JP2002166217A5 - - Google Patents
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- Publication number
- JP2002166217A5 JP2002166217A5 JP2001270971A JP2001270971A JP2002166217A5 JP 2002166217 A5 JP2002166217 A5 JP 2002166217A5 JP 2001270971 A JP2001270971 A JP 2001270971A JP 2001270971 A JP2001270971 A JP 2001270971A JP 2002166217 A5 JP2002166217 A5 JP 2002166217A5
- Authority
- JP
- Japan
- Prior art keywords
- exhaust port
- damper
- rotating cup
- mist
- ceiling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Description
【００３８】
樋部７３の天井部７４は、回転カップ４２に向けて開放するように傾斜している。その傾斜角θ１として１０°〜４５°、より好ましくは２０°とされている。そして、回転カップ４２の流出孔５８は天井部７４の斜面に対面している。これにより、回転カップ４２の流出孔５８から排出されるレジスト液を樋部７３で確実に回収することができるようになる。[0038]
The ceiling 74 of the collar 73 is inclined to open toward the rotating cup 42. The inclination angle θ1 is 10 ° to 45 °, and more preferably 20 °. The outflow hole 58 of the rotating cup 42 faces the slope of the ceiling 74. As a result, the resist solution discharged from the outflow hole 58 of the rotating cup 42 can be reliably recovered by the flange portion 73 .
【００４５】
また、第２の排気通路８０と排気口７９との間には、メッシュが配置されている。これにより、排気口７９側にミストが侵入することを防止している。更に、排気口７９にはダンパが介挿されている。そして、基板Ｇ上にレジストを塗布しているときにはダンパが開いた状態とされ、それ以外のときにはダンパにより排気口７９が閉じられた状態とされている。これによっても、排気口７９側にミストが侵入することを防止している。[0045]
In addition, a mesh is disposed between the second exhaust passage 80 and the exhaust port 79. This prevents the mist from intruding into the exhaust port 79 side. Furthermore, a damper is inserted in the exhaust port 79. When the resist is applied onto the substrate G, the damper is in an open state, and in the other cases, the exhaust port 79 is closed by the damper . This also prevents the mist from invading the exhaust port 79 side.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001270971A JP3840388B2 (en) | 2000-09-25 | 2001-09-06 | Substrate processing equipment |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000289931 | 2000-09-25 | ||
| JP2000-289931 | 2000-09-25 | ||
| JP2001270971A JP3840388B2 (en) | 2000-09-25 | 2001-09-06 | Substrate processing equipment |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002166217A JP2002166217A (en) | 2002-06-11 |
| JP2002166217A5 true JP2002166217A5 (en) | 2004-09-16 |
| JP3840388B2 JP3840388B2 (en) | 2006-11-01 |
Family
ID=26600623
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001270971A Expired - Fee Related JP3840388B2 (en) | 2000-09-25 | 2001-09-06 | Substrate processing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3840388B2 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG185136A1 (en) | 2003-04-11 | 2012-11-29 | Nikon Corp | Cleanup method for optics in immersion lithography |
| TW200509205A (en) | 2003-05-23 | 2005-03-01 | Nippon Kogaku Kk | Exposure method and device-manufacturing method |
| CN103605262B (en) | 2004-06-09 | 2016-06-29 | 株式会社尼康 | Exposure device and maintaining method thereof and manufacturing method |
| JP5174391B2 (en) * | 2007-08-07 | 2013-04-03 | 靖彦 青山 | Spin coater |
| JP2011156480A (en) * | 2010-02-01 | 2011-08-18 | Disco Abrasive Syst Ltd | Liquid resin coating device |
| JP6659368B2 (en) * | 2016-01-15 | 2020-03-04 | 株式会社荏原製作所 | Cleaning apparatus, substrate processing apparatus, and substrate processing method |
-
2001
- 2001-09-06 JP JP2001270971A patent/JP3840388B2/en not_active Expired - Fee Related
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