JP2002042711A - Reflection electron detection device of scanning electron microscope - Google Patents
Reflection electron detection device of scanning electron microscopeInfo
- Publication number
- JP2002042711A JP2002042711A JP2000229024A JP2000229024A JP2002042711A JP 2002042711 A JP2002042711 A JP 2002042711A JP 2000229024 A JP2000229024 A JP 2000229024A JP 2000229024 A JP2000229024 A JP 2000229024A JP 2002042711 A JP2002042711 A JP 2002042711A
- Authority
- JP
- Japan
- Prior art keywords
- detection device
- reflection electron
- scintillator
- electron
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001514 detection method Methods 0.000 title claims abstract description 19
- 239000000203 mixture Substances 0.000 claims abstract description 17
- 238000010894 electron beam technology Methods 0.000 claims description 12
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000002131 composite material Substances 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000001154 acute effect Effects 0.000 description 2
- 230000003321 amplification Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、走査電子顕微鏡な
どの反射電子検出装置に関し、特にシンチレータと光電
子増倍管で構成する反射電子検出装置における観察方法
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a backscattered electron detector such as a scanning electron microscope, and more particularly to an observation method in a backscattered electron detector comprising a scintillator and a photomultiplier tube.
【0002】[0002]
【従来の技術】図面を参照しながら、従来の技術につい
て説明する。図3に、従来の反射電子検出装置による反
射電子検出概略図を示す。2. Description of the Related Art A conventional technique will be described with reference to the drawings. FIG. 3 shows a schematic diagram of backscattered electron detection by a conventional backscattered electron detection device.
【0003】従来の反射電子検出器13は、主に、シン
チレータ8、光電子増倍管9、増幅回路10で構成され
ている。図中1は電子ビーム、2は電子ビーム1が試料
5上を走査するための偏向回路、3は電子ビームの焦点
を試料5に合わせるための対物レンズ、4は試料室であ
る。電子ビーム1が照射されると試料5から反射電子
6,7が発生する。入射した電子ビーム1に対し鋭角に
反射する電子7は、重元素ほど多く軽元素ほど少ない。
つまり、反射電子7には組成情報が多く含まれている。
また、入射ビーム1に対する反射角が大きくなる反射電
子6には凹凸情報が多く含まれている。これらの反射電
子をシンチレータ8の検出面15で同時に検出し、光電
子増倍管9、増幅回路10で増幅すると、表示装置14
に組成像と凹凸像を加算した立体感のある像(立体像)
が得られる。The conventional backscattered electron detector 13 mainly comprises a scintillator 8, a photomultiplier tube 9, and an amplifier circuit 10. In the figure, 1 is an electron beam, 2 is a deflection circuit for scanning the electron beam 1 on the sample 5, 3 is an objective lens for focusing the electron beam on the sample 5, and 4 is a sample chamber. When the electron beam 1 is irradiated, reflected electrons 6 and 7 are generated from the sample 5. The number of electrons 7 reflected at an acute angle with respect to the incident electron beam 1 is larger for heavy elements and smaller for light elements.
That is, the reflected electrons 7 contain a lot of composition information.
Further, the reflected electrons 6 whose reflection angle with respect to the incident beam 1 is large contain a lot of unevenness information. When these reflected electrons are simultaneously detected by the detection surface 15 of the scintillator 8 and amplified by the photomultiplier tube 9 and the amplifier circuit 10, the display device 14
Image with a three-dimensional effect by adding a composition image and a concavo-convex image to the image (solid image)
Is obtained.
【0004】[0004]
【発明が解決しようとする課題】上記従来技術では、組
成情報が多く含まれている反射電子7のみを検出するこ
とはできなかった。本発明は、シンチレータと光電子増
倍管で構成した反射電子検出器においても、組成像と立
体像の2種類の像観察を可能とすることを目的としてい
る。In the above prior art, it was not possible to detect only the backscattered electrons 7 containing a large amount of composition information. An object of the present invention is to enable observation of two types of images, a composition image and a stereoscopic image, even in a backscattered electron detector composed of a scintillator and a photomultiplier tube.
