JP2002090963A - Photosensitive material processing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a photosensitive material processing device which is increased in the substitution speed of a processing liquid by decreasing the amount of liquid housed in processing tanks. SOLUTION: A photosensitive material passage 22P for transporting a photosensitive material 20 in the liquid is formed at a partition plate 16P for forming plural washing tanks. The photosensitive material passage 22P is provided with a blade 24P and a guide member 24P. The photosensitive materials 20 are squeezed in the liquid during the passage through the photosensitive material passage 22P. Nip rollers 38 are disposed above the partition plate 16Q and the photosensitive materials 20 ejected from the second tank 14B are squeezed outside the liquid. Since the photosensitive materials 20 are squeezed in the liquid and outside the liquid, the transporting path length in the washing tanks may be made longer than the length at which the photosensitive materials are squeezed only in the liquid. Accordingly, the downsizing of the washing tanks is realized, and accompanying this, the reduction of the amount of the washing water stored in the washing tanks can be realized.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive material processing apparatus for processing a photosensitive material with a processing solution.

[0002]

2. Description of the Related Art Automatic developing machines (film processors, printer processors, etc.) used in laboratories and the like are provided with a photosensitive material processing apparatus for processing photosensitive materials (mainly films and color papers) with a solution.

This photosensitive material processing apparatus has a plurality of processing tanks containing water and processing solutions for color development, bleach-fixing, washing and stabilization, and the like, and the photosensitive material is conveyed in these processing tanks. .

Hereinafter, a conventional photosensitive material processing apparatus will be described with reference to an example in which the photosensitive material is washed with water. As shown in FIG. 8, in the washing section of the photosensitive material processing apparatus 80, washing is performed using a plurality of baths. The photosensitive material 84 is conveyed in a washing tank 82, and the processing solution components are removed from the film of the photosensitive material 84. The main purpose is to wash out.

If the washing is continued, the bleach-fixing component that has flowed out of the photographic material usually increases in the washing tank, and the water in the washing tank approaches a diluting solution of the bleach-fixing component. For this reason, the photosensitive material processing apparatus 80 is designed and manufactured so that the replenishing water is added to reduce the concentration of the processing solution components such as the bleach-fixing components, thereby maintaining the washing performance in water washing.

If the amount of replenishing water added is small, the concentration of the treatment liquid component in the washing water increases, and the washing performance deteriorates. Therefore,
As the washing tank 82, a tank having a high circulation speed and a small capacity is considered to be the best.

In the washing tank 82, a processing rack 86 for guiding the photosensitive material 84 is provided.
The structure of the processing rack 86 is a relatively large-sized structure in which the photosensitive material is lowered from the upper part in one tank (tank), turned at the lower part, and transported and discharged again to the upper part. For this reason, there is a problem that the amount of liquid in the processing tank needs to be very large. In addition, the washing tank generally has a multi-tank structure. For example, a washing tank having a four-tank structure requires four reciprocating paths in the vertical direction, which further exacerbates the above problem.

In addition, since the photosensitive material moves up and down in one tank, the opening area of the lid of the tank (tank) in a multi-tank structure becomes large, so that the deterioration of the liquid (washing water) in the washing tank is prevented. This also promotes the problem that the durability of the liquid is low.

[0009] Such a problem occurs not only in the case of washing in a washing tank but also in the case of treating with a general treating solution.

[0010]

SUMMARY OF THE INVENTION In view of the above facts, the present invention reduces the amount of processing solution contained in a processing tank to increase the replacement speed of the solution, and also reduces the deterioration speed of the processing solution. It is an object of the present invention to provide a photosensitive material processing apparatus having the above-mentioned structure.

[0011]

According to the first aspect of the present invention, there is provided a photosensitive material processing apparatus in which a photosensitive material transport path for transporting a photosensitive material in a processing solution is formed in a partition wall between processing tanks. A squeezing section provided in the photosensitive material transport path and squeezing the photosensitive material in a processing liquid; and an out-of-liquid squeezing section squeezing the photosensitive material carried out of the processing tank out of the liquid. It is characterized by having.

