JP2002094217A - Method of manufacturing printed wiring board - Google Patents

Method of manufacturing printed wiring board

Info

Publication number
JP2002094217A
JP2002094217A JP2000281430A JP2000281430A JP2002094217A JP 2002094217 A JP2002094217 A JP 2002094217A JP 2000281430 A JP2000281430 A JP 2000281430A JP 2000281430 A JP2000281430 A JP 2000281430A JP 2002094217 A JP2002094217 A JP 2002094217A
Authority
JP
Japan
Prior art keywords
copper
film
printed wiring
wiring board
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000281430A
Other languages
Japanese (ja)
Inventor
Tatsuya Hiuga
達也 日向
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Avionics Co Ltd
Original Assignee
Nippon Avionics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Avionics Co Ltd filed Critical Nippon Avionics Co Ltd
Priority to JP2000281430A priority Critical patent/JP2002094217A/en
Publication of JP2002094217A publication Critical patent/JP2002094217A/en
Pending legal-status Critical Current

Links

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  • Chemical Treatment Of Metals (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method of forming an organic resist film high enough in strength to stand an etchant spray in an etching process. SOLUTION: An organic film 9 is selectively formed on the surface of a copper plating by the use of an alkyl benzimidazole solution, and the exposed part of the copper plating is etched, using the organic film 9 as an etching resist in a process of manufacturing a copper through-hole printed wiring board. All the surface of the copper plating 4 including the inner wall of a through-hole is subjected to a blacking treatment 5 before an organic film is formed.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はプリント配線板の製
造方法に係り、導体パターン形成に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a printed wiring board, and more particularly to a method for forming a conductive pattern.

【0002】[0002]

【従来の技術】スルーホールを有するプリント配線板の
導体パターンを形成する方法には、大別してアディティ
ブ法とサブトラクティブ法があり、スルーホールを含む
導体パターン部に銅を付着する方法がアディティブ法で
あり、基材両面およびスルーホール壁面を予め銅で覆い
不要部分の銅をエッチング等により除去する方法がサブ
トラクティブ法である。この二種類の製造方法のうち、
特殊な場合を除き専らサブトラクティブ法が使用され
る。
2. Description of the Related Art A method of forming a conductor pattern of a printed wiring board having through holes is roughly classified into an additive method and a subtractive method. A method of attaching copper to a conductor pattern portion including a through hole is an additive method. There is a subtractive method in which both surfaces of the base material and the wall surfaces of the through holes are covered in advance with copper, and unnecessary copper is removed by etching or the like. Of these two types of manufacturing methods,
Except in special cases, the subtractive method is used exclusively.

【0003】ここで、不要銅をエッチングにより除去す
るサブトラクティブ法はエッチングレジストとして、印
刷された樹脂膜、感光性樹脂膜、金めっき、はんだめっ
きを使用する方法が一般的であり、それぞれの長所短所
を考慮して選定している。金めっきプリント配線板は、
プリント配線板組立て時のはんだ付けにおいて、はんだ
に金が拡散しはんだを脆くしてしまうため、近年では特
殊な場合を除き金めっきによるエッチングレジストを避
ける傾向が強くなっている。また、はんだめっきによる
エッチングレジストは一時期大勢を占めたが、近年では
公害対策を講じた上で必要な場合のみ使用するようにな
っている。
Here, the subtractive method for removing unnecessary copper by etching generally uses a printed resin film, a photosensitive resin film, gold plating, and solder plating as an etching resist. The selection is based on the disadvantages. Gold-plated printed wiring boards
In soldering during the assembly of a printed wiring board, gold diffuses into the solder to make the solder brittle, and in recent years there has been a strong tendency to avoid etching resists by gold plating except in special cases. In addition, etching resists formed by solder plating occupied a large portion for some time, but in recent years, they have been used only when necessary after taking measures against pollution.

