JP2001358548A - Piezoelectric device recognizing illumination apparatus and piezoelectric device recognition apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a piezoelectric device recognizing illumination apparatus and a piezoelectric device recognition apparatus which can identify clearly contour electrodes on a piezoelectric device by obtaining sufficient contrast between the electrodes and their background when the images of the electrodes are recognized during manufacture of the piezoelectric device. SOLUTION: A CCD camera 31 and an illumination apparatus 9 are provided in a partial process of an MCF 10. An illumination light is applied to the MCF 10 by the illumination apparatus 9 and the images are picked up by the CCD camera 31 for the image recognition of positions of electrodes. A plurality of blue LED's 91, 91, etc., are arranged circularly around the CCD camera 31 to be employed as the light sources of the illumination apparatus 9. By illuminating the MCF 10 by the monochromatic light with a short wavelength, the sufficient contrast between the electrodes and a base circuit pattern, i.e., their background, can be obtained.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to, for example, a crystal filter (MCF (monolithic crystal filter)).
The present invention relates to a recognition device for recognizing an image of a piezoelectric device in a manufacturing process of the piezoelectric device typified by (1). The present invention also relates to a recognition lighting device for irradiating a piezoelectric device with light to perform the image recognition. In particular, the present invention relates to an improvement for performing image recognition of a piezoelectric device with high accuracy.

[0002]

2. Description of the Related Art Conventionally, in a quartz filter utilizing, for example, a thickness shear vibration of a quartz plate, an input electrode and an output electrode are generally formed with a predetermined gap on one surface of the quartz plate. In addition, a common electrode is formed on the other surface at a position facing these electrodes.

As one of the manufacturing processes of such a crystal filter, for example, A
There is a partial process of adjusting a frequency characteristic by depositing a thin film made of a material such as g or Al. This partial process is disclosed in, for example, JP-A-6-140861.

In this partial process, in order to accurately obtain the deposition position of the deposition material, the position of the electrode on the quartz plate is recognized in advance by imaging means such as a CCD camera, and the deposition material is determined based on the position. Is determined.

More specifically, in a quartz filter manufacturing line, a halogen lamp and a CC are opposed to the common electrode.
A D camera is installed, and while irradiating halogen light toward the common electrode, the reflected light is captured by a CCD camera to recognize an image of the electrode position. Then, the deposition position of the deposition material is determined based on the image recognition information, and the other area is masked with a partial mask. In this state, a deposition material from a deposition source is deposited at a predetermined position on the common electrode.

[0006]

However, such a conventional image recognition technique is still insufficient for clearly identifying the contours of the electrodes. That is, it is not possible to obtain a sufficient contrast between the electrode and its background, which may cause erroneous recognition of the electrode position. In particular, the quartz plate that has been polished or deep-etched is almost transparent because the crystal surface is exposed, and its background (the circuit pattern on the base side to which the quartz plate is attached) Everything is imaged by the CCD camera. This makes it difficult to discriminate the contour of the electrode to be detected from the circuit pattern of the background, which may cause a masking defect due to a partial displacement of the partial mask, resulting in a displacement of the deposition position of the deposition material. For this reason, there is a limit in reducing the incidence of defective crystal filters. Further, in a state where such a positional shift may occur, the manufacturing efficiency is deteriorated such that a number of partial processes must be repeated in order to manufacture a crystal filter having a desired frequency characteristic.

SUMMARY OF THE INVENTION The present invention has been made in view of the foregoing, and an object of the present invention is to sufficiently contrast the electrodes and their backgrounds when recognizing an image of an electrode on a piezoelectric device during manufacturing. Accordingly, it is an object of the present invention to provide a lighting device for recognizing a piezoelectric device and a recognizing device for a piezoelectric device which can clearly identify the contour of an electrode by obtaining the same.

[0008]

Means for Solving the Problems-Summary of the Invention-In order to achieve the above object, the present invention sets an illumination light for image recognition of an electrode on a piezoelectric device to a specific monochromatic light, Thereby, a sufficient contrast between the electrode and the background at the time of imaging by the imaging means can be obtained.

