JP2002060987A - Method of manufacturing electrodeposited bellows - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method of manufacturing electrodeposited bellows which is capable of improving the uniformity of the thickness of the electrodeposited bellows. SOLUTION: A mandrel (1) for the electrodeposited bellows alternately formed with annular peaks (2) and valleys (3) is mounted at a cathode side and a plating material at an anode side, respectively. The mandrel is electroplated by alternately supplying positive pulses (S) which are the pulse current of minus on the cathode side and plus on the anode side, and reverse pulses (G) of plus on the cathode side and minus on the anode side from a pulse power source device (21), thereby subjecting the mandrel to electric plating. The electrodeposited bellows is formed by dissolving the main body of the mandrel subjected to this electroplating.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an electrodeposited bellows in which a mandrel body is melted after electroplating the surface of the mandrel to form an electrodeposited bellows.

[0002]

2. Description of the Related Art Electrodeposited bellows used for sensors, bellows couplings and the like are formed by applying electroplating to the surface of a mandrel and then dissolving the mandrel body. Since the electrodeposited bellows has a bellows portion, ring-shaped peaks and valleys are alternately provided on the mandrel for the electrodeposited bellows so as to form the bellows portion of the electrodeposited bellows. Electroplating is performed with a constant low current (40 mA to 100 mA per mandrel) so that the thickness of the electrodeposited bellows is as uniform as possible.

[0003]

By the way, a mandrel electroplated by a conventional method for manufacturing an electrodeposited bellows is:
The state is as shown in FIG. FIG. 5 is an enlarged sectional view of a main part of a mandrel electroplated by a conventional method for manufacturing an electrodeposited bellows. As shown in FIG. 5, in the conventional method, the shape of the electrodeposited bellows is complicated because peaks and valleys are provided alternately. The thickness d1 of the plating layer 02 formed on the peak 01 of the mandrel is
Becomes thicker than the thickness d2 of the plating layer 02 formed on the substrate.
That is, plating is more likely to adhere to the peak portion 01 of the mandrel than the valley portion 03, the thickness of the plating layer 02 formed on the mandrel becomes uneven, and the thickness of the electrodeposited bellows to be manufactured becomes uneven. If the thickness of the manufactured electrodeposited bellows is too large, the durability of the electrodeposited bellows is adversely affected.

An object of the present invention is to solve the above-mentioned problems, and an object of the present invention is to provide a method for manufacturing an electrodeposited bellows capable of improving the uniformity of the thickness of the electrodeposited bellows.

[0005]

According to the present invention, there is provided a method for producing an electrodeposited bellows, comprising the steps of: forming an electrodeposited bellows mandrel (1) having ring-shaped peaks (2) and valleys (3) alternately formed on a cathode; A positive pulse (S) having a negative pulse on the cathode side and a positive pulse current on the anode side, and a pulse current having a positive pulse on the cathode side and a negative pulse on the anode side, from the pulse power supply (21). And the reverse pulse (G) is supplied alternately to electroplate the mandrel, and the body of the electroplated mandrel is melted to form an electrodeposited bellows.

The product of the magnitude of the forward pulse current (ipm) and its energization time (T2) is the magnitude of the reverse pulse current (ipm).
It may be 1.2 to 1.4 times the product of p) and its energization time (T1).

Further, the magnitude of the reverse pulse current may be two to three times the magnitude of the positive pulse current.

[0008]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, an embodiment of a method for manufacturing an electrodeposited bellows according to the present invention will be described. 1A and 1B are schematic cross-sectional views of a plating tank used in a method of manufacturing an electrodeposited bellows, in which FIG. 1A is a diagram when a positive pulse is applied, and FIG. 1B is a diagram when a reverse pulse is applied. FIG. 2 is a sectional view of the mandrel. 3A and 3B are explanatory views for explaining a method for manufacturing an electrodeposited bellows of the present invention, wherein FIG. 3A is a cross-sectional view of a main part of a mandrel after energizing a positive pulse, and FIG. It is sectional drawing. FIG. 4 is a graph of the current of the pulse power supply.

In FIG. 2, a mandrel 1 used for manufacturing an electrodeposited bellows has ring-shaped peaks 2 and valleys 3 formed alternately. This mandrel 1
It is made of resin or metal containing a conductive material, has a cylindrical shape, and has a mounting hole 4 formed in the center axis.

