JPH0645729A - Manufacturing method of printed-wiring board - Google Patents
Manufacturing method of printed-wiring boardInfo
- Publication number
- JPH0645729A JPH0645729A JP19834892A JP19834892A JPH0645729A JP H0645729 A JPH0645729 A JP H0645729A JP 19834892 A JP19834892 A JP 19834892A JP 19834892 A JP19834892 A JP 19834892A JP H0645729 A JPH0645729 A JP H0645729A
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- pattern
- wiring board
- roughness
- printed wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、プリント配線板の製造
方法に関するもので、特にパターン形成用のフォトレジ
スト形成のための前処理を行うプリント配線板の製造方
法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a printed wiring board, and more particularly to a method for manufacturing a printed wiring board which performs a pretreatment for forming a photoresist for pattern formation.
【0002】[0002]
【従来の技術】各種電子機器に使用されるプリント配線
板は、電子部品の小型化、高機能化が促進されるととも
に、これらの部品の高密度実装技術の進展に伴い、高密
度プリント配線板の要求が強くなっている。高密度プリ
ント配線板はサブトラクト法、アディティブ法によりパ
ターン形成され、電子部品への小型化が可能なことなど
の特長を有しているため、種々の製造法が検討されてい
る。これらの方法ではいずれも銅張積層板にパターン形
成用のフォトレジストを形成し、これを現像してパター
ン形成を行っている。2. Description of the Related Art Printed wiring boards used in various electronic devices have been promoted in miniaturization and high functionality of electronic components, and with the progress of high-density mounting technology for these components, high-density printed wiring boards have been developed. The demand for is getting stronger. Since a high-density printed wiring board is formed by a subtractive method or an additive method and has features such as miniaturization of electronic parts, various manufacturing methods have been studied. In all of these methods, a photoresist for pattern formation is formed on a copper clad laminate, and this is developed to form a pattern.
【0003】このようなプリント配線板の製造方法にお
けるパターン形成のためのフォトレジスト形成の前処理
法として、機械的研磨のバフ研磨を行った後、フォトレ
ジストをラミネートし、マスクフィルムを合わせ、露
光、現像、エッチングを行い、パターン形成するテンテ
ィング法、または現像後にパターン銅めっきと半田めっ
きを行う金属レジスト法などがある。As a pretreatment method for photoresist formation for pattern formation in such a method for producing a printed wiring board, buffing by mechanical polishing is performed, then photoresist is laminated, mask films are aligned and exposed. There are a tenting method of developing and etching to form a pattern, or a metal resist method of performing pattern copper plating and solder plating after development.
【0004】この場合、フォトレジスト形成の前処理法
として、機械的研磨によるテンティング法は、研磨面の
粗さ方向に沿って、パターン形成工程液が、フォトレジ
ストと研磨面の界面に浸入し、パターンの欠け、断線に
つながるなどの欠点がある。一方、機械的研磨による金
属レジスト法のパターン形成は、パターン銅めっきおよ
び半田めっきの際にフォトレジストと研磨面の界面にめ
っき液が浸入して、銅および半田が析出し、パターンの
太りやパターンの短絡等につながる欠点がある。In this case, a tenting method by mechanical polishing is used as a pretreatment method for photoresist formation, in which the pattern forming process liquid penetrates into the interface between the photoresist and the polishing surface along the roughness direction of the polishing surface. There are defects such as chipping of the pattern and disconnection. On the other hand, in the pattern formation of the metal resist method by mechanical polishing, the plating solution penetrates into the interface between the photoresist and the polishing surface during pattern copper plating and solder plating, copper and solder are deposited, and pattern thickening and pattern There is a drawback that leads to a short circuit, etc.
【0005】[0005]
【発明が解決しようとする課題】このように従来のプリ
ント配線板の製造方法において、フォトレジスト形成の
前処理法としての、機械的研磨による粗面化方法は、回
路形成のサブトラクト法のテンティング法および金属レ
ジスト法を用いた場合、研磨面の粗さ方向に沿って、パ
ターン形成工程液がレジストと研磨面の界面に浸入し、
レジストの浮き等により、レジストの密着力が低下し、
パターンの欠け、断線、太り、短絡等を発生するなどの
問題点があった。As described above, in the conventional method for manufacturing a printed wiring board, the roughening method by mechanical polishing, which is a pretreatment method for photoresist formation, is the tenting of the subtraction method for circuit formation. Method and the metal resist method, the pattern forming step liquid penetrates into the interface between the resist and the polishing surface along the roughness direction of the polishing surface,
The adhesion of the resist is reduced due to the floating of the resist,
There are problems such as chipping of the pattern, disconnection, thickening, and short circuit.
