JP2009195777A - Large-size substrate cleaning apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a large-size substrate cleaning apparatus of a compact configuration which includes a short carriage path between each of cleaning and drying processes of a large-size glass substrate and does not require a wide installation space in the cleaning performed after processing of the large-size glass substrate having a lateral side exceeding one meter. <P>SOLUTION: The large-size substrate cleaning apparatus is composed of a cleaning part 30 comprising: spray nozzles 31 for chemicals; one or more pairs of contact type cleaning tools 32, 33 arranged on the upper part of the nozzles such that each pair of tools includes a pair of non-contact type cleaning tool on the above side while facing each other; one pair of shower nozzles 34 arranged on the uppermost part of the pair of contact type cleaning tool 33 which is arranged on the upper part of the nozzles such that each pair of tools includes a pair of non-contact type cleaning tool on the above side while facing each other; and a pair of jet nozzles 35 which are arranged on the upper part of the nozzles while facing each other, a drying part 40 provided with a pair of air knives 41 which are arranged on the upper side of the cleaning part 30 while facing each other, a substrate-retaining conveying fixture 50 which retains a large-size substrate 90 while allowing the substrate to stand erect and a charge/delivery part 60 which is arranged on the lower side of the cleaning part 30. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to cleaning after processing a large glass substrate having a side exceeding 1 m. Specifically, the transport path between each cleaning and drying process of the large glass substrate is short, and a compact configuration that does not require a large installation space. The present invention relates to a large substrate cleaning apparatus.

  Liquid crystal panels have a wide range of uses from small portable terminals to large TVs. In increasing the size, the maximum substrate size is 2200 mm × 2400 mm class and the photomask size is 1200 mm × 1400 mm class. When such a large substrate is polished by a machine, the substrate surface on which the abrasive remains adhered is manually scrubbed in a cleaning process after the processing. This causes the problem that the workability by manpower is poor due to the large and heavy substrate and the cost is high.

  FIG. 4 is a schematic view of the substrate cleaning apparatus in the cited document 1. In FIG. 4, when cleaning the substrate, the glass substrate R to be cleaned is taken out of the storage unit 1 and placed above the brush cleaning tank 2. For this reason, the substrate R is conveyed along the path 6 while being held vertically, and is disposed above the brush cleaning tank 2. Then, the substrate R is carried into the brush cleaning tank 2, and the upper end surface Ra of the substrate R is disposed at a position a shown in FIG. 4, and pure water is ejected from the pure water ejection portion 7.

  Next, the substrate R is further lowered and brushed by the rotating brush 11 while receiving the cleaning liquid from the cleaning liquid ejecting portion 8. At this time, the position of the upper end surface Ra of the substrate R reciprocates between position b and position c shown in FIG. This reciprocating motion is repeated arbitrarily many times according to the adhesion state of the foreign matter.

  When the brushing operation of the substrate R is completed, the substrate R is again placed at the position a. Pure water is ejected from the pure water section 7 to the substrate R, and pure water cleaning is performed for a predetermined time. Immediately before the end of the pure water cleaning, the suction device 21 is driven, the suction portion 21a is disposed on the upper end surface Ra (suction position) of the glass substrate R, and the suction operation of the suction device 21 is started.

  When the suction device 21 sucks the pure water remaining on the upper end surface Ra of the glass substrate R, the suction device 21 discharges the pure water remaining outside the brush cleaning tank 2 through the recovery line 24. When pure water cleaning is performed for a predetermined time, the ejection of pure water from the pure water ejection section 7 is stopped. At this time, the suction operation by the suction device 21 is still performed. When the suction operation stops, the suction device 21 moves to the initial position. With this operation, it is possible to remove almost all of the pure water remaining on the upper end surface Ra of the substrate R when the cleaning in the brush cleaning tank 2 is completed.