-Solution Means In the first solution means, in order to pick up an image of a piezoelectric device by an image pickup means and recognize an image, a lighting device for recognition which irradiates the piezoelectric device with light is premised. The recognition illuminating device is configured so that one type of LED is used as a light source and the piezoelectric device is irradiated with only monochromatic light of a specific wavelength.

According to this specific matter, the monochromatic light of a specific wavelength emitted from the light source to the piezoelectric device is reflected by the piezoelectric device and imaged by the imaging means. As a result, for example, an electrode position on the piezoelectric device is image-recognized and used for subsequent processing (for example, partial processing for frequency adjustment). Since the illuminating light applied to the piezoelectric device is monochromatic light, it is not affected by chromatic aberration, and high-precision image recognition by the imaging unit is possible. For example, a sufficient contrast between the electrode and its background circuit pattern is obtained, and the contour of the electrode is clearly imaged.

Specific examples of the light source include the following second and third solving means. First, in the second solution, the light source is a blue LED in the first solution. In a third solution, the light source is a green LED in the first solution.

When these LEDs are used, the piezoelectric device is imaged by the imaging means while illuminating the piezoelectric device with monochromatic light having a short wavelength. For this reason, focusing can be favorably performed in the imaging unit,
The resolution of imaging is improved, and more accurate image recognition becomes possible.

As another means for irradiating a specific monochromatic light to the piezoelectric device, the following configuration can be mentioned. That is,
The illumination device for recognizing the piezoelectric device is provided with an optical filter that transmits only monochromatic light of a specific wavelength in the illumination light of the light source, and the monochromatic light transmitted through the optical filter is emitted toward the piezoelectric device. I have.

[0014] Also according to this specific matter, the illumination light applied to the piezoelectric device can be obtained as monochromatic light, and high-accuracy image recognition can be performed without being affected by chromatic aberration.

The following fifth example is a specific example of the above optical filter.
And a sixth solution. First, in a fifth solution, in the fourth solution, an optical filter is provided.
The filter is a blue filter that transmits only blue monochromatic light.
According to a sixth solution, in the fourth solution, the optical filter is a green filter that transmits only green monochromatic light.

According to these specific items, as in the case of the above-described second and third solving means, the imaging of the piezoelectric device by the imaging means is performed while illuminating the piezoelectric device with illumination light having a short wavelength. The resolution of imaging is improved, and more accurate image recognition can be performed.

The seventh means specifically specifies a method of irradiating the piezoelectric device with illumination light. That is, in any one of the first to sixth solving means, monochromatic light of a specific wavelength is irradiated toward the piezoelectric device from a plurality of directions around the piezoelectric device. That is, the piezoelectric device is illuminated using a so-called ring light guide or the like.

According to this specific matter, when the piezoelectric device is imaged by the imaging means, the shadow of the piezoelectric device does not occur. That is, it is possible to capture an image by the imaging unit in a state where erroneous recognition of the image due to the presence of the shadow is avoided. As a result, the effect of setting the illumination light to a specific monochromatic light and avoiding the existence of a shadow are combined with each other, so that more accurate image recognition can be performed.

The eighth means specifically specifies a piezoelectric device. That is, in any one of the first to seventh solving means, the piezoelectric device is a crystal vibration device. The quartz vibrating device is configured to emit only monochromatic light of a specific wavelength.

When the above-described monochromatic light is applied to the quartz vibrating device, the influence of the birefringence of the quartz plate on the reflected light can be almost eliminated. That is, it is possible to prevent a phenomenon in which polarized light accompanying the birefringence of the illumination light adversely affects a captured image of the imaging unit.

In each of the above-described solving means, high-precision image recognition is performed by improving illumination light applied to the piezoelectric device. The following ninth solution means performs high-precision image recognition by improving the reflected light reflected from the piezoelectric device and incident on the imaging means. Specifically, it is assumed that the recognition device is for recognizing the image of the piezoelectric device. The recognition device includes illumination means for irradiating the piezoelectric device with light, and imaging means for imaging reflected light of the light emitted from the illumination means to the piezoelectric device, and reflected light incident on the imaging means. Out of which are transmitted only monochromatic light of a specific wavelength.

