JP2002164317A - Substrate-spinning apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To avoid defectiveness in treatment caused by rotating a substrate to be subjected to the treatment, regarding cleaning by fixed posture, to improve the yield of products, and at the same time, to appropriately cope with a plurality of kinds of treatment. SOLUTION: In the substrate-spinning apparatus 57, having a chucking mechanism 59 interlocked to a rotating substrate 83, that is rotated by the operation of a rotary driving mechanism 60, while the chucking mechanism can be rotated with the rotary substrate 83, a tilt mechanism 62 is provided, where the tilting mechanism tilts a substrate 2, gripped by the chuck mechanism 59. In the tilting mechanism 62, a mounting member 81 for rotatably supporting the rotating substrate 83 is supported to a substrate-side member 105, while the mounting member can be freely tilted. Also, the rotary driving mechanism 60 is fitted to the mounting member 81, while the chucking mechanism 59 grips the substrate 2 in a vertical posture.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate spinning device for gripping a semiconductor substrate, a glass substrate or the like and rotating the substrate in the circumferential direction, for example, scrubbing for removing particles (foreign matter, dirt, etc.) attached to the substrate. The present invention relates to a substrate spin device incorporated in a substrate cleaning device that sequentially executes a cleaning process, a rinsing cleaning process, and a drying process.

[0002]

2. Description of the Related Art In recent years, a scrubbing cleaning step, a rinsing cleaning step, and a drying step are sequentially performed in order to remove particles attached to a semiconductor substrate or a glass substrate after a predetermined processing step. Has been done. In some cases, a substrate spinning device that grips a substrate and rotates the substrate in a circumferential direction is incorporated in a substrate cleaning device that executes each of these steps as a series of sequential operations.

[0003] As this substrate spinning device, for example, according to Japanese Patent Application Laid-Open No. H11-251414, a rotating base that rotates in accordance with the driving force of a driving mechanism, a substrate that is rotatably connected to the rotating base and has an upper end portion with a substrate. A plurality of arms for gripping an outer peripheral end surface of the arm, and a weight provided at the lower end of these arms and having a centrifugal force acting in a direction to increase the gripping force of the substrate by the upper end of the arm. I have.

However, the apparatus disclosed in the above publication has a configuration in which the substrate is rotated in the circumferential direction while the substrate is held in a horizontal posture by the arm. A large work space is required in the flow direction, and in particular, if a request for an increase in the diameter of the substrate is taken, a problem that the substrate cleaning apparatus becomes large is caused.

Therefore, the present applicant has come up with an apparatus for rotating the substrate in the circumferential direction while holding the substrate in a vertical posture by the holding member. If this apparatus is incorporated into the above-described substrate cleaning apparatus and is configured to be used for processing such as a rinsing cleaning step and a drying step, a work space in the process flow direction can be reduced, and further, the substrate cleaning apparatus can be reduced in size. Is realized.

[0006]

In the rinsing and drying processes, a rinsing liquid or the like is scattered from the rotating substrate to the outer periphery by centrifugal force. In this case, the substrate is rotated in a vertical position. In this case, since the rinsing liquid or the like scattered upward is dripped with dirt, the front and rear surfaces of the substrate may be secondary-contaminated.

In this case, as the substrate to be subjected to the above-described processing, there is a substrate whose surface is an important surface such as a pattern forming surface, and whose back surface is not as important as the left side. Nevertheless, if the front and back surfaces of the substrate are contaminated by the dripping rinse solution or the like, not only can the treatment not be performed as requested, but also the product yield be reduced.

In a configuration in which the substrate is rotated in a horizontal position as in the spin apparatus disclosed in the above-mentioned publication, it is preferable to maintain the substrate in a horizontal position when performing one process. In some cases, this is not preferable, and there is a drawback that a single apparatus cannot appropriately cope with a plurality of types of processing.

SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and it is possible to avoid a defect in a process to be performed due to a substrate to be subjected to a predetermined process rotating in a posture maintained fixedly, and to improve a product yield. It is another object of the present invention to provide a substrate spin apparatus capable of appropriately coping with a plurality of types of processing.

[0010]

SUMMARY OF THE INVENTION In order to achieve the above technical object, the present invention provides a rotating base which is rotated by the operation of a rotary driving mechanism, and a chuck which is integrally rotatably connected to the rotating base and holds the substrate. And a tilt mechanism for tilting the substrate held by the chuck mechanism.

According to such a configuration, the substrate held by the chuck mechanism is tilted by the operation of the tilt mechanism, so that the substrate can take a plurality of postures. Can be changed. As a result, the accuracy of each process can be ensured, and the product yield can be improved, and a single device can appropriately cope with a plurality of types of processes.

It is preferable that the tilt mechanism is configured such that a mounting member for rotatably supporting the rotating base is supported on a base member so as to be tiltable. According to this structure, the rotating base and the chuck mechanism integrally rotatably connected to the rotating base are tilted only by tilting the mounting member with respect to the base side member, and are thereby held by the chuck mechanism. The tilted substrate also tilts. Therefore, the configuration of the tilt mechanism is extremely simplified as compared with the case where the tilting operation is performed between other components.

It is preferable that the mounting member is provided with a rotation drive mechanism. According to this configuration, when the mounting member is tilted, the rotation driving mechanism is tilted integrally with the mounting member, so that the relative rotation between the rotating base supported by the mounting member and the rotation driving mechanism is performed. The positional relationship does not change between before and after tilting. Therefore, it is possible to tilt the substrate while maintaining an appropriate positional relationship between the components, and it is possible to avoid a problem that the components do not operate accurately due to the tilt.

Preferably, the chuck mechanism is configured to grip the substrate in a vertical posture. According to this structure, for example, when a flow operation is performed, it is not necessary to secure a large operation space in the flow direction of the process as compared with a case where the substrate is held in a horizontal posture, and the work equipment is compact. Is achieved. In addition, for example, in a situation where the liquid scattered due to the rotation of the substrate drops on the substrate with dirt, and the surface of the substrate is an important surface such as a pattern forming surface, the operation of the tilt mechanism is performed. The substrate is tilted so that the surface of the substrate is directed obliquely downward. As a result, the liquid scatters in an oblique direction and does not scatter vertically upward, so that the liquid does not drip toward the substrate, or even if it drips, it will drop exclusively on the back surface of the substrate, and the pattern forming surface Etc. are protected from cross-contamination.

The substrate spinning device according to the present invention can also be applied to a device provided with a weight in which a centrifugal force acts in a direction for increasing the gripping force of the substrate by the chuck mechanism when rotating the rotating base. Furthermore, the substrate spinning apparatus according to the present invention is incorporated in a substrate cleaning apparatus that sequentially performs a scrubbing cleaning step, a rinsing cleaning step, and a drying step on a transferred substrate, thereby achieving various functions as described above. Is used effectively.