【0006】本発明は、プリント配線板の製造方法のパ
ターン形成における上記問題点を解消するためになされ
たもので、従来法の機械的研磨に比べ、レジスト密着面
の粗さを低下させるとともに均一化し、かつ粗さ方向を
抑制し、これにより密着面におけるレジストの密着力を
向上させ、パターン精度を向上させることが可能なプリ
ント配線板の製造方法を得ることを目的とする。The present invention has been made in order to solve the above problems in pattern formation in a method for manufacturing a printed wiring board, and reduces the roughness of the resist contact surface and makes it uniform as compared with the conventional mechanical polishing. It is an object of the present invention to obtain a method for manufacturing a printed wiring board, which can reduce the roughness direction and improve the adhesive force of the resist on the contact surface, thereby improving the pattern accuracy.
【0007】[0007]
【課題を解決するための手段】この発明は次のプリント
配線板の製造方法である。 (1)銅張積層板にフォトレジストを形成して、回路パ
ターンの形成を行うプリント配線板の製造方法におい
て、フォトレジスト形成の前処理として、銅張積層板に
化学処理による粗面化を施し、粗化面にフォトレジスト
を形成して、パターン形成を行うプリント配線板の製造
方法。 (2)化学処理として、ブラックオキサイド処理、光沢
剤を添加しないめっき処理、または塩化第二鉄によるソ
フトエッチング処理を施す上記(1)記載のプリント配
線板の製造方法。The present invention is the following method for manufacturing a printed wiring board. (1) In a method for manufacturing a printed wiring board in which a photoresist is formed on a copper-clad laminate to form a circuit pattern, the copper-clad laminate is roughened by chemical treatment as a pretreatment for photoresist formation. A method for manufacturing a printed wiring board, wherein a photoresist is formed on a roughened surface to form a pattern. (2) The method for producing a printed wiring board according to (1) above, wherein the chemical treatment is black oxide treatment, plating treatment without addition of a brightening agent, or soft etching treatment with ferric chloride.
【0008】[0008]
【作用】本発明のプリント配線板の製造方法において
は、パターン形成のためのフォトレジスト形成前に化学
処理を施して、銅張積層板の銅表面を粗面化する。化学
処理としては、ブラックオキサイド処理により黒化膜を
形成し、さらに密着性を向上させる手段として、先ず、
黒化膜形成後、酸により該表面層を溶解させ、金属の酸
化皮膜を除去する方法、光沢剤を添加しないめっき処理
を行う方法、塩化第二鉄によりソフトエッチングする方
法などがある。これらの化学処理により粗面化した後、
粗化面にフォトレジストをラミネートし、所望のパター
ン形成を行い、プリント配線板を製造する。In the method of manufacturing a printed wiring board according to the present invention, the copper surface of the copper clad laminate is roughened by performing a chemical treatment before forming a photoresist for forming a pattern. As the chemical treatment, a blackened film is formed by black oxide treatment, and as a means for further improving the adhesion, first,
After formation of the blackening film, there are a method of dissolving the surface layer with an acid to remove the metal oxide film, a method of performing a plating treatment without adding a brightening agent, a method of soft etching with ferric chloride. After roughening by these chemical treatments,
A photoresist is laminated on the roughened surface and a desired pattern is formed to manufacture a printed wiring board.
【0009】本発明では、パターン形成用のフォトレジ
スト形成前に化学処理を施すことにより、レジスト密着
面の粗さが低下するとともに、粗化が均一化され、さら
に粗化面の方向性が分散化される。これによりレジスト
ラミネート後のパターン形成工程液は、粗化面とレジス
トの界面への侵入を抑制され、パターン形成レジストの
密着力が向上する。In the present invention, by performing a chemical treatment before forming a photoresist for pattern formation, the roughness of the resist contact surface is reduced, the roughening is made uniform, and the directionality of the roughened surface is dispersed. Be converted. As a result, the pattern forming process liquid after resist lamination is prevented from entering the interface between the roughened surface and the resist, and the adhesion of the pattern forming resist is improved.