According to this specific matter, the same effect as that of the first solution can be obtained while diverting a conventional device (for example, a halogen lamp) as a lighting device for irradiating the piezoelectric device with light. Thus, high-precision image recognition by the imaging means can be performed.

Specific examples of the optical filter according to the ninth solving means include the following tenth and eleventh solving means. First, in a tenth solution means, in the ninth solution means, the optical filter is a blue filter that transmits only blue monochromatic light. In an eleventh solution, in the ninth solution, the optical filter is a green filter that transmits only green monochromatic light.

According to these specific items, since only reflected light having a short wavelength is incident on the image pickup means, the resolution of the image pickup is obtained by the same operation as in the fifth and sixth solving means. Is improved, and more accurate image recognition becomes possible.

According to a twelfth solution, the piezoelectric device in the ninth to eleventh solutions is specifically specified. That is, the present piezoelectric device is a crystal vibration device. Then, only monochromatic light of a specific wavelength out of the reflected light from the crystal vibrating device is made to enter the imaging means.

Since the reflected light from the quartz vibrating device is transmitted through the optical filter and made incident on the image pickup means, the reflected light polarized under the influence of the birefringence in the quartz plate is transmitted through the optical filter. Thus, the influence of the birefringence can be eliminated, whereby the image recognizing operation by the image pickup means can be performed well.

[0027]

Embodiments of the present invention will be described below with reference to the drawings. In the present embodiment, a case where the present invention is applied to an MCF manufacturing line will be described by taking an MCF (monolithic crystal filter) as an example of a piezoelectric device.

(First Embodiment) FIG. 1 is a structural view of a partial process which is one of the manufacturing steps of the MCF 10 according to the present embodiment, and shows a schematic diagram showing a mechanical configuration and an electrical configuration. A block diagram is also shown.

This partial process section is provided with a vacuum device 1, which comprises a vacuum prechamber 11, a vacuum chamber 12
And a vacuum rear chamber 13. These rooms 11, 1
2 and 13 are separated by gate valves 14 and 15, respectively. In addition, each of these rooms 11, 12, 1
3, a transfer device 2 for transferring a carrier 21 holding the MCF 10 to be frequency-adjusted is provided.

In this example, the MCF to be frequency-adjusted
Reference numeral 10 includes an element E, and a base R made of, for example, ceramics for housing and holding the element E. As shown in a schematic diagram of the electrode pattern of the element E, an input electrode E1 and an output electrode E2 made of a material such as Ag are formed on one surface (a back surface in FIG. 2) of a quartz substrate S by a predetermined gap. G
The common electrode E3 is formed on the other surface (the surface on the near side in FIG. 2). Further, extraction electrodes E4, E5, and E6 are formed on each surface of the quartz substrate S.
Each is individually connected to each electrode E1, E2, E3. The quartz substrate S according to the present embodiment has been subjected to a polishing process or a deep etching process. Therefore, the crystal substrate S is substantially transparent with the crystal plane exposed. As a result, as shown in FIG. 2, the extraction electrodes E4 and E5 on the back side of the quartz substrate S are in a state of being visible from the front side.

This element E is a surface mount type base R (FIG. 1).
In the state where the lid of the base R is removed and the common electrode E3 is exposed facing downward open side,
The MCF 10 is held by the carrier 21. The input / output electrode E of the element E is provided on the bottom of the surface mount type base R.
A circuit pattern of an external lead portion (not shown) for individually leading the first electrode E1 and the common electrode E3 to the outside is formed.

