JP2002182017A - Substrate having rugged shape on surface and method for producing the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate with a finely rugged film having good heat and alkali resistances and good adhesion and a method for producing the substrate and to use the substrate for a reflecting plate, a wedge for a light guide plate or the like. SOLUTION: The substrate having a rugged shape on the surface has >=60% light transmittance and has a functional cured film 2 obtained by curing a coating material containing a resin forming component based on a monomer or oligomer having a fluorene skeleton and a photopolymerization initiator as essential components on a flat substrate 1. The surface of the film is rugged, the mean value of proportion of its peak-to-valley height (Z=X-Y) is in the range of 0.60-0.95 and the peak-to-valley height is in the range of 0.05-3 μm.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate having an uneven surface and a method for manufacturing the same.

[0002]

2. Description of the Related Art In recent years, it has been demanded to form various uneven shapes on a substrate for the purpose of improving adhesiveness, diffuse reflection of light, and the like. For the production of a substrate having an uneven shape on the surface, polishing of the substrate, filler addition to the resin composition,
Pattern unevenness has been formed by photolithography or the like using a photocurable resin. However, it is difficult to form the irregularities precisely by the method of polishing the substrate, and the method of adding the filler to the resin composition forming the coating agent is added although the manufacturing process is simple. When the specific gravity of the filler is greater than the resin composition, precipitation occurs, and when the particle size of the filler is large, a uniform coating film cannot be obtained, and there is a problem that good surface unevenness cannot be obtained. Was.

On the other hand, a method by photolithography using a photocurable resin as disclosed in Japanese Patent Application Laid-Open No. 11-183714 requires ultraviolet irradiation, development, washing, and heat curing steps, so that the surface can be easily roughened. The shape could not be formed. Therefore, Japanese Patent Laid-Open No. 11-248909, a manufacturing method of the diffuse reflection plate without the development step of the conventional photolithography method is shown. However, conventionally known substrates are made of conventional acrylic resin, so that the heat resistance of the cured film and the adhesion during alkali immersion are insufficient, and the substrate is peeled off by subsequent heat treatment or alkali treatment. It was not satisfactory because of deformation and deformation. Therefore, there has been a demand for the development of a substrate having an uneven shape on the surface and a method of manufacturing the same, which has both good heat resistance and good alkali resistance.

[0004]

SUMMARY OF THE INVENTION The present invention provides a cured film having excellent heat resistance and adhesion during alkali immersion, and has an uneven surface on which surface peeling and deformation can be suppressed in the subsequent heat treatment or alkali treatment. Provided is a substrate and a method for manufacturing the substrate by a simple method without going through complicated manufacturing steps.

[0005]

The present inventors have conducted intensive studies to solve the above-mentioned problems, and as a result, selected a material for forming a cured film provided on the substrate and having a specific surface unevenness shape. Is found to meet the purpose of the present invention,
The present invention has been completed. Further, the present inventors have studied the surface irregularity forming method for the selected material, and as a result, by controlling the difference between the photo-curing shrinkage and the thermosetting shrinkage of the coating material, only ultraviolet irradiation and heat treatment are performed. It has been found that a substrate having a good surface unevenness can be obtained without the steps of development and washing by the simple manufacturing method of the present invention, and the present invention has been completed.

That is, the present invention provides a functional material obtained by curing a coating material containing a resin-forming component mainly containing a monomer or oligomer having a fluorene skeleton and a photopolymerization initiator as essential components on a flat substrate. Having a cured film, the surface of the functional cured film has an uneven shape,
The surface having an average value of the ratio of the uneven step in the range of 0.60 to 0.95, the uneven step in the range of 0.05 to 3 μm, and the light transmittance of the functional cured film of 60% or more. Is a substrate having an uneven shape.