In this case, it is preferable that the photosensitive material is conveyed from the processing tank containing different types of processing liquid to the processing tank via the extra liquid squeezing section. As a result, the processing liquid does not pass through the photosensitive material transport path and mixes with different types of processing liquids. Therefore, it is possible to prevent the components of the processing liquid from greatly changing.

According to the first aspect of the present invention, the photosensitive material is squeezed in both the liquid squeezing portion and the liquid squeezing portion. The road length can be lengthened.
Accordingly, the size of the processing tank is reduced, and accordingly, the amount of the processing liquid contained in the processing tank is reduced.

According to a second aspect of the present invention, washing water is used as the treatment liquid, and the treatment tank is a washing tank for containing the washing water.

As a result, the size of the washing tank can be reduced, and the amount of washing water contained in the washing tank can be reduced.

According to the third aspect of the present invention, the washing tank is a plurality of washing tanks formed by partitioning one tank with at least one partition plate, and the photosensitive material conveying path and the photosensitive tank are provided on the partition plate. The liquid squeezing part is formed.

The partition plate is equivalent to the partition wall according to the first aspect in terms of separation of the washing water, and may be detachable.

According to the third aspect of the present invention, a plurality of washing tanks for submerged transfer can be easily formed from one tank.

According to a fourth aspect of the present invention, the squeeze portion in liquid and the squeeze portion out of liquid are alternately provided along a conveying path of the photosensitive material.

As a result, the length of the transfer path in the washing tank can be made sufficiently long. Therefore, the size of the washing tank can be further reduced, and the amount of washing water contained in the washing tank can be further reduced. Is realized.

According to the fifth aspect of the present invention, an odd number of the partition plates are provided in one tank to form an even number of washing tanks. The liquid squeezing portion formed on all the partition plates is provided above all of the even-numbered partition plates.

This makes it possible to carry the photosensitive material into the forefront washing tank from above, perform squeeze-in-liquid and out-of-liquid squeeze sequentially, and carry the photosensitive material upward from the last-stage washing tank.

In the invention according to claim 6, a sheet-like blade is provided in the squeezing portion for preventing the washing water from passing through the photosensitive material transport path, and the photosensitive material slides with respect to the blade. It is characterized by being squeezed in washing water.

The blade is preferably soft from the viewpoint of preventing damage to the photosensitive material.

According to the sixth aspect of the invention, the structure of the submerged squeeze portion can be simplified.

In the invention according to claim 7, the blade is arranged on the emulsion side of the photosensitive material, and a hard guide member for guiding the photosensitive material by contacting the surface opposite to the emulsion side. Is provided in the submerged squeeze section.

Thus, the emulsion surface of the photosensitive material can be prevented from being damaged during squeezing in liquid, and the guide member is prevented from escaping from the blade during squeezing in liquid.

The invention according to claim 8 is characterized in that the light-sensitive material is conveyed with the emulsion surface facing upward.

This prevents solids such as dust from staying between the blade and the emulsion surface. Therefore, it is possible to prevent the solid from being pressed against the emulsion surface by the blade during the submerged squeezing to damage the emulsion surface.

According to the ninth aspect of the present invention, a nip roller capable of blocking the passage of washing water from the photosensitive material transport path is provided in the submerged squeeze portion, and the photosensitive material is nipped by the nip roller. It is characterized by being squeezed in washing water.

Thus, the photosensitive material can be passed through the photosensitive material transport path while being nipped and transported.

In a tenth aspect of the present invention, there is provided a photosensitive material processing apparatus in which a rack having the submerged squeezing section is provided in each of the washing tanks. Is formed, and a first rack for carrying out the photosensitive material from a substantially lower part, and a second rack in which the photosensitive material is carried in from a substantially lower part, and an outlet for the photosensitive material is formed in a substantially upper part, Are alternately arranged.

Thus, the opening of the rack at the liquid (washing water) interface can be only one of the entrance and exit of the photosensitive material, and therefore the washing water is exposed to the atmosphere. Deterioration speed can be suppressed.