[0016]

Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 is a schematic perspective view showing the overall configuration of a substrate cleaning apparatus according to an embodiment of the present invention. As shown in FIG. 1, a substrate cleaning apparatus 1 includes a first storage container 3 for storing a plurality of substrates 2 in order from an upstream side in a process flow direction and scrubbing cleaning for removing particles attached to the substrates 2. A brush scrub tank 4 as a first tank for performing the step, and a second cleaning step for performing a rinsing cleaning step for removing particles and a cleaning liquid remaining on the substrate 2 and thereafter performing a drying step for drying the substrate. A rinse drying tank 5 as a tank and a second storage container 6 for sequentially storing the dried substrates 2 are provided. Note that the substrate 2 includes a semiconductor substrate (including a DVD master and a CD master), a glass substrate, and the like.

In the first storage container 3, a plurality of sheets (for example, 20 to 30) are arranged in a direction (front-back direction) orthogonal to the process flow direction.
Of the substrates 2 are stored in a vertical orientation at predetermined intervals. The first storage container 3 is configured to move in the front-rear direction by the operation of a driving means such as a driving cylinder, and a lid body such as a sliding shutter that opens and closes an upper opening is disposed at an upper end thereof. (Not shown). The lid is configured to slightly open the upper opening only when the substrate 2 is taken out. Further, a plurality of spray nozzles 7 as spray means for atomizing and spraying a wetting liquid such as pure water are provided inside the first storage container 3. Each of the spray nozzles 7 communicates with a vapor introduction passage for introducing, for example, the wetting liquid as vapor, or a mixture introduction passage for introducing a mixture formed by mixing the wetting liquid and air.

A scrubbing cleaning area 8 for cleaning the substrate 2 is provided inside the brush scrub tank 4, and the substrate 2 is evacuated and transferred immediately above the brush scrub tank 4. Evacuation area 9 is provided. In this area, a cleaning jig 10 as a substrate holding means for holding the substrate 2 between the scrubbing cleaning area 8 and the retreat area 9 and reciprocating the substrate 2 is provided.

In the transfer path between the first storage container 3 and the brush scrub tank 4, the first substrate 2 stored in the first storage container 3 is taken out one by one and transported to the retreat area 9. And a reversing robot 12 for rotating the substrate 2 by 180 degrees so that the substrate 2 is turned upside down is provided in the retreat area 9.

Inside the rinsing drying tank 5, a rinsing area 13 for rinsing the substrate 2 and a drying area for drying the substrate 2 are provided. And a brush scrub tank 4 and a rinse drying tank 5
A second substrate transport robot 14 that transports the substrate 2 delivered from the reversing robot 12 to the rinsing drying area 13 is provided in a transfer path between the two.

The substrate 2 after the final step (drying step) is stored in the second storage container 6 in a stacked state at predetermined intervals in a vertical posture in the front-rear direction. The second storage container 6 is also configured to move in the front-rear direction by the operation of a driving means such as a driving cylinder, and a lid body such as a slide type shutter that opens and closes an upper opening is disposed at an upper end thereof. (Not shown). The lid is configured to slightly open the upper opening only when the substrate 2 is stored. A transfer path between the rinsing drying tank 5 and the second storage container 6 is provided with a third substrate transfer robot 15 for storing the substrate 2 transferred in the rinsing drying area 13 in the second storage container 6. Has been deployed.

First, second and third substrate transfer robots 1
Reference numerals 1, 14, and 15 respectively denote sliders 17 slidably supported by upper and lower two-stage horizontal rails 16 extending horizontally in the process flow direction, and integrally formed with the respective sliders 17 and extending vertically. Each of the vertical rails 18 extends, each of the support brackets 19 slidably supported by each of the vertical rails 18, and each of the hand units 20 hanging down from each of the support brackets 19. Each of the substrate transfer robots 11, 14, and 15 is configured to move in the process flow direction and to move in the vertical direction by the operation of a drive unit such as a drive cylinder. In addition, these substrate transfer robots, especially first,
The third substrate transfer robots 11 and 15 can turn 90 degrees around the vertical axis.

Each of these substrate transfer robots 11, 14,
As shown in FIG. 2, a hand unit 20 includes a base frame 22 rotatably connected to a lower part of a support bracket 19 via a vertical shaft 21, and a horizontal direction inside the base frame 22. Two guide rods 23 (which may be one or three or more), a pair of hand members 24 which are supported by the guide rods 23 so as to be movable in the axial direction, and extend in the up-down direction; And a gripping control unit 25 for causing the hand member 24 to move toward and away from each other.

The gripping control means 25 includes a driving cylinder 26 such as an air cylinder installed inside the base frame 22, a cam body 28 fixed to a tip end of an extension / retraction rod 27 of the driving cylinder 26, And a coil spring 29 as an elastic body for urging the hand member 24 in the phase approaching direction. The cam body 28 is formed so that both side surfaces are inclined so as to become narrower as it moves to the distal end, and the base ends (two guide rods 2) of the pair of hand members 24.
3), a guide roller 30 with which both side surfaces of the cam body 28 abut is mounted.

A plurality of support rollers (one or more than one hand member 24, four in total in the illustrated example, two for each hand member 24) holding the substrate 2 are mounted on the pair of hand members 24. 31 are mounted, and each of the support rollers 3
A concave groove, such as a V-groove, is formed on the outer peripheral surface of the substrate 1 to restrict the axial movement of the substrate 2 when the substrate 2 is held. The pair of hand members 24 separate and reciprocate to release the holding of the substrate 2 by the reciprocating rod 27 of the drive cylinder 26 protruding, and the pair of hand members 24 reciprocate by reciprocating. The hand member 24 moves close to each other and holds the substrate 2 by the spring force of the coil spring 29.

The reversing robot 12 is configured to reciprocate within a predetermined size range in the process flow direction, and has two hand units 32,
33 (see FIG. 1). The substrate 2 is transferred from the upstream side to the hand unit 32 on the upstream side in the process flow direction (hereinafter, simply referred to as the upstream side), and the hand unit 32 on the downstream side in the process flow direction (hereinafter, simply referred to as the downstream side). The hand unit 33 is configured to transfer the substrate 2 from the downstream side. Note that the two hand units 32 and 33 are configured to rotate integrally by 180 degrees.

More specifically, as shown in FIG. 3, the reversing robot 12 includes a base frame 34 common to the two hand units 32 and 33, and the base frame 34 is horizontally It is rotatably supported by 180 degrees via a shaft (not shown). With respect to the other components, the two hand units 32 and 33 have substantially the same configuration as the above-described hand units 20 of the substrate transfer robots 11, 14, and 15, respectively. That is, although not shown in detail, each hand unit 3 of the reversing robot 12 is
Reference numerals 2 and 33 denote, respectively, two (one or three or more) guide rods arranged in parallel in the vertical direction inside the base end frame 34, and a phase approaching movement and a phase separation reaction with these guide rods. A pair of hand members 35, 36, which are supported and extend in the front-rear direction,
36 is provided with grip control means for causing the 36 to move toward and away from each other.

