JP2002098817A - Reflecting mirror - Google Patents
Reflecting mirrorInfo
- Publication number
- JP2002098817A JP2002098817A JP2000286554A JP2000286554A JP2002098817A JP 2002098817 A JP2002098817 A JP 2002098817A JP 2000286554 A JP2000286554 A JP 2000286554A JP 2000286554 A JP2000286554 A JP 2000286554A JP 2002098817 A JP2002098817 A JP 2002098817A
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- JP
- Japan
- Prior art keywords
- reflecting mirror
- reflector
- glass
- crystallized glass
- base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Optical Elements Other Than Lenses (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、主に投影機や照明の光
源ランプや天体観測用望遠鏡に使用される反射鏡であっ
て、特に液晶プロジェクタ用光源に使用される反射鏡に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reflector used mainly for a projector, a light source lamp for illumination and a telescope for astronomical observation, and more particularly to a reflector used for a light source for a liquid crystal projector. .
【０００２】[0002]
【従来の技術】近年、投影機は、液晶プロジェクタの登
場により、高精細化や高輝度化が進んできた。高輝度化
に伴い、光源に求められる要求特性が厳しくなってきて
おり、高輝度のものになるほど発熱も著しいため、光源
に用いられる反射鏡基体の材料には、耐熱衝撃性や耐熱
性に優れた材料が求められるようになってきた。2. Description of the Related Art In recent years, with the advent of liquid crystal projectors, projectors have been improved in definition and brightness. With the increase in brightness, the required characteristics of the light source are becoming severer, and the higher the brightness, the more heat is generated. Therefore, the material of the reflector base used for the light source has excellent heat shock resistance and heat resistance. Materials are required.
【０００３】そこで、反射鏡基体の材料としては、従来
使用されてきたホウケイ酸塩ガラスよりも耐熱衝撃性や
耐熱性に優れたＬｉ2Ｏ−Ａｌ2Ｏ3−ＳｉＯ2系低膨張結
晶化ガラスが使用されるようになってきた。[0003] Therefore, as a material of the reflector base, a Li 2 O—Al 2 O 3 —SiO 2 system low expansion crystallized glass having better thermal shock resistance and heat resistance than conventionally used borosilicate glass. Is being used.
【０００４】[0004]
【発明が解決しようとする課題】この低膨張結晶化ガラ
スからなる反射鏡基体は、高温で溶融されたガラス生地
をプレス成型して反射鏡の形状にした後、焼成炉にて熱
処理し、所望の結晶を析出させて作製される。The reflector base made of the low-expansion crystallized glass is formed by pressing a glass material melted at a high temperature into a shape of a reflector, followed by heat treatment in a firing furnace. Is produced by precipitating the crystals of
【０００５】しかしながら、プレス成型によって反射鏡
基体の内表面を滑らかな面に仕上げても、結晶化熱処理
を施すと、表面粗さが大きくなり、光反射率が低下する
ため、この反射鏡を液晶プロジェクタ用の光源として使
用すると、輝度が低くなるという問題点を有していた。[0005] However, even if the inner surface of the reflector base is finished to a smooth surface by press molding, the crystallization heat treatment increases the surface roughness and lowers the light reflectivity. When used as a light source for a projector, there is a problem that the luminance is reduced.
【０００６】本発明の目的は、上記事情に鑑みなされた
ものであり、結晶化によっても内表面の表面粗さが大き
くなりにくい低膨張結晶化ガラス製反射鏡を提供するこ
とである。An object of the present invention has been made in view of the above circumstances, and an object of the present invention is to provide a low-expansion crystallized glass reflecting mirror in which the surface roughness of the inner surface is hardly increased even by crystallization.
【０００７】[0007]
【課題を解決するための手段】本発明者は、上記目的を
達成すべく鋭意研究を行った結果、反射鏡基体の内表面
の表面粗さが結晶化ガラス中の水分量に依存することを
つきとめ、結晶化ガラス中の水分量を多くすることによ
って、結晶化によっても内表面の表面粗さが大きくなり
にくい反射鏡が得られることを見出し、本発明を提案す
るに至った。Means for Solving the Problems The present inventor has conducted intensive studies to achieve the above object, and as a result, has found that the surface roughness of the inner surface of the reflector base depends on the water content in the crystallized glass. Finally, they found that by increasing the amount of water in the crystallized glass, it was possible to obtain a reflecting mirror in which the surface roughness of the inner surface was not easily increased even by crystallization, and came to propose the present invention.
【０００８】即ち、本発明の反射鏡は、反射鏡基体とそ
の内表面に被覆されてなる光反射膜から構成される反射
鏡において、反射鏡基体が、β−ＯＨ量が０．２〜４／
ｍｍであるＬｉ2Ｏ−Ａｌ2Ｏ3−ＳｉＯ2系結晶化ガラス
からなることを特徴とする。That is, the reflecting mirror of the present invention comprises a reflecting mirror base and a light reflecting film coated on the inner surface thereof, wherein the reflecting base has a β-OH content of 0.2 to 4%. /
It is characterized by being composed of Li 2 O—Al 2 O 3 —SiO 2 -based crystallized glass having a size of mm.
