JP3904494B2 - Filtration unit and photosensitive material development processing apparatus using the same - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a filtration unit including a filter that captures foreign matters in a liquid, and a photosensitive material development processing apparatus using the same.
[0002]
[Prior art]
An automatic processor such as a printer processor used in a photographic processing laboratory incorporates an exposure processing device that performs exposure processing on a photosensitive material such as photographic paper and a development processing device that performs development processing on an exposed photosensitive material. ing. The development processing apparatus is provided with a transport roller for transporting the photosensitive material on which the frame image is exposed, and a plurality of processing tanks containing processing liquids such as color development, bleach-fixing, washing with water, and stability. Then, the photosensitive material is conveyed to a processing tank, and development processing is performed by sequentially passing through each processing solution.
[0003]
Conventional processing tanks have adopted a so-called crossover structure in which photosensitive material is once transported over the air when the photosensitive material is transported from the previous tank to the next tank. Recently, however, the photosensitive material transport length has been shortened. In order to shorten the development processing time, a submerged squeeze portion comprising a blade or the like is provided in each processing tank, for example, a partition wall between water washing tanks, and the photosensitive material is conveyed in the liquid through the submerged squeeze portion. A method has been proposed (Japanese Patent Laid-Open No. 2002-55422). Examples of the apparatus for horizontally conveying an object include those described in Japanese Patent Application Laid-Open Nos. 2000-25881, 2000-25882, and 2000-25883.
[0004]
On the other hand, in the photosensitive material development processing device, if foreign matter (such as deposits of processing solution components) is floating in the processing solution or if foreign matter adheres to the transport roller or blade, the photosensitive material is damaged and the quality is improved. Reduce. For this reason, the conveyance rack to which the conveyance roller is attached is periodically cleaned, the processing liquid is circulated by a pump or the like, and foreign matters are removed by a filtration unit installed in the circulation path.
[0005]
As a filter used in a conventional filtration unit, a filter that captures foreign matters having an average pore diameter of 100 μm to 200 μm or more is used. Since this filter has good permeability of the treatment liquid, bubbles in the filter that are generated when the treatment liquid is introduced into the treatment tank will naturally escape to the circulation path when the circulation pump is driven. The air lock of the pump can be prevented. However, since the lower limit of the size of the foreign matter that causes scratches on the photosensitive material is 30 μm to 80 μm, it is inevitable that the photosensitive material will be damaged even if the filter having the above-described hole diameter is used.
[0006]
[Problems to be solved by the invention]
In order to solve the above problems, it is sufficient to reduce the average pore diameter of the filter and increase the foreign matter capturing ability. However, the permeability of the treatment liquid to the filter deteriorates and bubbles do not escape, and the circulation pump Air lock may occur. Moreover, even if the circulation pump is operated without generating an air lock, if the air pump is operated for a long time, a load is applied to the circulation pump.
[0007]
An object of the present invention is to provide a filtration unit capable of maintaining the quality of a photosensitive material by reliably capturing foreign matter in a processing solution, and a photosensitive material developing processing apparatus using the same.
[0008]
[Means for Solving the Problems]
In order to achieve the above object, the present invention provides a filtration unit having a filter that traps foreign matter in a liquid, an air vent hole for removing bubbles in the filter unit, and a detachable attachment to the air vent hole. And a lid member that is displaced between a closed position that closes the air vent hole and an open position that allows air bubbles to pass through the air vent hole.
[0009]
In addition, it is preferable to attach the said cover member to an air vent hole so that it may be urged | biased by the said obstruction | occlusion position by the circulation of a liquid. Further, the filter and the cylindrical core material holding the filter constitute the filtration unit, the air vent hole is formed at one end of the core material, and the lid member is inserted into the air vent hole. And a lid main body that is formed continuously with the insertion shaft portion and contacts the air vent hole to close the air vent hole, and a drop-off preventing portion that is locked to the edge of the air vent hole to prevent the lid member from dropping off. It is preferable that the contact portion with the air vent hole of the lid main body is tapered.