Further, the present invention uses a coating material containing a resin-forming component mainly composed of a monomer or oligomer having a fluorene skeleton and a photopolymerization initiator as essential components on a flat substrate, and performs photocuring and thermosetting. By controlling the difference in the cure shrinkage of
This is a method for producing a substrate having an uneven shape on the surface on which a transparent functional cured film having an uneven shape in the range of 5 to 3 μm is formed.

Further, the present invention provides a coating material comprising a resin-forming component mainly composed of a monomer or oligomer having a fluorene skeleton having a film thickness of 0.5 μm or more and a photopolymerization initiator as essential components on a flat substrate. After application, 300 to 450 through a mask having a light transmitting part and a light shielding part.
irradiating 50 to 10000 mJ / cm ² of ultraviolet light of nm,
Then developed, without washing, 1 120 to 250 ° C.
By performing a heat treatment for 5 to 60 minutes, the surface of the cured film is formed with a transparent functional cured film having an irregularity step of 5 to 40% of the film thickness and an irregular shape in the range of 0.05 to 3 μm. This is a method for manufacturing a substrate having a shape.

In the method for producing a substrate having an uneven surface on the surface according to the present invention, the light transmittance of the transparent functional cured film is 60% or more, and the uneven portion formed on the surface is formed by a mask. It consists of an exposed part (film thickness X) and an unexposed part (film thickness Y), and the thickness ratio (Y / X) of each part is 0.60.
It is preferably in the range of 0.95 to 0.95.

[0010]

BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described below in detail. The description is made on the manufacture of a substrate having a transparent functional cured film (having an uneven shape) on the surface and a substrate having a transparent functional cured film on the surface. Described in the order of the methods. A substrate having a surface-transparent functional cured film (having an uneven shape) of the present invention (hereinafter, may be abbreviated as an uneven substrate) is provided with a coating material layer made of a specific resin forming component on a flat substrate, It has a functional cured film obtained by curing a coating material.

[0011] The substrate on which the coating material is provided must be flat in form. If the substrate does not have a flat (smooth) property, good coating cannot be performed, and it is difficult to form a fine surface unevenness aimed at by the present invention. Here, the flatness (smoothness) means JIS
Ra specified by B0601 indicates 0.05 μm or less.
Specifically, a glass substrate, a metal substrate, a plastic substrate and the like are exemplified.

The uneven substrate of the present invention has a functional cured film obtained by curing a coating material containing a resin-forming component mainly composed of a monomer or oligomer having a fluorene skeleton and a photopolymerization initiator as essential components. here,
The resin-forming component refers to a component containing a monomer, an oligomer, an epoxy resin curing agent, and the like. Further, the resin-forming component having a fluorene skeleton refers to a monomer or an oligomer having a fluorene skeleton or both of them. Further, the resin-forming component of the present invention refers to a resin-forming component mainly composed of a monomer or oligomer having a fluorene skeleton. The oligomer means one having an average degree of polymerization or a number of repetitions of 50 or less, and includes many uncured epoxy resins in addition to oligomers polymerized by unsaturated bonds.

As the resin-forming component having a fluorene skeleton, those represented by the following general formulas (1) to (3) are particularly preferable.

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[0014]

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In the above general formulas (1) and (2), Y
Represents a group represented by the formula (4), A is CH ₂ = CR- indicates (R is a hydrogen atom or a methyl group), n represents an integer of 0 to 20. In the general formula (3), Y represents a group represented by the formula (4), and X and Z each represent a residue of a polybasic acid. Further, m and n represent a molar ratio. In the formula (4), R represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. The compound of the general formula (3) can be obtained by reacting the compound of the general formula (2) with a derivative such as a polybasic acid or an anhydride thereof. In this case, the compound of the general formula (2)
May be 2 or more. Here, R in the formula (4) is a hydrogen atom, and R in the general formulas (1) and (2)
The average of n (average number of repetitions) is preferably 0 to 1.