【0010】[0010]
【実施例】実施例1 以下、本発明をより具体的に説明するため、実施例によ
り説明するが本発明は実施例のみに限定されるものでは
ない。 1)銅張積層板にスルホールを形成してスルホールめっ
きを行った後、脱脂、湯洗、水洗、希硫酸処理、水洗、
水酸化ナトリウムによるブラックオキサイド処理、水洗
の工程を経て次に10wt%の塩酸に3〜5秒間浸漬
し、黒化膜を溶解させた後さらに水洗、希硫酸、水洗、
乾燥を行い、銅表面を粗面化した。そして粗化面にフォ
トレジストをラミネートし、金属レジスト法により、所
望のパターン形成を行った。EXAMPLES Example 1 Hereinafter, the present invention will be described in more detail by way of examples, but the present invention is not limited to the examples. 1) After forming through holes on the copper clad laminate and performing through hole plating, degreasing, washing with hot water, washing with water, dilute sulfuric acid treatment, washing with water,
After black oxide treatment with sodium hydroxide and washing with water, it is immersed in 10 wt% hydrochloric acid for 3 to 5 seconds to dissolve the blackened film, and then washed with water, diluted sulfuric acid, washed with water,
Drying was performed to roughen the copper surface. Then, a photoresist was laminated on the roughened surface, and a desired pattern was formed by a metal resist method.
【0011】この化学処理により粗さ0.1ミクロン以
下の均一な粗化面が得られ、これによりパターン形成用
フォトレジストと粗化面の界面への金属レジスト液の浸
入がなくなり、良好な回路パターンが得られた。By this chemical treatment, a uniform roughened surface having a roughness of 0.1 micron or less can be obtained, which prevents the metal resist solution from infiltrating into the interface between the photoresist for pattern formation and the roughened surface, and a good circuit can be obtained. The pattern was obtained.
【0012】実施例2 銅張積層板にスルホールを形成してスルホール銅めっき
を行った後、予め別の槽に調製した光沢剤を添加しない
硫酸銅めっき液を用いて、銅表面に1ミクロン以下のめ
っきを付与し、銅表面を粗面化した。次に乾燥を行い、
フォトレジストをラミネートし、実施例1と同一操作を
行い、パターンを形成した。この場合、光沢剤を添加し
ない銅めっきは、銅めっきの結晶粒子が大きくなり、め
っき表面が粗化し、密着性が向上する。ただし、めっき
厚は、1ミクロン以下が良好であり、厚くすると、銅め
っき間で層間剥離を発生する。Example 2 After forming through-holes on a copper-clad laminate and performing through-hole copper plating, using a copper sulfate plating solution containing no brightening agent prepared in another bath in advance, the copper surface has a thickness of 1 micron or less. Plating was applied to roughen the copper surface. Then dry it
A photoresist was laminated, and the same operation as in Example 1 was performed to form a pattern. In this case, in the copper plating without the addition of the brightening agent, the crystal particles of the copper plating become large, the plating surface is roughened, and the adhesion is improved. However, the plating thickness is preferably 1 micron or less, and if it is thick, delamination occurs between the copper platings.
【0013】実施例3 化学処理として、塩化第二鉄溶液で1〜1.5ミクロン
のソフトエッチングを行い、実施例1、と同一操作を行
いパターンを形成した。Example 3 As a chemical treatment, a soft etching of 1 to 1.5 μm was performed with a ferric chloride solution, and the same operation as in Example 1 was performed to form a pattern.
【0014】フォトレジスト前処理として、従来の機械
的研磨を行うと、粗化面の粗さが1.5〜2.0ミクロ
ンとなるとともに、粗化面の粗さ方向が同一となるた
め、後工程のパターン形成用工程液が粗化面とフォトレ
ジスト界面に浸入し、パターンの不具合を生じる。そし
て機械的研磨の粗さが1ミクロン以下の場合、密着性が
著しく低下する。When conventional mechanical polishing is performed as a photoresist pretreatment, the roughness of the roughened surface becomes 1.5 to 2.0 μm, and the roughness directions of the roughened surface become the same. The pattern forming process liquid in the subsequent process penetrates into the roughened surface and the photoresist interface, and causes a pattern defect. When the roughness of mechanical polishing is 1 micron or less, the adhesiveness is significantly reduced.
【0015】これに対して実施例1〜3の化学処理を施
すことににより、粗化面の粗さが0.1ミクロン以下と
なり、さらに粗さが均一化する。粗さの低下と均一化に
より、パターン形成用工程液の浸入が防止され、パター
ン精度が向上する。On the other hand, by performing the chemical treatment of Examples 1 to 3, the roughness of the roughened surface becomes 0.1 micron or less, and the roughness becomes more uniform. By reducing the roughness and making it uniform, the infiltration of the pattern forming process liquid is prevented, and the pattern accuracy is improved.
