JP2002144057A - Method for repairing liquid crystal display element - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for repairing a liquid crystal display element with a laser beam, in which such damages of a color filter as curling-up and scatter of fragments are minimal and its yield is excellent. SOLUTION: Plural shots are performed for predetermined repairing in a way that a second shot and subsequent shots are performed while the shot keeps an overlap with the preceding shot region.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a laser repair method for a liquid crystal display device. More specifically, the present invention relates to a laser repair method for a liquid crystal display device, which can prevent the occurrence of a new defect due to laser repair.

[0002]

2. Description of the Related Art A liquid crystal display device comprises a very large number of pixels exceeding 300,000. Although it is required that all these pixels are completely formed, it is inevitable that a defect will occur at a certain probability, and various repairs are performed to remedy the defect.

[0003] Among them, repair using a laser tends to be frequently used because it is a simple dry process or a non-contact process. Laser repair can be used to cut shorts, connect open parts, and remove unnecessary color patterns from the board before panel assembly.However, the color filter board can be used with the other board. It can also be used for repair in a so-called panel state or a module state that are bonded together. In the panel state or the module state, the repaired part is located inside the cell gap sandwiched by the glass, so that the laser repair is the only means.

In an active matrix type TFT type or TFD type liquid crystal display element, a repair target in a panel state or a module state is mainly defective wiring of an array substrate opposite to a color filter substrate or defective active element. The repair target of the simple matrix STN or TN liquid crystal display element is a short circuit or an open defect of the striped transparent conductive film pattern formed on the color filter substrate and the counter substrate. When repairing a defect on the substrate opposite to the color filter substrate, for example, when cutting a metal wiring or a transparent electrode on the TFT array substrate, the laser light reaches the opposing color filter substrate and causes damage.

[0005]

In the panel state or the module state, the uppermost layer of the color filter has a transparent conductive film having a thickness of about 0.1 μm covered with an alignment film having a thickness of several tens nm. Under the transparent conductive film, a black matrix, an overcoat (transparent protective layer), and the like are arranged as necessary in addition to the coloring layer.

The laser used for the laser repair of the liquid crystal display element is usually a YAG laser,
Has an infrared wavelength. Usually, a polarizing film is attached to the liquid crystal display element. However, since the polarizing film blocks ultraviolet rays, a wavelength longer than visible light is used for laser repair. Therefore, the irradiated portion is more affected by heat than when an ultraviolet laser is used.

[0007] Repair by a laser having a wavelength longer than that of visible light involves melting the irradiated portion by heating it to a high temperature in a very short time.
Vaporization is performed to evaporate or melt the irradiated part, or to connect the open part. When a laser is applied to the color filter made of resin, the volume expansion around the evaporating part, the curl up, or 0. There may be deformation such as peeling of a lump having a size of several μm to several μm. Since the transparent conductive film is formed on the color filter, if the transparent conductive film comes into contact with the conductive portion of the counter substrate due to these deformations, a short-circuit defect occurs, and the number of defects is increased by laser repair. Further, at low temperatures or under pressure, the gap between the two substrates of the liquid crystal display element, that is, the cell gap becomes narrow, so that the deformation of the color filter is preferably as small as possible.

An object of the present invention is to provide a liquid crystal display element in which short-circuit defects are less likely to occur in laser repair.

[0009]

The object of the present invention is achieved by the following constitution. That is, (1) a laser repair of a liquid crystal display device having a color filter, and when performing a predetermined repair with a plurality of shots, a shot is maintained while maintaining an overlap with a shot area preceding the second shot. A method for repairing a liquid crystal display element. (2) The method for repairing a liquid crystal display element according to (1), wherein the overlap is 1 μm or more. (3) The method for repairing a liquid crystal display element according to (1) or (2), wherein the color filter includes a resin black matrix.

[0010]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The substrate used for the color filter and the counter substrate of the liquid crystal display device of the present invention is not particularly limited, and quartz glass, borosilicate glass, aluminosilicate glass, and silica-coated surface Inorganic glasses such as soda-lime glass and organic plastic films or sheets are preferably used. In the case of a reflective liquid crystal display device, an opaque substrate such as a metal plate can be used as the substrate on which the reflective electrode is provided.

The color filter constituting the liquid crystal display device of the present invention will be described.