According to the eleventh aspect of the present invention, during the processing of the photosensitive material, the opening of the liquid interface portion of the first rack or the second rack may be any one of an insertion port and a discharge port of the photosensitive material. It is characterized in that there is only one.

As a result, the photosensitive material can sufficiently suppress the deterioration rate of the washing water due to exposure to the atmosphere.

In the twelfth aspect of the present invention, in a region where the photosensitive material is transported in the air, a crossover rack that covers the photosensitive material from above is provided over an adjacent washing tank. .

This prevents the photosensitive material from drying when transported in the air, and prevents dust in the air from adhering to the photosensitive material.

According to the thirteenth aspect of the present invention, the first rack for carrying the photosensitive material from substantially above and carrying it out from substantially below,
A second rack for loading the photosensitive material from substantially below and unloading the photosensitive material from substantially above, and the first rack and the second rack
And at least one tank for accommodating a module body separated by two partition plates, and a photosensitive material transport path for transporting the photosensitive material in a liquid is formed in the partition plate, and the photosensitive material is processed in a processing solution. A submerged liquid squeezing section is formed in the photosensitive material transport path, and transports the photosensitive material in the processing liquid accommodated in the module body.

Thus, by assembling the module, it is possible to easily obtain a plurality of washing tanks for carrying in the liquid.

According to a fourteenth aspect of the present invention, a plurality of the tanks incorporating the module are connected, and the photosensitive material is conveyed and processed.

Thus, it is possible to easily obtain a photosensitive material processing apparatus in which a sufficient transport distance is secured by connecting the modules.

According to a fifteenth aspect of the present invention, the first rack, the second rack, and the partition plate can be individually pulled out from the tank.

Thus, when it becomes necessary to perform maintenance or the like on the rack, it is possible to perform maintenance or the like by pulling out only the rack.

According to a sixteenth aspect of the present invention, the module is detachable from the apparatus.

Thus, when the photosensitive material processing apparatus is moved, the module can be detached and the separated parts can be moved, whereby the photosensitive material processing apparatus can be easily moved.

According to a seventeenth aspect of the present invention, the module is movable relative to the apparatus.

As a result, it is possible to move only the module or only the photosensitive material processing apparatus without removing the module.

[0048]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS [First Embodiment] As shown in FIG. 1, in a water washing section 12 of a photosensitive material processing apparatus 10 according to a first embodiment, three partition plates 16P are provided in one tank 14, Q, R
(Hereinafter, the four washing tanks are respectively referred to as a first tank 14A and a second tank 14).
B, third tank 14C, fourth tank 14D). First tank 14
A is connected to a drain pipe (not shown). The tank 14 is detachable from the main body of the photosensitive material processing apparatus 10.

The photosensitive material 2 is provided below the partition plates 16P and 16R.
Photosensitive material passages 22P, R through which 0 passes (hereinafter simply referred to as passages 22P, R) are respectively formed.

As shown in FIG. 2, a guide member 24P made of a hard resin is attached to the lower side of the passage 22P.
A blade 26P made of a soft resin is attached. Regarding the mounting angle of the blade 26P, in order to facilitate the conveyance of the photosensitive material 20, the blade 26P is set so that the angle α between the direction from the base end to the tip of the blade 26P and the conveyance direction of the photosensitive material 20 becomes an acute angle. Installed.

Similarly, a guide member 24R and a blade 26R are provided in the passage 22R (see FIG. 1).

Racks 30A to 30D are inserted into the first tank 14A, the second tank 14B, the third tank 14C, and the fourth tank 14D, respectively.