The vacuum chamber 12 has an image processing area A1 on the front vacuum chamber 11 side and a frequency adjustment area A2 on the vacuum rear chamber 13 side.
It consists of two areas. In the image processing area A1, a CCD camera 31 for imaging the MCF 10 held on the carrier 21 is arranged. An image signal from the CCD camera 31 is supplied to an A / D converter (not shown).
After that, it is taken into the image processing device 3 placed outside the vacuum device 1. In the image processing device 3,
Based on the image data from the CCD camera 31, each electrode E3, E
4, E5 and E6 are image-recognized, and these electrodes E3 and E3 are recognized.
The position information of E4, E5, and E6 is obtained. Then, based on the information, information on the mounting state of the MCF 10 with respect to each carrier 21 (displacement up and down, right and left, rotation, etc.) is obtained and used as mounting position correction data. Is calculated. Specifically, the calculation of the center position of the common electrode E3 is based on the extraction electrode E connected to the input electrode E1 and the output electrode E2.
The corners of points 4 and E5 (points C and C in FIG. 2) are image-recognized, and the center point on a straight line connecting the corners C and C is determined as the center position of the common electrode E3. These mounting position correction data and center position data are stored in each MCF1
For each 0, the data is temporarily stored in the memory 32 and transferred to the control unit 8 described later.

As a feature of this embodiment, the image processing area A1 includes an MCF facing the CCD camera 31.
An illumination device 9 for irradiating illumination light to the light source 10 is provided. Hereinafter, the configuration of the lighting device 9 will be described. The lighting device 9 is assembled integrally with the CCD camera 31. FIG. 3 is a plan view (viewed from the MCF 10 side) showing the CCD camera 31 and the lighting device 9 integrated with the CCD camera 31. As shown in FIG. 3, the illuminating device 9 is composed of a plurality of LEDs 91, 91,... In this embodiment, the 12 LEDs 9
1, 91,... Are arranged. These LEDs 91, 9
The number of 1,... Is not limited to this. Each LED 9
Are so-called blue LEDs that emit blue light.
The lighting control of these LEDs 91, 91,... Is performed by an LED control unit 92 (see FIG. 1).

By lighting these LEDs 91, 91,..., The opposing MCF 10 is irradiated with blue light as monochromatic light from a plurality of directions around the periphery. Camera 3
1 can be taken. When a blue LED is employed, the wavelength is relatively short (4.
Since the monochromatic light (about 50 nm) can be applied to the MCF 10, the focus of the CCD camera 31 can be favorably adjusted, the resolution of the image pickup is improved, and the images of the electrodes E3, E4, E5, and E6 can be accurately formed. Recognition can be performed. In addition, since the irradiated light is monochromatic light (blue light), there is almost no influence of birefringence of the quartz substrate S due to chromatic aberration, and the electrodes E3, E4, E
5, E6 image recognition becomes possible. This lighting device 9 and C
The CD camera 31 constitutes the piezoelectric device recognition device according to the present invention.

In the frequency adjustment area A2, the deposition source 4 located below the carrier 21 positioned at the deposition position D
And a partial mask 5 disposed close to and opposed to one MCF 10 held by the carrier 21 similarly positioned at the deposition position D, and a mask movement for moving the partial mask 5 in a two-dimensional direction on a horizontal plane. Mechanism 5
1 and a shutter device 6 arranged between the partial mask 5 and the vapor deposition source 4. In addition, in the frequency adjustment area A2, an input electrode E1, an output electrode E2, and a common electrode E3 are provided via external lead-out terminals formed on a base R of the MCF 10 held on the carrier 21 positioned at the deposition position D. Is provided for leading out the vacuum chamber 12 to the outside.

This deriving circuit 7 connects the input electrode E1, output electrode E2 and common electrode E3 of the MCF 10 held on the carrier 21 positioned at the vapor deposition position D under the control of the control unit 8 outside the vacuum chamber 12. Is connected to an oscillating circuit (or network analyzer) 81 in the MCF 1 on the deposition position D by the oscillating circuit 81.
0 is driven.

The control unit 8 obtains the frequency characteristics of the MCF 10 based on the frequency data of the MCF 10 input from the oscillation circuit 81 and, based on the measurement results of the obtained frequency characteristics, determines that the characteristics are the required frequency characteristics. The data processing unit 82 calculates the data of the thickness of the film to be deposited on the common electrode E3, and the like.