A black matrix is provided on the transparent substrate or the opaque substrate as needed for the purpose of improving the contrast and avoiding malfunction of the active element. The black matrix may be formed by repeatedly applying a metal such as chromium or nickel or an oxide thereof, or a colored film.However, forming a resin black matrix composed of a resin and a light-shielding agent can reduce manufacturing costs and waste treatment. It is preferable from the viewpoint of cost. The resin used for the black matrix is not particularly limited, but a photosensitive or non-photosensitive material such as an epoxy resin, an acrylic resin, a urethane resin, a polyester resin, a polyimide resin, and a polyolefin resin is preferably used. Can be

The photosensitive resin used as the resin for the black matrix and the resin for the colored layer described later includes photodecomposable resins, photocrosslinkable resins, photopolymerizable resins, and the like. A photosensitive composition, a photosensitive polyamic acid composition and the like containing a monomer, oligomer or polymer having the above formula and an initiator generating radicals by ultraviolet rays are preferably used.

The non-photosensitive resin used as the resin for the black matrix or the resin for the colored layer described later includes:
Although those which can be developed with the above various polymers are preferably used, a resin having heat resistance such as to withstand such heat in a film forming process of a transparent conductive layer or a manufacturing process of a liquid crystal display device is preferable, and A resin having resistance to an organic solvent used in a manufacturing process of a liquid crystal display device is preferable, and a polyimide resin is particularly preferable.

Here, the polyimide resin is not particularly limited, but usually a polyimide precursor having a structural unit represented by the following general formula [I] as a main component is heated or heated by an appropriate catalyst. Those imidized are preferably used.

[0016]

Embedded image

Here, n in the general formula (1) is 0 or 1 to 1.
Number 4 R ¹ is an acid component residue, and R ¹ is a trivalent or tetravalent organic group having at least two carbon atoms. From the viewpoint of heat resistance, R ¹ is preferably a trivalent or tetravalent group containing a cyclic hydrocarbon, an aromatic ring or an aromatic heterocyclic ring and having 6 to 30 carbon atoms. Examples of R ¹ include phenyl, biphenyl, terphenyl, naphthalene, perylene, diphenylether, diphenylsulfone, diphenylpropane, benzophenone, biphenyltrifluoropropane, cyclobutyl, and cyclopentyl. However, the present invention is not limited thereto.

R ² represents a divalent organic group having at least two carbon atoms. From the viewpoint of heat resistance, R ² is preferably a divalent group containing a cyclic hydrocarbon, an aromatic ring or an aromatic heterocyclic ring and having 6 to 30 carbon atoms. Examples of R ² include phenyl, biphenyl, terphenyl, naphthalene, perylene, diphenylether, diphenylsulfone, diphenylpropane, benzophenone, biphenyltrifluoropropane, diphenylmethane, cyclohexylmethane, and the like. Derived groups include, but are not limited to.
In the polymer having the structural unit represented by the general formula (1) as a main component, R ¹ and R ² may each be composed of one of these, or a copolymer composed of two or more of each. It may be. As the solvent constituting the paste, amide polar solvents such as N-methyl-2-pyrrolidone, N, N-dimethylacetamide and N, N-dimethylformamide, and lactone polar solvents such as γ-butyrolactone are preferably used. Is done.

As the acrylic resin, about 3 to 5 kinds of alkyl acrylate or alkyl methacrylate such as acrylic acid, methacrylic acid, methyl acrylate, methyl methacrylate, cyclic acrylate or methacrylate, hydroxyethyl acrylate or methacrylate are used. Is used and a resin polymerized to a molecular weight of about 5,000 to 200,000 is used. When the spacer contains an acrylic resin, the content of the acrylic resin in the components constituting the spacer is preferably 50% by weight or more, and more preferably 60% by weight or more. The material constituting the acrylic resin spacer is not limited to photosensitive or non-photosensitive, but a photosensitive material is preferably used from the viewpoint of fine processing of the spacer. In the case of a photosensitive resin, a composition comprising an acrylic resin, a photopolymerizable monomer, and a photopolymerization initiator is preferably used. As photopolymerizable monomers, bifunctional, trifunctional
There are functional and polyfunctional monomers.
6-hexanediol diacrylate, ethylene glycol diacrylate, neopentyl glycol diacrylate, triethylene glycol acrylate, etc., and trifunctional monomers such as trimethylolpropane triacrylate, pentaerythritol triacrylate, and tris (2-hydroxyethyl) isocyanate And polyfunctional monomers such as ditrimethylolpropane tetraacrylate, dipentaerythritol penta and hexaacrylate. As the photopolymerization initiator, benzophenone, thioxanthone, imidazole, triazine and the like are used alone or in combination.