【0005】[0005]
【課題を解決するための手段】上記目的を達成するため
に、シンチレータと光電子増倍管で構成する反射電子検
出器において、検出面に入射する反射電子の量を制限す
る絞り板と、その絞り板の位置を変える機械的構造を具
備したことで、組成像観察も可能としたことを特徴とし
ている。In order to achieve the above object, in a backscattered electron detector comprising a scintillator and a photomultiplier tube, an aperture plate for limiting the amount of reflected electrons incident on a detection surface, and an aperture for the aperture plate It is characterized in that it has a mechanical structure that changes the position of the plate, so that composition images can be observed.
【0006】[0006]
【発明の実施の形態】以下、図面を参照して本発明の実
施例を詳細に説明する。Embodiments of the present invention will be described below in detail with reference to the drawings.
【0007】図1は本発明の実施例装置の概略図であ
り、組成像が得られる状態を示している。本発明による
反射電子検出器13は、シンチレータ8、光電子増倍管
9、増幅回路10に、絞り11、絞り位置変更機構12
を加えた構成である。図中1は電子ビーム、2は電子ビ
ーム1が試料5上を走査するための偏向回路、3は電子
ビームの焦点を試料5に合わせるための対物レンズ、4
は試料室である。FIG. 1 is a schematic view of an apparatus according to an embodiment of the present invention, in which a composition image is obtained. The backscattered electron detector 13 according to the present invention includes a scintillator 8, a photomultiplier tube 9, and an amplification circuit 10, an aperture 11, an aperture position change mechanism 12,
Is added. In the figure, 1 is an electron beam, 2 is a deflection circuit for scanning the electron beam 1 on the sample 5, 3 is an objective lens for focusing the electron beam on the sample 5, 4
Is a sample chamber.
【0008】電子ビーム1が照射されると試料5から反
射電子6,7が発生する。入射ビーム1に対する反射角
が大きい反射電子6には試料の形状情報が多く含まれて
いる。入射した電子ビーム1に対し鋭角に反射する反射
電子7には試料の組成情報が多く含まれている。When the electron beam 1 is irradiated, reflected electrons 6 and 7 are generated from the sample 5. The backscattered electrons 6 having a large reflection angle with respect to the incident beam 1 contain a lot of sample shape information. The reflected electrons 7 that are reflected at an acute angle with respect to the incident electron beam 1 contain a large amount of sample composition information.
【0009】絞り11には、入射ビーム1付近の反射電
子のみシンチレータ8で検出できるように穴を空けてあ
る。図のように、試料5とシンチレータ8の間に絞り1
1を入れることで、反射電子(凹凸情報)6を遮断し、組
成情報の多く含んだ反射電子7のみ検出することが可能
となる。これにより、検出面15で光に変換された電子
エネルギーは、光電子増倍管9、増幅回路10で増幅さ
れ、表示装置14に観察像として表示され、組成像観察
が可能となる。The aperture 11 is provided with a hole so that only the reflected electrons near the incident beam 1 can be detected by the scintillator 8. As shown in the figure, the diaphragm 1 is located between the sample 5 and the scintillator 8.
By inserting 1, it is possible to cut off the backscattered electrons (roughness information) 6 and detect only the backscattered electrons 7 containing a lot of composition information. As a result, the electron energy converted into light on the detection surface 15 is amplified by the photomultiplier tube 9 and the amplifier circuit 10 and is displayed on the display device 14 as an observation image, so that a composition image can be observed.