【０００９】[0009]
【作用】本発明における反射鏡は、反射鏡基体がＬｉ2
Ｏ−Ａｌ2Ｏ3−ＳｉＯ2系結晶化ガラスから構成されて
おり、主結晶としてβ−石英固溶体又はβ−スポジュメ
ン固溶体を析出するため、耐熱性や耐熱衝撃性に優れた
反射鏡の基体になり、高輝度の光源に使用可能となる。
尚、結晶化ガラスからなる反射鏡基体は、主結晶として
準安定なβ−石英固溶体を析出させると、膨張係数がゼ
ロに近く、特に耐熱衝撃性に優れた透明な結晶化ガラス
になり、さらに高温で処理してβ−石英固溶体を安定な
β−スポジュメン固溶体に転移させると、特に耐熱性に
優れた白色不透明な結晶化ガラスとなる。The reflecting mirror according to the present invention has a reflecting base made of Li 2
It is composed of O-Al 2 O 3 -SiO 2 -based crystallized glass and precipitates β-quartz solid solution or β-spodumene solid solution as a main crystal, so that it can be used as a base of a reflector having excellent heat resistance and thermal shock resistance. Therefore, it can be used for a high-luminance light source.
Incidentally, the reflector base made of crystallized glass, when a metastable β-quartz solid solution is precipitated as a main crystal, the expansion coefficient is close to zero, and the crystal becomes a transparent crystallized glass with excellent thermal shock resistance, and When the β-quartz solid solution is transformed into a stable β-spodumene solid solution by treatment at a high temperature, a white opaque crystallized glass having particularly excellent heat resistance is obtained.
【００１０】また、反射鏡基体の熱膨張係数が、−１０
〜３０×１０-7／℃、好ましくは−１０〜１５×１０-7
／℃（３０〜７５０℃）の低い熱膨張係数を有している
と、特に耐熱衝撃性に優れるため好ましい。Further, the coefficient of thermal expansion of the reflector base is -10.
~30 × 10 -7 / ℃, preferably -10~15 × 10 -7
/ C (30 to 750C) has a low coefficient of thermal expansion, which is particularly excellent in thermal shock resistance.
【００１１】本発明の反射鏡基体においては、主結晶と
してどちらの結晶を析出させても、また共存させても構
わないが、特に、反射鏡基体の可視光での平均透過率が
肉厚３ｍｍで、３０％以上であると、反射鏡基体の内表
面に被覆する光反射膜を目視で検査できるようになるた
め、透明な結晶化ガラスとなるβ−石英固溶体を主結晶
として析出させることが望ましい。In the reflector substrate of the present invention, either crystal may be precipitated as the main crystal or may be coexisted. Particularly, the average transmittance of the reflector substrate for visible light is 3 mm in thickness. When the content is 30% or more, the light reflection film coated on the inner surface of the reflector base can be visually inspected, so that a β-quartz solid solution that becomes a transparent crystallized glass can be precipitated as a main crystal. desirable.
【００１２】本発明においては、ガラス中の水分量をβ
−ＯＨ量で表示する。In the present invention, the water content in the glass is β
Indicated by -OH amount.
【００１３】本発明における反射鏡基体を構成するＬｉ
2Ｏ−Ａｌ2Ｏ3−ＳｉＯ2系結晶化ガラスのβ−ＯＨ量
は、ガラスの赤外線スペクトルにおいて、次式によって
求められる。尚、赤外線スペクトルによるβ−ＯＨ量
は、反射鏡の形状では測定できないため、板状サンプル
（２０×３０×３ｍｍ）を用いて測定した。[0013] Li constituting the reflector base in the present invention
The β-OH content of the 2 O—Al 2 O 3 —SiO 2 crystallized glass can be determined by the following equation in the infrared spectrum of the glass. Since the β-OH content in the infrared spectrum cannot be measured by the shape of the reflecting mirror, it was measured using a plate sample (20 × 30 × 3 mm).