As the light shielding agent for the black matrix, carbon black, titanium oxide, titanium oxynitride,
In addition to metal oxide powder such as iron tetroxide, metal sulfide powder, and metal powder, a mixture of pigments such as red, blue, and green can be used. Among these, carbon black, titanium oxide, and titanium oxynitride are particularly preferable because of their excellent light-shielding properties.
Since carbon black having a good dispersion and a small particle diameter mainly exhibits a brownish color tone, it is preferable to mix a complementary color pigment to obtain an achromatic color. In addition, titanium oxide having a small particle size,
Since titanium oxynitride exhibits a blue color tone, it is preferable to similarly mix a complementary color pigment to obtain an achromatic color.

As the light-shielding agent for the black matrix of the present invention, it is preferable to employ a metal oxide powder such as titanium oxide, titanium oxynitride, iron tetroxide, or a metal sulfide powder. That is, these light-shielding agents have a higher light absorption coefficient in the infrared region than carbon black, or have a specific heat,
It is considered that the large specific gravity acts in the direction of suppressing deformation of the color filter due to laser irradiation.

As a method of dispersing the light-shielding agent, for example, a method of mixing a light-shielding agent and a dispersant in a polyimide precursor solution and then dispersing the mixture in a dispersing machine such as a three-roll mill, a sand grinder or a ball mill. However, the method is not particularly limited. Further, various additives may be added for improving the dispersibility of the light-shielding agent, or for improving the coating property and the leveling property.

The resin black matrix is formed by applying a black paste on a transparent substrate, drying the paste, and then patterning. As a method of applying the black paste,
A dip method, a roll coater method, a spinner method, a die coating method, a wire bar coating method, or the like is suitably used. Thereafter, heat drying (semi-curing) is performed using an oven or a hot plate. The semi-cure conditions vary depending on the resin, solvent and paste applied amount, but are usually heated at 60 to 200 ° C. for 1 to 60 minutes.

In the black paste film thus obtained, after a photoresist film is formed thereon when the resin is a non-photosensitive resin, and when the resin is a photosensitive resin, Exposure and development are performed as it is or after forming an oxygen barrier film. If necessary, the positive photoresist film or oxygen barrier film is removed, and the film is dried by heating (this cure). These curing conditions are slightly different depending on the amount of the polyimide resin obtained from the precursor, but are generally heated at 200 to 300 ° C. for 1 to 60 minutes. In the case of an acrylic resin, the curing condition is generally to heat at 150 to 300 ° C. for 1 to 60 minutes. Through the above process, a black matrix is formed on the substrate.

In addition to the method of applying a black paste on a substrate, a resin black matrix may be formed by a method (transfer method) in which a black layer applied and semi-cured on another substrate is transferred by heating and pressing. .

The thickness of the resin black matrix is preferably 0.5 to 2.0 μm, more preferably 0.8 to 1.
5 μm. When the film thickness is smaller than 0.5 μm, the light-shielding property becomes insufficient. On the other hand, when the film thickness is greater than 2.0 μm, although the light-shielding property can be ensured, the flatness of the color filter is easily sacrificed, and a step is easily generated.

In order to reduce the deformation of the color filter due to the laser repair, it is preferable that the thickness of the black matrix is small. The wiring of the TFT array is often provided in a portion of the color filter facing the black matrix. That is, there is a black matrix at the laser repair position of the TFT array, and a colored layer or an overcoat is laminated by design. Further, a transparent conductive film is also laminated. The black matrix absorbs laser light most easily among the layers constituting the color filter, and has the greatest effect on the evaporation or thermal expansion behavior of the color filter. The present invention is particularly effective for a color filter using a resin black matrix. The thickness of the black matrix composed of a metal film or a metal oxide film is usually in the range of 0.1 μm to 0.2 μm. In comparison with this, the thickness of the resin black matrix is large as described above, so that evaporation or thermal expansion occurs. The deformation due to is remarkable.