The drive control unit 83 uses the various data from the data processing unit 82, the data of the center position on the image stored in the memory 32, and the data relating to the mounting position information to control the frequency adjustment area A2. The drive unit of the entire apparatus including the mask moving mechanism 51 and the shutter device 6 and the transfer mechanism 2 of the carrier 21 is controlled. Further, the vapor deposition control section 84 controls driving of the vapor deposition source 4 and controls start / stop of vapor deposition.

Hereinafter, the partial operation of the vacuum apparatus 1 configured as described above will be described. First, in the state of being held by the carrier 21, the gate valve 14 is removed from the vacuum pre-chamber 11.
Via the MCF 10 to the image processing area A1 of the vacuum chamber 12
Is carried in. When the MCF 10 reaches a position facing the lighting device 9 and the CCD camera 31, the illumination light from each of the blue LEDs 91, 91,.
The light is emitted toward F10, and the image is captured by the CCD camera 31. As a result, the image is recognized by the image processing device 3, the mounting position correction data based on the mounting information for the carrier 21 is obtained, and the center position of the common electrode E3 on the image is calculated.
Is stored in M in which such an imaging operation is continuously conveyed
Are performed in order for CFs 10, 10,....

The MCF 10 that has completed the above image processing is
After being transferred to the frequency adjustment area A2 by the carrier 21 and positioned one by one on the deposition position D, the partial mask 5 is positioned. When positioning the partial mask 5, the position information of the opening of the mask 5 in the memory 32, the mounting position correction data of each device W in the memory 32, and the center position on the image are also called, and Positioning is performed with reference to the center position. After the positioning, the shutter device 6 is driven and controlled, and a vapor deposition film is formed in a predetermined area of the common electrode E3 in a pattern corresponding to the opening of the mask 5. During the vapor deposition operation of the vapor deposition material (for example, Ag), partial vapor deposition is performed on the common electrode E3 from the vapor deposition source 4 via the shutter device 6 and the mask 5 while monitoring the electrical characteristics of the MCF 10.

By performing such a vapor deposition operation, the MCF 10 having a desired frequency characteristic is obtained, and the frequency adjustment operation is completed. This operation is performed by each of the MCFs 10, 10,
Are sequentially performed, and are conveyed to the post-vacuum chamber 13 through the gate valve 15.

-Effects of Embodiment- As described above, in this embodiment, the illumination light for recognizing the electrodes E3, E4, E5, E6 on the MCF 10 is obtained by the plurality of blue LEDs 91, 91, .... I have to. That is, only monochromatic light having a relatively short wavelength is used as the illumination light. For this reason, the focus adjustment in the CCD camera 31 can be performed well, and high-precision image recognition by the CCD camera 31 can be performed without being affected by chromatic aberration. As a result, the electrodes E3, E4, E5,
A sufficient contrast between E6 and the circuit pattern of the base R, which is the background, can be obtained sufficiently, the contours of the electrodes can be identified well, and the partial mask 5 can be prevented from being displaced. Thus, deposition at an accurate position can be performed without causing a shift in the deposition position of the deposition material.

(Second Embodiment) In the first embodiment described above, the illumination device 9 is provided with a plurality of blue LEDs 91, 91,.
Was irradiated.

In this embodiment, instead of this, the illumination device 9 is provided with a plurality of green LEDs, and the MCF 10 is irradiated with monochromatic light having a wavelength of about 550 nm.
The arrangement state of each green LED is the same as that of the first embodiment described above (see FIG. 3). In other words, each green LED is CC
The illumination device 9 is configured by being arranged in an annular shape around the outer periphery of the D camera 31.

In this embodiment, as in the case of the first embodiment described above, since only monochromatic light having a relatively short wavelength is used as the illumination light, highly accurate image recognition by the CCD camera 31 becomes possible. Thus, the deposition material can be deposited at an accurate position.

(Third Embodiment) This embodiment is a modification of the lighting device 9. Other configurations are the same as those of the above-described first embodiment, and therefore, only the illumination device 9 will be described here.