【0010】次に、従来通り、組成像と凹凸像を加算し
た立体感のある像(立体像)を観察したい場合は、絞り
板11の位置を変える機械的構造12を動作させること
で、観察可能となる。例としては、図2に示すように、
絞り11をスライドさせて、試料5とシンチレータ8間
から絞り11を外すだけで、従来通りの像観察が可能と
なる。なお、図2は図1のP方向からの図示である。Next, when it is desired to observe an image having a three-dimensional effect (a three-dimensional image) obtained by adding the composition image and the concavo-convex image, as in the conventional case, the mechanical structure 12 for changing the position of the aperture plate 11 is operated. It becomes possible. As an example, as shown in FIG.
By simply sliding the stop 11 and removing the stop 11 from between the sample 5 and the scintillator 8, the conventional image observation becomes possible. FIG. 2 is a view from the P direction in FIG.
【0011】つまり、従来のシンチレータタイプの反射
電子検出器に、絞り11とその絞りの位置を変える機械
的構造を加えることで、組成像、立体像という2種類の
像観察が可能となり、機能向上が図れる。That is, by adding a diaphragm 11 and a mechanical structure for changing the position of the diaphragm to the conventional scintillator-type backscattered electron detector, it is possible to observe two types of images, a composition image and a three-dimensional image, thereby improving the function. Can be achieved.
【0012】また、これらの絞り位置変更は操作者から
の観察モード切替で自動的に行われることで操作性も向
上する。具体的には組成像観察モードにおいては絞り板
11は挿入状態11−aとし、立体像観察モードにおい
ては絞り板11は非挿入状態11−bになるように機械
的構造12を制御する。In addition, the operability is improved because these aperture positions are automatically changed when the operator switches the observation mode. Specifically, in the composition image observation mode, the mechanical structure 12 is controlled such that the aperture plate 11 is in the inserted state 11-a, and in the stereoscopic image observation mode, the aperture plate 11 is in the non-inserted state 11-b.
【0013】[0013]
【発明の効果】本発明は、以上説明したように、シンチ
レータと光電子増倍管から成る反射電子検出器1台で、
組成像および立体像を観察できるという効果を奏する。According to the present invention, as described above, one backscattered electron detector comprising a scintillator and a photomultiplier tube is used.
This has the effect of observing a composition image and a stereoscopic image.
【図1】本発明の一実施例である反射電子検出装置の構
成概略図を示す。FIG. 1 is a schematic diagram showing a configuration of a backscattered electron detection device according to an embodiment of the present invention.
【図2】図1のP方向視図を示す。FIG. 2 shows a view in the direction P of FIG. 1;
【図3】従来の反射電子検出装置の構成概略図を示す。FIG. 3 shows a schematic configuration diagram of a conventional backscattered electron detection device.
【符号の説明】 1…電子ビーム、2…偏向回路、3…対物レンズ、4…
試料室、5…試料、6…反射電子(凹凸情報)、7…反射
電子(組成情報)、8…シンチレータ、9…光電子増倍
管、10…増幅回路、11…絞り、12…絞り位置変更
機構、13…反射電子検出装置、14…観察像表示回
路、15…有効検出面。[Description of Signs] 1 ... Electron beam, 2 ... Deflection circuit, 3 ... Objective lens, 4 ...
Sample chamber, 5: sample, 6: reflected electrons (irregularity information), 7: reflected electrons (composition information), 8: scintillator, 9: photomultiplier tube, 10: amplifier circuit, 11: diaphragm, 12: diaphragm position change Mechanism: 13: backscattered electron detection device, 14: observation image display circuit, 15: effective detection surface.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 川俣 茂 茨城県ひたちなか市大字市毛1040番地 株 式会社日立サイエンスシステムズ内 Fターム(参考) 5C033 NN02 NP08 ──────────────────────────────────────────────────続 き Continuing from the front page (72) Inventor Shigeru Kawamata 1040, Ichimo, Hitachinaka-shi, Ibaraki F-term in Hitachi Science Systems, Ltd. (reference) 5C033 NN02 NP08
Claims (3)
次電子線を照射して得られる反射電子を検出する手段
と、当該検出信号に基づいて試料像を表示する表示装置
を備えた電子顕微鏡において、前記反射電子を検出する
手段はシンチレータと光電子増倍管を組み合わせた方式
のものであって、シンチレータ検出面に反射電子制限用
の絞り板を設けたことを特徴とする反射電子検出装置。An electron source comprising: an electron source; means for detecting reflected electrons obtained by irradiating a primary electron beam emitted from the electron source; and a display device for displaying a sample image based on the detection signal. In the microscope, the means for detecting the backscattered electrons is of a type in which a scintillator and a photomultiplier are combined, and an aperture plate for limiting the backscattered electrons is provided on the scintillator detection surface. .