Then, the mandrel 1 is placed in a plating tank 11 in which a plating solution such as nickel sulfate is stored, and the mandrel 1 is immersed in the plating solution. That is, the plating tank 11
Is provided with an electrode rod 12 on the cathode side and an electrode rod 13 on the anode side. The electrode rod 12 on the cathode side is provided with a plurality of support brackets 16 such as clips for supporting the mandrel 1 to be plated. It has a tree shape. The mandrel 1 is mounted by fitting the mounting hole 4 to a support fitting 16. The electrode rod 12 on the cathode side is formed of a round rod of Cu (copper), and is substantially entirely coated with a resin. However, portions requiring electrical conduction, such as the portion of the support bracket 16, are not coated with a resin film. On the other hand, the anode-side electrode rod 13 is made of a plate-like plating material such as nickel.

The electrode rod 12 on the cathode side and the electrode rod 13 on the anode side are connected to the output terminal 22 of the pulse power supply 21,
23 respectively. This pulse power supply 2
1, as shown in FIG. 1A, the first terminal 22 to which the cathode-side electrode rod 12 is connected is negative, and the second terminal 23 to which the anode-side electrode rod 13 is connected is positive. 1B, the first terminal 22 is positive and the second terminal 23 is positive as shown in FIG.
And a reverse pulse, which is a negative pulse current, can be output alternately. Thus, in this specification, the pulse current at the time of ordinary plating is a positive pulse. And
At the time of positive pulse, normal plating is performed, and the mandrel 1
On the other hand, at the time of a reverse pulse, the plating layer 26 formed on the mandrel 1 is peeled off, contrary to normal plating.

When the electrodeposition bellows is manufactured by the plating apparatus configured as described above, the pulse power supply 21 alternately outputs the reverse pulse G and the positive pulse S as shown in FIG. I do. The magnitude ipp of the current + ipp of the reverse pulse G (+ display when the cathode side is positive) is approximately 2.64 times the magnitude ipm of the current -ipm of the positive pulse S. The positive pulse S has a low current (40 mA to 100 mA per mandrel). The energizing time T1 of the reverse pulse G is about 1.0 msec, and the energizing time T2 of the positive pulse S is about
3.5 msec, energization time T0 of one cycle is about 4.5 msec
Becomes Therefore, the product of the magnitude of the current and the conduction time is about 1.3 times that of the forward pulse S than the reverse pulse G. That is, (ipm × T2) / (ipp × T1) = (1.0 × 3.5) / (2.64 × 1.0) ≒
1.3

After the energization of the positive pulse S, as shown in FIG. 3A, the plating layer 26 is easily formed on the crest 2 of the mandrel 1, so that the plating layer 26 formed on the crest 2 of the mandrel 1 is formed. The thickness d3 of 26 becomes larger than the thickness d4 of the plating layer 26 formed in the valley 3 of the mandrel 1. Note that, as the magnitude of the current ipm of the positive pulse S increases,
The thickness d3 of the plating layer 26 formed on the peak 2 of the mandrel 1 and the thickness of the plating layer 2 formed on the valley 3 of the mandrel 1
6, and the difference from the thickness d4 increases. Then, the positive pulse S
The reverse pulse G larger than the current is supplied. And
The plating layer 26 formed on the peak 2 of the mandrel 1 is peeled off earlier than the plating layer 26 formed on the valley 3.
Accordingly, as shown in FIG. 3B, the thickness d5 of the plating layer 26 formed on the peak 2 of the mandrel 1 is substantially the same as the thickness d6 of the plating layer 26 formed on the valley 3. In addition, as the magnitude of the current ipp of the reverse pulse G increases, the difference between the amount peeled off the plating layer 26 of the peak 2 of the mandrel 1 and the amount peeled off the plating layer 26 of the valley 3 of the mandrel 1 increases. Become. In this way, by alternately supplying the forward pulse S and the reverse pulse G, the plating layer 26 formed on the mandrel 1 can be increased with a substantially uniform thickness. In this way, when the plating layer 26 has a predetermined thickness (the thickness of the electrodeposited bellows as a product, for example, 30 to 40 μm), the mandrel 1 on which the plating layer 26 is formed is taken out of the plating tank 11 and the mandrel 1 is removed. Dissolve the body. Then, the plating layer 26 remains, and the remaining plating layer 26 becomes an electrodeposition bellows.

As described above, in manufacturing the electrodeposited bellows, the plating layer 26 is formed as uniformly as possible on the mandrel 1 by reducing the current of the positive pulse S. However, in the mandrel 1 for electrodeposition bellows, the ring-shaped peaks 2 and the valleys 3 are formed alternately, and the plating layer 26 formed on the peaks 2 is replaced with the plating layer formed on the valleys 3. It becomes thicker than 26. Then, by the reverse pulse G, the plating layer 26 of the peak 2 is peeled off more than the plating layer 26 of the valley 3, and the plating layer 26 of the peak 2 and the plating layer 2 of the valley 3 are removed.
6 have substantially the same thickness. In particular, by making the magnitude of the current of the reverse pulse G larger than the magnitude of the current of the positive pulse S, the plating layer 26 of the peak portion 2 can be efficiently peeled off. Since the reverse pulse G and the positive pulse S are alternately repeated to increase the thickness of the plating layer 26,
The thickness of the electrodeposited bellows can be made more uniform than before.