By employing these resin-forming components, the heat resistance of the resin matrix can be increased, and an uneven substrate suitable for applications requiring heat resistance can be obtained. In this case, the proportion of the resin-forming component having a fluorene skeleton is at least 40% by weight, preferably at least 50% by weight, more preferably at least 70% by weight of the total resin and the resin-forming component. Further, the monomer or oligomer having a fluorene skeleton is a fluorene epoxy resin, fluorene acrylate or an acid adduct of fluorene acrylate, and the ratio thereof is 0.5 to 5 parts by weight of fluorene acrylate and 1 to 5 parts by weight of fluorene acrylate. It is preferable that the amount of the acrylate acid adduct is 0 to 5 parts by weight, and the amount of the monomer or oligomer having a fluorene skeleton in the resin-forming component is 50% by weight or more. It is advantageous that the polyfunctional acrylate is contained in the resin-forming component in an amount of 10 to 40% by weight.

The resin-forming component of the present invention can contain other resins or resin-forming components, and it is preferable to use an acrylic resin or an epoxy resin. Examples of the acrylic resin include acrylic monomers, substituted acrylic acids such as methacrylic acid, and acrylic monomers, oligomers or polymers selected from acrylates such as methyl esters thereof, and polymerizable monomers or oligomers are preferred. . Examples of the acrylic resin component include general-purpose acrylates such as methyl methacrylate and methyl acrylate, polyfunctional acrylates derived from polyfunctional alcohols and polyfunctional epoxy compounds, and polymers such as poly (meth) acrylic acid. And its oligomers. Examples of the epoxy resin component include a bisphenol A epoxy resin, a bisphenol F epoxy resin, a phenol novolak epoxy resin, and a dihydroxybiphenyl epoxy resin. The epoxy resin in the present invention includes an epoxy compound. The resin-forming component having a fluorene skeleton, which is an essential component, and other acrylic resin-forming components and epoxy resin-forming components, which are optional components, may be used alone or in combination of two or more.

The photopolymerization initiator, which is one of the essential components, may be any as long as it initiates or promotes the photopolymerization of the resin-forming component. Examples of the photopolymerization initiator include carbonyl compounds, sulfur compounds, and azo compounds. , Triazine compounds, organic peroxides and the like can be appropriately adjusted and used.

The coating material used in the present invention may contain other components as long as the effects of the present invention are not impaired. For example, a solvent or a surfactant that improves the coating properties, a thermal polymerization initiator that promotes thermal polymerization,
A coupling agent can be used to improve the adhesion, and a pigment can be used to change the light transmittance. In addition, as long as the effects of the present invention are not impaired, a solvent-soluble resin as described above can be contained.

As the solvent, ethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, cyclohexanone, ethylethoxypropionate, butyl acetate, diethylene glycol dimethyl ether, γ-butyrolactone, etc. are preferred from the viewpoint of solubility and coating properties. A mixture of these solvents may be used.

When a thermal polymerization initiator is used, it may be any as long as it initiates or promotes the thermal polymerization of an acrylic resin component or another thermopolymerizable resin component, and may be an organic amine compound, an imidazole compound, an acid anhydride, or an organic compound. Phosphine and the like can be mentioned, but the most preferable ones from the viewpoint of storage stability are organic amine compounds and imidazole compounds, and several kinds of these can be used as a mixture. As the organic amine, bis (diethylamino) benzophenone is preferable, and as the imidazole compound, 2-methylimidazole is preferable in terms of curability and storage stability. Many of these are also components that act as curing agents or curing accelerators for epoxy resins, so when epoxy resin is included, they also act as curing agents or curing accelerators, but in the present invention, the curing agent is a resin-forming component And the curing accelerator is called a thermal polymerization initiator.

The preferred compounding ratio of the coating material is as follows:
The photopolymerization initiator is 1 to 15 parts by weight, the thermal polymerization initiator is 0.5 to 10 parts by weight, and the solvent is 100 to 500 parts by weight based on 100 parts by weight of the resin and the resin-forming component in total.