【００１４】β−ＯＨ量（／ｍｍ）＝｛ｌｏｇ（Ｔ3850
／Ｔ3500）｝／ｔ Ｔ3850：３８５０ｃｍ-1付近の透過率 Ｔ3500：３５００ｃｍ-1付近の吸収帯の最低透過率 ｔ ：スペクトル測定時の結晶化ガラスの板厚（ｍ
ｍ、実測値３ｍｍ） 本発明の反射鏡は、反射鏡基体が、β−ＯＨ量が０．２
〜４／ｍｍ、好ましくは０．３〜２／ｍｍであるＬｉ2
Ｏ−Ａｌ2Ｏ3−ＳｉＯ2系結晶化ガラスからなるため、
結晶化によっても反射鏡基体の内表面の表面粗さが大き
くなりにくい。すなわち、β−ＯＨ量が０．２／ｍｍよ
り少ないと、結晶性が弱くなり、結晶サイズが大きくな
るため、反射鏡基体の内表面の表面粗さが大きくなる。
一方、β−ＯＨ量が４／ｍｍより大きいと、反射鏡基体
が透明な結晶化ガラスでは、マトリックスガラスの軟化
温度が低くなり、結晶化のための熱処理によって、反射
鏡基体が軟化し、反射鏡基体の曲面精度が悪化し、スク
リーン照度が低下する。また、反射鏡基体が白色不透明
な結晶化ガラスでは、析出結晶量が多く、マトリックス
ガラスが少ないため、マトリックスガラスの軟化温度が
低くなっても反射鏡基体が軟化することはないが、結晶
化が進みすぎて、反射鏡基体の内表面の表面粗さが大き
くなる。Β-OH content (/ mm) = ｛log (T 3850
/ T 3500)} / t T 3850: 3850cm -1 vicinity of the transmittance T 3500: 3500 cm minimum transmittance of absorption band near -1 t: thickness of crystallized glass during spectrum measurement (m
m, measured value 3 mm) In the reflector of the present invention, the reflector base has a β-OH content of 0.2.
Li 2 4 / mm, preferably 0.3-2 / mm
Since consisting O-Al 2 O 3 -SiO 2 based crystallized glass,
The surface roughness of the inner surface of the reflector body is unlikely to increase even by crystallization. That is, if the amount of β-OH is less than 0.2 / mm, the crystallinity becomes weak and the crystal size becomes large, so that the surface roughness of the inner surface of the reflector base becomes large.
On the other hand, if the amount of β-OH is more than 4 / mm, the softening temperature of the matrix glass is lowered in the crystallized glass having a transparent reflecting mirror base, and the reflecting mirror base is softened by heat treatment for crystallization, and the reflection is reduced. The curved surface accuracy of the mirror base deteriorates, and the screen illuminance decreases. Further, in the case of a crystallized glass in which the reflector base is white and opaque, the amount of precipitated crystals is large and the amount of matrix glass is small. Therefore, even if the softening temperature of the matrix glass is lowered, the reflector base does not soften. If it advances too much, the surface roughness of the inner surface of the reflector base will increase.
【００１５】また、本発明における反射鏡基体の内表面
の表面粗さ（Ｒａ）が、０．０５μｍ以下であると、光
反射率が高くなるため好ましい。Further, it is preferable that the surface roughness (Ra) of the inner surface of the reflecting mirror substrate in the present invention is 0.05 μm or less, since the light reflectance is increased.
【００１６】本発明の反射鏡基体を構成する結晶化ガラ
スの好適な組成範囲は、質量百分率で、ＳｉＯ2 ５０
〜８０％、Ａｌ2Ｏ3 １２〜３０％、Ｌｉ2Ｏ １〜６
％、ＭｇＯ ０〜５％、ＺｎＯ ０〜５％、Ｎａ2Ｏ
０〜５％、Ｋ2Ｏ ０〜５％、ＢａＯ ０．３〜８％、
ＴｉＯ2 ０〜８％、ＺｒＯ2 ０〜７％、Ｐ2Ｏ5 ０〜
７％である。組成範囲をこのように限定した理由を述べ
る。The preferred composition range of the crystallized glass constituting the reflector substrate of the present invention is, in terms of mass percentage, SiO 2 50
~80%, Al 2 O 3 12~30 %, Li 2 O 1~6
%, MgO 0-5%, ZnO 0-5%, Na 2 O
0~5%, K 2 O 0~5% , BaO 0.3~8%,
TiO 2 0~8%, ZrO 2 0~7 %, P 2 O 5 0~
7%. The reason for limiting the composition range in this way will be described.
【００１７】ＳｉＯ2 はガラスの骨格を形成するととも
に結晶を構成する成分であり、その含有量は５０〜８０
％、さらに好ましくは６０〜７５％である。ＳｉＯ2 が
５０％より少ないと熱膨張係数が大きくなりすぎ、耐熱
衝撃性が悪化し、８０％より多いとガラス溶融が困難に
なる。SiO 2 is a component that forms a skeleton of glass and also constitutes a crystal.
%, More preferably 60 to 75%. When the content of SiO 2 is less than 50%, the thermal expansion coefficient becomes too large, and the thermal shock resistance is deteriorated. When the content is more than 80%, glass melting becomes difficult.
【００１８】Ａｌ2 Ｏ3 はガラスの骨格を形成するとと
もに結晶を構成する成分であり、その含有量は１２〜３
０％、さらに好ましくは１７〜２７％である。Ａｌ2 Ｏ
3 が１２％より少ないと化学的耐久性が低下し、またガ
ラスが失透し易くなる。一方、３０％より多いとガラス
の粘度が大きくなりすぎてガラス溶融が困難になる。Al 2 O 3 is a component that forms the skeleton of the glass and also forms the crystal.