As shown in FIG. 3, a carry-in entrance 32I into which the photosensitive material 20 is carried is formed on the ceiling surface of the rack 30A, and the photosensitive material 20 carried in from there passes through as shown in FIG. It is carried out from the lower side near the road 22P.
(Hereinafter, the entrance where the photosensitive material 20 is carried in is simply referred to as a carry-in entrance.) In the rack 30B, the photosensitive material 20 is carried in from the lower lateral side near the passage 22P, and the photosensitive material 2 carried in from here.
0 is carried out from a carry-out port 32E formed in the ceiling surface.
(Hereinafter, the exit from which the photosensitive material 20 is carried out is simply referred to as the exit.) The rack 30C has a shape symmetrical to the rack 30B, and the entrance 34I is formed on the ceiling surface.

The rack 30D has a shape similar to that of the rack 30A, and a carry-out port 34E is formed on the ceiling surface (FIG. 4).
reference).

That is, the rack into which the photosensitive material is carried in from the entrance formed in the ceiling surface and the photosensitive material is carried out from the lower side, and the photosensitive material is carried in from the lower side into the tank 14, and The racks that carry out the photosensitive material from the carry-out port formed on the surface are alternately arranged.

Each rack is provided with a plurality of pairs of transport rollers 36 for transporting the photosensitive material 20 in the washing water at predetermined positions.

A crossover rack 37 is provided slightly above the partition plate 16Q so as to extend over the second tank 14B and the third tank 14C. Several sets of nip rollers 38 are arranged in the crossover rack 37, and the photosensitive material 20 is squeezed by the nip rollers 38 outside the washing water.

[Hydration mechanism] As shown in FIG.
The water washing section 12 includes a replenishing water tank 40 for replenishing the stored water to the fourth tank 14D, and a water supply pipe 44 connected to the replenishing water tank 40 and supplying water to the fourth tank by a pump 42.

As shown in FIG. 5, after the amount of water in the fourth tank 14D reaches a certain amount, when the fourth tank 14D is further replenished with replenishing water, the washing water is supplied via the connection pipe 46. It flows out to the third tank 14C. Similarly, from the third tank 14C to the second tank 14B, from the second tank 14B to the first tank 1
4A (see FIG. 1), the washing water flows out.

In this manner, a predetermined height difference in water level is generated from the first tank 14A to the fourth tank 14D. The rinsing water that has reached the first tank 14A shown in FIG. 1 is eventually discharged.

The water washing section 12 includes the density sensors 50, 5
2, 54, respectively, the second tank 14B, the fourth tank 14D,
If the concentration of the processing solution component flowing out of the photosensitive material 20 in the fourth tank 14D or the second tank 14B exceeds a predetermined value in the replenishing water tank 40, the replenishing water tank 40 is removed so that the concentration becomes equal to or lower than the predetermined value. Water is replenished to the fourth tank 14D.

Further, a temperature sensor 56 is inserted in the replenishing water tank 40, and the temperature of the replenishing water tank 40 is set to a predetermined temperature by a temperature control mechanism (not shown) provided in the replenishing water tank. .

[Regarding the action of washing the photosensitive material in the washing section] As shown in FIG. 1, water is appropriately poured into the first tank 14A to the fourth tank 14D, and the washing water is supplied from the replenishing tank 40 to the fourth tank 14D. The photosensitive material 20 having the emulsion surface 20S turned upward is carried into the carry-in port 32I of the rack 30A placed in the first tank 14A from above.

The rack 30A has one opening (transport entrance) formed on the ceiling surface, and the opening area is reduced by half as compared with the conventional case. Accordingly, the rate at which the washing water in the rack deteriorates is reduced by about half.

Subsequently, the photosensitive material 20 passes through the passage 22P. During this passage, the photosensitive material 20 is
The photosensitive material 20 is squeezed in the liquid because it passes while sliding between the P and the blade 26P. Also,
During this squeezing, the emulsion surface 2 on the upper side of the photosensitive material 20
0S comes in contact with the blade 26P, and the surface opposite to the emulsion surface 20S contacts the guide member 24P.
Is hard to scratch.

After passing through the passage 22P, the photosensitive material 20
Is carried into the second tank 14B, is further carried out upward from the carry-out port 32E of the rack 30B contained in the second tank 14B, and turns in the crossover rack 37. At this time, the photosensitive material 20 is squeezed by the nip roller 38.