[0023] There is no particular limitation on how to prepare a coating material, a resin-forming component, a photopolymerization initiator, a solvent, a thermal polymerization initiator, a surfactant, the type of such a coupling agent, after appropriately adjusting the amount , Using a dispersing and mixing device such as a roll mill, a ball mill, a sand mill, and a planetary mixer,
A method of performing stirring and mixing at 5 to 70 ° C. for about 1 to 50 hours and dispersing so as to have a uniform composition can be adopted.

The uneven substrate according to the present invention has a functional cured film. The functional cured film refers to a cured film having a function expressed by the uneven shape of the surface of the cured film, and has such a functional cured film on at least a part of the substrate.
The surface of the functional cured film has an uneven shape, and the average value of the uneven step ratio is in the range of 0.60 to 0.95, and the uneven step is required to be in the range of 0.05 to 3 μm. it is. If the average value of the unevenness step ratio and the unevenness step are out of this range, good surface unevenness will not be obtained, and characteristics as a functional cured film will not be sufficiently exhibited. The unevenness is 5 to 40%, preferably 10 to 30% of the average thickness of the functional cured film.

The functional cured film needs to have a light transmittance of 60% or more, and preferably in the range of 70 to 95%. If the light transmittance is less than this value, it cannot be used for applications utilizing transparency, which is not preferable. Here, the method of measuring the average value of the unevenness step ratio, the unevenness step, and the light transmittance is as described in Examples below.

Next, a method of manufacturing a substrate having an uneven surface according to the present invention will be described. In the method for manufacturing a concavo-convex substrate of the present invention, first, it is necessary to apply a coating material on a flat substrate. As the flat substrate, the same one as described above can be used, and the method for applying the coating material is not particularly limited, and a known method can be applied. Specifically, the method can be performed by spin coating. . The film thickness of the coating agent applied is 0.5
It is preferably at least μm. If the film thickness is less than 0.5 μm, sufficient unevenness cannot be obtained. The applied coating material is usually 60 to 120 before irradiation with ultraviolet light.
After pre-drying at a temperature of about 1 to about 5 minutes to remove the solvent to some extent, it is preferable to proceed to the next step of irradiation with ultraviolet rays.

The coating material used is a coating material containing the above-mentioned resin-forming component of the present invention and a photopolymerization initiator as essential components. A transparent functional cured film having an uneven shape on the cured film surface after curing is used. Any material that can be formed may be used. As the resin-forming component having a fluorene skeleton, those represented by the above general formulas (1) to (3) are exemplified as preferable ones.

In the production method of the present invention, it is advantageous to form the irregularities on the surface of the transparent functional cured film by controlling the difference in curing shrinkage between photocuring and thermosetting.
It is not limited to this. The above method will be described. For example, the applied coating material is irradiated with ultraviolet rays through a mask, and is subjected to a heat treatment using a hot air drier or the like to form a film. At this time, the unevenness of the surface is determined by using a mask having a light transmitting part and a light shielding part at the time of irradiating ultraviolet rays, exposing an exposed part and an unexposed part, It is formed using the difference in curing shrinkage of the part.

The shape of the mask used at the time of ultraviolet irradiation is not particularly limited as long as it has a light transmitting portion and a light shielding portion, and is appropriately designed according to the target surface unevenness shape. It is. However, in order to form fine surface irregularities, 2 to 10 μm per 100 μm is required.
It is preferable that about 2 to 20 linear or curved light transmitting portions having a line width of m exist.