0%, more preferably 17 to 27%. Al 2 O
If 3 is less than 12%, the chemical durability is reduced and the glass is liable to devitrify. On the other hand, if it is more than 30%, the viscosity of the glass becomes too large, and it becomes difficult to melt the glass.
【００１９】Ｌｉ2 Ｏは結晶構成成分であり、結晶性に
大きな影響を与えるとともに、ガラスの粘性を低下させ
る働きがあり、その含有量は１〜６％、さらに好ましく
は３〜５％である。Ｌｉ2 Ｏが１％より少ないとガラス
の結晶性が弱くなり、熱膨張係数が大きくなりすぎるた
め、耐熱衝撃性が悪化する。一方、６％より多いと結晶
性が強くなりすぎ、ガラスが失透する。Li 2 O is a crystal component and has a great effect on crystallinity and also has a function of lowering the viscosity of glass. Its content is 1 to 6%, more preferably 3 to 5%. . If the content of Li 2 O is less than 1%, the crystallinity of the glass becomes weak, and the thermal expansion coefficient becomes too large, so that the thermal shock resistance deteriorates. On the other hand, if it exceeds 6%, the crystallinity becomes too strong, and the glass is devitrified.
【００２０】ＭｇＯ、ＺｎＯ、Ｎａ2Ｏ及びＫ2Ｏの含有
量は、それぞれ０〜５％、さらに好ましくは０〜３％で
ある。ＭｇＯ、ＺｎＯ、Ｎａ2Ｏ及びＫ2Ｏがそれぞれ５
％よりも多いと、基体が透明な結晶化ガラスでは、マト
リックスガラスの軟化温度が低くなり過ぎ、結晶化によ
って、反射鏡基体が軟化し、反射鏡基体の曲面精度が悪
化する。また、反射鏡基体が白色不透明な結晶化ガラス
では、結晶化が進みすぎ、反射鏡基体の表面粗さが大き
くなる。The contents of MgO, ZnO, Na 2 O and K 2 O are each 0 to 5%, more preferably 0 to 3%. MgO, ZnO, Na 2 O and K 2 O are each 5
%, The softening temperature of the matrix glass is too low in the crystallized glass having a transparent substrate, and the crystallization causes the reflector substrate to be softened and the curved surface accuracy of the reflector substrate to deteriorate. Further, in the case of a crystallized glass in which the reflector base is white and opaque, crystallization proceeds excessively, and the surface roughness of the reflector base increases.
【００２１】ＢａＯは、結晶性を強める効果があり、そ
の含有量は０．３〜８％であると好ましく、より好まし
くは０．５〜４％である。ＢａＯが０．３％よりも少な
いと、結晶性が弱くなって結晶サイズが大きくなるた
め、反射鏡基体の内表面の表面粗さが大きくなり、８％
より多いと結晶の析出を阻害するために十分な結晶量が
得られず、熱膨張係数が大きくなりすぎ、耐熱衝撃性が
悪化する。BaO has an effect of enhancing crystallinity, and its content is preferably 0.3 to 8%, more preferably 0.5 to 4%. If the content of BaO is less than 0.3%, the crystallinity becomes weak and the crystal size becomes large, so that the surface roughness of the inner surface of the reflecting mirror base material becomes large and 8%
If it is larger, a sufficient amount of crystals cannot be obtained to inhibit the precipitation of crystals, the coefficient of thermal expansion becomes too large, and the thermal shock resistance deteriorates.
【００２２】ＴｉＯ2 は核形成剤であり、その含有量は
０〜８％、さらに好ましくは０〜３％である。ＴｉＯ2
が８％より多くなると、ガラスが失透し易くなる。TiO 2 is a nucleating agent, and its content is 0 to 8%, more preferably 0 to 3%. TiO 2
Is more than 8%, the glass tends to be devitrified.
【００２３】ＺｒＯ2 は核形成剤であり、その含有量は
０〜７％、さらに好ましくは１〜４％である。ＺｒＯ2
が７％より多いとガラス溶融が困難になるとともに、ガ
ラスの失透性が強くなる。ZrO 2 is a nucleating agent, and its content is from 0 to 7%, more preferably from 1 to 4%. ZrO 2
Is more than 7%, it becomes difficult to melt the glass, and the devitrification of the glass becomes strong.
【００２４】Ｐ2 Ｏ5 はガラスの結晶性を向上させるた
めの成分であり、その含有量は０〜７％、さらに好まし
くは０〜３％である。Ｐ2 Ｏ5 が７％より多いと熱膨張
係数が大きくなりすぎ、耐熱衝撃性が悪化する。P 2 O 5 is a component for improving the crystallinity of glass, and its content is 0 to 7%, more preferably 0 to 3%. If P 2 O 5 is more than 7%, the coefficient of thermal expansion becomes too large, and the thermal shock resistance deteriorates.