Further, the photosensitive material 20 is carried into the third tank 14C and squeezed in the liquid while passing through the passage 22R.
It is carried into the tank 14D, and is carried out upward from the carry-out port 34E of the rack 30D of the fourth tank 14D.

In the present embodiment, the photosensitive material 20 is only lowered or raised in one rack, and it is not necessary to reciprocate the photosensitive material 20 as in the conventional case. For this reason, the racks 30A to 30D
Could be made thin, light and simple.

Since the racks 30A to 30D are thin, 1
Tanks A to D could also be made thinner, and the amount of liquid (water) to be charged into each tank could be reduced to about half. Therefore, the liquid replacement speed was improved about twice. In other words, the time required to replace the liquid was reduced by about half.

Further, the opening area of the liquid interface, that is, the opening area on the ceiling surface of the rack was reduced by about half, and as a result, the rate of deterioration of the liquid due to oxidation was reduced by half.

As described above, the time required for the replacement of the liquid is reduced by half, and as a result, the resistance to liquid deterioration is improved by about 4 times in total.

[Reason for transporting with emulsion side up] In the above embodiment, the photosensitive material 20 is transported with the emulsion side 20S facing up. Therefore, when the liquid is squeezed out of the liquid by the nip roller 38, the emulsion surface 20S turns outward. Further, when squeezed in the liquid by the guide member 24 and the blade 26, the emulsion surface 20S is turned inside.

At the time of squeezing in the liquid, from the viewpoint of preventing accumulation of dust, it is better to attach the blade 26 to the upper position of the photosensitive material 20 and squeeze it (since dust and precipitates in the liquid settle from above, If the blade 26 is attached to the lower position, dust accumulates on the upper surface of the blade 26). Therefore, in the passages 22P and R, the blade 26 is disposed on the upper side, and the guide member 24 is disposed on the lower side. However, unless the emulsion surface 20S is raised, the blade 26 does not hit the emulsion surface 20S. If the emulsion surface side is the guide member side, the guide member is made of a material having high hardness, so that the emulsion surface 20S is likely to be scratched. When the blade 26 is on the lower side, the blade 26 is greatly opened when the photosensitive material 20 passes, so that the amount of liquid leaking to the adjacent tank increases. From the above, in the submerged squeeze, the emulsion surface 20S was set with the blade 26 on the upper side and the guide member 24 on the lower side.
It is preferable that the paper is conveyed with the surface facing upward.

The liquid squeeze structure is a roller nip structure and does not use a blade.
Even if OSS turns to the outside, it is not possible for the blade to open widely. Therefore, the performance of the extra-liquid squeeze is not different from the conventional one. If the extra-liquid squeeze structure is changed to the submerged squeeze structure, the above conditions are reversed, and it is clear that the squeeze performance is reduced.

[Position of Drying Section for Drying Photosensitive Material] When the photosensitive material is inserted from the top of the first tank, the squeezing in the liquid and the squeezing out of the liquid are alternately repeated.
The photosensitive material is discharged from the upper part of the even-numbered cell. In order to increase the reliability of the liquid leakage resistance of the final washing tank, it is preferable to discharge from the upper part. Therefore, it is better to arrange the drying section so that the photosensitive material is inserted into the drying section after the discharge of the even-numbered tank.

[Modification of First Embodiment] In the first embodiment, four tanks are formed by partitioning the tank 14 with a partition plate. However, as shown in FIG. What is connected can be used as a washing tank. That is, the first tank and the second tank may be formed as one module, and the third tank and the fourth tank may be formed as one module.

The module body 60 includes a tank 62 in which a first tank 14A and a second tank 14B are formed by a partition plate 16P provided with a blade 26P and a guide member 24P in a passage 22P, and a first tank 14A and a second tank 14B. It is composed of a rack 30A and a rack 30B which are respectively placed in the tank 14B. The partition plate 16P may be integral with the tank 62 or detachable from the tank 62. Further, if the partition plate 16P, the rack 30A, and the rack 30B are combined so as to be integrally detachable from the tank 62, the rack can be detached and attached integrally.