Each of the grip control means is provided with a base frame 34.
A drive cylinder such as an air cylinder installed in the drive cylinder, a cam body fixed to an extension / retraction rod of each drive cylinder, and a coil spring as an elastic body for urging the pair of hand members 35 and 36 in a phase approaching direction. Have. The pair of hand members 35 and 36 are configured to independently move toward and away from each other with each movement of each cam body accompanying the operation of each drive cylinder. The pair of upstream hand members 35 has a plurality of support rollers (one or more than one hand member 35, four in total in the illustrated example, two for each hand member 35) projecting upstream. 35a is attached, and a plurality of hand members 36 on the downstream side protrude downstream (same as above).
Are mounted. In addition, concave grooves such as V-grooves are formed on the outer peripheral surfaces of the support rollers 35a and 36a to restrict the axial movement of the substrate 2 when the substrate 2 is held.

As shown in FIG. 1, the cleaning jig 10 includes a hanger portion 37 and a substrate holding portion 38, and the hanger portion 37 is slidably supported on a vertical rail 39 extending in the vertical direction. It is configured to move up and down by the operation of the driving means. Specifically, the cleaning jig 10
As shown in FIG. 4, the substrate holding unit 38 includes a plurality (three in the example) of rolls 40, 41, and 42 that hold the substrate 2 in a vertical position and rotate the substrate 2 in the circumferential direction. On the outer peripheral surface of these rolls 40, 41, 42, a concave groove such as a V-groove for regulating the axial movement of the substrate 2 when holding the substrate 2 is formed.
2 is mounted on the swing arm 43. In this case, a plurality of (two) rolls 40 and 41 other than the roll 42 mounted on the swing arm 43 are driven to rotate by, for example, the operation of a drive motor and a belt transmission mechanism.

The oscillating arm 43 is configured to oscillate within a predetermined angle range by operation of a driving means (not shown) such as a driving cylinder, and the oscillating arm 20 reaches an oscillating end to one side. In this case, the radial movement and the axial movement of the substrate 2 are restricted by the rolls 40, 41, and 42, and the substrate 2 cannot be removed.
Is reached, the movement restriction of the substrate 2 is released, and the substrate 2 can be removed. Further, the substrate holding portion 38 of the cleaning jig 10 has an L-shape that protrudes forward from the lower end of the hanger portion 37 and hangs downward from the front end thereof. An escape portion 45 is provided to avoid interference with 44.

A pair of rotating brushes 44 arranged in parallel in the front-rear direction are cantilevered inside the rear surface of the brush scrub tank 4, and the pair of rotating brushes 44 are located in the scrubbing cleaning area 8. . Each rotating brush 44
A roller body whose axial dimension is greater than or equal to the radius of the substrate 2 and less than the diameter (2/3 or less of the diameter);
Fine fibers such as nylon fibers are fixed to the outer periphery of 4a. When the substrate holding portion 38 of the cleaning jig 10 has reached the scrubbing cleaning area 8 as shown in the drawing, the tip end portions of the pair of rotary brushes 44 are positioned within the escape portion 45 of the substrate holding portion 38. As a result, the rotating brush 44 and the cleaning jig 10 are in a non-interfering state. Further, the substrate holding unit 3 of the cleaning jig 10
The rotating brush 44 and the cleaning jig 10 are configured so as not to interfere with each other during the process of the intrusion of the cleaning brush 8 into the scrubbing cleaning area 8 and the process of retreating from the scrubbing cleaning area 8.

A pair of driving motors 46 as driving means for driving the respective rotating brushes 44 to rotate are provided outside the rear surface of the brush scrub tank 4. Each rotating brush 44
Are arranged so as to come into contact with the portions from the outer periphery to the center on both the front and back surfaces of the substrate 2, so that both the rotating brushes 44 are urged in directions approaching each other during scrubbing cleaning. Each of the rotating brushes 44 is configured to reciprocate in a predetermined dimension range and at a predetermined cycle in the axial direction by the operation of a driving means such as a driving cylinder, and to move in mutually approaching and separating directions. It is configured. A pair of spray pipes 47 extending in the front-rear direction are disposed inside the upper end of the brush scrub tank 4 so that the cleaning liquid is sprayed from the spray nozzles 48 of the spray pipes 47 to the rotary brushes 44 and the periphery thereof. It has become.

Further, the brush scrub tank 4 is provided with an auxiliary cleaning means 49 for removing particles, brush residue and the like attached to the rotating brush 44. As a first example, as a first example, the auxiliary cleaning means 49 is provided as a fluid ejecting means extending in the outer peripheral space (upper space in the illustrated example) of the pair of rotating brushes 44 in the same direction as the pair of rotating brushes 44, as shown in FIG. A pair of cleaning pipes 50 are provided, and a plurality of cleaning nozzles 5 as injection units are provided on the pair of cleaning pipes 50.
1 (or fluid ejection ports) are arranged at a predetermined pitch along the longitudinal direction. Each cleaning nozzle 51 is a so-called pin spot type in which the fluid diameter is maintained at a small diameter even after the fluid ejection.

In this case, the injection port of each cleaning nozzle 51, that is, the jet direction of the fluid is offset in a direction symmetrically opposite to each axis of each rotary brush 44 as shown in FIG. 5B. I have. More specifically, the ejection direction is offset to a position that does not interfere with the shaft portion 44a of the rotating brush 44. The direction of rotation of each rotary brush 44 is set to a direction in which an upward pressing force is applied to the substrate 2 as shown by an arrow a, and accordingly, the direction of fluid ejection from each cleaning nozzle 51 is The directionality of the rotating brush 44 is set so as to be substantially the same as the direction of movement of the injection portion.

The pair of cleaning pipes 50 are connected at their base ends by a connecting pipe 53 (see FIG. 5A), and are supplied with a high-pressure water, a high-pressure cleaning liquid, or a high-pressure air through a feeding pipe 54 communicating with the connecting pipe 53. , Or a cleaning fluid, such as a mixed fluid obtained by arbitrarily selecting and combining them, is fed to the cleaning pipe 50 by pressure. And a pair of cleaning pipes 50 are the side part (rear part) of the brush scrub tank 4.
The rotary cylinder 44 is reciprocated in a predetermined dimensional range (for example, a dimensional range corresponding to the arrangement pitch of the cleaning nozzles 51) along the axial direction of the rotating brush 44 by the operation of the driving cylinder 55 as a driving unit. It is configured to move.