[0010]
Further, it is preferable that the filtration unit is disposed at the bottom of the processing tank of the photosensitive material developing apparatus, and the lid member is biased to the closed position by the liquid flow in the processing tank. Moreover, it is preferable that the said cover member consists of a material whose specific gravity is smaller than the process liquid stored in the said processing tank.
[0011]
The present invention is also provided with a plurality of processing tanks in which processing solutions for processing a photosensitive material are stored, a circulation pump for circulating the processing solutions in the processing tank, and a side where the processing solutions flow into the circulation pump. A photosensitive material development processing apparatus having a filter unit including a filter for capturing foreign matter in the processing solution, a cylindrical core material for holding the filter, and an air vent formed at one end of the core material. The filtration unit is composed of a hole and a lid member that is detachably attached to the air vent hole, and the lid member is formed continuously with the insertion shaft portion that is inserted into the air vent hole. And a lid main body that contacts the air vent hole to close the air vent hole, and a drop-off preventing portion that is locked to the edge of the air vent hole and prevents the lid member from falling off. In addition, it is preferable to form the contact part with the air vent hole of the said lid body in a taper.
[0012]
DETAILED DESCRIPTION OF THE INVENTION
FIG. 1 shows a schematic configuration of a photosensitive material development processing apparatus embodying the present invention. The photosensitive material developing apparatus 2 includes a developing tank 10, a bleach-fixing tank 11, a washing tank 16 including a first washing tank 12, a second washing tank 13, a third washing tank 14, and a fourth washing tank 15. Is provided. A developing solution is stored in the developing tank 10, a bleach-fixing solution is stored in the bleach-fixing tank 11, and a washing solution is stored in the washing tank 16 in a predetermined amount. Inside the developing tank 10 and the bleach-fixing tank 11, there is provided a transport rack 18 composed of a plurality of transport rollers for transporting the photosensitive material 17 in a substantially U shape within the tank.
[0013]
Above the developing tank 10, a pair of conveying rollers 19 for conveying the photosensitive material 17 into the developing tank 10 and a pair of conveying rollers 20 for conveying the developed photosensitive material 17 to the bleach-fixing tank 11 side are provided. . Similarly, above the bleach-fixing tank 11, a pair of conveying rollers 21 for conveying the photosensitive material 17 conveyed from the developing tank 10 side into the bleach-fixing tank 11, and the photosensitive material 17 subjected to the fixing process in the first washing tank. A conveying roller pair 22 for conveying toward the 12 side is provided. Further, a pair of conveying rollers 23 for conveying the photosensitive material 17 subjected to the fixing process into the first washing tank 12 is provided above the first washing tank 12. The conveying roller pair 20-23 constitutes an out-of-liquid squeeze portion 24 so that the processing liquid adhering to the photosensitive material 17 is not brought into the next tank.
[0014]
Above the fourth rinsing tank 15, a pair of conveying rollers 25 is provided for conveying the washed photosensitive material 17 to a drying device (not shown). The washing tank 16 is provided with a pair of conveying rollers 26 as means for conveying the photosensitive material 17. The transport roller pair 26 is provided integrally with a removable transport rack 27 (see FIG. 2).
[0015]
The fourth washing tank 15 is replenished with a washing solution from a replenishing tank 28 via a pump 29. The increase due to the replenishment of the washing liquid is upstream from the fourth washing tank 15 to the third washing tank 14, from the third washing tank 14 to the second washing tank 13, and from the second washing tank 13 to the first washing tank 12. Sequentially overflow in a cascading manner toward the water washing tank. The first washing tank 12 is provided with a discharge pipe 30 for discharging a predetermined amount or more of washing liquid. The overflowed washing liquid is stored in the storage tank 31 through the discharge pipe 30.
[0016]
Between the 1st water washing tank 12 and the 2nd water washing tank 13, the 2nd water washing tank 13 and the 3rd water washing tank 14, and the partition wall 32 which partitions each water washing tank between the 3rd water washing tank 14 and the 4th water washing tank, 33 and 34 are provided, respectively. Each of the partition walls 32 to 34 is provided with a submerged squeeze portion 35 that allows the photosensitive material 17 to pass therethrough and prevents the washing liquid from passing therethrough. The photosensitive material 17 is conveyed in the liquid in the washing tank 16 through the submerged squeeze portion 35.