【００２５】さらに本発明の反射鏡基体を構成する結晶
化ガラスは、上記以外にも種々の成分を添加することが
可能である。Further, various components other than those described above can be added to the crystallized glass constituting the reflector base of the present invention.
【００２６】例えば、清澄効果を向上させるために、Ａ
ｓ2Ｏ3、Ｓｂ2Ｏ3、ＳｎＯ2、Ｃｌ等の清澄剤を２％ま
で添加する事が可能であるが、環境上、特に有害なＡｓ
2Ｏ3を含まない方が望ましい。For example, in order to improve the refining effect, A
It is possible to add a fining agent such as s 2 O 3 , Sb 2 O 3 , SnO 2 , Cl or the like up to 2%.
It is desirable not to contain 2 O 3 .
【００２７】また、本発明の反射鏡基体の内表面には、
光反射膜が被覆されており、光反射膜が可視光反射膜で
あると、投影機、照明装置あるいは天体望遠鏡の用途に
好適である。この光反射膜の材料としては特に限定は無
いが、金属、酸化物、窒化物、硫化物、フッ化物等から
選ばれた１種あるいは２種以上の混合物を単層あるいは
多層膜として使用できる。The inner surface of the reflector base of the present invention has
When the light reflecting film is coated and the light reflecting film is a visible light reflecting film, it is suitable for use in a projector, a lighting device, or an astronomical telescope. The material of the light reflecting film is not particularly limited, but one or a mixture of two or more selected from metals, oxides, nitrides, sulfides, fluorides, and the like can be used as a single layer or a multilayer film.
【００２８】また、本発明の反射鏡は、反射鏡基体が耐
熱性や耐熱衝撃性に優れるため、高輝度の光源を必要と
する液晶プロジェクタ用光源の反射鏡として好適であ
る。Further, the reflecting mirror of the present invention is suitable as a reflecting mirror of a light source for a liquid crystal projector which requires a high-luminance light source because the reflecting mirror base has excellent heat resistance and thermal shock resistance.
【００２９】上記した本発明の反射鏡は以下のようにし
て製造することができる。The above-described reflecting mirror of the present invention can be manufactured as follows.
【００３０】まず質量百分率でＳｉＯ2 ５０〜８０
％、Ａｌ2 Ｏ3 １２〜３０％、Ｌｉ 2 Ｏ １〜６％、
ＭｇＯ ０〜５％、ＺｎＯ ０〜５％、Ｎａ2 Ｏ ０〜
５％、Ｋ2 Ｏ ０〜５％、ＢａＯ ０．３〜８％、Ｔｉ
Ｏ2 ０〜８％、ＺｒＯ2 ０〜７％、Ｐ2 Ｏ5 ０〜
７％の組成を有するように原料を調合する。なお必要に
応じてさらにＡｓ2Ｏ3、Ｓｂ2Ｏ3、ＳｎＯ2、Ｃｌ、Ｆ
ｅ2 Ｏ3 等を添加してもよい。First, SiO 2 is expressed in terms of mass percentage.Two 50-80
%, AlTwo OThree 12-30%, Li Two O 1-6%,
MgO 0-5%, ZnO 0-5%, NaTwo O 0
5%, KTwo O 0-5%, BaO 0.3-8%, Ti
OTwo 0-8%, ZrOTwo 0-7%, PTwo OFive 0 to
The raw materials are prepared to have a composition of 7%. Still necessary
Further AsTwoOThree, SbTwoOThree, SnOTwo, Cl, F
eTwo OThree Etc. may be added.
【００３１】次に調合したガラス原料を１５５０〜１７
５０℃で４〜２０時間溶融した後、成形し、Ｌｉ2 Ｏ−
Ａｌ2 Ｏ3 −ＳｉＯ2 系結晶性ガラスを得る。成型方法
としては、プレス成型、ブロー成型、遠心鋳造法等が使
用できる。なお結晶化ガラスのβ−ＯＨ量を０．２〜４
／ｍｍに調整するには、含水量の高い原料（例えば水酸
化アルミ原料）を選択したり、ガラス溶融の際の燃焼ガ
ス中の水分量を増加させたり、溶融ガラス中で水蒸気バ
ブリングを行う等の方法により結晶性ガラス中の水分量
を調整することによって行うことができる。Next, the prepared glass raw materials were mixed with 1550-17
After melting at 50 ° C. for 4 to 20 hours, molding is performed, and Li 2 O—
Obtain Al 2 O 3 -SiO 2 -based crystallizable glass. As the molding method, press molding, blow molding, centrifugal casting, or the like can be used. Note that the β-OH content of the crystallized glass is 0.2 to 4
To adjust to / mm, a raw material having a high water content (for example, aluminum hydroxide raw material) is selected, the amount of water in the combustion gas at the time of melting the glass is increased, or steam bubbling is performed in the molten glass. Can be carried out by adjusting the amount of water in the crystalline glass by the method described in (1).
