JP2002150994A - プラズマ質量の選別器 - Google Patents
プラズマ質量の選別器Info
- Publication number
- JP2002150994A JP2002150994A JP2001240480A JP2001240480A JP2002150994A JP 2002150994 A JP2002150994 A JP 2002150994A JP 2001240480 A JP2001240480 A JP 2001240480A JP 2001240480 A JP2001240480 A JP 2001240480A JP 2002150994 A JP2002150994 A JP 2002150994A
- Authority
- JP
- Japan
- Prior art keywords
- particles
- chamber
- cyclotron
- central axis
- uniform
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/26—Mass spectrometers or separator tubes
- H01J49/28—Static spectrometers
- H01J49/284—Static spectrometers using electrostatic and magnetic sectors with simple focusing, e.g. with parallel fields such as Aston spectrometer
- H01J49/286—Static spectrometers using electrostatic and magnetic sectors with simple focusing, e.g. with parallel fields such as Aston spectrometer with energy analysis, e.g. Castaing filter
- H01J49/288—Static spectrometers using electrostatic and magnetic sectors with simple focusing, e.g. with parallel fields such as Aston spectrometer with energy analysis, e.g. Castaing filter using crossed electric and magnetic fields perpendicular to the beam, e.g. Wien filter
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Tubes For Measurement (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US63466500A | 2000-08-08 | 2000-08-08 | |
US634665 | 2000-08-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2002150994A true JP2002150994A (ja) | 2002-05-24 |
Family
ID=24544729
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001240480A Pending JP2002150994A (ja) | 2000-08-08 | 2001-08-08 | プラズマ質量の選別器 |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP1220289A3 (de) |
JP (1) | JP2002150994A (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114501768A (zh) * | 2022-01-30 | 2022-05-13 | 清华大学 | 加速器带电粒子束电流压缩装置及方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4093856A (en) * | 1976-06-09 | 1978-06-06 | Trw Inc. | Method of and apparatus for the electrostatic excitation of ions |
US6096220A (en) * | 1998-11-16 | 2000-08-01 | Archimedes Technology Group, Inc. | Plasma mass filter |
-
2001
- 2001-08-02 EP EP01202936A patent/EP1220289A3/de not_active Withdrawn
- 2001-08-08 JP JP2001240480A patent/JP2002150994A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114501768A (zh) * | 2022-01-30 | 2022-05-13 | 清华大学 | 加速器带电粒子束电流压缩装置及方法 |
CN114501768B (zh) * | 2022-01-30 | 2023-04-18 | 清华大学 | 加速器带电粒子束电流压缩装置及方法 |
Also Published As
Publication number | Publication date |
---|---|
EP1220289A2 (de) | 2002-07-03 |
EP1220289A3 (de) | 2003-05-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3672488B2 (ja) | 負イオンフィルタ | |
JP3492960B2 (ja) | プラズマ質量フィルタ | |
US6326627B1 (en) | Mass filtering sputtered ion source | |
EP2068602B1 (de) | Radial erweiterte plasmaerzeugungsvorrichtung | |
JP5097397B2 (ja) | プラズマ処理装置およびプラズマの機械的閉じ込めを磁気的に向上させる方法 | |
JP4944336B2 (ja) | プラズマ加速装置 | |
JP3609711B2 (ja) | 螺旋磁界を備えたプラズマフィルタ | |
EP1220293A2 (de) | Tandem Plasmamassenfilter | |
US6730231B2 (en) | Plasma mass filter with axially opposed plasma injectors | |
EP1115142A2 (de) | Plasmamassenfilter | |
US6787044B1 (en) | High frequency wave heated plasma mass filter | |
JP2002150994A (ja) | プラズマ質量の選別器 | |
US6293406B1 (en) | Multi-mass filter | |
US6521888B1 (en) | Inverted orbit filter | |
US6723248B2 (en) | High throughput plasma mass filter | |
US6719909B2 (en) | Band gap plasma mass filter | |
US20050172896A1 (en) | Injector for plasma mass filter | |
US6541764B2 (en) | Helically symmetric plasma mass filter | |
JP2009289560A (ja) | 3次元ポールトラップ装置及び該3次元ポールトラップ装置を用いたイオン検出装置 | |
JP2869517B2 (ja) | 荷電粒子の捕獲供給装置 | |
EP0093618B1 (de) | Mehrstufiges Verfahren und Apparat zur Separation von Substanzen unterschiedlichen Atomgewichts mit einer Plasmazentrifuge | |
RU2137532C1 (ru) | Устройство для разделения заряженных частиц по массам | |
JPH0594941U (ja) | E×b回転照射装置 | |
JPH08138598A (ja) | 電子ビーム励起プラズマ発生装置 | |
RU1772939C (ru) | Устройство для разделения заряженных частиц по массам |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20031202 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20040302 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20040305 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20040803 |