas measurement and monitoring system characterized by including operation control information of the incinerator .
請求項の排ガス計測・監視システムにおいて、
前記基準空間は以下の手順にて、作成されることを特徴とする排ガス計測・監視システム。
(1)前記成分検出手段やプロセス変量センサからの計測値データ、及び前記運転制御情報を収集し、
(2)前記(1)項のデータを、各データの平均値と標準偏差で正規化し、
(3)前記(2)項のデータから、2次元の相関行列を作成し、さらに当該行列からのマハラノビスの距離を求め、これらの距離で決定した分布状態を前記排ガスの基準空間とする。
In the exhaust gas measurement and monitoring system according to claim 3 ,
The exhaust gas measurement and monitoring system is characterized in that the reference space is created by the following procedure.
(1) collecting measurement value data from the component detection means and the process variable sensor, and the operation control information;
(2) Normalize the data of the item (1) with the mean value and standard deviation of each data,
(3) A two-dimensional correlation matrix is created from the data of the item (2), and further, the Mahalanobis distance from the matrix is determined, and the distribution determined by these distances is used as the reference space of the exhaust gas.
請求項の排ガス計測・監視システムにおいて、
前記基準空間と前記監視時のマハラノビスの距離を比較し、その距離が予め定められた範囲内である場合は、排ガスの性状は変化無しと診断することを特徴とする排ガス計測・監視システム。
In the exhaust gas measurement and monitoring system according to claim 4 ,
An exhaust gas measurement / monitoring system characterized by comparing the distance between the reference space and the Mahalanobis at the time of monitoring and judging that the property of the exhaust gas is not changed if the distance is within a predetermined range .
請求項の排ガス計測・監視システムにおいて、
前記基準空間と前記監視時のマハラノビスの距離を比較し、その距離が予め定められた範囲外である場合、且つその距離の隔離程度が計量値で判断出来る場合には、その値を信号の水準値として、前記各計測値と運転制御情報の各パラメータを増減して、寄与率の大きいパラメータのみを特徴要素として算出することを特徴とする排ガス計測・監視システム。
In the exhaust gas measurement and monitoring system according to claim 4 ,
The distance between the reference space and the Mahalanobis at the time of monitoring is compared, and if the distance is out of a predetermined range, and if the separation degree of the distance can be determined by a metric value, the value is used as the signal level. An exhaust gas measurement / monitoring system characterized by calculating, as a feature element, only a parameter with a large contribution rate by increasing or decreasing each parameter of each measured value and operation control information as a value .
請求項の排ガス計測・監視システムにおいて、
前記基準空間と前記監視時のマハラノビスの距離を比較し、その距離が予め定められた範囲外である場合、且つその距離の隔離程度が計量値で判断出来ないが基準空間内に入っ ていないことが明白な場合は、各パラメータを使用する、使用しないという2水準のカテゴリーのもとに各パラメータの前記隔離距離に対して、その有効性の寄与率の大きいパラメータのみを特徴要素として算出することを特徴とする排ガス計測・監視システム。
In the exhaust gas measurement and monitoring system according to claim 4 ,
The distance between the reference space and the Mahalanobis at the time of monitoring is compared, and if the distance is out of a predetermined range, the separation degree of the distance can not be determined by the metric value, but it is not within the reference space If it is obvious, calculate only the parameter that has a large contribution of its effectiveness as the feature element with respect to the separation distance of each parameter under the two level category of using each parameter and not using it. Exhaust gas measurement and monitoring system characterized by
JP2000387308A 2000-12-20 2000-12-20 Exhaust gas measurement and monitoring system Expired - Lifetime JP3986752B2 (en)

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JP5944206B2 (en) * 2012-04-12 2016-07-05 住友重機械工業株式会社 Abnormality monitoring device and abnormality monitoring method for circulating fluidized bed boiler
CN102735799B (en) * 2012-06-19 2015-11-04 北京雪迪龙科技股份有限公司 A kind of motor exhaust monitoring system
JP6198638B2 (en) * 2013-03-06 2017-09-20 新日鉄住金エンジニアリング株式会社 Waste charge control device and waste charge control method
JP6838289B2 (en) * 2016-06-02 2021-03-03 いすゞ自動車株式会社 How to measure the amount of fuel in the exhaust gas
KR101843879B1 (en) * 2017-06-26 2018-03-30 한국환경공단 System for detecting abnormality data, method thereof and computer recordable medium storing the method
CN118067930B (en) * 2024-04-19 2024-07-09 辽宁省气象服务中心(辽宁省气象影视中心) Automatic air negative oxygen ion monitoring device and method

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JPH09330858A (en) * 1996-06-07 1997-12-22 Hitachi Ltd Method and system for generating schedule management chart
JP3280872B2 (en) * 1996-10-23 2002-05-13 ニッタン株式会社 Environmental monitoring system, abnormality detection method, and abnormality detection device
JP3108405B2 (en) * 1998-07-23 2000-11-13 核燃料サイクル開発機構 Device diagnosis method
JP3668010B2 (en) * 1998-09-29 2005-07-06 株式会社日立製作所 Waste incineration equipment and its control method
JP3349455B2 (en) * 1998-09-30 2002-11-25 宮崎沖電気株式会社 Management method and management system for semiconductor manufacturing equipment
JP2000252179A (en) * 1999-03-04 2000-09-14 Hitachi Ltd Semiconductor manufacturing process stabilization support system
JP2000259222A (en) * 1999-03-04 2000-09-22 Hitachi Ltd Device monitoring and preventive maintenance system

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