  When the cleaning process in the brush cleaning tank 2 is completed, the substrate R is unloaded from the brush cleaning tank 2 and placed above the ultrasonic cleaning tank 3, and the cleaning process in the ultrasonic cleaning tank 3 is started. The glass substrate R is disposed with the position of the upper end surface Ra at the position d, and the entire glass substrate R is soaked in pure water collected in the inner tank 3a of the ultrasonic cleaning tank 3, and is superposed by the high-frequency vibrator 20 below the inner tank 3a. Sonic cleaning is performed. Thereafter, the upper end surface Ra of the substrate R is disposed at the position e, and pure water is sprayed from the pure water ejection portion 13 onto the surface of the glass substrate R, and pure water is used to prevent reattachment of foreign matters dropped by ultrasonic cleaning. Rinse.

  After a predetermined time, immediately before the rinsing with pure water is completed, the suction device 22 places the suction part 22a on the upper portion (suction position) of the glass substrate R, and the suction operation is started. As described above, since pure water on the upper end surface Ra is removed from when pure water is injected until after the injection of pure water is stopped, it remains on the upper end surface Ra after the injection of pure water is stopped. It is possible to remove almost all of the pure water.

  When the cleaning in the ultrasonic cleaning tank 3 is completed, the glass substrate R is carried into the steam tank 4 and lowered to a position filled with the vapor of the IPA liquid. The glass substrate R is stopped at that position for a predetermined time and then raised to the height of the cooling pipe 15. Here, the vapor clinging to the glass substrate R descends or is drawn toward the cooling pipe 15 to condense. Since the glass substrate R is dried by the above steps, the glass substrate R is unloaded from the steam tank 4 and immediately stored in the adjacent storage unit 1.

As described above, in the invention of Patent Document 1, although there is no description about the size of the glass substrate, the substrate R is conveyed along the path 6 while being held vertically, and is moved between the positions b and c in the brush cleaning tank 2. Since brush cleaning can be performed by reciprocating up and down, there is a possibility that manual scrubbing can be eliminated. However, according to this substrate cleaning apparatus, since each cleaning and drying process is performed in independent processing tanks, the path 6 becomes long, and a large area is required for apparatus installation. In Patent Document 2, the substrate is vertically arranged and has a conveying means for conveying the substrate horizontally and a nozzle having a slit-like opening at the tip, and the opening is parallel to the main surface of the substrate at a constant interval. In Japanese Patent Application Laid-Open No. 2004-26853, an ultrasonic cleaning device composed of a plurality of ultrasonic showers that inject pure water and hold the upper edge of the substrate and hang down. A method and an apparatus are described in which the cleaning liquid is discharged uniformly from the upper part to the lower part for cleaning, and an air knife that follows this is sprayed with air to remove the cleaning liquid.
Japanese Patent Laid-Open No. 7-114174 JP-A-8-57436 Japanese Patent Laid-Open No. 10-286535

  The present invention has been made in order to solve such a problem, and the purpose of the present invention is to clean the large glass substrate whose side is longer than 1 m, and to transport the large glass substrate between each cleaning and drying process. It is an object of the present invention to provide a large substrate cleaning apparatus having a compact configuration that has a short path and does not require a large installation space.

  The large substrate cleaning apparatus of the present invention is a large substrate cleaning apparatus that performs cleaning after processing a large substrate having a side exceeding 1 m. A pair of chemical solution spray nozzles disposed at the bottom and facing each other, and an upper portion of the nozzle A pair of opposed contact cleaning tools disposed above and having a non-contact cleaning tool and facing each other and having one or more non-contact cleaning tools above and facing each other A cleaning unit having a pair of opposed shower nozzles disposed on the top of the contact-type cleaning tool, a pair of opposed jet nozzles disposed on the upper part of the nozzle, and an opposed surface disposed above the cleaning unit A drying unit having a pair of air knives, and a substrate holding / conveying jig that holds a large substrate upright and is inserted into the opposing interval between each nozzle, brush, and drying unit facing the cleaning unit. A substrate holding / carrying jig that is disposed below the cleaning unit and that holds the substrate in an upright position. After each of the nozzles, the tools facing the cleaning unit and the knives facing the drying unit are moved up and down to move up and down, the cleaning unit performs cleaning, and the drying unit performs drying. The payout is performed through the input / output part.