The conditions for the ultraviolet irradiation are 300 to 45.
It is preferable to irradiate an ultraviolet ray of 0 nm in a range of 50 to 10000 mJ / cm ^2.
It is preferable to carry out at 0 to 250 ° C. for 15 to 60 minutes. If the UV irradiation conditions are below this range, curing by light is insufficient and the desired unevenness cannot be formed, and above this range, sufficient unevenness can be formed due to light sneaking into the shield due to light diffraction. It is not preferable because it disappears.
On the other hand, if the conditions of the heat treatment are less than this range, sufficient thermal curing is not performed, and sufficient unevenness cannot be formed. According to a method using ordinary photolithography, development and washing steps are required after irradiation with ultraviolet light. However, according to the method of the present invention, this step can be omitted, and a heat treatment step can be performed immediately after irradiation with ultraviolet light. There is no need to go through a manufacturing process. Note that a lamp such as an ultra-high pressure mercury lamp or a metal halide lamp can be used for the irradiation with ultraviolet light.

The coating film formed in this manner has a transparent functional cured film having a fine surface unevenness. The functional cured film needs to have transparency, but its light transmittance is preferably 60% or more. The uneven portion formed on the surface of the functional cured film is composed of an exposed portion (film thickness X) and an unexposed portion (film thickness Y) using a mask, and the thickness ratio (Y / X) of each portion is different. It is preferably in the range of 0.60 to 0.95, and the step is preferably in the range of 0.05 to 3 μm. Here, the concavo-convex shape of the surface of the formed coating film can be adjusted by appropriately adjusting the shape of the mask (exposed portion) used for the ultraviolet irradiation through the mask, the ultraviolet irradiation conditions, the heat treatment conditions, and the like. Can be controlled.

[0032]

The present invention will be described below in detail with reference to examples. Evaluation of various characteristics was measured by the following methods. (1) Heat resistance: The formed coating film was placed in an oven at 260 ° C. for 3 hours, and the state of the coating film was evaluated. The ranking of the evaluation is as follows. ：: No abnormality in appearance of coating film. ×: Appearance of coating film, peeling and coloring. (2) Adhesion to substrate: After coating, apply a cross cut to make at least 100 grids, then perform a peeling test using cellophane adhesive tape according to JIS Z1522, and peel off grids Was visually evaluated. The ranking of the evaluation is as follows. ：: No peeling was observed at all. ×: Peeling is observed even a little. (3) Coating film hardness: Using a pencil hardness tester according to the test method of JIS-K5400, under the condition of a load of 1 kg, the pencil hardness at which the coating film was not scratched was defined as the coating film hardness. The pencil used was "Mitsubishi High Uni (registered trademark)". The ranking of the evaluation is as follows. ：: 4H or more. X: Less than 4H.

(4) Chemical resistance: The formed coating film was immersed in the following chemicals under the following conditions, and the appearance and adhesion after immersion were evaluated. The ranking of the evaluation is as follows. ：: No abnormality in appearance of coating film. ×: Appearance of coating film, peeling and coloring.

(5) Concavity and convexity step: The film thickness of the convex part (film thickness X) and concave part (film thickness Y) on which the concavities and convexities are formed is measured using a surface roughness meter, and the difference (X−Y) is determined by the step height. And Further, the ratio of the uneven steps was obtained by calculating the ratio (Y / X) of the thickness of each part. This will be described with reference to FIG. 1. A difference between a convex portion X (exposed portion of the coating film: film thickness X) and a concave portion Y (unexposed portion: film thickness Y) is obtained as a step Z. In the drawings, reference numeral 1 denotes a substrate, 2 denotes a functional cured film, 3 denotes a mask for forming an exposed portion and a non-exposed portion, and UV denotes ultraviolet light. In addition, the average value of the uneven steps and the average value of the ratio of the uneven steps were the average values of 100 points of the uneven steps randomly measured by the above method.