The current of the positive pulse S can be appropriately changed. However, in order to make the plating layer 26 uniform, a low current (40 mA to 100 mA per mandrel) is used.
It is preferred that It is preferable that the magnitude of the current of the reverse pulse G is two to three times the magnitude of the current of the positive pulse S. If it is too small, the efficiency of peeling off the plating layer 26 of the peak 2 decreases, and if it is too large, the surface of the plating layer 26 becomes rough. Further, the product of the magnitude of the current and the conduction time is optimally about 1.3 times the ratio of the positive pulse S to the reverse pulse G in the experiment, and the allowable range is about 1.2 to 1.4 times. In particular, the ratio is preferably 1.25 to 1.35 times. Further, the repetition of the forward pulse S and the reverse pulse G can start from the forward pulse S or can start from the reverse pulse G.
It is also possible to provide a time during which no current is supplied between the reverse pulse G and the positive pulse S.

[0016]

According to the present invention, a mandrel for an electrodeposition bellows in which ring-shaped peaks and valleys are alternately formed is attached to the cathode side, and a plating material is attached to the anode side, respectively. The mandrel is electroplated by alternately supplying a positive pulse having a negative pulse current on the cathode side and a positive pulse current on the anode side and a reverse pulse having a positive pulse current on the cathode side and a negative pulse current on the anode side. When a positive pulse is applied to the electrodeposited bellows mandrel in which ring-shaped peaks and valleys are alternately formed, the plating layer formed on the peaks of the mandrel is formed on the valleys of the mandrel. Although it is thicker than the layer, the reverse pulse removes the mandrel peak plating layer more efficiently than the mandrel valley plating layer, so the thickness of the mandrel peak plating layer and the thickness of the valley plating layer are approximately uniform It can be. As a result, the thickness of the manufactured electrodeposition bellows can be made as uniform as possible.

If the product of the magnitude of the current of the forward pulse and the duration of the current is 1.2 to 1.4 times the product of the magnitude of the current of the reverse pulse and the duration of the current, the mandrel is driven. The formed plating layer can be made substantially uniform.

Further, when the magnitude of the current of the reverse pulse is two to three times the magnitude of the current of the positive pulse, the plating layer on the peak of the mandrel can be peeled more efficiently than the plating layer on the valley. it can. Therefore, the thickness of the plating layer of the mandrel can be efficiently made uniform.

[Brief description of the drawings]

FIGS. 1A and 1B are schematic cross-sectional views of a plating tank used in a method of manufacturing an electrodeposited bellows, wherein FIG. 1A is a diagram when a positive pulse is applied, and FIG. 1B is a diagram when a reverse pulse is applied. .

FIG. 2 is a cross-sectional view of a mandrel.

3A and 3B are explanatory views for explaining a method for manufacturing an electrodeposited bellows according to the present invention, wherein FIG. 3A is a cross-sectional view of a main part of a mandrel after energizing a positive pulse, and FIG. It is principal part sectional drawing of a mandrel.

FIG. 4 is a graph of a current of the pulse power supply device.

FIG. 5 is an enlarged sectional view of a main part of a mandrel electroplated by a conventional method for manufacturing an electrodeposited bellows.

[Explanation of symbols]

 G Reverse pulse ipm Current magnitude of positive pulse ipp Current magnitude of reverse pulse S Regular pulse T1 Current duration of reverse pulse T2 Current duration of positive pulse 1 Mandrel 2 Peak of mandrel 3 Valley of mandrel 21 Pulse power supply

Claims (3)

[Claims] An electrodeposited bellows mandrel in which ring-shaped peaks and valleys are alternately formed is provided on the cathode side.
A plating material is attached to each anode side, and a pulse power supply alternately supplies a positive pulse with a negative pulse current on the cathode side and a positive pulse current on the anode side and a reverse pulse with a positive pulse current on the cathode side and a negative pulse current on the anode side. A method for producing an electrodeposited bellows, wherein the mandrel is electroplated, and the body of the electroplated mandrel is melted to form an electrodeposited bellows. 2. The product of the magnitude of the current of the forward pulse and the duration of the current is 1.2 to 1.4 times the product of the magnitude of the current of the reverse pulse and the duration of the duration. The method for producing an electrodeposited bellows according to claim 1. 3. The method according to claim 1, wherein the magnitude of the reverse pulse current is two to three times the magnitude of the positive pulse current.