【0004】従って、近年の趨勢は金やはんだのオーバ
ーコートめっきを行なわない銅表面が露呈した仕上がり
の導体パターンであって、そのなかでも、感光性樹脂膜
をエッチングレジストとする製造方法が普及している。
この方法は、スルーホール内の壁面銅をスルーホール開
口部両面に張られた樹脂膜によってエッチング液から保
護するところから、テントで風雨を凌ぐのに喩えてテン
ティング法として馴染みが深い。
Accordingly, in recent years, there has been a trend toward a finished conductor pattern in which a copper surface without gold or solder overcoat plating is exposed, and among these, a manufacturing method using a photosensitive resin film as an etching resist has become widespread. ing.
Since this method protects the wall copper in the through-hole from the etching solution by a resin film stretched on both sides of the through-hole opening, it is well known as a tenting method, which is analogous to weathering with a tent.

【0005】近年の電子機器の高速化、小型化がプリン
ト配線板に対する要求仕様として導体パターンの精細
化、高密度化を促進しているため、ビアランドを極力小
径に設計する必要に迫られている。前記テンティング法
の限界を超える小径ランドの設計を行なうためには、従
来、はんだ剥離法と呼ぶはんだめっきをエッチングレジ
ストとして導体パターン形成後はんだを剥離する方法を
採用して銅スルーホールプリント配線板を製造してい
た。しかしながら、最終的に剥離してしまうはんだを敢
えて使用するのは、環境保護上も、コスト面でも得策で
はない。
[0005] In recent years, high speed and miniaturization of electronic devices have promoted the refinement and high density of conductive patterns as required specifications for printed wiring boards, and therefore it is necessary to design via lands as small as possible. . In order to design a small-diameter land exceeding the limit of the tenting method, a conventional method of removing a solder after forming a conductor pattern using solder plating as an etching resist, which is called a solder peeling method, is used. Had been manufactured. However, it is not advisable to use the solder that eventually peels, both in terms of environmental protection and cost.

【0006】上記はんだに代わる物質として、銅表面に
選択的に有機被膜を形成する2−アルキルベンズイミダ
ゾール、2−アルキル−アルキルベンズイミダゾール、
2−フェニルベンツイミダゾール、2−フェニル−アル
キルベンズイミダゾール等の化合物が公知である(特開
平3−235395号)。
As a substitute for the solder, 2-alkylbenzimidazole, 2-alkyl-benzimidazole which selectively forms an organic film on a copper surface,
Compounds such as 2-phenylbenzimidazole and 2-phenyl-alkylbenzimidazole are known (JP-A-3-235395).

【0007】図2は、前記化学物質による処理で形成し
た有機レジスト被膜をエッチングレジストとするプリン
ト配線板の製造方法について断面模式図を使用して示し
たものである。図2(a)は、銅張積層板11にスルー
ホール用穴13を穿孔し、該穴壁13ならびに両面の銅
箔12に無電解銅めっきと電解銅めっきによるめっき銅
14を施し、両面に感光性樹脂フィルム15を貼付し、
露光用ポジフィルム16を密着させて露光17している
状態を示す。図2(b)は、未露光部の感光性樹脂フィ
ルム15を洗浄除去する現像工程と露出しためっき銅表
面の酸化膜除去を目的としたソフトエッチ工程を終えた
状態、図2(c)は、前記化学物質による有機被膜18
処理工程および硬化のための水洗乾燥加温工程を終えた
状態、図2(d)は、残存の感光性樹脂フィルム剥離、
図2(e)は、露出部銅のエッチング、図2(f)は、
有機被膜18を除去した状態を示す。
FIG. 2 is a schematic sectional view showing a method of manufacturing a printed wiring board using an organic resist film formed by the treatment with the chemical substance as an etching resist. FIG. 2A shows a hole 13 for a through hole formed in a copper-clad laminate 11, and a plating copper 14 formed by electroless copper plating and electrolytic copper plating is applied to the hole wall 13 and the copper foils 12 on both surfaces. Affix photosensitive resin film 15,
This shows a state in which the exposure 17 is performed while the exposure positive film 16 is brought into close contact. FIG. 2B shows a state in which a developing step for cleaning and removing the unexposed portion of the photosensitive resin film 15 and a soft etching step for removing an oxide film on the exposed plated copper surface have been completed, and FIG. , Organic coating 18 of the chemical substance
FIG. 2 (d) shows a state in which the processing step and the washing / drying / heating step for curing have been completed, and FIG.
FIG. 2E shows the etching of the exposed portion copper, and FIG.
This shows a state where the organic coating 18 has been removed.