The light shielding property of the resin black matrix is O
It is represented by the D value (common logarithm of the reciprocal of the transmittance), and is preferably 1.6 or more, more preferably 2.0 or more, in order to improve the display quality of the liquid crystal display device.
The preferred range of the thickness of the resin black matrix has been described above, but the upper limit of the OD value should be determined in relation to this.

Usually, (2)
An opening of 0 to 200) μm × (20 to 300) μm is provided.
A plurality of primary color layers are arranged. That is,
One opening is covered with any one of the three primary color layers, and a plurality of color layers of each color are arranged.

The coloring layers of the color filter include at least three layers of three primary colors, red (R), green (G), blue (B) or cyan (C), magenta (M), and yellow (Y). Each pixel is provided with one colored layer of any of these three colors.

As the coloring agent used in the coloring layer, organic pigments, inorganic pigments, dyes and the like can be preferably used, and various additives such as an ultraviolet absorber and a dispersant may be added. . A wide range of dispersants such as surfactants, pigment intermediates, dye intermediates, and polymer dispersants are used. In addition, various additives may be added for improving coating properties and leveling properties.

A specific example of a pigment is represented by a color index (CI) number. Pigment Red 9, 97, 122, 123, 144, 14 as a red pigment
9, 166, 168, 177, 180, 190, 19
2, 209, 215, 216, 224, 254, etc.
Pigment Green C.I. I. No. 7,
Pigment Blue 15, 15: 1, 15: 2, 15:10, 36, 37, 38, 47, etc.
3, 15: 4, 15: 6, 16, 17, 21, 22, 6
And yellow pigments such as Pigment Yellow 13, 17, 20, 24, 83, 86, 93, 94, 9
5, 109, 110, 117, 125, 129, 13
7, 138, 139, 150, 153, 154, 16
6, 173 and the like, and as violet pigments, Pigment Violet 19, 23, 29, 30, 32, 33, 36, 3
7, 38 and the like, and as an orange pigment, Pigment Orange 13, 31, 36, 38, 40, 42, 43, 51, 5
5, 59, 61, 64, 65, etc .; pigment blues 15, 16 etc. as indigo pigments; and pigment reds 81, 122, 144, 146, 16 as red pigments.
9, 177 and Pigment Violet 19 can be employed. These pigments may be used alone,
You may use in combination of more than one type. If necessary, the pigment may be subjected to a surface treatment such as a rosin treatment, an acidic group treatment, and a basic treatment.

The resin used for the colored layer is not particularly limited, but may be an epoxy resin, an acrylic resin, a urethane resin, a polyester resin, a polyimide resin,
A photosensitive or non-photosensitive material such as a polyolefin resin can be employed. Since the dot-shaped spacer of the present invention is preferably formed of a tough resin capable of fine processing and withstanding pressure, it is preferable to use an acrylic resin or a polyimide resin, and a polyimide resin is more preferable. It is preferably used.

As a method for forming the colored layer, the same method as that for the black matrix can be employed. After applying and drying a paste containing a colorant on the substrate, patterning is performed. As a method of dispersing or dissolving the colorant to obtain a color paste, there is a method of mixing the resin and the colorant in a solvent and then dispersing the mixture in a dispersing machine such as a three-roll, sand grinder, or ball mill.

As a method for applying the colored paste, a dipping method, a roll coater method, a spinner method, a die coating method, a wire bar coating method, etc. are preferably used, as in the case of the black paste, and thereafter, an oven or hot Heat drying (semi-cure) is performed using a plate. The semi-curing conditions vary depending on the resin, solvent and paste applied amount, but are usually heated at 60 to 200 ° C. for 1 to 60 minutes.

The colored paste film thus obtained is formed after forming a photoresist film thereon when the resin is a non-photosensitive resin, and when the resin is a photosensitive resin when the resin is a non-photosensitive resin. Exposure and development are performed as it is or after forming an oxygen barrier film. If necessary, the photoresist film or the oxygen barrier film is removed, and the film is dried by heating (this cure).

The curing conditions are slightly different depending on the coating amount when a polyimide resin is obtained from the precursor.
Generally, heating is performed at 0 to 300 ° C. for 1 to 60 minutes.
In the case of acrylic resin, this curing condition is usually 15
Generally, heating is performed at 0 to 300 ° C. for 1 to 60 minutes.
Through the above process, a patterned colored layer is formed on the substrate. Further, the colored layer may be formed by a so-called transfer method.