The auxiliary cleaning means 49 directs the cleaning fluid from each cleaning nozzle 51 to the rotating brush 44 rotating at regular intervals or whenever the number of substrates 2 subjected to scrubbing cleaning reaches a predetermined number. To inject. Then, while this injection is being performed, the cleaning pipe 50 reciprocates in the axial direction. Thus, particles, brush residue, and the like attached to the rotating brush 44 during the scrubbing cleaning are washed away.

In this case, since the jetting direction of the cleaning fluid from the cleaning nozzle 51 is offset with respect to the axis of the rotating brush 44, particles or the like pressed by the cleaning fluid cause the rotating brush 44 to rotate. The particles and the like do not remain around the portion 44a and are reliably washed away. Also,
Since the cleaning pipe 50 reciprocates in the axial direction, the cleaning fluid is sprayed over the entire area of the rotating brush 44 in the axial direction, even though the spray area from each cleaning nozzle 51 is narrow. If the reciprocating range of the cleaning pipe 50 is a dimension corresponding to the arrangement pitch of the cleaning nozzles 56, the cleaning fluid is efficiently and uniformly jetted.

On the other hand, as a second example, as shown in FIGS. 6 (a) and 6 (b), the auxiliary cleaning means 49 is provided on the outer circumferential side of the pair of rotating brushes 44 rotating in the direction of the arrow (in the example shown in FIG. One or two or more pairs of cleaning nozzle units 56 (pin spot type) as fluid ejecting means are provided in the space (space). The cleaning nozzle units 56 are movably supported over the entire length of the rotary brush 44 in the axial direction, and the cleaning nozzle units 56 are moved by the operation of a driving unit such as a driving cylinder (not shown).
Also in this case, high-pressure water,
High-pressure cleaning liquid, or high-pressure air, or a cleaning fluid consisting of a mixed fluid and the like arbitrarily selected and combined,
Injection is performed toward the outer periphery of each rotating brush 44 that is rotating. The direction in which the cleaning fluid is jetted from each cleaning nozzle unit 56 is offset in a direction symmetrically opposite to each axis of each rotating brush 44. Further, the direction in which the cleaning fluid is ejected from the cleaning nozzle 56 and the rotating brush 4
4 is set so that the direction of movement of the injection site is substantially the same as the direction of movement.

Further, as a third example, the auxiliary cleaning means 49 rotates the rotating brush 44 at a higher speed than in scrubbing cleaning, and separates particles and the like adhering to the rotating brush 44 by centrifugal force. I do. In this case, the rotating brush 44 rotates at a high speed higher than that at which particles and the like can be separated by centrifugal force. Specifically, it is preferable that the rotation speed of the rotating brush 44 at the time of performing the centrifugal separation be 5 to 1000 times the rotation speed at the time of scrubbing cleaning. If it is less than 5 times, the effect of removing particles and the like due to sufficient centrifugal force cannot be obtained, and
If it is 0 times or more, a problem in performance of the drive motor 46 occurs. More preferably, the rotating brush 4 during the centrifugation is used.
The number of rotations of 4 is set to 10 to 500 times the number of rotations at the time of scrubbing cleaning. If it is 10 times or less, there is a problem in obtaining a more appropriate action of removing particles and the like by centrifugal force, and if it is 500 times or more, it becomes difficult to reduce the size of the drive motor 46. Occurs. The drive motor used at the time of cleaning the rotating brush 44 may be the same as or different from the drive motor 46 used at the time of scrubbing cleaning.

In the first and second examples described above,
As in the third example, it is preferable that the rotation speed of the rotating brush 44 during the auxiliary cleaning be higher than the rotation speed during the scrubbing cleaning.

FIG. 7 shows a substrate spinning device 57 provided at a position corresponding to the rinsing drying tank 5. The substrate spin device 57 includes a spin unit 58 as a spin unit for rotating the substrate 2 while holding it in a vertical position. The spin unit 58 is disposed in the rinse drying area 13 in the rinse drying tank 5. I have. More specifically, the substrate spinning device 57 includes a chuck mechanism 59 that holds the substrate 2 in a vertical position.
A rotation driving mechanism 60 for rotating the substrate 2 gripped by the chuck mechanism 59; a release mechanism 61 for releasing the gripping of the substrate 2 by the chuck mechanism 59;
And a tilt mechanism 62 for tilting the substrate 2 gripped by 9 from a vertical posture. In this case, a mounting member 81 is provided on the base 112 on the downstream side of the rinsing drying tank 5, and a rotating base 83 is rotatably supported by the mounting member 81 via a bearing 82. This rotating base 83
A chuck mechanism 59 is integrally rotatably connected to the upstream side of.

As shown in FIGS. 8 and 9, a plurality of (at least three or more, in the illustrated example, six) chuck mechanisms 59 are arranged at predetermined circumferential positions on the outer peripheral side of the annular rotating body 63. Gripping members 64 and these gripping members 64
And a link mechanism 65 as a linear moving mechanism for linearly moving each of them in the radial direction of the substrate 2. In this case, the spin part 58 is constituted by a plurality of gripping members 64 that grip the substrate 2 in a vertical posture and rotate in the circumferential direction. Each gripping member 64 is extended from the outer periphery of the annular rotating body 63 to the upstream side along the process flow direction, and the leading end is bent at an obtuse angle toward the outer periphery, and is bent at the leading end of the inclined portion 66. The concave portion 67 with which the outer peripheral end surface of the substrate 2 contacts
Are formed. The link mechanism 65 includes a linear link 68 extending in the radial direction, and a swing link 69 connected to the linear link 68 and arranged along the process flow direction. More specifically, the linear link 68 has a base end of the gripping member 64 fixed to an outer peripheral end thereof,
Are slidably supported in the radial direction via a bearing 70. The swing link 69 has a linear motion link 6 at its upstream end.
8 is rotatably connected to an inner peripheral end thereof, and an intermediate portion in the longitudinal direction is swingably supported via a support pin 72 on a support connecting member 71 for connecting and fixing the annular rotating body 63 and the rotating base 83. Have been.

In this case, the linear link 68 and the swing link 6
9 is connected to a linear motion link 68 as shown in FIG.
A long hole 74 elongated in the process flow direction is formed in a connection bracket 73 fixed to the inner peripheral end of the shaft, and a connecting pin 75 fixed to the upstream end of the swing link 69 penetrates the long hole 74. It is configured. A coil spring 76 as an elastic member is provided between the connecting bracket 73 and the bearing 70 so as to bias the linear motion link 68 toward the inner peripheral side to apply a gripping force toward the center of the substrate 2 to the gripping member 64. Is interposed. Further, the swing link 69 has a support pin 7
A weight 77 having a predetermined weight is fixed to a portion downstream of the substrate 2, and a centrifugal force acts on the weight 77 in a direction in which the gripping force of the gripping member 64 on the substrate 2 increases when the chuck mechanism 59 rotates. It is configured. In addition, between a connecting body 78 that connects and fixes the gripping member 64 and the linear motion link 68, and a member 79 that covers the outer peripheral side of the bearing 70,
More specifically, the outer peripheral side of the linear motion link 68 is covered between the connecting body 78 and the projecting body 79 protruding from the outer peripheral side of the annular rotating body 63 corresponding to each gripping member 64. A bellows-like member (bellows) 80 that expands and contracts with the radial movement of the dynamic link 68 is provided.