【0008】前記のように、製造工程中の「有機被膜処
理工程」の前に「ソフトエッチ」工程があり、前記公開
特許公報の実施例の一部をそのまま引用すると、『上記
の印刷法、写真法で陰画回路を形成した銅張積層板を2
0%過硫酸ソーダ水溶液に20秒間浸漬して、銅表面を
ソフトエッチしたのちに2−アルキルベンズイミダゾー
ル、又は2−アルキル−アルキルベンズイミダゾールの
1%溶液中に銅張積層板を浸漬し、ゆっくり動かしなが
ら50°Cの温度で3分間処理した。』とある。
As described above, there is a “soft etching” step before the “organic coating processing step” in the manufacturing process. Two copper-clad laminates with negative circuits formed by photo
After immersing in a 0% aqueous sodium persulfate solution for 20 seconds and soft-etching the copper surface, immersing the copper-clad laminate in a 1% solution of 2-alkylbenzimidazole or 2-alkyl-alkylbenzimidazole, slowly Treated at a temperature of 50 ° C. for 3 minutes while moving. "a.

【0009】[0009]

【発明が解決しようとする課題】しかしながら、該被膜
形成前のソフトエッチ工程での銅表面酸化膜除去が該被
膜形成の反応性を低下させてしまい、その後のエッチン
グ工程においてエッチング液噴霧の圧力に負けて該被膜
が剥離してしまう場合があることが判明した。本発明
は、上記課題を解決するためになされたもので、エッチ
ング工程におけるエッチング液の噴霧に十分耐えられる
強度の有機レジスト被膜を形成する製造方法を提供する
ことを目的とする。
However, the removal of the oxide film on the copper surface in the soft etching step before the formation of the coating lowers the reactivity of the formation of the coating, and the pressure of the spray of the etching solution is reduced in the subsequent etching step. It was found that the film could lose due to losing. The present invention has been made to solve the above problems, and has as its object to provide a manufacturing method for forming an organic resist film having sufficient strength to withstand spraying of an etching solution in an etching step.

【0010】[0010]

【課題を解決するための手段】請求項1のプリント配線
板の製造方法は、アルキルベンズイミダゾール系等の溶
液により銅表面に選択的に有機被膜を形成し、該有機被
膜をエッチングレジストとして露出部銅をエッチングす
る銅スルーホールプリント配線板の製造おいて、前記有
機被膜形成処理前にスルーホール壁を含む銅めっき表面
全面を黒化処理することを特徴とする。
According to a first aspect of the present invention, there is provided a method for manufacturing a printed wiring board, wherein an organic film is selectively formed on a copper surface by using a solution such as an alkylbenzimidazole system, and the organic film is exposed as an etching resist. In manufacturing a copper through-hole printed wiring board for etching copper, the entire surface of the copper plating surface including the through-hole walls is blackened before the organic film forming process.

【0011】請求項1のプリント配線板の製造方法によ
れば、アルキルベンズイミダゾール系の溶液の銅に対す
る反応性が酸化膜を除去した銅表面に対する反応性より
良好であるので、エッチング液噴霧に十分耐えられる強
固な有機レジスト被膜を形成することができる。
According to the first aspect of the present invention, the reactivity of the alkylbenzimidazole-based solution to copper is better than the reactivity to the copper surface from which the oxide film has been removed. A durable and strong organic resist film can be formed.

【0012】[0012]

【発明の実施の形態】図1は本発明の一実施形態である
プリント配線板の製造方法について断面模式図により示
したものである。2−アルキルベンズイミダゾールを主
成分とする溶液による銅表面への有機被膜形成を種々試
みるなかで、2−アルキルベンズイミダゾールは酸化膜
を除去した銅表面よりも酸化銅との反応性のほうが良い
ことが判ってきた。本発明における黒化処理は有機被膜
形成前に銅表面を均一に酸化させるための一実施例であ
る。図1に基づいて本発明の製造工程を説明する。
FIG. 1 is a schematic sectional view showing a method for manufacturing a printed wiring board according to an embodiment of the present invention. In various attempts to form an organic film on a copper surface using a solution containing 2-alkylbenzimidazole as a main component, 2-alkylbenzimidazole has better reactivity with copper oxide than a copper surface from which an oxide film has been removed. I knew it. The blackening treatment in the present invention is one embodiment for uniformly oxidizing the copper surface before forming the organic film. The manufacturing process of the present invention will be described with reference to FIG.