After the first color layer is formed on the entire surface of the substrate as described above, unnecessary portions are removed by photolithography to form a desired first color pattern. . Repeat the same operation,
A color pattern of a color and a color pattern of a third color are formed.

The thickness of the colored layer is preferably 0.5-2.
5 μm, more preferably 0.8 to 2.0 μm. If the thickness is smaller than 0.5 μm, the coloring becomes insufficient. On the other hand, when the film thickness is larger than 2.5 μm, the flatness of the color filter tends to be sacrificed, and a step is likely to occur.

The laser repair is intended for a metal wiring or a transparent electrode on the substrate side on which the active element is mounted, and parameters such as a laser irradiation dimension and irradiation energy of one shot are selected according to the purpose. When the irradiation size is set to be large, a single shot cannot be covered and a predetermined repair is performed for a plurality of shots. In the present invention, when performing a predetermined repair with a plurality of shots, it is important that the second and subsequent shots are shot while maintaining a partial overlap with a shot region preceding the second shot. As a result, damage such as turning up of the color filter can be reduced.
Although the details of the operation of the present invention are unknown, it is considered that the formation of the overlap makes it easier to extract a part of the energy given to the inside of the color filter to the outside.

A preferred example of the present invention will be described with reference to the drawings. FIG.
In the case of irradiating the shot indicated by 2 following the shot indicated by 1, the overlapping portion indicated by 3 is formed. FIG. 2 shows a case where an overlapping portion indicated by 6 is formed when the shot indicated by 5 is irradiated following the shot indicated by 4.
Although the shape of the overlapping portion is not particularly limited as described above, it is preferable that the outer peripheral edge of the shot area after the second shot be as large as possible in the area of the shot preceding the shot area in order to reduce damage to the color filter. For example, when the irradiation area is a quadrangle, it is preferable in order to increase the effect of the present invention that one side of the irradiation area after the second shot is entirely included in the irradiation area preceding it.

It is not necessary to provide an overlap between two consecutive shots emitted from the laser device. In the present invention, it is not important that the positions are continuous in time, but that the positions are continuous. That is, when performing repairs at a plurality of locations in parallel, the second shot may be irradiated at a predetermined repair position at a time interval from the first shot.

The overlap length between the irradiation area after the second shot and the shot area preceding it is determined by the length of the outer peripheral edge of the shot area following the second shot and the long side existing in the area preceding the shot. Refers to the distance from the adjacent side of the preceding shot that is substantially parallel to. That is, in FIG. 1, the length a between the side A and the side B is the length a, and in FIG. 2, the length b between the side C and the side D is the overlapping length. The overlap length is preferably long to suppress the damage of the color filter. On the other hand, when the same portion of the liquid crystal display element is irradiated with the laser more than once, the laser energy is deeper than the single irradiation. May arrive and the color filter may be severely damaged. Also, in order to enhance the productivity of laser repair, it is better that the overlapping portion is small, so that the overlapping length is 1 μm or more and 10 μm or more.
m, more preferably 2 μm or more and 5 μm or less.

In the color filter of the present invention, a transparent protective layer is formed between the transparent conductive film and the colored layer as required. The formation of such a transparent protective layer is disadvantageous in that it tends to increase the deformation of the color filter due to laser repair, but is advantageous in flattening the surface of the color filter and preventing seepage of impurities. As the transparent protective layer, an acrylic resin, an epoxy resin, a siloxane polymer or a silicone polyimide can be employed.

After the formation of the three colored layers or the formation of the transparent protective layer, a transparent conductive film is formed. As the transparent conductive film, an oxide thin film such as ITO is adopted, and usually 0.1 μm
A small amount of ITO film is formed by a sputtering method, a vacuum evaporation method, or the like. In the active matrix system, the transparent conductive film is a solid film in the screen, but in the simple matrix system, it is patterned in a stripe shape.

