JP2002090987A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2002090987A5 JP2002090987A5 JP2001209543A JP2001209543A JP2002090987A5 JP 2002090987 A5 JP2002090987 A5 JP 2002090987A5 JP 2001209543 A JP2001209543 A JP 2001209543A JP 2001209543 A JP2001209543 A JP 2001209543A JP 2002090987 A5 JP2002090987 A5 JP 2002090987A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001209543A JP4226808B2 (ja) | 2000-07-12 | 2001-07-10 | ポジ型レジスト組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000211642 | 2000-07-12 | ||
| JP2000-211642 | 2000-07-12 | ||
| JP2001209543A JP4226808B2 (ja) | 2000-07-12 | 2001-07-10 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002090987A JP2002090987A (ja) | 2002-03-27 |
| JP2002090987A5 true JP2002090987A5 (enExample) | 2006-01-19 |
| JP4226808B2 JP4226808B2 (ja) | 2009-02-18 |
Family
ID=26595896
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001209543A Expired - Fee Related JP4226808B2 (ja) | 2000-07-12 | 2001-07-10 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4226808B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004004561A (ja) * | 2002-02-19 | 2004-01-08 | Sumitomo Chem Co Ltd | ポジ型レジスト組成物 |
| JP4286151B2 (ja) | 2002-04-01 | 2009-06-24 | ダイセル化学工業株式会社 | フォトレジスト用高分子化合物の製造法 |
| JP4606392B2 (ja) * | 2002-04-01 | 2011-01-05 | ダイセル化学工業株式会社 | フォトレジスト用高分子化合物の製造法 |
| CN100565340C (zh) * | 2002-09-12 | 2009-12-02 | 住友化学工业株式会社 | 化学增强型光刻胶组合物 |
| WO2011104127A1 (en) | 2010-02-24 | 2011-09-01 | Basf Se | Latent acids and their use |
| KR102537349B1 (ko) | 2015-02-02 | 2023-05-26 | 바스프 에스이 | 잠재성 산 및 그의 용도 |
-
2001
- 2001-07-10 JP JP2001209543A patent/JP4226808B2/ja not_active Expired - Fee Related