【0013】図1(a)は銅張積層板1にスルーホール
用穴3をあけ、該穴3の壁面および銅箔2の表面全面に
無電解銅めっきに続く電解銅めっきによるめっき銅4を
施した後、めっき銅4表面に黒化処理膜5を形成した状
態を示す。黒化処理膜5の形成は、次亜塩素酸ナトリウ
ムと水酸化ナトリウムの約70°C溶液に5分間程度浸
漬することで行なう。図1(b)は感光性樹脂フィルム
6を両面に貼付し、露光用ポジフィルム7を密着させて
露光8している状態、図1(c)は非露光部の感光性樹
脂フィルム6を洗浄除去した現像後の状態を示す。
FIG. 1A shows a hole 3 for a through hole in a copper-clad laminate 1 and a plated copper 4 formed by electroless copper plating followed by electrolytic copper plating on the wall surface of the hole 3 and the entire surface of the copper foil 2. This shows a state where the blackening film 5 is formed on the surface of the plated copper 4 after the application. The blackening film 5 is formed by dipping in a solution of sodium hypochlorite and sodium hydroxide at about 70 ° C. for about 5 minutes. FIG. 1B shows a state in which a photosensitive resin film 6 is stuck on both surfaces, and a positive film 7 for exposure is brought into close contact with the photosensitive resin film 6 for exposure 8, and FIG. The state after development after removal is shown.

【0014】図1(d)は黒化処理済み銅露出部に2−
アルキルベンズイミダゾールを主成分とする溶液により
有機被膜9を形成した状態である。該有機被膜9の形成
は、前記公開特許公報の実施例と同様に、2−アルキル
ベンズイミダゾールの1%溶液中に浸漬し、ゆっくり動
かしながら50°Cの温度で3分間処理する。図1
(e)は感光性樹脂フィルム6の除去および前工程にお
いて形成済みの有機被膜9の乾燥硬化である。この段階
で、該有機被膜9はスルーホール内および導体パターン
として残す銅をエッチング液噴霧から守ることができる
強度が得られる。
FIG. 1 (d) shows 2-
This is a state in which the organic coating 9 is formed with a solution containing alkylbenzimidazole as a main component. The organic coating 9 is formed by immersing it in a 1% solution of 2-alkylbenzimidazole and treating it at a temperature of 50 ° C. for 3 minutes while slowly moving the organic coating 9 in the same manner as in the example of the above-mentioned publication. FIG.
(E) shows the removal of the photosensitive resin film 6 and the drying and curing of the organic film 9 formed in the previous step. At this stage, the organic coating 9 has sufficient strength to protect copper remaining in the through hole and as a conductor pattern from the spray of the etching solution.

【0015】図1(f)は前記有機被膜9で覆われてい
ない部分の銅がエッチングされ、導体パターンが形成さ
れた状態、図1(g)は前記有機被膜9を除去した状態
を示す。なお、この段階ではスルーホール内および導体
パターンの銅表面は黒化処理した状態であるが、図では
省略した後工程としてソルダーレジスト塗布があり、そ
の前処理として表面研磨および酸化膜除去が行なわれる
ので黒化処理膜は無くなる。
FIG. 1 (f) shows a state where the copper not covered by the organic film 9 is etched to form a conductor pattern, and FIG. 1 (g) shows a state where the organic film 9 is removed. At this stage, the inside of the through hole and the copper surface of the conductor pattern are in a blackened state, but a solder resist is applied as a post-process omitted in the drawing, and the surface is polished and the oxide film is removed as a pretreatment. Therefore, the blackened film is eliminated.

【0016】前記実施例では、銅表面の酸化手段として
次亜塩素酸ナトリウムと水酸化ナトリウムの溶液による
黒化処理を示したが、銅表面を均一に酸化する他の方法
であっても同様な効果が得られる。
In the above embodiment, as a means for oxidizing the copper surface, a blackening treatment with a solution of sodium hypochlorite and sodium hydroxide was described. However, the same method can be applied to other methods for uniformly oxidizing the copper surface. The effect is obtained.