(6) Cured film light transmittance: The coating material is coated on a flat glass substrate by spin coating.
After applying to a thickness of 0 μm and pre-drying at a temperature of 80 ° C. for 2 minutes, a 500 W high-pressure mercury lamp was used through a quartz mask (50 μm dots deposited with chromium at 10 μm intervals) for forming irregularities. UV light having a wavelength of 365 nm and an illuminance of 10 mW / cm ² was irradiated for 50 seconds, and then heated and dried at 200 ° C. for 30 minutes using a hot air drier, and the prepared sample was subjected to Hitachi spectral transmittance meter UBEST-40.
The transmittance at 500 nm was measured using 0.

(Adjustment of Coating Material) The coating agents were adjusted at the mixing ratios shown in Table 1.

[Table 1]

Each component in the table is as follows. Fluorene acrylate: Compound of general formula 2 Polyfunctional acrylate: dipentaerythritol hexaacrylate Fluorene epoxy resin: Compound of general formula 1 Photopolymerization initiator: Irgacure 907 manufactured by Ciba Geigy Co., Ltd. Solvent: propylene glycol monomethyl ether acetate Silane coupling agent: γ -Glycidoxypropyltrimethoxysilane curing agent (thermal polymerization initiator): bis (diethylamino) benzophenone

Example 1 The above coating agent containing a photopolymerization initiator shown in Table 1 and cured by light and heat was applied to a degreased and washed flat glass substrate having a thickness of 1.1 mm by spin coating to about 3.0 μm. 80 ° C
After pre-drying at a temperature of 2 minutes for 2 minutes, a 500 W high-pressure mercury lamp was used to illuminate at 10 mW / cm ² with a 500 W high-pressure mercury lamp through a quartz mask (chrome-deposited lines of 10 μm width at intervals of 10 μm) for forming irregularities. For 50 seconds. Then, using a hot air dryer, 200 ° C
For 30 minutes to prepare a sample.

The average of the steps of the uneven portions of this sample was 0.3.
The average of the ratio of the film thickness (film thickness Y) of the exposed portion (film thickness X) and the unexposed portion (film thickness Y) was 0.77 (Y / X). In addition, the uneven substrate of the present invention resulted in excellent heat resistance, transparency, adhesion, hardness, chemical resistance, and the like. The light transmittance of the functional cured film was 60% or more.

Comparative Example 1 The procedure of Example 1 was repeated, except that the coating agent which was cured by light and heat was changed to that of Comparative Example 1 in Table 1.
Also about the photothermal curing type transparent resin which is used as a protective film for color filter on a glass plate having a thickness of 1.1mm was degreased by spin coating on a glass substrate 5.0
μm thick, pre-dried at 80 ° C. for 2 minutes, and then a quartz mask (width 10 μm
Was irradiated with ultraviolet rays having a wavelength of 365 nm and an illuminance of 20 mW / cm ² for 50 seconds using a 500 W high-pressure mercury lamp. Thereafter, a heating and drying treatment was performed at 200 ° C. for 30 minutes using a hot-air drier to prepare a sample.

The average of the steps of the concave and convex portions of this sample was 0.3.
The average of the ratio (Y / X) of the film thickness (film thickness Y) of the exposed portion (film thickness X) and the unexposed portion was 0.83. However, in Comparative Example 1 not using the resin component having a fluorene skeleton, adhesion and heat resistance, film hardness deficiency was observed.

[0042]

The substrate of the present invention having an uneven surface has good heat resistance, alkali resistance and adhesion, and therefore requires a fine surface unevenness in the fields of electric machines and electronics. Can be widely used for applications. Applications include wedges for reflectors, light guide plates, dot formation, prism sheets, micro lenses for LCD projectors, etc.
Full-nel lens for projection screen, LCD for wide viewing angle
Although it can be used for structures in cells, etc., it is particularly used for LCD reflective substrates that have fine surface irregularities and require high-efficiency light reflection performance, and for substrates that require fine matting. Suitable for. Further, according to the manufacturing method of the present invention, without performing complicated manufacturing steps such as development and washing steps as in conventional polishing and photolithography,
Simple exposure, by heat drying, can better irregularities create, the usefulness of the industry is extremely high.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view showing uneven steps.