  The disk brush and roll brush of the large substrate cleaning apparatus of the present invention come into contact with the substrate when the substrate is inserted, move left and right while rotating, and become non-contact with the substrate after each cleaning is completed. It is characterized by.

  The substrate holding and conveying jig of the large-sized substrate cleaning apparatus of the present invention is formed by combining the upper side, the lower side and the side on which the substrate is held upright in a U shape, and the upper side, the lower side and the side Each has a chuck piece for fixing the substrate, and the chuck pieces arranged at the ends of the upper side and the lower side are folded inside the U-shape to fix the substrate when the substrate is placed on the hanger. The upper side portion further includes a transfer jig, and when the substrate is fixed by the chuck pieces arranged at the end portions of the upper side portion and the lower side portion, the substrate holding transfer jig is loaded and discharged by the transfer jig. It is conveyed to a part.

  The roll-shaped brush and the disk-shaped brush of the large-sized substrate cleaning apparatus of the present invention are formed of any material of nylon, PVA, and polyurethane.

  The jet nozzle of the large substrate cleaning apparatus of the present invention may be any one of a three-fluid jet nozzle, a two-fluid jet nozzle, a one-fluid jet nozzle, an ultrasonic jet nozzle, and a steam jet nozzle, or any combination thereof. It is characterized by being.

  The rinse liquid sprayed from the shower nozzle of the large substrate cleaning apparatus of the present invention is pure water or 10% or less ammonia water.

  The chemical solution sprayed from the chemical solution spray nozzle of the large substrate cleaning apparatus of the present invention contains sulfuric acid or hydrofluoric acid which are inorganic acids.

  According to the present invention, the conveyance path between each cleaning and drying process of the large glass substrate is only a carry-in path for cleaning first and a carry-out path after drying. Since they can be combined into one, it is possible to provide a large-sized substrate cleaning apparatus having a compact configuration that does not require a large installation space and that does not require cleaning by hand.

  Embodiments of the present invention will be described with reference to the drawings. FIG. 1 is an apparatus configuration diagram showing a schematic configuration of a large substrate cleaning apparatus according to the present invention. In FIG. 1, the large substrate cleaning apparatus 100 includes a cleaning unit 30, a drying unit 40, a loading / unloading unit 60, and a substrate holding / conveying jig 50. The cleaning unit 30 includes a pair of opposed spray nozzles 31 for chemical solutions disposed at the bottom and a detergent spray nozzle that is disposed above the nozzle and is a non-contact cleaning tool and is opposed to the pair. Disc brush 32 which is a type cleaning tool, a pair of contact type cleaning tools roll brush 33 which is disposed above and is provided with a detergent spray nozzle which is a non-contact type cleaning tool and which is opposed to the brush brush, and the brush A pair of opposed shower nozzles 34 disposed at the upper part of the nozzle and a pair of opposed jet nozzles 35 disposed at the upper part of the nozzle.

  The pair of chemical solution spray nozzles 31 are piped to the chemical solution 70, and the chemical solution 70 is supplied during cleaning. A pair of disk brushes 32 that are opposed to each other with a detergent spray nozzle above, and a pair of roll brushes 33 that are opposed to each other with a detergent spray nozzle above are equipped with power sources 80-1 and 80-2, respectively. ing. The power sources 80-1 and 80-2 advance the respective brushes at the time of cleaning, rotate them in contact with the substrate 90, move the brushes left and right, perform brush cleaning, and move the brush backward when cleaning is completed. Each upper detergent spray nozzle is piped to the detergent solution 72 and is supplied with the detergent solution 72 during cleaning.