【0016】また、化学処理により生成する酸化皮膜
は、酸に対して極めて溶解性が大きいため、これを酸に
より溶解除去することにより、フォトレジストと粗化面
の銅との密着性がさらに向上する。Further, since the oxide film formed by the chemical treatment has extremely high solubility with respect to acid, the adhesiveness between the photoresist and the copper on the roughened surface is further improved by dissolving and removing the oxide film with acid. To do.
【0017】なお、上記の説明において、化学処理とし
てブラックオキサイド処理光沢剤を添加しないめっき処
理、ソフトエッチング処理を示したが他の化学処理によ
る粗面化を行ってもよい。In the above description, as the chemical treatment, the plating treatment without the addition of the black oxide treatment brightener and the soft etching treatment are shown, but the surface may be roughened by another chemical treatment.
【0018】[0018]
【発明の効果】本発明のプリント配線板の製造方法によ
れば、フォトレジスト前処理として、化学処理による粗
面化を施すため、粗化面の粗さを小さくして均一化する
とともに、粗さの方向性をなくすことができ、これによ
りレジストの密着性を向上させて、粗化面とフォトレジ
スト間へのパターン形成工程液の浸入を防止でき、パタ
ーン精度を向上させることができる。According to the method for manufacturing a printed wiring board of the present invention, since roughening is performed by a chemical treatment as a photoresist pretreatment, the roughness of the roughened surface is reduced to be uniform and It is possible to eliminate the directionality of the thickness, thereby improving the adhesiveness of the resist, preventing the infiltration of the pattern forming process liquid between the roughened surface and the photoresist, and improving the pattern accuracy.
Claims (2)
て、回路パターンの形成を行うプリント配線板の製造方
法において、フォトレジスト形成の前処理として、銅張
積層板に化学処理による粗面化を施し、粗化面にフォト
レジストを形成して、パターン形成を行うことを特徴と
するプリント配線板の製造方法。1. A method of manufacturing a printed wiring board, wherein a photoresist is formed on a copper-clad laminate to form a circuit pattern, and the copper-clad laminate is roughened by chemical treatment as a pretreatment for photoresist formation. And forming a photoresist on the roughened surface to form a pattern, the method for producing a printed wiring board.
理、光沢剤を添加しないめっき処理、または塩化第二鉄
によるソフトエッチング処理を施すことを特徴とする請
求項1記載のプリント配線板の製造方法。2. The method for producing a printed wiring board according to claim 1, wherein a black oxide treatment, a plating treatment without adding a brightening agent, or a soft etching treatment with ferric chloride is performed as the chemical treatment.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19834892A JPH0645729A (en) | 1992-07-24 | 1992-07-24 | Manufacturing method of printed-wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19834892A JPH0645729A (en) | 1992-07-24 | 1992-07-24 | Manufacturing method of printed-wiring board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0645729A true JPH0645729A (en) | 1994-02-18 |
Family
ID=16389623
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19834892A Pending JPH0645729A (en) | 1992-07-24 | 1992-07-24 | Manufacturing method of printed-wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0645729A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5501350A (en) * | 1994-01-06 | 1996-03-26 | Toppan Printing Co., Ltd. | Process for producing printed wiring board |
WO2007039992A1 (en) * | 2005-10-05 | 2007-04-12 | Nippon Mining & Metals Co., Ltd. | Two-layer flexible substrate |
-
1992
- 1992-07-24 JP JP19834892A patent/JPH0645729A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5501350A (en) * | 1994-01-06 | 1996-03-26 | Toppan Printing Co., Ltd. | Process for producing printed wiring board |
WO2007039992A1 (en) * | 2005-10-05 | 2007-04-12 | Nippon Mining & Metals Co., Ltd. | Two-layer flexible substrate |
JPWO2007039992A1 (en) * | 2005-10-05 | 2009-04-16 | 日鉱金属株式会社 | 2-layer flexible board |
JP4771552B2 (en) * | 2005-10-05 | 2011-09-14 | Jx日鉱日石金属株式会社 | 2-layer flexible board |
US8568856B2 (en) | 2005-10-05 | 2013-10-29 | Nippon Mining & Metals Co., Ltd. | Two-layer flexible substrate |
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