[Explanation of symbols]

 1 base material 2 cured film 3 mask

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) C08J 7/04 CER C08J 7/04 CERZ 4J038 CEZ CEZZ C09D 4/02 C09D 4/02 5/00 5/00 Z 5/28 5/28 163/00 163/00 201/00 201/00 G02B 1/11 C08L 101: 02 // C08L 101: 02 G02B 1/10 A F-term (reference) 2H042 BA04 BA15 BA19 BA20 2K009 AA12 CC24 CC33 DD02 4D075 BB26Z BB40Z BB42Z BB46Z BB92Z BB93Z CA02 CA13 CA18 CA44 CB03 CB06 CB33 DA06 DB01 DB13 DB31 DC19 DC21 DC24 EB20 EB22 EB24 EB33 EC37 4F006 AB13 AB20 AB34 AB35 BA01 AG00 ABAB04 BA01 BA00 ATB4A01 BA00 BAB AT01B00 EJ422 EJ542 GB41 JB01 JB12B JJ03 JK12 JN01 JN01B YY00B 4J038 DB271 DB272 FA141 FA142 KA03 NA01 NA19 PA17

Claims (5)

[Claims] 1. A functional cured film obtained by curing a coating material containing a resin-forming component mainly containing a monomer or oligomer having a fluorene skeleton and a photopolymerization initiator as essential components on a flat substrate. The surface of the functional cured film has an uneven shape, the average value of the ratio of the uneven steps is in the range of 0.60 to 0.95, and the uneven step is in the range of 0.05 to 3 μm. A substrate having a functional cured film on its surface, wherein the light transmittance of the functional cured film is 60% or more. Wherein the coating material is applied on a flat substrate, a method of forming a surface unevenness of a cured film obtained by curing the coating material, a main monomer or oligomer having a fluorene skeleton in the coating material Using a coating material containing a resin-forming component and a photopolymerization initiator as essential components, and controlling the difference in curing shrinkage between photo-curing and thermo-curing, the unevenness level of the cured film surface is in the range of 0.05 to 3 μm. A method for producing a substrate having a transparent functional cured film on its surface, characterized by forming a transparent functional cured film having an uneven shape. To 3. A flat substrate, a coating material containing a main and a resin-forming component and a photopolymerization initiator of a monomer or oligomer having a fluorene skeleton to a thickness 0.5μm or more as an essential component coating After that, through a mask having a light transmitting portion and a light shielding portion, irradiating under a condition that the coating material of the exposed portion can be cured through ultraviolet rays of 300 to 450 nm, and then, without performing development and washing, 1
By performing a heat treatment at 20 to 250 ° C. for 15 to 60 minutes, the unevenness level on the cured film surface is 5 to 40% of the film thickness, and is 0.0%.
A method for producing a substrate having a transparent functional cured film on its surface, comprising forming a transparent functional cured film having an uneven shape in the range of 5 to 3 μm. 4. The light transmittance of the transparent functional cured film is 60%.
The uneven portion formed on the surface is composed of an exposed portion (film thickness X) and an unexposed portion (film thickness Y) using a mask, and the thickness ratio (Y / X) of each portion is 0. The method for producing a substrate having a transparent functional cured film on the surface according to claim 2 or 3, wherein the substrate has a range of 60 to 0.95. 5. The monomer or oligomer having a fluorene skeleton is a fluorene epoxy resin, fluorene acrylate or an acid adduct of fluorene acrylate, the ratio of which is 0.5 to 5 parts by weight per 1 part by weight of the fluorene epoxy resin. 5 parts by weight, 0 to 5 parts by weight of an acid adduct of fluorene acrylate, and the monomer or oligomer having a fluorene skeleton in the resin-forming component is 50% by weight or more, and is transparent on the surface according to any one of claims 2 to 4. A substrate having a functional cured film.