As shown in FIG. 7, the rotation drive mechanism 60
The rotation torque from the drive motor 84 is transmitted to the rotation base 81 and eventually to the chuck mechanism 59. Specifically, a timing pulley,
An auxiliary mounting member 88 fixed to a driven wheel 86 composed of a V pulley, a sprocket, and the like (hereinafter, referred to as a wheel) and fixed to a downstream side of the mounting member 81 via a predetermined gap.
And a drive belt 84 fixed to the output shaft of the drive motor 84 and an endless drive belt 87 composed of a timing belt, a V-belt, a chain, etc., extending over a driving wheel 85 and a driven wheel 86. It is constructed by winding.
The rotation drive mechanism 60 may include a gear train or the like that transmits the rotation torque of the output shaft of the drive motor 84 to the rotating base 83.

As shown in FIG. 11, the release mechanism 61 includes a driving cylinder 89 such as an air cylinder fixed to an auxiliary mounting member 88, and a pressing member 91 fixed to the tip of a rod 90 of the driving cylinder 89. A plurality of moving rods 92 with which the pressing members 91 can be brought into contact with and separated from each other and supported by the rotating base 83 so as to be movable in the process flow direction; A guide shaft 93 having a fixed portion and a slide member 94 movably supported along the guide shaft 93 are provided.

As shown in FIG. 10, the slide member 94 is externally fitted on the guide shaft 93 so as to be movable in the axial direction and is arranged in series. And two annular covering members 96 arranged in series and arranged in series. A coil spring 98 as an elastic body is interposed between the flange 97 formed at the upstream end of the guide shaft 93 and the slide member 94, and the slide member 94 is moved downstream by the coil spring 98. Being energized.

Each of the two covering annular bodies 96 is formed with an annular convex portion 99 protruding to the outer peripheral side. The two annular convex portions 99 are provided at circumferential positions corresponding to the link mechanisms 65, respectively. A pair of locking projections 1 facing each other with a predetermined gap therebetween
00 are fixed. Further, a protruding piece 101 formed at an intermediate portion in the longitudinal direction of the swing link 69 so as to protrude inward is inserted between the locking projections 100.
In this case, the protruding piece 101 extends in the radial direction about the support pin 72.

Therefore, when the extension / retraction rod 90 of the driving cylinder 89 is protruded, the pressing member 91 moves the moving rod 92 to the upstream side, and accordingly, the slide member 94 resists the spring force of the coil spring 98. Then, by moving to the upstream side, the locking projection 100 on the downstream side pushes and swings the protruding piece 101, and swings the swing link 69 around the support pin 72. Thereby, the linear link 68 of each link mechanism 65 moves to the outer peripheral side against the spring force of the coil spring 76, and each gripping member 64 moves linearly to the outer peripheral side as shown by a chain line in FIG. . As a result, the holding of the substrate 2 by each gripping member 64 is released.

When each gripping member 64 and each link mechanism 65 are rotated by the operation of the rotary drive mechanism 60, the centrifugal force acting on the gripping member 64 and the centrifugal force acting on the weight 77 are set to be balanced. ing. That is, the force by which the gripping member 64 tries to link the link mechanism 65 to one side during rotation and the force by which the weight 77 tries to link the link mechanism 65 to the other side are set to be substantially the same. Have been. Therefore, the gripping force acting on the substrate 2 from each gripping member 64 during rotation is substantially equal to the sum of the spring forces of the coil spring 98 on the guide shaft 93 side and the coil springs 76 on each linear motion link 68 side.

When each gripping member 64 holds the board 2, each coil spring 7 on each translation link 68 side
6 may be set to have a natural length. In this case, the gripping force is substantially equal to the spring force of the coil spring 98 on the guide shaft 93 side. Further, in the same state, the coil spring 98 on the guide shaft 93 side may be set to have a natural length.
It becomes substantially equal to the sum of the spring forces of the coil springs 76 on the eighth side. Similarly, in order to obtain a gripping force by only one of the coil springs, one of the coil springs on the side of each linear motion link 68 or the guide shaft 93 may be omitted.

As shown in FIG. 7, a rinsing liquid jetting means for jetting a rinsing liquid such as pure water to both the front and back surfaces of the substrate 2 held by the gripping member 64 is provided on the inner side surface of the rinsing drying tank 5. Are mounted. In this case, the gap 103 between the gripping members 64 (see FIG. 8) with respect to the back surface (downstream surface) of the substrate 2
Is set such that the rinse liquid is injected and supplied from the injection nozzle 102 through the nozzle. In addition, on the surface (upstream surface) of the annular rotator 63, a covering disk 104 that covers the inner peripheral opening is mounted.

The tilt mechanism 62 supports the mounting member 81 over a lower support member 105 as a base member fixedly installed on the base 112 via a support shaft 106 in the front-rear direction so as to be tiltable. It is configured. Then, the attachment member 81 is configured to be tilted in the process flow direction by the operation of the driving means 107 including a driving cylinder such as an air cylinder. Specifically, as shown in FIG.
The lower support members 105 are provided on both front and rear sides of the mounting member 81, respectively, and each of the support shafts 106 rotatably supported by the lower support members 105 is mounted on the mounting member 8 respectively.
The lower end portion 1 is connected to both front and rear sides. In this case, each support shaft 106 serving as a tilt center is disposed at a position lower than the lowest part of the rotation locus of the gripping member 64. Each of the support shafts 106 may be disposed at a height between the lowest part and the highest part of the rotation locus of the gripping member 64, or may be disposed at a position higher than the highest part of the rotation locus of the gripping member 64. May be arranged.

The tip of the extension rod 108 of the drive cylinder 107 is connected to the bracket 10 fixed to the back surface of the mounting member 81.
9 and the cylinder member 1
10 rear end is a bracket 111 fixed to the base 112
(See FIG. 7). The axis of the drive cylinder 107 is inclined at a predetermined angle (for example, approximately 45 degrees) in a vertical plane along the process flow direction. When the extension rod 108 of the drive cylinder 107 moves backward by a predetermined distance from the state shown in FIG. 7, the surface of the mounting member 81 is directed obliquely upward, and is accordingly held by each gripping member 64. The surface of the substrate 2 is also directed obliquely upward by the same angle. Conversely, when the retracting rod 108 protrudes, the surface of the mounting member 81 and the surface of the substrate 2 are directed obliquely downward by the same angle. Note that an opening 5a through which a connecting portion (smaller than the arrangement diameter of the gripping members 64) between the rotating base 83 and the chuck mechanism 59 is inserted in one side surface portion (downstream side portion) of the rinsing drying tank 5. Is formed. The size and position of the opening 5a are set such that interference does not occur between the opening 5a and the connecting portion even when the components provided on the mounting member 81 are inclined as described above. .