【００３２】続いてこの結晶性ガラスからなる成形体を
７００〜８００℃で１〜４時間保持して核形成を行い、
透明な結晶化ガラスとする場合は８００〜９５０℃で
０．５〜３時間熱処理してβ−石英固溶体を析出させ
る。また白色不透明な結晶化ガラスとする場合は核形成
後に１０５０〜１２５０℃で０．５〜２時間熱処理して
β−スポジュメン固溶体を析出させればよい。このよう
にして得られた結晶化ガラスは、０．２〜４／ｍｍのβ
−ＯＨ量を示す。Subsequently, the molded body made of the crystalline glass is held at 700 to 800 ° C. for 1 to 4 hours to form nuclei.
In the case of forming a transparent crystallized glass, β-quartz solid solution is precipitated by heat treatment at 800 to 950 ° C. for 0.5 to 3 hours. In the case of a white opaque crystallized glass, a β-spodumene solid solution may be precipitated by performing a heat treatment at 1,050 to 1,250 ° C. for 0.5 to 2 hours after nucleation. The crystallized glass thus obtained has a β of 0.2-4 / mm.
Indicates -OH content.
【００３３】さらに、得られた結晶化ガラスから構成さ
れる反射鏡基体の内表面に光反射特性を有する膜を、蒸
着法、スパッタ法、ＣＶＤ法、スピンコート法、ディッ
プコート等の塗布法によって被覆することによって、本
発明の反射鏡を作製することができる。Further, a film having a light reflecting property is coated on the inner surface of the reflector substrate composed of the crystallized glass obtained by a coating method such as a vapor deposition method, a sputtering method, a CVD method, a spin coating method, and a dip coating. By coating, the reflecting mirror of the present invention can be manufactured.
【００３４】[0034]
【実施例】以下、実施例に基づいて本発明の反射鏡を説
明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a reflector according to the present invention will be described based on embodiments.
【００３５】表１、２は本発明の実施例（試料Ｎｏ．１
〜１０）及び比較例（試料Ｎｏ．１１、１２）の組成を
示し、表３、４は本発明の実施例(試料Ｎｏ．１〜１０)
及び比較例（試料Ｎｏ．１１、１２）の評価結果を示
す。また、図１は、本発明の反射鏡の断面図を示す。Tables 1 and 2 show examples of the present invention (sample No. 1).
10 and 10) and Comparative Examples (Sample Nos. 11 and 12), and Tables 3 and 4 show Examples of the present invention (Sample Nos. 1 to 10).
And the evaluation results of Comparative Examples (Sample Nos. 11 and 12) are shown. FIG. 1 shows a sectional view of a reflecting mirror of the present invention.
【００３６】[0036]
【表１】 [Table 1]
【００３７】[0037]
【表２】 [Table 2]
【００３８】各試料は次のようにして調製した。Each sample was prepared as follows.
【００３９】まず表の組成を有するガラスとなるように
各原料を酸化物、水酸化物、ハロゲン化物、炭酸塩、硝
酸塩等の形態で調合し、均一に混合した後、白金坩堝を
用いて電気炉で１５５０〜１６５０℃で８〜２０時間溶
融した。なお試料Ｎｏ．１〜１０は、ガラスの加水を行
うため、Ａｌ2Ｏ3原料に水酸化アルミを用い、さらに溶
融初期に水蒸気バブリングを行った。次いで溶融したガ
ラスを、金型を使用し、図１に示すような反射鏡基体１
１の形状にプレス成型し、さらに徐冷炉を用いて室温ま
で冷却した。このガラス成形体を電気炉に入れ、表３、
４に示すスケジュールで熱処理を行って結晶化した後、
炉冷した。なお昇温速度は、室温から核形成温度までを
３００℃／ｈ、核形成温度から結晶成長温度までを１０
０〜２００℃／ｈとした。その後、反射鏡基体１１の内
表面１２に可視光を反射するＴｉＯ2−ＳｉＯ2交互多層
膜１３を蒸着して反射鏡１０を得た。なお結晶化前にお
ける反射鏡基体の内表面の表面粗さを測定したところ、
０．００３〜０．００５μｍであった。First, each raw material is prepared in the form of an oxide, a hydroxide, a halide, a carbonate, a nitrate, etc. so as to obtain a glass having the composition shown in the table, and uniformly mixed. Melted in a furnace at 1550-1650 ° C. for 8-20 hours. The sample No. In Nos. 1 to 10, in order to add water to the glass, aluminum hydroxide was used as an Al 2 O 3 raw material, and steam bubbling was performed in the early stage of melting. Next, the molten glass was used to form a reflector base 1 as shown in FIG.