In the first embodiment, the photosensitive material processing apparatus 1 is constructed by integrating washing tanks from the first tank 14A to the fourth tank 14D.
The first tank 14A and the second tank 14B are integrally formed by using the above-mentioned module body as in the present modification, and the third tanks 14C and 4C are used. The tank eyes 14D are formed as one piece, and can be freely attached to and detached from the main body of the photosensitive material processing apparatus.

Further, the structure may be such that the module body can be pulled out to a certain position, instead of the structure that can be detached and attached as described above. Thereby, the maintainability is sufficiently improved.

[Second Embodiment] The photosensitive material processing apparatus according to the second embodiment is an apparatus for squeezing in a liquid by a different configuration and operation from the first embodiment. That is, as shown in FIG. 7, in the photosensitive material processing apparatus according to the second embodiment, the photosensitive material passage 72 formed in the partition plate 70 that partitions the tank.
A nip roller 74 that nips the photosensitive material 20 and conveys the photosensitive material 20 to an adjacent tank is provided in a passageway 72 (hereinafter, simply referred to as a passageway 72). A blade 76 that covers the gap is mounted.

As a result, the photosensitive material 20 can be moved to the adjacent washing tank while applying a conveying force to the photosensitive material 20 in the passage 72. Further, there is no need to provide the guide member 24P (see FIGS. 1 and 2).

Since the film is easily damaged, when the photosensitive material is a film, the squeeze in liquid by the roller nip structure as shown in the second embodiment is particularly effective from the viewpoint of preventing damage. In the second embodiment, there is no effect on the emulsion surface regardless of whether the emulsion surface is on the upper side or the lower side. Therefore, it is possible to convey the emulsion with the emulsion side on the lower side.

[0083]

According to the present invention, the processing tank can be downsized while securing the length of the photosensitive material to be conveyed. Therefore, the amount of the processing liquid contained in the processing tank is reduced and the liquid replacement speed is reduced. Can be raised.

Further, by using the first rack and the second rack, it is possible to reduce the rate of deterioration of the processing liquid stored in the processing tank.

[Brief description of the drawings]

FIG. 1 is a side cross-sectional view illustrating a configuration of a water washing unit of a photosensitive material processing apparatus according to a first embodiment.

FIG. 2 is an enlarged side sectional view showing that the photosensitive material is squeezed in a liquid in the photosensitive material processing apparatus according to the first embodiment.

FIG. 3 is a plan view of the rack taken along line 3-3 in FIG. 1;

FIG. 4 is a plan view of the rack taken along line 4-4 in FIG. 1;

FIG. 5 is a partial perspective view of a water washing unit of the photosensitive material processing apparatus according to the first embodiment.

FIG. 6 is a side sectional view showing a configuration of a module used in a modified example of the photosensitive material processing apparatus according to the first embodiment.

FIG. 7 is a partial side sectional view showing that a photosensitive material is squeezed in a liquid in a photosensitive material processing apparatus according to a second embodiment.

FIG. 8 is a side sectional view showing a configuration of a washing section of a conventional photosensitive material processing apparatus.

[Explanation of symbols]

 Reference Signs List 10 photosensitive material processing apparatus 14 tank 16P-R partition plate 14A first tank (washing tank) 14B second tank (washing tank) 14C third tank (washing tank) 14D fourth tank (washing tank) 20 photosensitive material 20S emulsion surface 22P, R photosensitive material passage (photosensitive material transport path) 24P, R guide member 26P, R blade 30A-D rack 32I carry-in port 32E carry-out port 34I carry-in port 34E carry-out port 37 crossover rack 38 nip roller 60 module body 70 partition plate 72 photosensitive material passage (photosensitive material conveying path) 74 nip roller 76 blade 80 photosensitive material processing device 84 photosensitive material 82 washing tank 86 processing rack (rack)

Claims (17)