[0017]
As shown in FIG. 2, the first water washing tank 12 is provided with a water washing liquid circulation mechanism 40. The water washing liquid circulation mechanism 40 includes a filtration unit 41, a circulation pump 42, a heater 43, a sub tank 44, and a circulation pipe 45, and the water washing liquid in the tank is circulated by the circulation pump 42 in the arrow direction. The liquid concentration and temperature are kept uniform, and the filtration unit 41 removes foreign matters in the washing liquid.
[0018]
A water intake 46 is formed at the bottom of the first water rinsing tank 12, and a filtration unit 41 is disposed in a mounting portion 46 a of the water intake 46. Further, an outlet 47 through which the washing liquid of the sub tank 44 flows out to the first washing tank 12 is provided in a partition wall between the first washing tank 12 and the sub tank 44 provided on the side thereof. The washing liquid that has passed through the filtration unit 41 from the water intake 46 is sent to the circulation pump 42 via the circulation pipe 45. The washing liquid sent out from the circulation pump 42 is heated to a predetermined temperature by the heater 43. The washing liquid heated by the heater 43 is sent to the sub tank 44 and flows out to the first washing tank 12 through the outlet 47.
[0019]
As shown in FIG. 3, the filtration unit 41 includes a filter 50, a core material 51, and a cap (lid member) 52. For the filter 50, for example, a high-performance pleated filter that captures 100% of foreign matters having a size of 30 μm or more (98% at 23 μm or more) is used. The filter 50 has a substantially cylindrical shape in which a portion corresponding to the core material 51 is hollow, and the core material 51 is fitted into the hollow portion. The filter 50 and the core material 51 are held between upper and lower holding members 53 and 54 having circular openings 53a and 54a at the center.
[0020]
The core material 51 is made of a plastic molded product such as polypropylene, for example, and has a structure in which a plurality of rings 55 arranged in the inflow direction of the washing liquid at regular intervals are connected by four struts 56 arranged every 90 °. It has become. The distance between the opposing struts 56 in the horizontal direction is narrower toward the inflow direction of the washing liquid in order to facilitate the insertion of the filter 50 into the hollow portion, and the diameter of the ring 55 is reduced accordingly. It has become. A plurality of gaps formed by the ring 55 and the support column 56 serve as a water sampling port 57 through which the washing liquid in which foreign matter is captured by the filter 50 permeates. The washing liquid that has permeated from the water sampling port 57 flows down to a liquid path that is a space inside the core member 51 formed by the ring 55 and the support column 56.
[0021]
As shown in FIG. 4, an air vent hole 59 is provided at the tip 51 a of the core member 51. A cap 52 is attached to the air vent hole 59. The cap 52 includes a shaft portion 52a and a main body 52b. The shaft portion 52a is provided with a notch 52c and a locking claw 52d (see also FIG. 5). Four notches 52c are provided every 90 °, and the insertion of the shaft portion 52a into the air vent hole 59 is facilitated, and the bubbles 60 are easily captured. The locking claw 52d is locked to the edge of the air vent hole 59 after the cap 52 is attached to prevent the cap 52 from falling off.
[0022]
The cap 52 is movable up and down between a closed position where the air vent hole 59 shown in (A) is closed and an open position where the air bubble 60 passes through the air vent hole 59 shown in (B). The cap 52 is made of a material having a specific gravity smaller than that of the washing liquid, for example, polypropylene. For this reason, when the rinsing liquid is introduced into the first rinsing tank 12, the cap 52 floats above the air vent hole 59 as shown in FIG. On the other hand, when the washing liquid is circulated, as shown in (A), a negative pressure is applied to the cap 52 downward, and the air vent hole 59 is automatically closed by the main body 52b. The foreign matter in the washing liquid is captured by 50.
[0023]
A contact portion of the main body 52b with the air vent hole 59 is formed in a tapered shape having a narrow width toward the washing liquid inflow direction. If it does in this way, bubble 60 can escape smoothly, without staying in the level difference of cap 52. In addition, although only the 1st washing tank 12 was demonstrated so far, the same washing liquid circulation mechanism 40 is provided also in the 2nd-4th washing tanks 13-15.