FIG. 4 is a schematic diagram showing a lighting device 9 according to this embodiment. The lighting device 9 includes a light source unit 93 and an irradiation unit 94.

The light source unit 93 has a light source lamp 93b built in a casing 93a. For example, a halogen lamp is employed as the light source lamp 93b. The light source unit 93 includes an optical filter 93.
c is built in. The optical filter 93c is a blue filter that transmits only blue monochromatic light of the light emitted from the halogen lamp 93b.

The illuminating unit 94 includes a plurality of light emitting units (not shown in FIG. 4) arranged in an annular shape around the outer periphery of the CCD camera 31 similarly to the illuminating device 9 according to the first embodiment described above. I have. The irradiation unit 94 is connected to the light source unit 93 by an optical cable 95, so that light emitted from the halogen lamp 93 b passes through the blue filter 93 c and is emitted from each light emitting unit to the MCF 10 via the optical cable 95. I have.

Also in the configuration of the present embodiment, monochromatic blue light is emitted toward the MCF 10 from a plurality of directions around the MCF 10. For this reason, similarly to the above embodiments, high-precision image recognition by the CCD camera 31 becomes possible, and vapor deposition of a vapor deposition material at an accurate position becomes possible. Further, it is possible to use the same halogen lamp as a conventional light source. That is, the first
And a plurality of LEDs 91, 91,... As in the second embodiment.
You can achieve a similar effect without having to use
It is possible to simplify the configuration of the entire lighting device 9 and reduce costs.

As the optical filter 93c, not only a blue filter but also a green filter that transmits only green monochromatic light of the light emitted from the halogen lamp may be employed.

(Fourth Embodiment) This embodiment is a CCD camera 3
This is a modification of the first embodiment. Other configurations are the same as those of the above-described first embodiment. Therefore, only the CCD camera 31 will be described here. The illumination device 9 employed in the vacuum device 1 according to the present embodiment is the same as the conventional one. That is,
A halogen lamp is used as a light source, and illumination light from the halogen lamp is emitted toward the MCF 10. In addition, as the configuration of the light source, as in the above-described embodiments, a light source in which a light emitting portion is arranged in an annular shape around the outer periphery of the CCD camera 31 or a lamp separately provided from the CCD camera 31 is used. You may.

FIG. 5 is a schematic diagram showing a CCD camera 31 according to this embodiment. The CCD camera 31 has an MCF
A blue filter 33 is incorporated as an optical filter that transmits only blue monochromatic light of the reflected light reflected by 10 and incident on the CCD camera 31.

For this reason, only monochromatic light of a specific frequency useful for image recognition is selected from the reflected light from the MCF 10 and C
This allows the light to enter the CD camera 31. Therefore, even with the configuration of the present embodiment, highly accurate image recognition by the CCD camera 31 is possible, and deposition of a deposition material at an accurate position becomes possible. Also in this embodiment, similarly to the case of the third embodiment, it is possible to use the same halogen lamp as in the related art, and to simplify the configuration of the entire lighting device 9 and reduce the cost. be able to.

In this embodiment, as the optical filter, not only a blue filter but also a green filter that transmits only green monochromatic light among the reflected light from the MCF 10 may be used.

(Experimental Example) Next, an experimental example performed to confirm the effects of the above embodiments and the experimental results will be described. In this experimental example, the first, second, and third
CCD camera 3 in image processing area A1 in the embodiment
The image obtained in 1 was compared with an image obtained by a CCD camera in a conventional image processing area (irradiating with a halogen lamp). Further, in the first embodiment, when a red LED is employed instead of the blue LED (wavelength is about 650 nm), C
Images obtained by the CD camera 31 were also acquired for reference.

FIG. 6 shows each image photograph.
(A) is the one according to the first embodiment, (b) is the conventional one, (c) is the one according to the second embodiment, (d) is the one according to the third embodiment, and (e) is the red LED. It is a case where is adopted.

