JP2002050558A5 - - Google Patents
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- Publication number
- JP2002050558A5 JP2002050558A5 JP2000231126A JP2000231126A JP2002050558A5 JP 2002050558 A5 JP2002050558 A5 JP 2002050558A5 JP 2000231126 A JP2000231126 A JP 2000231126A JP 2000231126 A JP2000231126 A JP 2000231126A JP 2002050558 A5 JP2002050558 A5 JP 2002050558A5
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- JP
- Japan
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000231126A JP4738573B2 (ja) | 2000-07-31 | 2000-07-31 | 投影露光装置及びデバイス製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000231126A JP4738573B2 (ja) | 2000-07-31 | 2000-07-31 | 投影露光装置及びデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002050558A JP2002050558A (ja) | 2002-02-15 |
| JP2002050558A5 true JP2002050558A5 (de) | 2007-09-06 |
| JP4738573B2 JP4738573B2 (ja) | 2011-08-03 |
Family
ID=18723997
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000231126A Expired - Fee Related JP4738573B2 (ja) | 2000-07-31 | 2000-07-31 | 投影露光装置及びデバイス製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4738573B2 (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG102718A1 (en) * | 2002-07-29 | 2004-03-26 | Asml Holding Nv | Lithography tool having a vacuum reticle library coupled to a vacuum chamber |
| JP2005191278A (ja) * | 2003-12-25 | 2005-07-14 | Semiconductor Leading Edge Technologies Inc | 投影露光装置及び投影露光方法 |
| JP2011003723A (ja) * | 2009-06-18 | 2011-01-06 | Nikon Corp | マスク搬送装置、露光装置、マスク搬送方法、及びデバイスの製造方法 |
| JPWO2023282205A1 (de) * | 2021-07-05 | 2023-01-12 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60107834A (ja) * | 1983-11-16 | 1985-06-13 | Hitachi Ltd | 露光装置 |
| JP3064367B2 (ja) * | 1990-09-21 | 2000-07-12 | 株式会社ニコン | 投影光学装置、露光方法、および回路製造方法 |
| JP3391409B2 (ja) * | 1993-07-14 | 2003-03-31 | 株式会社ニコン | 投影露光方法及び装置、並びに素子製造方法 |
| JP3414476B2 (ja) * | 1994-03-02 | 2003-06-09 | 株式会社ニコン | 投影露光装置 |
| JP3303758B2 (ja) * | 1996-12-28 | 2002-07-22 | キヤノン株式会社 | 投影露光装置及びデバイスの製造方法 |
| JPH10289871A (ja) * | 1997-04-14 | 1998-10-27 | Nikon Corp | 投影露光装置 |
| AU2747899A (en) * | 1998-03-20 | 1999-10-18 | Nikon Corporation | Photomask and projection exposure system |
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2000
- 2000-07-31 JP JP2000231126A patent/JP4738573B2/ja not_active Expired - Fee Related