[0024]
In order to further facilitate air bleeding of the filter, it is preferable to install the filter after immersing it in water, alcohol or the like before removing the air. Moreover, as a kind of filter to be used, in addition to the pleated filter of the above embodiment, a mesh-like or porous filter can be used.
[0025]
【The invention's effect】
As described above, according to the filtration unit of the present invention and the photosensitive material development processing apparatus using the filtration unit, the air vent hole for removing bubbles in the filtration unit and the air vent hole are detachably attached to the air vent hole. A lid member that is displaced between a closed position that blocks air and an open position that allows air bubbles to pass through the air vent hole is provided. The occurrence of lock can be prevented. Accordingly, the foreign matter in the processing solution can be reliably captured, and the quality of the photosensitive material can be maintained.
[Brief description of the drawings]
FIG. 1 is a schematic diagram showing the configuration of a photosensitive material developing apparatus embodying the present invention.
FIG. 2 is a schematic view showing a configuration of a washing liquid circulation mechanism.
3A and 3B are diagrams showing a configuration of a filtration unit, in which FIG. 3A is a side view and FIG. 3B is an upper plan view.
FIG. 4 is an enlarged view of the vicinity of the air vent hole.
FIG. 5 is a top plan view of the cap.
[Explanation of symbols]
2 Photosensitive material development processing apparatus 10 Developing tank 11 Bleach fixing tank 16 Washing tank 17 Photosensitive material 40 Washing liquid circulation mechanism 41 Filtration unit 42 Circulation pump 44 Sub tank 50 Filter 51 Core material 52 Cap 52a Shaft 52b Main body 52d Locking claw 59 Air vent Hole 60 bubble

Claims (5)

In a filtration unit equipped with a filter that captures foreign matter in the liquid,
An air vent hole for removing air bubbles in the filtration unit, and a lid member that is displaceably attached to the air vent hole and is displaced between a closed position that closes the air vent hole and an open position that allows air bubbles to pass through the air vent hole. equipped with a,
The lid member is made of a material having a specific gravity smaller than that of the liquid,
The filtration unit, which is attached to the air vent hole so as to be urged to the closed position by circulation of liquid and to move to the open position when the circulation is stopped . While constituting the filtration unit from the filter and a cylindrical core material holding the filter,
Forming the air vent at one end of the core;
The lid member is inserted into the air vent hole, inserted into the air vent hole, formed continuously with the insert shaft portion, the lid body closing the air vent hole in contact with the air vent hole, and the edge of the air vent hole. And configured with a drop-off prevention portion that prevents the lid member from falling off,
The filtration unit according to claim 1, wherein a contact portion with the air vent hole of the lid body is formed in a taper. 3. The filtration unit according to claim 1, wherein the filtration unit is disposed at a bottom of a processing tank of the photosensitive material developing processing apparatus, and the lid member is biased to a closed position by a liquid flow in the processing tank. . A plurality of processing tanks in which processing solutions for processing the photosensitive material are stored; a circulation pump for circulating the processing solutions in the processing tank; and a side where the processing solutions flow into the circulation pumps. In a photosensitive material development processing apparatus having a filtration unit including a filter for capturing foreign matter,
And the filter, and the core member cylindrical holding the filter, and an air vent hole formed in one end of the core member, mounted for displacement in the air vent hole, and a closed position for closing the vent, the air bubbles from the air vent hole While constituting the filtration unit from a lid member that is displaced between the open position to pass through ,
The lid member is made of a material having a specific gravity smaller than that of the processing liquid,
It is urged to the closed position by circulation of the liquid, and is attached to the air vent hole so as to move to the open position when the circulation is stopped.
The lid member is inserted into the air vent hole, inserted into the air vent hole, formed continuously with the insert shaft portion, the lid body closing the air vent hole in contact with the air vent hole, and the edge of the air vent hole. And a drop-off preventing portion for preventing the lid member from falling off. 5. The photosensitive material developing apparatus according to claim 4 , wherein a contact portion of the lid body with the air vent hole is tapered.

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