[Claims] 1. A photosensitive material processing apparatus, wherein a photosensitive material transport path for transporting a photosensitive material in a liquid in a processing liquid is formed in a partition wall between processing tanks. And a liquid squeezing unit for squeezing the photosensitive material conveyed out of the liquid from the processing tank. 2. The photosensitive material processing apparatus according to claim 1, wherein rinsing water is used as the processing liquid, and the processing tank is a rinsing tank containing the rinsing water. 3. The washing tank may include at least one washing tank.
3. The photosensitive material according to claim 2, wherein the photosensitive material is a plurality of washing tanks formed by partitioning the photosensitive material with the partition plate, wherein the photosensitive material transport path and the submerged squeeze portion are formed in the partition plate. 4. Processing equipment. 4. The photosensitive material processing apparatus according to claim 3, wherein the submerged squeezing section and the extra-liquid squeezing section are provided alternately along a conveying path of the photosensitive material. 5. An odd number of said partition plates are provided in one tank to form an even number of washing tanks, and said photosensitive material transport path and said submerged squeeze portion are formed in all odd-numbered partition plates. 5. The photosensitive material processing apparatus according to claim 4, wherein the extra liquid squeezing unit is provided above all of the even-numbered partition plates. 6. A sheet-like blade is provided in the squeeze portion for preventing passage of the washing water from the photosensitive material transport path, and the photosensitive material slides on the blade so that the photosensitive material slides in the washing water. The photosensitive material processing apparatus according to claim 2, wherein the apparatus is squeezed. 7. A squeeze part in the liquid, wherein the blade is disposed on the emulsion side of the photosensitive material, and a hard guide member for guiding the photosensitive material by contacting a surface opposite to the emulsion side is provided on the squeeze part in liquid. 7. The photosensitive material processing apparatus according to claim 6, wherein the apparatus is provided. 8. The apparatus according to claim 7, wherein the photosensitive material is conveyed with the emulsion surface facing upward. 9. A nip roller capable of blocking passage of washing water from the photosensitive material transport path is provided in the submerged squeezing section, and the photosensitive material is squeezed in the washing water by being nipped by the nip roller. The photosensitive material processing apparatus according to any one of claims 2 to 5, wherein: 10. A photosensitive material processing apparatus in which a rack having the submerged squeezing section is provided in each of the washing tanks, wherein an entrance of the photosensitive material is formed substantially at an upper portion, and A first rack for carrying out the photosensitive material from a lower portion, and a second rack having the photosensitive material carried in from a substantially lower portion and having an outlet for the photosensitive material formed in a substantially upper portion are alternately arranged. The photosensitive material processing apparatus according to any one of claims 4 to 9, wherein: 11. During the processing of the photosensitive material, the first
The photosensitive material processing apparatus according to claim 10, wherein an opening at a liquid interface portion of the rack or the second rack is only one of an insertion opening and a discharge opening of the photosensitive material. 12. A crossover rack which covers the photosensitive material from above in a region where the photosensitive material is conveyed in the air, over an adjacent washing tank. The photosensitive material processing apparatus according to claim 1. 13. A first rack for loading the photosensitive material from substantially above and unloading it from substantially below, a second rack for loading the photosensitive material from substantially below and unloading it from substantially above, the first rack and the first rack. A module accommodating the second rack separated by one partition plate; at least one tank for containing the photosensitive material; a photosensitive material transport path for transporting the photosensitive material in the liquid is formed in the partition plate; A squeeze portion for squeezing the photosensitive material in the liquid is formed in the photosensitive material transport path, and the photosensitive material is transported in the processing liquid accommodated in the module body. 14. The photosensitive material processing apparatus according to claim 13, wherein a plurality of the tanks each incorporating the module are connected, and the photosensitive material is transported and processed. 15. The photosensitive material processing apparatus according to claim 13, wherein the first rack, the second rack, and the partition plate can be individually pulled out from the tank. 16. The photosensitive material processing apparatus according to claim 13, wherein the module is detachable from the apparatus. 17. The photosensitive material processing apparatus according to claim 13, wherein the module is movable relative to the apparatus.