As can be seen from these image photographs, (b)
In the prior art, both the electrodes on the quartz substrate S and the circuit pattern on the base side, which is the background, are in a state of being recognized, and the contrast between the electrodes and the background is not sufficiently obtained. For this reason, there is a high possibility that erroneous recognition of the electrode position is caused. On the other hand, in the other image photograph according to the present invention, the circuit pattern on the base side is hardly recognized, and a sufficient contrast between the electrode and the background can be obtained. For this reason, the possibility of causing misrecognition of the electrode position is extremely reduced as compared with the conventional one, and it is unlikely that the partial mask will be misaligned. You can see what you can do. In particular, the first type using illumination light having a short wavelength
The effects according to the third to third embodiments are remarkable.

-Other Embodiments- In each of the above embodiments, the case where the present invention is applied to the manufacture of the MCF 10 has been described. The present invention is not limited to this type of device, and can be applied to frequency adjustment of a crystal oscillator and a piezoelectric vibration device that is not a surface mount type. In addition to the frequency adjustment operation (partial process), after the element E is mounted on the base R, a conductive adhesive application step (e.g., a process of bonding the lead electrodes E4, E5, and E6 to the pads on the base R) is performed. The present invention can be applied to an image recognition operation in a so-called secondary coating step).

Further, in each of the above embodiments, the LED 91 has a light emission color of blue or green, and the light filter has a light transmission of blue or green. The present invention is not limited to this, and it is also possible to adopt one that uses red, yellow, or the like as the emission color or transmission color. However, in order to remarkably obtain the effect of the present invention, it is preferable to employ an LED or an optical filter having a color having a wavelength as short as possible. Also, the light source is not limited to a plurality of light sources,
A configuration in which one light source illuminates the MCF 10 is also included in the scope of the present invention.

In each of the above embodiments, the case where the present invention is applied to the manufacture of a device using the quartz substrate S as the piezoelectric material has been described. The present invention is not limited to this,
The present invention can be applied to the manufacture of a device using a piezoelectric material such as lithium tantalate, lithium niobate, and lithium borate.

The electrodes E1 to E6 and the vapor deposition material are not limited to Ag, but various materials such as Al and Au can be used.

The illumination mode of the illumination device 9 is not limited to the one described above (shown in FIG. 3). For example, various forms can be applied, such as adopting a form in which the LEDs 91, 91,...

Further, the light amount of the illumination light in the illumination device 9 may be adjustable so that the light amount capable of performing image recognition with higher accuracy can be automatically or manually selected.

In addition, the vapor deposition method in the partial step is not limited to the vacuum vapor deposition method, but may be a sputtering vapor deposition method or an electron beam vapor deposition method.

The present invention can also be applied to an image recognition operation in an ion milling method, a laser milling method, or the like.

[0067]

As described above, according to the present invention, the following effects are exhibited.

According to the first and fourth aspects of the present invention, only monochromatic light of a specific wavelength is used as illumination light for imaging the piezoelectric device. According to the ninth aspect of the present invention, only monochromatic light of a specific wavelength out of the reflected light from the piezoelectric device is made incident on the imaging means. For this reason, high-precision image recognition by the imaging unit is possible without being affected by chromatic aberration. As a result, for example, when performing image recognition of an electrode in a partial process, a sufficient contrast between the electrode and its background can be obtained,
The contour of the electrode can be satisfactorily identified, and the partial mask can be prevented from shifting. Accordingly, deposition can be performed at an accurate position without causing a shift in the deposition position of the deposition material, and the occurrence rate of defective products of the piezoelectric device can be reduced, and the manufacturing efficiency can be improved.

In the second, third, fifth, sixth and tenth aspects of the present invention, blue or green is used as the monochromatic light having the specific wavelength. By using monochromatic light having a particularly short wavelength in this way, it is possible to favorably perform focusing in the imaging means, and improve the resolution of imaging,
Higher precision image recognition becomes possible.

According to the seventh aspect of the present invention, the monochromatic light of a specific wavelength is irradiated to the piezoelectric device from a plurality of directions around the piezoelectric device. For this reason, it is possible to perform imaging without a shadow of the piezoelectric device. As a result, erroneous recognition of an image due to the presence of a shadow can be avoided, and further high-precision image recognition by the imaging unit can be achieved.