It was press-molded into the shape of No. 1 and further cooled to room temperature using a lehr. This glass molded body was placed in an electric furnace, and Table 3,
After heat treatment and crystallization according to the schedule shown in 4,
Furnace cooled. The heating rate was 300 ° C./h from room temperature to the nucleation temperature and 10 ° C. from the nucleation temperature to the crystal growth temperature.
0 to 200 ° C / h. Thereafter, a TiO 2 —SiO 2 alternating multilayer film 13 that reflects visible light was deposited on the inner surface 12 of the reflector base 11 to obtain the reflector 10. When the surface roughness of the inner surface of the reflector base before crystallization was measured,
It was 0.003-0.005 μm.
【００４０】得られた各試料に対して、主結晶、熱膨張
係数、β−ＯＨ量、表面粗さ（Ｒａ）及び反射率の評価
を行い、その結果を表３、４に示す。なお表中の「β−
Ｑ」はβ−石英固溶体を、「β−Ｓ」はβ−スポジュメ
ン固溶体をそれぞれ表している。Each of the obtained samples was evaluated for the main crystal, the coefficient of thermal expansion, the amount of β-OH, the surface roughness (Ra) and the reflectance, and the results are shown in Tables 3 and 4. Note that “β-
“Q” represents β-quartz solid solution, and “β-S” represents β-spodumene solid solution.
【００４１】なお主結晶はＸ線回折装置を用いて評価し
た。熱膨張係数は、結晶化ガラス試料を５０ｍｍ×５ｍ
ｍφの無垢棒に加工し、３０〜７５０℃の温度域での平
均線熱膨張係数を測定した。表面粗さは、反射鏡基体１
１の内表面１２を触針式表面粗さ計（東京精密製）を用
いて、ＪＩＳ Ｂ ０６０１に基づき測定した。また、
反射率は、反射鏡基体１１の内表面１２にＴｉＯ2−Ｓ
ｉＯ2交互多層膜１３を蒸着し、全可視光範囲にわたる
平均反射率を測定し、表面粗さが０．００２μｍの耐熱
ガラスを基体とした反射鏡の平均反射率１００に対する
結晶化ガラス基体の平均反射率の値を求めて評価した。The main crystal was evaluated using an X-ray diffractometer. The thermal expansion coefficient is 50 mm x 5 m for a crystallized glass sample.
It was processed into a solid rod of mφ, and the average linear thermal expansion coefficient in a temperature range of 30 to 750 ° C. was measured. The surface roughness of the reflector base 1
The inner surface 12 of No. 1 was measured using a stylus type surface roughness meter (manufactured by Tokyo Seimitsu) in accordance with JIS B0601. Also,
The reflectivity is such that TiO 2 —S
The iO 2 alternating multilayer film 13 was deposited, and the average reflectance over the entire visible light range was measured. The average reflectance of the crystallized glass substrate was 100 with respect to the average reflectance 100 of a reflector made of heat-resistant glass having a surface roughness of 0.002 μm. The value of the reflectance was determined and evaluated.
【００４２】[0042]
【表３】 [Table 3]
【００４３】[0043]
【表４】 [Table 4]
【００４４】実施例Ｎｏ．１〜１０は、β−ＯＨ量が多
いため、結晶化によっても反射鏡基体の内表面の表面粗
さが小さくなりにくく、反射率が高かった。Example No. In Nos. 1 to 10, since the amount of β-OH was large, the surface roughness of the inner surface of the reflector base was hardly reduced even by crystallization, and the reflectance was high.
【００４５】それに対し、比較例Ｎｏ．１１、１２は、
β−ＯＨ量が少ないため、結晶化により反射鏡基体の内
表面の表面粗さが大きくなり、反射率が低かった。On the other hand, in Comparative Example No. 11, 12
Since the amount of β-OH was small, the surface roughness of the inner surface of the reflector base was increased by crystallization, and the reflectance was low.
【００４６】[0046]
【発明の効果】以上説明したように、本発明の反射鏡
は、β−ＯＨ量が多く、結晶化によっても反射鏡基体の
内表面の表面粗さが大きくなりにくく、耐熱性や耐熱衝
撃性に優れる結晶化ガラスを基体に使用しているため、
高輝度の光源を必要とする液晶プロジェクタ用光源の反
射鏡として好適である。As described above, the reflecting mirror of the present invention has a large amount of β-OH, the surface roughness of the inner surface of the reflecting mirror base is hardly increased by crystallization, and the heat resistance and the thermal shock resistance are improved. Because the crystallized glass which is excellent in is used for the base,
It is suitable as a reflector of a light source for a liquid crystal projector that requires a high-luminance light source.
【図１】本発明の反射鏡の断面図である。FIG. 1 is a sectional view of a reflecting mirror of the present invention.