  The pair of shower nozzles 34 are pipe-connected to the rinse liquid 74, and the rinse liquid 74 is supplied in the rinse cleaning. The pair of jet nozzles 35 includes a mixing unit M. The mixing unit M is pipe-connected to the compressed air 76, the rinsing liquid 74, and the detergent solution 72, and mixes predetermined amounts in the final cleaning and supplies them to the jet nozzle 35.

  The drying unit 40 is disposed above the cleaning unit 30 and includes a pair of opposed air knives 41, and the substrate holding and conveying jig 50 is moved up and down so that the lowermost portion of the substrate 90 can be dried by the air knife 41. As shown in FIG. The air knife 41 is pipe-connected to the compressed air 76. The loading / unloading unit 60 is disposed below the cleaning unit 30, and the substrate holding / conveying jig 50 that holds the substrate 90 for cleaning is disposed on each nozzle, brush, and opposing knife of the drying unit 40 facing the cleaning unit 30. And a conveying space for discharging after cleaning and drying. The substrate holding / conveying jig 50 has a U-shape that holds the substrate 90 upright.

  FIG. 2 is a structural diagram showing the structure of the substrate holding / conveying jig of the large substrate cleaning apparatus according to the present invention. In FIG. 2, the substrate holding / conveying jig 50 is formed by combining an upper side portion 51-1, a lower side portion 51-2, and a side side portion 51-3 that hold the substrate 90 upright, in a U shape. Are provided with chuck pieces 52-1 to 52-7, respectively. The chuck pieces 52-1 and 52-2 disposed at the ends of the upper side portion 51-1 and the lower side portion 51-2 are folded inside the U-shape to fix the substrate 90 when the substrate 90 is received. The upper side portion 51-1 further includes conveying jigs 53-1, 53-2. Since these chuck pieces have a pulley structure in which the contact portion with the end portion of the substrate 90 is curved and recessed, the substrate only needs to come into contact with a part of the two edges forming the end portion of the substrate 90. 90 can be held and fixed.

  1 and 2, the substrate 90 is inserted into the substrate holding and conveying jig 50, and chuck chucks 52-1 and 52-2 disposed at the ends of the upper side portion 51-1 and the lower side portion 51-2, respectively. When the substrate 90 is fixed, the substrate holding / conveying jig 50 is conveyed by the conveying jigs 53-1 and 53-2 to a loading / unloading unit 60 through a predetermined path (not shown). (Arrow direction S1). Depending on the device layout, the input may be input from a direction parallel to the drawing, or may be input from a direction perpendicular to the drawing (arrow direction S2).

  When the substrate holding / conveying jig 50 is put into the loading / unloading unit 60, the substrate holding / conveying jig 50 is thrown into the facing interval between each of the nozzles and brushes facing the cleaning unit 30 and the opposing knife of the drying unit 40. The reciprocating motion is performed a predetermined number of times in the vertical direction (arrow direction S3). For this reason, the loading / unloading unit 60 and the drying unit 40 have a space required for the vertical movement of the substrate 90 in cleaning and drying.

  When the upper end portion of the substrate holding / conveying jig 50 is inserted into the position of a pair of opposed chemical spray nozzles 31 disposed at the lowermost part of the cleaning unit 30, the inorganic acid that is a chemical solution is supplied from the chemical spray nozzle 31. A liquid containing sulfuric acid or hydrofluoric acid is jetted. The substrate holding / conveying jig 50 moves up and down with respect to the chemical spray nozzle 31 to remove dirt such as abrasives attached to the substrate 90 during processing. After going up and down a predetermined number of times, the liquid ejection is stopped.

  When the upper end portion of the substrate holding / conveying jig 50 is provided with a detergent spray nozzle on the upper side and is put into a pair of opposing disk brushes 32, the detergent solution is sprayed from the detergent spray nozzle. When the disk brush 32 comes into contact with the substrate 90, the disk brush 32 starts rotating and moves left and right to start brush cleaning. The substrate holding / conveying jig 50 moves up and down with respect to the disk brush 32 to remove rough dirt adhering to the substrate 90. After moving up and down a predetermined number of times, the disc brush 32 is retracted and the spraying of the detergent solution is stopped.