As described above, a YAG laser having a wavelength of 1064 nm is often used as a light source for laser repair, but the second harmonic of the YAG laser and YIE laser are also used.
Lasers, ruby lasers, glass lasers, infrared semiconductor lasers, carbon dioxide lasers, and the like can also be used. Since a polarizing film used in a liquid crystal display element blocks ultraviolet light, a laser having a wavelength longer than visible light is used. The laser includes a continuously oscillating CW laser and a pulsed laser. In the present invention, either laser can be adopted as long as a desired region can be heated, but a pulsed laser is easier to apply to irradiate a discrete laser repair target.

As a method of focusing the laser beam on a minute area, there are a method using an optical system such as a lens and a method combining the optical system with a light shaping mask made of a metal plate or the like. In order to irradiate a predetermined position, there is a method of mounting a color filter on a stage and moving it, or scanning a laser beam with a galvanometer mirror etc.The light irradiation time is to sufficiently heat and evaporate the repair target In order to suppress damage to the color filter and to increase the processing speed, it is preferable that the light irradiation time is short. Therefore, the irradiation time per light is 0.1 ns to 10 μm.
s, and more preferably 0.5 ns to 1 μs. Further, the irradiation light power density is preferably large in order to sufficiently heat and evaporate the repair target, and the irradiation light power density is preferably small in order to suppress damage to the color filter.
The range of cm ^{2 to} 100 J / cm ² is preferred.

The color filter of the present invention and a liquid crystal display device using the same are provided with a personal computer, a word processor,
It is used for display screens of engineering workstations, navigation systems, liquid crystal televisions and the like, and is also suitably used for liquid crystal projection and the like.

[0049]

Example 1 (Preparation of resin black matrix) 3, 3 ', 4, 4'
-144.1 g of biphenyltetracarboxylic dianhydride was mixed with 1095 g of γ-butyrolactone and 209 g of N-methyl-2-pyrrolidone, and 95.1 g of 4,4′-diaminodiphenyl ether and bis (3-aminopropyl) tetramethyldimethyl Add 6.2 g of siloxane and add 3 at 70 ° C.
After reacting for 2 hours, 2.96 g of phthalic anhydride was added and further reacted at 70 ° C. for 1 hour to obtain a polyimide precursor (polyamic acid) solution.

A carbon black mill base having the following composition was mixed with a homogenizer at 7000 rpm for 3 hours.
The mixture was dispersed for 0 minutes, and the glass beads were filtered to prepare a black paste.

Carbon black mill base Carbon black (MA100, manufactured by Mitsubishi Chemical Corporation) 4.6 parts Polyimide precursor solution 24.0 parts N-methyl-2-pyrrolidone 61.4 parts Glass beads 90.0 parts Alkali-free glass The black paste was applied on the substrate using a spinner and semi-cured in an oven at 135 ° C. for 20 minutes. Subsequently, a Posi-type photoresist was applied with a spinner and dried at 80 ° C. for 210 minutes. The photoresist film thickness was 1.5 μm. This photoresist was exposed through a photomask.

Next, the substrate was dipped in a developing solution, and the development of the positive resist and the etching of the polyimide precursor were performed simultaneously. Thereafter, the positive type photoresist was stripped off with a resist stripping solvent, and further cured at 300 ° C. for 30 minutes to obtain a resin black matrix substrate. The thickness of the resin black matrix is 1.2 μm, and the OD value is 3.
It was 8.

(Preparation of Colored Layer) Dianthraquinone pigment represented by Color Index No. 65300 Pigment Red 177 as a red, green and blue pigment, Color Index No. 74265 Pigme
A phthalocyanine green pigment represented by nt Green 36 and a phthalocyanine blue pigment represented by Color Index No. 74160 Pigment Blue 15: 6 were prepared. The pigments were mixed and dispersed in the polyimide precursor solution used for the black matrix to obtain three kinds of colored pastes of red, green and blue. First, a blue paste was applied on a resin black matrix substrate and semi-cured at 120 ° C. for 20 minutes. Thereafter, a positive type photoresist was applied by a spinner and dried at 80 ° C. for 20 minutes. Exposure was performed using a photomask, dipped in a developer, and development of a positive type photoresist and etching of a polyimide precursor were performed simultaneously. Thereafter, the positive photoresist was stripped with a resist stripping solvent, and further cured at 300 ° C. for 30 minutes. The thickness of the blue coloring layer was 1.5 μm.