The substrate cleaning apparatus having the above configuration performs each processing on the substrate 2 according to the following procedure.

When the first substrate transfer robot 11 shown in FIG. 1 takes out the substrate 2 from the first storage container 3 arranged at the upstream end, the hand unit 20 is moved 90 degrees from the state shown in FIG. In a state where the substrate 2 is turned in the direction b, the substrate 2 is moved downward after holding the substrates 2 arranged in the front end row by the support rollers 31 of the pair of hand members 24. And the first storage container 3 is provided with the first substrate transfer robot 11.
By the operation of the driving means, the substrate 2 is moved forward by a dimension corresponding to the storage space for one substrate 2 until the next substrate 2 is taken out. Therefore, the first substrate transfer robot 11 can accurately take out the substrate 2 from the first storage container 3 even if it does not have a function of moving in the front-rear direction.

The holding operation of the substrate 2 is performed by pushing the cam body 28 down by protruding and retracting the rod 27 of the drive cylinder 26 shown in FIG. In this state, the support rollers 31 of both hand members 24 are positioned in the space on the outer peripheral side of the substrate 2. Thereafter, the width of the pair of hand members 24 is reduced by the spring force of the coil spring 29 by moving the extension / retraction rod 27 of the drive cylinder 26 backward and raising the cam body 28. Thus, the substrate 2 is held by the support rollers 31.

In this case, the hand member 24 of the first substrate transfer robot 11 moves down and up to move the first storage container 3
When passing through the upper opening of the storage container 3, the lid provided at the upper opening of the storage container 3 closes the upper opening by a small width within a range in which the hand member 24 can pass. It is opened and the upper opening is closed by the lid after passing through the hand member 24.

On the other hand, since the inside of the first storage container 3 is filled with the atomized liquid (a liquid obtained by atomizing the wetting liquid) sprayed from the spray nozzle 7, the first storage container 3 is housed therein. Both front and back surfaces of the plurality of substrates 2 are in a wet state. Therefore, the dirt adhering to the substrate 2 is not dried, and is maintained in a wet state equivalent to the case where the dirt is immersed in the liquid, which makes it difficult for dirt to be removed in a subsequent scrubbing cleaning step. Be avoided.

After the first substrate transfer robot 11 moves up to a predetermined height while holding the substrate 2, the hand unit 20 is turned 90 degrees in the direction a in FIG. State, the first substrate transfer robot 11 is moved from this state to a position downstream of the reversing robot 12, and the first substrate transfer robot 11 is further moved down.
The hand unit 20 and the hand unit 33 on the downstream side of the reversing robot 12 face each other. Thereafter, by moving the pair of hand members 36 on the downstream side of the reversing robot 12 by the same operation as described above, the substrate 2 held by the first substrate transport robot 11 is moved to the downstream side of the reversing robot 12. The state is also held by the hand unit 33. From such a state, by expanding the width between the pair of hand members 24 of the first substrate transfer robot 11, the substrate is transferred from the first substrate transfer robot 11 to the hand unit 33 on the downstream side of the reversing robot 12. 2 is completed. In this case, the hand member 24 of the first substrate transfer robot 11 extends in the up-down direction, whereas the hand member 36 of the reversing robot 12 extends in the front-rear direction. Does not interfere with the delivery.

Simultaneously with such an operation or with a slight time difference, the hand member 35 on the upstream side of the reversing robot 12 and the substrate holding portion 38 of the cleaning jig 10 face each other, and the cleaning jig 10 is held. The processed substrate 2 is transferred to the hand member 35 on the upstream side of the reversing robot 12.
The transfer of the substrate 2 in this case is performed in the same manner as described above on the reversing robot 12 side, and on the cleaning jig 10 side, the swing arm 43 is swung in a predetermined direction to release the roll 42 from the substrate holding position. This is done by moving it to a position.

Thereafter, when the first substrate transport robot 11 retreats and moves to the first storage container 3 side again, the reversing robot 12 rotates 180 degrees to hold the substrate 2 before the cleaning process. The hand member 36 moving to the upstream side, and the hand member 3 holding the substrate 2 after the cleaning process
5 moves downstream. Under such a state, the substrate 2 before the cleaning process held by the reversing robot 12 is transferred to the cleaning jig 10, and the substrate 2 after the cleaning process is transferred to the second substrate transfer robot 14. .

After the substrate 2 before the cleaning process is transferred from the reversing robot 12 to the cleaning jig 10, the cleaning jig 10 moves down to reach the scrubbing cleaning area 8 in the brush scrub tank 4. At this point, as shown in FIG. 4, the pair of rotating brushes 44 comes into contact with a portion from the outer periphery to the center of the substrate 2, and scrubbing cleaning is performed in such a state. That is, a rotational torque is applied to the two rolls 40 and 41 by the operation of a drive motor and a belt transmission mechanism (not shown), and the substrate 2 rotates in the circumferential direction in a vertical posture, and each rotating brush 44 drives the drive motor. The substrate 2 is rotated in the opposite direction by the operation of 46, and the cleaning operation for the substrate 2 is performed under the supply of the cleaning liquid from the injection nozzle 48 of the injection pipe 47.

In this case, although the axial dimension of the rotating brush 44 is smaller than the diameter of the substrate 2, the scrubbing cleaning by the rotating brush 44 is performed because the substrate 2 is rotating in the circumferential direction.
It is applied evenly over the entire surface of the substrate 2. Moreover, the substrate 2
Is rotated in a state where an edge portion (outer peripheral end surface portion) is exposed, so that the edge portion is also appropriately scrubbed and cleaned by the rotating brush 44. After such a cleaning operation is performed for a predetermined time, the cleaning jig 10 moves upward to transfer the substrate 2 to the retreat area 9, and the reversal robot 12 is moved from the cleaning jig 10 to the retreat area 9 as described above. The substrate 2 after the cleaning process is transferred to the second substrate transport robot 1 from the reversing robot 12 as described above.
Passed to 4.

Thereafter, the second substrate transfer robot 14
After moving a predetermined distance to the downstream side, it is moved downward to rotate the spin part 58 of the substrate spin device 57 in the rinse drying tank 5.
The substrate 2 is transferred to the (gripping member 64). At the time of this delivery, the extension / retraction rod 90 of the drive cylinder 89 of the release mechanism 61 shown in FIG. 7 is protruded and the gripping member 64 of the chuck mechanism 59 is linearly moved to the outermost moving end position shown by the chain line in FIG. With the movement, the extension / retraction rod 108 of the drive cylinder 107 of the tilt mechanism 62 retreats, and the mounting member 81
Are tilted integrally at a predetermined angle, and the surface side of the chuck mechanism 59 is directed obliquely upward. Therefore, the plurality of gripping members 64 are in a state in which the lower gripping members 64 protrude more toward the front side than the upper gripping members 64.