  When the upper end portion of the substrate holding / conveying jig 50 is provided with a detergent spray nozzle on the upper side and put into the position of the pair of roll brushes 33 facing each other, the detergent solution 72 is sprayed from the detergent spray nozzle. When the roll brush 33 comes into contact with the substrate 90, the roll brush 33 starts to rotate and moves to the left and right to start the roll brush cleaning. The substrate holding / conveying jig 50 moves up and down with respect to the roll brush 33, and fine dirt adhering to the substrate 90 is removed. After moving up and down a predetermined number of times, the roll brush 33 is retracted and the spraying of the detergent solution is stopped.

  When the upper end of the substrate holding / conveying jig 50 is put into the position of the pair of shower nozzles 34 facing each other, pure water as a rinsing liquid or ammonia water liquid of 10% or less is ejected from the shower nozzle 34. The substrate holding and conveying jig 50 moves up and down with respect to the shower nozzle 34, and the substrate 90 is rinsed. After going up and down a predetermined number of times, the injection of pure water or 10% or less ammonia water is stopped.

  When the upper end portion of the substrate holding / conveying jig 50 is inserted into the position of the pair of jet nozzles 35 facing each other, the pure water of the rinsing liquid 76 or the ammonia water liquid of 10% or less and the detergent solution are mixed via the mixing section M. A predetermined amount of 72 is mixed and jetted by compressed air 76 from the jet nozzle 35. The substrate holding and conveying jig 50 moves up and down with respect to the jet nozzle 35, and the substrate 90 is finished and cleaned. After going up and down a predetermined number of times, the jetting of the finished mixture is stopped.

  The jet nozzle 35 may be any one of a three-fluid jet nozzle, a two-fluid jet nozzle, a one-fluid jet nozzle, an ultrasonic jet nozzle, and a steam jet nozzle, or any combination thereof. In this case, the type of liquid supplied to the mixing unit M and the number of pipes corresponding to the type are arbitrarily set according to the combination.

  FIG. 3 is a structural diagram showing the structure of a chuck piece for single-side cleaning. In the chuck pieces 52-1 to 52-7 in FIG. 2, brush cleaning of the contact portion with the substrate 90 is difficult. In the chuck pieces 54-1 to 54-7 for single-sided cleaning in FIG. 3, it is necessary to turn over the substrate 90 and clean it again for double-sided substrate cleaning, but the entire surface can be cleaned with a brush.

  In FIG. 1 again, when the upper end portion of the substrate holding / conveying jig 50 is inserted into the position of the pair of air knives 41 facing the drying unit 40, dry air is jetted from the air knife 41. The substrate holding and conveying jig 50 moves up and down with respect to the air knife 41, and the substrate 90 is dried. After going up and down a predetermined number of times, the spray of dry air is stopped.

  When the cleaning and drying are completed, the substrate holding / conveying jig 50 is transported to the loading / unloading unit 60 and discharged (arrow direction S4). The substrate holding and conveying jig 50 is conveyed again through a predetermined path, and the substrate 90 is taken out (arrow direction S5). The payout may be performed from the upper side of the drying unit 40, whereas the input is performed from the lower side.

  As described above, according to the present invention, the conveyance path between each cleaning and drying process of the large glass substrate is only the carry-in path for performing the cleaning first and the carry-out path after drying, so the conveyance path is short. Since each processing tank can be combined into one, it is possible to provide a large substrate cleaning apparatus having a compact configuration that does not require a wide installation space and that does not require cleaning by hand.