According to the eighth and twelfth aspects of the invention,
The imaging target is a crystal vibrating device. Therefore, imaging can be performed in a state where the influence of the birefringence of the quartz plate is almost eliminated. In other words, the present invention is particularly effective in imaging of a crystal vibrating device in which the influence of the birefringence is concerned.

[Brief description of the drawings]

FIG. 1 is a configuration diagram of a partial process portion according to a first embodiment.

FIG. 2 is a schematic view showing an electrode pattern of an element on a crystal vibrating device.

FIG. 3 is a plan view showing a CCD camera and a lighting device.

FIG. 4 is a schematic diagram illustrating a lighting device according to a third embodiment.

FIG. 5 is a schematic view showing a CCD camera according to a fourth embodiment.

FIG. 6 is a view showing an image photograph in an experimental example.

[Explanation of symbols]

 Reference Signs List 10 MCF (piezoelectric device) 31 CCD camera (imaging means) 33, 93c Optical filter 9 Lighting device 91 LED (light source)

Continuation of the front page (72) Inventor Hiroyuki Arimura 1389 Kono, Hiraoka-cho, Hiraoka-cho, Kakogawa-shi, Hyogo F-term (reference) 5B047 AA11 BC07 BC11 BC12

Claims (12)

[Claims] 1. A recognition illuminating device for irradiating light to a piezoelectric device in order to recognize an image by capturing an image of the piezoelectric device by an imaging unit, wherein one type of LED is used as a light source and a specific wavelength of A lighting device for recognizing a piezoelectric device, wherein the lighting device is configured to emit only monochromatic light. 2. A lighting device for recognizing a piezoelectric device according to claim 1, wherein the light source is a blue LED. 3. The lighting device for recognizing a piezoelectric device according to claim 1, wherein the light source is a green LED. 4. A recognition illumination device that irradiates light to a piezoelectric device in order to recognize an image by imaging the piezoelectric device by an imaging unit, wherein only a monochromatic light of a specific wavelength among illumination light of the light source is transmitted. An illumination device for recognizing a piezoelectric device, comprising: an optical filter, and configured to irradiate only monochromatic light transmitted through the optical filter toward a piezoelectric device. 5. The illuminating device for recognizing a piezoelectric device according to claim 4, wherein the optical filter is a blue filter that transmits only blue monochromatic light. 6. The lighting device for recognizing a piezoelectric device according to claim 4, wherein the optical filter is a green filter that transmits only green monochromatic light. 7. The illuminating device for recognizing a piezoelectric device according to claim 1, wherein the monochromatic light having a specific wavelength is applied to the piezoelectric device from a plurality of directions around the piezoelectric device. A lighting device for recognizing a piezoelectric device, wherein the lighting device is configured as described above. 8. The illuminating device for recognizing a piezoelectric device according to claim 1, wherein the piezoelectric device is a crystal vibrating device, and only monochromatic light having a specific wavelength is used for the crystal vibrating device. An illumination device for recognizing a piezoelectric device, characterized in that the illumination device is configured to irradiate light. 9. A recognition apparatus for image-recognizing a piezoelectric device, comprising: illuminating means for irradiating the piezoelectric device with light; and imaging means for imaging reflected light of the light emitted from the illuminating means to the piezoelectric device. A piezoelectric device recognizing device, comprising: an optical filter that transmits only monochromatic light having a specific wavelength among reflected light incident on the imaging unit. 10. The piezoelectric device recognition apparatus according to claim 9, wherein the optical filter is a blue filter that transmits only blue monochromatic light. 11. The piezoelectric device recognition apparatus according to claim 9, wherein the optical filter is a green filter that transmits only green monochromatic light. 12. The piezoelectric device recognizing device according to claim 9, wherein the piezoelectric device is a quartz vibrating device, and a specific wavelength of light reflected from the quartz vibrating device. A piezoelectric device recognizing device configured to cause only the monochromatic light to be incident on the imaging means.