In this state, when the second substrate transfer robot 14 holding the substrate 2 moves down, the holding member 64 of the chuck mechanism 59 and the substrate 2 do not interfere with each other, and the substrate 2 is passed. That is, when the second substrate transfer robot 14 moves down vertically, if the chuck mechanism 59 is supported in the vertical posture, the grip member 64 located above the chuck mechanism 59
The substrate 2 comes into contact with the substrate and its downward movement is prevented.
However, if the chuck mechanism 59 is inclined as described above, the substrate 2 can be moved down to the vicinity of the lower gripping member 64 without interfering with the upper gripping member 64. In this case, the pair of hand members 24
Pass through the gap 103 between the gripping members 64.

When the substrate 2 reaches the lower end,
Extension rod 10 of drive cylinder 107 of tilt mechanism 62
By causing the mounting member 81 to protrude, each component mounted on the mounting member 81 is returned to the vertical posture. After this return, the extension rod 90 of the drive cylinder 89 of the release mechanism 61
Is retracted, the slide member 94 moves to the downstream side by the spring force of the coil spring 98 on the guide shaft 93 side, and accordingly, each link mechanism 65 performs a link operation to move the linear motion link 68 to the inner peripheral side. Moving. As a result, each gripping member 64 moves linearly toward the inner peripheral side, and the substrate 2 is moved by the spring force of the coil spring 98 on the guide shaft 93 side and / or the coil spring 76 on the direct link 68 side.
Is held. In this case, the gripping force of each gripping member 64 is
Since it acts toward the center (center of gravity) of the substrate 2, no shear force or bending stress acts on the substrate 2,
The occurrence of chipping or cracking of the substrate 2 is avoided. Further, since each gripping member 64 moves linearly, even if the gripping member 64 is short, the gripping member 64 can be sufficiently expanded by moving to the outer peripheral side, and the gripping operation of the substrate 2 (the same applies to the releasing operation). ) Can be performed smoothly, and the length of the holding member 64 can be reduced, and the size of the substrate spin device 57 can be reduced.

Thereafter, the width between the pair of hand members 24 of the second substrate transfer robot 14 is expanded to release the holding of the substrate 2 by the second substrate transfer robot 14, and the substrate 2 is held by the chuck mechanism. The state is held by only each of the gripping members 64 of 59. From such a state, the drive cylinder 107 of the tilt mechanism 62 is operated to move the substrate 2
Is shifted to a state in which the surface of the member is directed obliquely downward (in this state, the gripping member 64 located below also moves slightly upstream at the same time as the inclination), or the second state in a state where the chuck mechanism 59 is supported in a vertical posture. By slightly moving the substrate transfer robot 14 to the downstream side,
(Support roller 31) and substrate 2 are separated from each other in the process flow direction. As a result, the second substrate transport robot 14 moves upward and retreats from the rinse drying area 13 without interference between the hand member 24 and the substrate 2, and is again moved to the reverse robot 12.
Reversing robot 12 to transfer the substrate 2 between
Move to the side.

When the drive motor 84 of the rotary drive mechanism 60 rotates while the chuck mechanism 59 is supported in the vertical position, the chuck mechanism 59 and the substrate 2 held by the chuck mechanism 59 are rotated in the vertical position. As a result, the rinsing liquid is sprayed and supplied from the plurality of spray nozzles 102 to the front and back surfaces of the substrate 2. By performing such an operation for a predetermined time, the cleaning liquid or the like adhering to the substrate 2 is washed away, and the rinsing cleaning process is completed.

Thereafter, the supply of the rinsing liquid from the injection nozzle 102 is stopped, and the drive motor 84 is rotated at a higher speed than during the rinsing cleaning process, so that the rinsing liquid adhering to the substrate 2 is removed. Centrifuge. During the drying process by such an operation, the rinsing liquid scattered by the centrifugal separation or the like and the rinsing liquid attached to the upper surface of the rinsing drying tank 5 are dropped.
If the surface of the substrate 2 is more important than the rear surface, such as a pattern formation surface, it is necessary to protect the surface of the substrate 2 from dripping of the rinsing liquid. Therefore, in such a case, before the drying process is performed, the drive cylinder 107 of the tilt mechanism 62 is operated so that the surface of the substrate 2 is directed obliquely downward. Drive motor 84 is rotated at a high speed. As a result, the rinsing liquid or the like scatters in an oblique direction and does not scatter vertically upward, so that the rinsing liquid or the like does not drip toward the substrate 2 or even if it drips toward the substrate 2. The droplets are dropped on the back surface of the substrate 2, and the surface of the substrate 2 is subjected to a drying process in an extremely clean state. In the latter case, on the back surface of the substrate 2, the dropped rinsing liquid or the like is subjected to centrifugal separation again, so that an appropriate drying treatment is performed. If the centrifugal separation operation is performed until the state where no drying occurs, the drying treatment is not hindered.

Then, at the time when the drop of the rinsing liquid does not occur (at this time, the surface of the substrate 2 is directed obliquely downward), the third substrate transport robot 15 is moved to the lower end. Immediately after that, the drive cylinder 107 of the tilt mechanism 62 is operated to bring the substrate 2 into the vertical position, so that the substrate 2 and the hand member 24 of the third substrate transfer robot 15 face each other. As another example for performing such facing, as the substrate 2 held by the chuck mechanism 59 is in a vertical posture, the third substrate transfer robot 15 is moved to the lower end, and Immediately after that, the third substrate transfer robot 15 may be slightly moved to the upstream side. Then, in such a state, after the substrate 2 is held by the third substrate transfer robot 15, the drive cylinder 89 of the release mechanism 61 is operated to release the holding of the substrate 2 by each gripping member 64. Thereafter, the drive cylinder 107 of the tilt mechanism 62 is operated so that the surface side of the chuck mechanism 59 is directed obliquely upward. Under this state, the third substrate transport robot 15 is moved upward to move it upward. The substrate 2 is transferred vertically upward by the third substrate transfer robot 15 without causing interference between the existing holding member 64 and the substrate 2.

As described above, the third substrate transfer robot 15
Receives the substrate 2 from the substrate spin device 57 (the second substrate transfer robot 14
Similarly, the substrate transfer robot 15 (1
In 4), an appropriate operation can be performed simply by moving the rinsing drying tank 5 up and down, and a small amount of movement is required even if the apparatus moves in the process flow direction. Therefore, it is possible to avoid an increase in the capacity of the rinse drying tank 5 and an increase in the size of the substrate cleaning apparatus 1.