１０ 反射鏡 １１ 反射鏡基体 １２ 内表面 １３ ＴｉＯ2−ＳｉＯ2交互多層膜10 reflector 11 reflector body 12 in the surface 13 TiO 2 -SiO 2 alternate multilayer film
Claims (5)
る光反射膜から構成される反射鏡において、反射鏡基体
が、β−ＯＨ量が０．２〜４／ｍｍであるＬｉ2Ｏ−Ａ
ｌ2Ｏ3−ＳｉＯ2系結晶化ガラスからなることを特徴と
する反射鏡。1. A reflecting mirror comprising a reflecting mirror base and a light reflecting film coated on an inner surface thereof, wherein the reflecting mirror base is Li 2 O having a β-OH content of 0.2 to 4 / mm. -A
reflector, characterized in that it consists of l 2 O 3 -SiO 2 based crystallized glass.
５０〜８０％、Ａｌ2Ｏ3 １２〜３０％、Ｌｉ2Ｏ １
〜６％、ＭｇＯ ０〜５％、ＺｎＯ ０〜５％、Ｎａ2
Ｏ ０〜５％、Ｋ2Ｏ ０〜５％、ＢａＯ ０．３〜８
％、ＴｉＯ2 ０〜８％、ＺｒＯ2 ０〜７％、Ｐ2Ｏ5
０〜７％の組成を有するＬｉ2Ｏ−Ａｌ2Ｏ3−ＳｉＯ2系
結晶化ガラスであることを特徴とする請求項１に記載の
反射鏡。2. The reflector substrate according to claim 1, wherein the mass percentage is SiO 2.
50~80%, Al 2 O 3 12~30 %, Li 2 O 1
~6%, 0~5% MgO, 0~5 % ZnO, Na 2
O 0-5%, K 2 O 0-5%, BaO 0.3-8
%, TiO 2 0~8%, ZrO 2 0~7%, P 2 O 5
Reflector according to claim 1, characterized in that the Li 2 O-Al 2 O 3 -SiO 2 based crystallized glass having 0-7% of the composition.
が０．０５μｍ以下であることを特徴とする請求項１又
は２に記載の反射鏡。3. The surface roughness (Ra) of the inner surface of the reflector base.
3 is 0.05 μm or less.
厚３ｍｍで、３０％以上であることを特徴とする請求項
１〜３のいずれかに記載の反射鏡。4. The reflector according to claim 1, wherein the average transmittance of the reflector base for visible light is 30% or more at a thickness of 3 mm.
用される反射鏡であることを特徴とする請求項１〜４の
いずれかに記載の反射鏡。5. The reflecting mirror according to claim 1, wherein the reflecting mirror is a reflecting mirror used for a light source for a liquid crystal projector.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000286554A JP2002098817A (en) | 2000-09-21 | 2000-09-21 | Reflecting mirror |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000286554A JP2002098817A (en) | 2000-09-21 | 2000-09-21 | Reflecting mirror |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002098817A true JP2002098817A (en) | 2002-04-05 |
Family
ID=18770461
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000286554A Pending JP2002098817A (en) | 2000-09-21 | 2000-09-21 | Reflecting mirror |
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| Country | Link |
|---|---|
| JP (1) | JP2002098817A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011033714A (en) * | 2009-07-30 | 2011-02-17 | Nippon Electric Glass Co Ltd | Light reflecting substrate |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04367538A (en) * | 1991-02-01 | 1992-12-18 | Okamoto Glass Kk | Heat-resistant ceramics molding and production thereof |
| JPH09169542A (en) * | 1987-01-19 | 1997-06-30 | Nippon Sheet Glass Co Ltd | Transparent crystallized glass |
| JPH11101904A (en) * | 1997-09-29 | 1999-04-13 | Osaka Tokushu Glass Kk | Reflection mirror |
| JP2000044282A (en) * | 1998-05-29 | 2000-02-15 | Nippon Electric Glass Co Ltd | Li2O-Al2O3-SiO2 TYPE TRANSPARENT CRYSTALLIZED GLASS AND CRYSTALLIZABLE GLASS |
-
2000
- 2000-09-21 JP JP2000286554A patent/JP2002098817A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09169542A (en) * | 1987-01-19 | 1997-06-30 | Nippon Sheet Glass Co Ltd | Transparent crystallized glass |
| JPH04367538A (en) * | 1991-02-01 | 1992-12-18 | Okamoto Glass Kk | Heat-resistant ceramics molding and production thereof |
| JPH11101904A (en) * | 1997-09-29 | 1999-04-13 | Osaka Tokushu Glass Kk | Reflection mirror |
| JP2000044282A (en) * | 1998-05-29 | 2000-02-15 | Nippon Electric Glass Co Ltd | Li2O-Al2O3-SiO2 TYPE TRANSPARENT CRYSTALLIZED GLASS AND CRYSTALLIZABLE GLASS |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011033714A (en) * | 2009-07-30 | 2011-02-17 | Nippon Electric Glass Co Ltd | Light reflecting substrate |
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