After the substrate was washed with water, a green pixel having a thickness of 1.5 μm was formed in the same manner as the blue colored layer. Further, after the substrate was washed with water, a red pixel having a thickness of 1.5 μm was formed in the same manner as the blue colored layer.

(Preparation of Transparent Protective Layer and Transparent Conductive Film) 4.08 g of methyltrimethoxysilane, 9.9 g of phenyltrimethoxysilane, and 28.8 g of γ-aminopropylmethyldiethoxysilane were added to 156.3 of γ-butyrolactone.
g, 3-methyl-3-methoxybutanol was dissolved in 150 g, and 9.12 g of distilled water was added with stirring at 30 ° C., followed by heating and stirring at 50 ° C. for 2 hours to carry out hydrolysis and condensation. Then, the temperature was raised to 130 ° C., and the alcohol and water produced were distilled off while further condensing. After the solution was cooled to 50 ° C., it was stirred for 3,3 ′, 4,4 ′.
-Benzophenonetetracarboxylic dianhydride 24.17
g was added to obtain an amic acid-based polyorganosiloxane solution.

After 272 g of methyltrimethoxysilane and 396 g of phenyltrimethoxysilane were dissolved in 785.6 g of 3-methyl-3-methoxybutanol, a mixture of 3.34 g of phosphoric acid and 216 g of distilled water was added with stirring. The obtained solution was heated at 105 ° C. for 1 hour, and 302 g of a component mainly composed of methanol was distilled off. Then, the mixture was heated at 130 ° C. for 2 hours to distill off 147 g of a component mainly composed of alcohol and water. After cooling to room temperature, 86 g of 3-methyl-3-methoxybutanol was added to obtain a polyorganosiloxane solution.

650 g of ethyl acetoacetate and 3-
To a mixture of 1567 g of methyl-3-methoxybutanol was added 383 g of tetrabutoxyzirconium, and the mixture was added at 30 ° C.
After stirring for 1 hour, the mixture was left standing for 24 hours to obtain a zirconia chelate solution.

7.5 g of the above amic acid-based polyorganosiloxane solution and 10 g of the above polyorganosiloxane solution
And 1.5 g of the above chelate solution was mixed to obtain a composition for a transparent resin. The transparent resin is applied on a substrate on which a black matrix and a coloring layer of three primary colors are formed.
For 10 minutes, and then cured at 280 ° C. for 60 minutes to form a transparent protective layer having a thickness of 0.5 μm.

On the substrate on which the transparent protective layer was formed, a film thickness of 140 nm and a surface resistance of 20 Ω /
The ITO film of □ was formed.

(Preparation of Electrode Substrate) A chromium thin film was formed on an alkali-free glass substrate by sputtering, and was patterned into a gate electrode by photolithography. Next, the thickness of the insulating layer is 700 n by plasma CVD.
A silicon nitride film having a thickness of 100 nm, an amorphous silicon film having a thickness of 100 nm as a channel layer, and a silicon nitride film having a thickness of 500 nm were successively formed as an etching stopper layer. Next, the silicon nitride film of the etching stopper layer was patterned by photolithography. An n ⁺ amorphous silicon film for forming an ohmic contact between the TFT terminal and the metal electrode was formed and patterned. At this time, the amorphous silicon layer of the channel layer was simultaneously patterned. An ITO film serving as a display electrode was formed thereon and patterned. Further, a film of aluminum as a wiring material was formed by sputtering, and signal wiring and a metal electrode of a TFT were formed by photolithography. Using the drain electrode and the source electrode as masks, n ⁺
The amorphous silicon film was removed by etching to obtain an electrode substrate provided with a TFT element. (Preparation of Color Liquid Crystal Display Element) An alignment film having a thickness of 50 nm was printed on the color filter, dried at 80 ° C. for 10 minutes, and then cured at 180 ° C. for 60 minutes. Similarly, an alignment film was provided on the electrode substrate provided with the opposed thin film transistor. An epoxy-based sealant was printed on the periphery of the color filter substrate and dried, and then the two substrates were bonded and fixed at 150 ° C. for 30 minutes under pressure. The inside of the panel after the bonding was evacuated with a liquid crystal injection device, and then liquid crystal was injected from an injection port provided in the seal portion. After injecting the liquid crystal, an ultraviolet-curing resin was applied to the injection port and irradiated with ultraviolet rays to seal. Further, a polarizing plate was attached to the outside of the substrate to produce a liquid crystal display device.