The apparatus block diagram which shows schematic structure of the large sized substrate cleaning apparatus by this invention. FIG. 3 is a structural diagram showing a structure of a substrate holding / conveying jig of a large substrate cleaning apparatus according to the present invention. FIG. 3 is a structural diagram of a chuck piece for single-side cleaning of a substrate holding and conveying jig according to the present invention. Schematic of the conventional board | substrate cleaning apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 30 Washing | cleaning part 31 A pair of spray nozzle for chemical | medical solutions 32 A pair of disk brush which comprises a detergent spray nozzle and opposes A pair of roll brush which comprises a detergent spray nozzle and opposes 34 A pair of shower nozzle 35 A pair of jet nozzle 40 Drying Part 41 A pair of air nozzles 50 Substrate holding / conveying jig 51-1 Upper side part 51-2 Lower side part 51-3 Side part 52-1 to 52-7 Chuck piece 53-1, 53-2 Conveying jig 60 , Dispensing unit 70 Chemical solution 72 Detergent solution 74 Rinse solution 76 Compressed air 80-1, 80-2 Power source 90 Substrate 100 Large substrate cleaning device G Opposite spacing M Mixing unit S1-S5 Arrow direction

Claims (7)

In a large substrate cleaning apparatus that performs cleaning after processing of a large substrate with one side exceeding 1 m,
A pair of chemical spray nozzles disposed at the bottom and facing each other, and one or more paired contact cleaning tools disposed at the top of the nozzle and provided with a non-contact cleaning tool at the top; A pair of opposed shower nozzles disposed at the top of the pair of opposed contact cleaning tools provided with a non-contact cleaning tool above the one or more, and opposed to each other disposed above the nozzles A cleaning section having a pair of jet nozzles that
A drying unit comprising a pair of opposed air knives disposed above the cleaning unit;
A substrate holding and conveying jig that holds the large substrate upright, and that is put into an opposing interval of the opposing nozzles and tools of the cleaning unit and the opposing knife of the drying unit;
A loading / dispensing portion that is disposed below the cleaning unit and for loading and unloading the substrate holding / conveying jig to and from the facing interval;
The substrate holding and conveying jig that holds the substrate upright is thrown into the facing interval between the facing nozzles and brushes of the cleaning unit and the facing knives of the drying unit via the charging and discharging unit. The large substrate cleaning apparatus is characterized in that the substrate is moved up and down, cleaned in the cleaning unit, and dried in the drying unit, and then discharged through the loading / unloading unit.   The disk brush and the roll brush are in contact with the substrate when the substrate is inserted, move left and right while rotating, and become non-contact with the substrate after each cleaning is completed. The large substrate cleaning apparatus according to 1. The substrate holding and conveying jig is formed by combining an upper side portion, a lower side portion, and a side portion that hold the substrate upright, in a U-shape,
The upper side portion, the lower side portion, and the side portion are each provided with a chuck piece for fixing the substrate, and the chuck pieces disposed at the end portions of the upper side portion and the lower side portion are arranged in the shape of the U-shaped when the substrate is accommodated. Fold inside the shape to fix the substrate,
The upper side portion further includes a transfer jig, and when the substrate is fixed by the chuck pieces arranged at the end portions of the upper side portion and the lower side portion, the substrate holding transfer jig is moved to the transfer jig. The large substrate cleaning apparatus according to claim 1, wherein the large substrate cleaning apparatus is transported to the input / output part by a tool.   The large substrate cleaning apparatus according to claim 1, wherein the roll-shaped brush and the disk-shaped brush are made of any material of nylon, PVA, and polyurethane.   The jet nozzle is any one of a three-fluid jet nozzle, a two-fluid jet nozzle, a one-fluid jet nozzle, an ultrasonic jet nozzle, and a steam jet nozzle, or any combination thereof. Item 2. The large substrate cleaning apparatus according to Item 1.   The large-sized substrate cleaning apparatus according to claim 1, wherein the rinse liquid sprayed from the shower nozzle is pure water or 10% or less ammonia water.   2. The large substrate cleaning apparatus according to claim 1, wherein the chemical liquid sprayed from the chemical liquid spray nozzle includes sulfuric acid or hydrofluoric acid which are inorganic acids.

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