Then, after the third substrate transfer robot 15 moves up to the predetermined height position, moves to the downstream side by a predetermined distance, and reaches the upper part of the second storage container 6, the hand unit 20 Pivots downward by 90 degrees in the direction d from the state shown in the figure and moves downward to store the substrate 2 in the front end row in the second storage container 6. By the operation of the driving means, the second storage container 6 is moved backward by a dimension corresponding to the storage space for one substrate 2 until the next storage of the substrate 2 by the third substrate transfer robot 15. Go to

Therefore, the third substrate transfer robot 15
Can accurately store the substrate 2 in the second storage container 6 without having the function of moving in the front-rear direction. Note that the second substrate transfer robot 14 also
The transfer of the substrate 2 between the reversing robot 12 and the substrate spinning device 57 can be accurately performed even if the substrate 2 does not have a function of moving in the front-rear direction.

In this case, the first and second substrate transfer robots 14 are dedicated to the transfer of the wet substrate 2, and the third substrate transfer robot 15 is dedicated to the transfer of the dry substrate 2. Therefore, each component of the third substrate transfer robot 15 does not get wet, so that the second storage container 6 has a high quality
Can be stored.

Further, since the rinsing cleaning process and the drying process for the substrate 2 are performed in a single rinsing drying tank 5,
Compared with the conventional case where the rinsing tank and the drying tank are separately provided, the number of components to be arranged in the process flow direction is reduced, and the substrate cleaning apparatus is further downsized.

In the above embodiment, the mounting member 81 of the substrate spinning device 57 is positioned on the downstream side,
Although the position 8 is located on the upstream side, the mounting member 81 may be located on the upstream side and the spin portion 58 may be located on the downstream side.

[0078]

As described above, according to the present invention, since the tilt mechanism for tilting the substrate held by the chuck mechanism is provided, the substrate can take a plurality of postures by the operation of the tilt mechanism. A single apparatus can appropriately cope with a plurality of types of processing, and the accuracy of each processing can be ensured according to the type of processing, thereby improving the product yield.

The tilt mechanism is constituted by supporting the mounting member on which the rotating base is rotatably supported by the base member so as to be tiltable, so that the rotation can be performed only by the tilting operation of the mounting member with respect to the base member. Since the base, the chuck mechanism, and the substrate are tilted integrally, the configuration of the tilt mechanism can be simplified as compared with the case where the tilting operation is performed between other components.

If the mounting member is provided with a rotary drive mechanism, the substrate can be tilted without causing a relative positional relationship between the rotating base supported by the mount member and the rotary drive mechanism. This makes it possible to prevent malfunction of each component due to tilting.

If the chuck mechanism is configured to grip the substrate in a vertical position, the working space in the flow direction of the process in the case where the line operation is performed, as compared with the case where the substrate is gripped in a horizontal position. Can be reduced, and the working equipment can be made more compact. In addition, the surface of the substrate can be protected against liquid dropping from above by tilting the substrate from the vertical position so that the surface is directed obliquely downward by the operation of the tilt mechanism.

Even when the substrate spinning device according to the present invention is applied to a device provided with a weight on which a centrifugal force acts in a direction to increase the gripping force of the substrate by the chuck mechanism when the rotating base is rotated, the above-described spinning device can be used. Various advantages can be enjoyed.

Further, by incorporating the substrate spinning apparatus according to the present invention into a substrate cleaning apparatus that sequentially executes a scrubbing cleaning step, a rinsing cleaning step, and a drying step on a transferred substrate, the above-described various advantages can be obtained. Is realized.

[Brief description of the drawings]

FIG. 1 is a perspective view showing a schematic overall configuration of a substrate cleaning apparatus incorporating a substrate spinning apparatus according to an embodiment of the present invention.

FIG. 2 is a vertical cross-sectional side view of a substrate transport robot provided in a substrate cleaning apparatus incorporating a substrate spinning apparatus according to an embodiment of the present invention.

FIG. 3 is a schematic perspective view showing a reversing robot provided in the substrate cleaning apparatus in which the substrate spinning apparatus according to the embodiment of the present invention is incorporated.

FIG. 4 is a perspective view showing an internal structure of a brush scrub tank provided in a substrate cleaning device in which the substrate spinning device according to the embodiment of the present invention is incorporated.

FIG. 5 is a perspective view of a main part (FIG. 5A) and an elevation view of a main part showing an example of an auxiliary cleaning device provided in the substrate cleaning device in which the substrate spin device according to the embodiment of the present invention is incorporated. 5
(B)).

FIG. 6 is a perspective view of a main part showing another example of the auxiliary cleaning device provided in the substrate cleaning apparatus in which the substrate spinning device according to the embodiment of the present invention is incorporated (FIG. 6A), and a front view of the main part. (FIG. 6
(B)).

FIG. 7 is a vertical sectional front view showing the substrate spinning device according to the embodiment of the present invention.

FIG. 8 is a single side view of the substrate spinning apparatus according to the embodiment of the present invention.

FIG. 9 is an enlarged vertical sectional front view showing a main part of the substrate spinning device according to the embodiment of the present invention.

FIG. 10 is an enlarged vertical sectional front view showing a main part of the substrate spinning device according to the embodiment of the present invention.

FIG. 11 is an enlarged vertical sectional front view showing a main part of the substrate spinning device according to the embodiment of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Substrate cleaning apparatus 2 Substrate 57 Substrate spin apparatus 59 Chuck mechanism 60 Rotation drive mechanism 62 Tilt mechanism 77 Weight 81 Mounting member 83 Rotating base 105 Lower support member (base side member)

Claims (6)

[Claims] 1. A substrate spinning apparatus comprising: a rotating base that is rotated by an operation of a rotation drive mechanism; and a chuck mechanism that is integrally rotatably connected to the rotating base and grips a substrate, wherein the chuck mechanism is gripped by the chuck mechanism. A substrate spin device comprising a tilt mechanism for tilting a substrate. 2. The substrate according to claim 1, wherein the tilt mechanism is configured such that a mounting member rotatably supporting the rotating base is supported on a base member so as to be tiltable. Spin device. 3. The substrate spinning apparatus according to claim 2, wherein said mounting member is provided with said rotation drive mechanism. 4. The substrate spinning apparatus according to claim 1, wherein the chuck mechanism is configured to grip the substrate in a vertical posture. 5. A weight provided with a centrifugal force acting in a direction to increase a gripping force of the substrate by the chuck mechanism during rotation of the rotating base.
5. The substrate spinning apparatus according to any one of items 1 to 4, 6. The substrate spinning apparatus according to claim 1, wherein the apparatus is incorporated in a substrate cleaning apparatus that sequentially executes a scrubbing cleaning step, a rinsing cleaning step, and a drying step on the transferred substrate. .