【0017】[0017]

【発明の効果】本発明によれば、テンティング法では作
業できないマイクロビアを持つプリント配線板やスルー
ホール径が大きいプリント配線板を銅スルーホールで製
造する際に使用する、銅表面に選択的に反応し有機被膜
を形成するアルキルベンズイミダゾール系溶液は、酸化
膜のない銅表面に対してよりも黒化処理した銅表面に対
してより反応性が良好で強固な有機被膜を形成できるの
で、エッチング液噴霧により該有機被膜の損傷がなく良
好な導体パターンを歩留まり良く形成することができ
る。
According to the present invention, it is possible to selectively form a printed wiring board having micro vias or a printed wiring board having a large through-hole diameter with a copper through-hole, which cannot be worked by the tenting method, by selectively using a copper surface. Alkylbenzimidazole-based solutions that form an organic film by reacting with a can form a strong organic film with better reactivity on a blackened copper surface than on a copper surface without an oxide film, By spraying the etching solution, a good conductor pattern can be formed with good yield without damaging the organic film.

【図面の簡単な説明】[Brief description of the drawings]

【図1】図1は、本発明の一実施の形態であるプリント
配線板の製造方法について断面模式図により示したもの
である。
FIG. 1 is a schematic cross-sectional view illustrating a method for manufacturing a printed wiring board according to an embodiment of the present invention.

【図2】図2は、アルキルベンズイミダゾール系溶液に
よる処理で形成した有機レジスト被膜をエッチングレジ
ストとするプリント配線板の製造方法について断面模式
図を使用して示したものである。
FIG. 2 is a schematic cross-sectional view showing a method for manufacturing a printed wiring board using an organic resist film formed by treatment with an alkylbenzimidazole-based solution as an etching resist.

【符号の説明】[Explanation of symbols]

1 銅張積層板 2 銅箔 3 スルーホール用穴 4 めっき銅 5 黒化処理膜 6 感光性樹脂フィルム 7 露光用ポジフィルム 8 露光 9 有機被膜 11 銅張積層板 12 銅箔 13 スルーホール用穴(穴壁) 14 めっき銅 15 感光性樹脂フィルム 16 露光用ポジフィルム 17 露光 18 有機被膜 Reference Signs List 1 copper-clad laminate 2 copper foil 3 through-hole 4 plated copper 5 blackened film 6 photosensitive resin film 7 exposure positive film 8 exposure 9 organic coating 11 copper-clad laminate 12 copper foil 13 through-hole ( Hole wall) 14 Plated copper 15 Photosensitive resin film 16 Positive film for exposure 17 Exposure 18 Organic coating

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 アルキルベンズイミダゾール系の溶液に
より銅表面に選択的に有機被膜を形成し、該有機被膜を
エッチングレジストとして露出部銅をエッチングする銅
スルーホールプリント配線板の製造おいて、前記有機被
膜形成処理前にスルーホール壁を含む銅めっき表面全面
を黒化処理することを特徴とするプリント配線板の製造
方法。
1. A method of manufacturing a copper through-hole printed wiring board, wherein an organic film is selectively formed on a copper surface with an alkylbenzimidazole-based solution, and the exposed portion is etched using the organic film as an etching resist. A method for manufacturing a printed wiring board, comprising subjecting a copper plating surface including a through-hole wall to a blackening process before a film forming process.
JP2000281430A 2000-09-18 2000-09-18 Method of manufacturing printed wiring board Pending JP2002094217A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000281430A JP2002094217A (en) 2000-09-18 2000-09-18 Method of manufacturing printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000281430A JP2002094217A (en) 2000-09-18 2000-09-18 Method of manufacturing printed wiring board

Publications (1)

Publication Number Publication Date
JP2002094217A true JP2002094217A (en) 2002-03-29

Family

ID=18766091

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000281430A Pending JP2002094217A (en) 2000-09-18 2000-09-18 Method of manufacturing printed wiring board

Country Status (1)

Country Link
JP (1) JP2002094217A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100675012B1 (en) * 2006-02-06 2007-01-29 삼성전자주식회사 Pcb having enforced copper plated film and method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100675012B1 (en) * 2006-02-06 2007-01-29 삼성전자주식회사 Pcb having enforced copper plated film and method thereof

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