の位置を変更する機構を有することを特徴とする反射電
子検出装置。2. The backscattered electron detection device according to claim 1, further comprising a mechanism for changing a position of the aperture plate.
組成像または立体像の観察モードに応じて該絞り板の位
置を決定する機構を有することを特徴とする反射電子検
出装置。3. The detection device according to claim 1, wherein:
A backscattered electron detection device having a mechanism for determining the position of the aperture plate according to a composition image or a stereoscopic image observation mode.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000229024A JP2002042711A (en) | 2000-07-25 | 2000-07-25 | Reflection electron detection device of scanning electron microscope |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000229024A JP2002042711A (en) | 2000-07-25 | 2000-07-25 | Reflection electron detection device of scanning electron microscope |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2002042711A true JP2002042711A (en) | 2002-02-08 |
Family
ID=18722212
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000229024A Pending JP2002042711A (en) | 2000-07-25 | 2000-07-25 | Reflection electron detection device of scanning electron microscope |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2002042711A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015053262A1 (en) * | 2013-10-08 | 2015-04-16 | 株式会社日立ハイテクノロジーズ | Charged particle beam device and charged particle beam device control method |
-
2000
- 2000-07-25 JP JP2000229024A patent/JP2002042711A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015053262A1 (en) * | 2013-10-08 | 2015-04-16 | 株式会社日立ハイテクノロジーズ | Charged particle beam device and charged particle beam device control method |
US9881769B2 (en) | 2013-10-08 | 2018-01-30 | Hitachi High-Technologies Corporation | Charged particle beam device and charged particle beam device control method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4211924A (en) | Transmission-type scanning charged-particle beam microscope | |
US5362964A (en) | Environmental scanning electron microscope | |
US7285780B2 (en) | Detector system for a scanning electron microscope and a scanning electron microscope incorporating said detector system | |
US7888643B2 (en) | Focusing and positioning device for a particle-optical raster microscope | |
JP2002042713A (en) | Scanning electron microscope provided with detection part in objective lens | |
JP4354197B2 (en) | Scanning electron microscope | |
US3872305A (en) | Convertible scanning electron microscope | |
JP2002042711A (en) | Reflection electron detection device of scanning electron microscope | |
JPH11273608A (en) | Scanning electron microscope | |
JP5341025B2 (en) | Scanning electron microscope | |
JPH024441Y2 (en) | ||
JPH04229939A (en) | Electron beam device | |
US20090057558A1 (en) | Scanning electron microscope | |
JPH045363B2 (en) | ||
JPH07169429A (en) | Scanning transmission electron microscope | |
JPH0756788B2 (en) | electronic microscope | |
JP2006172919A (en) | Scanning electron microscope having three-dimensional shape analysis function | |
US4121100A (en) | Electron microscope | |
JP2000123774A (en) | Scanning tunneling electron microscope | |
JP2002015691A (en) | Scanning electron microscope | |
JP2005005056A (en) | Scanning electron microscope | |
JP2002150983A (en) | Manipulator | |
JP2008066057A (en) | Scanning transmission electron microscope | |
JPS6119044A (en) | Stereoscanning-type electron microscope | |
JP3331245B2 (en) | Scanning soft X-ray microscope |