JP2001515500A5 - - Google Patents

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Publication number
JP2001515500A5
JP2001515500A5 JP1998540086A JP54008698A JP2001515500A5 JP 2001515500 A5 JP2001515500 A5 JP 2001515500A5 JP 1998540086 A JP1998540086 A JP 1998540086A JP 54008698 A JP54008698 A JP 54008698A JP 2001515500 A5 JP2001515500 A5 JP 2001515500A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998540086A
Other languages
English (en)
Japanese (ja)
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JP2001515500A (ja
JP4308326B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP1998/001346 external-priority patent/WO1998041524A1/en
Publication of JP2001515500A publication Critical patent/JP2001515500A/ja
Publication of JP2001515500A5 publication Critical patent/JP2001515500A5/ja
Application granted granted Critical
Publication of JP4308326B2 publication Critical patent/JP4308326B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP54008698A 1997-03-18 1998-03-07 α−アミノアルケン類に基づく光励起性の窒素含有塩基類 Expired - Fee Related JP4308326B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH65297 1997-03-18
CH652/97 1997-03-18
PCT/EP1998/001346 WO1998041524A1 (en) 1997-03-18 1998-03-07 PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMINO ALKENES

Publications (3)

Publication Number Publication Date
JP2001515500A JP2001515500A (ja) 2001-09-18
JP2001515500A5 true JP2001515500A5 (cg-RX-API-DMAC7.html) 2005-11-10
JP4308326B2 JP4308326B2 (ja) 2009-08-05

Family

ID=4192009

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54008698A Expired - Fee Related JP4308326B2 (ja) 1997-03-18 1998-03-07 α−アミノアルケン類に基づく光励起性の窒素含有塩基類

Country Status (12)

Country Link
US (1) US6087070A (cg-RX-API-DMAC7.html)
EP (1) EP0970085B1 (cg-RX-API-DMAC7.html)
JP (1) JP4308326B2 (cg-RX-API-DMAC7.html)
KR (1) KR100527614B1 (cg-RX-API-DMAC7.html)
CN (1) CN1128799C (cg-RX-API-DMAC7.html)
AU (1) AU720834B2 (cg-RX-API-DMAC7.html)
BR (1) BR9808899B1 (cg-RX-API-DMAC7.html)
CA (1) CA2283446C (cg-RX-API-DMAC7.html)
DE (1) DE69806739T2 (cg-RX-API-DMAC7.html)
TW (1) TW466255B (cg-RX-API-DMAC7.html)
WO (1) WO1998041524A1 (cg-RX-API-DMAC7.html)
ZA (1) ZA982233B (cg-RX-API-DMAC7.html)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6489374B1 (en) * 1998-08-21 2002-12-03 Ciba Specialty Chemicals Corporation Photoactivatable bases containing nitrogen
KR20020084256A (ko) * 2000-03-28 2002-11-04 아크조 노벨 엔.브이. 광활성 코팅 조성물 및 대기온도에서 빠르게 처리될 수있는 표면의 코팅제 제조를 위한 광활성 코팅 조성물의 용도
BR0213354A (pt) * 2001-10-17 2004-10-26 Ciba Sc Holding Ag Bases nitrogenadas fotoativáveis
EP1497338B1 (en) * 2002-04-19 2010-09-01 Basf Se Curing of coatings induced by plasma
EP1593728B1 (en) * 2004-05-03 2012-05-09 Rohm And Haas Company Michael addition compositions
EP1640388B1 (en) * 2004-09-24 2015-02-25 Rohm and Haas Company Biomass based Michael addition composition
JP5345537B2 (ja) * 2006-09-29 2013-11-20 チバ ホールディング インコーポレーテッド ブロックイソシアネートをベースとする系のための光潜在性塩基
EP2145231B1 (en) 2007-04-03 2011-09-14 Basf Se Photoactivable nitrogen bases
DE102008049848A1 (de) 2008-10-01 2010-04-08 Tesa Se Mehrbereichsindikator
JP5978138B2 (ja) * 2013-01-22 2016-08-24 株式会社Adeka 新規化合物及び感光性樹脂組成物
JP5927750B2 (ja) 2013-07-18 2016-06-01 セメダイン株式会社 光硬化性組成物
US9718999B2 (en) 2013-12-13 2017-08-01 Cemedine Co., Ltd Photocurable composition having adhesive properties
US20170327717A1 (en) 2014-10-29 2017-11-16 Tesa Se Adhesive compounds containing getter materials that can be activated
WO2016176548A1 (en) 2015-04-29 2016-11-03 3M Innovative Properties Company Composition including a polythiol and a polyepoxide and methods relating to the composition
CN107708647B (zh) 2015-04-29 2021-02-19 Bsn医疗有限公司 医疗洗浴设备
EP3288893B8 (de) 2015-04-29 2019-04-10 BSN medical GmbH Mehrstufiges verfahren zur no-herstellung
CA3042864A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition
WO2018085534A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods
EP3535341A1 (en) 2016-11-03 2019-09-11 3M Innovative Properties Company Polythiol sealant compositions
EP3548969A1 (en) 2016-12-05 2019-10-09 Arkema, Inc. Initiator blends and photocurable compositions containing such initiator blends useful for 3d printing
EP3395800B1 (en) 2017-04-26 2021-11-03 Henkel AG & Co. KGaA Heterocyclic quaternary nitrogen compounds comprising a polymeric substituent and their use as a photolatent catalyst in curable compositions
JP2021529840A (ja) 2018-04-26 2021-11-04 ヘンケル・アクチェンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフト・アウフ・アクチェンHenkel AG & Co. KGaA 硬化性組成物における潜在性触媒として使用するための第四級窒素化合物。
WO2020065588A1 (en) 2018-09-27 2020-04-02 3M Innovative Properties Company Composition including amino-functional silanes and method of applying a sealant to a substrate
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4772530A (en) * 1986-05-06 1988-09-20 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
ES2054861T3 (es) * 1987-03-26 1994-08-16 Ciba Geigy Ag Nuevas alfa-aminoacetofenonas como fotoiniciadores.
DE3825586A1 (de) * 1988-07-28 1990-02-01 Basf Ag Substituierte imidazolylmethyloxirane und substituierte imidazolylpropene, ihre herstellung und sie enthaltende fungizide
JP2583364B2 (ja) * 1990-06-19 1997-02-19 三菱電機株式会社 感光性樹脂組成物
JP2654339B2 (ja) * 1992-11-24 1997-09-17 インターナショナル・ビジネス・マシーンズ・コーポレイション 感光性レジスト組成物及び基板上にレジスト像を形成する方法

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