(Laser Repair and Evaluation) The liquid crystal display element was measured using the X of a YAG laser device (L-230 manufactured by HOYA).
A laser beam having an energy density of 10 J / cm ² mounted on a -Y stage and shaped into a rectangle of 15 μm × 6 μm was used. A central portion of one pixel surrounded by a black matrix is irradiated with a laser irradiation area of 15 μm × 6 μm five times while shifting its long side 12 μm at a time to about 63 μm.
The transparent electrode was removed over the length of. That is, the second
After the shot, overlap with the previous shot area 3 μm in length
Laser irradiation was performed while taking m. The same operation was performed for 20 pixels. The laser was irradiated from the side of the electrode substrate provided with the thin film transistor. However, the transparent conductive film, the transparent protective layer, and the colored layer on the color filter side of the laser-irradiated portion were also removed to form a depression. The shape of the depression was sharp, and the turn-up of the periphery was small. Also, large color filter fragments of 5 μm or more were not observed.

After the laser repair, the liquid crystal display element was turned on while applying a force to the glass surface, but there was no bright spot defect due to a short circuit between the color filter side electrode and the electrode substrate side electrode.

Comparative Example 1 A liquid crystal display device was manufactured in the same manner as in Example 1. Change the stage feed pitch from 12μm to 15μm, irradiate 5 times without overlapping laser irradiation area, and about 75μ
The transparent electrode was removed over a length of m. The transparent conductive film on the color filter side of the laser irradiation part, the transparent protective layer,
The coloring layer was also removed to form depressions. Height 2 at the periphery of the depression
A turn-up of ３3 μm was observed. In addition, seven pieces of color filter fragments of 5 μm or more were observed.

After the laser repair, the liquid crystal display element was turned on while applying a force to the glass surface. As a result, there were three pixels which resulted in a bright spot defect due to a short circuit between the color filter side electrode and the electrode substrate side electrode.

Comparative Example 2 A liquid crystal display device was manufactured in the same manner as in Example 1. Change the stage feed pitch from 12μm to 14.5μm,
Approximately 7 times by irradiating 5 times without overlapping laser irradiation areas
The transparent electrode was removed over a length of 3 μm. The transparent conductive film, the transparent protective layer, and the colored layer on the color filter side of the laser-irradiated portion were also removed to form depressions. A turn-up of 2-3 μm in height was observed at the periphery of the depression. 5 μm
Five pieces of the above color filter were observed.

After the laser repair, the liquid crystal display element was turned on while applying a force to the glass surface. As a result, there were three pixels which had a bright spot defect due to a short circuit between the color filter side electrode and the electrode substrate side electrode, which was defective.

[0067]

The method for repairing a liquid crystal display element according to the present invention comprises:
In the repair by laser irradiation, when performing a predetermined repair with multiple shots, the second shot and subsequent shots are shot while maintaining the overlap with the shot area preceding it, so that the color filter is turned up and shards are scattered Of the liquid crystal display element can be suppressed, and the yield of the liquid crystal display element can be improved.

[Brief description of the drawings]

FIG. 1 is an explanatory view showing a preferred example of a laser repair method of the present invention.

FIG. 2 is an explanatory view showing another preferred example of the laser repair method of the present invention.

[Explanation of symbols]

 1, 2, 3, 4: 1 shot irradiation area 3, 6: overlap area

Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat II (reference) // B23K 101: 36 B23K 101: 36 F term (reference) 2H048 BA02 BA11 BA42 BA48 BB03 BB14 BB44 2H088 FA12 FA15 FA16 FA18 FA24 FA30 HA12 HA14 MA16 2H091 FA35Y FB02 FB13 FC10 FC26 FD04 FD22 GA11 LA03 LA11 LA12 4E068 AC00 AC01

Claims (3)

[Claims] 1. A laser repairing method for a liquid crystal display device having a color filter, wherein when performing a predetermined repairing with a plurality of shots, the second and subsequent shots are shot while maintaining an overlap with a shot area preceding the second shot. A method for repairing a liquid crystal display element. 2. The method according to claim 1, wherein the overlap is 1 μm or more. 3. The method for repairing a liquid crystal display element according to claim 1, wherein said color filter comprises a resin black matrix.